JP2002100691A - Container for housing semiconductor light-receiving element - Google Patents
Container for housing semiconductor light-receiving elementInfo
- Publication number
- JP2002100691A JP2002100691A JP2000287457A JP2000287457A JP2002100691A JP 2002100691 A JP2002100691 A JP 2002100691A JP 2000287457 A JP2000287457 A JP 2000287457A JP 2000287457 A JP2000287457 A JP 2000287457A JP 2002100691 A JP2002100691 A JP 2002100691A
- Authority
- JP
- Japan
- Prior art keywords
- receiving element
- semiconductor light
- ceramic substrate
- resin frame
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ファクシミリやイ
メージスキャナ等に使用される、長尺のラインセンサ用
CCD等の半導体受光素子を搭載収納する中空部を有す
る半導体受光素子収納用容器に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a container for housing a semiconductor light receiving element having a hollow portion for mounting and receiving a semiconductor light receiving element such as a long CCD for a line sensor used for a facsimile or an image scanner.
【0002】[0002]
【従来の技術】従来、OA機器類のファクシミリやイメ
ージスキャナ等に使用されるラインセンサは、長尺のラ
インセンサ用CCD(Charge Coupled Device:電荷
結合素子)等の半導体受光素子を半導体受光素子収納用
容器(以下、半導体容器という)に搭載することによっ
て構成されている。このような半導体容器には、セラミ
ック基板の上面に形成された凹部に半導体受光素子の搭
載部を有して成るセラミックパッケージが用いられてい
た。そして、その搭載部に半導体受光素子をダイボンド
し、ボンディングワイヤ等による電気的配線を行って、
凹部の開口をガラスまたはプラスチックから成る透明窓
を封着することによって、ラインセンサとして使用され
ていた。2. Description of the Related Art Conventionally, a line sensor used for a facsimile or an image scanner of OA equipment includes a semiconductor light receiving element such as a long line sensor CCD (Charge Coupled Device). It is configured by being mounted on a container (hereinafter, referred to as a semiconductor container). In such a semiconductor container, a ceramic package having a mounting portion for a semiconductor light receiving element in a concave portion formed on the upper surface of a ceramic substrate has been used. Then, a semiconductor light receiving element is die-bonded to the mounting portion, and electrical wiring is performed by a bonding wire or the like.
The opening of the concave portion was used as a line sensor by sealing a transparent window made of glass or plastic.
【0003】また、種々の仕様やコスト低減の要求に応
えるべく、透明窓を封着する代わりに透光性封止樹脂に
よるポッティングを行うことや、セラミック基板に代え
て樹脂基板を用いたプラスチックパッケージを用いるこ
とが行われていた。Further, in order to meet various specifications and demands for cost reduction, potting with a light-transmitting sealing resin is performed instead of sealing a transparent window, or a plastic package using a resin substrate instead of a ceramic substrate. Was used.
【0004】最近では、複数のリードフレームを狭持し
た樹脂枠体とセラミック基板とを接着剤で接合すること
により、搭載面の寸法精度が高く、かつ熱放散性に優れ
る半導体受光素子収納用容器が提案されている(特開平
12−138305号公報参照)。[0004] Recently, a semiconductor light receiving element housing container having a high dimensional accuracy of a mounting surface and excellent heat dissipation by bonding an adhesive to a resin frame body holding a plurality of lead frames and a ceramic substrate. Has been proposed (see JP-A-12-138305).
【0005】また、他の従来例として、容器本体とキャ
ップを接着するシール材が容器本体の中央部へ流れ込む
のを阻止するための溝が容器本体のシール部の内側に沿
って設けられている構成の半導体装置が提案されている
(特開平3−266453号公報参照)。Further, as another conventional example, a groove is provided along the inside of the seal portion of the container main body to prevent the sealing material for bonding the container main body and the cap from flowing into the central portion of the container main body. A semiconductor device having a configuration has been proposed (see Japanese Patent Application Laid-Open No. 3-266453).
【0006】[0006]
【発明が解決しようとする課題】しかしながら、図6の
ような特開平12−138305号公報の半導体受光素
子収納用容器では、セラミック基板11と樹脂枠体12
を熱硬化性の接着剤14で接合する際、接着剤14が硬
化時に収縮し、セラミック基板11と樹脂枠体12の間
で隙間Aが発生することがあり、その隙間Aにダストが
挟まりやすくなり、洗浄工程でもダストの除去が困難と
なっていた。その結果、パッケージを封止した後にダス
トの一部が飛散し、半導体受光素子の表面にダストが付
着し半導体受光素子が誤動作してしまう場合があった。However, in the container for accommodating a semiconductor light receiving element disclosed in Japanese Patent Application Laid-Open No. 12-138305 as shown in FIG.
