JP2003122023A - Alkali developing liquid for photosensitive lithographic printing plate and method for making lithographic printing plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an alkali developing liquid which can stably be used for development to produce a clear image with high sharpness for a long time and to provide a method for making a lithographic printing plate. SOLUTION: The alkali developing liquid for a photosensitive lithographic printing plate is characterized in containing a compound expressed by general formula (I). In formula (I), at least two of R1 , R2 , R3 are not hydrogen atoms, each of A and B represents either -CH2 CH2 O- or -CH2 CH(CH3 )O-, each of n and m represents 0 or an integer from 1 to 30 but both of m and n are not 0 at a time. The method for making a lithographic printing plate is characterized in exposing an IR photosensitive lithographic printing plate having an image forming layer containing an IR absorbing dye to IR rays and then developing the layer with the above alkali developing liquid.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing solution for a photosensitive lithographic printing plate, and more particularly to a so-called direct plate-making lithographic printing plate precursor capable of direct plate making by infrared laser scanning based on a digital signal from a computer or the like. The present invention relates to a development processing solution suitable for alkali development. The present invention further relates to a method of making a lithographic printing plate using the development processing solution.

[0002]

2. Description of the Related Art In recent years, the development of lasers has been remarkable, and in particular, solid-state lasers and semiconductor lasers having a near-infrared to infrared emission region are easily available with high output and small size. These lasers are very useful as an exposure light source for a system for making a plate directly from digital data. As an image recording material suitable for laser writing, for example, JP-A-7-285275 discloses a binder such as cresol resin, a substance that absorbs light to generate heat, and a thermally decomposable substance such as quinonediazide. In addition, a positive type image recording material containing a compound capable of substantially decreasing the solubility of the binder in a state before decomposition has been proposed. This is a substance (heat mode type) in which a substance that absorbs the above-mentioned light and generates heat in the exposed portion by the irradiation of infrared rays generates heat to make the exposed portion alkali-soluble (heat mode type), but is absorbed by the aluminum support. Therefore, the thermal efficiency is low, and the solubility in the alkaline developing solution in the developing step is not satisfactory. Therefore, the alkali concentration of the developer has been increased to ensure the solubility of the exposed portion.

However, the hide mode type lithographic printing plate precursor has a low resistance to dissolution in an alkali developing treatment solution in the image area under the above-mentioned high-concentration alkaline conditions, and only slightly scratches the surface of the image recording material. However, there is a problem in that it is melted by the above process and a defect occurs in the image area. In particular, the tendency was more remarkable in the positive type lithographic printing plate precursor using a polymer compound having high solubility in an alkaline aqueous solution. Therefore, there is a limit to increase the alkali concentration of the alkali developer so that a residual film is not formed in the non-image area.

Further, with the recent improvement of infrared laser exposure type image recording materials, infrared absorbing dyes such as cyanine dyes, which are less soluble in an alkaline developing solution than conventional infrared absorbing dyes, are used. Prone to
When this image recording material is developed with an alkali developing solution, insoluble matter of the infrared absorbing dye tends to be discharged into the developing solution. In addition, further insoluble matter is formed by the interaction with the binder polymer components and inorganic substances in water, and these insoluble matter adheres to the plate and interferes with the image or precipitates in the development bath. It causes precipitation, which causes a burden on the maintenance of the processing bath.
Under such circumstances, if the burning process is performed with the residual film remaining on the non-image area, the residual film may be carbonized to cause stains during printing. Therefore, avoiding the inconvenience caused by the insoluble matter due to the photosensitive layer component, without forming a defect in the formed image portion, to form a highly sharp and clear image,
Especially in fine images including dots and fine lines,
Higher sharpness and improved reproducibility are required.

[0005]

SUMMARY OF THE INVENTION The object of the present invention is to prevent development debris from adhering to a plate, precipitation or precipitation in a development bath due to components contained in an image forming layer in the plate making process, An object of the present invention is to provide an alkaline developing treatment liquid which can be stably developed for a long period of time and which can obtain a high sharp and clear image, and a plate making method of a lithographic printing plate.

[0006]

The inventors of the present invention have conducted extensive studies to achieve the above-mentioned object, and as a result, by incorporating a specific compound into a development processing solution, the development derived from the components of the image forming layer is developed. The inventors have found that the dispersibility of dust is excellent, stable development processing can be performed even during long-term running, and development detergency for the image area can be exhibited well, and the present invention has been completed. It has been conventionally known that the performance of a surfactant is greatly different depending on whether the hydrophobic group is a linear type or a branched type. More specifically, the present invention has been completed by finding that a nonionic surfactant having a branched hydrophobic group improves the dispersion state of a novolac binder as compared with a linear type. Therefore, the present invention is an alkaline developing treatment solution for a photosensitive lithographic printing plate, which contains a compound represented by the following general formula (I). (In the formula, R ₁ , R ₂ and R ₃ are each independently a hydrogen atom, an alkyl group having 1 to 24 carbon atoms, an aryl group, an alkenyl group, an alkynyl group, an aralkyl group, an alkoxy group, an alkenyloxy group, an aryl group. Represents an oxy group or an aralkyloxy group, provided that at least two of R ₁ , R ₂ and R ₃ are not hydrogen atoms, and A and B are each —CH.
₂ CH ₂ O- or -CH ₂ CH (CH ₃₎ O- represents any, m represents an integer of 0 or 1 to 30, n is 0 or 1
Represents an integer of ˜30, but m and n are never 0. The present invention is also a method of making a lithographic printing plate, which comprises subjecting an infrared-sensitive lithographic printing plate having an image-forming layer containing an infrared-absorbing dye to infrared irradiation and then performing development processing with the above alkali developing solution. A preferred embodiment of the plate-making method of the present invention is an embodiment in which a positive type infrared-sensitive lithographic printing plate is processed as described above.

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION The alkaline developing solution of the present invention will be described. The alkaline developing treatment liquid used for the developing treatment (hereinafter, also simply referred to as “developing liquid”) is an alkaline aqueous solution and can be appropriately selected from conventionally known alkaline aqueous solutions. Examples of the alkaline aqueous solution include a developing solution containing an alkali silicate or non-reducing sugar and a base, and a solution having a pH of 12.5 to 14.0 is particularly preferable. The alkali silicate shows alkalinity when dissolved in water, and examples thereof include alkali metal silicates such as sodium silicate, potassium silicate, and lithium silicate, and ammonium silicate. The alkali silicate may be used alone or in combination of two or more.

The above alkaline aqueous solution is developed by adjusting the mixing ratio and concentration of silicon oxide SiO ₂ which is a silicate component and alkali oxide M ₂ O (M represents an alkali metal or ammonium group). The sex can be adjusted easily. Among the alkaline aqueous solutions, the mixing ratio of the silicon oxide SiO ₂ and the alkali oxide M ₂ O (Si
The O ₂ / M ₂ O: molar ratio) is preferably 0.5 to 3.0, more preferably 0.75 to 1.5. Said Si
When O ₂ / M ₂ O is less than 0.5, the alkali strength is increased, which may cause an adverse effect of etching a general-purpose aluminum plate or the like as a support for the lithographic printing plate precursor. If it exceeds 3.0, the developability may decrease.

The concentration of the alkali silicate in the developer is 1 to 10% by mass with respect to the mass of the alkaline aqueous solution.
Is preferable, 3-8 mass% is more preferable, 4-7 mass% is the most preferable. If this concentration is less than 1% by mass, developability and processing ability may be deteriorated, and if it exceeds 10% by mass, precipitates and crystals are likely to be formed, and further gelation is likely to occur during neutralization during waste liquid. , It may interfere with waste liquid treatment.

In the developer containing a non-reducing sugar and a base, the non-reducing sugar means a saccharide having no reducing property because it does not have a free aldehyde group or a ketone group, and trehalose in which reducing groups are bonded to each other. Type oligosaccharides, glycosides in which reducing groups of sugars are bound to non-saccharides, and sugar alcohols obtained by hydrogenating sugars to reduce them. In the present invention, any of these can be preferably used. Examples of trehalose-type oligosaccharides include saccharose and trehalose,
Examples of the glycoside include alkyl glycosides, phenol glycosides, mustard oil glycosides, and the like. Examples of sugar alcohols include D, L-arabit, rebit,
Examples thereof include xylit, D, L-sorbit, D, L-mannite, D, L-idit, D, L-talit, zuricit, and alodulcit. Furthermore, maltitol obtained by hydrogenation of a disaccharide, a reduced form (reduced starch syrup) obtained by hydrogenation of an oligosaccharide, and the like can be preferably mentioned.

Among the above, sugar alcohols and saccharoses are preferable as the non-reducing sugars, and among them, D-sorbit, saccharose and reduced starch syrup are more preferable because they have a buffering action in an appropriate pH range. These non-reducing sugars may be used alone or in combination of two or more, and their proportion in the developing solution is preferably 0.1 to 30% by mass, 1
-20 mass% is more preferred.

The alkali silicate or non-reducing sugar can be combined with an alkali agent as a base by appropriately selecting it from conventionally known substances. Examples of the alkaline agent include sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate,
Triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, sodium carbonate, potassium carbonate, ammonium carbonate, sodium hydrogen carbonate,
Examples thereof include inorganic alkali agents such as potassium hydrogen carbonate, ammonium hydrogen carbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, tripotassium citrate, sodium citrate, and the like.

Further, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanol. Organic alkali agents such as amine, ethyleneimine, ethylenediamine and pyridine can also be preferably mentioned. These alkaline agents may be used alone or in combination of two or more. Of these, sodium hydroxide and potassium hydroxide are preferable. The reason is that the pH can be adjusted in a wide pH range by adjusting the addition amount to the non-reducing sugar.
Further, trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable because they have a buffering effect.

