JP2003159639A - Clamp jig for glass substrate, buffer sheet, machining method for glass substrate, and glass substrate - Google Patents
Clamp jig for glass substrate, buffer sheet, machining method for glass substrate, and glass substrateInfo
- Publication number
- JP2003159639A JP2003159639A JP2001317136A JP2001317136A JP2003159639A JP 2003159639 A JP2003159639 A JP 2003159639A JP 2001317136 A JP2001317136 A JP 2001317136A JP 2001317136 A JP2001317136 A JP 2001317136A JP 2003159639 A JP2003159639 A JP 2003159639A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- peripheral edge
- glass
- processing
- outer peripheral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は多数の円環状のガラ
ス基板を重ねて保持するクランプ治具、ガラス基板間に
挟み込む緩衝シート、多数の円環状ガラス基板の内周端
と外周端に研削(面取り又は研磨)を施す方法およびこ
の方法によって得られたガラス基板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a clamp jig for stacking and holding a large number of annular glass substrates, a cushioning sheet sandwiched between the glass substrates, and grinding of inner and outer peripheral ends of a large number of annular glass substrates ( Chamfering or polishing) and a glass substrate obtained by this method.
【0002】[0002]
【従来の技術】ガラスはアルミニウムに比較して、耐衝
撃性、剛性、硬度、強度の面で優れているため、ハード
ディスクドライブ等に内蔵される磁気記録媒体として使
用されつつある。特に、最近ではパーソナルコンピュー
タの形態が、デスクトップ型からノートブック型やモバ
イル型に移行しつつあり、アルミニウム基板に代わっ
て、平坦性、高密度化に優れるガラス基板の需要が増し
ている。2. Description of the Related Art Since glass is superior to aluminum in impact resistance, rigidity, hardness and strength, it is being used as a magnetic recording medium incorporated in a hard disk drive or the like. In particular, recently, the form of a personal computer is shifting from a desktop type to a notebook type or a mobile type, and there is an increasing demand for a glass substrate excellent in flatness and high density instead of an aluminum substrate.
【0003】磁気記録媒体用ガラス基板を得るには、ガ
ラス素板から円盤状(ドーナッツ状)に切り抜き、この
円盤状ガラス基板の周端面(内周端と外周端)に例えば
特開平10−154321号公報にも開示されるように
ダイヤモンド砥石によるラッピングと、酸化セリウム懸
濁液によるポリッシングを施し、この後、表裏の記録面
(主表面)にアルミナ砥粒によるラッピングと、酸化セ
リウム懸濁液によるポリッシングを施すようにしてい
る。In order to obtain a glass substrate for a magnetic recording medium, a glass blank is cut into a disk shape (doughnut shape), and the peripheral end surfaces (inner peripheral edge and outer peripheral edge) of this disk glass substrate are, for example, disclosed in JP-A-10-154321. As disclosed in Japanese Patent Publication, lapping with a diamond grindstone and polishing with a cerium oxide suspension are performed. After that, lapping with alumina abrasive grains on the front and back recording surfaces (main surfaces) and cerium oxide suspension are performed. I try to polish it.
【0004】上述の方法ではガラス基板の加工が枚葉式
で効率が悪いため、多数枚のガラス基板を同時に研磨す
る方法が特開平11−221742号公報に開示されて
いる。この公報では、ガラス基板をそのままの状態で多
数枚積層してクランプしてブロック状にし、このブロッ
クの内孔に研磨ブラシまたは研磨パッドを臨ませ、研磨
液を供給しながら内孔即ち、多数のガラス基板の内周端
を同時に研磨するようにしている。In the above-mentioned method, since the processing of the glass substrate is a single-wafer type and the efficiency is low, a method of simultaneously polishing a large number of glass substrates is disclosed in Japanese Patent Laid-Open No. 11-221742. In this publication, a large number of glass substrates are stacked as they are and clamped into a block shape, and a polishing brush or a polishing pad is made to face the inner hole of this block. The inner peripheral edge of the glass substrate is polished at the same time.
【0005】[0005]
【発明が解決しようとする課題】上述した先行技術は以
下の課題を有している。先ず第1に、ガラス基板の内周
端については、多数のガラス基板を同時に研磨できる
が、外周端については基板ケース内にガラス基板を収め
たままであるので、外周端については内周端の研磨加工
とは全く別の工程で研磨加工しなければならない。即
ち、基板ケース内から多数のガラス基板を取り出し、枚
葉で外周端を研磨加工するか、或いは別のクランパに持
ち換えて同時に研磨加工することになる。しかしなが
ら、枚葉で処理すると効率が悪くなり、また他のクラン
パに持ち換えるのは工程が複雑になるだけでなく、持ち
換えの際に芯ずれを起こし、加工精度が悪くなる。The above-mentioned prior art has the following problems. First of all, for the inner peripheral edge of the glass substrate, a large number of glass substrates can be polished at the same time, but for the outer peripheral edge, the glass substrate remains contained in the substrate case, so the inner peripheral edge is polished for the outer peripheral edge. Polishing must be performed in a process completely different from the processing. That is, a large number of glass substrates are taken out from the substrate case, and the outer peripheral edge is polished by a single wafer, or it is carried to another clamper and simultaneously polished. However, if the processing is performed with a single sheet, the efficiency becomes poor, and the process of switching to another clamper not only complicates the process, but also causes a misalignment during the switching of the clamper, resulting in poor processing accuracy.
【0006】また第2に、ガラス基板同士を直接積層し
ているので、記録面に傷が生じやすい。即ち、研磨作業
の現場では多数のカレット(ガラス粉)が発生し、この
カレットがガラス基板間に挟まれ、クランプの圧力でガ
ラス基板側に埋入すると、深いクラック(25μm以
上)を発生させる。このように、ガラス基板の記録面に
クラックが存在すると、均一な磁性膜を形成することに
支障が生じるため、クラックが消失するまで研磨を行わ
なければならない。研磨代が厚くなればそれだけ研磨時
間が長くなり、ガラス基板自体も当該研磨代を見込んで
製造する必要があるので、厚くなってしまう。Secondly, since the glass substrates are directly laminated, the recording surface is apt to be scratched. That is, a large number of cullets (glass powder) are generated at the site of polishing work, the cullets are sandwiched between glass substrates, and when embedded on the glass substrate side by the pressure of the clamp, deep cracks (25 μm or more) are generated. As described above, the presence of cracks on the recording surface of the glass substrate hinders the formation of a uniform magnetic film, so that polishing must be performed until the cracks disappear. The thicker the polishing allowance is, the longer the polishing time is, and the glass substrate itself needs to be manufactured in consideration of the polishing allowance.
