JP2003074800A - Fluid controller, heat treatment device and fluid control method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce a cost by commonly using a plurality of gas lines, to implement compactness by reducing the number of the gas lines, and to facilitate expansion of gas kinds. SOLUTION: In this fluid controller 11, the single-system fluid supply line 13 is provided with a flow controller 13g, a pressure control system area 14 is provided on the upstream side of the flow controller 13g, the single-system line 13 of the pressure control system area 14 is connected with a plurality of fluid supply sources A, B, C, and a nearly L-shaped extension line 15 extended on this side in a view from the front of the single-system line 13 of the pressure control system area 14 is provided to coaxially configure the single-system line 13. The extension line 15 is formed with a plurality of fluid supply ports 16a, 16b, 16c connected to the fluid supply sources A, B, C.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluid control apparatus and a heat treatment apparatus and a fluid control method for semiconductor manufacturing, etc. The present invention relates to a fluid control apparatus, a heat treatment apparatus, and a fluid control method that enable downsizing and cost reduction, etc. by controlling and sharing different types of gas in one system as prerequisites.

[0002]

2. Description of the Related Art In a semiconductor manufacturing process, it is often the case that many kinds of gases are used by switching over time, or the same kind of gas is used at different flow rates. In the semiconductor manufacturing process, for example, in the film forming process, film formation is performed on a semiconductor wafer by combining a plurality of kinds of gases. In this case, 1
Since one type of gas control line is provided for each type of gas, a plurality of types of gas lines are eventually required.

FIG. 10 is a schematic circuit diagram showing a conventional example in which various gases are supplied from a plurality of gas lines into a reaction processing furnace for semiconductor manufacturing. In FIG. 10, a, b, and
Gas supply line for supplying gases c and d and purge gas p
It is composed of a purge gas line for introducing.

The gas supply lines a, b, c, d
, A pressure control area such as a switching valve 2, a filter 3, a pressure regulator 4, a pressure sensor 5 and a control valve 2a are individually provided in each line upstream of a flow rate controller 1 such as a mass flow controller. There is. Further, a branch line p ′ branched from the purge line p is connected to the primary side of the flow rate controller 1.

However, according to this conventional example, since a flow rate controller is provided for each system of one system of gas control line for one type of gas, it is often attempted to supply various gases. This requires different types of gas lines, a large housing for accommodating the gas lines, and a large number of flow rate controllers, and as a result, not only becomes a factor of cost increase, but also causes major problems such as an increase in equipment footprint. Have

Therefore, in order to solve the above-mentioned problem that it is impossible to reduce the size and cost of the gas supply device if a flow rate controller is provided for each supply gas system to control the flow rate, No. 2000-323464 has been proposed. That is, according to the publication, as shown in the schematic circuit diagram of FIG. 11, the gas supply line a is constituted by a gas supply line for supplying gas a, b, c, d and a purge gas line for introducing a purge gas line p. , B, c are provided with a flow rate controller 6 such as a shared mass flow controller, and each line is provided with a pressure control section such as a switching valve 7, a filter 8, a pressure regulator 10, a pressure sensor 9 and the like. The gas supply line d is connected to the flow rate controller 6
Etc., and the branch line p ′ of the purge gas line p is connected to the primary side of the flow rate controller 6.

[0007]

However, according to the configuration of the above publication, the gas supply lines a, b and c have one
By providing two flow rate controllers 6,
Since it is shared, it is possible to reduce the cost accordingly, and it is possible to cope with the miniaturization of the shared portion. However, the switching valve 7 disposed on the upstream side of the flow rate controller 6,
Since the pressure control system areas such as the filter 8, the pressure regulator 10, the pressure sensor 9 and the like are respectively arranged in the individual gas supply lines a, b and c, there is still a demand for downsizing the gas supply device. There are issues such as inadequacy.

The present invention has been developed as a result of intensive research in order to solve the above problems. The object of the present invention is to significantly reduce costs by sharing a plurality of gas lines. The purpose is to reduce the number of gas lines to enable compactness and to easily add gas types.

[0009]

In order to achieve the above object, the invention according to claim 1 is to provide a flow rate controller on one fluid supply line, and to arrange a pressure control system region on the upstream side of the flow rate controller. And a plurality of fluid supply sources are connected to one system line in this pressure control system area.

In the invention according to claim 2, the flow rate controller is a mass flow controller or a pressure type flow rate controller, and in the invention according to claim 3, the pressure control system area includes a switching valve, a filter, and a pressure adjusting device. It is a fluid control device including a container, a pressure sensor and the like.