The developer of the present invention contains the above-mentioned alkali.
The aqueous solution contains a compound represented by the following general formula (I)
It is characterized by (In the formula, R₁, R₂And R₃Are hydrogen atom and carbon atom respectively
Alkyl group, aryl group, alkenyl having 1 to 24 children
Group, alkynyl group, aralkyl group, alkoxy group, ari
Ruoxy group, aryloxy group or aralkyloxy group
, Where R₁, R₂And R₃At least two of them are water
A and B are not elementary atoms, and each is -CH ₂CH₂O-
Or -CH₂CH (CH₃) Represents one of O-, and m is
Represents an integer of 0 or 1 to 30, and n is an integer of 0 or 1 to 30.
Represents a number, but m and n are never 0. ) In the above formula, R₁, R₂And R₃Two or three of which are shown
The groups other than the hydrogen atom may be the same or different.
The groups are preferably alkyl having 3 to 24 carbon atoms.
Group, aryl group, alkenyl group, alkynyl group, aral
Kill group, alkoxy group, alkenyloxy group, aryl
It represents an oxy group or an aralkyloxy group. R₁, R₂as well as
R₃Is a group other than a hydrogen atom, the group may be straight-chain.
It may be branched. Aryl groups include phenyl and naphth
Examples include chill group and anthryl group. The aryl group is
May have a substituent on the aromatic ring of
As a substituent, there is an alkyl group having 1 to 24 carbon atoms.
In the above formula, m and n are polyoxypropylene chains or
Represents the number of repeating units of xyethylene chain,
If there is a ethylene part and a polyoxypropylene part,
It may be a block copolymer or a block copolymer. m is preferably 0
To 20, more preferably 0 to 10, and n is preferably
Is 0 to 20, more preferably 0 to 10.

These compounds are commercially available, and commercially available products include, for example, Pionine D-1120S (manufactured by Takemoto Yushi Co., Ltd.). The molecular weight of the compound represented by the formula (I) is preferably 50 to 10,000.
0-5000 are more preferable, and 500-3500 are the most preferable. If the molecular weight is less than 50, it may not be possible to obtain a dissolution inhibiting effect on the image area.
If it exceeds 0000, the developability of the non-image area may decrease.

In the alkaline developing solution of the present invention, the compound represented by the above formula (I) may be used alone or in combination of two or more kinds. The content of the compound represented by the above formula (I) in the alkaline developing treatment solution of the present invention is 0.
001 to 10.0 mass% is suitable, and preferably 0.
01 to 5.0% by mass, more preferably 0.1 to 5.0% by mass.
It is 1.0 mass%.

As described above, the alkaline developing treatment solution of the present invention uses a developing solution containing an alkali silicate or non-reducing sugar and a base.
i ⁺ , Na ⁺ , K ⁺ , and NH ₄ ⁺ are used. Among them, in a system containing a large number of cations having a small ionic radius, the penetrability into the image forming layer is high and the developability is excellent, but the image area is also dissolved. Cause image defects. Therefore, there is a certain limit to increase the alkali concentration, and in order to completely process the image forming layer (residual film) in the non-image area without causing a defect in the image area, it is a delicate matter. It was required to set various liquid conditions. However, as the cation component,
By using a cation with a large ionic radius,
The permeability of the developing solution into the image forming layer can be suppressed, and the dissolution inhibiting effect of the image area can be improved without lowering the alkali concentration, that is, the developability. As the cation component, other cations can be used in addition to the above-mentioned alkali metal cations and ammonium ions.

A surfactant can be further added to the alkaline developing treatment liquid of the present invention. Examples of the surfactant include nonionic surfactants, anionic surfactants, cationic surfactants and amphoteric surfactants. Nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, glycerin fatty acid partial esters, sorbitan fatty acid moieties. Esters, pentaerythritol fatty acid partial esters, propylene glycol monofatty acid esters,

Sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, polyglycerin fatty acid partial esters, polyoxyethylenated castor oils,
Polyoxyethylene glycerin fatty acid partial esters,
Suitable examples include fatty acid diethanolamides, N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, and trialkylamine oxides.

Examples of the anionic surfactant include fatty acid salts, abietic acid salts, hydroxyalkanesulfonic acid salts, alkanesulfonic acid salts, dialkylsulfosuccinic acid ester salts, α-olefinsulfonic acid salts, linear alkylbenzenesulfonic acid salts, and branched salts. Chain alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl-N-oleyl taurine sodium salt, N-alkyl sulfosuccinic acid monoamide Sodium salt, petroleum sulfonates, sulfated tallow oil,
Sulfate ester salts of fatty acid alkyl esters, alkyl sulfate ester salts, polyoxyethylene alkyl ether sulfate ester salts,

Fatty acid monoglyceride sulfate ester salts,
Polyoxyethylene alkyl phenyl ether sulfate ester salts, polyoxyethylene styryl phenyl ether sulfate ester salts, alkyl phosphate ester salts, polyoxyethylene alkyl ether phosphate ester salts, polyoxyethylene alkyl phenyl ether phosphate ester salts, styrene / anhydrous Preferable examples include partially saponified products of maleic acid copolymers, partially saponified products of olefin / maleic anhydride copolymers, and naphthalenesulfonate formalin condensates.

Examples of the cationic surfactant include alkylamine salts, quaternary ammonium salts such as tetrabutylammonium bromide, polyoxyethylene alkylamine salts and polyethylene polyamine derivatives. Examples of the amphoteric surfactant include carboxybetaines, alkylaminocarboxylic acids, sulfobetaines, aminosulfates, imidazolines and the like. Among the above surfactants, those with "polyoxyethylene" can be read as polyoxyalkylenes such as polyoxymethylene, polyoxypropylene and polyoxybutylene, and these are also included in the above surfactants. It The surfactant concentration in the developer is preferably 0.001 to 10.0% by mass,
0.01-5.0 mass% is more preferable, and 0.1-1.
Most preferred is 0% by weight.

The following additives may be added to the alkaline developing solution for the purpose of further improving the developing performance. For example, N described in JP-A-58-75152
Neutral salts such as aCl, KCl and KBr, JP-A-58-1
Chelating agents such as EDTA and NTA described in JP-A-90952, and [C described in JP-A-59-121336].
complexes such as o (NH ₃ ) ₆ ] Cl ₃ , CoCl ₂ .6H ₂ O, sodium alkylnaphthalenesulfonate described in JP-A No. 50-51324, and n-tetradecyl-N, N.
-Anionic or amphoteric surfactants such as dihydroxyethyl betaine, nonionic surfactants such as tetramethyldecynediol described in US Pat. No. 4,374,920, described in JP-A-55-95946. P-
Cationic polymers such as methyl chloride quaternary compounds of dimethylaminomethyl polystyrene, JP-A-56-
An amphoteric polymer electrolyte such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-142528, JP-A-57-192951.
Inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, organic Si, Ti described in JP-A-59-75255, and the like. Including organometallic surfactants,
Examples thereof include organic boron compounds described in JP-A-59-84241, and quaternary ammonium salts such as tetraalkylammonium oxide described in EP101010.

The mode of use of the alkaline development processing solution of the present invention is not particularly limited. In recent years, especially in the platemaking and printing industry, to streamline and standardize platemaking work,
Automatic developing machines for printing plate materials are widely used. This automatic developing machine is generally composed of a developing section and a post-processing section, and is composed of a device for conveying a printing plate material, each processing liquid tank, and a spray device. Each of the processing liquids pumped up is sprayed from a spray nozzle for development processing. Further, recently, a method has also been known in which a printing plate material is immersed and conveyed by a submerged guide roll or the like in a treatment liquid tank filled with the treatment liquid to perform treatment.
In such automatic processing, it is possible to perform processing while replenishing each processing solution with a replenishing solution according to the processing amount, operating time, and the like.

In this case, a large amount of the image forming material can be processed without replacing the developing solution in the developing tank for a long time by adding an aqueous solution having a higher alkali strength than the developing solution as a replenishing solution to the developing solution. It is a preferred embodiment to employ this replenishment method even when the alkaline developing treatment solution of the present invention is used. Also as the replenisher, the alkaline developing treatment liquid for a lithographic printing plate of the present invention can be used as an aqueous solution having a higher alkaline strength than the developing liquid for development.

If necessary, an organic solvent or the like may be added to the developing solution and the developing solution replenishing solution for the purpose of promoting or suppressing the developing property, dispersing the development dust and improving the ink affinity of the printing plate image area. You can also Benzyl alcohol and the like are preferable as the organic solvent. It is also preferable to add polyethylene glycol or its derivative, or polypropylene glycol or its derivative. Further, if necessary, an inorganic salt-based reducing agent such as hydroquinone, resorcinol, sodium salt or potassium salt of sulfurous acid or bisulfite, an organic carboxylic acid, an antifoaming agent, and a water softener may be added.

The lithographic printing plate developed using the alkaline developing solution and the replenisher of the present invention is a rinsing solution containing washing water and a surfactant, and a desensitizing solution containing gum arabic and a starch derivative. Post-processing is done. This post-treatment can be performed by combining these treatment liquids in various ways. Further, it is also possible to adopt a so-called disposable processing method in which processing is carried out with a substantially unused developing processing solution.

The alkaline developing treatment solution of the present invention is particularly suitable for plate making using an infrared-sensitive lithographic printing plate, and particularly suitable for making a positive type infrared-sensitive lithographic printing plate. Therefore, the present invention is further directed to a plate-making method of a lithographic printing plate, which comprises subjecting an infrared-sensitive lithographic printing plate having an image-forming layer containing an infrared absorbing dye to infrared irradiation and then developing with the above-mentioned alkali developing solution. The infrared-sensitive lithographic printing plate precursor will be described below. The infrared-sensitive lithographic printing plate
It has an image forming layer on a support, and further has other layers as necessary, and the image forming layer contains (A) an infrared absorbing dye, and further contains (B) an alkali-soluble polymer compound, (C) a compound which is optionally made compatible with (C) an alkali-soluble polymer compound to reduce the solubility of the alkali-soluble polymer compound in an alkaline aqueous solution, and whose solubility-reducing action is reduced by heating (D) a cyclic acid You may contain an anhydride etc. In the case of a negative type lithographic printing plate precursor, the exposed area is cured to form an image area. Therefore, the compound (A) which generates an acid by heat is crosslinked with the acid (F) in the image forming layer. And a cross-linking agent. Hereinafter, each component will be briefly described.