【0007】[0007]
【課題を解決するための手段】上記課題を解決するた
め、本発明に係るクランプ治具は、ガラス基板を多数枚
重ねたガラス基板ブロックの両端面に押し付けられ中央
に締結具挿通穴が形成された一対の第1プレートと、前
記ガラス基板ブロックの内孔に挿通され両端部が前記第
1プレートの締結具挿通穴に結着される第1の締結具
と、前記第1プレートの外側に配置され内径が第1プレ
ートの外径よりも小さな一対の第2プレートと、前記ガ
ラス基板ブロックの外側において一対の第2プレートを
締め付ける第2の締結具にて構成される。このクランプ
治具によれば、ガラス基板を多数枚重ねたガラス基板ブ
ロックのクランプ状態を解除することなく、連続して内
周端と外周端のラッピングまたはポリッシングを行うこ
とができる。In order to solve the above problems, a clamp jig according to the present invention is pressed against both end faces of a glass substrate block in which a large number of glass substrates are stacked and a fastener insertion hole is formed in the center. A pair of first plates, a first fastener that is inserted into the inner hole of the glass substrate block and has both ends bound to fastener insertion holes of the first plate, and is disposed outside the first plate. And a pair of second plates having an inner diameter smaller than the outer diameter of the first plate, and a second fastener for tightening the pair of second plates outside the glass substrate block. According to this clamp jig, the inner peripheral edge and the outer peripheral edge can be continuously lapped or polished without releasing the clamped state of the glass substrate block in which a large number of glass substrates are stacked.
【0008】また、本発明に係るガラス基板の加工方法
は、円環状をなすガラス基板の間に、当該ガラス基板の
内周端および外周端からはみ出さないように緩衝シート
を挟み込むとともに多数のガラス基板を重ね合せて外側
または内側からクランプし、内側からクランプした状態
で多数のガラス基板の外周端を同時に研削し、外側から
クランプした状態で多数のガラス基板の内周端を同時に
研削し、更に前記内周端と外周端の研削の切り替えの際
にもガラス基板のクランプ状態を維持する。上記におい
て、外周端の研削と内周端の研削はどちらを先に行って
もよい。また、研削には面取り、粗研磨(ラッピング)
及び研磨(ポリッシング)を含む。Further, in the method for processing a glass substrate according to the present invention, a buffer sheet is sandwiched between annular glass substrates so as not to protrude from the inner peripheral edge and the outer peripheral edge of the glass substrate, and a large number of glass substrates are sandwiched. The substrates are overlapped and clamped from the outside or inside, the outer peripheral edges of many glass substrates are ground at the same time when clamped from the inside, and the inner peripheral ends of many glass substrates are simultaneously ground when clamped from the outside. The clamped state of the glass substrate is maintained even when the grinding of the inner peripheral edge and the outer peripheral edge is switched. In the above, either of the outer peripheral edge grinding and the inner peripheral edge grinding may be performed first. For grinding, chamfering and rough polishing (lapping)
And polishing (polishing).
【0009】本発明によれば、多数のガラス基板の内周
端と外周端を連続して研削することができ、更にはラッ
ピング終了後にそのままポリッシングを行うことも可能
である。According to the present invention, it is possible to continuously grind the inner peripheral edge and the outer peripheral edge of a large number of glass substrates, and further it is possible to carry out polishing as it is after lapping is completed.
【0010】研削のうち面取りを施すには、例えば台金
にダイヤモンド砥粒を固着した砥石を回転接触せしめ
る。また、ラッピングやポリッシングを施すには、例え
ば研磨液を供給しつつ研磨ブラシまたは研磨パッドを回
転接触せしめる。For chamfering in grinding, for example, a grindstone having diamond abrasive grains fixed to a base metal is brought into rotary contact. To perform lapping or polishing, for example, a polishing brush or a polishing pad is rotated while being supplied with a polishing liquid.
【0011】また前記緩衝シートとしては、内径がガラ
ス基板の内径より大きく、外径がガラス基板の外径より
小さい樹脂製シートで、厚みが0.2mm以下のものを
用いることが好ましい。内径及び外径を上記の範囲とす
ることが、ラッピング不良やポリッシング不良を生じな
いために必要であり、また厚みを0.2mm以下とする
ことで、RC(Radial Curvature)を40nm以下に
することができる。As the buffer sheet, it is preferable to use a resin sheet having an inner diameter larger than the inner diameter of the glass substrate and an outer diameter smaller than the outer diameter of the glass substrate and having a thickness of 0.2 mm or less. It is necessary to set the inner diameter and the outer diameter within the above ranges in order to prevent lapping failure and polishing failure, and to reduce the RC (Radial Curvature) to 40 nm or less by setting the thickness to 0.2 mm or less. You can
【0012】また前記緩衝シートとしては、ロックウェ
ル硬度40以下の軟質材料からなるもの、軟質層と硬質
層(例えば圧縮弾性率が100MPa以上、好ましくは1
000MPa以上)の2層構造をなすもの、硬質層の両面
を軟質層で挟んだ3層構造をなすものなどが適当であ
る。尚、ロックウェル硬度と圧縮弾性率との関係は図1
4に示す。この図から軟質層の材料としては、PO(ポ
リオレフィン)、PU(ポリウレタン)、PE(ポリエ
チレン)、S(スエード)が挙げられ、硬質層の材料と
しては、PP(ポリプロピレン)、PVC(ポリ塩化ビ
ニル)、PET(ポリエチレンテレフタレート)および
PS(ポリエステル)が挙げられる。The buffer sheet is made of a soft material having a Rockwell hardness of 40 or less, and a soft layer and a hard layer (for example, the compressive elastic modulus is 100 MPa or more, preferably 1).
Those having a two-layer structure of 000 MPa or more) and those having a three-layer structure in which both surfaces of a hard layer are sandwiched by soft layers are suitable. The relationship between Rockwell hardness and compressive elastic modulus is shown in FIG.
4 shows. From this figure, examples of the material of the soft layer include PO (polyolefin), PU (polyurethane), PE (polyethylene), and S (suede), and examples of the material of the hard layer include PP (polypropylene) and PVC (polyvinyl chloride). ), PET (polyethylene terephthalate) and PS (polyester).
