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JP2003242732A - Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working - Google Patents

Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working

Info

Publication number
JP2003242732A
JP2003242732A JP2002034882A JP2002034882A JP2003242732A JP 2003242732 A JP2003242732 A JP 2003242732A JP 2002034882 A JP2002034882 A JP 2002034882A JP 2002034882 A JP2002034882 A JP 2002034882A JP 2003242732 A JP2003242732 A JP 2003242732A
Authority
JP
Japan
Prior art keywords
load beam
hard disk
layer
metal layer
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002034882A
Other languages
Japanese (ja)
Inventor
Katsuya Tsuruta
克也 鶴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUCHIGAMI MICRO KK
Fuchigami Micro Co Ltd
Original Assignee
FUCHIGAMI MICRO KK
Fuchigami Micro Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUCHIGAMI MICRO KK, Fuchigami Micro Co Ltd filed Critical FUCHIGAMI MICRO KK
Priority to JP2002034882A priority Critical patent/JP2003242732A/en
Publication of JP2003242732A publication Critical patent/JP2003242732A/en
Pending legal-status Critical Current

Links

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  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
  • Supporting Of Heads In Record-Carrier Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a production method of a load beam with an insulation layer for a hard disk which enables high-precision and low-cost working so as to correspond to the higher precision of the hard disk. <P>SOLUTION: The production method is a method for producing the load beam for the hard disk by using a laminate of three layer constitution in which a metal layer 1 is laminated on the metal layer 3 exhibiting a spring characteristic via an electric insulation layer 2. Therein, the metal layer is efficiently subjected to etching working in a short time and, thereby, the production method of the load beam with the high-precision insulation layer is established. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明が属する技術分野】本発明は、ハードディスク用
ロードビームの製造方法。特に、板厚の異なる金属材料
層の間に絶縁層を含んだハードディスク用ロードビーム
の製造方法に関する。
TECHNICAL FIELD The present invention relates to a method of manufacturing a load beam for a hard disk. In particular, the present invention relates to a method of manufacturing a load beam for a hard disk including an insulating layer between metal material layers having different plate thicknesses.

【0002】[0002]

【従来の技術】従来のハードディスク用ロードビーム
は、機械的に磁気ヘッドを支える機能が必要な為ステン
レス材単独で製造されてきた。しかし、ハードディスク
の面記録密度が飛躍的に高くなった現在では、サスペン
ションの浮上量を低くすることが求められ、ロードビー
ムはダンピング特性を要求されている。そこで、従来ス
テンレス材単独で用いられていたロードビームを、ステ
ンレス材/絶縁層/ステンレス材の複合材料で製造する
ことでダンピング特性の向上技術が提案されている。図
2は、そのような絶縁層を含むロードビームの例を示す
図である。図3は、この構成のロードビームの製造方法
を示す。請求項2で示される絶縁層を含んだ厚みの異な
る複合材の金属層を加工する場合、絶縁層がある為に、
2種類の金属層をぞれぞれの金属層毎に加工する。すな
わち、2回の金属層の加工が必要な製造方法である。
2. Description of the Related Art A conventional load beam for a hard disk has been manufactured solely from a stainless steel material because it is required to mechanically support a magnetic head. However, at the present time when the areal recording density of hard disks has dramatically increased, it is required to reduce the suspension flying height, and the load beam is required to have damping characteristics. Therefore, there has been proposed a technique for improving damping characteristics by manufacturing a load beam, which has been conventionally used only with a stainless material, with a composite material of stainless material / insulating layer / stainless material. FIG. 2 is a diagram showing an example of a load beam including such an insulating layer. FIG. 3 shows a method of manufacturing the load beam having this configuration. When processing the metal layer of the composite material having different thicknesses including the insulating layer shown in claim 2, since the insulating layer is present,
Two types of metal layers are processed for each metal layer. That is, this is a manufacturing method that requires the metal layer to be processed twice.

【0003】[0003]

【発明が解決しようとする課題】ハードディスクの面記
録密度が飛躍的に高くなった現在に対応すべく、精度の
高いロードビームを製造することが要求されている。そ
こで、本発明は金属層/絶縁層/金属層の複合材料から
なるロードビームの製造において、双方の金属層の加工
技術の研究を行い、高精度の絶縁層付きロードビームを
製造する方法である。
In order to cope with the present day when the areal recording density of hard disks has dramatically increased, it is required to manufacture a load beam with high accuracy. Therefore, the present invention is a method of manufacturing a load beam made of a composite material of a metal layer / insulating layer / metal layer, by researching processing techniques of both metal layers, and manufacturing a load beam with an insulating layer with high precision. .