When bonding is performed with the thermosetting adhesive 14, the adhesive 14 shrinks during curing, and a gap A may be generated between the ceramic substrate 11 and the resin frame 12, and dust is easily caught in the gap A. Thus, it has been difficult to remove dust even in the cleaning process. As a result, a part of the dust may be scattered after the package is sealed, and the dust may adhere to the surface of the semiconductor light receiving element, causing the semiconductor light receiving element to malfunction.
【0007】また、材料コスト低減の目的から接着剤1
4の幅を小さくすると、セラミック基板11と樹脂枠体
12の間の隙間Aが図6の場合よりさらに大きくなるこ
ととなり、それによってダストがさらに挟まりやすくな
り、洗浄工程で挟まったダストをほとんど除去できなく
なっていた。その結果、半導体受光素子の表面にさらに
ダストが付着し半導体受光素子が誤動作してしまう場合
があった。さらに、接着剤14の幅が小さいためセラミ
ック基板11と樹脂枠体12の間の接合強度が低下して
いた。In order to reduce material costs, the adhesive 1
When the width of 4 is reduced, the gap A between the ceramic substrate 11 and the resin frame 12 becomes larger than in the case of FIG. 6, whereby the dust is more likely to be trapped, and the dust trapped in the cleaning step is almost removed. I could not do it. As a result, dust may further adhere to the surface of the semiconductor light receiving element, and the semiconductor light receiving element may malfunction. Furthermore, since the width of the adhesive 14 is small, the bonding strength between the ceramic substrate 11 and the resin frame 12 has been reduced.
【0008】逆に接着剤14の幅を大きくすると、図7
に示すように接合時に接着剤14の搭載面11aへのは
み出しが起こり、半導体受光素子へ流れ込んで、半導体
受光素子の側面に付着し、半導体受光素子自体の動作特
性に影響を与える場合があった。On the contrary, when the width of the adhesive 14 is increased, FIG.
As shown in (1), the adhesive 14 protrudes from the mounting surface 11a at the time of joining, flows into the semiconductor light receiving element, adheres to the side surface of the semiconductor light receiving element, and affects the operating characteristics of the semiconductor light receiving element itself. .
【0009】一方、特開平3−266453号公報のよ
うに、載置部に溝を設けると半導体受光素子の搭載面が
大きくなり、パッケージが大型重量化されるという問題
点を有していた。On the other hand, as described in Japanese Patent Application Laid-Open No. Hei 3-266453, when a groove is provided in the mounting portion, there is a problem that the mounting surface of the semiconductor light receiving element becomes large and the package becomes large and heavy.
【0010】従って、本発明は上記問題点に鑑み完成さ
れたもので、その目的は、樹脂枠体とセラミック基板と
の間に隙間が発生し、洗浄工程でダストがその隙間に残
り、ダストの一部が半導体受光素子に付着して誤動作を
起こすという問題点を解消し、また樹脂枠体とセラミッ
ク基板との接合時に接着剤の半導体受光素子の搭載面へ
のはみ出しを防止することである。[0010] Accordingly, the present invention has been completed in view of the above problems, and an object thereof is to form a gap between the resin frame and the ceramic substrate, and the dust remains in the gap in the cleaning step, and the dust is removed. An object of the present invention is to solve the problem that a part of the adhesive adheres to the semiconductor light receiving element to cause a malfunction, and to prevent the adhesive from protruding to the mounting surface of the semiconductor light receiving element at the time of joining the resin frame and the ceramic substrate.
【0011】[0011]
【課題を解決するための手段】本発明の半導体容器は、
セラミック基板と、該セラミック基板と略同じ外形寸法
を有するとともに複数のリードフレームを狭持した樹脂
枠体とを接着剤により接合して成り、前記セラミック基
板上面の前記樹脂枠体に囲まれた領域に半導体受光素子
の搭載面を有する半導体受光素子収納用容器において、
前記樹脂枠体の接合面側に前記樹脂枠体の内側の略全周
にわたる切り欠き部が形成されており、かつ該切り欠き
部の内面の算術平均粗さRaが0.05〜0.4μmであ
ることを特徴とするものである。A semiconductor container according to the present invention comprises:
A region surrounded by the ceramic frame on the upper surface of the ceramic substrate, the ceramic substrate and a resin frame having substantially the same outer dimensions as the ceramic substrate and holding a plurality of lead frames are joined by an adhesive. In a semiconductor light receiving element storage container having a semiconductor light receiving element mounting surface,
A cutout portion is formed on the joining surface side of the resin frame body over substantially the entire inner circumference of the resin frame body, and the arithmetic average roughness Ra of the inner surface of the cutout portion is 0.05 to 0.4 μm. It is characterized by being.