【0013】更に、前記緩衝シートとして、内周縁また
は外周縁に凸部を有するものを用い、この凸部がガラス
基板の内周端または外周端にかかるように緩衝シートを
ガラス基板に重ね合わせて研削を施し、ガラス基板の内
周縁または外周縁のうち前記凸部に対応する部分を研削
不完全部分として残すことで、品質管理用などのマーク
を研削と同時にガラス基板に形成することができる。Further, as the buffer sheet, one having a convex portion on the inner peripheral edge or the outer peripheral edge is used, and the buffer sheet is superposed on the glass substrate so that the convex portion may be applied to the inner peripheral edge or the outer peripheral edge of the glass substrate. By performing grinding and leaving a portion of the inner peripheral edge or the outer peripheral edge of the glass substrate corresponding to the convex portion as an incompletely ground portion, a mark for quality control or the like can be formed on the glass substrate simultaneously with the grinding.
【0014】[0014]
【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。図1は磁気記録媒体用ガラス
基板の製作手順を示すブロック図であり、先ず、ガラス
素板を打ち抜き円環状(円盤状)ガラス基板とし、この
ガラス基板の外端部と内端部に面取り加工を施し、次い
で外端部と内端部に研磨(ポリッシング)を施し、この
後記録面の粗研磨(ラッピング)を行った後、記録面の
研磨(ポリッシング)を行い、更にスクラブ洗浄の後、
表面を化学強化し、洗浄した後に検査を行って製品とす
る。本発明は上記の工程のうち、ガラス基板の面取り及
び端面の研磨に適用される。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a block diagram showing a procedure for manufacturing a glass substrate for a magnetic recording medium. First, a glass base plate is punched out into an annular (disc-shaped) glass substrate, and chamfering processing is performed on an outer end portion and an inner end portion of the glass substrate. Then, the outer edge and the inner edge are polished (polishing), after which the recording surface is roughly polished (lapping), then the recording surface is polished (polishing), and after scrub cleaning,
The surface is chemically strengthened, washed, and then inspected to obtain a product. The present invention is applied to chamfering of glass substrates and polishing of end faces among the above steps.
【0015】図2は本発明の実施に用いるクランプ冶具
の斜視図である。クランプ冶具は一対の第1プレート
1,1、一対の第2プレート2,2、一対の第1プレー
ト1,1間に挿着される第1の締結具3、一対の第2プ
レート2,2間に挿着される第2の締結具4からなる。FIG. 2 is a perspective view of a clamp jig used for implementing the present invention. The clamp jig includes a pair of first plates 1 and 1, a pair of second plates 2 and 2, a first fastener 3 inserted between the pair of first plates 1 and 1, a pair of second plates 2 and 2. It consists of a second fastener 4 inserted between them.
【0016】第1プレート1は外径がガラス基板gの外
径よりも小さく、内径がガラス基板gの内径と略同一の
円環状をなし、第2プレート2は外径がガラス基板gの
外径よりも大きく、内径が第1プレート1の外径よりも
小さい円環状をなす。そして第1および第2の締結具
3,4はいずれもボルトとナットの組み合わせからな
り、第2の締結具4は第2プレート2の周方向に等間隔
で3本設けられる。The outer diameter of the first plate 1 is smaller than that of the glass substrate g, and the inner diameter of the first plate 1 is substantially the same as the inner diameter of the glass substrate g. The second plate 2 has an outer diameter of the glass substrate g. It has an annular shape that is larger than the diameter and smaller in inner diameter than the outer diameter of the first plate 1. Each of the first and second fasteners 3 and 4 is a combination of a bolt and a nut, and three second fasteners 4 are provided at equal intervals in the circumferential direction of the second plate 2.
【0017】上記のクランプ冶具を用いてガラス基板g
の外端部を研削する場合には、後で図8に基づいて詳し
く述べるように、第1プレート1,1と第1の締結具3
を用い、ガラス基板gの内端部を研削する場合には、後
で図9に基づいて詳しく述べるように、第1プレート
1,1と第2プレート2,2と第2の締結具4を用い
る。Using the above clamp jig, a glass substrate g
In the case of grinding the outer end portion of the first plate 1, the first fastener 3 as described later in detail with reference to FIG.
In the case of grinding the inner end portion of the glass substrate g by using, the first plate 1, 1 and the second plate 2, 2 and the second fastener 4 are attached as described later in detail with reference to FIG. To use.
【0018】図3はガラス基板gを多数枚積層したガラ
ス基板ブロックGを示し、本発明はこのガラス基板ブロ
ックGに対して面取り、ラッピング、ポリッシング等を
施す。ガラス基板ブロックGはガラス基板gの間に緩衝
シート5を介在させている。FIG. 3 shows a glass substrate block G in which a large number of glass substrates g are laminated. In the present invention, the glass substrate block G is chamfered, lapped, polished or the like. In the glass substrate block G, the buffer sheet 5 is interposed between the glass substrates g.
【0019】ガラス基板gを直接積層した際に間にカレ
ットなどの異物が存在すると、記録面にクラックが入る
ことがある。そこで、緩衝シート5を介在させ、カレッ
トなどの異物を緩衝シート5に埋入せしめクラックが入
るのを防止する。このような目的のため、緩衝シート5
はガラス基板gよりも柔らかい材料を用いる必要があ
る。ただし、あまり柔らかいと積層してクランプしても
ガラス基板gが研磨中にずれるおそれがあるため、緩衝
シート5の好ましい硬度としてはロックウェル硬度で5
以上である。If foreign matter such as cullet is present between the glass substrates g directly laminated, cracks may occur on the recording surface. Therefore, the cushioning sheet 5 is interposed so that foreign matter such as cullet is embedded in the cushioning sheet 5 to prevent cracking. For such a purpose, the cushioning sheet 5
Needs to use a material softer than the glass substrate g. However, if it is too soft, the glass substrate g may be displaced during polishing even when laminated and clamped. Therefore, the preferable hardness of the buffer sheet 5 is 5 as Rockwell hardness.
That is all.
【0020】また、研削の際に緩衝シート5がガラス基
板の内端又は外端からはみ出ていると、その部分が研削
できないことになるので、緩衝シート5の内径は図4に
示すように、ガラス基板gの内径よりも例えば0.01
mm〜5.0mm大きく、ガラス基板gの外径よりも例
えば0.03mm〜10.0mm小さくしている。If the cushioning sheet 5 protrudes from the inner or outer end of the glass substrate during grinding, that portion cannot be ground. Therefore, the inner diameter of the cushioning sheet 5 is as shown in FIG. The inner diameter of the glass substrate g is, for example, 0.01
It is larger by mm to 5.0 mm and smaller than the outer diameter of the glass substrate g by, for example, 0.03 mm to 10.0 mm.