【0004】[0004]

【課題を解決するための手段】本発明者は、上記の課題
を解決するために検討した結果、以下に述べる発明を完
成するに至った。すなわち、本発明は、絶縁層付きロー
ドビームを効率良く製造するために、双方の金属層を同
時にエッチング加工するという新しい概念を導入し、絶
縁層付きロードビームの製造方法を確立したものであ
る。
The present inventor has completed the invention described below as a result of studies to solve the above problems. That is, the present invention introduces a new concept of simultaneously etching both metal layers in order to efficiently manufacture a load beam with an insulating layer, and establishes a method for manufacturing a load beam with an insulating layer.

【0005】請求項1の発明は、高精度のハードディス
クの要求に対応すべく、金属層/絶縁層/金属層からな
るハードディスク用ロードビームの絶縁層を高精度に加
工できることを特徴とするロードビームの製造方法であ
る。この製造方法であれば、高精度のロードビームを製
造することができる。
According to a first aspect of the present invention, in order to meet the demand for a high precision hard disk, the insulating layer of the hard disk load beam consisting of metal layer / insulating layer / metal layer can be processed with high precision. Is a manufacturing method. With this manufacturing method, a highly accurate load beam can be manufactured.

【0006】請求項2の発明は、請求項1および請求項
2記載のハードディスク用絶縁層付きロードビームの製
造方法において、金属材料層の支持体部の厚みが、他方
の金属材料層より厚い材料を使用することを特徴とする
ハードディスク用ロードビームの製造方法。この製造方
法であれば、絶縁層付きロードビームを効率的に製造で
きる。
According to a second aspect of the present invention, in the method of manufacturing the load beam with an insulating layer for a hard disk according to the first and second aspects, a material in which the support portion of the metal material layer is thicker than the other metal material layer. A method of manufacturing a load beam for a hard disk, characterized by using. With this manufacturing method, the load beam with an insulating layer can be efficiently manufactured.

【0007】[0007]

【発明の実施の形態】図3はハードディスク用のロード
ビームを製造する手順を示す工程図であり、以下その工
程を順を追って説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 3 is a process chart showing a procedure for manufacturing a load beam for a hard disk, and the process will be described below step by step.

【0008】図3(a)は、ハードディスク用のロード
ビームを形成するための積層体を示すものである。この
積層体は、バネ特性を発現させる金属層3としてのステ
ンレスの上に、絶縁層2を介して金属層1であるステン
レスを熱圧着にて積層したものである。ここで用いる絶
縁層2は、ポリイミド系樹脂、エポキシ系樹脂、あるい
はアクリル系樹脂であり、ポリイミドの場合、ポリイミ
ド層はコア絶縁層とその両面に積層された接着剤層とか
らなる。金属層1あるいは3と絶縁層2との密着強度
は、少なくとも500g/cm以上であり、また、金属
層1と絶縁層2の密着強度と、金属層3と絶縁層2との
密着強度は、±20%の誤差以内で均一な密着強度が必
要である。
FIG. 3 (a) shows a laminated body for forming a load beam for a hard disk. In this laminated body, stainless steel which is the metal layer 1 is laminated by thermocompression bonding on the stainless steel which is the metal layer 3 which exhibits spring characteristics, with the insulating layer 2 interposed therebetween. The insulating layer 2 used here is a polyimide resin, an epoxy resin, or an acrylic resin. In the case of polyimide, the polyimide layer is composed of a core insulating layer and an adhesive layer laminated on both surfaces thereof. The adhesion strength between the metal layer 1 or 3 and the insulating layer 2 is at least 500 g / cm or more, and the adhesion strength between the metal layer 1 and the insulating layer 2 and the adhesion strength between the metal layer 3 and the insulating layer 2 are Uniform adhesion strength is required within an error of ± 20%.

【0009】図3(b)は、金属層1上と金属層3上の
両面に感光性材料であるカゼイン等の液状レジスト4を
塗布した状態を示す。レジストは、ドライフィルムレジ
ストを使用しても良い。
FIG. 3B shows a state in which a liquid resist 4 such as casein which is a photosensitive material is applied on both surfaces of the metal layer 1 and the metal layer 3. A dry film resist may be used as the resist.