-(A) Infrared absorbing dye-The infrared absorbing dye used in the image forming layer is not particularly limited as long as it is a dye that absorbs infrared light and generates heat, and various dyes known as infrared absorbing dyes. Can be used. As the infrared absorbing dye, a commercially available dye or a document (for example, “Handbook of Dyes”, edited by The Society of Synthetic Organic Chemistry, Showa 45)
The publicly known ones described in (Annual) are listed, for example, azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes,
Examples thereof include carbonium dye, quinone imine dye, methine dye, cyanine dye, squarylium dye, pyrylium salt, and metal thiolate complex. Among these dyes, those that absorb infrared light or near infrared light are particularly preferable in that they are suitable for use in a laser that emits infrared light or near infrared light.

Examples of such dyes that absorb infrared light or near infrared light include, for example, JP-A-58-125246.
JP-A-59-84356 and JP-A-59-2028.
29, cyanine dyes described in JP-A-60-78787, JP-A-58-173696, JP-A-58-18.
1690, methine dyes described in JP-A-58-194595, JP-A-58-112793 and JP-A-58-
224793, JP 59-48187, JP 5
9-73996, JP-A-60-52940 and JP-A-60-63744, naphthoquinone dyes, squarylium dyes described in JP-A-58-112792, and British Patent 434,875. Suitable examples thereof include the cyanine dyes described, and the dihydroperimidine squarylium dyes described in US Pat. No. 5,380,635.

Further, as a dye, US Pat. No. 5,156,56
The near infrared absorption sensitizer described in Japanese Patent No. 938 is also preferable,
Substituted aryl benzo (thio) pyrylium salts described in U.S. Pat. No. 3,881,924, JP-A-57 / 57
Trimethine thiapyrylium salt described in US Pat. No. 4,327,169 (US Pat. No. 4,327,169);
-181051, 58-201243, 59-
41363, 59-84248, 59-842.
49, 59-146063, 59-14606.
Pyrylium compounds described in JP-A-59-216
Cyanine dyes described in U.S. Pat.
The pentamethine thiopyrium salt described in the specification of No. 3,475, the pyrylium compounds described in JP-B Nos. 5-13514 and 5-19702, and as a commercial product, Epolight I
II-178, Epolight III-130, Epolight III-12
5, Epolight IV-62A (manufactured by Eporin) and the like are also preferable. Further, near-infrared absorbing dyes represented by formulas (I) and (II) described in U.S. Pat. No. 4,756,993 can also be mentioned as preferable ones. Among the above, a cyanine dye, a squarylium dye, a pyrylium salt, and a nickel thiolate complex are more preferable.

More specifically, a compound represented by the following general formula (Z) can be given.

[0033]

In the above general formula (Z), R ^{21 to} R ²⁴ are each independently a hydrogen atom, or an optionally substituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkoxy group, a cyclo group. It represents an alkyl group or an aryl group, and R ²¹ and R ²² , and R ²³ and R ²⁴ may be bonded to each other to form a ring structure. Examples of R ^{21 to} R ²⁴ include a hydrogen atom,
Examples thereof include a methyl group, an ethyl group, a phenyl group, a dodecyl group, a naphthyl group, a vinyl group, an allyl group and a cyclohexyl group, and these groups may further have a substituent. Here, as the substituent, for example, a halogen atom,
Carbonyl group, nitro group, nitrile group, sulfonyl group,
Examples thereof include a carboxyl group, a carboxylic acid ester, and a sulfonic acid ester.

In the formula, R ^{25 to} R ³⁰ each independently represent an alkyl group having 1 to 12 carbon atoms which may have a substituent, and examples of R ^{25 to} R ³⁰ include a methyl group, Examples thereof include an ethyl group, a phenyl group, a dodecyl group, a naphthyl group, a vinyl group, an allyl group, and a cyclohexyl group, and these groups may further have a substituent. Here, as the substituent, for example, a halogen atom, a carbonyl group,
Examples thereof include nitro group, nitrile group, sulfonyl group, carboxyl group, carboxylic acid ester and sulfonic acid ester.

In the formula, R ^{31 to} R ³³ each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R ³² is the R ³¹ Alternatively, it may combine with R ³³ to form a ring structure, and when m> 2, a plurality of R ^{32 s} may combine with each other to form a ring structure. Examples of R ^{31 to} R ³³ include a chlorine atom, a cyclohexyl group, a cyclopentyl ring formed by combining R ^32's , a cyclohexyl ring, and the like, and these groups may further have a substituent. .. Here, as the substituent, for example, a halogen atom, a carbonyl group, a nitro group, a nitrile group, a sulfonyl group, a carboxyl group,
Examples thereof include carboxylic acid ester and sulfonic acid ester. Moreover, m represents the integer of 1-8, and 1-3 are preferable especially.

In the formula, R ^{34 to} R ³⁵ each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R ³⁴ is R ³⁵ or R ³⁵ . They may be bonded to each other to form a ring structure, and when m> 2, a plurality of R ³⁴ 's may be bonded to each other to form a ring structure. Examples of R ^{34 to} R ³⁵ include a chlorine atom, a cyclohexyl group, a cyclopentyl ring formed by combining R ^34's , a cyclohexyl ring, and the like, and these groups may further have a substituent. .. Here, examples of the substituent include a halogen atom, a carbonyl group, a nitro group, a nitrile group, a sulfonyl group, a carboxyl group, a carboxylic acid ester, a sulfonic acid ester, and the like. Also, m
Represents an integer of 1 to 8, and among them, 1 to 3 are preferable.

In the formula, X ⁻ represents an anion, for example,
Perchloric acid, tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-O-toluenesulfonic acid, 5-sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4. 6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-
Chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid and para. Examples include toluene sulfonic acid. Of these, alkylaromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, and 2,5-dimethylbenzenesulfonic acid are preferable.

Of the compounds represented by the above general formula (Z), the following compounds are specifically preferably used, but the present invention is not limited thereto.

The content of the infrared absorbing dye as described above is 0.01 to 50 relative to the total solid mass of the image forming layer.
Mass% is preferable, 0.1-10 mass% is more preferable,
Furthermore, 0.5-10 mass% is the most preferable. If the content is
If it is less than 0.01% by mass, the sensitivity may be lowered, and if it exceeds 50% by mass, the uniformity of the image forming layer may be deteriorated and the durability thereof may be deteriorated.

-(B) Alkali-soluble polymer compound-A usable alkali-soluble polymer compound (hereinafter,
Sometimes referred to as "(B) component". As the above), an alkaline water-soluble polymer compound having the following acidic groups (1) to (3) in the main chain and / or side chain structure can be used. (1) phenol group (-Ar-OH) (2) sulfonamide group _{(-SO 2 NH-R) (} 3) substituted sulfonamide-based acid group (hereinafter, referred to as "active imide group".) [-SO ₂ NHCOR , -SO ₂ NHSO ₂ R, -CON
HSO ₂ R] In the above (1) to (3), Ar represents a divalent aryl linking group which may have a substituent, and R represents a hydrocarbon group which may have a substituent. Represent Specific examples thereof are shown below, but the present invention is not limited thereto.

(1) Examples of the alkali-soluble polymer compound having a phenol group include a condensation polymer of phenol and formaldehyde, a condensation polymer of m-cresol and formaldehyde, and a condensation polymer of p-cresol and formaldehyde. , A condensation polymer of m- / p-mixed cresol and formaldehyde, phenol and cresol (m
Any of-, p- or m- / p- mixture may be used. A novolak resin such as a condensation polymer of) and formaldehyde, or a condensation polymer of pyrogallol and acetone. Further, a polymer compound obtained by polymerizing a monomer having a phenol group in its side chain can also be mentioned.

As the polymer compound having a phenolic hydroxyl group in the side chain, a polymerizable monomer consisting of a low molecular weight compound having one or more unsaturated bonds capable of polymerizing with the phenolic hydroxyl group is homopolymerized, or Examples thereof include polymer compounds obtained by copolymerizing a monomer with another polymerizable monomer. Examples of the monomer having a phenol group in its side chain include acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester, hydroxystyrene and the like having a phenol group in its side chain.

Specifically, N- (2-hydroxyphenyl) acrylamide, N- (3-hydroxyphenyl)
Acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (2-hydroxyphenyl) methacrylamide, N- (3-hydroxyphenyl) methacrylamide, N- (4-hydroxyphenyl) methacrylamide, o-hydroxyphenyl acrylate , M-hydroxyphenyl acrylate, p-hydroxyphenyl acrylate, o-hydroxyphenyl methacrylate, m-hydroxyphenyl methacrylate, p-hydroxyphenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (2 -Hydroxyphenyl) ethyl acrylate, 2- (3-hydroxyphenyl) ethyl acrylate, 2- (4-hydroxyphenyl) ethyl acrylate, 2- (2-hydro) Shifeniru) ethyl methacrylate, 2- (3-hydroxyphenyl) ethyl methacrylate, 2- (4-hydroxyphenyl) ethyl methacrylate can be preferably exemplified.