【0021】また、ガラス基板g間に緩衝シート5をセ
ットする際に、ずれてセットされてもガラス基板gの外
周から緩衝シート5がはみ出さないためには、ガラス基
板gの外径寸法と緩衝シート5の外径寸法の差が、ガラ
ス基板gの内径寸法と緩衝シート5の内径寸法の差の2
倍以上とすることが好ましい。Further, when the buffer sheet 5 is set between the glass substrates g, in order to prevent the buffer sheet 5 from protruding from the outer periphery of the glass substrate g even if the buffer sheets 5 are set in a misaligned manner, the outer diameter of the glass substrate g and The difference in the outer diameter dimension of the cushioning sheet 5 is equal to 2 of the difference between the inner diameter dimension of the glass substrate g and the inner diameter dimension of the cushioning sheet 5.
It is preferable that the number is twice or more.
【0022】また、図5(a)および(b)は緩衝シー
トの別実施例をしめす断面図であり、緩衝シート5とし
ては、(a)に示すように、軟質層51と硬質層52の
2層構造とするか、(b)に示すように、硬質層52の
両面を軟質層51で挟んだ3層構造としてもよい。また
硬質層52としては圧縮弾性率が100MPa以上好まし
くは1000MPa以上の材料を用いる。5 (a) and 5 (b) are sectional views showing another embodiment of the cushioning sheet. As the cushioning sheet 5, as shown in FIG. 5 (a), a soft layer 51 and a hard layer 52 are provided. It may have a two-layer structure or, as shown in (b), a three-layer structure in which both surfaces of the hard layer 52 are sandwiched by the soft layers 51. As the hard layer 52, a material having a compressive elastic modulus of 100 MPa or more, preferably 1000 MPa or more is used.
【0023】圧縮弾性率とロックウェル硬度との関係は
図14に示す通りであり、圧縮弾性率が100MPa以上
の材料としては、PP(ポリプロピレン)、PVC(ポ
リ塩化ビニル)、PET(ポリエチレンテレフタレー
ト)およびPS(ポリエステル)が挙げられる。本発明
の緩衝シートは、硬質層および軟質層を構成するものの
圧縮弾性率Y(Mpa)とロックウェル硬度Rの関係
が、図14の二つの点線で示される式、logY=0.0
22R+0.78およびlogY=0.022R−0.4
2で挟まれる領域にある材料のシートの一つまたはそれ
らの積層体で構成される。The relationship between the compression elastic modulus and the Rockwell hardness is as shown in FIG. 14, and as the material having the compression elastic modulus of 100 MPa or more, PP (polypropylene), PVC (polyvinyl chloride), PET (polyethylene terephthalate). And PS (polyester). In the cushioning sheet of the present invention, the relationship between the compression elastic modulus Y (Mpa) and the Rockwell hardness R of the hard layer and the soft layer is expressed by two dotted lines in FIG. 14, logY = 0.0.
22R + 0.78 and logY = 0.022R-0.4
It is composed of one of the sheets of material or a laminate thereof in the area sandwiched by two.
【0024】図6はRC(Radial Curvature)と緩衝
シートの厚さとの関係を示すグラフである。ここで、R
Cは図7に示すように、円盤状のガラス基板gの中心か
ら所定寸法距離だけ離れた半径R1の位置と記録面のほ
ぼ端に相当する円盤状のガラス基板gの中心から半径R
2の位置との間で、半径方向に生じるガラス基板gのだ
れ部分AB間において測定した最大距離で示される特性
で、一般にRCが42μm以下が要求される。この要求
を満たすには図6から緩衝シート5の厚みは0.2mm
以下とすべきであることが分かる。FIG. 6 is a graph showing the relationship between RC (Radial Curvature) and the thickness of the buffer sheet. Where R
As shown in FIG. 7, C is the radius R1 from the center of the disk-shaped glass substrate g corresponding to the position of the radius R1 separated from the center of the disk-shaped glass substrate g by a predetermined dimension distance and almost the end of the recording surface.
The RC is generally required to be 42 μm or less as a characteristic indicated by the maximum distance measured between the sagging portions AB of the glass substrate g generated in the radial direction between the two positions. To satisfy this requirement, the thickness of the cushioning sheet 5 is 0.2 mm from FIG.
It turns out that it should be:
【0025】次に、ガラス基板gの外端部と内端部に面
取りを行う手順を図8及び図9に基づいて説明する。先
ず、多数の円環状ガラス基板gを間に緩衝シート5を挟
んで積層してガラス基板ブロックGとする。そして、前
記クランプ治具の第1プレート1,1をガラス基板ブロ
ックGの両端面に当て、第1プレート1,1及びガラス
基板ブロックGの中央穴に第1の締結具3を挿通し、ガ
ラス基板ブロックGを内側からクランプし、外端面を回
転砥石6にて面取り加工する。Next, the procedure for chamfering the outer and inner ends of the glass substrate g will be described with reference to FIGS. 8 and 9. First, a large number of annular glass substrates g are laminated with a buffer sheet 5 interposed therebetween to form a glass substrate block G. Then, the first plates 1 and 1 of the clamp jig are applied to both end surfaces of the glass substrate block G, and the first fastener 3 is inserted through the central holes of the first plate 1 and 1 and the glass substrate block G. The substrate block G is clamped from the inside, and the outer end surface is chamfered with the rotary grindstone 6.
【0026】回転砥石6は台金にダイヤモンド砥粒を固
着し、外周面形状は目的とする面取り形状に合わせた凹
凸形状となっている。そして、ガラス基板gの内端部を
面取りするにはガラス基板ブロックGを回転しつつ、回
転砥石6も回転せしめる。The rotary grindstone 6 has diamond abrasive grains fixed to a base metal, and the outer peripheral surface has an uneven shape corresponding to the intended chamfered shape. Then, in order to chamfer the inner end portion of the glass substrate g, while rotating the glass substrate block G, the rotary grindstone 6 is also rotated.
【0027】上記によって多数のガラス基板gの外端部
の面取り加工を同時に行った後、ガラス基板ブロックG
を崩すことなく、クランプ状態を維持したまま、クラン
プ治具の第2プレート2,2を第1プレート1,1の外
側に当て、更に第2プレート2,2間に3本の第2の締
結具4を挿通し、ガラス基板ブロックGを外側からクラ
ンプする。この後、第1の締結具3を取り外し、図9に
示すように、ガラス基板ブロックGの中央穴内に別の回
転砥石7を用いて多数のガラス基板gの内端部を同時に
面取り加工する。After simultaneously chamfering the outer edges of a large number of glass substrates g as described above, the glass substrate block G is formed.