【0010】図3(c)は、マスクを介して紫外線露光
6を照射をする事により、液状レジスト4へパターニン
グしている状態を示す。
FIG. 3C shows a state in which the liquid resist 4 is patterned by irradiating the ultraviolet exposure 6 through a mask.

【0011】図3(d)は、マスク5を介してパターン
ニングした後の、未露光部のレジストを溶解した状態を
示す。
FIG. 3D shows a state in which the resist in the unexposed portion is dissolved after patterning through the mask 5.

【0012】図3(e)は、パターニングしたレジスト
4を介して、金属層1と金属層3をエッチングした状態
を示す。この場合、一般的な塩化第二鉄液からなるエッ
チング液を使用し、金属層1と金属層3とを同時にエッ
チングする。
FIG. 3E shows a state in which the metal layer 1 and the metal layer 3 are etched through the patterned resist 4. In this case, the metal layer 1 and the metal layer 3 are etched at the same time by using an etching solution composed of a general ferric chloride solution.

【0013】図3(f)は、金属層1と金属層3をエッ
チングした後で、水酸化ナトリウムからなる剥離液でレ
ジスト4を剥離した状態を示す。これにより、図示のよ
うに、絶縁層2の両面に金属層1と金属層3がパターニ
ングされた3層の積層体が得られる。
FIG. 3 (f) shows a state in which the resist 4 is stripped by a stripping solution made of sodium hydroxide after the metal layer 1 and the metal layer 3 are etched. As a result, as shown in the drawing, a three-layer laminate in which the metal layer 1 and the metal layer 3 are patterned on both surfaces of the insulating layer 2 is obtained.

【0014】以上説明したように、図3に示す手順によ
り、ハードディスク用絶縁層付きロードビームの金属層
の製造が完了する。
As described above, the production of the metal layer of the load beam with an insulating layer for a hard disk is completed by the procedure shown in FIG.

【0016】[0016]

【実施例】コア絶縁層として厚さ12.5ミクロンのポ
リイミドフィルムを使用し、接着剤層としてポリイミド
ワニスを乾燥後の膜厚が2.0±0.3ミクロンになるよ
うに両面に成膜して接着剤付きフィルムの絶縁層とし
た。そして、この接着剤層付きフィルムを、厚み30ミ
クロンのステンレスと厚み64ミクロンのステンレスに
挟み、真空熱プレスして、金属層/絶縁層/金属層の積
層体を形成した。ここで、形成した積層体のステンレス
とポリイミドとの密着強度を、IPC2.4.9の密着強
度測定方法に則り測定した。測定結果は、30ミクロン
−ステンレスとポリイミドとの密着強度は1.8Kg/c
m、64ミクロン−ステンレスとポリイミドとの密着強
度は1.6Kg/cmであった。上記の積層体に対し、
30ミクロン、64ミクロンのステンレス両面にアクリル
系のドライフィルムレジストをラミネートした後、両方
のドライフィルムレジストをそれぞれ所定のフォトマス
クパターンに従って露光・現像してパターニングした。
露光は、露光量40〜70mJ/cmで行い、現像は
30℃、1wt%NaCOでスプレー現像した。次
いで、塩化第二鉄液を使用して両面のステンレスを同時
にエッチングした。これにより、ポリイミドフィルムの
両面にステンレスがパターニングされた3層の積層体が
得られた。
[Example] A polyimide film having a thickness of 12.5 μm was used as a core insulating layer, and a polyimide varnish was used as an adhesive layer so that the film thickness after drying was 2.0 ± 0.3 μm. Then, it was used as an insulating layer of a film with an adhesive. Then, this film with an adhesive layer was sandwiched between stainless steel having a thickness of 30 μm and stainless steel having a thickness of 64 μm and vacuum hot pressed to form a metal layer / insulating layer / metal layer laminate. Here, the adhesion strength between the stainless steel and the polyimide of the formed laminate was measured in accordance with the adhesion strength measurement method of IPC 2.4.9. The measurement result shows that the adhesion strength between 30 micron-stainless steel and polyimide is 1.8 kg / c.
m, 64 micron-The adhesion strength between stainless steel and polyimide was 1.6 Kg / cm. For the above laminate,
Acrylic dry film resists were laminated on both sides of 30-micron and 64-micron stainless steel, and then both dry film resists were exposed and developed according to predetermined photomask patterns, and patterned.
The exposure was carried out at an exposure dose of 40 to 70 mJ / cm 2 , and the development was carried out by spray development at 30 ° C. and 1 wt% Na 2 CO 3 . Next, the stainless steel on both sides was simultaneously etched using a ferric chloride solution. As a result, a three-layer laminate in which stainless steel was patterned on both surfaces of the polyimide film was obtained.

