JP2002033442A - Semiconductor device, circuit board and electronic apparatus - Google Patents
Semiconductor device, circuit board and electronic apparatusInfo
- Publication number
- JP2002033442A JP2002033442A JP2000216870A JP2000216870A JP2002033442A JP 2002033442 A JP2002033442 A JP 2002033442A JP 2000216870 A JP2000216870 A JP 2000216870A JP 2000216870 A JP2000216870 A JP 2000216870A JP 2002033442 A JP2002033442 A JP 2002033442A
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- JP
- Japan
- Prior art keywords
- semiconductor chip
- semiconductor
- semiconductor device
- electrodes
- electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
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- H01L2224/48091—Arched
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
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- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
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- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/0651—Wire or wire-like electrical connections from device to substrate
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- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06555—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
- H01L2225/06562—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking at least one device in the stack being rotated or offset
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- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体装置、回路
基板及び電子機器に関する。The present invention relates to a semiconductor device, a circuit board, and an electronic device.
【0002】[0002]
【発明の背景】高密度実装を実現した半導体装置の一つ
の形態として、複数の半導体チップを積み重ねたスタッ
ク構造の半導体装置が知られている。例えば、積み重ね
られた複数の半導体チップは、それぞれの半導体チップ
の周端部に形成された電極が、ワイヤによって配線基板
に電気的に接続される。BACKGROUND OF THE INVENTION As one form of a semiconductor device which realizes high-density mounting, a semiconductor device having a stack structure in which a plurality of semiconductor chips are stacked is known. For example, in a plurality of stacked semiconductor chips, electrodes formed on a peripheral end of each semiconductor chip are electrically connected to a wiring board by wires.
【0003】しかし、ワイヤによる電気的接続を考慮す
ると、電極を避けて半導体チップを積み重ねる必要があ
り、半導体チップの外形は、搭載する一方において、搭
載される側となる他方よりも小さくなければならなかっ
た。すなわち、上側に搭載する半導体チップの大きさに
制限があった。However, in consideration of electrical connection by wires, it is necessary to stack semiconductor chips avoiding the electrodes, and the outer shape of the semiconductor chip must be smaller on one side than on the other side. Did not. That is, the size of the semiconductor chip mounted on the upper side is limited.
【0004】また、この場合に、上下に積層されたそれ
ぞれの半導体チップにおいて、平面的にワイヤが重複し
てしまうので、上側の半導体チップのワイヤを高く、か
つ、長く形成する必要があった。これは、半導体装置の
小型化、高密度化の弊害となる場合があった。In this case, the wires of the upper and lower semiconductor chips need to be formed high and long because the wires overlap in a plane in each of the semiconductor chips stacked vertically. This may have a negative effect on miniaturization and high density of the semiconductor device.
【0005】本発明はこの問題点を解決するものであ
り、その目的は、半導体チップの外形に制限されず、か
つ、好適に電気的接続を図れる半導体装置、回路基板及
び電子機器を提供することにある。An object of the present invention is to provide a semiconductor device, a circuit board, and an electronic device which are not limited to the outer shape of a semiconductor chip and can make an appropriate electrical connection. It is in.
【0006】[0006]
【課題を解決するための手段】(1)本発明に係る半導
体装置は、電極が形成され、積み重ねられてなる複数の
半導体チップを有し、前記複数の半導体チップは、第1
の半導体チップと、前記第1の半導体チップに搭載され
た第2の半導体チップと、を含み、前記第2の半導体チ
ップは、前記第1の半導体チップの外側に一部をはみ出
して搭載され、前記第1の半導体チップからはみ出した
側に前記電極が形成されてなる。(1) A semiconductor device according to the present invention has a plurality of semiconductor chips on which electrodes are formed and which are stacked, and the plurality of semiconductor chips is a first semiconductor chip.
A semiconductor chip and a second semiconductor chip mounted on the first semiconductor chip, wherein the second semiconductor chip is mounted partially outside the first semiconductor chip, The electrode is formed on a side protruding from the first semiconductor chip.
【0007】本発明によれば、第2の半導体チップは、
第1の半導体チップからはみ出した側に電極が形成され
るので、例えば電極にワイヤを接続した場合に、直接的
に上下に積層された2つの半導体チップにおいて、ワイ
ヤを平面的に重複させることがない。これによって、そ
れぞれのワイヤを互いに接触させずに、電極に接続して
設けることができる。さらに、第2の半導体チップの電
極が第1の半導体チップからはみ出した部分に形成され
たときに、例えば電極と基板の配線パターンとをワイヤ
で接続した場合に、平面的に最短距離でワイヤを形成で
きる。According to the present invention, the second semiconductor chip comprises:
Since the electrode is formed on the side protruding from the first semiconductor chip, for example, when a wire is connected to the electrode, the wire may be planarly overlapped in two semiconductor chips stacked directly on top and bottom. Absent. Thus, the respective wires can be connected to the electrodes without being in contact with each other. Furthermore, when the electrode of the second semiconductor chip is formed in a portion protruding from the first semiconductor chip, for example, when the electrode and the wiring pattern of the substrate are connected by a wire, the wire is connected with the shortest distance in a plane. Can be formed.
【0008】また、第2の半導体チップは、第1の半導
体チップの外側にはみ出して搭載されるので、第1の半
導体チップの外形の大きさに制限されずに搭載できる。
これによって、例えば、同一サイズの複数の半導体チッ
プが積み重ねられた半導体装置を提供できる。Further, since the second semiconductor chip is mounted outside the first semiconductor chip, the second semiconductor chip can be mounted without being limited by the outer size of the first semiconductor chip.
Thus, for example, a semiconductor device in which a plurality of semiconductor chips of the same size are stacked can be provided.
【0009】なお、本発明では、複数の半導体チップ
は、2つのみならずそれ以上の数であってもよく、第1
及び第2の半導体チップとは、複数の半導体チップのう
ちの任意の2つを示す。In the present invention, the number of the plurality of semiconductor chips is not limited to two, but may be more.
And the second semiconductor chip refers to any two of the plurality of semiconductor chips.
【0010】(2)この半導体装置において、前記第1
の半導体チップの前記電極は、端部に形成され、前記第
2の半導体チップは、前記第1の半導体チップにおける
前記電極が形成された面に前記電極を避けて搭載され、
前記第1の半導体チップの前記電極から離れる方向に前
記第1の半導体チップの外側に突出してもよい。(2) In this semiconductor device, the first
The electrode of the semiconductor chip is formed at an end portion, the second semiconductor chip is mounted on the surface of the first semiconductor chip where the electrode is formed, avoiding the electrode,
The first semiconductor chip may protrude outside the first semiconductor chip in a direction away from the electrodes.
【0011】これによれば、第2の半導体チップは、第
1の半導体チップの外形の大きさに制限されず、かつ、
第1の半導体チップの電極を露出させることができる。According to this, the size of the second semiconductor chip is not limited by the size of the outer shape of the first semiconductor chip, and
The electrodes of the first semiconductor chip can be exposed.
【0012】(3)この半導体装置において、前記第1
の半導体チップの外形は矩形をなし、前記第1の半導体
チップの前記電極は、前記第1の半導体チップの1辺に
並んで形成され、前記第2の半導体チップは、前記第1
の半導体チップの前記1辺に対向する辺を超えて外側に
突出してもよい。(3) In this semiconductor device, the first
The outer shape of the semiconductor chip is rectangular, the electrodes of the first semiconductor chip are formed along one side of the first semiconductor chip, and the second semiconductor chip is
The semiconductor chip may protrude outward beyond a side opposite to the one side.
