JP2005070191A - Apparatus for sticking frame and pellicle plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a apparatus for laminating a pellicle frame and a pellicle plate for producing a pellicle which is free from misalignment of a transfer pattern, and to provide a high-performance pellicle which is reduced in misalignment of the transfer pattern. <P>SOLUTION: The laminating apparatus is used for manufacturing a framed pellicle comprising a frame 1 having a specified thickness and a pellicle plate 4 made of synthetic quartz glass to be fixed to one face of the frame. The apparatus is equipped with a mechanism to adjust the distance and parallelism between a supporting member to fix the frame 1 and another supporting member to fix the pellicle plate 4, the mechanism being disposed between both of the supporting members and comprising a spacer 8, micrometer 9, precision screw, piezoelectric device or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention is an apparatus for bonding a frame and a pellicle plate, which is used for obtaining a pellicle suitable for exposure using light having a wavelength of 220 nm or less, and is used in a photolithography process of a semiconductor process. Related pellicles.

  In a photolithography process of a semiconductor process, pattern formation is performed by exposing a semiconductor wafer coated with a photoresist. If there are scratches or foreign matter on the mask used at this time, pattern defects (circuit short-circuiting or disconnection) may occur during exposure. For this reason, a method of mounting a pellicle on one side or both sides of the mask is effective for preventing foreign matter adhesion on the mask pattern surface.

  A conventional pellicle is composed of a frame made of aluminum or the like and a pellicle film having a thickness of several nanometers to several μm made of an organic resin such as nitrocellulose or fluororesin, and the pellicle film is one opening surface of the frame-shaped frame. (For example, refer patent document 1).

  In recent years, exposure using light with a wavelength of 220 nm or less has been studied in response to demands for finer and higher density patterns. However, a pellicle using the above-described organic resin film or the like has low durability because the organic component of the organic resin film is decomposed when exposure light having a short wavelength is used to improve the resolution of exposure. Therefore, it has been studied to use a synthetic quartz glass that is sufficiently transmissive to the wavelength used for exposure and has sufficient resistance for the pellicle plate. This synthetic quartz glass is made from, for example, substantially silicon oxide obtained by growing a porous material made of silicon oxide called soot by reacting a silicon source and an oxygen source in a gas phase and sintering the porous material. Glass.

  However, when creating a pellicle by attaching a pellicle plate made of synthetic quartz glass to the upper end surface of the frame, to ensure the parallelism and warpage of the pellicle plate and the parallelism and flatness of the upper and lower surfaces of the frame. You have to be careful.

  In other words, the pellicle plate needs to have a thickness of about 0.05 to 2.00 mm in order to ensure practical strength. However, if there is a variation in the thickness of the pellicle plate, the optical path of the refracted light changes. The position of the pattern shifts and good lithography cannot be performed. For this reason, the parallelism of the upper and lower surfaces allowed for the pellicle plate is about 0.1 μm / 50 mm.

  Furthermore, if the parallelism between the two surfaces consisting of the pellicle plate fixed on the upper and lower surfaces of the frame and the mask surface is poor, the transfer pattern may be misaligned. For this reason, the warp of the pellicle plate in a state of being attached to the frame is preferably 2 μm or less. For this reason, it is necessary to minimize the warpage of the pellicle itself. On the other hand, since the pellicle plate is used as a pellicle by bonding to the frame, if the flatness of the upper surface of the frame is not good, the pellicle plate after bonding is warped by being bent to the shape of the frame upper surface In addition to increasing the size, there is a risk of causing optical problems such as increasing birefringence due to stress. Furthermore, if the flatness of the lower surface of the frame is also poor, the frame may be distorted or bent during bonding to the mask surface, and as a result, the pellicle plate may be bent. For this reason, it is desirable that the flatness of the upper and lower surfaces used for bonding the frame is 1 μm or less and the parallelism of the upper and lower surfaces is 2 μm or less.

  Further, it is considered that the pellicle plate and the mask expand due to heat in order to absorb exposure light during exposure. At this time, if the thermal expansion coefficient of the frame is different from that of the pellicle plate or the mask, it may be displaced from the initial adhesion position during exposure, and there is a risk of causing a problem such as increasing deflection or birefringence by applying expansion or compression to the pellicle plate. is there. For this reason, the frame is preferably made of a material having a thermal expansion coefficient close to that of synthetic quartz glass, and it is most preferable to use synthetic quartz glass or fused silica glass (also referred to as “quartz glass”).

  However, even if the parallelism and warpage of the pellicle plate and the parallelism and flatness of the frame made of synthetic quartz glass are within the above ranges, a pellicle having no transfer pattern misalignment may not be obtained.