The second plate 2, 2 of the clamp jig is applied to the outside of the first plate 1, 1 while maintaining the clamped state without breaking the plate, and the third second fastening between the second plates 2 and 2 is performed. The tool 4 is inserted and the glass substrate block G is clamped from the outside. After that, the first fastener 3 is removed, and as shown in FIG. 9, another rotary grindstone 7 is used in the central hole of the glass substrate block G to simultaneously chamfer the inner end portions of many glass substrates g.
【0028】この後、図10及び図11に示すように、
研磨液を供給しつつナイロンなどの研磨ブラシまたは研
磨パッド8,9を用いて、多数のガラス基板gをブロッ
クGの状態にして、面取りした外端部および内端部を酸
化セリウム微粒子が懸濁した研磨液を用いて研磨(ポリ
ッシング)する。Thereafter, as shown in FIGS. 10 and 11,
Using a polishing brush or polishing pads 8 and 9 made of nylon or the like while supplying a polishing liquid, a large number of glass substrates g are placed in a block G state, and the chamfered outer and inner ends are suspended with cerium oxide fine particles. Polishing (polishing) is performed using the polishing liquid.
【0029】尚、実施例ではガラス基板gの外端部を先
に加工し、この後内端部の加工を行うようにしたが、ど
ちらを先に加工してもよい。In the embodiment, the outer end of the glass substrate g is processed first, and then the inner end is processed, but either may be processed first.
【0030】図12は緩衝シートの別実施例を示し、
(a)に示す緩衝シート5は外周部に凸部5aを有し、
(b)に示す緩衝シート5は内周部に凸部5bを有して
いる。このように外周部または内周部に凸部5a,5b
を有する緩衝シート5を、当該凸部5a,5bがガラス
基板gの外端部または内端部にかかるように重ね、この
状態でラッピングまたはポリッシングを行うことで、当
該凸部5a,5bに覆われる部分が十分にラッピングま
たはポリッシングされないことになり、図13に示すよ
うに、外端部または内端部に積極的にマークmを形成す
ることができる。FIG. 12 shows another embodiment of the cushioning sheet,
The cushioning sheet 5 shown in (a) has a convex portion 5a on the outer periphery,
The cushioning sheet 5 shown in (b) has a convex portion 5b on the inner peripheral portion. In this way, the convex portions 5a, 5b are formed on the outer peripheral portion or the inner peripheral portion.
The cushioning sheet 5 having the above is overlapped so that the convex portions 5a and 5b overlap the outer end portion or the inner end portion of the glass substrate g, and lapping or polishing is performed in this state to cover the convex portions 5a and 5b. The exposed portion is not sufficiently lapped or polished, and the mark m can be positively formed at the outer end portion or the inner end portion as shown in FIG.
【0031】上記マークmは、例えばロットごとの製品
番号、生産工場、生産日時などの製品管理に用いること
ができる。ただし、あまり研磨不充分な箇所が多くなる
と品質に影響してくるため、凸部5a,5bの大きさ及
び数は品質に影響しない範囲とする。The mark m can be used for product management such as a product number for each lot, a production factory, a production date and time. However, since the quality is affected if the number of insufficiently polished portions is large, the size and number of the convex portions 5a and 5b are set within a range that does not affect the quality.
【0032】次に、材料と層構造を異ならせた各種緩衝
シートを用いて研磨した実験結果を以下の(表)に示
す。実験は以下の条件で行った。外周および内周の端面
・面取加工は、それぞれ外径寸法80mmφおよび外径
寸法22mmφを有し、所定断面形状の溝を10個有す
る10溝タイプ研削砥石を使用して、クランプ冶具で束
ねた10枚のガラスを同時に加工した。砥石は10個の
溝に♯500のダイヤモンド砥石を台金に付着させた砥
石を用いた。このとき種々の材質の緩衝シートをガラス
板の間に挟んで行った。その後行った研磨ポリッシング
は、ナイロンブラシロールを用いて酸化セリウム粒子を
懸濁させた研磨液を供給しながら行った。その後ガラス
をクランプ冶具からはずして、ガラスの束ねを解除して
ガラス板の主表面(記録面)を平均粒度0.5〜1.7
μmの酸化セリウム研磨砥粒を含む研磨液と研磨パッド
を用いて、片面あたり25μm研磨し、洗浄、乾燥をし
た。続いて硝酸カリウムと硝酸ナトリウムの混合溶融塩
を用いるイオン交換による化学強化処理を行い、再度洗
浄乾燥して、主表面についてのキズの検査を行った。な
お、ダイヤモンド砥石を用いるガラス基板の外周端面加
工及び内周端面加工(研削)を1枚づつ枚葉式で行い、
その後酸化セリウム研磨液を供給しながら、研磨パッド
または研磨ブラシを用いて行う内周端および外周端の研
磨加工を、多数枚のガラス基板をクランプで束ねて保持
固定し、多数枚のガラス基板を一括研磨方式で行っても
よい。Next, the following table shows the experimental results obtained by polishing using various buffer sheets having different materials and layer structures. The experiment was conducted under the following conditions. The end face and chamfering of the outer and inner circumferences were bundled with a clamp jig using a 10-groove grinding wheel having an outer diameter of 80 mmφ and an outer diameter of 22 mmφ, each having 10 grooves of a predetermined cross-sectional shape. 10 sheets of glass were processed simultaneously. The grindstone used was a grindstone in which # 500 diamond grindstone was attached to a base metal in 10 grooves. At this time, buffer sheets of various materials were sandwiched between glass plates. The subsequent polishing polishing was performed while supplying a polishing liquid in which cerium oxide particles were suspended using a nylon brush roll. After that, the glass is removed from the clamp jig, the bundling of the glass is released, and the main surface (recording surface) of the glass plate has an average grain size of 0.5 to 1.7.
Using a polishing liquid containing a cerium oxide abrasive grain of μm and a polishing pad, 25 μm was polished on each side, washed and dried. Subsequently, a chemical strengthening treatment was carried out by ion exchange using a mixed molten salt of potassium nitrate and sodium nitrate, followed by washing and drying again, and the main surface was inspected for scratches. In addition, the outer peripheral end surface processing and the inner peripheral end surface processing (grinding) of a glass substrate using a diamond grindstone are performed one by one in a single-wafer type,
After that, while supplying the cerium oxide polishing liquid, a large number of glass substrates are held and fixed by bundling a number of glass substrates with a clamp for polishing the inner peripheral edge and the outer peripheral edge using a polishing pad or a polishing brush. It may be performed by a batch polishing method.
