Nothing Special   »   [go: up one dir, main page]

JP2002057457A - Manufacturing method of multilayered printed-wiring board - Google Patents

Manufacturing method of multilayered printed-wiring board

Info

Publication number
JP2002057457A
JP2002057457A JP2000243542A JP2000243542A JP2002057457A JP 2002057457 A JP2002057457 A JP 2002057457A JP 2000243542 A JP2000243542 A JP 2000243542A JP 2000243542 A JP2000243542 A JP 2000243542A JP 2002057457 A JP2002057457 A JP 2002057457A
Authority
JP
Japan
Prior art keywords
copper foil
resin
inner layer
internal layer
hydrogen peroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000243542A
Other languages
Japanese (ja)
Inventor
Satoshi Maekawa
智 前川
Tetsuaki Suzuki
鉄秋 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP2000243542A priority Critical patent/JP2002057457A/en
Publication of JP2002057457A publication Critical patent/JP2002057457A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a multilayered printed-wiring board that has superior solder heat resistance and inner layer peel strength by carrying out internal layer copper foil treatment having an improved boding property with resin, and by increasing adhesion force between internal layer copper foil and resin. SOLUTION: A specific number of prepregs, where a thermosetting resin is impregnated to glass cloth are overlapped, a circuit is formed on an internal layer plate integrated by overlapping copper foil to the outside, and the prepregs are overlapped to the outside of the internal layer plate for integration, thus manufacturing a multilayered board. In this case, to improve the adhesion strength between the copper foil and resin, the internal layer copper foil, where the circuit is formed is treated by etching treatment liquid containing sulphuric acid, hydrogen peroxide water, and a corrosion prevention agent, or that containing the sulphuric acid, hydrogen peroxide water, corrosion preventing agent, and a water-soluble polymer, and is treated by an alkaline solution furthermore, thus integrating the multilayered board.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、はんだ耐熱性、内
層引剥がし強度、耐酸性に優れた多層プリント配線板の
製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a multilayer printed wiring board having excellent solder heat resistance, inner layer peeling strength and acid resistance.

【0002】[0002]

【従来の技術】近年、LSIの高速、高集積化とメモリ
ーの大容量化、それに電子部品の小型、軽量化、薄型化
が急速に進んでいる。加えて世界的に環境に配慮した基
板材料の要求が高まり、基板のハロゲンフリー化、アン
チモンフリー化、鉛フリー半田の使用が拡大してきてい
る。
2. Description of the Related Art In recent years, high-speed, high-integration LSIs, large-capacity memories, and small, lightweight, and thin electronic parts have been rapidly advanced. In addition, the demand for environmentally friendly substrate materials has been increasing worldwide, and the use of halogen-free, antimony-free, and lead-free solder on substrates has been expanding.

【0003】これに伴い、リフロー時の半田浴温度は、
上昇傾向にある。このため、基板の熱問題が大きな課題
となってきており、これ迄以上に基板のはんだ耐熱性、
内層引剥がし強度の向上が要求されている。
Accordingly, the solder bath temperature during reflow is
It is on the rise. For this reason, the thermal problem of the substrate has become a major issue, and the solder heat resistance of the substrate
An improvement in the inner layer peeling strength is required.

【0004】従来、多層板は内層銅箔の表面の密着性を
向上させるために、黒化処理とよばれる表面処理を行っ
ている。これは、内層板に所定の回路形成を行った後、
亜塩素酸ナトリウム、水酸化ナトリウム、リン酸ナトリ
ウム等の処理液で銅箔の表面を処理し、酸化銅被膜を形
成した後にプリプレグを介して積層成形し多層板を製造
する方法である。
Conventionally, a multilayer board has been subjected to a surface treatment called blackening treatment in order to improve the adhesion of the surface of the inner copper foil. This is because after performing a predetermined circuit formation on the inner layer board,
This is a method of manufacturing a multilayer board by treating the surface of a copper foil with a treatment solution such as sodium chlorite, sodium hydroxide, sodium phosphate, etc., forming a copper oxide film, and then laminating and molding through a prepreg.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
黒化処理多層板は、穴明け後のスルーホールメッキ工程
における酸性の前処理液やメッキ液による処理で酸化銅
被膜が溶解し、ピンクリングと呼ばれる現象を発生して
いた。このピンクリング発生により、多層板は接続信頼
性や耐熱性が低下するという問題が生じ、その対策とし
て多くの改良方法が提案されてきた。
However, in the conventional blackening-processed multilayer board, the copper oxide film is dissolved by the treatment with an acidic pretreatment solution or a plating solution in a through-hole plating process after drilling, and the pink ring is formed. The phenomenon called was occurring. The occurrence of the pink ring causes a problem that the connection reliability and the heat resistance of the multilayer board are reduced, and many improvement methods have been proposed as countermeasures.