【0012】本発明は、上記の構成により、樹脂枠体の
接合面側に樹脂枠体の内側の略全周にわたる切り欠き部
が形成されており、かつ切り欠き部の内面の算術平均粗
さRaが0.05〜0.4μmであることにより、樹脂枠
体とセラミック基板との隙間に残ったダストを洗浄工程
で除去することが容易となり、半導体受光素子にダスト
が付着することがなくなり、半導体受光素子を正常に作
動することができる。さらに、樹脂枠体とセラミック基
板との接合時に接着剤の半導体受光素子の搭載面へのは
み出しを大幅に減少し得る。According to the present invention, a notch is formed on the joining surface side of the resin frame over substantially the entire inner periphery of the resin frame, and the arithmetic average roughness of the inner surface of the notch is provided. When Ra is 0.05 to 0.4 μm, dust remaining in the gap between the resin frame and the ceramic substrate can be easily removed in the cleaning step, and the dust does not adhere to the semiconductor light receiving element. The semiconductor light receiving element can operate normally. Further, the protrusion of the adhesive onto the mounting surface of the semiconductor light receiving element at the time of joining the resin frame and the ceramic substrate can be greatly reduced.
【0013】[0013]
【発明の実施の形態】本発明の半導体容器について以下
に詳細に説明する。図1は本発明の半導体容器の実施の
形態の一例を示す断面図であり、図2はその斜視図であ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS The semiconductor container of the present invention will be described in detail below. FIG. 1 is a sectional view showing an example of an embodiment of a semiconductor container of the present invention, and FIG. 2 is a perspective view thereof.
【0014】図1および図2において、1はセラミック
基板、2はセラミック基板1と略同じ外形寸法を有する
樹脂枠体、3は樹脂枠体2に挟時された複数のリードフ
レーム、4はセラミック基板1と樹脂枠体2とを接合す
る熱硬化性の接着剤である。この半導体容器は、セラミ
ック基板1上にリードフレーム3と一体成形された樹脂
枠体2が接着剤4により接合される。1 and 2, 1 is a ceramic substrate, 2 is a resin frame having substantially the same external dimensions as the ceramic substrate 1, 3 is a plurality of lead frames sandwiched between the resin frames 2, 4 is a ceramic frame. It is a thermosetting adhesive for joining the substrate 1 and the resin frame 2. In this semiconductor container, a resin frame 2 integrally formed with a lead frame 3 on a ceramic substrate 1 is joined by an adhesive 4.
【0015】本発明のセラミック基板1は板体から成
り、その上面の樹脂枠体2に囲まれた領域に半導体受光
素子の搭載面1aを有している。The ceramic substrate 1 of the present invention is formed of a plate, and has a mounting surface 1a of the semiconductor light receiving element in a region surrounded by the resin frame 2 on the upper surface thereof.
【0016】また、セラミック基板1のセラミックス材
料としては、酸化アルミニウム(Al2O3)質焼結体や
ムライト(3Al2O3・2SiO2)質焼結体,窒化ア
ルミニウム(AlN)質焼結体,窒化珪素(Si3N4)
質焼結体,炭化珪素(SiC)質焼結体やガラスセラミ
ックス等の種々のセラミックス材料を用いることがで
き、寸法精度、強度、熱放散性等の要求特性に応じて適
宜選択すればよい。中でも、酸化アルミニウム質焼結体
を用いると、好適な熱伝導率を有し、研磨等による加工
が容易なことから、所望の寸法精度の搭載面1aを有
し、強度、信頼性、熱放散性に優れた、良好な特性の半
導体容器を得ることができる。The ceramic material of the ceramic substrate 1 includes an aluminum oxide (Al 2 O 3 ) sintered body, a mullite (3Al 2 O 3 .2SiO 2 ) sintered body, and an aluminum nitride (AlN) based sintered body. Body, silicon nitride (Si 3 N 4 )
Various ceramic materials such as high-quality sintered body, silicon carbide (SiC) -based sintered body, and glass ceramics can be used, and may be appropriately selected according to required characteristics such as dimensional accuracy, strength, and heat dissipation. Among them, when an aluminum oxide sintered body is used, it has a suitable thermal conductivity and is easily processed by polishing or the like, so that it has a mounting surface 1a with desired dimensional accuracy, strength, reliability, and heat dissipation. A semiconductor container having excellent characteristics and excellent characteristics can be obtained.