【0013】これによれば、第2の半導体チップは、第
1の半導体チップとの平面的に重なる部分を広くして安
定した状態で積み重ねられる。According to this, the second semiconductor chip is stacked in a stable state by widening a portion overlapping the first semiconductor chip in a plane.
【0014】(4)この半導体装置において、前記第1
の半導体チップの外形は矩形をなし、前記第1の半導体
チップの前記電極は、前記第1の半導体チップの隣り合
う2辺に並んで形成され、前記第2の半導体チップは、
前記第1の半導体チップの前記2辺に対向する他の2辺
を超えて外側に突出してもよい。(4) In this semiconductor device, the first
The outer shape of the semiconductor chip is rectangular, the electrodes of the first semiconductor chip are formed side by side on two adjacent sides of the first semiconductor chip, and the second semiconductor chip is
The first semiconductor chip may protrude outward beyond the other two sides facing the two sides.
【0015】これによれば、それぞれの半導体チップの
電極の数が多くても、第2の半導体チップは、第1の半
導体チップの隣り合う2辺を避けることで第1の半導体
チップからはみ出して搭載できる。According to this, even if the number of electrodes of each semiconductor chip is large, the second semiconductor chip protrudes from the first semiconductor chip by avoiding two adjacent sides of the first semiconductor chip. Can be installed.
【0016】(5)この半導体装置において、前記第1
又は第2の半導体チップの前記電極の並ぶ側に配置され
たリードを含み、前記電極と前記リードとが電気的に接
続されてもよい。(5) In this semiconductor device, the first
Alternatively, a lead may be provided on a side of the second semiconductor chip on which the electrodes are arranged, and the electrodes and the leads may be electrically connected.
【0017】(6)前記電極と前記リードとが直接ある
いは導電材によって電気的に接続されてもよい。(6) The electrode and the lead may be electrically connected directly or by a conductive material.
【0018】(7)本発明に係る回路基板には、上記半
導体装置が搭載されてなる。(7) The semiconductor device described above is mounted on a circuit board according to the present invention.
【0019】(8)本発明に係る電子機器は、上記半導
体装置を有する。(8) An electronic apparatus according to the present invention includes the above semiconductor device.
【0020】[0020]
【発明の実施の形態】以下、本発明の好適な実施の形態
について図面を参照して説明する。ただし、本発明は、
以下の実施の形態に限定されるものではない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. However, the present invention
The present invention is not limited to the following embodiment.
【0021】(第1の実施の形態)図1及び図2は、本
実施の形態に係る半導体装置を説明するための図であ
る。半導体装置は、積み重ねられてなる複数の半導体チ
ップを有する。複数の半導体チップは、第1及び第2の
半導体チップ10、20を含む。ここで、複数の半導体
チップは、2つのみならずそれ以上の数であってもよ
く、第1及び第2の半導体チップとは、複数の半導体チ
ップのうち、上下に積層された任意の2つを示す。(First Embodiment) FIGS. 1 and 2 are views for explaining a semiconductor device according to the present embodiment. The semiconductor device has a plurality of semiconductor chips stacked. The plurality of semiconductor chips include first and second semiconductor chips 10 and 20. Here, the number of the plurality of semiconductor chips is not limited to two, and may be more than two. The first and second semiconductor chips are any two of the plurality of semiconductor chips stacked vertically. Show one.
【0022】各半導体チップは、例えば、フラッシュメ
モリ、SRAM、DRAM、ASIC又はMPUなどで
ある。複数の半導体チップの組み合わせとして、例え
ば、ASICとフラッシュメモリとSRAM、SRAM
同士、DRAM同士、あるいはフラッシュメモリとSR
AMなどがある。なお、各半導体チップの機能及び複数
の半導体チップの組み合わせは、上述に限定されない。Each semiconductor chip is, for example, a flash memory, SRAM, DRAM, ASIC or MPU. As a combination of a plurality of semiconductor chips, for example, ASIC, flash memory, SRAM, SRAM
DRAM, DRAM, or flash memory and SR
AM and the like. The function of each semiconductor chip and the combination of a plurality of semiconductor chips are not limited to the above.
【0023】図1に示すように、第2の半導体チップ2
0は、第1の半導体チップ10に搭載されている。第1
の半導体チップ10は、矩形(長方形又は正方形を含
む)をなすことが多いがこれに限定されない。また、第
1の半導体チップ10は、集積回路が形成された面とは
反対の面において、薄く研削されてなるものであっても
よい。As shown in FIG. 1, the second semiconductor chip 2
0 is mounted on the first semiconductor chip 10. First
In many cases, the semiconductor chip 10 has a rectangular shape (including a rectangular shape or a square shape), but is not limited thereto. Further, the first semiconductor chip 10 may be formed by thinly grinding the surface opposite to the surface on which the integrated circuit is formed.
【0024】第1の半導体チップ10は、一方の面(集
積回路が形成された面)に1つ又は複数の電極12を有
する。電極12は、例えばアルミニウム又は銅などで第
1の半導体チップ10に薄く平らに形成されている。電
極12の平面形状は、矩形又は円形であってもよく、そ
の形状は限定されない。電極12は、第1の半導体チッ
プ10の中央部又は端部に形成される。図示するよう
に、電極12は、第1の半導体チップ10の1辺に1列
で並んで形成されてもよい。あるいは、第1の半導体チ
ップ10の端部又は中央部に、2列以上に並んで形成さ
れてもよく、あるいは千鳥状に形成されてもよい。The first semiconductor chip 10 has one or more electrodes 12 on one surface (the surface on which an integrated circuit is formed). The electrode 12 is thinly and flatly formed on the first semiconductor chip 10 with, for example, aluminum or copper. The planar shape of the electrode 12 may be rectangular or circular, and the shape is not limited. The electrode 12 is formed at the center or the end of the first semiconductor chip 10. As illustrated, the electrodes 12 may be formed in a line on one side of the first semiconductor chip 10. Alternatively, the first semiconductor chip 10 may be formed in two or more rows at the end or the center thereof, or may be formed in a staggered manner.
【0025】第1の半導体チップ10には、電極12の
形成された側の面に、保護膜(図示しない)が形成され
てもよい。保護膜は、各電極12の表面において、中央
部を露出させて端部を覆って形成される。保護膜は、電
気的な絶縁膜である。保護膜は、一般的なパッシベーシ
ョン膜であってもよい。保護膜は、SiO2、SiN又
はポリイミド樹脂などで形成することができる。A protective film (not shown) may be formed on the surface of the first semiconductor chip 10 on which the electrode 12 is formed. The protective film is formed on the surface of each electrode 12 so as to expose the center and cover the end. The protective film is an electrical insulating film. The protective film may be a general passivation film. The protective film can be formed of SiO 2 , SiN, a polyimide resin, or the like.
