JP2002071928A - Method for manufacturing color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter on which a coloring film and a black matrix are formed so as to own a mutually overlapping region, of which the overlapping region has no protrusion from a coloring film surface and is excellently smooth, and which enables to display a uniform picture. SOLUTION: In the method of manufacturing a color filter by forming the coloring film and the black matrix containing resin on a substrate, the method is characterized by having a step for polishing the surface of a color filter film consisting of the black matrix containing the resin and the coloring film formed on the substrate and by setting chromaticity of the coloring film before the polishing so as to make chromaticity of the coloring film after the polishing have a desired chromaticity.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a color filter suitable for a CCD camera, various liquid crystal display devices such as a color liquid crystal display (LCD), a color image sensor and the like.

[0002]

2. Description of the Related Art A color filter used in a color liquid crystal display or the like generally has a pixel composed of a red (R), green (G), and blue (B) colored film, and a gap between the pixels to improve display contrast. And a black matrix. Generally, a colored film is formed so as to have a slightly overlapping region at the edge of a black matrix formed using a metal such as chromium (Cr) or a black resin.

In the case of a black matrix made of a metal film, since the thickness of the black matrix is 0.1 to 0.2 μm, even if the edge of the colored film and the black matrix are formed to overlap each other. The thickness of the overlapping region is not so large as to impair the smoothness of the color filter surface and hinder the liquid crystal display. That is, there is no protruding step on the surface of the color filter film.

However, in the case of a black matrix containing a black-colored resin component, if the film is too thin, a sufficient optical density cannot be obtained. The thickness needs to be 1.0 μm or more. However, when a colored film is formed on a black matrix having a film thickness of 1.0 μm or more so that the edges of the colored film overlap, as shown in FIG. 3 and the thickness b of the projection 3 may be 0.3 μm or more, or even 1 μm in some cases, from the surface of the colored film 1 in a region not overlapping with the black matrix 2. In particular, when the black matrix is formed by coating with a coating solution containing a resin component similarly to the formation of other colored films, or when a colored layer of a transfer material is to be transferred (transfer method), The above-described formation of the projections cannot be avoided, and the above-described transfer method in which a layer having a constant thickness is transferred and laminated is particularly remarkable.

Originally, from the viewpoint of improving the liquid crystal display characteristics, it is desired that the surface of the color filter be excellent in smoothness. However, the presence of the projections impairs the smoothness. Therefore, when the surface of the color filter serving as the contact surface with the liquid crystal material has the above-described protrusions, when the liquid crystal is displayed, the orientation of the liquid crystal molecules around the protrusions is disturbed, and display unevenness and a decrease in contrast are reduced. It is an inviting factor.

Conventionally, as a means for avoiding the deterioration of the smoothness due to the thickness of the overlapping region as described above, an overcoat layer is further formed on a color filter film composed of a colored film and a black matrix by coating and forming a smooth surface. Has been performed. However, there is a concern that the application of the overcoat layer may cause a reduction in yield, and a means for smoothing the color filter film surface without providing the overcoat layer has been desired.

On the other hand, the surface of the color filter film is generally polished. However, the polishing here removes foreign substances adhering to the color filter film surface to some extent so as not to hinder the subsequent processing. This is polishing in the sense of smoothing the surface, and is different from flattening the entire color filter film itself because the color filter film itself is formed to project in a convex shape. That is, for example, in order to improve the applicability of a coating solution for forming an overcoat layer (for example, to avoid coating unevenness), cleaning polishing for removing foreign matter that hinders coating has conventionally been performed. Has been done since. Specifically, for example, a full-surface polishing method for polishing using a polishing pad is known. In this method, the surface plate on which the planted cloth is affixed is polished by contacting or rotating the surface of the color filter film. However, it is difficult to control the amount of polishing due to differences in the hardness and the like of the RGB film and the black matrix film, and it is difficult to sufficiently remove foreign matter and planarize with high accuracy.

In Japanese Patent Application Laid-Open No. 8-68993,
There has been proposed a method of partially polishing foreign substances on a color filter using a polishing tape obtained by coating a belt with polishing abrasive grains. According to this method, since the polishing is performed in accordance with the respective shapes and hardness of the RGB film and the light shielding portion, it is possible to perform high-precision flattening locally while removing foreign matter, but it is possible to perform a wide range of high-speed There is a disadvantage that it is not suitable for polishing. Therefore, when the color filter film is formed so as to have an overlapping region where each of the RGB films and the black matrix overlap each other, the convex overlapping region exists over the entire surface of the substrate. The entire surface cannot be polished uniformly and at high speed.

As described above, in the color filter formed so that the three-colored RGB color film and the resin-containing black matrix have an overlapping region, there is no protrusion in the overlapping region, the smoothness is excellent, and the display unevenness and the like are improved. At present, a color filter that can display stably without a decrease in contrast has not yet been provided.

[0010]

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems and achieve the following objects. That is, in the present invention, the color film and the black matrix are formed so as to have an overlapping region with each other, and the surface of the color filter film including the region without the overlapping region protruding from the surface of the coloring film is excellent in smoothness, An object of the present invention is to provide a method of manufacturing a color filter capable of manufacturing a color filter capable of displaying an image with high contrast without display unevenness.

[0011]

Means for solving the above problems are as follows. <1> A method for manufacturing a color filter, in which a color film and a resin-containing black matrix are formed on a substrate to form a color filter, the color filter comprising a resin-containing black matrix and a color film formed on the substrate. A method for producing a color filter, comprising a step of polishing the surface of a film, and setting the chromaticity of the colored film before polishing so that the chromaticity of the colored film after polishing becomes a desired chromaticity. It is.