Japanese Patent Laid-Open No. 2002-323752

  In view of the current situation, the present invention devised a pellicle frame and pellicle plate bonding apparatus for creating a pellicle with no transfer pattern misalignment, and provides a high-performance pellicle with less transfer pattern misalignment. For the purpose.

  The inventors of the present invention have made extensive trials on the assumption that the accuracy of the support member holding the frame and the pellicle plate affects the accuracy after bonding in the bonding apparatus and mechanism used when bonding the frame and the pellicle plate. As a result of the overlapping, if the flatness of the surface supporting each is not less than 2 μm, the frame and pellicle plate are corrected by the adsorption force for holding the frame and pellicle plate and the pressure when bonding the two, and the predetermined accuracy is achieved. I found out. This may be the case when the frame or pellicle plate is forcibly held by a suction hole or an electrostatic chuck provided in the support member, or when it is only placed on the support member. Similar accuracy was required. In addition, when bonding the two, the knowledge that the parallelism of the support members is preferably 2 μm or less is preferable in order to obtain alignment and pressure distribution to keep the opposing surfaces of the respective support members parallel. Obtained.

  On the other hand, even when using a support member having these precisions, the thickness of the adhesive is not uniform when the frame or pellicle plate is held on each support member and the adhesive is applied to the surfaces to be bonded. There is a risk that the parallelism between the frame surface to be bonded and the pellicle surface will deteriorate. Since the frame is a frame body and the width of the bonding surface is generally about 2 mm, it is difficult to apply the viscoelastic adhesive with a uniform thickness. In order to solve this problem, a spacer that can maintain parallelism between the support member of the frame and the support member of the pellicle plate may be provided between the support members. Similar to the frame, this spacer can satisfy the requirements if the flatness of the upper and lower surfaces is 2 μm or less and the parallelism is 2 μm or less. Furthermore, in order to absorb variations in the frame height, the thickness of the pellicle plate, and the thickness of the adhesive, it is desirable to have a function capable of adjusting the interval and the parallelism. This function can be obtained by providing a micrometer, precision screws, and piezo elements at a plurality of locations on at least one of the support members.

  Next, as a method of superimposing the support members on which the frame and the pellicle plate are mounted, a method of superimposing both the support members vertically, and a method of placing one of the support members horizontally and supporting the other from above. A method of lowering the member or a method of raising one of the support members is conceivable. The method of adhering vertically is advantageous in that the influence of gravity on the pellicle plate can be minimized. However, since it is necessary to perform adhesion while maintaining the parallelism of both support members, heavy or complicated control is required as an apparatus.

  On the other hand, the method of placing and supporting the support members horizontally, in particular, the method of lowering and superposing one of the support members is also mechanically easy, because the direction of pressure used for bonding and the direction of gravity coincide. There is an advantage that it is easy to control. However, when considering a mechanism for this purpose, it is necessary to keep the supporting member to be lowered horizontally so that a uniform pressure is applied to the bonding surface. In order to achieve this, the present inventors have devised that a mechanism having a degree of freedom, such as a universal joint, is attached to the connection between the tip of the cylinder or the like that supports the supporting member to be lowered and the supporting member. At this time, the center of the cylinder and the connection portion must be on a vertical line passing through the center of gravity of the support member.

  Furthermore, in order to more precisely control the parallelism between the two support members, a parallelism consisting of a plurality of precision screws and piezo elements on the opposite side of the surface on which at least one of the frames and the pellicle plate is mounted. It is desirable to install an adjustment function.

  In addition, as described above, even when trying to create a high-performance pellicle with less misalignment of the transfer pattern by improving the accuracy around the bonded portion, the adhesive expands and contracts, and the adhesive In some cases, a desired shape cannot be obtained due to adhesion of foreign matter inside, foreign matter on the frame or pellicle surface. Once the bonded frame and pellicle plate are peeled off, dirt adheres to them, which necessitates a cleaning process and increases costs. For this reason, it is desirable to be able to observe the flatness of the pellicle plate before and after bonding.

  In addition, the pellicle plate bends due to the influence of gravity regardless of the difference in bonding direction, that is, the form in which the frame or pellicle plate is horizontal or vertical, and it is necessary to reduce this effect. For example, when trying to bond horizontally, the following method is devised. (1) A pellicle plate warped in an arbitrary direction by an arbitrary amount is created. (2) Place the frame horizontally and bond the convex side of the pellicle plate downward from above. (3) When the pellicle is actually mounted on the mask and used, the pellicle plate side faces downward, so that the deflection is offset by its own weight.