In the invention according to claim 4, an extension line extending substantially L-shaped is provided on the front side of the one-system line in the pressure control system region as viewed from the front, and the one-system line is coaxially constructed.
The extension line is a fluid control device provided with a plurality of fluid supply ports for connecting a fluid supply source.

According to a fifth aspect of the present invention, each fluid supply port is provided with a three-way valve, one connection port of the three-way valve is connected to a fluid supply source, and another pair of connection ports are connected to each other. In the fluid control device, a purging fluid line is connected to the connection port at the front end.

In the invention according to claim 6, the flow rate controller, the pressure control system region or the three-way valve provided in one fluid supply line are integrated units.

According to a seventh aspect of the present invention, a flow rate controller is provided in a gas supply line for supplying different kinds of gas into the processing reactor in one system, and a pressure control region is provided upstream of the flow rate controller. The heat treatment apparatus is provided with a fluid control device that connects a plurality of gas supply sources to one system line in the pressure control region.

According to an eighth aspect of the present invention, different kinds of fluids are supplied while being switching-controlled from a plurality of fluid supply ports provided in one fluid supply line, and this supply fluid is supplied from a pressure control region provided in one system. This is a fluid control method for supplying to a flow rate controller.

The invention according to claim 9 is a fluid control method, wherein the purge fluid is supplied from the front end of one fluid supply line.

[0017]

BEST MODE FOR CARRYING OUT THE INVENTION A preferred embodiment of a fluid control device according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic circuit diagram showing an example of a fluid control device according to the present invention. In the figure, reference numeral 11 denotes a fluid control device. In this device 11, gas supply lines are coaxially arranged in parallel at a predetermined pitch interval. In the system of FIG. 1, 12
Is a purge gas line (purging fluid line) for supplying the replacement gas P such as N ₂ from the left column,
The purge gas line 12 is provided with a gas supply port (fluid supply port) 12a, a manual valve 12b, a filter 12c, a pressure regulator (regulator) 12d, a pressure sensor 12e, a control valve 12f, a flow rate controller 12g, and a filter 12h. ing.

Next, FIGS. 1 to 5 show a gas supply line (fluid supply line) 13 for supplying different kinds of gases (for example, H ₂ , O ₂ , N ₂ , SiH ₄ etc.) to one line. Is shown. The gas supply line 13 is provided with a flow rate controller 13g and a pressure control system region 14 on the upstream side of the flow rate controller 13g. This pressure control system area 14
A manual valve 13b, a filter 13c, a pressure regulator 13d, a pressure sensor 13e, a control valve 13f, a filter 13h, and a control valve 13i are provided in the.

Further, a plurality of gas supply sources (fluid supply sources) A, B and C are connected to the lower end side of the gas supply line 13. In particular, as shown in FIG. 2, the lower end portion of the gas supply line 13 is substantially L toward the front side when viewed from the front.
An extension line 15 is provided extending in a letter shape, and the extension line 15 and the gas supply line 13 are provided coaxially when viewed from the front. The extension line 15 is provided with gas supply ports (fluid supply ports) 16a, 16b, 16c for connecting the gas supply sources A, B, C.

Further, the gas supply ports 16a, 16b, 1
6c includes three-way valves 17, 18 and 1 with actuators
9 is provided, and one port of the three-way valves 17, 18, 19 is connected to the connection ports 17a, 1 of the gas supply sources A, B, C.
8a and 19a, and another pair of connection ports (connection ports) 1
7b, 17c and 18b, 18c and 19b, 19c are connected to each other. Furthermore, the purge gas line 12 is connected to the connection port 17b at the front end,
Specifically, as shown in FIGS. 2 and 4, the connection port 1
7b is provided with a two-way valve 20 with an actuator, and this two-way valve 20 is connected to a line 22 of the purge gas P via a check valve 21. This three-way valve 17,1
The pair of connection ports 17b, 17c and the like in 8 and 19 are always in communication, and the connection ports 17a, 18a, 19a
Only are configured to automatically open and close with a diaphragm actuated by an actuator.

Further, in FIG. 1, a gas supply line 23 for supplying a gas supply source D is provided in the right column.
Similarly to this gas supply line 23, the gas supply port 23
a, manual valve 23b, filter 23c, pressure regulator 2
3d, pressure sensor 23e, control valve 23f,
A flow controller 23g and the like are provided.