<2> A color for producing a color filter by laminating a photosensitive transfer material having a photosensitive resin layer on a substrate and transferring the photosensitive resin layer to form a colored film and a resin-containing black matrix. A method for manufacturing a filter, comprising a step of polishing a surface of a color filter film composed of a colored film and a resin-containing black matrix formed on a substrate.

<3> The chromaticity of the colored film before polishing is set so that the chromaticity of the colored film after polishing becomes a desired chromaticity.
2>. <4> The method for producing a color filter according to any one of <1> to <3>, wherein the surface of the color filter film is polished by wet polishing.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A first aspect of the color filter manufacturing method of the present invention includes a step of polishing a surface of a color filter film having a plurality of colored films and a resin-containing black matrix formed on a substrate. The chromaticity of the colored film before polishing is set so that the chromaticity of the colored film after polishing becomes a desired chromaticity.

In a second aspect of the method for manufacturing a color filter of the present invention, a plurality of photosensitive transfer materials are used on a substrate.
A method of manufacturing a color filter for laminating a photosensitive transfer material having a photosensitive resin layer and transferring the photosensitive resin layer to form a colored film of a plurality of colors and a resin-containing black matrix, wherein the color filter is formed on a substrate. Characterized in that it has a step of polishing the surface of a color filter film composed of a colored film and a resin-containing black matrix, and preferably the coloration before polishing falls within a range in which the chromaticity of the colored film after polishing becomes a desired chromaticity. Set the chromaticity of the film. Hereinafter, the method for manufacturing the color filter of the present invention will be described in detail.

In the method for producing a color filter of the present invention according to the first and second aspects, basically, a resin-containing black matrix is formed on a substrate constituting the color filter (hereinafter, simply referred to as “substrate”). Forming (hereinafter referred to as “black matrix forming step”) and forming R (red), G (green), and B (blue) colored films on the substrate (hereinafter referred to as “colored film formation”). Process).
And a step of polishing the surface of a color filter film formed of a colored film and a resin-containing black matrix formed on the substrate (hereinafter, may be referred to as a “polishing step”). Is provided with a color filter film formed so that the colored film and the resin-containing black matrix overlap each other.

Although the black matrix forming step and the colored film forming step may be any of the preceding steps, the viewpoint of the optical density of the overlapping region with the colored film of the black matrix and the positional accuracy of the colored pixels are not limited. From the viewpoint, the black matrix forming step is generally set as the previous step. Here, the positional accuracy of the colored pixels refers to the accuracy when viewed through transmission, and the accuracy of the position and width of the black matrix is important. Therefore, the case where the black matrix forming step is the previous step is preferable in that even if the protrusions in the overlapping area are shaved, there is no effect on the accuracy of the black matrix and no significant change in density occurs. In the case where the black matrix forming step is a subsequent step, if the projections of the overlapping area are removed, the overlapping area itself disappears, and there is a possibility that the positional deviation of the pixel becomes apparent.

In the present invention, after the black matrix forming step and the colored film forming step, a color filter film composed of a colored film and a resin-containing black matrix (hereinafter simply referred to as a “color filter film”) is formed on the substrate. ), A polishing step of polishing the surface of the color filter film is provided. First, a characteristic polishing step in the present invention will be described.

(Polishing Step) In the polishing step, the surface of the color filter film composed of the resin-containing black matrix and the colored film formed on the substrate is polished.

In the color filter according to the present invention,
For example, as shown in FIG. 1, since the colored film 1 is formed so as to have a slightly overlapping region a with the black matrix 2 on the periphery thereof, the overlapping region a is formed by the colored film 1 and the black matrix 2. Is formed in a convex thick film portion (hereinafter, referred to as a “projection portion”) 3 protruding from the surface by a film thickness b from a region where the color filter film does not overlap with each other, so that the smoothness of the color filter film is significantly impaired. . In particular, when a colored film and a black matrix are formed using a photosensitive transfer material as in the embodiment (A) described below, the thickness b of the overlapping region is almost equal to the sum of the two layer thicknesses. The deterioration of the smoothness becomes more remarkable. That is, the liquid crystal material is closely arranged on the color filter film, and the projections 3 are located on the side of the liquid crystal material so that the orientation of the liquid crystal molecules is disturbed around the projections 3 during the liquid crystal display, causing display unevenness. This leads to a decrease in contrast. In particular, this is a problem particularly when the thickness b of the overlap region a is 0.3 μm or more or when the angle α between the surface of the colored film 1 and the projection 3 is large. Conversely, the same applies when the black matrix is formed after the formation of the colored film.

In the present invention, a polishing step is provided after forming a color filter film in a colored film forming step and a black matrix forming step described later, and in the polishing step,
The surface of the color filter film is polished uniformly. Polishing is performed on the entire surface of the color filter film to remove projections formed by overlapping the colored film and the black matrix.
Here, it is sufficient to remove only the more protruding protrusions, but in the polishing step according to the present invention, the entire surface of the color filter film is substantially smoothed by polishing.

The degree of polishing varies depending on the surface condition of the color filter film, but is appropriately selected according to the state of the periphery of the color filter film. The degree of polishing is such that the protrusion projecting from the surface of the colored film does not cause display unevenness of the liquid crystal display. Polishing may be performed so long as both the colored film and the black matrix are polished, or polished so that only the colored film is substantially removed.

As a method for polishing the surface of the color filter film, a wet polishing method in which polishing particles such as alumina particles are used and polishing is performed under a wet method is preferable. For example, SP-800
Polishing can be suitably performed by using a polishing device such as (manufactured by Speed Fam). As the particle size of the abrasive grains,
0.5 to 1.0 μm is preferred.