  However, it is difficult to industrially manufacture a pellicle plate warped in an arbitrary direction by an arbitrary amount. In addition to the shape of the warp of the pellicle plate, the shape of the flatness of the frame and the support member is also arbitrary. Because it is necessary to make it practically difficult.

  For this reason, a technique for applying an external force to the pellicle plate to cancel the influence of gravity when bonding the pellicle plate and bonding the pellicle plate to the frame in an arbitrary shape is required. At this time, as in the case described above, it is necessary for the attaching device to be able to observe how the pellicle plate warps before and after bonding.

  The requirement for bonding while observing the shape is that an opening is provided in at least one of the frame support member and the support member on the pellicle surface, and a displacement sensor for measuring the distance to the pellicle plate is provided on the opening side. It can be solved by installing. However, the displacement sensor is a partial measurement. When measuring multiple points, a mechanism for moving the displacement sensor in the X and Y directions parallel to the pellicle surface is required and the structure becomes complicated, but it is manufactured at a relatively low cost. Is possible. On the other hand, when an optical interferometer such as a Fizeau interferometer is used instead of the displacement sensor, there is an advantage that the shape can be measured in a short time with a high data density over a wide range.

  Based on the information obtained by these mechanisms, the following three types have been devised as mechanisms for controlling the shape of warpage of the pellicle plate during bonding. In any case, if a hard object comes into contact with the area where the pellicle plate is used, that is, the surface through which the exposure light passes, it causes scratches and dust generation, and means for avoiding it are added.

  (1) A concave portion is provided inside the surface of the support member of the pellicle plate that holds the pellicle plate, and gas flows into or is sucked into a sealed space formed by the pellicle plate and the support member to A method of creating an arbitrary uneven shape on a pellicle plate by creating a pressure difference. Alternatively, a method of flowing or sucking gas into a space constituted by a pellicle plate, a frame, and a frame support member. However, since the frame is generally provided with a vent hole, in that case, the latter uses a space consisting of a frame support member, a sealing wall installed on the outer periphery of the frame, and a pellicle plate support member and a pellicle plate. Become.

  (2) Next, a plurality of holes of an arbitrary size and shape are formed at positions where the pellicle plate support member comes into contact with the frame, and through the holes, the surface opposite to the adhesion of the pellicle plate is contacted with a terminal or the like. By controlling the thickness of the adhesive, which is an elastic body, by applying pressure to the opposite surface of the part to be used, or the adhesive, which is an elastic body, acts as a buffer, changing the behavior of the inner surface side (use area) of the pellicle plate A method for forming an arbitrary uneven shape on the pellicle plate.

  (3) Thirdly, by providing one or more gas injection ports on one of the frame support member and the pellicle plate support member provided with a recess on the inside, and applying gas to the pellicle plate from this injection port A method of forming an arbitrary uneven shape.

The frame support member, pellicle plate support member, spacing / parallelism adjustment spacer, and sealing wall used in this device are processed with high precision, and are affected by changes in the temperature of the location where this device is installed. Receive. For this reason, it is desirable to use a material having a thermal expansion coefficient close to that of synthetic quartz glass, which is the material of the pellicle plate, that is, 5.0 to 6.5 × 10 ⁻⁷ / ° C.

  Next, the warpage of the pellicle plate changes when it is released from the pressure without being dried due to expansion or contraction of the adhesive with time or elasticity due to elasticity. In order to prevent this, it is desirable that the pellicle frame and the pellicle plate are bonded in as short a time as possible while being sandwiched between the respective support members. As an adhesive for this purpose, a UV curable resin is conceivable, but the UV light necessary for curing the resin must reach between the pellicle frame and the pellicle plate while being sandwiched between the support members. Therefore, at least one of the frame support member, the pellicle plate support member, the spacer for adjusting the interval and parallelism, and the sealing wall must be made of a material and thickness that transmit light of a wavelength of 300 to 400 nm by 70% or more. I must. For example, it is preferable to use polished synthetic quartz glass.

  Also, in order to evenly apply the adhesive for bonding the frame and the pellicle plate, just before applying, the application surface using UV light with a short wavelength such as an ultra-high pressure mercury lamp, Xe excimer lamp, ArF excimer laser, etc. It is effective to irradiate and remove the organic matter adhering thereto. For this reason, it is desirable to irradiate with the frame or pellicle plate to which the adhesive is applied being placed or adsorbed on the respective support members. Therefore, at least one of the frame support member, the pellicle plate support member, the spacer for adjusting the interval / parallelism, and the sealing wall has a material and thickness that transmit light with a wavelength of 170 to 300 nm by 30% or more. There is a need. For example, it is preferable to use polished synthetic quartz glass.