Alkali-soluble having the above-mentioned phenol group
The weight average molecular weight of the polymer compound is 5.0 × 10.²
~ 2.0 x 10^FiveHas a number average molecular weight of 2.0.
× 10 ²~ 1.0 x 10^FiveAre preferable in terms of image forming property.
Good In addition, the alkali-soluble high content of phenol group
Sub-compounds can be used alone or in combination of two or more.
You may use together. If you want to combine,
As described in U.S. Pat. No. 4,123,279,
Condensation polymer of t-butylphenol and formaldehyde
And polycondensation of octylphenol and formaldehyde
Body-like alkyl group having 3 to 8 carbon atoms as a substituent
The condensation polymer of phenol and formaldehyde
May be used. These polycondensates also have a weight average molecular weight of
5.0 x 10²~ 2.0 x 10^FiveHaving a number average molecular weight of 2.0
× 10²~ 1.0 x 10^FiveAre preferred.

(2) Examples of the alkali-soluble polymer compound having a sulfonamide group include, for example, a polymer having a compound having a sulfonamide group as a main monomer constituent unit, that is, a homopolymer or another monomer in the monomer constituent unit. Examples thereof include a copolymer obtained by copolymerizing a polymerizable monomer. Examples of the polymerizable monomer having a sulfonamide group include a sulfonamide group —SO ₂ —NH— having at least one hydrogen atom bonded to a nitrogen atom in one molecule,
Examples of the monomer include a low molecular weight compound having one or more polymerizable unsaturated bonds. Among them, a low molecular weight compound having an acryloyl group, an allyl group or a vinyloxy group and a substituted or mono-substituted aminosulfonyl group or a substituted sulfonylimino group is preferable. Examples of the low molecular weight compounds include compounds represented by the following general formulas (a) to (e), but the present invention is not limited thereto.

[0047]

In the formula, X ¹ and X ² each independently represent an oxygen atom or NR ⁷ . R ¹ and R ⁴ each independently represent a hydrogen atom or CH ₃ . R ² , R ⁵ , R ⁹ , R ¹² , R
¹⁶ independently represents an alkylene group having 1 to 12 carbon atoms, which may have a substituent, a cycloalkylene group, an arylene group or an aralkylene group. R ³ , R ⁷ and R ¹³ are
Each independently represents a hydrogen atom, an optionally substituted alkyl group having 1 to 12 carbon atoms, a cycloalkyl group, an aryl group or an aralkyl group. R ⁶ and R ¹⁷ each independently have 1 to 12 carbon atoms which may have a substituent.
Represents an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group. R ⁸ , R ¹⁰ and R ¹⁴ each independently represent a hydrogen atom or CH ₃ . R ¹¹ and R ¹⁵ each independently represent a single bond or a carbon atom which may have a substituent.
Represents an alkylene group, a cycloalkylene group, an arylene group or an aralkylene group. Y ¹ and Y ² each independently represent a single bond or CO.

Among them, m-aminosulfonylphenyl methacrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p-aminosulfonylphenyl) acrylamide and the like can be preferably used.

As the alkali-soluble polymer compound having an active imide group (3), for example, a polymer having a compound having an active imide group as a main monomer constituent unit can be mentioned. As a polymer having a compound having an active imide group as a main monomer constitutional unit,
Obtained by homopolymerizing a monomer composed of a low molecular weight compound having an active imide group represented by the following formula and at least one polymerizable unsaturated bond, or by copolymerizing the monomer with another polymerizable monomer. A high molecular compound can be mentioned.

[0051]

Specific examples of such a compound include:
N- (p-toluenesulfonyl) methacrylamide, N
Preferable examples thereof include-(p-toluenesulfonyl) acrylamide. Further, in addition to the above, a polymer compound obtained by polymerizing any two or more of the above-mentioned polymerizable monomer having a phenol group, a polymerizable monomer having a sulfonamide group, and a polymerizable monomer having an active imide group, or Further, a polymer compound obtained by copolymerizing these two or more kinds of polymerizable monomers with another polymerizable monomer is also preferable.

Polymerizable monomer having a phenol group (M
1), a polymerizable monomer having a sulfonamide group (M
The compounding ratio (M1: M2 and / or M3; mass ratio) when 2) and / or the polymerizable monomer (M3) having an active imide group is copolymerized is 50:50 to 5:95.
Is preferred, and 40:60 to 10:90 is more preferred.

The alkali-soluble polymer compound is a copolymer composed of a monomer constitutional unit having any one of the acidic groups (1) to (3) and a constitutional unit of another polymerizable monomer. In this case, it is preferable that the copolymer contains 10 mol% or more of a monomer structural unit having any one of the acidic groups (1) to (3).
It is more preferable to contain 0 mol% or more. If the content of the monomer structural unit is less than 10 mol%, sufficient alkali solubility may not be obtained and the development latitude may be narrowed. As a method for synthesizing the copolymer, a conventionally known graft copolymerization method, block copolymerization method, random copolymerization method or the like can be used.

The monomer having any one of the acidic groups (1) to (3) is copolymerized with a polymerizable monomer having a constitutional unit. Examples of the other polymerizable monomer include the monomers listed in (a) to (1) below, but the present invention is not limited thereto.

(A) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate. (B) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl Alkyl acrylate such as acrylate. (C) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl. Alkyl methacrylate such as methacrylate.

(D) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide , Acrylamide such as N-ethyl-N-phenylacrylamide, or methacrylamide. (E) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether. (F) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate. (G) Styrene, α-methylstyrene, methylstyrene, chloromethylstyrene and the like and styrenes.

(H) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone and phenyl vinyl ketone. (I) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene. (J) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile and the like. (K) maleimide, N-acryloyl acrylamide,
Unsaturated imides such as N-acetylmethacrylamide, N-propionylmethacrylamide, and N- (p-chlorobenzoyl) methacrylamide. (L) Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic anhydride, and itaconic acid.

The alkali water-soluble polymer compound, regardless of homopolymer or copolymer, is
Weight average molecular weight of 2000 or more, number average molecular weight of 500
The above is preferable, and the weight average molecular weight is 5,000 to 3
00000, the number average molecular weight is 800 to 250,000, and the dispersity (weight average molecular weight / number average molecular weight) is 1.1 to
10 is more preferable. Further, the alkali-soluble polymer compound, phenol-formaldehyde resin,
In the case of a cresol-aldehyde resin or the like, those having a weight average molecular weight of 500 to 20,000 and a number average molecular weight of 200 to 10,000 are preferable.

The content of the alkaline water-soluble polymer compound is 30 to 30 with respect to the total solid content of the image forming layer.
99 mass% is preferable, 40-95 mass% is more preferable, 50-90 mass% is the most preferable. The content is
If it is less than 30% by mass, the durability of the image forming layer may decrease, and if it exceeds 99% by mass, the sensitivity and durability may decrease. Further, the polymer compound may be used alone or in combination of two or more kinds.

-(C) A compound which is compatible with the alkali-soluble polymer compound to reduce the solubility of the alkali-soluble polymer compound in an aqueous alkali solution, and which reduces the solubility-reducing action by heating- The component (C) has good compatibility with the above-mentioned (B) alkali-soluble polymer compound due to the function of the hydrogen-bonding functional group present in the molecule, and can form a uniform coating liquid for the image-forming layer. At the same time, it refers to a compound having a function of suppressing the alkali solubility of the alkali-soluble polymer compound by the interaction with the alkali-soluble polymer compound (solubility suppressing action).

Although the solubility-suppressing action on the alkali-soluble polymer compound disappears by heating, when the infrared absorbing agent itself is a compound which decomposes by heating, sufficient energy for decomposition is generated by laser output or laser output. If it is not given under various conditions such as irradiation time, the solubility-suppressing action of the alkali-soluble polymer compound cannot be sufficiently lowered, and the sensitivity may be lowered. For this reason,
The thermal decomposition temperature of the component (C) is preferably 150 ° C or higher.

As the component (C), in consideration of the interaction with the above-mentioned (B) alkali-soluble polymer compound, for example,
It can be appropriately selected from compounds capable of interacting with the alkali-soluble polymer compound, such as sulfone compounds, ammonium salts, phosphonium salts, and amide compounds.
The compounding ratio (C / B) of the component (C) to the (B) alkali-soluble polymer compound is generally 1/99 to 25 /
75 is preferred.

-(D) Cyclic acid anhydride-A cyclic acid anhydride may be further used in the lithographic printing plate precursor. The cyclic acid anhydride has a bond conjugated to the carbonyl group of the carboxylic acid anhydride in its structure, the decomposition rate is controlled by increasing the stability of the carbonyl group, and the cyclic acid anhydride decomposes at an appropriate rate during storage. And generate acid. Therefore, it is possible to suppress the deterioration of the developability over time and to maintain the developability stably for a long period of time. Examples of the cyclic acid anhydride include compounds represented by the following general formula (II) or (III).

[0065]

In the general formula (II), R ⁴¹ and R ⁴² are each independently a hydrogen atom, or an optionally substituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkoxy group or a cycloalkyl group. Represents a group, an aryl group, a carbonyl group, a carboxy group or a carboxylic acid ester. In addition,
R ⁴¹ and R ⁴² may combine with each other to form a ring structure.
Preferable examples of R ⁴¹ and R ⁴² include a hydrogen atom, or an unsubstituted alkyl group having 1 to 12 carbon atoms, an aryl group, an alkenyl group, a cycloalkyl group, and the like. Methyl group, ethyl group, phenyl group,
Examples thereof include a dodecyl group, a naphthyl group, a vinyl group, an allyl group, a cyclohexyl group, and these groups may further have a substituent. When R ⁴¹ and R ⁴² are linked to each other to form a ring structure, examples of the cyclic group include a phenylene group, a naphthylene group, a cyclohexene group and a cyclopentene group. Examples of the substituent include a halogen atom, a hydroxy group, a carbonyl group, a sulfonic acid ester, a nitro group and a nitrile group.