【0017】樹脂枠体2は、セラミック基板1の上面に
接着剤により接合されて内側の搭載面1aを囲む領域に
半導体受光素子を収容する空間を形成し、セラミック基
板1とともに容器を構成する。The resin frame 2 is bonded to the upper surface of the ceramic substrate 1 with an adhesive to form a space for accommodating the semiconductor light receiving element in a region surrounding the inner mounting surface 1a, and forms a container together with the ceramic substrate 1.
【0018】尚、樹脂枠体2の樹脂材料としては、ビス
フェノールA型エポキシ樹脂,ノボラック型エポキシ樹
脂,グリシジアルアミン型エポキシ樹脂等のエポキシ樹
脂、ポリイミド樹脂,フェノール樹脂,不飽和ポリエス
テル樹脂,シリコーン樹脂等の熱硬化性樹脂、または、
液晶ポリマー,ポリフェニレンスルフィド樹脂,ポリス
ルホン樹脂等の熱可塑性樹脂が用いられる。特に耐熱
性、耐湿性が良好でかつ低価格の観点からエポキシ樹脂
が好ましい。また、これらの樹脂には硬化剤、硬化促進
剤、充填剤、難燃剤、顔料、離型剤等が配合されていて
もよい。The resin material of the resin frame 2 includes epoxy resins such as bisphenol A type epoxy resin, novolak type epoxy resin, glycidylamine type epoxy resin, polyimide resin, phenol resin, unsaturated polyester resin, and silicone resin. Or other thermosetting resin, or
Thermoplastic resins such as liquid crystal polymer, polyphenylene sulfide resin, and polysulfone resin are used. Particularly, an epoxy resin is preferable from the viewpoint of good heat resistance and moisture resistance and low cost. Further, these resins may contain a curing agent, a curing accelerator, a filler, a flame retardant, a pigment, a release agent, and the like.
【0019】樹脂枠体2を製作するには、例えば射出成
形法あるいはトランスファー成形法により、複数のリー
ドフレーム3を所定位置にセットした金型中に、約5〜
20MPa(メガパスカル)の圧力,約150〜200
℃の温度,約1〜10分の成型時間といった成型条件に
より、樹脂材料を注入固化することによって製作すれば
よい。In order to manufacture the resin frame 2, for example, an injection molding method or a transfer molding method is used to put a plurality of lead frames 3 in a mold set at a predetermined position for about 5 to 5 minutes.
20MPa (megapascal) pressure, about 150-200
It may be manufactured by injecting and solidifying a resin material under molding conditions such as a temperature of ° C. and a molding time of about 1 to 10 minutes.
【0020】また、樹脂枠体2を製作する金型は表面を
切削加工で荒削りをしたのち放電加工を施し、図3に示
すように切り欠き部5が設けられている面6の部位に当
たる金型の部分のみを砥石,研磨布,遊離研粒等の研磨
材で仕上げる。その切り欠き部5は、セラミック基板1
と接合する面の内側(搭載面1a側)に形成されてい
る。切り欠き部5の大きさは、図1に示すように、樹脂
枠体2の幅Xに対して0.1X〜0.5Xがよく、また樹
脂枠体2のリードフレームの下側の厚Yに対して0.1
Y〜0.5Yがよい。0.1X未満だと、セラミック基板
1と樹脂枠体2の隙間にダストが残るため洗浄工程での
ダスト除去が困難になり、また、0.5Xを超えると、
セラミック基板1と樹脂枠体2との接着強度が低下し、
樹脂枠体2の外れ等が多くなる。0.1Y未満だと、セ
ラミック基板1と樹脂枠体2の隙間にダストが残るため
洗浄工程でのダスト除去が困難になり、0.5Yを超え
るとリードフレーム3の下の樹脂枠体2の厚みが薄くな
り、剛性が低下しワイヤボンディング不良が多くなる。
具体的には、Xの長さは2〜8mm程度、Yの厚みは
0.25〜1mm程度である。The metal mold for manufacturing the resin frame 2 is subjected to electric discharge machining after roughing the surface by cutting, and as shown in FIG. 3, the metal corresponding to the portion of the surface 6 where the notch 5 is provided. Only the mold is finished with an abrasive such as a whetstone, abrasive cloth, or loose abrasive. The notch 5 is formed in the ceramic substrate 1
Is formed on the inner side (on the mounting surface 1a side) of the surface to be joined. As shown in FIG. 1, the size of the notch 5 is preferably 0.1X to 0.5X with respect to the width X of the resin frame 2, and the thickness Y of the resin frame 2 on the lower side of the lead frame. 0.1 for
Y to 0.5Y is preferable. If it is less than 0.1X, dust remains in the gap between the ceramic substrate 1 and the resin frame 2, making it difficult to remove the dust in the cleaning process.