  The frame and pellicle plate laminating apparatus using the mechanism / material as described above is effective in both horizontal and vertical forms except for the unique mechanism of the horizontal form described in claim 3, and is extremely useful. I can say that.

  According to the present invention, it is possible to obtain a pellicle frame and pellicle plate laminating device for producing a pellicle with no transfer pattern displacement, and to obtain a high-performance pellicle with less transfer pattern displacement. Can do.

Hereinafter, the present invention will be described in more detail with reference to the drawings.
FIG. 1 is a schematic cross-sectional view of the main part of a bonding machine. The frame 1 is placed on the frame support member 2 and is adsorbed and fixed by the frame fixing suction holes 3. At this time, if the flatness of at least the surface of the frame support member 2 that contacts the frame is not 2 μm or less, the frame itself is bent and a good pellicle cannot be obtained. However, in consideration of an adhesion mechanism using a spacer, which will be described later, the entire surface on which the frame 1 is placed preferably has a flatness of 2 μm or less. Further, the pellicle plate 4 is held by the pellicle plate support member 5 through the pellicle plate fixing suction hole 6, but the pellicle plate support member 5 has a recess 7 so that the area where the pellicle plate 4 is used is not scratched. Is provided. At this time, if the flatness of the surface where the pellicle plate 4 and the pellicle plate support member 5 are in contact with each other is large, the pellicle plate is bent and a good pellicle cannot be obtained. Therefore, the flatness of this surface also needs to be 2 μm or less, and is desirably 2 μm or less over the entire surface excluding the recesses 7 like the frame support member 2.

  FIG. 2 is a schematic cross-sectional view showing the spacer 8 for making the distance and parallelism between the support members 2 and 5 for both the pellicle plate and the frame constant. In FIG. 2, the spacer 8 is described as a frame for convenience. However, a plurality of columns, prisms, or the like may be used as long as the desired requirements are satisfied.

  FIG. 3 is a schematic cross-sectional view showing a distance / parallelism adjusting mechanism between the support members 2 and 5. A plurality of micrometers 9 are fixed through the frame support member 2, and the distance between the pellicle plate support member 5 and the frame support member 2 can be adjusted by the micrometer 9. Instead of the micrometer 9, a precision screw, a piezo element, or the like may be used. In FIG. 3, the frame support member 2 is provided with a through hole and the adjustment mechanism is attached. However, even if the adjustment mechanism is attached on the support member, the function is not impaired. Further, the spacer 8 shown in FIG. 2 and the adjustment mechanism shown in FIG.

  FIG. 4 is a schematic cross-sectional view showing a suspension mechanism for a support member used particularly when the pellicle plate and the frame are horizontally placed and bonded. The pellicle plate support member 5 is connected to the air cylinder 11 which is a vertical mechanism through a support plate A13. However, even if the pellicle plate support member 5 is directly mounted without using the support plate A, the function is not impaired.

  However, since the support member 5 is processed with high accuracy, the support plate A is bonded as a reinforcing material and screwed on the support plate A in order to reduce the occurrence of distortion due to bending or drilling due to its own weight. It is preferable to process holes. In order to suspend the pellicle plate support member 5, a suspension housing 10 is installed above the support member 5, and a suspension mechanism and an elevating mechanism such as an air cylinder are mounted on the housing. The tip of the air cylinder and the plate A are connected by a universal joint 12 so that the pellicle plate 4 held by the pellicle plate support member 5 can be lowered onto the frame 1 horizontally. By this mechanism, a bonding pressure is uniformly applied to the bonding surface, and a flat bonding surface can be obtained. In addition to moving the support member 5 by such a support method having a degree of freedom, a method of lowering it along a slide guide installed so as to surround the support member is conceivable, but the support member and the guide are rubbed. There is a risk of generating dust.

  FIG. 5 is a schematic cross-sectional view showing a parallelism adjusting mechanism provided in the lower part of the support member in order to control the parallelism of the pellicle plate support member 5 and the frame support member 2 more precisely. By providing a plurality of parallelism adjusting micrometers, precision screws, piezo elements and the like between the frame support member 2 and the support plate B14, the parallelism with the other support member 5 is provided. I can keep. This mechanism works effectively by attaching to either one of the two support members, but can also be attached to both support members to make it more effective. Further, this mechanism is a horizontal laminating machine, and can be used in combination with the function of claim 3 to obtain a higher effect.