In the general formula (III), R ⁴³ , R ⁴⁴ , R ⁴⁵ , R
⁴⁶ is each independently a hydrogen atom, a hydroxy group, a halogen atom such as chlorine, a nitro group, a nitrile group, or an alkyl group having a carbon number of 1 to 12 which may have a substituent,
It represents an alkenyl group, an alkoxy group, a cycloalkyl group, an aryl group, a carbonyl group, a carboxy group or a carboxylic acid ester group. The aforementioned R ⁴³ , R ⁴⁴ , R ⁴⁵ , R ⁴⁶
Preferable examples thereof include a hydrogen atom, a halogen atom, an unsubstituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, and an aryl group having 6 to 12 carbon atoms, and specifically, a methyl group and vinyl. Group, phenyl group, allyl group and the like. These groups may further have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, a carbonyl group, a sulfonic acid ester, a nitro group, a nitrile group and a carboxy group.

As the cyclic acid anhydride, for example, phthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, 3-hydroxyphthalic anhydride,
3-methylphthalic anhydride, 3-phenylphthalic anhydride,
Preferable examples include trimellitic anhydride, pyromellitic anhydride, maleic anhydride, phenylmaleic anhydride, dimethylmaleic anhydride, dichloromaleic anhydride and chloromaleic anhydride. The content of the cyclic acid anhydride is preferably 0.5 to 20% by mass, more preferably 1 to 15% by mass, and 1 to 1 with respect to the total solid content of the image forming layer.
Most preferred is 0% by weight. When the content is less than 0.5% by mass, the effect of maintaining developability may be insufficient,
If it exceeds 20% by mass, an image may not be formed.

The following are components constituting the recording layer of the negative type lithographic printing plate. — (E) Compound that Generates Acid by Heat— When the image forming material is a negative type, a compound that generates an acid when heated (hereinafter, referred to as “acid generator”) is used in combination. This acid generator decomposes when heated to 100 ° C. or higher to increase the compound that generates an acid. As the acid generated,
A strong acid having a pKa of 2 or less, such as sulfonic acid or hydrochloric acid, is preferable. The acid generator, iodonium salt,
Preferable examples are onium salts such as sulfonium salts, phosphonium salts and diazonium salts. In particular,
U.S. Pat. No. 4,708,925 and JP-A-7-20629
The compounds described in JP-A No. 2004-242242 can be mentioned, and among them, iodonium salts, sulfonium salts, and diazonium salts having a sulfonate ion as a counter ion are preferable.

Examples of the diazonium salt include diazonium salt compounds described in US Pat. No. 3,867,147,
Diazonium compounds described in U.S. Pat. No. 2,632,703, JP-A-1-102456 and JP-A-1-
The diazo resin described in each publication of 102457 can also be mentioned suitably. Also, US Pat. No. 5,135,83
No. 8, benzyl sulfonates described in US Pat. No. 5,200,544, active sulfonic acid esters and disulfonyls described in JP-A Nos. 2-100054, 2-100055, and 8-9444. Compounds are also preferred. In addition, haloalkyl-substituted S-triazines described in JP-A-7-271029 are also preferable. The amount of the acid generator added is preferably 0.01 to 50% by mass, and 0.1 to 40% by mass based on the total solid content of the image forming layer.
Is more preferable, and 0.5 to 30 mass% is the most preferable.

-(F) Acid-crosslinking agent-When the lithographic printing plate precursor is a negative type, an acid-crosslinking agent (hereinafter sometimes referred to simply as "crosslinking agent") is used in combination. The following can be mentioned as said crosslinking agent. (I) Aromatic compound substituted with alkoxymethyl group or hydroxymethyl group (ii) Compound having N-hydroxymethyl group, N-alkoxymethyl group or N-acyloxymethyl group (iii) Epoxy compound Examples thereof include those described in JP-A-254850 and phenol derivatives.

The amount of the cross-linking agent added is preferably 5 to 80% by mass, based on the total mass of the solid content of the image forming layer.
-75 mass% is more preferable, and 20-70 mass% is the most preferable. When the phenol derivative is used as a crosslinking agent, the amount of the phenol derivative added is preferably 5 to 70% by mass, and more preferably 10 to 50% by mass, based on the total solid mass of the image forming material. Details of the above various compounds are described in JP-A-2000-267265.

-Other Components-Various additives can be further added to the image forming layer of the lithographic printing plate precursor, if necessary. For example, known additives such as phenols, organic acids and sulfonyl compounds can be used in combination for the purpose of improving sensitivity. Examples of phenols include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4.
4'-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4-hydroxybenzophenone, 4,4 ', 4 "-trihydroxytriphenylmethane, 4,4', 3", 4 "-tetrahydroxy-
3,5,3 ', 5'-tetramethyltriphenylmethane and the like can be mentioned.

As the above-mentioned organic acids, JP-A-60-8 is used.
There are sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphoric acid esters, carboxylic acids and the like described in Japanese Patent Publication No. 8942, Japanese Patent Application Laid-Open No. 2-96755 and the like, and specifically, p-toluene. Sulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfate, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid,
Examples thereof include 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-2,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid. Examples of the sulfonyl compounds include bishydroxyphenyl sulfone, methylphenyl sulfone, diphenyldisulfone and the like. The addition amount of the other cyclic acid anhydride, phenols, organic acids or sulfonyl compounds is preferably 0.05 to 20 mass% with respect to the total solid mass of the image forming layer, and 0.1 to 1
5 mass% is more preferable, and 0.1-10 mass% is the most preferable.

Further, for the purpose of expanding the stability of processability under developing conditions, a siloxane compound as described in EP 950517, JP-A-11-28809.
Fluorine-containing monomer copolymers such as those described in JP-A-3 can be added. As the siloxane-based compound, a block copolymer of dimethylsiloxane and polyalkylene oxide is preferable.
Made by Chisso Corporation, DBE-224, DBE-621, DBE
-712, DBP-732, DBP-534, German Teg
Polyalkylene oxide-modified silicone such as Tego Glide 100 manufactured by O Co. may be mentioned. The amount of the surfactant used, based on the total solid content of the image forming layer, 0.
05 to 15 mass% is preferable, and 0.1 to 5 mass% is more preferable.

In the image forming layer, after heating by exposure,
A printout agent for obtaining a visible image or a dye or pigment as an image colorant can be added immediately. Examples of the printing-out agent include a combination of a compound that generates an acid when heated by exposure to light and an organic dye that can form a salt. Specifically, combinations of o-naphthoquinonediazide-4-sulfonic acid halogenide and a salt-forming organic dye described in JP-A-50-36209 and JP-A-53-8128, and JP-A- 53-36223, JP-A-54
-74728, JP-A-60-3626, JP-A-61
The combination of a trihalomethyl compound and a salt-forming organic dye described in JP-A-143748, JP-A-61-151644 and JP-A-63-58440. As the trihalomethyl compound, there are an oxazole compound and a triazine compound, both of which have excellent stability over time and give a clear printout image. As the image colorant, for example, other dyes can be used in addition to the salt-forming organic dye, and for example, oil-soluble dyes and basic dyes are suitable.

Specifically, Oil Yellow # 101, Oil Yellow # 103, Oil Pink # 312, Oil Green BG, Oil Blue BOS, Oil Blue # 6.
03, oil black BY, oil black BS, oil black T-505 (above, manufactured by Orient Chemical Industry Co., Ltd.), Victoria Pure Blue, crystal violet (CI. 42555), methyl violet (CI. 42535). , Ethyl violet, rhodamine B (CI. 145170B), malachite green (CI. 42000), methylene blue (CI.
52015) and the like. In addition, JP-A-6
The dyes described in JP-A-2-293247 are particularly preferable. The amount of the various dyes added is preferably 0.01 to 10% by mass, based on the total mass of the solid content of the image forming layer.
-3 mass% is more preferable.

If desired, a plasticizer may be added for the purpose of imparting flexibility to the coating film. Examples of the plasticizer include butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, and acrylic. Examples thereof include oligomers and polymers of acid or methacrylic acid.

If necessary, the following various additives can be added. For example, onium salts, o-quinonediazide compounds, aromatic sulfone compounds, aromatic sulfonic acid ester compounds, and other compounds that are thermally decomposable and substantially reduce the solubility of the alkaline water-soluble polymer compound in the undecomposed state can be used. Can be used together. Addition of the compound is preferable from the viewpoint of improving the dissolution inhibiting ability of the image area in the developing solution. Examples of the onium salts include diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, arsonium salts and the like. Among them, for example SI Schlesinger,
Photogr. Sci. Eng., 18, 387 (1974), TSBal et al,
Polymer, 21, 423 (1980), the diazonium salt described in JP-A-5-158230, U.S. Pat. No. 4,069,
055, 4,069,056, and JP-A-3-140.
Ammonium salt described in No. 140, DC Necker et a
l, Macromolecules, 17, 2468 (1984), CS Wen et a
l, The Proc. Conf. Rad. Curing ASIA, p478 Tokyo, O
ct (1988), US Pat. Nos. 4,069,055 and 4,
069,056 phosphonium salt, JV Criv
elloet et al. Macromolecules, 10 (6), 1307 (1977),
Chem. & Eng. News, Nov. 28, p. 31 (1988), European Patent 104,143, US Patents 339,049, 410,201, JP-A-2-150848, JP-A-2-150848. 2-296514, iodonium salts,

JV Crivello et al, Polymer J. 17, 7
3 (1985), JV Crivello et al, J.Org. Chem., 43,
3055 (1978), W. R, Watt et al, J. Polymer Sci., Po
lymerChem. Ed., 22, 1789 (1984), JV Crivello et
al, Polymer bull., 14, 279 (1985), JV Crivello
et al, Macromolecules, 14 (5), 1141 (1981), JVCr
ivello et al, J. Polymer Sci., Polymer Chem. Ed.,
17. 2877 (1979), European Patent Nos. 370,693 and 2
33,567, 297,443, 297,44
No. 2, US Pat. Nos. 4,933,377 and 3,90.
2,114, 410,201, 399,049
No. 4, ibid. 4,760,013, ibid. 4,734,444
No. 2,833,827, German Patent No. 2,904,
No. 626, No. 3,604,580, No. 3,604,5
No. 81, a sulfonium salt,

JV Crivello et al, Macromolecules,
10 (6), 1307 (1977), JV Crivelloet al, J. Polymer
Sci., Polymer Chem. Ed., 17, 1047 (1979), selenonium salt, CS Wen et al, The Proc. Conf. R
Examples include arsonium salts described in ad. Curing ASIA, p.478, Tokyo, Oct (1988). Of the above, diazonium salts are preferable, and among them, JP-A-5-158230.
The one described in the publication is more preferable.