【0026】図示するように、第2の半導体チップ20
は、第1の半導体チップ10と同じ形態(例えば形状及
び電極の配置)であってもよい。本実施の形態によれ
ば、同一形態を有する複数の半導体チップを積層させる
ことができる。あるいは、第2の半導体チップ20は、
第1の半導体チップ10と異なる形態を有してもよい。
例えば、第2の半導体チップ20は、第1の半導体チッ
プ10の外形よりも大きくてもよく、あるいは小さくて
もよい。As shown, the second semiconductor chip 20
May have the same form (for example, shape and arrangement of electrodes) as the first semiconductor chip 10. According to the present embodiment, a plurality of semiconductor chips having the same form can be stacked. Alternatively, the second semiconductor chip 20
It may have a different form from the first semiconductor chip 10.
For example, the second semiconductor chip 20 may be larger or smaller than the outer shape of the first semiconductor chip 10.
【0027】第2の半導体チップ20は、第1の半導体
チップ10の外側に一部をはみ出して搭載される。例え
ば、第2の半導体チップ20は、第1の半導体チップ1
0の面で、中心から平面的にいずれかの方向に平行移動
した位置に搭載されてもよい。The second semiconductor chip 20 is mounted outside the first semiconductor chip 10 so as to partially protrude. For example, the second semiconductor chip 20 is the first semiconductor chip 1
The plane may be mounted at a position parallel to any direction in a plane from the center on the zero plane.
【0028】図示する例では、第2の半導体チップ20
は、第1の半導体チップ10における、電極12が並ぶ
1辺に対向する辺を超えて、第1の半導体チップ10の
外側に突出している。すなわち、第2の半導体チップ2
0は、第1の半導体チップ10の面で、その中心から第
1の半導体チップ10の電極12から離れる方向へ、平
行移動した位置に搭載される。例えば、第1及び第2の
半導体チップ10、20が同一サイズである場合に、第
2の半導体チップ20は、第1の半導体チップ10の表
面を平面的に露出させた面積分だけ、第1の半導体チッ
プ10の外側に突出する。言い換えると、第1及び第2
の半導体チップ10、20は、電極12の側又は電極1
2に対向する側において階段形状をなしている。In the example shown, the second semiconductor chip 20
Protrudes outside the first semiconductor chip 10 beyond a side opposite to one side of the first semiconductor chip 10 where the electrodes 12 are arranged. That is, the second semiconductor chip 2
Numeral 0 denotes a surface of the first semiconductor chip 10, which is mounted at a position shifted in parallel from a center thereof in a direction away from the electrode 12 of the first semiconductor chip 10. For example, when the first and second semiconductor chips 10 and 20 have the same size, the second semiconductor chip 20 has the first semiconductor chip 10 in an amount corresponding to the area of the surface of the first semiconductor chip 10 that is planarly exposed. Project outside the semiconductor chip 10. In other words, the first and second
The semiconductor chips 10 and 20 are connected to the electrode 12 or the electrode 1
Step 2 is formed on the side facing 2.
【0029】これによれば、第2の半導体チップ20
は、第1の半導体チップ10からはみ出すので、第1の
半導体チップ10の外形の大きさに制限されずに搭載さ
れる。すなわち、第2の半導体チップ20の外形は、第
1の半導体チップよりも小さい必要はない。これによれ
ば、上下に積み重ねる半導体チップの組合わせの形態が
広がるという利点がある。According to this, the second semiconductor chip 20
Protrudes from the first semiconductor chip 10, and thus is mounted without being limited by the size of the outer shape of the first semiconductor chip 10. That is, the outer shape of the second semiconductor chip 20 does not need to be smaller than that of the first semiconductor chip. According to this, there is an advantage that the form of combination of semiconductor chips stacked one on top of the other is widened.
【0030】第2の半導体チップ20は、第1の半導体
チップ10における電極12が形成された面に搭載され
てもよい。この場合に、第2の半導体チップ20は、第
1の半導体チップ10における電極12を避けて搭載さ
れる。第1の半導体チップ10の電極12を避けること
で、電極12に例えばワイヤを接続できる。The second semiconductor chip 20 may be mounted on the surface of the first semiconductor chip 10 on which the electrodes 12 are formed. In this case, the second semiconductor chip 20 is mounted so as to avoid the electrodes 12 in the first semiconductor chip 10. By avoiding the electrode 12 of the first semiconductor chip 10, for example, a wire can be connected to the electrode 12.
【0031】図示する例のように、第1の半導体チップ
10の電極12は、端部(例えば1辺に沿った領域)に
形成されることが好ましい。これによれば、第2の半導
体チップ20は、第1の半導体チップ10における端部
に形成された電極12を避ければよいので、第1の半導
体チップ10との平面的に重なる部分を広くすることが
できる。すなわち、第2の半導体チップ20は、安定し
た状態で第1の半導体チップ10上に固定できる。これ
によって、例えば、確実に、第2の半導体チップ20の
電極22に圧力(超音波振動など)を加えてワイヤボン
ディングすることができる。As in the example shown, the electrode 12 of the first semiconductor chip 10 is preferably formed at an end (for example, a region along one side). According to this, since the second semiconductor chip 20 has only to avoid the electrode 12 formed at the end of the first semiconductor chip 10, the portion overlapping the first semiconductor chip 10 in a plane is widened. be able to. That is, the second semiconductor chip 20 can be fixed on the first semiconductor chip 10 in a stable state. Thus, for example, it is possible to reliably apply pressure (ultrasonic vibration or the like) to the electrode 22 of the second semiconductor chip 20 to perform wire bonding.
【0032】図示するように、第2の半導体チップ20
は、電極22が形成された面とは反対の面を、第1の半
導体チップ10に対向させて搭載されてもよい。あるい
は、第2の半導体チップ20は、電極22が形成された
面を対向させて、第1の半導体チップ10に搭載されて
もよい。後者の場合には、第2の半導体チップ20は、
第1の半導体チップ10から露出する面に電極22が配
置されてもよい。As shown, the second semiconductor chip 20
May be mounted with the surface opposite to the surface on which the electrodes 22 are formed facing the first semiconductor chip 10. Alternatively, the second semiconductor chip 20 may be mounted on the first semiconductor chip 10 with the surfaces on which the electrodes 22 are formed facing each other. In the latter case, the second semiconductor chip 20
The electrode 22 may be arranged on a surface exposed from the first semiconductor chip 10.
【0033】第2の半導体チップ20は、少なくとも第
1の半導体チップ10からはみ出した側に電極22を有
する。第1の半導体チップ10が1辺に電極12を有す
る場合には、第2の半導体チップ20は、第1の半導体
チップ10における他の3辺のいずれかにはみ出す側に
電極22を有してもよい。例えば、第2の半導体チップ
20は、第1の半導体チップ10の電極12を避けるこ
とによって、反対側に突出する側において、電極22が
形成されてもよい。なお、第2の半導体チップ20は、
第1の半導体チップ10からはみ出した部分のみに形成
されてもよく、あるいは、それに加えて第1の半導体チ
ップ10と重なる部分に形成されてもよい。The second semiconductor chip 20 has electrodes 22 at least on the side protruding from the first semiconductor chip 10. When the first semiconductor chip 10 has the electrode 12 on one side, the second semiconductor chip 20 has the electrode 22 on one of the other three sides of the first semiconductor chip 10. Is also good. For example, in the second semiconductor chip 20, the electrode 22 may be formed on the side protruding to the opposite side by avoiding the electrode 12 of the first semiconductor chip 10. Note that the second semiconductor chip 20
It may be formed only at a portion protruding from the first semiconductor chip 10, or may be formed at a portion overlapping with the first semiconductor chip 10 in addition thereto.