  FIG. 6 is a schematic cross-sectional view showing a mechanism for measuring the deflection of a pellicle plate using a displacement sensor. The amount of warpage of the pellicle plate 4 can be measured by measuring the position of the pellicle plate 4 with the displacement sensor 16 through the opening 17 provided in the pellicle plate support member 5. In this case, in order to obtain the shape of the warp more precisely, it is sufficient to increase the number of pieces of position information collected, and a method of increasing the number of displacement sensors and scanning the displacement sensors in the XY directions is devised. Further, as shown in the figure, the pellicle plate support member 5 can be measured by providing an opening 17, or the frame plate support member 2 can be provided with an opening and measured from the opposite surface of the pellicle plate 4. Is also possible. On the other hand, when the opening 17 is enlarged, the shape of the support member 5 becomes a frame, so that bending due to its own weight occurs, and the accuracy may deteriorate. This can be reduced by making the support member 5 thicker or larger, but it is easier to handle by providing a plurality of openings for measurement. The displacement sensor 16 only needs to be able to measure the amount of displacement without contact, and examples thereof include a laser displacement meter and an ultrasonic displacement meter.

  FIG. 7 is a schematic cross-sectional view showing a pellicle plate warpage measuring mechanism using an optical interferometer 18 instead of the shape observation means using the displacement sensor. In addition to being able to measure using interference light from the opening 31 provided in the frame support member 2 and observing a wide range of shapes with high density in a short time, there is no need for a scanning mechanism. There is no worry that the pellicle plate is contaminated by dust. On the other hand, there is a demerit that the measuring mechanism is large and expensive. As the optical interferometer 18, a Fizeau interferometer, a Michelson interferometer, or the like can be used.

  FIG. 8 is a schematic cross-sectional view showing a bending adjustment mechanism of the pellicle plate 4 using a pressure difference. An air pressure difference between the pellicle plate 4 and the pellicle plate support member 5 is created by introducing or sucking gas through the vent hole A19 into the sealed space formed by the recess 7 of the pellicle plate support member 5. The concavo-convex shape is formed. The gas to be introduced at this time is not limited as long as it takes safety and cleanliness into consideration.

  On the other hand, FIG. 9 is a schematic cross-sectional view when the unevenness of the pellicle plate is controlled using the same mechanism from the frame side. In this case, a space formed by the three members of the frame support member 2, the frame 1, and the pellicle plate 4 may be used. However, since the frame 1 generally has a ventilation hole, it should be completely sealed. I can't. Therefore, a closed space must be created by the sealing wall 21 provided on the outer periphery of the frame. The same effect as the above-described control can be obtained by injecting or sucking gas into the closed space through the vent hole 20. Moreover, this sealing wall can also use together the spacer of the above-mentioned frame.

Moreover, said closed space is not limited to what is made only with the member of description, It can comprise in combination with another member as needed.
The unevenness control mechanism using the above-described pressure difference can be said to be a good means without the possibility of causing scratches or the like in the area where the pellicle plate is used. In addition, the inventors have found a method for controlling the unevenness of the pellicle plate at the time of attachment by utilizing the elasticity of the adhesive used when attaching the pellicle plate and the frame. This utilizes the fact that when the adhesive is in an undried state, the concavo-convex shape of the use area is changed by partially pressing the pellicle plate from the side opposite to the surface in contact with the frame. FIG. 10 is a schematic cross-sectional view of the mechanism for this purpose. The pellicle plate support member 5 is provided with a plurality of through holes 32 at the same position as the upper surface of the frame 1, and an arbitrary pressure is applied to the outer periphery of the pellicle plate by the mechanical pusher 22 through the plurality of through holes 32 to control the uneven shape in the use region It is possible. Since the positions of the through holes 32 and the suction holes for holding the pellicle are on the same line, it is necessary to provide them at regular intervals.

  FIG. 11 is a schematic cross-sectional view of a mechanism for controlling the uneven shape by blowing gas directly on the pellicle plate 4. An arbitrary shape can be obtained by blowing gas with a plurality of air pushers 23 provided on the side where the pellicle plate 4 is attached. The gas to be blown is not limited as long as safety and cleanliness are taken into consideration.

The frame support member 2, the pellicle plate support member 5, the spacer 18 for adjusting the interval / parallelism, and the sealing wall 21 used in the present apparatus are processed with high precision, and therefore the temperature change at the place where the present apparatus is installed. The accuracy also changes. For this reason, it is generally considered that a material having a small thermal expansion coefficient is desirable, but a material close to the thermal expansion coefficient of the pellicle plate 4 whose accuracy should be guaranteed, that is, a material having a temperature of 5.0 to 6.5 × 10 ⁻⁷ / ° C. It is necessary to use For this, synthetic quartz glass, which is the same material, can be used, and fused silica glass, ceramic, and alloys thereof can be used.