【0033】[0033]
【表1】 [Table 1]
【0034】上記(表)において、実施例1〜6は、い
ずれもロックウェル硬度が40MPa以下の単層からな
る緩衝シートを用いた例であり、ガラス主表面のキズの
発生は抑制され、500Wの照明ランプで照射した目視
検査法では、キズが認められないことを合格としたとき
の歩留まりとして、92%以上の高い数値が得られた。
このうち、実施例1は、緩衝シートの全厚味が0.27
5mmと最も厚く、このときラジアルカーベチャーが1
78nmと大きな値を示した。これに対して、実施例2
〜7の緩衝シートは厚味を0.2mm以下の薄い厚味に
したので、ラジアルカーベチャーは45nm以下の小さ
い特性が得られた。比較例1〜3は硬質材料からなる単
層の緩衝シートであり、主表面のキズ発生が見られ、キ
ズ歩留まりは78%以下と低い値であった。比較例の三
者の中でも、厚味が厚い比較例2は、ラジアルカーベチ
ャーが大きな値を示し、磁気記録媒体用基板の製造用と
しては、適していないことが分る。また緩衝シートの作
業性は、シートの厚味、材質に起因する濡れた状態での
ガラスとの密着性、腰の強さなどにより、ガラス面への
セットのし易さ、濡れたガラス面からはずすときで作業
性評価点が異なったものと考えられる。In the above (Table), each of Examples 1 to 6 is an example in which a buffer sheet composed of a single layer having a Rockwell hardness of 40 MPa or less is used, and the occurrence of scratches on the glass main surface is suppressed, and 500 W is obtained. In the visual inspection method of irradiating with the illumination lamp of No. 2, a high numerical value of 92% or more was obtained as the yield when passing the condition that no flaw was recognized.
Of these, in Example 1, the total thickness of the buffer sheet was 0.27.
5mm thickest, with 1 radial carvecher
The value was as large as 78 nm. On the other hand, Example 2
Since the buffer sheets of ~ 7 had a thin thickness of 0.2 mm or less, the radial curve betcha obtained a small characteristic of 45 nm or less. Comparative Examples 1 to 3 are single-layer buffer sheets made of a hard material, in which scratches were observed on the main surface, and the scratch yield was a low value of 78% or less. Among the three Comparative Examples, Comparative Example 2 having a large thickness has a large radial curve, and it is found that it is not suitable for manufacturing a magnetic recording medium substrate. In addition, the workability of the cushioning sheet depends on the thickness of the sheet, the adhesion to the glass in the wet state due to the material, the strength of the waist, etc., the ease of setting on the glass surface, the wet glass surface It is considered that the workability evaluation points were different when they were removed.
【0035】[0035]
【発明の効果】以上に説明したように本発明によれば、
磁気記録媒体などとして用いるガラス基板の内周端及び
外周端をラッピングまたはポリッシングするにあたり、
多数枚を同時に処理できるため、大幅なコストダウンを
図ることができる。As described above, according to the present invention,
When lapping or polishing the inner peripheral edge and outer peripheral edge of a glass substrate used as a magnetic recording medium,
Since a large number of sheets can be processed at the same time, a significant cost reduction can be achieved.
【0036】また、内周端のラッピングまたはポリッシ
ングに引き続いて外周端のラッピングまたはポリッシン
グを行うにあたり、多数のガラス基板のクランプ状態を
解除せずにそのままの状態を維持することができるの
で、持ち替えの際のずれが生じることがない。In addition, when lapping or polishing the outer peripheral edge subsequent to the lapping or polishing of the inner peripheral edge, it is possible to maintain the clamped state of a large number of glass substrates without releasing the clamped state. There is no gap between the edges.
【0037】また、多数枚のガラス基板を積層する際
に、ガラス基板間に緩衝シートを挟み込むようにしたの
で、仮にカレットなどの異物がガラス基板間に挟み込ま
れた場合でも、緩衝シートに埋入し、ガラス基板の記録
面にクラックなどを生じることがない。Since a buffer sheet is sandwiched between the glass substrates when a large number of glass substrates are laminated, even if foreign matter such as cullet is sandwiched between the glass substrates, it is embedded in the buffer sheets. However, cracks and the like do not occur on the recording surface of the glass substrate.
【0038】また、多数のガラス基板を重ねるときに用
いる本発明の緩衝シートによれば、そのロックウェル硬
度が所定の値を有するので、ガラス基板の主表面(記録
面)にキズを生じることが抑制される。また、軟質層と
の多層構造の緩衝シートとすることにより、更にガラス
基板の横ズレが抑止され、端面の面取りおよびポリッシ
ングを真円形状にすることができる。Further, according to the buffer sheet of the present invention used for stacking a large number of glass substrates, since the Rockwell hardness thereof has a predetermined value, scratches may occur on the main surface (recording surface) of the glass substrate. Suppressed. Further, by using a buffer sheet having a multilayer structure with the soft layer, lateral displacement of the glass substrate can be further suppressed, and chamfering of the end face and polishing can be made into a perfect circular shape.
【0039】更に、緩衝シートの一部に凸部を設け、こ
の凸部がガラス基板の内端部や外端部にかかるようにラ
ッピングまたはポリッシングすることで、簡単に品質な
どを管理するためのマークを形成することができる。Further, a convex portion is provided on a part of the buffer sheet, and lapping or polishing is performed so that the convex portion may be applied to the inner end portion or the outer end portion of the glass substrate, so that the quality and the like can be easily controlled. Marks can be formed.
【図1】磁気記録媒体用ガラス基板の製作手順を示すブ
ロック図FIG. 1 is a block diagram showing a manufacturing procedure of a glass substrate for a magnetic recording medium.
【図2】クランプ治具の斜視図FIG. 2 is a perspective view of a clamp jig.
【図3】多数のガラス基板を積層したガラス基板ブロッ
クの側面図FIG. 3 is a side view of a glass substrate block in which many glass substrates are stacked.
【図4】ガラス基板の上に緩衝シートを重ねた状態を示
す平面図FIG. 4 is a plan view showing a state in which a buffer sheet is stacked on a glass substrate.
【図5】(a)および(b)は緩衝シートの別実施例を
しめす断面図5A and 5B are cross-sectional views showing another embodiment of the cushioning sheet.