【0034】これによれば、電極12及び電極22にワ
イヤを接続した場合に、上下に積層されてなる第1及び
第2の半導体チップ10、20において、ワイヤを平面
的に重複させることがない。すなわち、高さの異なる第
1及び第2の半導体チップ10、20の面から、それぞ
れ延ばして形成する2つのワイヤを、互いに高さ方向に
おいて非接触にすることができる。これによって、例え
ば、第2の半導体チップ20の電極22に接続するワイ
ヤを、そのループの形状を高く形成する必要がなく、さ
らにワイヤ長を長くする必要がない。したがって、小型
で、かつ、信号の高速化を実現した半導体装置を提供で
きる。According to this, when wires are connected to the electrodes 12 and 22, the wires do not overlap in a plane in the first and second semiconductor chips 10 and 20 which are stacked vertically. . That is, two wires extending from the surfaces of the first and second semiconductor chips 10 and 20 having different heights can be in non-contact with each other in the height direction. Thus, for example, it is not necessary to form a wire connected to the electrode 22 of the second semiconductor chip 20 with a high loop shape, and it is not necessary to increase the wire length. Therefore, it is possible to provide a semiconductor device which is small and realizes a high-speed signal.
【0035】さらに、第2の半導体チップ20の電極2
2が第1の半導体チップ10からはみ出した部分に形成
されたときに、例えば電極22と基板の配線パターンと
をワイヤで接続する場合に、平面的に、電極22を配線
パターンに近づけて最短距離でワイヤを形成できる。Further, the electrode 2 of the second semiconductor chip 20
When the electrode 2 is formed at a portion protruding from the first semiconductor chip 10, for example, when the electrode 22 is connected to the wiring pattern of the substrate by a wire, the electrode 22 is brought close to the wiring pattern in a planar manner and the shortest distance Can form a wire.
【0036】第2の半導体チップ20上にさらに他の半
導体チップが積み重ねられてもよい(図2参照)。さら
に積み重ねられる他の半導体チップは、第2の半導体チ
ップ20が第1の半導体チップ10に積み重ねられるよ
うに、第2の半導体チップ20に搭載されてもよい。こ
の場合には、前記他の半導体チップを含む任意の2つを
第1及び第2の半導体チップ10、20として、上述の
形態を適用することができる。Another semiconductor chip may be stacked on the second semiconductor chip 20 (see FIG. 2). Other semiconductor chips to be further stacked may be mounted on the second semiconductor chip 20 so that the second semiconductor chip 20 is stacked on the first semiconductor chip 10. In this case, the above-described embodiment can be applied to any two of the semiconductor chips including the other semiconductor chip as the first and second semiconductor chips 10 and 20.
【0037】図2は、本実施の形態に係る半導体装置の
一例を示す図である。詳しくは、図2は、半導体装置の
断面図を示したものである。半導体装置1は、複数の半
導体チップ10、20、30、40を含む。複数の半導
体チップ10〜40は、上下に積層された任意の2つを
上述の第1及び第2の半導体チップとすることができ
る。FIG. 2 is a diagram showing an example of the semiconductor device according to the present embodiment. Specifically, FIG. 2 is a cross-sectional view of the semiconductor device. The semiconductor device 1 includes a plurality of semiconductor chips 10, 20, 30, 40. Any two of the plurality of semiconductor chips 10 to 40 stacked vertically can be the above-described first and second semiconductor chips.
【0038】半導体装置1は、複数のリード50と、半
導体チップ10〜40を封止する樹脂52と、をさらに
含む。本実施の形態に係る半導体装置の一例としては、
QFP(Quad Flat Package)などのリードフレームを
用いたパッケージに適用した形態が挙げられる。The semiconductor device 1 further includes a plurality of leads 50 and a resin 52 for sealing the semiconductor chips 10 to 40. As an example of the semiconductor device according to the present embodiment,
There is a form applied to a package using a lead frame such as a QFP (Quad Flat Package).
【0039】複数の半導体チップ10〜40は、上下に
積層された2つが平面的に一部において重なるように積
層されている。それぞれの半導体チップ10〜40は、
接着剤54によって接着されていてもよい。図示するよ
うに、接着剤54は、搭載する側の半導体チップの裏面
(例えば電極が形成された側とは反対側の面)に設けら
れ、それ自体が搭載される側の半導体チップからはみ出
してもよい。接着剤54は、絶縁性のものであってもよ
い。また、接着剤54は、ペースト状であってもよく、
あるいはフィルム状のものであってもよい。なお、接着
剤54の性質及び形態は特に限定されない。The plurality of semiconductor chips 10 to 40 are stacked so that two stacked vertically are partially overlapped in plan. Each semiconductor chip 10-40,
It may be bonded by an adhesive 54. As shown in the figure, the adhesive 54 is provided on the back surface of the mounting semiconductor chip (for example, on the surface opposite to the side on which the electrodes are formed), and protrudes from the mounting semiconductor chip. Is also good. The adhesive 54 may be an insulating material. The adhesive 54 may be in the form of a paste,
Alternatively, it may be in the form of a film. The nature and form of the adhesive 54 are not particularly limited.
【0040】最も下から3番目の半導体チップ30は、
1つ飛ばして、最も下の半導体チップ10と平面的に重
なってもよい。すなわち、半導体チップ30は、直接下
にくる半導体チップ20に対して一部をはみ出して搭載
され、1つ飛ばした半導体チップ10に対して平面的に
重なって搭載されてもよい。これによれば、2つの半導
体チップを積層してなる半導体装置と平面面積を同じに
して、3つ以上の半導体チップを積層することができ
る。したがって、小型の半導体装置を提供できる。な
お、最も下から4番目(最も上)の半導体チップ40
は、1つ飛ばして、最も下から2番目の半導体チップ2
0と平面的に重なってもよく、同じようにさらに半導体
チップ40に他の半導体チップが積み重ねられてもよ
い。The third semiconductor chip 30 from the bottom is
One may be skipped and overlap the lowermost semiconductor chip 10 in a planar manner. That is, the semiconductor chip 30 may be mounted so as to partially protrude from the semiconductor chip 20 directly below, and may be mounted so as to overlap the semiconductor chip 10 which is skipped one by one. According to this, three or more semiconductor chips can be stacked with the same planar area as a semiconductor device formed by stacking two semiconductor chips. Therefore, a small semiconductor device can be provided. The fourth (uppermost) semiconductor chip 40 from the bottom
Is the second semiconductor chip 2 from the bottom, skipping one
0 may be overlapped in a plane, and similarly, another semiconductor chip may be stacked on the semiconductor chip 40.