【0006】例えば、銅箔を酸化剤を含む水溶液で処理
し、酸化銅被膜を形成後、ホルムアルデヒド供給源を含
む水溶液と接触させ、酸化銅被膜を還元して耐酸性を向
上させる方法(特開昭62−185884号公報)があ
る。しかしながら、酸化銅のある部分は全面的に金属銅
に還元される訳ではなく、水酸化銅に還元されるのであ
り、耐熱性は向上せず、処理液の管理も煩雑であった。
これに対し、過酸化水素含有水性組成物を用いて銅箔表
面を処理する方法によれば、銅箔表面が微細に粗面化さ
れ、耐酸性が優れ、熱的にも安定した処理面が得られる
ことがわかった(特願平10−161632号)。しか
しながら、この方法においては、内層銅箔との密着力が
劣るという問題があった。
For example, a method of treating a copper foil with an aqueous solution containing an oxidizing agent to form a copper oxide film, and then bringing the copper oxide film into contact with an aqueous solution containing a formaldehyde supply source to reduce the copper oxide film to improve acid resistance (Japanese Patent Application Laid-Open No. H10-163,837) 62-185888). However, a part of the copper oxide is not entirely reduced to copper metal, but is reduced to copper hydroxide, heat resistance is not improved, and management of the processing solution is complicated.
In contrast, according to the method of treating the copper foil surface using the hydrogen peroxide-containing aqueous composition, the copper foil surface is finely roughened, has excellent acid resistance, and has a thermally stable treated surface. It was found to be obtained (Japanese Patent Application No. 10-161632). However, in this method, there was a problem that the adhesion to the inner layer copper foil was poor.

【0007】本発明の目的は、樹脂との接着性に優れた
内層銅箔処理を行い、内層銅箔と樹脂との密着力を向上
させ、はんだ耐熱性、内層引剥がし強さに優れる多層プ
リント配線板を提供しようとするものである。
[0007] It is an object of the present invention to provide an inner layer copper foil having excellent adhesiveness to a resin, to improve the adhesion between the inner layer copper foil and the resin, and to provide a multilayer print excellent in solder heat resistance and inner layer peeling strength. It is intended to provide a wiring board.

【0008】[0008]

【課題を解決するための手段】本発明者らは、上記の目
的を達成しようと鋭意研究を行った結果、内層銅箔と樹
脂との密着力向上の手法として、内層銅箔を硫酸、過酸
化水素、腐食防止剤を含むエッチング処理液による処理
後、さらにアルカリ溶液処理をすることで内層銅箔と樹
脂との密着力を向上させることができ、上記目的が達成
できることを見いだし、本発明を完成させたものであ
る。
Means for Solving the Problems The present inventors have conducted intensive studies to achieve the above object, and as a result, as a method of improving the adhesion between the inner layer copper foil and the resin, sulfuric acid was added to the inner layer copper foil. After the treatment with an etching solution containing hydrogen oxide and a corrosion inhibitor, by further performing an alkali solution treatment, it is possible to improve the adhesion between the inner layer copper foil and the resin, and it has been found that the above object can be achieved. It has been completed.