In carrying out the polishing step, in the present invention, a color film having a high chromaticity (density in a black matrix) or a film thickness and a color filter film made of a black matrix are formed on a substrate in advance. In advance, polishing is performed so as to obtain a colored film having a desired chromaticity (and / or a black matrix having a desired concentration). Generally, when a colored film already set to a desired chromaticity is polished, an initial chromaticity changes and a color filter having a desired chromaticity cannot be obtained, but the chromaticity of the colored film before polishing is reduced. Since the chromaticity of the colored film after polishing is set to be a desired chromaticity, there is no chromaticity deviation due to polishing.

By adopting the polishing step according to the present invention, a color film having a desired chromaticity and a color filter film comprising a black matrix having a desired density or more can be accurately and uniformly smoothed. Can be formed. In addition, in the main polishing step, the entire surface of the color filter film is uniformly polished, so that a color filter having particularly excellent surface smoothness can be formed at a high speed, and foreign matters can be formed on the color filter film surface other than the overlapping region. Even when there is a defect due to the adhesion of the color filter, the defect can be removed to produce a color filter having no defect.

Next, the colored film forming step and the black matrix forming step will be described. The colored film forming step, and the black matrix forming step, using a photosensitive transfer material having a photosensitive resin layer formed by applying a photosensitive resist on a temporary support, transferred to a substrate, exposed, developed [Aspect (A)], or a method in which a photosensitive resist is applied onto a substrate, and then exposed and developed to form [Aspect (B)]. Examples of the photosensitive transfer material include a dry film for forming a pixel and a photosensitive black resin sheet for forming a black matrix.

In the first aspect, any of the aspects (A) and (B) may be employed as the colored film forming step and the black matrix forming step. Mode (A) and the other step may be mode (B). In the second aspect, the aspect (A) is employed as the colored film forming step and the black matrix forming step.

In the present invention, as described later, the RG of the photosensitive resin layer of the photosensitive transfer material used in the embodiment (A) is used.
B, or the black density of the photosensitive resin layer of the photosensitive transfer material for black, or in the embodiment (B), the chromaticity of RGB of the photosensitive resin layer coated and formed with the photosensitive resin layer coating solution, The black density of the black matrix layer formed by applying the black matrix coating solution is set in advance to a range where the chromaticity after polishing becomes a desired chromaticity.

(Colored Film Forming Step) In the colored film forming step, three colored films of R (red), G (green), and B (blue) are overlapped with an edge portion of a black matrix described later. Is formed.

-Aspect (A)-In the aspect (A), a photosensitive transfer material having a photosensitive resin layer in which a colored photosensitive resist material is provided on a temporary support is used. After transferring the photosensitive resin layer, a colored film is formed by exposing to a desired pattern and further developing. Here, using a plurality of photosensitive transfer materials each having a photosensitive resin layer of a different hue,
By repeatedly transferring, exposing, and developing on the same substrate, a colored film made of RGB can be formed.

[Photosensitive Transfer Material] The photosensitive transfer material has at least a photosensitive resin layer on a temporary support, and if necessary, is provided between the temporary support and the photosensitive resin layer. ,
An intermediate layer such as a thermoplastic resin layer and an oxygen barrier layer is provided. Further, it is preferable that a cover film is provided on the photosensitive resin layer for the purpose of protecting the photosensitive resin layer during storage.

<Temporary Support> The temporary support is made of a material that is flexible, has good releasability from a photosensitive resin layer or the like, and is chemically and thermally stable. Is preferred. Specifically, Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene,
A film such as polypropylene or a laminate thereof is preferred. The thickness of the temporary support is suitably from 5 to 300 μm, and particularly preferably from 20 to 150 μm.

<Photosensitive Resin Layer> The photosensitive resin layer is prepared by coating a coating solution containing at least a photosensitive resin composition and a coloring agent (a coating solution for a photosensitive resin layer) by a known coating method. It is formed by coating on top. The photosensitive resin layer,
It is a colored layer containing a photosensitive resin composition and a coloring agent, and is preferably a resin layer that is softened or fluidized by heat or pressure. Specifically, it is preferable to have a transfer property showing thermoplasticity having softness or tackiness at a temperature of at least 150 ° C. or less, and it is cured when irradiated with light, while an unirradiated portion is easily exposed to an alkaline solution. It is preferable to be soluble and have resist properties. Most layers of known photopolymerizable compositions have this property. Further, these layers can be further modified by adding a thermoplastic resin or a compatible plasticizer.

As the photosensitive resin composition, for example, all those described in JP-A-3-282404 can be used. For example, a photosensitive resin composition comprising a negative-type diazo resin and a binder, a photosensitive resin composition, Examples include a synthetic composition, a photosensitive resin composition comprising an azide compound and a binder, and a cinnamic acid-type photosensitive resin composition. Above all, a photosensitive resin composition containing an alkali-soluble binder polymer, a monomer having an ethylenically unsaturated double bond that undergoes addition polymerization upon irradiation with light, and a photopolymerization initiator is preferable, and in the present invention, the photosensitive resin A photosensitive resin layer containing a composition and a colorant is particularly preferred.

As the alkali-soluble binder polymer, a polymer having a carboxylic acid group in a side chain, for example, JP-A-59-44615, JP-B-54-34
JP-A-327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836, and JP-A-59-71048 describe methacrylic acid copolymers and acrylic acid. Copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, and partially esterified maleic acid copolymers are exemplified. Also,
Cellulose derivatives having a carboxylic acid group in the side chain can also be mentioned.

In addition to the above, those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group are also suitable. Particularly, a copolymer of benzyl (meth) acrylate and (meth) acrylic acid or a multi-component copolymer of benzyl (meth) acrylate, (meth) acrylic acid and another monomer described in US Pat. No. 4,139,391. Can be mentioned.