【0041】リード50は、それぞれの半導体チップ1
0〜40の電極12、22、32、42と電気的に接続
されている。リード50は、ワイヤ14、24、34、
44によって、電極12〜42と電気的に接続されても
よい。詳しくは、リード50は接続部56を有し、接続
部56にワイヤ14〜44が接続される。ワイヤ14〜
44は、金を含む材料で形成されることが多い。また、
リード50は、例えば銅を含む材料で形成されてもよ
い。リード50は、特に接続部56にメッキが施されて
もよい。リード50は、例えばリードフレームの一部で
あってもよい。この場合に、接続部56はインナーリー
ドと称してもよい。The leads 50 are connected to the respective semiconductor chips 1
It is electrically connected to the 0 to 40 electrodes 12, 22, 32, 42. The lead 50 is connected to the wires 14, 24, 34,
44 may be electrically connected to the electrodes 12 to 42. More specifically, the lead 50 has a connecting portion 56 to which the wires 14 to 44 are connected. Wire 14 ~
44 is often formed of a material containing gold. Also,
The lead 50 may be formed of, for example, a material containing copper. The lead 50 may be plated particularly at the connection portion 56. The lead 50 may be a part of a lead frame, for example. In this case, the connection portion 56 may be referred to as an inner lead.
【0042】複数の半導体チップ10〜40は、上下に
積層される2つの半導体チップにおいて、それぞれはみ
出す側に電極が形成されている。詳しくは、それぞれの
半導体チップ20〜40は、下にくる半導体チップから
はみ出た側に電極が形成される。特に、それぞれの半導
体チップ10〜40の1辺に電極が並ぶ場合には、それ
ぞれの半導体チップ10〜40の電極12〜42は、1
辺の側とそれに対向する側とに交互に形成されてもよ
い。これによれば、直接的に上下に積層されてなる半導
体チップ(例えば半導体チップ10、20)において、
ワイヤ(例えばワイヤ14、24)を平面的に重複させ
ることがないので、高さ方向におけるワイヤの接触を防
止できる。また、電極12〜42と、リード50の接続
部56と、の平面的な距離を短くすることができるの
で、ワイヤ長を短くできる。In the plurality of semiconductor chips 10 to 40, electrodes are formed on the protruding sides of two vertically stacked semiconductor chips. More specifically, each of the semiconductor chips 20 to 40 has an electrode formed on the side protruding from the underlying semiconductor chip. In particular, when the electrodes are arranged on one side of each of the semiconductor chips 10 to 40, the electrodes 12 to 42 of each of the semiconductor chips 10 to 40
It may be formed alternately on the side of the side and the side facing the side. According to this, in a semiconductor chip (for example, semiconductor chips 10 and 20) directly stacked on top and bottom,
Since the wires (for example, the wires 14 and 24) do not overlap in a plane, contact of the wires in the height direction can be prevented. Further, since the planar distance between the electrodes 12 to 42 and the connection portion 56 of the lead 50 can be reduced, the wire length can be reduced.
【0043】半導体チップ10〜40の電極12〜42
は、複数のリード50のうちのいずれかに重複して電気
的に接続してもよい。例えば、半導体チップ10におけ
る複数の電極12のいずれかと、半導体チップ30の複
数の電極32のいずれかとを、同一のリード50と電気
的に接続してもよい。特に、複数の半導体チップ10〜
40が同一の回路構造を有するときに、それぞれの半導
体チップ10〜40に対して、同一のリード50と電気
的な接続を図ることができる。例えば、複数の半導体チ
ップ10〜40がメモリである場合に、同一のリード5
0で、アドレス端子やデータ端子を共有化することが容
易になる。詳しくは、同一のリード50から、それぞれ
の半導体チップ10〜40の同じアドレスのメモリセル
に、情報の読み出し又は書き込みを行うことができる。Electrodes 12 to 42 of semiconductor chips 10 to 40
May be electrically connected to any of the plurality of leads 50 in an overlapping manner. For example, any of the plurality of electrodes 12 of the semiconductor chip 10 and any of the plurality of electrodes 32 of the semiconductor chip 30 may be electrically connected to the same lead 50. In particular, a plurality of semiconductor chips 10
When the semiconductor chips 40 have the same circuit structure, the same leads 50 can be electrically connected to the respective semiconductor chips 10 to 40. For example, when the plurality of semiconductor chips 10 to 40 are memories, the same lead 5
With 0, it becomes easy to share the address terminal and the data terminal. Specifically, information can be read or written from the same lead 50 to the memory cell of the same address of each of the semiconductor chips 10 to 40.
【0044】さらに、本実施の形態によれば、同一サイ
ズの半導体チップを積み重ねることが可能である。した
がって、設計時の制約に制限されることなく、例えば大
容量のメモリを有する半導体装置を提供できる。Further, according to the present embodiment, semiconductor chips of the same size can be stacked. Therefore, for example, a semiconductor device having a large-capacity memory can be provided without being limited by restrictions at the time of design.
【0045】複数の半導体チップ10〜40は、樹脂5
2によって封止されている。樹脂52は、例えば金型を
使用して成型することができる。樹脂52は金型を使用
した場合には、樹脂52をモールド樹脂と称してもよ
い。The plurality of semiconductor chips 10 to 40 are made of resin 5
2 sealed. The resin 52 can be molded using, for example, a mold. When a resin is used as the resin 52, the resin 52 may be referred to as a mold resin.
【0046】リード50は、樹脂52で封止された領域
から突出する。リード50における樹脂52から突出す
る部分は、樹脂52で封止されてなる領域の平面視にお
いて、対向する2辺から突出してもよく、あるいは4辺
から突出してもよい。リード50における樹脂52から
突出する部分は、所定の形状に成形される。なお、リー
ド50における樹脂52から突出する部分は、アウター
リードと称してもよい。The lead 50 protrudes from the region sealed with the resin 52. The portion of the lead 50 protruding from the resin 52 may protrude from two opposing sides or from four sides in plan view of a region sealed with the resin 52. A portion of the lead 50 protruding from the resin 52 is formed into a predetermined shape. The portion of the lead 50 protruding from the resin 52 may be referred to as an outer lead.
【0047】本実施の形態に係る半導体装置によれば、
第2の半導体チップ(例えば半導体チップ20)は、第
1の半導体チップ(例えば半導体チップ10)からはみ
出した側に電極22が形成されるので、例えば電極1
2、22にワイヤ14、24を接続した場合に、直接的
に上下に積層された2つの半導体チップ10、20にお
いて、ワイヤ14、24を平面的に重複させることがな
い。これによって、それぞれのワイヤ14、24を互い
に接触させずに、電極12、22に接続して設けること
ができる。According to the semiconductor device of this embodiment,
In the second semiconductor chip (for example, the semiconductor chip 20), the electrode 22 is formed on the side protruding from the first semiconductor chip (for example, the semiconductor chip 10).
When the wires 14 and 24 are connected to the wires 2 and 22, the wires 14 and 24 do not overlap in a plane in the two semiconductor chips 10 and 20 that are directly stacked vertically. Thus, the wires 14 and 24 can be connected to the electrodes 12 and 22 without being in contact with each other.
【0048】また、第2の半導体チップ20は、第1の
半導体チップ10の外側にはみ出して搭載されるので、
第1の半導体チップ10の外形の大きさに制限されずに
搭載できる。これによって、例えば、同一サイズの複数
の半導体チップ10〜40が積み重ねられた半導体装置
を提供できる。Also, since the second semiconductor chip 20 is mounted so as to protrude outside the first semiconductor chip 10,
The first semiconductor chip 10 can be mounted without being limited by the size of the outer shape. Thereby, for example, a semiconductor device in which a plurality of semiconductor chips 10 to 40 of the same size are stacked can be provided.