  Next, even if both the frame 1 and the pellicle plate 4 can be accurately overlapped with each other by the above-mentioned means, etc., they remain undried due to expansion and contraction of the adhesive over time or elasticity. When released from the pressure, the warpage of the pellicle plate 4 changes. In order to prevent this, it is desirable that the pellicle frame 1 and the pellicle plate 4 are bonded in as short a time as possible while being sandwiched between the respective support members. As an adhesive for this purpose, a UV curable resin is conceivable, but it must sufficiently reach between the pellicle frame 1 and the pellicle plate 4 in a state where the UV light necessary for curing the resin is sandwiched. Therefore, at least one part of the frame support member 2, the pellicle plate support member 5, the spacer 8 for adjusting the interval and parallelism, and the sealing wall 21 is a material that transmits 70% or more of light having a wavelength of 300 to 400 nm, Must be thick. For example, it is preferable to use polished synthetic quartz glass.

  In addition, it is desirable that the adhesive for bonding the frame 1 and the pellicle plate 4 be applied immediately before each of them is brought into close contact with each other. There are cases in which the adhesive is adsorbed on the surface to be applied and the adhesive cannot be applied uniformly. To prevent this, the coated surface is irradiated with short-wave ultraviolet rays such as ultra-high pressure mercury lamps, Xe excimer lamps, and ArF excimer lasers just before applying the adhesive, and the attached organic components are decomposed and removed. It is effective to do. For this reason, it is desirable to irradiate the frame 1 or the pellicle plate 4 to which the adhesive is applied in a state where the frame 1 or the pellicle plate 4 is placed on or adsorbed to each support member. Therefore, at least one of the frame support member 2, the pellicle plate support member 5, the spacer 8 for adjusting the interval and parallelism, and the sealing wall 21 is a material and thickness that transmits light of a wavelength of 170 to 300 nm by 30% or more. Need to be. For example, it is preferable to use polished synthetic quartz glass.

  FIG. 12 is a schematic cross-sectional view showing an ultraviolet irradiation mechanism for curing an adhesive. In this example, the ultraviolet irradiation lamp 24 for curing an adhesive disposed above the pellicle plate support member 5 is irradiated. In order to transmit light, the pellicle plate support member 5 must be the above-described transmission material. If the ultraviolet irradiation lamp is installed on the side surface of the support member, it is necessary to use a transmissive material for the spacer and the sealing wall, and in some cases, the irradiation can be performed from the frame support member 2 side.

  The ultraviolet irradiation lamp for curing the adhesive in FIG. 12 can be read as a cleaning ultraviolet irradiation lamp.

  In the drawings used to describe the above embodiments, the frame support member 2 is disposed below and the pellicle plate support member 5 is disposed above for convenience. However, even if this positional relationship is reversed, the function is impaired. There is no, but it is not limited to this. In addition, the vertical configuration in which the pellicle plate and the frame are erected and affixed is also effective except for the one using the unique suspension mechanism of the horizontal configuration in claim 3, and the present invention is not limited to this.

  Further, each invention is an invention sufficient to improve the bonding accuracy between the pellicle plate and the frame, and does not prevent the use of a single bonding machine or a plurality of combinations as a bonding machine.

  Next, embodiments of the present invention will be described with reference to the drawings. FIG. 13 is a schematic cross-sectional view showing the main part of a horizontal laminating machine used in carrying out the present invention.

  A synthetic quartz glass-made pellicle plate 4 (126 mm × 148 mm × t0.8 mm) obtained by a known method is placed on a synthetic quartz glass-made pellicle plate support member 5. The upper and lower surfaces of the pellicle plate support member 5 made of synthetic quartz glass are mirror-polished by a double-side polishing machine, and the flatness of the surface on which the pellicle plate 4 is placed is 1.2 μm in the range of 152 mm × 152 mm. there were. Further, the pellicle plate support member 5 and the support plate A13 that fixes the support member are provided with openings, and the uneven shape during bonding can be measured by the Fizeau interferometer 18 provided at the lower part of the apparatus. . At the same time, the ultraviolet light from the ultraviolet light 24 for curing the adhesive provided in the lower part of the apparatus can reach the adhesive surface sufficiently. Further, the pellicle plate 4 can be placed on the pellicle plate support member 5 by pulling the rail 28 together with the moving stage 29 holding the support member from the center of the bonding apparatus indicated by the solid line. Further, the level of the pellicle plate support member 5 can be adjusted by the pellicle plate support member adjusting screws 27 provided at four positions below the support member.