When the alkali-soluble binder polymer is used, 50 to 300 mg KOH /
It is preferable to select and use those having an acid value in the range of g and a mass average molecular weight in the range of 1,000 to 300,000.

In addition to the above-mentioned alkali-soluble binder polymer, an alkali-insoluble polymer can be added for the purpose of improving various performances, for example, the strength of the cured film, as long as it does not adversely affect developability and the like. Such polymers include alcohol-soluble nylon or epoxy resins.

The total content of the alkali-soluble polymer and, if necessary, the alkali-insoluble polymer relative to the total solid content of the photosensitive resin composition is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass. . When the content is less than 10% by mass, the adhesiveness of the photosensitive resin layer may be too high, and when the content is more than 95% by mass, the formed image is inferior in strength and light sensitivity. There is.

The monomer having an ethylenically unsaturated double bond that undergoes addition polymerization upon irradiation with light has at least one addition-polymerizable ethylenically unsaturated group in the molecule and has a boiling point of 100 at normal pressure. Compounds at a temperature of at least ° C. For example, monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate;

Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra ( (Meth) acrylate, pentaerythritol tri (meth)
Acrylate, dipentaerythritol hexa (meth)
Acrylate, dipentaerythritol penta (meth)
Acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; trimethylolpropane and glycerin And polyfunctional acrylates and polyfunctional methacrylates, such as those obtained by adding propylene oxide to ethylene oxide to a polyfunctional alcohol such as (meth) acrylated.

Further, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50-6034, and Japanese Patent Application Laid-Open No. 51-37193.
Urethane acrylates described in JP-A No.
Polyester acrylates described in JP-A-64183, JP-B-49-43191 and JP-B-52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of an epoxy resin and (meth) acrylic acid Are also mentioned. Among them, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are preferable.

The monomer having an ethylenically unsaturated double bond that undergoes addition polymerization upon irradiation with light may be used alone or as a mixture of two or more. Further, the content of the monomer with respect to the total solid content of the photosensitive resin composition is 5
The content is generally from 50 to 50% by mass, and particularly preferably from 10 to 40% by mass. If the content is less than 5% by mass, the photosensitivity and the strength of the image may be reduced. If the content is more than 50% by mass, the adhesiveness of the photosensitive resin layer may be excessive, which is not preferable.

As the photopolymerization initiator, US Pat.
U.S. Pat. No. 2,672,512, a vicinal polyketaldonyl compound described in US Pat. No. 3,676,660, an acyloin ether compound described in U.S. Pat. No. 2,448,828.
No. 3,049,127 and 2,951,758, polynuclear quinone compounds described in U.S. Pat. Nos. 3,046,127 and 2,951,758, and U.S. Pat. No. 3,549,367. A combination of a triarylimidazole dimer and a p-aminoketone, a benzothiazole compound and a trihalomethyl-s-triazine compound described in JP-B-51-48516, and a trihalomethyl compound described in U.S. Pat. No. 4,239,850. -S-triazine compounds, U.S. Pat.
No. 976, for example, a trihalomethyloxadiazole compound.

Among them, particularly preferred are trihalomethyl-s-triazine, trihalomethyloxadiazole and triarylimidazole dimer. As the content of the photopolymerization initiator with respect to the total solid content of the photosensitive resin composition,
The content is generally 0.5 to 20% by mass, and particularly preferably 1 to 15% by mass. When the content is less than 0.5% by mass, light sensitivity and image intensity may be low.
Even if added in excess of 0% by mass, no effect on performance improvement is observed.

As the coloring agent (coloring material), red, green and blue pigments which are colors constituting a color filter are generally used. Preferred examples thereof include carmine 6B (CI. 12490), phthalocyanine green (CI. 74260), phthalocyanine blue (CI. 74160) and the like.

As described above, when the chromaticity of the photosensitive resin layer before polishing is set in advance so that the chromaticity after polishing becomes a desired chromaticity, the chromaticity before polishing is determined by the colorant. Can be adjusted by the content of The specific content of the colorant in the photosensitive resin layer varies depending on the target chromaticity and the degree of polishing, but is preferably 2 to 50% by mass of the solid content of the photosensitive resin layer, and is preferably 5 to 45% by mass. % Is more preferred. If the content is outside the above range, a color filter having a desired chromaticity after polishing may not be produced.

The photosensitive resin layer can contain the following other components in addition to the above components. It is particularly preferable that the photosensitive resin layer contains a thermal polymerization inhibitor. Examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,
4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-
Butylphenol), 2-mercaptobenzimidazole, phenothiazine and the like. Further, known additives such as a plasticizer, a surfactant, a solvent, and the like can be added to the photosensitive resin layer.

The photosensitive transfer material is prepared by dissolving or dispersing the photosensitive resin composition and a coloring agent in a solvent on a temporary support, and preparing a solution or dispersion (a coating solution for a photosensitive resin layer). After application, it can be formed by drying.

The thickness of the photosensitive resin layer is generally preferably 0.5 to 3 μm, and usually about 2 μm.
On the other hand, when the chromaticity of the photosensitive resin layer before polishing is set in advance so that the chromaticity after polishing becomes a desired chromaticity, as described above, the chromaticity before polishing depends on the content of the coloring agent. Can be set, but may be set by adjusting the layer thickness of the photosensitive resin layer regardless of the content. The chromaticity before polishing may be set by adjusting the content and the layer thickness.

When the chromaticity before polishing is adjusted by the layer thickness,
The layer thickness of the photosensitive resin layer is 0.8 to 4.0 μm.
Is preferably, and more preferably 1.2 to 3.5 μm.