【0049】(第2の実施の形態)図3及び図4は、本
実施の形態に係る半導体装置を説明するための図であ
る。なお、以下に示す実施の形態においても、第1の実
施の形態で説明した内容を可能な限り適用することがで
きる。本実施の形態では、上下に積層されてなる第1及
び第2の半導体チップ60、70の形態が上述と異な
る。(Second Embodiment) FIGS. 3 and 4 are views for explaining a semiconductor device according to the present embodiment. In the following embodiments, the contents described in the first embodiment can be applied as much as possible. In the present embodiment, the form of the first and second semiconductor chips 60 and 70 stacked vertically is different from that described above.
【0050】第1の半導体チップ60は、矩形をなす。
第1の半導体チップ60における電極62は、隣り合う
2辺に並んで形成されている。電極62は、図示するよ
うに1列に並んでもよく、あるいは2列以上に並んでも
よい。あるいは、電極62は、千鳥状に形成されてもよ
い。また、電極62の並びは、規則的であってもよく、
あるいは不規則的であってもよい。The first semiconductor chip 60 has a rectangular shape.
The electrodes 62 in the first semiconductor chip 60 are formed side by side on two adjacent sides. The electrodes 62 may be arranged in one row as shown, or in two or more rows. Alternatively, the electrodes 62 may be formed in a staggered manner. The arrangement of the electrodes 62 may be regular,
Alternatively, it may be irregular.
【0051】第2の半導体チップ70は、第1の半導体
チップ60における電極62が形成された2辺に対向す
る他の2辺を超えて、第1の半導体チップ60の外側に
突出している。第1の半導体チップ60から避ける領域
は、矩形をなす第1の半導体チップ60の隣り合う2辺
の領域であるので、第2の半導体チップ70は、電極6
2の全てを避けることができる。これによれば、第1の
半導体チップ60の電極62の数が多い場合に効果的で
ある。したがって、高密度の半導体装置を提供できる。The second semiconductor chip 70 protrudes outside the first semiconductor chip 60 beyond the other two sides of the first semiconductor chip 60 where the electrodes 62 are formed. Since the area to be avoided from the first semiconductor chip 60 is an area of two sides adjacent to the first semiconductor chip 60 having a rectangular shape, the second semiconductor chip 70
All of 2 can be avoided. This is effective when the number of electrodes 62 of the first semiconductor chip 60 is large. Therefore, a high-density semiconductor device can be provided.
【0052】第2の半導体チップ70は、第1の半導体
チップ60の形態と同様であってもよい。すなわち、第
2の半導体チップ70の電極72は、矩形をなす第2の
半導体チップ70の隣り合う2辺に並んで形成されても
よい。この場合に、第2の半導体チップ70の電極72
は、第1の半導体チップ60の電極62の並ぶ2辺とは
異なる2辺に並んで形成される。The configuration of the second semiconductor chip 70 may be the same as that of the first semiconductor chip 60. That is, the electrodes 72 of the second semiconductor chip 70 may be formed side by side on two adjacent sides of the rectangular second semiconductor chip 70. In this case, the electrode 72 of the second semiconductor chip 70
Are formed on two sides different from the two sides on which the electrodes 62 of the first semiconductor chip 60 are arranged.
【0053】本実施の形態によれば、電極62、72の
数が多い場合であっても、第2の半導体チップ70は、
第1の半導体チップ60から一部をはみ出して搭載でき
るので、高密度の半導体装置を提供できる。According to the present embodiment, even if the number of electrodes 62 and 72 is large, the second semiconductor chip 70
Since a part of the first semiconductor chip 60 can be mounted outside the semiconductor chip 60, a high-density semiconductor device can be provided.
【0054】図4は、本実施の形態に係る半導体装置の
一例を示す図である。詳しくは、図4は、半導体装置の
断面図を示したものである。半導体装置2は、複数の半
導体チップ60、70、80、90を含む。複数の半導
体チップ60〜90は、上下に積層された任意の2つの
上述の第1及び第2の半導体チップとすることができ
る。FIG. 4 is a diagram showing an example of the semiconductor device according to the present embodiment. Specifically, FIG. 4 is a cross-sectional view of the semiconductor device. The semiconductor device 2 includes a plurality of semiconductor chips 60, 70, 80, 90. The plurality of semiconductor chips 60 to 90 can be any two of the above-described first and second semiconductor chips stacked vertically.
【0055】半導体装置2は、基板100と、複数の半
導体チップを封止する樹脂52と、を含む。本実施の形
態では、実装形態(パッケージ形態)が上述の実施の形
態と異なる。本実施の形態に係る半導体装置の一例とし
て、BGA(Ball Grid Array)又はCSP(Chip Scal
e/Size Package)などの基板(インターポーザ)を用い
たパッケージに適用した形態が挙げられる。The semiconductor device 2 includes a substrate 100 and a resin 52 for sealing a plurality of semiconductor chips. In this embodiment, a mounting mode (package mode) is different from the above-described embodiment. As an example of the semiconductor device according to the present embodiment, a BGA (Ball Grid Array) or a CSP (Chip Scal
e / Size Package) and the like, which are applied to a package using a substrate (interposer).
【0056】複数の半導体チップ60〜90は、上下に
積層された2つが平面的に一部において、重なるように
積層されている。半導体チップ60〜90のいずれか
は、1つ飛ばしで、他の半導体チップと平面的に重なっ
て積層されてもよい。The plurality of semiconductor chips 60 to 90 are stacked so that two stacked vertically are partially overlapped in plan. Any one of the semiconductor chips 60 to 90 may be stacked one on top of the other and stacked on another semiconductor chip.
【0057】いずれかの半導体チップ(例えば半導体チ
ップ70)は、下にくる半導体チップ(例えば半導体チ
ップ60)からはみ出した側に電極(例えば電極72)
が形成されている。複数の半導体チップ60〜90が隣
り合う2辺に電極62、72、82、92を有する場合
は、それぞれの半導体チップ60〜90の電極62〜9
2は、隣り合う2辺の側とそれに対向する側とに交互に
形成されてもよい。これによれば、半導体チップを積み
重ねる高さ方向において、ワイヤ64、74、84、9
4の接触を防止できる。One of the semiconductor chips (for example, the semiconductor chip 70) has an electrode (for example, the electrode 72) on the side protruding from the underlying semiconductor chip (for example, the semiconductor chip 60).
Are formed. When the plurality of semiconductor chips 60 to 90 have the electrodes 62, 72, 82, and 92 on two adjacent sides, the electrodes 62 to 9 of the respective semiconductor chips 60 to 90
2 may be alternately formed on two sides adjacent to each other and a side opposite to the two sides. According to this, in the height direction in which the semiconductor chips are stacked, the wires 64, 74, 84, 9
4 can be prevented.
【0058】これまでに示した半導体チップの積層形態
は、同一構造の半導体チップを積層する形態であるが、
これとは別に異なる構造の複数の半導体チップを積層さ
せてもよい。例えば、1辺に並んだ電極を有する半導体
チップ(例えば第1の半導体チップ10)の上に、隣り
合う2辺に並んだ電極を有する半導体チップ(例えば第
2の半導体チップ70)を積層させてもよい。あるい
は、隣り合う2辺に並んだ電極を有する半導体チップ
(例えば第1の半導体チップ60)の上に、1辺に並ん
だ電極を有する半導体チップ(例えば第2の半導体チッ
プ20)を積層させてもよい。また、積層されてなる複
数の半導体チップは、下側の半導体チップからはみ出し
た側に電極が並んでなる上下の半導体チップの組み合わ
せを、少なくとも1つ(1つ又は全部)有していればよ
い。The stacking mode of the semiconductor chips described so far is a mode in which semiconductor chips having the same structure are stacked.