【図6】RC(Radial Curvature)と緩衝シートの厚
さとの関係を示すグラフFIG. 6 is a graph showing the relationship between RC (Radial Curvature) and the thickness of the buffer sheet.
【図7】RC(Radial Curvature)の概念図[Figure 7] Conceptual diagram of RC (Radial Curvature)
【図8】ガラス基板の外端部を面取りしている状態の側
面図FIG. 8 is a side view showing a state where the outer edge of the glass substrate is chamfered.
【図9】ガラス基板の内端部を面取りしている状態の側
面図FIG. 9 is a side view showing a state where the inner end portion of the glass substrate is chamfered.
【図10】ガラス基板の外端部を研磨している状態の側
面図FIG. 10 is a side view showing a state where the outer end portion of the glass substrate is being polished.
【図11】ガラス基板の内端部を研磨している状態の側
面図FIG. 11 is a side view showing a state where the inner end portion of the glass substrate is being polished.
【図12】(a)は外周部に凸部を有する緩衝シートの
平面図、(b)は内周部に凸部を有する緩衝シートの平
面図12A is a plan view of a cushioning sheet having a convex portion on an outer peripheral portion, and FIG. 12B is a plan view of a cushioning sheet having a convex portion on an inner peripheral portion.
【図13】凸部を有する緩衝シートを用いて製作された
ガラス基板を示す図FIG. 13 is a diagram showing a glass substrate manufactured using a buffer sheet having a convex portion.
【図14】弾性圧縮率とロックウェル硬度との関係を示
す図FIG. 14 is a diagram showing the relationship between elastic compressibility and Rockwell hardness.
1…クランプ治具の第1プレート、2…クランプ治具の
第2プレート、3…クランプ治具の第1の締結具、4…
クランプ治具の第2の締結具、5…緩衝シート、5a、
5b…凸部、51…軟質層、52…硬質層、6,7…回
転砥石、8,9…研磨ブラシまたは研磨パッド、g…ガ
ラス基板、G…ガラス基板ブロック、m…マーク。DESCRIPTION OF SYMBOLS 1 ... 1st plate of a clamp jig, 2 ... 2nd plate of a clamp jig, 3 ... 1st fastener of a clamp jig, 4 ...
Second fastener of clamp jig, 5 ... Buffer sheet, 5a,
5b ... Convex part, 51 ... Soft layer, 52 ... Hard layer, 6,7 ... Rotating grindstone, 8,9 ... Polishing brush or polishing pad, g ... Glass substrate, G ... Glass substrate block, m ... Mark.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松野 賢介 大阪府大阪市中央区北浜四丁目7番28号 日本板硝子株式会社内 (72)発明者 渡辺 武夫 大阪府大阪市中央区北浜四丁目7番28号 日本板硝子株式会社内 Fターム(参考) 3C043 BB05 CC03 DD05 3C049 AA18 AB04 AB08 CA01 CA06 4G059 AA08 AB19 AC03 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Kensuke Matsuno 7-28 Kitahama 4-28, Chuo-ku, Osaka City, Osaka Prefecture Within Nippon Sheet Glass Co., Ltd. (72) Inventor Takeo Watanabe 7-28 Kitahama 4-28, Chuo-ku, Osaka City, Osaka Prefecture Within Nippon Sheet Glass Co., Ltd. F term (reference) 3C043 BB05 CC03 DD05 3C049 AA18 AB04 AB08 CA01 CA06 4G059 AA08 AB19 AC03
Claims (17)
保持するクランプ治具において、このクランプ治具はガ
ラス基板を多数枚重ねたガラス基板ブロックの両端面に
押し付けられ中央に締結具挿通穴が形成された一対の第
1プレートと、前記ガラス基板ブロックの内孔に挿通さ
れ両端部が前記第1プレートの締結具挿通穴に結着され
る第1の締結具と、前記第1プレートの外側に配置され
内径が第1プレートの外径よりも小さな一対の第2プレ
ートと、前記ガラス基板ブロックの外側において一対の
第2プレートを締め付ける第2の締結具とを備えるガラ
ス基板のクランプ治具。1. A clamp jig for stacking and holding a large number of annular glass substrates, wherein the clamp jig is pressed against both end faces of a glass substrate block in which a large number of glass substrates are stacked, and a fastener insertion hole is formed in the center. A pair of first plates formed with the first plate, a first fastener that is inserted into the inner hole of the glass substrate block, and both ends thereof are bound to fastener insertion holes of the first plate; A glass substrate clamping jig including a pair of second plates arranged outside and having an inner diameter smaller than the outer diameter of the first plate, and a second fastener for tightening the pair of second plates outside the glass substrate block. .
緩衝シートであって、この緩衝シートは、ロックウェル
硬度40以下の軟質材料からなることを特徴とする緩衝
シート。2. A buffer sheet sandwiched between annular glass substrates, wherein the buffer sheet is made of a soft material having a Rockwell hardness of 40 or less.
緩衝シートであって、この緩衝シートは、軟質層と硬質
層の2層構造をなすことを特徴とする緩衝シート。3. A buffer sheet sandwiched between annular glass substrates, the buffer sheet having a two-layer structure of a soft layer and a hard layer.
緩衝シートであって、この緩衝シートは、硬質層の両面
を軟質層で挟んだ3層構造をなすことを特徴とする緩衝
シート。4. A buffer sheet sandwiched between annular glass substrates, wherein the buffer sheet has a three-layer structure in which both sides of a hard layer are sandwiched by soft layers.
ートにおいて、前記硬質層は圧縮弾性率が100MPa以
上であることを特徴とする緩衝シート。5. The buffer sheet according to claim 3 or 4, wherein the hard layer has a compression elastic modulus of 100 MPa or more.
トにおいて、緩衝シートの厚みは0.2mm以下である
ことを特徴とする緩衝シート。6. The cushioning sheet according to any one of claims 2 to 5, wherein the cushioning sheet has a thickness of 0.2 mm or less.
トにおいて、緩衝シートは、内径がガラス基板の内径よ
り大きく、外径がガラス基板の外径より小さく成形され
ていることを特徴とする緩衝シート。7. The cushioning sheet according to claim 2, wherein the cushioning sheet is formed such that the inner diameter is larger than the inner diameter of the glass substrate and the outer diameter is smaller than the outer diameter of the glass substrate. Cushioning sheet.