Further, when a thermoplastic resin layer or an intermediate layer (such as an oxygen barrier layer) is provided, first, a coating liquid (a coating liquid for a thermoplastic resin layer) formed by dissolving a thermoplastic resin in an organic solvent is temporarily supported. Coating and drying on the body to form a thermoplastic resin layer, then preparing a coating solution (a coating solution for an intermediate layer) using a solvent that does not dissolve the thermoplastic resin layer, and coating and drying the intermediate layer Are laminated. Next, a coating solution for a photosensitive resin layer is prepared using an organic solvent that does not dissolve the intermediate layer, and is further coated and dried on the intermediate layer to form a photosensitive resin layer. A cover film made of polypropylene or the like may be further provided on the surface of the photosensitive resin layer. The cover film is peeled off in a step before the photosensitive transfer material is laminated on the substrate.

<Thermoplastic resin layer> The thermoplastic resin layer is provided for the purpose of preventing air bubbles from entering during transfer, and mainly contains an alkali-soluble thermoplastic resin, and may contain other components as necessary. May be included. The thermoplastic resin preferably has a substantial softening point of 80 ° C. or less. Examples of the alkali-soluble thermoplastic resin having a softening point of 80 ° C. or lower include a saponified product of ethylene and an acrylate copolymer, a saponified product of styrene and a (meth) acrylate copolymer, and vinyltoluene and (meth) acrylic. Examples include saponified acid ester copolymers, poly (meth) acrylates, and saponified (meth) acrylate copolymers such as butyl (meth) acrylate and vinyl acetate. The thermoplastic resins may be used alone or in combination of two or more.

Also, an organic material having a softening point of about 80 ° C. or less described in “Plastic Performance Handbook” (edited by the Japan Plastics Industry Federation, All Japan Plastics Molding Industry Association, published by the Industrial Research Council, issued on October 25, 1968). Among the polymers, those soluble in an alkaline aqueous solution can be used.

Further, even if the organic polymer substance has a softening point of 80 ° C. or more, various plasticizers compatible with the organic polymer substance are added to the organic polymer substance to substantially reduce the The softening point can be lowered to 80 ° C. or lower.
In the organic polymer substance, various polymers, a supercooled substance, an adhesion improver, a surfactant, a releasing agent, for the purpose of adjusting the adhesive strength to the support, within a range where the substantial softening point does not exceed 80 ° C. Molding agents and the like can be added.

Specific examples of the plasticizer include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, biphenyl diphenyl phosphate, and the like. .

The thermoplastic resin layer is prepared by dissolving the thermoplastic resin and, if necessary, other components in an organic solvent to prepare a coating solution (coating solution for a thermoplastic resin layer), and temporarily supporting the coating solution by a known coating method. It can be formed by coating or the like on the body. Examples of the organic solvent include methyl ethyl ketone, 1-methoxy-
2-propanol and the like.

The thickness of the thermoplastic resin layer is 6 μm.
m or more is preferable. When the layer thickness is less than 6 μm, 1
In some cases, it may be difficult to completely absorb irregularities of the underlayer having a size of μm or more. The upper limit is generally about 100 μm or less from the viewpoint of developability and manufacturing suitability, and about 50 μm or less.
m or less is preferable.

<Intermediate Layer> It is preferable to provide an oxygen barrier layer or the like as the intermediate layer. The oxygen barrier layer, the purpose of preventing the diffusion of oxygen from the air that inhibits the photo-curing reaction in the photosensitive resin layer during pattern exposure, and the layer when the thermoplastic resin layer is provided It is provided for the purpose of preventing the photosensitive resin layer from mixing with each other.

The oxygen barrier layer mainly comprises a resin component which can be dispersed and dissolved in water or an aqueous alkali solution, and may contain other components such as a surfactant, if necessary. The resin component constituting the oxygen barrier layer can be appropriately selected from known ones.
No. 121 and JP-B-56-40824, polyvinyl ether / maleic anhydride polymer, water-soluble salts of carboxyalkyl cellulose, water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinyl pyrrolidone, Water-soluble salts of the group consisting of various polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, various starches and the like, styrene / maleic acid copolymers, maleates Resins and those obtained by combining two or more of these resins are exemplified.

Among them, a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferred. Further, the polyvinyl alcohol has a saponification rate of 80.
% Or more is preferable. The content of the polyvinyl pyrrolidone is 1 to 75% of the solid volume of the intermediate layer.
Is preferable, more preferably 1 to 60%, and most preferably 10 to 50%. If the solid volume is less than 1%, sufficient adhesion with the curable resin layer may not be obtained, and if it exceeds 75%,
Oxygen barrier ability may decrease.

When the oxygen-blocking ability of the oxygen-blocking layer is lowered, the polymerization sensitivity of the curable resin layer is lowered, so that not only the light amount at the time of exposure must be increased or the exposure time must be lengthened, but also the resolution must be increased. Therefore, the oxygen permeability is preferably small.

The oxygen barrier layer is formed by dissolving and dispersing a resin component and the like in an aqueous solvent to prepare a coating solution (coating solution for an oxygen barrier layer), and applying the solution on a temporary support by a known coating method. can do. Examples of the aqueous solvent include a solvent containing water such as distilled water as a main component and, if desired, a solvent or a salt having an affinity for water, such as alcohol, to the extent that the effects of the present invention are not impaired.

The thickness of the oxygen barrier layer is about 0.1
To 5 μm, more preferably 0.5 to 2 μm.
If the layer thickness is less than about 0.1 μm, the oxygen permeability is too high, and the polymerization sensitivity of the curable resin layer may be lowered. It may be necessary.