As the counter ion of the onium salt, tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5
-Sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2
-Nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5- Examples thereof include benzoyl-benzenesulfonic acid and paratoluenesulfonic acid. Of these, alkylaromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, and 2,5-dimethylbenzenesulfonic acid are preferable.

Examples of the o-quinonediazide compound include
Compounds having at least one o-quinonediazide group, which increase alkali solubility by thermal decomposition, can be mentioned, and compounds having various structures can be used. Said o
-Quinonediazide helps the solubility of the lithographic printing plate precursor by both effects of losing the ability to inhibit the dissolution of the binder by thermal decomposition and changing the o-quinonediazide itself into an alkali-soluble substance.

Examples of the o-quinonediazide compound as described above include those described in J. 33, "Light-Sensitive Systems" by John Coley, John Wiley & Sons. Inc.
Although the compounds described on pages 9 to 352 can be used, sulfonic acid esters or sulfonic acid amides of o-quinonediazide reacted with various aromatic polyhydroxy compounds or aromatic amino compounds are preferable. Further, benzoquinone (1,2) -diazide sulfonic acid chloride described in JP-A-43-28403 or US Pat. Nos. 3,046,120 and 3,188,210.
Also preferred are the esters of benzoquinone- (1,2) -diazide sulfonic acid chloride or naphthoquinone- (1,2) -diazide-5-sulfonic acid chloride described in US Pat.

Further, an ester of naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and a phenol formaldehyde resin or a cresol-formaldehyde resin, naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and pyrogallol. Esters with acetone resins are also preferred. Others, for example, JP-A-4
7-5303, JP-A-48-63802, JP-A-4.
8-63803, JP-A-48-96575, JP-A-49-38701, JP-A-48-13354, JP-B-41-11222, JP-B-45-9610, JP-B-49-17481, US Pat. No. 2,797,213
No. 3, No. 3,454, 400, No. 3, 544, 32
No. 3, No. 3,573,917, No. 3,674,4
95, 3,785,825, British Patents 1,2
No. 27,602, No. 1,251,345, No. 1,
Those described in 267,005, 1,329,888, 1,330,932, German Patent 854,890 and the like are also useful. These compounds may be used alone or in combination of several kinds. The addition amount of the onium salt, o-quinonediazide compound, aromatic sulfonic acid ester or the like is preferably 0.1 to 50% by mass with respect to the total solid mass of the image forming layer,
0.5-30 mass% is more preferable, and 0.5-20 mass% is the most preferable.

In addition, for the purpose of strengthening the discrimination of images and the resistance to scratches on the surface, as described in JP-A-2000-187318, a polymer having a carbon number of 3 to 20 is used. It is preferable to use a polymer having a (meth) acrylate monomer having 2 or 3 fluoroalkyl groups as a polymerization component. The addition amount is preferably 0.1 to 10% by mass, and more preferably 0.5 to 5% by mass, based on the total mass of the solid content of the image forming layer. Further, for the purpose of imparting resistance to scratches, a compound that lowers the coefficient of static friction of the surface can be added. Specific examples thereof include esters of long-chain alkylcarboxylic acids as disclosed in US Pat. No. 6,117,913. The addition amount thereof is preferably 0.1 to 10% by mass, and more preferably 0.5 to 5% by mass, based on the total mass of the solid content of the image forming layer. Further, various dissolution inhibitors may be included for the purpose of adjusting the solubility of the image forming layer. As a dissolution inhibitor, JP-A-11
A disulfone compound or a sulfone compound described in JP-A-119418 is preferably used, and 4,4′-bishydroxyphenylsulfone is preferably used as a specific example. The addition amount thereof is preferably 0.05 to 20% by mass, more preferably 0.5 to 10% by mass, based on the total solid content of the image forming layer.

As a specific example of a photosensitive lithographic printing plate to which the plate-making method of the present invention can be applied, a lithographic printing method in which an image forming layer as disclosed in Japanese Patent Application No. 2000-378507 is used as a positive heat-sensitive layer having a two-layer structure. The original edition is also included. That is, this positive-type heat-sensitive layer has a laminated structure and comprises a heat-sensitive layer provided at a position close to the surface (exposed surface) and a lower layer containing an alkali-soluble polymer compound provided on the side closer to the support. It is characterized by having. The above-mentioned (A) infrared absorbing dye, (B) alkali-soluble polymer compound, (C) alkali-soluble polymer compound which is compatible with the above-mentioned (A) infrared-absorbing dye, in one or both of the heat-sensitive layer and the lower layer. It is possible to include a compound, which reduces the solubility of the compound in an alkaline aqueous solution and reduces the solubility-decreasing action by heating, and other components. As the alkali-soluble polymer compound used in the lower layer, an acrylic resin can maintain good solubility of the lower layer in an alkali developing solution containing a buffering organic compound and a base as main components, and therefore, during development. Is preferable from the viewpoint of image formation. Further, the acrylic resin having a sulfamide group is particularly preferable. Further, as the alkali-soluble polymer compound used in the heat-sensitive layer, a strong hydrogen bonding property is generated in the unexposed area,
In the exposed area, a resin having a phenolic hydroxyl group is desirable because some hydrogen bonds are easily released. More preferably, it is a novolac resin. The infrared absorbing dye can be added not only to the heat-sensitive layer but also to the lower layer. The lower layer can also function as a heat-sensitive layer by adding an infrared absorbing dye to the lower layer. When the infrared absorbing dye is added to the lower layer, the same materials as those in the upper heat-sensitive layer may be used, or different materials may be used. Other additives may be contained only in the lower layer,
It may be contained only in the heat sensitive layer, or may be contained in both layers.

The image forming layer (including the above-mentioned two-layer structure) of the lithographic printing plate precursor can be coated on a suitable support by dissolving the above components in a solvent. Examples of the solvent include ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2.
-Propanol, 2-methoxyethyl acetate, 1-
Methoxy-2-propylacetate, dimethoxyethane, methyl lactate, ethyl lactate, N, N-dimethylacetamide, N, N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, α-butyrolactone, toluene, etc. However, the present invention is not limited to these. The above solvents may be used alone or in combination of two or more.

When the image-forming layer has a two-layer structure, it is preferable to select those having different solubilities with respect to the alkali-soluble polymer compound used for the heat-sensitive layer and the alkali-soluble polymer compound used for the lower layer. That is, after applying the lower layer, when applying a heat-sensitive layer that is the upper layer adjacent to it, if a solvent capable of dissolving the alkali-soluble polymer compound of the lower layer is used as the coating solvent for the uppermost layer, the mixing at the layer interface will occur. It cannot be ignored, and in extreme cases, it may become a uniform single layer instead of multiple layers. Therefore, the solvent used for coating the upper heat-sensitive layer is preferably a poor solvent for the alkali-soluble polymer compound contained in the lower layer.

When the image forming layer is applied, the total solid concentration of the above components in the solvent is generally preferably 1 to 10% by mass. The dry coating amount (solid content) of the image forming layer formed by coating and drying the support is generally 0.5.
It is preferably up to 5.0 g / m ² . When using a two-layer structure,
The heat sensitive layer is 0.05 to 1.0 g / m ² , and the lower layer is 0.
It is preferably ³ to 3.0 g / m ² . As the coating amount decreases, the apparent sensitivity increases, but the film characteristics of the image forming layer deteriorate. The method for coating on the support can be appropriately selected from various known methods,
Examples thereof include bar coater coating, spin coating, spray coating, curtain coating, dip coating, air knife coating, grade coating and roll coating. A surfactant such as the fluorine-based surfactant described in JP-A-62-170950 may be added to the coating liquid for the image forming layer for the purpose of improving the coatability. The amount added is 0.0 with respect to the total solid content of the image forming layer.
1-1 mass% is preferable, and 0.05-0.5 mass% is more preferable.

—Support— Examples of the support for the lithographic printing plate precursor include a pure aluminum plate, an aluminum alloy plate, and a plastic film having aluminum laminated or vapor deposited thereon. The surface of the aluminum plate is preferably subjected to surface treatment such as graining treatment, permeation treatment with an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate or the like, or anodization treatment. In addition, after graining the aluminum plate described in US Pat. No. 2,714,066 and then dipping it in an aqueous solution of sodium silicate, the aluminum plate described in Japanese Patent Publication No. 47-5125 is anodized. An aluminum plate that has been immersed in an aqueous solution of an alkali metal silicate is also preferable.

As the anodizing treatment, for example, sulfuric acid,
Anodize an aluminum plate in an electrolytic solution of inorganic acid such as phosphoric acid, chromic acid, nitric acid, boric acid, etc., or organic acid such as oxalic acid, sulfamic acid, etc. Is applied by flowing an electrode. Also, US Pat. No. 3,65
The silicate electrodeposition described in the specification of No. 8,662 is also effective.