【0019】[0019]

【発明の効果】以上説明したように、本発明によれば、
異なる板厚を同時にエッチングすることにより、エッチ
ング時間の短縮につながり、製造の低コスト化を図るこ
とがでる。その結果、低コストで、高精度な加工ができ
るハードディスク用絶縁層付きロードビームの製造方法
が可能となった。
As described above, according to the present invention,
By etching different plate thicknesses at the same time, the etching time can be shortened and the manufacturing cost can be reduced. As a result, a low-cost manufacturing method of a load beam with an insulating layer for a hard disk, which enables highly accurate processing, has become possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に使用する積層体の断面図である。FIG. 1 is a cross-sectional view of a laminate used in the present invention.

【図2】本発明で製造されるハードディスク用絶縁層付
きロードビームの製造終了品の図である。(A)は斜面
図である。(B)は図2(A)のA−A‘線における断
面図である。
FIG. 2 is a diagram of a finished product of the load beam with an insulating layer for a hard disk manufactured according to the present invention. (A) is a perspective view. 2B is a sectional view taken along the line AA ′ of FIG.

【図3】ハードディスク用絶縁層付きロードビームの製
造手順の一例を示す工程図である。
FIG. 3 is a process drawing showing an example of a manufacturing procedure of a load beam with an insulating layer for a hard disk.

【符号の説明】[Explanation of symbols]

1 金属層 2 絶縁層 3 金属層 4 レジスト 5 ガラスマスク 6 紫外線露光 1 metal layer 2 insulating layers 3 metal layers 4 resist 5 glass mask 6 UV exposure

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 バネ特性を発現させる金属材料層、絶縁
層、金属材料層からなる3層の材料が順に積層されたサ
スペンション用材料を加工してハードディスク用ロード
ビームを製造する方法において、絶縁層を高精度に加工
できることを特徴とするハードディスク用絶縁層付きロ
ードビームの製造方法。
1. A method of manufacturing a load beam for a hard disk by processing a suspension material in which three layers of materials, which exhibit spring characteristics, a metal material layer, an insulating layer, and a metal material layer are laminated in this order. A method for manufacturing a load beam with an insulating layer for a hard disk, which is characterized in that it can be processed with high precision.
【請求項2】 図1−1、3に示す金属材料層の支持体
部の厚みが異なる金属材料を、同時にエッチング加工出
来ることを特徴とするハードディスク用ロードビームの
製造方法。
2. A method of manufacturing a load beam for a hard disk, wherein the metal materials shown in FIGS. 1-1 and 3 having different thicknesses of the support portion of the metal material layer can be simultaneously etched.
JP2002034882A 2002-02-13 2002-02-13 Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working Pending JP2003242732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002034882A JP2003242732A (en) 2002-02-13 2002-02-13 Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002034882A JP2003242732A (en) 2002-02-13 2002-02-13 Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working

Publications (1)

Publication Number Publication Date
JP2003242732A true JP2003242732A (en) 2003-08-29

Family

ID=27777230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002034882A Pending JP2003242732A (en) 2002-02-13 2002-02-13 Production method of load beam with insulation layer between plates of different thickness by means of simultaneous working

Country Status (1)

Country Link
JP (1) JP2003242732A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005061974A1 (en) * 2003-12-19 2005-07-07 Hoshizaki Denki Kabushiki Kaisha Automatic ice maker
CN100416190C (en) * 2003-12-19 2008-09-03 星崎电机株式会社 Automatic ice maker

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005061974A1 (en) * 2003-12-19 2005-07-07 Hoshizaki Denki Kabushiki Kaisha Automatic ice maker
EP1696190A1 (en) * 2003-12-19 2006-08-30 Hoshizaki Denki Kabushiki Kaisha Automatic ice maker
EP1696190A4 (en) * 2003-12-19 2006-12-06 Hoshizaki Electric Co Ltd Automatic ice maker
CN100416190C (en) * 2003-12-19 2008-09-03 星崎电机株式会社 Automatic ice maker
US7444829B2 (en) 2003-12-19 2008-11-04 Hoshizaki Denki Kabushiki Kaisha Automatic ice making machine

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