Alternatively, a plurality of semiconductor chips having different structures may be stacked. For example, a semiconductor chip (for example, the second semiconductor chip 70) having electrodes arranged on two adjacent sides is stacked on a semiconductor chip (for example, the first semiconductor chip 10) having electrodes arranged on one side. Is also good. Alternatively, a semiconductor chip having electrodes arranged on one side (for example, the second semiconductor chip 20) is laminated on a semiconductor chip having electrodes arranged on two adjacent sides (for example, the first semiconductor chip 60). Is also good. Further, the plurality of stacked semiconductor chips may have at least one (one or all) combinations of upper and lower semiconductor chips in which electrodes are arranged on the side protruding from the lower semiconductor chip. .
【0059】基板100は、有機系、無機系又はこれら
の複合によって形成されることが多い。基板100の一
例として、例えばポリイミド樹脂からなるフレキシブル
基板であってもよく、又はセラミック、ガラスもしくは
ガラスエポキシなどのものであってもよい。なお、基板
100として、多層基板やビルドアップ型基板を用いて
もよい。The substrate 100 is often formed of an organic type, an inorganic type, or a combination thereof. An example of the substrate 100 may be a flexible substrate made of, for example, a polyimide resin, or a substrate made of ceramic, glass, or glass epoxy. Note that, as the substrate 100, a multilayer substrate or a build-up type substrate may be used.
【0060】基板100にはリードが形成されている。
この場合にリードは、配線パターン102であってもよ
い。配線パターン102は、ワイヤ64、74、84、
94によって、それぞれの半導体チップ60〜90の電
極62〜92と電気的に接続される。詳しくは、ワイヤ
64〜94は、配線パターン102の接続部104と接
続される。接続部104は、そこに接続される配線より
も面積の広い、いわゆるランド部であってもよい。The substrate 100 has leads formed thereon.
In this case, the lead may be the wiring pattern 102. The wiring pattern 102 includes wires 64, 74, 84,
94 electrically connects the electrodes 62 to 92 of the respective semiconductor chips 60 to 90. Specifically, the wires 64 to 94 are connected to the connection portions 104 of the wiring pattern 102. The connection portion 104 may be a so-called land portion having a larger area than a wiring connected thereto.
【0061】半導体装置2は、外部端子106を有して
もよい。図4に示す例では、外部端子106としてボー
ル状のバンプが形成されている。外部端子106は、例
えばハンダボールであってもよい。複数の半導体チップ
と電気的に接続する配線パターン102を所定の配置に
引き回して形成することで、外部端子106を基板10
0における2次元的に広がる領域に設けることができ
る。すなわち、半導体装置の外部端子106のピッチを
変換して、例えば回路基板(マザーボード)への搭載を
容易に行うことができる。The semiconductor device 2 may have the external terminal 106. In the example shown in FIG. 4, a ball-shaped bump is formed as the external terminal 106. The external terminal 106 may be, for example, a solder ball. By forming wiring patterns 102 electrically connected to a plurality of semiconductor chips in a predetermined arrangement, the external terminals 106
0 can be provided in a two-dimensionally expanded region. That is, the pitch of the external terminals 106 of the semiconductor device can be changed, and the semiconductor device can be easily mounted on, for example, a circuit board (motherboard).
【0062】外部端子106のその他の形態として、基
板100の配線パターン102の一部を延出し、そこか
ら外部接続を図るようにしてもよい。配線パターン10
2の一部をコネクタのリードとしたり、コネクタを基板
100上に実装してもよい。さらに、積極的に外部端子
106を形成せず回路基板への実装時に回路基板側に塗
布されるハンダクリームを利用し、その溶融時の表面張
力で結果的に外部端子を形成してもよい。その半導体装
置は、いわゆるランドグリッドアレイ型の半導体装置で
ある。なお、本実施の形態においても、上述と同様の効
果を得ることができる。As another form of the external terminal 106, a part of the wiring pattern 102 of the substrate 100 may be extended and an external connection may be made therefrom. Wiring pattern 10
2 may be used as a connector lead, or the connector may be mounted on the substrate 100. Further, the external terminal 106 may not be formed positively, and the external terminal may be formed as a result by the surface tension at the time of melting using a solder cream applied to the circuit board at the time of mounting on the circuit board. The semiconductor device is a so-called land grid array type semiconductor device. In this embodiment, the same effects as described above can be obtained.
【0063】これまでに記載の例では、電極とリードと
をワイヤ(導電材)を介して接続する例を示したが、直
接的に電極とリードとを電気的に接続してもよい。例え
ば、本発明をTAB技術によって製造される半導体装置
に適用してもよい。図4に示す例では、基板110のデ
バイスホール116に半導体チップ10、20が配置さ
れて、デバイスホール116の内側に突出するリード1
12の一部(インナーリード114)と電極12、22
とが直接的に接続される。半導体チップ10、20は、
電極12、22を有する面が基板110におけるリード
112を有する面と同じ方向を向いて配置されることが
多い。リード112は、図示するように、積層された半
導体チップ10、20の面の高さに応じて、先端部が屈
曲してもよい。In the examples described above, the electrodes and the leads are connected via wires (conductive materials). However, the electrodes and the leads may be directly electrically connected. For example, the present invention may be applied to a semiconductor device manufactured by TAB technology. In the example shown in FIG. 4, the semiconductor chips 10 and 20 are arranged in the device holes 116 of the substrate 110, and the leads 1 protruding inside the device holes 116.
12 (inner lead 114) and electrodes 12, 22
Are directly connected. The semiconductor chips 10 and 20
In many cases, the surface having the electrodes 12 and 22 faces the same direction as the surface of the substrate 110 having the leads 112. As shown, the lead 112 may be bent at the distal end in accordance with the height of the surface of the stacked semiconductor chips 10 and 20.
【0064】電極12、22とインナーリード114の
間に図示しないバンプが介在してもよい。また、リード
112における少なくともインナーリード114は、メ
ッキされてもよい。例えば、電極12、22上に形成さ
れた金バンプ(少なくとも表面が金からなるバンプ)
と、インナーリード114のスズメッキと、によって共
晶接合されてもよい。あるいは、電極12、22上の金
バンプと、インナーリード114の金メッキと、によっ
て熱圧着されて両者が接合されてもよい。A bump (not shown) may be interposed between the electrodes 12, 22 and the inner lead 114. Further, at least the inner lead 114 of the lead 112 may be plated. For example, a gold bump formed on the electrodes 12 and 22 (a bump having at least a surface made of gold)
And the tin plating of the inner lead 114 may be eutectic bonded. Alternatively, the two may be joined by thermocompression bonding using gold bumps on the electrodes 12 and 22 and gold plating of the inner leads 114.