Further, US Pat. No. 4,087,341, JP-B-46-27481, and JP-A-52-3.
It is also useful that the support described in Japanese Patent No. 0503, which has been subjected to electrolytic graining, is subjected to the anodizing treatment. Aluminum sheets which have been grained, chemically etched and further anodized as described in US Pat. No. 3,834,998 are also useful. These treatments are performed for the purpose of making the surface of the support hydrophilic, for the purpose of preventing harmful reaction with the image forming layer provided on the support, and for improving the adhesion to the image-formed image. It is given for various purposes such as.

The lithographic printing plate precursor is provided by laminating at least an image forming layer on a support, but an undercoat layer may be provided on the support if necessary. Examples of components used in the undercoat layer include various organic compounds,
For example, phosphonic acids having an amino group such as carboxymethyl cellulose, dextrin, gum arabic, and 2-aminoethylphosphonic acid; phenylphosphonic acid which may have a substituent, naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, methylene Organic phosphonic acids such as diphosphonic acid and ethylenediphosphonic acid; phenylphosphoric acid which may have a substituent, naphthylphosphoric acid,
Organic phosphoric acid such as alkyl phosphoric acid and glycerophosphoric acid;
Organic phosphinic acids such as phenylphosphinic acid which may have a substituent, naphthylphosphinic acid, alkylphosphinic acid and glycerophosphinic acid; glycine and β-
Amino acids such as alanine; and hydrochlorides of amines having a hydroxyl group such as triethanolamine hydrochloride. The organic compounds may be used alone or in combination of two or more. It is also a preferable embodiment to undercoat the above-mentioned diazonium salt.

As the undercoat layer, the following general formula (I
An organic undercoat layer containing at least one organic polymer compound having a structural unit represented by V) is also preferable.

[0096]

In the formula, R⁵¹Is a hydrogen atom, a halogen atom or
Represents an alkyl group, R⁵²And R⁵³Each independently water
Elemental atom, hydroxyl group, halogen atom, alkyl group, substituted alkyl
Kill group, aryl group, substituted aryl group, -OR⁵⁴, -C
OOR⁵⁵, -CONHR⁵⁶, -COR⁵⁷Or-show CN
And the R⁵²And R⁵³Combine with each other to form a ring structure
May be. Where R⁵⁴~ R⁵⁷Each independently
Represents an aryl group or an aryl group. X is a hydrogen atom, a metal atom,
-NR⁵⁸R⁵⁹R⁶⁰R⁶¹Represents Where R⁵⁸~ R ⁶¹Is it
Each independently a hydrogen atom, an alkyl group, a substituted alkyl group,
Represents a reel group or a substituted aryl group, R⁵⁸And R⁵⁹Are mutual
They may be bonded to each other to form a ring structure. m is 1 to 3
Represents a number. The dry coating amount of the undercoat layer is 2 to 200 m
g / m²Is preferred, 5-100 mg / m²Is more preferred
Yes. This dry coating amount is 2 mg / m²Is less than enough
The film property may not be obtained. Meanwhile, 200 mg / m²To
Even if you apply more than that, you cannot get any further effect.
Yes.

The undercoat layer can be provided by the following method. That is, water or methanol, ethanol, an organic solvent such as an organic solvent such as methyl ethyl ketone or a mixed solvent thereof, a solution for the undercoat layer is applied on a support such as an aluminum plate, and a method for providing it by drying,
Water or an organic solvent such as methanol, ethanol, methyl ethyl ketone, or a mixed solvent thereof in a solution for the undercoat layer, a support such as an aluminum plate is immersed to adsorb the organic compound, and then water, etc. It is a method of washing and drying with.

In the former method, 0.000 of the organic compound is used.
It is preferable to use an undercoat layer solution having a concentration of 5 to 10% by mass. On the other hand, in the latter method, the concentration of the organic compound in the undercoat layer solution is suitably 0.01 to 20% by mass, preferably 0.05 to 10% by mass, and more preferably 0.1 to 10% by mass. Is about 5% by mass. The immersion temperature is preferably 20 to 90 ° C, more preferably 25 to 50 ° C. The immersion time is preferably 0.1 second to 20 minutes, and 2
Seconds to 1 minute are more preferable. For the undercoat layer solution, use a basic substance such as ammonia, triethylamine and potassium hydroxide or an acidic substance such as hydrochloric acid and phosphoric acid to adjust the pH to 1 to 12.
It can also be adjusted within the range. Further, a yellow dye may be added for the purpose of improving tone reproducibility.

The infrared-sensitive lithographic printing plate can be recorded with an infrared laser, as well as with an ultraviolet lamp or with a thermal head. As the infrared laser, a laser emitting infrared rays having a wavelength of 700 to 1200 nm is preferable, and a solid laser or a semiconductor laser emitting infrared rays in the same wavelength range is more preferable.

[0101]

EFFECT OF THE INVENTION According to the alkali developing solution and the plate making method of the lithographic printing plate of the present invention, the development residue caused by the components in the image forming layer is favorably maintained while maintaining the liquid condition of the alkali developing solution. It is possible to suppress the generation of insoluble matter by dispersing and prevent the development dust from adhering to the plate surface, and to stably perform the development processing of the lithographic printing plate precursor for a long period of time. Further, according to the alkali developing treatment solution and the plate making method of the lithographic printing plate of the present invention, a highly sharp and clear image can be formed.

[0102]

The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto. In addition,
All "%" in the examples represent "mass%".

[SiO₂Preparation of contained alkaline developing solution
Made] silicon oxide SiO₂And potassium oxide K₂Mixing ratio of O
SiO₂/ K₂O is 1.1, potassium silicate 4.0% water soluble
Various compounds of the general formula (I) shown below in 1 liter of liquid
AZ was added at the concentration (g / liter) described in Table 1,
The alkaline developing solutions (1) to (30) of the present invention were prepared.
It was For comparison, the above composition does not include the compound.
Alkaline development processing solution (61)
Ruther C ₁₂H_{twenty five}O (CH₂CH₂O)₂₀1.0 g of H
/ L contained alkaline developing solution (62)
And

[Preparation of alkaline developing solution containing non-reducing sugar] D-sorbit / a combination of a non-reducing sugar and a base.
To 1 liter of a 5.0% potassium salt aqueous solution containing potassium oxide K ₂ O, various compounds A to Z of the general formula (I) shown below were added at concentrations (g / liter) shown in Table 1,
The alkaline developing treatment solutions (31) to (60) of the present invention were prepared. For comparison, an alkali developing solution (63) having the above composition and containing no such compound was used as a linear alkyl ether C ₁₂ H ₂₅ O (CH ₂ CH ₂ O) ₁₀ H (compound AA). The alkaline development treatment solution (64) contained 0 g / liter.

Compounds AZ used in the developing solution

[0106]

[Table 1]

[0107]

Examples 1-60 and Comparative Examples 1-4 The infrared-sensitive lithographic printing plates used in Examples 1-60 and Comparative Examples 1-4 were prepared as follows. Examples 1 to 30 were each treated with an alkali developing solution (1) to (30), and Examples 31 to 60 were each treated with an alkaline developing solution (31) to (60).
As Comparative Examples 1 to 4, alkali developing solution (61),
It processed with (62), (63) and (64).

<Preparation of lithographic printing plate precursor 1> 0.3 mm thickness
Aluminum plate (material 1050) of trichlorethylene
After cleaning and degreasing with a nylon brush and 400 mesh
Using a Pumis-water suspension of
Washed well with water. After cleaning, this aluminum plate is 45
Immerse in 25% sodium hydroxide aqueous solution at ℃ for 9 seconds
Etching and washing with water, then 20% nitric acid solution
It was immersed in the solution for 20 seconds and washed again with water. Graining at this time
Surface etching rate is about 3g / m ²Met.

Next, this aluminum plate was charged with 7% sulfuric acid.
Current density of 15 A / dm ²DC current of 3g
/ M²After providing the anodic oxide coating of No. 1, washed with water and dried. This
This is treated with a 2.5% aqueous solution of sodium silicate at 30 ° C for 10 seconds.
After processing, apply the following undercoat layer coating solution and apply at 80 ° C for 1
After drying for 5 seconds, a support was obtained. Drying the undercoat layer after drying
The coating amount is 15 mg / m²Met.

<Coating liquid for undercoat layer> The following copolymer P (molecular weight 28,000) 0.3 g 100 g of methanol 1 g water

[0111]

<Synthesis of Specific Copolymer> Synthesis Example (Specific Copolymer 1) 31.0 g (0.36 mol) of methacrylic acid was added to a 500 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel.
39.1 g (0.36 mol) of ethyl chloroformate and 200 ml of acetonitrile were added, and the mixture was stirred while cooling with an ice water bath. Triethylamine 36.4 was added to this mixture.
g (0.36 mol) was added dropwise by a dropping funnel over about 1 hour. After completion of the dropping, remove the ice-water bath and let it stand at room temperature for 3
The mixture was stirred for 0 minutes. To this reaction mixture, 51.7 g (0.30 mol) of p-aminobenzenesulfonamide was added, and the mixture was stirred for 1 hour while warming to 70 ° C in an oil bath. After completion of the reaction, this mixture was put into 1 liter of water while stirring the water, and the resulting mixture was stirred for 30 minutes. The mixture is filtered to remove the precipitate, which is slurried with 500 ml of water and then the slurry is filtered,
The obtained solid was dried to obtain a white solid of N- (p-aminosulfonylphenyl) methacrylamide (yield 46.9 g).