Further, in FIGS. 1 and 4, the purge gas line 12 is provided with a branch line 24, and the branch line 24 is connected to the connection port 17b of the three-way valve 17 via the two-way valve 20 as described above. Connected. On the other hand, when the same type of gas is supplied a plurality of times, it is not necessary to replace the pressure control region 14 and purge it. Therefore, the switching control is automatically performed to the branch line 25 connected to the primary side of the flow rate controller 13g. It is also possible to supply the purge gas. The branch line 25 is also provided with a control valve 25a and a check valve 25b.

The purge gas line 12, the gas supply line 13 and the gas supply line 23 provided in the fluid control device 11 in a vertical arrangement are configured to introduce various gases into the process reaction furnace 32. In this case, the gas line arranged in the fluid control device 11 in FIG.
0 and the area of the gas supply system 11 of FIG. 11 can be reduced by the area X, and the size can be reduced.

Further, in this example, the gas supply line 1
3, flow rate controllers 13g, 12g, 23g provided in the purge gas line 12 and the gas supply line 23, and manual valves 12b, 13 provided in the pressure control system region 14 and the like.
b, 23b, filters 12c, 13c, 23c, pressure regulators 12d, 13d, 23d and three-way valves 17, 18,
19, the two-way valve 20, and the like are each configured by a known integrated structure unit. This integrated structure unit 26
Is formed by fixing the base block 26a to the bases 27 and 28, respectively, and mounting the valve block 26b having an actuator or the like on the upper surface of the base block 26a and sealingly fixing it.

Next, the operation of the above embodiment will be described. For example, in a semiconductor manufacturing process such as a film forming process, various plural kinds of gases (for example, H ₂ , O ₂ , SiH ₄ , and N _{2 are used).}
Etc.) are supplied into the process reaction furnace 32. In this case, it is possible to use different types of gas in one line under the precondition that the supply gases can join each other and are used over time instead of simultaneously, and the flow rate range is close.

First, referring to FIGS. 2 and 3, the supply gas B
When the three-way valve 18 is opened while the two-way valve 20 is closed, the supply gas B is controlled to a predetermined pressure by the pressure control region 14 of the gas supply line 13 from the extension line 15, and The flow rate is controlled to a predetermined flow rate by the flow rate controller 13 and supplied into the process reaction furnace 32.

Next, when purging the supply line with the replacement gas P in order to supply a different gas, as shown in FIGS. 4 and 5, the three-way valves 17, 18, 19 are closed and the two-way valve 20 is closed. Is opened, the purge gas P is supplied, the gas supply line 13 is pushed out from the extension line 15 to purge the entire flow path, and there is no dead region where the purge gas P is not supplied and the used gas remains. There is no fear. And to supply other different gases,
It becomes possible to carry out by repeating the above-mentioned use.

FIGS. 6 to 9 show another example of the fluid control system. The same parts as those in the above example are designated by the same reference numerals and their description is omitted. In this example, one system of gas supply line 13
Provide a flow rate controller 13g such as a mass flow controller,
A pressure control region 14 is provided on the upstream side of the flow rate controller 13g, and a plurality of gas supply sources 29a, 29b, 29c and a purge gas supply source 29 are provided in one system line of the pressure control region 14.
d is provided.

According to this example, the extension line 30 for providing the gas supply source is arranged in a laterally expanded state, and the extension line 3
A purge gas supply line 31 is provided at the uppermost stream of 0.
In this case, as shown in FIGS. 6 and 7, when the supply gas is supplied, a dead region V is generated and the used gas remains. In this case, as shown in FIGS. 8 and 9, when the purge gas is supplied, the gas remaining in the dead zone V cannot be purged. As described above, a system capable of supplying different types of gas in one system is similar to the above example, but in comparison with the above example, the extension line 30 provided in the gas supply line is laterally expanded. Therefore, not only does it not lead to the reduction of lines, but also the used gas remains and a dead region V is generated in each part. Therefore, in comparison with this example, the above-mentioned example can surely satisfy the required condition. Therefore, the object of the present invention can be reliably achieved.

Although mass flow controllers are used as the flow rate controllers 12g, 13g, and 23g, the flow rate controllers are not limited thereto, and pressure type flow rate controllers may be used. Also, of the flow rate controllers 12g, 13g, and 23g, the digital MF
If C (mass flow controller) is used, it becomes possible to cope with gas types having different flow rate ranges. This digital MF
In C, the flow rate control characteristic curve is fixed only to those corresponding to the reference gas and the reference flow rate, and for different gas species and different flow rates, the conversion coefficient for the pre-crimp reference gas is obtained, and the gas species and flow rate are If it changes, an approximate control value corresponding to the reference gas and the reference flow rate is calculated from the measured value at this time and this conversion coefficient, and the flow rate control of the different gas is performed based on this approximate control value. In addition, it is possible to handle a large number of different gases and to adopt a wide flow rate range.