The adhesive strength between the ceramic substrate 1 and the resin frame 2 decreases,
The detachment of the resin frame 2 increases. If it is less than 0.1Y, dust remains in the gap between the ceramic substrate 1 and the resin frame 2, making it difficult to remove dust in the cleaning process. The thickness is reduced, the rigidity is reduced, and wire bonding defects increase.
Specifically, the length of X is about 2 to 8 mm, and the thickness of Y is about 0.25 to 1 mm.
【0021】また、成形時の樹脂の流動により金型が磨
耗するのを防ぐために金型表面の表面硬化処理を行う。
その表面硬化処理方法としては、硬質クロム(Cr)メ
ッキ、ニッケル(Ni)メッキ、Ni−テフロンコーテ
ィング、窒化処理、浸硫化処理、硼化処理、TiN膜等
の物理蒸着法(PDV法)、TiN膜等の化学蒸着法
(CVD法)等によって行うことができる。Further, in order to prevent the mold from being worn by the flow of the resin at the time of molding, the surface of the mold is subjected to a surface hardening treatment.
Examples of the surface hardening method include hard chromium (Cr) plating, nickel (Ni) plating, Ni-Teflon coating, nitriding treatment, sulfurizing treatment, boride treatment, physical vapor deposition method (PDV method) such as TiN film, and TiN. It can be performed by a chemical vapor deposition method (CVD method) of a film or the like.
【0022】この金型で樹脂成形した場合、金型の表面
粗さが半導体受光素子収納用容器の表面に転写され金型
とほぼ同じ表面性状に仕上がる。そして、切り欠き部5
の内面の算術平均粗さRaは0.05〜0.4μm程度に
なる。0.05μm未満の場合は成型金型の加工限界で
あり、また0.4μmを超える場合は洗浄工程でのダス
ト除去が困難となる。好ましくは、0.05〜0.25μ
mが好適である。When resin molding is performed using this mold, the surface roughness of the mold is transferred to the surface of the semiconductor light receiving element housing container, and the surface is finished to have almost the same surface properties as the mold. And the notch 5
Has an arithmetic average roughness Ra of about 0.05 to 0.4 μm. If it is less than 0.05 μm, it is the processing limit of the molding die, and if it exceeds 0.4 μm, it becomes difficult to remove dust in the cleaning step. Preferably, 0.05-0.25μ
m is preferred.
【0023】さらに、切り欠き部5の内面の算術平均粗
さRaが0.05〜0.4μmであることにより、一般的
に量の多い0.4μmを超える大きさのダストはほとん
ど付着しなくなる。また、0.05μm以下の大きさの
ダストが切り欠き部5の内面に付着しても、そのような
小さなダストは内面との分子間力で付着している場合が
多く、その結果付着力が弱く、洗浄工程で容易に除去で
きるようになる。従って、切り欠き部5に付着するダス
トはほとんどなくなるため、半導体受光素子を正常に作
動させることができる。Further, since the arithmetic average roughness Ra of the inner surface of the cutout portion 5 is 0.05 to 0.4 μm, generally large amount of dust having a size exceeding 0.4 μm hardly adheres. . Even if dust having a size of 0.05 μm or less adheres to the inner surface of the notch 5, such small dust often adheres to the inner surface by an intermolecular force with the inner surface. It is weak and can be easily removed in the washing process. Therefore, almost no dust adheres to the notch 5, so that the semiconductor light receiving element can be normally operated.
【0024】セラミック基板1の算術平均粗さRaは、
0.15〜1μmが好ましい。0.15μm未満の場合
は、接着剤4やダイボンド剤との接着強度が低下し、セ
ラミック基板1の外れ等が多くなり、1μmを超えると
セラミック基板1の平坦性が劣化して半導体受光素子を
光学系に必要な精度で搭載できなくなる。The arithmetic average roughness Ra of the ceramic substrate 1 is
0.15-1 μm is preferred. When the thickness is less than 0.15 μm, the adhesive strength with the adhesive 4 or the die bonding agent decreases, and the detachment of the ceramic substrate 1 increases. The optical system cannot be mounted with the required precision.