Then, in a 20 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel, 4.61 g of N- (p-aminosulfonylphenyl) methacrylamide, (0.0192 mol) and 2.94 g of ethyl methacrylate ( 0.0258 mol), acrylonitrile 0.80 g (0.015 mol)
And 20 g of N, N-dimethylacetamide were added, and the mixture was stirred while heating at 65 ° C. in a hot water bath. To this mixture was added 0.15 g of "V-65" (manufactured by Wako Pure Chemical Industries, Ltd.), and the mixture was stirred under a nitrogen stream for 2 hours while maintaining the temperature at 65 ° C. The reaction mixture was further added with N- (p-aminosulfonylphenyl) methacrylamide 4.61 g, ethyl methacrylate 2.94 g, acrylonitrile 0.80 g, N, N-
A mixture of dimethylacetamide and 0.15 g of "V-65" was added dropwise by a dropping funnel over 2 hours. After the dropping was completed, the resulting mixture was further stirred at 65 ° C. for 2 hours. After the reaction was completed, 40 g of methanol was added to the mixture, the mixture was cooled, and the resulting mixture was added to 2 liters of water while stirring this water, the mixture was stirred for 30 minutes, and then the precipitate was taken out by filtration and dried. Gave 15 g of a white solid. The weight average molecular weight (polystyrene standard) of the specific copolymer was measured by gel permeation chromatography and found to be 53,000.

The following coating solution for image forming layer was applied onto the obtained support and dried at 150 ° C. for 30 seconds to give a dry coating amount of 1.8 g / m ² to obtain a positive lithographic printing plate precursor. It was <Coating Liquid for Image Forming Layer> Specific Copolymer 1 [(B) Component] 0.4 g m, p-cresol novolac [(B) Component] 0.6 g (m / p ratio = 6/4, weight Cyanine dye A [(A + C) component] 0.1 g Phthalic anhydride [(D) component] 0.05 g p-toluenesulfonic acid 0.002 g ethyl violet 0.1. 02 g (counter ion: 6-hydroxy-β-naphthalene sulfonic acid) Naphtoquinone 1,2-diazide-5-sulfonyl chloride ester product with pyrogallol-acetone resin 0.01 g Fluorine-based surfactant 0.05 g (trade name: Megafac F-177, manufactured by Dainippon Ink and Chemicals, Inc. Methyl ethyl ketone 8 g 1-methoxy-2-propanol 4 g

Output 5 on the planographic printing plate precursor obtained from the above.
00 mW, wavelength 830 nm, beam diameter 17 μm (1 /
It was exposed at a main scanning speed of 5 m / sec using the semiconductor laser of e ² ) and kept at 25 ° C. This planographic printing plate original,
Automatic developing machine P filled with the above alkaline developing solutions
Development processing was performed with S900NP (manufactured by Fuji Photo Film Co., Ltd.) at a development temperature of 30 ° C. for 12 seconds. 50m ² , 100m ² , 200m ² , 300m ² , 40 without replenishment
It was treated with 0 m ² and 500 m ² . After the development processing was completed, a washing process was performed, followed by processing with gum (GU-7 (1: 1)) or the like to obtain a lithographic printing plate on which plate making was completed.

<Evaluation of balance between image area / non-image area> (Evaluation of developability of non-image area) Immediately after development, 50 m ² , 100 m ² , 200 m ² , 300 m ² and 40 were evaluated as described above.
By observing the "presence or absence of residual film in non-image area" of the developability of the non-image area of the lithographic printing plate obtained by treating with 0 m ² and 500 m ² ,
Sensory evaluation was performed. The results are shown in Tables 2 and 3. -Criteria- A: Sufficiently developed, no residual image forming layer on the non-image area was observed. There was no stain on the print. Δ: The image forming layer was slightly left on the non-image area. There was no stain on the print. X: Poor development was recognized, and the image forming layer remained in the non-image area. Dirt has occurred on the printed matter.

<Evaluation of Film Roughness in Image Area> As described above, immediately after development, 50 m ² , 100 m ² , 200 m ² , 300
The “defects in the image area” of the lithographic printing plate obtained by treating with m ² , 400 m ² and 500 m ² were visually observed according to the following criteria to perform sensory evaluation. The evaluation results are shown in Tables 4 to 5. -Reference- ○: No defect was observed in the image area. There was no white spot in the image area on the printed matter. Δ: The image area density was slightly reduced, and some defects were recognized. On the printed matter, there was no white spot in the image area. X: The density of the image area is significantly reduced, and the image area has a defect. White spots in the image area occurred on the printed matter.

[0118] Per <Evaluation of insolubles in the developer> 1 liter of 1m ^2, 10m ^2, 100m ² treated developer,
Refrigerator (5 ° C), normal temperature (20-25 ° C), thermo (35
The insoluble matter when left to stand for 1 month in (° C.) Was evaluated, and the results are summarized in Tables 6 to 7. ◯: No insoluble matter Δ: There is some insoluble matter, but it disappears when shaken. X: Insoluble matter remains even if shaken.

[0119]

[Table 2]

[0120]

[Table 3]

[0121]

[Table 4]

[0122]

[Table 5]

[0123]

[Table 6] Insoluble matter in developer

[0124]

[Table 7] Insoluble matter in developer

[0125]

Examples 61 to 120 and Comparative Examples 5 to 8 Examples 61 to
120 and the infrared-sensitive lithographic printing plates used in Comparative Examples 5 to 8 were prepared as described below, and treated as alkaline developing solutions (1) to (30) as Examples 61 to 90, respectively.
1 to 120, respectively, alkaline developing solution (31) to (6
0) and Comparative Examples 5 to 8 were treated with alkaline developing solutions (61), (62), (63) and (64), respectively.

<Preparation 2 of lithographic printing plate precursor> The following photosensitive solution 2 was applied to an aluminum support which was treated in the same manner as in <Preparation 1 of lithographic printing plate precursor> and provided with an undercoat layer. To 0.16 g / m ² with a wire bar, then use TABAI PERFECT OVER PH 200 to make WindCo
The ntrol was set to 7 and dried at 140 ° C. for 50 seconds. Further, the photosensitive solution 3 is applied thereon by a wire bar so that the applied amount becomes 0.85 g / m ^2, and then PERFECT OVER P manufactured by TABAI.
Wind Control was set to 7 on H200 and dried at 120 ° C. for 60 seconds to obtain a lithographic printing plate precursor having a heat-sensitive layer having a two-layer structure.

[0127] (Photosensitive liquid 2) N- (4-aminosulfonylphenyl) methacrylamide /   Acrylonitrile / methyl methacrylate   (36/34/30 weight average molecular weight 50,000) 1.896g Cresol novolac (m / p = 6/4 weight average molecular weight 4500,   Residual monomer 0.8wt%) 0.237g Cyanine dye A 0.109g 4,4'-bishydroxyphenyl sulfone 0.063g Tetrahydrophthalic anhydride 0.190g p-toluenesulfonic acid 0.008 g The counter ion of ethyl violet   Changed to 6-hydroxynaphthalene sulfone 0.05g Fluorosurfactant (F176, manufactured by Dainippon Ink and Co., Ltd.) 0.035 g Methyl ethyl ketone 26.6g 1-methoxy-2-propanol 13.6g γ-butyrolactone 13.8 g

[0128] (Photosensitive liquid 3) Cresol novolac (m / p = 6/4 weight average molecular weight 4500,   Residual monomer 0.8wt%) 0.237g Cyanine dye A 0.047g Dodecyl stearate 0.060g 3-methoxy-4-diazodiphenylamine hexafluorophosphate                                                         0.030g Fluorine-based surfactant (F176 (20% solution), manufactured by Dainippon Ink and Chemicals, Inc.)                                                         0.110 g Fluorine-based surfactant (MCF312F (30% solution), manufactured by Dainippon Ink and Chemicals, Inc.)                                                         0.12g Methyl ethyl ketone 15.1 g 1-Methoxy-2-propanol 7.7g

Output 5 on the planographic printing plate precursor obtained from the above.
00 mW, wavelength 830 nm, beam diameter 17 μm (1 /
It was exposed at a main scanning speed of 5 m / sec using the semiconductor laser of e ² ) and kept at 25 ° C. This planographic printing plate original,
Automatic developing machine P filled with the above alkaline developing solutions
Development processing was performed with S900NP (manufactured by Fuji Photo Film Co., Ltd.) at a development temperature of 30 ° C. for 12 seconds. 50m ² , 100m ² , 200m ² , 300m ² , 40 without replenishment
It was treated with 0 m ² and 500 m ² . After the development processing was completed, a washing process was performed, followed by processing with gum (GU-7 (1: 1)) or the like to obtain a lithographic printing plate on which plate making was completed.

Regarding the lithographic printing plate thus prepared,
Evaluation was performed in the same manner as in Examples 1-60. The evaluation results are shown in Tables 8 to 9 for the developability in the non-image area, Tables 10 to 11 in the image area, and Tables 12 to 13 in the insoluble matter in the developing solution.

[0131]

[Table 8]

[0132]

[Table 9]

[0133]

[Table 10]

[0134]

[Table 11]

[0135]

[Table 12] Insoluble matter in developer

[0136]

[Table 13] Insoluble matter in developer

Claims (3)

[Claims] 1. An alkaline developing solution for a photosensitive lithographic printing plate, which comprises a compound represented by the following general formula (I). (In the formula, R ₁ , R ₂ and R ₃ are each independently a hydrogen atom, an alkyl group having 1 to 24 carbon atoms, an aryl group, an alkenyl group, an alkynyl group, an aralkyl group, an alkoxy group, an alkenyloxy group, an aryl group. Represents an oxy group or an aralkyloxy group, provided that at least two of R ₁ , R ₂ and R ₃ are not hydrogen atoms and A and B are each -C.
H ₂ CH ₂ O- or -CH ₂ CH (CH ₃₎ O- represents any, m represents an integer of 0 or 1 to 30, n represents an integer of 0 or 1 to 30, provided that the m Both n never become 0. ) 2. A method of making a lithographic printing plate, which comprises exposing an infrared-sensitive lithographic printing plate having an image forming layer containing an infrared absorbing dye to infrared rays and then developing the same with the alkaline developing solution according to claim 1. . 3. The plate-making method for a lithographic printing plate according to claim 2, wherein the infrared-sensitive lithographic printing plate is a positive type infrared-sensitive lithographic printing plate.