[0031]

As is apparent from the above, according to the inventions of claims 1 and 7, the flow rate control system region and the pressure control system region are provided in one fluid (gas) supply line. Since all of them are shared, a significant cost reduction can be achieved, and it is possible to contribute to downsizing by reducing the number of lines as much as possible.
This has the effect that the number of fluid (gas) species can be increased extremely easily.

According to the second aspect of the present invention, it is possible to deal with the change of many kinds of fluid (gas) and the change of the flow rate of fluid (gas), and it is possible to control the flow rate with high accuracy by the same flow rate controller. To do.

According to the third aspect of the invention, since the pressure control system region can be shared, the fluid control device can be made compact and the cost can be greatly reduced.

According to the invention of claim 4, since one system line is a vertically developed line, it is possible to reduce the number of fluid (gas) supply lines, which in turn contributes to downsizing.

According to the inventions of claims 5 and 9,
The entire one-system line can be replaced with a fluid (gas), and the fluid (gas) used does not remain, so that the fluid (gas) purge can be reliably executed in the line.

According to the invention of claim 6, the fluid (gas) supply line can be constructed compactly, the cost can be reduced, and the maintenance can be facilitated. The effect is great.

According to the seventh aspect of the present invention, in the heat treatment apparatus for manufacturing semiconductors and the like, both the demand for the connection process and the supply of various gases and the demand for the low cost and the low footprint of the apparatus are satisfied. be able to.

[Brief description of drawings]

FIG. 1 is a schematic circuit diagram showing an example of a fluid control device according to the present invention.

FIG. 2 is an enlarged side view showing a pressure control area of FIG.

FIG. 3 is a front view of FIG.

FIG. 4 is a side view showing an example of execution of purge gas in the supply line in FIG.

FIG. 5 is a front view of FIG.

FIG. 6 is a front view showing another example of the pressure control region of FIG.

7 is a cross-sectional view taken along the line EE of FIG.

FIG. 8 is a front view showing another example when the purge gas of FIG. 5 is executed.

9 is a cross-sectional view taken along the line ROLL of FIG.

FIG. 10 is a schematic circuit diagram showing an example of a gas supply device in a conventional example.

FIG. 11 is a schematic circuit diagram showing still another example of the conventional example.

[Explanation of symbols]

11 Fluid control device 12 Purge fluid line (purge gas line) 13 Fluid supply line (gas supply line) 13g flow controller 14 Pressure control area 15 extension line 16a, 16b, 16c Fluid supply port (gas supply port) 32 treatment reactor A, B, C Fluid supply source (gas supply source)

   ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 3J071 AA02 BB14 BB15 CC01 DD27                       DD36 EE02 EE24 FF11                 5F045 BB08 EC07 EE04

Claims (9)

[Claims] 1. A flow controller is provided in one fluid supply line, a pressure control system region is provided upstream of the flow controller, and a plurality of fluid supply sources are connected to one system line in this pressure control system region. A fluid control device characterized in that. 2. The fluid control device according to claim 1, wherein the flow rate controller is a mass flow controller or a pressure type flow rate controller. 3. The pressure control system area comprises a switching valve, a filter, a pressure regulator, a pressure sensor and the like.
The fluid control device according to. 4. An extension line extending substantially L-shaped is provided on the front side of the one-system line in the pressure control system area when viewed from the front, and the one-system line is coaxially configured. The fluid control device according to claim 1, further comprising a plurality of fluid supply ports that connect the fluid supply sources. 5. A three-way valve is provided at each fluid supply port in claim 4, one connection port of this three-way valve is connected to a fluid supply source, and another pair of connection ports are connected to each other.
A fluid control device with a purging fluid line connected to the frontmost connection port. 6. The fluid control according to claim 1, wherein each of the flow rate controller, the pressure control system region, and the three-way valve provided in one fluid supply line is an integrated structure unit. apparatus. 7. A flow rate controller is provided in a gas supply line for supplying different kinds of gas into the processing reactor in one system, and a pressure control area is provided upstream of the flow rate controller, and a pressure control area of this pressure control area is provided. A heat treatment apparatus comprising a fluid control device for connecting a plurality of gas supply sources to one system line. 8. A heterogeneous fluid is switched and supplied from a plurality of fluid supply ports provided in one fluid supply line,
A fluid control method characterized in that the supply fluid is supplied to a flow rate controller from a pressure control region provided in one system. 9. The fluid control method according to claim 8, wherein the purge fluid is supplied from the front end of one fluid supply line.