記ガラス基板の間に請求項2乃至請求項7に記載の緩衝
シートを挟み込んで重ね合わせ,前記ガラス基板を外周
側または内周側からクランプし、前記クランプしていな
い側を研削することを特徴とするガラス基板の加工方
法。8. A plurality of annular glass substrates are stacked by sandwiching the buffer sheet according to any one of claims 2 to 7 between the glass substrates, and the glass substrates are placed on an outer peripheral side or an inner peripheral side. The method for processing a glass substrate is characterized in that the glass substrate is clamped from the glass substrate and the non-clamped side is ground.
ラス基板の内周端および外周端からはみ出さないように
緩衝シートを挟み込むとともに多数のガラス基板を重ね
合せて外側または内側からクランプし、内側からクラン
プした状態で多数のガラス基板の外周端を同時に研削
し、外側からクランプした状態で多数のガラス基板の内
周端を同時に研削し、更に前記内周端と外周端の研削の
切り替えの際にもガラス基板のクランプ状態を維持する
ことを特徴とするガラス基板の加工方法。9. A buffer sheet is sandwiched between annular glass substrates so as not to protrude from the inner and outer peripheral edges of the glass substrates, and a large number of glass substrates are stacked and clamped from the outside or inside. , The outer peripheral edges of many glass substrates are ground at the same time when clamped from the inside, and the inner peripheral edges of many glass substrates are simultaneously ground when clamped from the outside, and the grinding is switched between the inner peripheral edge and the outer peripheral edge. A method of processing a glass substrate, characterized in that the clamped state of the glass substrate is maintained even in the case of.
法において、前記外周端および内周端の研削が、合金に
ダイヤモンド砥粒を固着した砥石を回転接触せしめて行
う面取りであることを特徴とするガラス基板の加工方
法。10. The method for processing a glass substrate according to claim 9, wherein the grinding of the outer peripheral edge and the inner peripheral edge is chamfering performed by bringing a grindstone having diamond abrasive grains fixed to an alloy into rotational contact. And a method of processing a glass substrate.
法において、前記外周端および内周端の研削が、研磨液
を供給しつつ研磨ブラシまたは研磨パッドを回転接触せ
しめて行うポリッシングであることを特徴とするガラス
基板の加工方法。11. The method for processing a glass substrate according to claim 9, wherein the grinding of the outer peripheral edge and the inner peripheral edge is polishing performed by rotating a polishing brush or a polishing pad while supplying a polishing liquid. And a method of processing a glass substrate.
ガラス基板のクランプ状態を解除することなく維持した
状態で、研磨液を供給しつつ研磨ブラシまたは研磨パッ
ドを回転接触せしめて外周端および内周端をポリッシン
グすることを特徴とするガラス基板の加工方法。12. After the grinding according to claim 9, while continuously holding the clamped state of the glass substrate without releasing it, the polishing brush or polishing pad is rotated and brought into contact with the outer peripheral edge while supplying the polishing liquid. A method for processing a glass substrate, which comprises polishing the inner peripheral edge.
ス基板の加工方法において、前記緩衝シートは請求項2
乃至請求項7に記載したものを用いることを特徴とする
ガラス基板の加工方法。13. The method of processing a glass substrate according to claim 9, wherein the cushioning sheet is formed according to claim 2.
A method of processing a glass substrate, wherein the glass substrate according to claim 7 is used.
ス基板の加工方法において、前記緩衝シートとして、内
周縁または外周縁に凸部を有するものを用い、この凸部
がガラス基板の内周端または外周端にかかるように緩衝
シートをガラス基板に重ね合わせて研削を施し、ガラス
基板の内周縁または外周縁のうち前記凸部に対応する部
分を研削不完全部分として残すことを特徴とするガラス
基板の加工方法。14. The glass substrate processing method according to claim 9, wherein the buffer sheet has a convex portion on an inner peripheral edge or an outer peripheral edge, and the convex portion is an inner peripheral surface of the glass substrate. It is characterized in that a cushioning sheet is superposed on a glass substrate so as to be overlapped with an edge or an outer peripheral edge and is ground, and a portion corresponding to the convex portion of the inner peripheral edge or the outer peripheral edge of the glass substrate is left as an incompletely ground portion. Glass substrate processing method.
方法によって得られたことを特徴とするガラス基板。15. A glass substrate obtained by the processing method according to claim 8.
方法によって得られたことを特徴とするガラス基板。16. A glass substrate obtained by the method for processing a glass substrate according to claim 13.
方法によって得られたガラス基板であって、内周端また
は/および外周端に不完全な研削によりマークが形成さ
れていることを特徴とするガラス基板。17. A glass substrate obtained by the method for processing a glass substrate according to claim 14, wherein the inner peripheral edge and / or the outer peripheral edge have marks formed by incomplete grinding. Glass substrate.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001317136A JP3933432B2 (en) | 2001-09-10 | 2001-10-15 | Glass substrate clamping jig, glass substrate processing method, and glass substrate |
MYPI20022943A MY136450A (en) | 2001-09-10 | 2002-08-07 | Clamping jig for glass substrate, buffer sheet, method for processing glass substrate, and glass substrate |
US10/215,893 US20030082999A1 (en) | 2001-09-10 | 2002-08-08 | Clamping jig for glass substrate, buffer sheet, method for processing glass substrate, and glass substrate |
US11/003,148 US20050101230A1 (en) | 2001-09-10 | 2004-12-03 | Clamping jig for glass substrate, buffer sheet, method for processing glass substrate, and glass substrate |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001273581 | 2001-09-10 | ||
JP2001-273581 | 2001-09-10 | ||
JP2001317136A JP3933432B2 (en) | 2001-09-10 | 2001-10-15 | Glass substrate clamping jig, glass substrate processing method, and glass substrate |
Publications (2)
Publication Number | Publication Date |
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JP2003159639A true JP2003159639A (en) | 2003-06-03 |
JP3933432B2 JP3933432B2 (en) | 2007-06-20 |
Family
ID=26621913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2001317136A Expired - Lifetime JP3933432B2 (en) | 2001-09-10 | 2001-10-15 | Glass substrate clamping jig, glass substrate processing method, and glass substrate |
Country Status (3)
Country | Link |
---|---|
US (2) | US20030082999A1 (en) |
JP (1) | JP3933432B2 (en) |
MY (1) | MY136450A (en) |
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Also Published As
Publication number | Publication date |
---|---|
MY136450A (en) | 2008-10-31 |
US20050101230A1 (en) | 2005-05-12 |
US20030082999A1 (en) | 2003-05-01 |
JP3933432B2 (en) | 2007-06-20 |
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