<Method of Forming Colored Film> Next, a method of forming a colored film using a photosensitive transfer material will be described. Here, an example using a photosensitive transfer material in which a thermoplastic resin layer, an oxygen blocking layer, a photosensitive resin layer, and a cover film are laminated in this order on a temporary support as a photosensitive transfer material is shown. First, the cover film of the photosensitive transfer material is removed, and the photosensitive resin layer is closely adhered to a substrate as a transfer object under pressure and heat. For laminating, a laminator appropriately selected from conventionally known laminators, vacuum laminators and the like can be used. To further increase productivity, an auto-cut laminator can also be used.

After bonding, the temporary support was peeled off at the interface with the thermoplastic resin layer, and the photosensitive resin layer was exposed in a pattern from above the thermoplastic resin layer through the thermoplastic resin layer and the oxygen barrier layer. Patterning). As a light source that can be used for the patterning, a light source that emits ultraviolet light is preferable in terms of high energy and rapid polymerization reaction, and examples thereof include a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, and an Hg-Xe lamp.

As the patterning method, for example, a method of arranging an exposure mask above the thermoplastic resin layer and exposing the pattern in a lump through the mask, a method of using an exposure means such as a stepper exposure apparatus, or the like is used. No.

After the exposure, development processing is performed to remove the thermoplastic resin layer, the oxygen blocking layer, and the unnecessary portion (uncured portion) of the photosensitive resin layer. Then, only the irradiated cured portion remains on the substrate to form a colored film. By repeating this process using a photosensitive transfer material for forming a red, green and blue colored film, a colored film made of RGB can be formed.

The development can be performed by a known method. For example, (a) immersing the exposed substrate itself in a developing bath using a solvent or an aqueous developer, particularly an alkaline aqueous solution, etc .; Spraying may be performed on the subsequent substrate by spraying or the like, and if necessary, the object may be rubbed with a rotary brush or a wet sponge or the like while irradiating an ultrasonic wave for the purpose of enhancing the solubility.

As the alkaline aqueous solution, a dilute aqueous solution of an alkaline substance is preferable, and an aqueous solution to which a small amount of a water-miscible organic solvent is added can also be suitably used. As the alkaline substance, sodium hydroxide,
Alkali metal hydroxides such as potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkali metal bicarbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate; alkali metals such as sodium silicate and potassium silicate Silicates, alkali metal metasilicates such as sodium metasilicate, potassium metasilicate, etc., tetraalkylammonium hydroxides such as triethanolamine, diethanolamine, monoethanolamine, morpholine, tetramethylammonium hydroxide, trisodium phosphate, etc. Is mentioned.

The concentration of the alkaline substance in the aqueous alkaline solution is preferably 0.01 to 30% by weight,
Is preferably 8 to 14.

Examples of the water-miscible organic solvent include:
Methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone,
γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like. As the addition amount of the organic solvent,
0.1 to 30% by weight is preferred.

Further, various known surfactants can be added to the aqueous alkali solution. The concentration of the surfactant is preferably from 0.01 to 10% by weight. Usually, the temperature during development is preferably from about room temperature to 40 ° C.
Further, after the development processing, a step of washing with water may be included.

-Aspect (B)-In the aspect (B), a colored photosensitive resist material (having the same composition as the photosensitive resin layer coating solution prepared in the aspect (A)) is used as a substrate. After being directly applied on top, it is exposed to a desired pattern in the same manner as in the embodiment (A),
Further, a colored film is formed by performing a developing process. Here, by using the photosensitive resin layer coating liquid of each different hue,
By repeatedly applying, exposing and developing on the same substrate, a colored film made of RGB can be formed.

As described above, it is necessary to previously set the chromaticity of the photosensitive resin layer before polishing so that the chromaticity after polishing becomes a desired chromaticity. The chromaticity before polishing can be set by adjusting the content of the coloring agent in the layer coating liquid and / or the layer thickness of the photosensitive resin layer formed by coating. The conditions relating to exposure and development, such as the photosensitive resin layer coating solution, the coating thickness of the coating solution, the substrate, and preferred embodiments thereof, used in this embodiment are the same as those in the above embodiment (A).

(Black Matrix Forming Step) In the black matrix forming step, a black matrix containing a resin is formed so as to have a region overlapping the peripheral portion of the colored film.

-Aspect (A)-In the aspect (A), a black photosensitive transfer layer having a black colored photosensitive resin layer provided with a black colored photosensitive resist material on a temporary support. A black matrix is formed by transferring the photosensitive resin layer onto a substrate, exposing the photosensitive resin layer to a desired pattern, and further developing the same as in the case of the color film forming step (A). it can.

In the above-mentioned photosensitive transfer material for black,
On the temporary support, at least having a photosensitive resin layer,
If necessary, a thermoplastic resin layer and an oxygen barrier layer are provided between the temporary support and the photosensitive resin layer. Further, it is preferable that a cover film is provided on the photosensitive resin layer for the purpose of protecting the photosensitive resin layer during storage. The temporary support, the thermoplastic resin layer, the intermediate portion (oxygen blocking layer), the cover film, and the preferred embodiments of the black photosensitive transfer material are used in the above-described colored film forming step. This is the same as in the case of the photosensitive transfer material.

The black-colored photosensitive resin layer is coated on a temporary support by a known coating method with a coating solution (a coating solution for black matrix) containing at least a photosensitive resin composition and a black colorant. Formed. Here, the photosensitive resin composition, and other components that can be contained in the photosensitive resin layer,
This is the same as the case of the photosensitive transfer material used in the above-described colored film forming step. As the black colorant, a black pigment is generally used, for example, carbon black. Further, the content of the colorant in the black photosensitive resin layer,
This is the same as the case of the photosensitive transfer material used in the above-described colored film forming step.