  On the other hand, a synthetic quartz glass frame 1 (126 mm × 148 mm width 2 mm height 3.2 mm) obtained by a known method is held in the synthetic quartz glass frame support member 2 by suction holes. The frame support member 2 was also mirror-polished by a double-side polisher, and the flatness in the range of 152 mm × 152 mm was 0.8 μm. The support member 2 is fixed to a support plate B14, and the support plate B14 can be inverted 180 degrees by a hinge 30 at the left end. The dotted line on the left side of the drawing shows the frame holding mechanism in the inverted state, and the frame 1 is held by the frame support member 2 in this state. The level of the frame support member 2 can be adjusted by providing frame support member adjusting screws 26 at four locations on the support plate B14 for fixing the support member. Further, a ventilation hole B20 is provided through the frame support member 2 and the support plate B14, and is composed of the frame support member 2, the plate B14, the sealing wall 21, the support plate A13, and the pellicle plate 4 by sucking air from here. The sealed space can be depressurized, and the bending due to the weight of the pellicle plate 4 can be corrected.

The procedure for actual bonding is shown below.
First, the frame is held on the frame support member 2 in the state indicated by the left dotted line, and once inverted by 180 degrees, and after light cleaning using the Xe lamp is performed for 60 seconds, it is inverted by 180 degrees and indicated by the left dotted line. After returning to the state, an ultraviolet curable resin was applied on the frame and waited.

  Next, the pellicle plate 4 is placed on the pellicle plate support member 5 on the moving stage 29 in the state indicated by the right dotted line, and the entire stage is moved to the center of the apparatus. The warp of the pellicle plate at this time had a convex shape on the lower side and was 6.2 μm. Thereafter, optical cleaning with a Xe lamp was performed for 90 seconds.

  Subsequently, the support plate B14 was inverted 180 degrees, and the frame and the pellicle plate were overlapped. When the warpage of the pellicle plate at this time was measured, it was 6.8 μm with a convex shape on the lower side. Therefore, suction was performed through the suction hole, and when the warpage was 2 μm with a concave shape, the suction was stopped, and the sealed state It was. Further, in this state, ultraviolet rays for curing were irradiated for 30 seconds to cure the adhesive.

  Thereafter, the suction hole was opened, and the warpage of the pellicle plate was measured. As a result, a good pellicle having a convex shape of 2 μm could be obtained.

  In this embodiment, as a method of moving the support plates A and B, reversal using a hinge or horizontal movement using a rail is used. However, these are not limited to the contents described, but satisfy a predetermined purpose. Any method is acceptable.

The cross-sectional schematic diagram which shows the principal part of a bonding machine. The cross-sectional schematic diagram which shows the spacer for making the space | interval and parallelism of a supporting member constant. The cross-sectional schematic diagram which shows the space | interval and parallelism adjustment mechanism of a supporting member. The cross-sectional schematic diagram which shows the suspension mechanism of a supporting member. The cross-sectional schematic diagram which shows the parallelism adjustment mechanism provided in the support member lower part. The cross-sectional schematic diagram which shows the measurement mechanism of the curvature of the pellicle board using a displacement sensor. The cross-sectional schematic diagram which shows the measurement mechanism of the curvature of the pellicle board using an optical interferometer. Sectional model (1) which shows the curvature adjustment mechanism of the pellicle board using a pressure difference. Sectional model (2) which shows the curvature adjustment mechanism of the pellicle board using an atmospheric pressure difference. The cross-sectional schematic diagram which shows the curvature adjustment mechanism of a mechanical pellicle board. The cross-sectional schematic diagram which shows the curvature adjustment mechanism of the pellicle board using the injection pressure of gas. The cross-sectional schematic diagram which shows the ultraviolet irradiation mechanism for adhesive agent hardening. The cross-sectional schematic diagram which shows the bonding machine main part of a horizontal form.

Explanation of symbols

1: frame, 2: frame support member, 3: suction hole for frame fixing,
4: Pellicle plate, 5: Pellicle plate support member,
6: Pellicle plate fixing suction hole, 7: Pellicle plate support member recess,
8: Spacer, 9: Micrometer, 10: Hanging housing
11: Cylinder, 12: Universal joint,
13: support plate A, 14: support plate B, 15: parallelism adjusting means,
16: displacement sensor, 17: aperture, 18: optical interferometer,
19: Vent hole A, 20: Vent hole B, 21: Sealed wall,
22: mechanical pusher, 23: air pusher,
24: UV irradiation lamp for curing the adhesive, 25: UV irradiation lamp for cleaning,
26: frame support member adjustment screw, 27: pellicle plate support member adjustment screw, 28: rail, 29: moving stage, 30: hinge, 31: opening,
32: Through hole.