【0025】リードフレーム3は、鉄(Fe)−ニッケ
ル(Ni)−コバルト(Co)合金やFe−Ni合金、
銅(Cu)合金等の金属材料から成り、容器内部に収容
される半導体受光素子にボンディングワイヤ等の電気的
接続手段により接続されるとともに、外部電気回路に半
田等を介して接続されることにより、両者間の導電路と
して機能するものである。The lead frame 3 is made of an iron (Fe) -nickel (Ni) -cobalt (Co) alloy, an Fe-Ni alloy,
It is made of a metal material such as a copper (Cu) alloy, and is connected to a semiconductor light receiving element housed in a container by an electric connection means such as a bonding wire and is connected to an external electric circuit via solder or the like. , Function as a conductive path between them.
【0026】また、リードフレーム3は、例えば、Fe
−Ni−Co合金のインゴット(塊)に圧延加工法や打
ち抜き加工法等、従来周知の金属加工法を施すことによ
って、所定の形状、寸法に形成される。また、その露出
表面には、耐蝕性に優れ、かつろう材やボンディングワ
イヤ等との濡れ性が良いニッケルや金等の良導電性の金
属メッキ膜を0.1〜20μmの厚みに被着させておく
と、リードフレーム3の酸化腐食を有効に防止すること
ができるとともに、ボンディングワイヤや半田等による
電気的接続を良好なものとすることができる。The lead frame 3 is made of, for example, Fe
-An ingot (a lump) of a Ni-Co alloy is formed into a predetermined shape and dimensions by applying a conventionally known metal working method such as a rolling method or a punching method. On the exposed surface, a highly conductive metal plating film such as nickel or gold having excellent corrosion resistance and good wettability with a brazing material or a bonding wire is applied to a thickness of 0.1 to 20 μm. By doing so, the oxidative corrosion of the lead frame 3 can be effectively prevented, and the electrical connection using a bonding wire, solder, or the like can be improved.
【0027】セラミック基板1の上面に樹脂枠体2を接
合する接着剤4は、アクリル系ゴムを含有したエポキシ
樹脂等から成る。このようなエポキシ樹脂から成る接着
剤としては、具体的にはビスフェノールA型エポキシ樹
脂やノボラック型エポキシ樹脂、グリシジアルアミン型
エポキシ樹脂等のエポキシ樹脂にアミン系硬化剤やイミ
ダゾール系硬化剤、酸無水物硬化剤等の硬化剤を添加し
た樹脂接着剤を用い、これにブチルアクリレートゴムや
架橋ポリメチルメタアクリレートゴム、エチルアクリレ
ートゴム、ウレタンアクリレートゴム等からなるアクリ
ル系ゴムの粒子を含有させたものを用いる。The adhesive 4 for joining the resin frame 2 to the upper surface of the ceramic substrate 1 is made of an epoxy resin containing acrylic rubber or the like. Specific examples of the adhesive composed of such an epoxy resin include an epoxy resin such as a bisphenol A type epoxy resin, a novolak type epoxy resin, a glycidylamine type epoxy resin, an amine type curing agent, an imidazole type curing agent, and an acid anhydride. Using a resin adhesive to which a curing agent such as a product curing agent has been added, and containing particles of acrylic rubber such as butyl acrylate rubber, cross-linked polymethyl methacrylate rubber, ethyl acrylate rubber, urethane acrylate rubber, etc. Used.
【0028】そして、このような接着剤4によりセラミ
ック基板1と樹脂枠体2とを接合するには、例えば、ま
ずセラミック基板1の上面のうち樹脂枠体2と接合させ
る部分にスクリーン印刷法やディスペンサー法等により
接着剤4を枠状に印刷塗布する。次に樹脂枠体2を載置
して、接着剤4の硬化特性に応じて2〜8N(ニュート
ン)程度の圧力を加えつつ、120〜180℃の温度で
5分〜3時間程度の加熱処理を行い、接着剤4を熱硬化
させることによりセラミック基板1に樹脂枠体2を接合
させる。In order to join the ceramic substrate 1 and the resin frame 2 with such an adhesive 4, for example, a screen printing method or the like is first applied to a portion of the upper surface of the ceramic substrate 1 to be joined to the resin frame 2. The adhesive 4 is printed and applied in a frame shape by a dispenser method or the like. Next, the resin frame 2 is placed, and a heat treatment is performed at a temperature of 120 to 180 ° C. for about 5 minutes to 3 hours while applying a pressure of about 2 to 8 N (Newton) according to the curing characteristics of the adhesive 4. Then, the resin frame 2 is joined to the ceramic substrate 1 by thermally curing the adhesive 4.