The formation of the black matrix using the black photosensitive transfer material can be performed in the same manner as in the above-described colored film forming step. The conditions relating to exposure and development, such as the coating thickness of the coating liquid for the black matrix, the temporary support, and preferred embodiments thereof, are the same as those in the above-described embodiment (A) of the colored film forming step. When the chromaticity of the black-colored photosensitive resin layer before polishing is set in advance so that the chromaticity after polishing becomes a desired chromaticity, the content of the colorant in the coating liquid for the black matrix may be adjusted. By adjusting the thickness of the photosensitive resin layer, it is possible to set so that a black matrix having a desired concentration or more can be obtained after polishing.

-Aspect (B)-In the aspect (B), a black-colored photosensitive resist material (having the same composition as the black matrix coating solution prepared in the aspect (A)) is placed on a substrate. After being directly applied to the substrate, the film is exposed to a desired pattern in the same manner as in the embodiment (A), and then subjected to a development process to form a colored film.

The conditions for exposure and development, such as the coating solution for the black matrix used in this embodiment, the coating thickness of the coating solution, the substrate and their preferred embodiments, are the same as those in the above embodiment (A). The concentration of the black-colored photosensitive resin layer before polishing is adjusted by adjusting the content of the colorant in the coating liquid for the black matrix applied on the substrate and / or the thickness of the black-colored photosensitive resin layer. By doing so, a setting may be made so that a black matrix having a desired density or more can be obtained after polishing.

As the substrate constituting the color filter,
For example, a known glass plate such as a soda glass plate, a low expansion glass plate, a non-alkali glass plate, and a quartz glass plate having a silicon oxide film on the surface thereof, or a plastic film may be used.

As described above, the polishing step of polishing the entire surface of the color filter film is provided, and the chromaticity of the colored film before polishing is set in advance so that the chromaticity of the colored film after polishing becomes a desired chromaticity. By doing so, it is possible to produce a color filter which is excellent in surface smoothness, has no chromaticity deviation, and can display a high-contrast image without display unevenness.

[0085]

EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples. still,
In the following, “parts” and “%” represent “parts by mass” and “% by mass” unless otherwise specified. In this embodiment, the black matrix coating solution is referred to as a photosensitive resin layer coating solution (K).

Example 1 <Preparation of Photosensitive Transfer Material> A polyethylene terephthalate film (PET film) having a thickness of 75 μm and wound into a roll was prepared as a temporary support, and was placed on the temporary support. A coating liquid A for a thermoplastic resin layer having the following composition was applied and dried to form a thermoplastic resin layer having a dry layer thickness of 15 μm.

[Composition of Coating Solution A for Thermoplastic Resin Layer] Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer: 4.5 parts (copolymerization ratio (molar ratio) = 55 / 11.7 / 4.5 / 28.8, weight-average molecular weight 80000) Styrene / acrylic acid copolymer: 10.5 parts (copolymerization ratio (molar ratio) = 7/3, weight-average molecular weight 8000) BPE-500 (manufactured by Shin-Nakamura Chemical Co., Ltd.): 7 parts (average molecular weight: 822) Surfactant: 0.26 parts (Megafac F-177P, manufactured by Dainippon Ink and Chemicals, Inc.) 1) Methyl ethyl ketone 18.6 parts Methanol 30.6 parts 1-methoxy-2-propanol 9.3 parts

Subsequently, on the thermoplastic resin layer, as a layer having a function of preventing mixing of the thermoplastic resin layer and a photosensitive resin layer to be provided later and blocking oxygen, an intermediate layer having the following composition: The layer coating solution B was applied and dried to form an intermediate layer having a dry layer thickness of 1.6 μm. [Composition of Coating Solution B for Intermediate Layer]-Polyvinyl alcohol ... 13 parts (PVA-205 (Saponification ratio 80%), manufactured by Kuraray Co., Ltd.)-Polyvinyl pyrrolidone ... 6 parts (PVP-K30, V -Methanol: 173 parts-Water: 211.4 parts

Subsequently, there are four types having the compositions shown in Table 1 below, for a red layer (R layer), for a green layer (G layer), for a blue layer (B layer), and for a black layer (K layer). Coating solution for photosensitive resin layer (R, G,
B, K) were prepared. As described above, roll-shaped PET
Four types of thermoplastic resin layers and intermediate layers laminated on a film in this order are prepared, and the above-mentioned 4 layers are formed on each intermediate layer.
One kind of photosensitive resin layer coating liquid (R, G, B, K) is applied and dried, and the coating liquid RGB is dried layer thickness 2.0.
A photosensitive resin layer having a dry layer thickness of 1.2 μm was formed for the coating liquid K. From the above, on the temporary support, a thermoplastic resin layer, an intermediate layer, and red, green,
A photosensitive transfer material in the form of four rolls for forming an R layer, forming a G layer, forming a B layer, and forming a K layer is formed by laminating any one of a blue and a black photosensitive resin layer in this order. Produced.

[0090]

[Table 1]

As described later, the coating liquid for the photosensitive resin layer is used in order to improve the surface smoothness of the color filter. In consideration of this, before the polishing, the color filters having the chromaticities shown in Table 3 below are prepared so that the final target chromaticity of each of the RGB colors of the color filters becomes the value shown in Table 2 below. Oita.

[0092]

[Table 2]

[0093]

[Table 3]

<Formation of Color Filter> -Black Matrix Forming Step- First, a washed transparent glass substrate (thickness 0.7 mm, size 400 mm × 300 mm; # 1737, manufactured by Corning Corp.) was prepared. A silane coupling agent (KBM-603, manufactured by Shin-Etsu Chemical Co., Ltd.) was used to improve the adhesion between the transfer material and the photosensitive resin layer.
Was immersed in a 0.3% aqueous solution for 30 seconds, rinsed with pure water for 30 seconds, and dried with an air knife.