Claims (12)

A frame having a constant thickness;
A laminating apparatus used for producing a pellicle with a frame made of a synthetic quartz glass pellicle plate fixed to one surface thereof,
Between the support member for fixing the frame and the support member for fixing the pellicle plate, a spacer for the purpose of making the interval and parallelism of both support members constant,
Alternatively, a frame and pellicle plate bonding apparatus characterized in that a mechanism for adjusting the distance and parallelism is provided by a micrometer, a precision screw, a piezoelectric element, or the like. A frame having a constant thickness;
A laminating device used for the production of a pellicle with a frame consisting of a pellicle plate made of synthetic quartz glass fixed to one surface thereof,
A surface of the support member that fixes the frame in contact with the frame;
2. The frame and pellicle plate bonding apparatus according to claim 1, wherein the flatness of a surface of the support member that fixes the pellicle plate and that contacts the pellicle plate is 2 μm or less. A frame having a constant thickness;
Used to produce a pellicle with a frame consisting of a synthetic quartz glass pellicle plate fixed on one side,
Either one of the support member that fixes the frame or the support member that fixes the pellicle plate is suspended from the support housing provided above the support member.
A laminating device having a function of lowering to the other member to be bonded with a cylinder or the like,
An apparatus for laminating a frame and a pellicle plate, wherein a universal joint mechanism having a degree of freedom, such as a universal joint, is used at a portion connecting a distal end of a movable part such as a cylinder and a support member. A frame having a constant thickness;
A laminating apparatus used for producing a pellicle with a frame made of a synthetic quartz glass pellicle plate fixed to one surface thereof,
A support member for fixing the frame;
And using a micrometer, a precision screw, a piezo element, etc. for at least one of the support members for fixing the pellicle plate,
An apparatus for bonding a frame and a pellicle plate, which has a function of adjusting the parallelism between the other support member. A frame having a constant thickness;
A laminating apparatus used for producing a pellicle with a frame made of a synthetic quartz glass pellicle plate fixed to one surface thereof,
An opening is provided in at least one of the support member for fixing the frame and the support member for fixing the pellicle plate,
A non-contact displacement sensor for measuring the distance to the pellicle plate or an optical interferometer for measuring the shape is attached to the opening side,
An apparatus for bonding a pellicle plate and a frame that enables the warpage of the pellicle plate before bonding and the warpage of the pellicle plate after bonding to be measured on the same apparatus. A frame having a constant thickness;
A laminating apparatus used for producing a pellicle with a frame made of a synthetic quartz glass pellicle plate fixed to one surface thereof,
A space composed of a pellicle plate and its support member,
Alternatively, a pellicle plate and frame and a frame support member,
Alternatively, by providing a pressure difference between the outer space and at least one of the space formed by the frame-shaped sealing wall and the frame support member installed on the outer periphery of the pellicle plate and the frame,
Frame and pellicle plate bonding device equipped with a mechanism for bonding while controlling warpage of the pellicle plate. By pressing one or more points or surfaces against the upper surface of the pellicle plate with a terminal or the like from the opening provided in the pellicle plate support member,
The frame and pellicle plate bonding apparatus according to claim 6, wherein a mechanism for bonding the pellicle plate while controlling warpage of the pellicle plate is mounted. By the gas injection port provided in the support member of the pellicle plate or the support member of the frame,
The frame according to claim 6, wherein a mechanism for adhering while controlling warpage of the pellicle plate by applying pressure having an arbitrary distribution to the pellicle plate at one or more points or surfaces is mounted. Alignment device. A material having a coefficient of thermal expansion of 5.0 to 6.5 × 10 ⁻⁷ / ° C. in at least one of a frame support member, a pellicle plate support member, a spacer for maintaining spacing and parallelism, and a frame-shaped sealing wall The apparatus for bonding a frame and a pellicle plate according to any one of claims 1 to 8, wherein: By using a material that transmits 70% or more of light having a wavelength of 300 to 400 nm for at least one of a frame support member, a pellicle plate support member, a spacer for maintaining spacing and parallelism, and a frame-shaped sealing wall,
The apparatus for bonding a frame and a pellicle plate according to any one of claims 1 to 9, wherein the light source light for ultraviolet curing can be irradiated in a state where the frame and the pellicle plate are sandwiched between respective support members. By using at least one of a frame support member, a pellicle plate support member, a spacer for maintaining spacing and parallelism, and a frame-shaped sealed wall, a material that transmits light having a wavelength of 170 to 300 nm for 30% or more. ,
The apparatus for bonding a frame and a pellicle plate according to any one of claims 1 to 10, wherein the light source light for light cleaning can be irradiated in a state where the frame and the pellicle plate are held or placed on each support member. A pellicle obtained by using the apparatus for bonding a frame and a pellicle plate according to any one of claims 1 to 11.

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