【0029】本発明の半導体容器の搭載部に半導体受光
素子を搭載し、半導体受光素子の電極とリードフレーム
3とをボンディングワイヤ等により電気的に接続し、樹
脂枠体2の上面にガラスやプラスチックス等からなる透
明窓を封着し、あるいは透光性封止樹脂のポッティング
により半導体受光素子を封止することにより、ファクシ
ミリやイメージスキャナ等に使用されるラインセンサ等
の半導体受光装置となる。The semiconductor light receiving element is mounted on the mounting portion of the semiconductor container of the present invention, and the electrodes of the semiconductor light receiving element and the lead frame 3 are electrically connected by a bonding wire or the like. By sealing a transparent window made of a resin or the like, or sealing a semiconductor light receiving element by potting with a light-transmitting sealing resin, a semiconductor light receiving device such as a line sensor used for a facsimile, an image scanner, or the like is obtained.
【0030】かくして、本発明は、樹脂枠体の接合面側
に樹脂枠体の内側の略全周にわたる切り欠き部が形成さ
れており、かつ切り欠き部の内面が所定の粗さの平滑面
とされていることから、洗浄工程でのダスト除去が容易
となり半導体受光素子を正常に作動させることができ
る。さらに樹脂枠体とセラミック基板との接合時での接
着剤の半導体受光素子の搭載面へのはみ出しを大幅に減
少させることができる。Thus, according to the present invention, a notch is formed on the joining surface side of the resin frame over substantially the entire inner periphery of the resin frame, and the inner surface of the notch has a smooth surface having a predetermined roughness. Accordingly, dust can be easily removed in the cleaning step, and the semiconductor light receiving element can be operated normally. Further, it is possible to greatly reduce the protrusion of the adhesive onto the mounting surface of the semiconductor light receiving element when the resin frame and the ceramic substrate are joined.
【0031】尚、本発明は上述の実施の形態に限定され
るものでなく、本発明の要旨を逸脱しない範囲であれば
種々の変更・改良が可能であることは言うまでもない。
例えば、デジタルカメラ,ビデオカメラ等に使用され
る、エリアセンサ用CCD等の半導体受光素子を搭載す
る中空部を有する半導体容器にも適用できる。また、切
り欠き部の形状については、図3に示すもの以外で図4
のような切り欠き深さが内側に向かって大きくなった円
弧状、階段状等のものであってもよく、その形状にする
ことにより、ダストの付着をより効果的に防止でき、セ
ラミック基板1と樹脂枠体2の接合時に発生する応力が
緩和できる効果も有する。さらに、切り欠き部5以外の
樹脂枠体2の内側面7も算術平均粗さRaを0.05〜
0.4μmとすることにより、ダストの付着がさらに防
止でき、ワイヤボンディング時の不良をなくすことがで
きる効果を有する。It should be noted that the present invention is not limited to the above-described embodiment, and it is needless to say that various modifications and improvements can be made without departing from the gist of the present invention.
For example, the present invention can be applied to a semiconductor container having a hollow portion for mounting a semiconductor light receiving element such as a CCD for an area sensor used in a digital camera, a video camera, and the like. Also, the shape of the notch is different from that shown in FIG.
The shape of the notch may be an arc shape, a step shape, or the like in which the notch depth increases toward the inside. By adopting such a shape, the adhesion of dust can be more effectively prevented, and the ceramic substrate 1 It also has an effect that stress generated at the time of joining the resin frame 2 with the resin frame 2 can be reduced. Further, the inner surface 7 of the resin frame 2 other than the notch portion 5 also has an arithmetic average roughness Ra of 0.05 to 0.05.
By setting the thickness to 0.4 μm, there is an effect that dust adhesion can be further prevented and defects during wire bonding can be eliminated.
【0032】[0032]
【発明の効果】本発明は、樹脂枠体の搭載面側に樹脂枠
体の内側の略全周にわたる切り欠き部が形成されてお
り、かつ切り欠き部の内面の算術平均粗さRaが0.0
5〜0.4μmであることから、洗浄工程での切り欠き
部内面に残留したダスト除去が容易となり、半導体受光
素子にダストが付着することがなくなり、半導体受光素
子を正常に作動させることができる。さらに樹脂枠体と
セラミック基板との接合時に接着剤の半導体受光素子の
搭載面へのはみ出しを大幅に減少することができる。According to the present invention, a cutout is formed on the mounting surface side of the resin frame over substantially the entire inner periphery of the resin frame, and the arithmetic mean roughness Ra of the inner surface of the cutout is zero. .0
Since the thickness is 5 to 0.4 μm, it is easy to remove dust remaining on the inner surface of the notch in the cleaning step, and dust does not adhere to the semiconductor light receiving element, and the semiconductor light receiving element can be operated normally. . Further, the protrusion of the adhesive onto the mounting surface of the semiconductor light receiving element at the time of joining the resin frame and the ceramic substrate can be greatly reduced.