【0065】図6には、上述の実施の形態に係る半導体
装置2を実装した回路基板200が示されている。回路
基板200には例えばガラスエポキシ基板等の有機系基
板を用いることが一般的である。回路基板200には例
えば銅などからなる配線パターンが所望の回路となるよ
うに形成されていて、それらの配線パターンと半導体装
置2の外部端子106とを機械的に接続することでそれ
らの電気的導通を図る。FIG. 6 shows a circuit board 200 on which the semiconductor device 2 according to the above embodiment is mounted. Generally, an organic substrate such as a glass epoxy substrate is used for the circuit board 200. Wiring patterns made of, for example, copper or the like are formed on the circuit board 200 so as to form a desired circuit. These wiring patterns and the external terminals 106 of the semiconductor device 2 are electrically connected to each other by mechanical connection. Conduct continuity.
【0066】なお、回路基板200に直接的に複数の半
導体チップを上述の形態で搭載してもよい。いわゆるベ
アチップ実装の場合にも本発明を適用することができ、
上述と同様の効果を得ることができる。Note that a plurality of semiconductor chips may be directly mounted on the circuit board 200 in the above-described manner. The present invention can be applied to so-called bare chip mounting,
The same effect as described above can be obtained.
【0067】そして、本発明を適用した半導体装置を有
する電子機器として、図7にはノート型パーソナルコン
ピュータ210、図8には携帯電話220が示されてい
る。FIG. 7 shows a notebook personal computer 210 and FIG. 8 shows a portable telephone 220 as an electronic apparatus having a semiconductor device to which the present invention is applied.
【図1】図1は、本発明を適用した第1の実施の形態に
係る半導体装置を説明するための図である。FIG. 1 is a diagram for explaining a semiconductor device according to a first embodiment to which the present invention is applied;
【図2】図2は、本発明を適用した第1の実施の形態に
係る半導体装置の一例を示す図である。FIG. 2 is a diagram illustrating an example of a semiconductor device according to a first embodiment to which the present invention is applied;
【図3】図3は、本発明を適用した第2の実施の形態に
係る半導体装置を説明するための図である。FIG. 3 is a diagram for explaining a semiconductor device according to a second embodiment to which the present invention is applied;
【図4】図4は、本発明を適用した第2の実施の形態に
係る半導体装置の一例を示す図である。FIG. 4 is a diagram illustrating an example of a semiconductor device according to a second embodiment to which the present invention is applied;
【図5】図5は、本発明を適用した実施の形態に係る半
導体装置の一例を示す図である。FIG. 5 is a diagram illustrating an example of a semiconductor device according to an embodiment to which the present invention is applied;
【図6】図6は、本発明を適用した実施の形態に係る半
導体装置が実装された回路基板を示す図である。FIG. 6 is a diagram illustrating a circuit board on which a semiconductor device according to an embodiment to which the present invention is applied is mounted;
【図7】図7は、本発明を適用した実施の形態に係る半
導体装置を有する電子機器を示す図である。FIG. 7 is a diagram illustrating an electronic apparatus including a semiconductor device according to an embodiment to which the present invention is applied;
【図8】図8は、本発明を適用した実施の形態に係る半
導体装置を有する電子機器を示す図である。FIG. 8 is a diagram illustrating an electronic apparatus including a semiconductor device according to an embodiment to which the present invention is applied;
10 半導体チップ(第1の半導体チップ) 12 電極 20 半導体チップ(第2の半導体チップ) 22 電極 30 半導体チップ 32 電極 40 半導体チップ 42 電極 50 リード 60 半導体チップ(第1の半導体チップ) 62 電極 70 半導体チップ(第2の半導体チップ) 72 電極 80 半導体チップ 82 電極 90 半導体チップ 92 電極 112 リード Reference Signs List 10 semiconductor chip (first semiconductor chip) 12 electrode 20 semiconductor chip (second semiconductor chip) 22 electrode 30 semiconductor chip 32 electrode 40 semiconductor chip 42 electrode 50 lead 60 semiconductor chip (first semiconductor chip) 62 electrode 70 semiconductor Chip (second semiconductor chip) 72 electrode 80 semiconductor chip 82 electrode 90 semiconductor chip 92 electrode 112 lead
Claims (8)
数の半導体チップを有し、前記複数の半導体チップは、
第1の半導体チップと、前記第1の半導体チップに搭載
された第2の半導体チップと、を含み、 前記第2の半導体チップは、前記第1の半導体チップの
外側に一部をはみ出して搭載され、前記第1の半導体チ
ップからはみ出した側に前記電極が形成されてなる半導
体装置。1. A semiconductor device comprising: a plurality of semiconductor chips on which electrodes are formed and stacked;
A first semiconductor chip; and a second semiconductor chip mounted on the first semiconductor chip, wherein the second semiconductor chip is partially mounted outside the first semiconductor chip and mounted. A semiconductor device having the electrode formed on a side protruding from the first semiconductor chip.
れ、 前記第2の半導体チップは、前記第1の半導体チップに
おける前記電極が形成された面に前記電極を避けて搭載
され、前記第1の半導体チップの前記電極から離れる方
向に前記第1の半導体チップの外側に突出してなる半導
体装置。2. The semiconductor device according to claim 1, wherein the electrode of the first semiconductor chip is formed at an end, and the second semiconductor chip is formed with the electrode of the first semiconductor chip. A semiconductor device which is mounted on the surface avoiding the electrodes and protrudes outside the first semiconductor chip in a direction away from the electrodes of the first semiconductor chip.
体チップの1辺に並んで形成され、 前記第2の半導体チップは、前記第1の半導体チップの
前記1辺に対向する辺を超えて外側に突出してなる半導
体装置。3. The semiconductor device according to claim 2, wherein the outer shape of the first semiconductor chip is rectangular, and the electrodes of the first semiconductor chip are arranged along one side of the first semiconductor chip. The semiconductor device, wherein the second semiconductor chip is formed and protrudes outward beyond a side opposite to the one side of the first semiconductor chip.
体チップの隣り合う2辺に並んで形成され、 前記第2の半導体チップは、前記第1の半導体チップの
前記2辺に対向する他の2辺を超えて外側に突出してな
る半導体装置。4. The semiconductor device according to claim 2, wherein the outer shape of the first semiconductor chip is rectangular, and the electrodes of the first semiconductor chip are located on two adjacent sides of the first semiconductor chip. A semiconductor device formed side by side, wherein the second semiconductor chip protrudes outside beyond the other two sides facing the two sides of the first semiconductor chip.
の半導体装置において、 前記第1又は第2の半導体チップの前記電極の並ぶ側に
配置されたリードを含み、前記電極と前記リードとが電
気的に接続されてなる半導体装置。5. The semiconductor device according to claim 1, further comprising a lead disposed on a side of said first or second semiconductor chip on which said electrode is arranged, wherein said electrode and said lead are arranged. And a semiconductor device that is electrically connected.
電気的に接続されてなる半導体装置。6. The semiconductor device according to claim 5, wherein the electrode and the lead are electrically connected directly or electrically by a conductive material.
の半導体装置が搭載された回路基板。7. A circuit board on which the semiconductor device according to claim 1 is mounted.
の半導体装置を有する電子機器。8. An electronic apparatus comprising the semiconductor device according to claim 1.
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JP2000216870A JP3818359B2 (en) | 2000-07-18 | 2000-07-18 | Semiconductor device, circuit board and electronic equipment |
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JP2000216870A JP3818359B2 (en) | 2000-07-18 | 2000-07-18 | Semiconductor device, circuit board and electronic equipment |
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