Next, the surface of the photosensitive resin layer (K) of the photosensitive transfer material for forming a K layer obtained above is superimposed on the glass substrate, and an auto-cut laminator ASC-24 (manufactured by Somar) is used. Pressure 2MPa, temperature 130 ° C,
Lamination was performed under the condition of a transport speed of 1.0 m / min. After that, only the temporary support was peeled off at the interface with the thermoplastic resin layer,
After removal, the photosensitive resin layer (K) was transferred onto the glass substrate. In this state, the photosensitive resin layer is placed on the glass substrate.
(K), an intermediate layer and a thermoplastic resin layer are laminated in this order.

Next, a predetermined photomask was arranged above the thermoplastic resin layer as the outermost layer, and exposure was performed through the photomask with an ultrahigh pressure mercury lamp under the conditions shown in Table 4 below. Thereafter, the thermoplastic resin layer and the intermediate layer were removed by shower development using a 10-fold diluted solution of developer T-PD-1 (manufactured by Fuji Photo Film Co., Ltd.) (development process 1). At this stage, the photosensitive resin layer has not been substantially developed. Subsequently, shower development was performed using a 5-fold diluted solution of a developing solution T-CD-1 (manufactured by Fuji Photo Film Co., Ltd.) to remove unnecessary portions (uncured portions) of the photosensitive resin layer (K) by development. [Development processing 2]. Further, while spraying a 10-fold diluted solution (33 ° C.) of a developing solution T-SD-1 (manufactured by Fuji Photo Film Co., Ltd.) on the photosensitive resin layer with a shower, rubbing with a rotating brush completely removes unnecessary portions. It was removed [Development processing 3]. Table 4 shows the conditions for the development processing.

After the development treatment, post exposure was performed from both surfaces of the glass substrate, and post-baking was performed using a convection oven to form a black matrix on the glass substrate. Table 4 shows the conditions of the post-exposure and post-bake.
Shown in

[0098]

[Table 4]

-Coloring film forming step- Subsequently, the surface of the photosensitive resin layer (R) of the photosensitive transfer material for forming an R layer is further superimposed on the surface of the glass substrate on which the black matrix is formed, and the black matrix is formed. The same operation as in the formation of the black matrix is repeated, the photosensitive resin layer (R) is transferred to cover the black matrix, and exposed using a predetermined photomask under the same conditions (Table 4) as in the formation of the black matrix. Then, development, post-exposure, and post-baking were performed to form a red pixel pattern composed of the R layer so as to have a slightly overlapping region with the black matrix. Subsequently, in the same manner as in the formation of the red pixel pattern, the photosensitive material for forming the G layer and the formation of the B layer are sequentially used so as to have a slightly overlapping region with the black matrix, respectively. And a blue pixel pattern.

As described above, a color filter having a black matrix and a color filter film composed of three colored pixels of RGB having the chromaticities shown in Table 3 was obtained on a transparent glass substrate. This color filter is formed so as to have an overlapping area where the black matrix and the colored pixel overlap each other. As shown in FIG. The projections were 3 μm or more (see 3 ′ in FIG. 2). Therefore, in order to improve the surface smoothness of the color filter, the following smoothing treatment was performed by polishing (polishing step).

-Polishing Step- As described above, the entire surface of the color filter film that has been post-baked is polished using a polishing apparatus SP-800 (manufactured by Speed Fam) to form an alumina having a particle size of 1.0 μm. Wet polishing with particles was performed. Actually, it was polished and smoothed to such an extent that only the colored film was polished.

The surface of the polished color filter film had good surface smoothness which did not hinder the alignment of the liquid crystal molecules as shown in FIG. 3 indicates a black matrix). In addition, since the entire surface was polished, there was no defect due to a non-adhered material or the like in the region other than the overlapping region. In addition, R after polishing
The chromaticity of the three colored pixels of GB is as shown in Table 5 below, and the target chromaticity (Table 2) was obtained.

[0103]

[Table 5]

[0104]

According to the present invention, the colored film and the black matrix are formed so as to have mutually overlapping regions,
Provided is a method for manufacturing a color filter capable of manufacturing a color filter capable of manufacturing an image with high contrast without unevenness in display, with the surface of the color filter film including the overlapped region not protruding from the surface of the colored film and having excellent smoothness. be able to.

[Brief description of the drawings]

FIG. 1 is a diagram showing an example of a color filter film having an overlapping region.

FIG. 2 is a profile showing a surface state of a color filter film before polishing.

FIG. 3 is a profile showing a surface state of a color filter film after polishing.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Color film 2 ... Black matrix 3, 3 '... Protrusion part a ... Overlap area | region where a color film and a black matrix overlap b ... Thickness of a protrusion part

Claims (4)

[Claims] 1. A method for manufacturing a color filter, wherein a color film and a resin-containing black matrix are formed on a substrate to produce a color filter, the color filter comprising a resin-containing black matrix and a color film formed on the substrate. A method for producing a color filter, comprising a step of polishing the surface of a film, and setting the chromaticity of the colored film before polishing so that the chromaticity of the colored film after polishing becomes a desired chromaticity. . 2. A method of laminating a photosensitive transfer material having a photosensitive resin layer on a substrate to transfer the photosensitive resin layer,
What is claimed is: 1. A method for manufacturing a color filter, comprising: forming a colored film and a resin-containing black matrix to form a color filter by forming a colored film and a resin-containing black matrix. A method for manufacturing a color filter, comprising: 3. The method for manufacturing a color filter according to claim 2, wherein the chromaticity of the colored film before polishing is set so that the chromaticity of the colored film after polishing becomes a desired chromaticity. 4. The method for manufacturing a color filter according to claim 1, wherein the surface of the color filter film is polished by wet polishing.