【図1】本発明の半導体容器の実施の形態の一例を示す
断面図である。FIG. 1 is a sectional view showing an example of an embodiment of a semiconductor container of the present invention.
【図2】本発明の半導体容器の実施の形態の一例を示す
斜視図である。FIG. 2 is a perspective view showing an example of an embodiment of a semiconductor container of the present invention.
【図3】図1の半導体容器の要部拡大断面図である。FIG. 3 is an enlarged sectional view of a main part of the semiconductor container of FIG. 1;
【図4】図1の半導体容器の他の実施の形態の一例を示
す要部拡大断面図である。FIG. 4 is an enlarged sectional view of a main part showing an example of another embodiment of the semiconductor container of FIG. 1;
【図5】従来の半導体容器の断面図である。FIG. 5 is a sectional view of a conventional semiconductor container.
【図6】従来の半導体容器の要部拡大断面図である。FIG. 6 is an enlarged sectional view of a main part of a conventional semiconductor container.
【図7】従来の半導体容器の要部拡大断面図である。FIG. 7 is an enlarged sectional view of a main part of a conventional semiconductor container.
1:セラミック基板 2:樹脂枠体 3:リードフレーム 4:接着剤 5:切り欠き部 1: Ceramic substrate 2: Resin frame 3: Lead frame 4: Adhesive 5: Notch
Claims (1)
同じ外形寸法を有するとともに複数のリードフレームを
狭持した樹脂枠体とを接着剤により接合して成り、前記
セラミック基板上面の前記樹脂枠体に囲まれた領域に半
導体受光素子の搭載面を有する半導体受光素子収納用容
器において、前記樹脂枠体の接合面側に前記樹脂枠体の
内側の略全周にわたる切り欠き部が形成されており、か
つ該切り欠き部の内面の算術平均粗さRaが0.05〜
0.4μmであることを特徴とする半導体受光素子収納
用容器。1. A resin frame on an upper surface of a ceramic substrate, comprising: a ceramic substrate; and a resin frame having substantially the same outer dimensions as the ceramic substrate and holding a plurality of lead frames. A semiconductor light-receiving element storage container having a mounting surface of the semiconductor light-receiving element in a region surrounded by a notch formed on the joining surface side of the resin frame over substantially the entire circumference inside the resin frame. And the arithmetic average roughness Ra of the inner surface of the notch is 0.05 to
A semiconductor light receiving element storage container having a thickness of 0.4 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000287457A JP2002100691A (en) | 2000-09-21 | 2000-09-21 | Container for housing semiconductor light-receiving element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000287457A JP2002100691A (en) | 2000-09-21 | 2000-09-21 | Container for housing semiconductor light-receiving element |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002100691A true JP2002100691A (en) | 2002-04-05 |
Family
ID=18771199
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000287457A Pending JP2002100691A (en) | 2000-09-21 | 2000-09-21 | Container for housing semiconductor light-receiving element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002100691A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007053261A (en) * | 2005-08-18 | 2007-03-01 | Matsushita Electric Ind Co Ltd | Package for electronic component and its manufacturing method |
JP2012094627A (en) * | 2010-10-26 | 2012-05-17 | Kyocera Corp | Package for housing element and electronic apparatus with the same |
WO2013081156A1 (en) * | 2011-11-30 | 2013-06-06 | 京セラ株式会社 | Image pickup element housing package, and image pickup device |
-
2000
- 2000-09-21 JP JP2000287457A patent/JP2002100691A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007053261A (en) * | 2005-08-18 | 2007-03-01 | Matsushita Electric Ind Co Ltd | Package for electronic component and its manufacturing method |
JP2012094627A (en) * | 2010-10-26 | 2012-05-17 | Kyocera Corp | Package for housing element and electronic apparatus with the same |
WO2013081156A1 (en) * | 2011-11-30 | 2013-06-06 | 京セラ株式会社 | Image pickup element housing package, and image pickup device |
JPWO2013081156A1 (en) * | 2011-11-30 | 2015-04-27 | 京セラ株式会社 | Image pickup device storage package and image pickup apparatus |
US9276023B2 (en) | 2011-11-30 | 2016-03-01 | Kyocera Corporation | Image pickup element housing package, and image pickup device |
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