【0009】即ち、本発明は、ガラスクロスに熱硬化性
樹脂を含浸させて得られるプリプレグを所定枚数重ね、
その外側に銅箔を重ね合わせて一体成形した内層板に回
路形成を行った後、内層板の外側にさらにプリプレグを
重ね一体成形して多層板を製造するにあたり、銅箔と樹
脂との密着力向上のため、上記回路形成をした内層銅箔
を、硫酸、過酸化水素及び腐食防止剤を含むエッチング
処理液、又は硫酸、過酸化水素、腐食防止剤及び水溶性
重合体を含むエッチング処理液によって処理し、さらに
アルカリ溶液で処理した後、上記多層板一体成形をする
ことを特徴とする多層プリント配線板の製造方法であ
る。
That is, according to the present invention, a predetermined number of prepregs obtained by impregnating a glass cloth with a thermosetting resin are stacked,
After forming a circuit on the inner layer plate which is formed by laminating copper foil on the outside, the prepreg is further laminated on the outside of the inner layer plate to form a multilayer board. For improvement, the inner layer copper foil on which the circuit was formed was treated with an etching solution containing sulfuric acid, hydrogen peroxide and a corrosion inhibitor, or an etching solution containing sulfuric acid, hydrogen peroxide, a corrosion inhibitor and a water-soluble polymer. A method for producing a multilayer printed wiring board, comprising treating the substrate, further treating the substrate with an alkaline solution, and then integrally forming the multilayer board.

【0010】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0011】本発明が適用される場合のプリプレグや銅
箔の原材料、コアとなる内層板の種類、ピンラミネート
方式、マスラミネート方式、シーケンシャル方式などの
積層構造、プレス条件等は、特に制約を受けない。
In the case where the present invention is applied, the raw materials of the prepreg and copper foil, the kind of the inner layer plate as the core, the laminated structure such as the pin laminating method, the mass laminating method and the sequential method, and the pressing conditions are particularly restricted. Absent.

【0012】回路形成した内層板を硫酸、過酸化水素及
び腐食防止剤を主成分とした溶液に浸漬し、エッチング
によって内層銅箔表面に凹凸を形成する。このとき、銅
箔表面は、同時に腐食防止剤によってコートされ、処理
後に錆が生じないようになる。これは、硫酸、過酸化水
素、腐食防止剤を含む処理液によって、エッチングによ
り銅箔表面が凹凸を形成されると同時に、その凹凸上に
防錆膜が形成されるためである。さらに、この硫酸、過
酸化水素及び腐食防止剤を主成分としたエッチング処理
液には、水溶性重合体の添加によって、凹凸上の防錆膜
が一段と強化される。
The inner layer plate on which the circuit is formed is immersed in a solution containing sulfuric acid, hydrogen peroxide and a corrosion inhibitor as main components, and irregularities are formed on the surface of the inner layer copper foil by etching. At this time, the surface of the copper foil is simultaneously coated with a corrosion inhibitor so that rust does not occur after the treatment. This is because the surface of the copper foil is formed asperities by etching with a treatment solution containing sulfuric acid, hydrogen peroxide, and a corrosion inhibitor, and at the same time, a rust preventive film is formed on the asperities. Further, the rust preventive film on the unevenness is further strengthened by the addition of a water-soluble polymer to the etching treatment liquid containing sulfuric acid, hydrogen peroxide and a corrosion inhibitor as main components.

【0013】本発明で用いるエッチング処理剤の腐蝕防
止剤としては、ベンゾトリアゾールなどトリアゾール
系、イミダゾール等のものが特に好適である。また、水
溶性重合体としては、酸化エチレンポリマー(ポリエチ
レングリコール)、ポリビニルアルコール等が好適であ
る。エッチング処理液の配合は、濃硫酸70〜110重
量%、50%過酸化水素水12〜30重量%、腐蝕防止
剤6〜12g/l、水溶性重合体3〜6g/lの範囲の
水溶液とすることが好ましい。
As the corrosion inhibitor for the etching agent used in the present invention, those based on triazoles such as benzotriazole and those based on imidazole are particularly suitable. As the water-soluble polymer, an ethylene oxide polymer (polyethylene glycol), polyvinyl alcohol and the like are preferable. The etching solution is mixed with an aqueous solution of concentrated sulfuric acid 70 to 110% by weight, 50% hydrogen peroxide solution 12 to 30% by weight, corrosion inhibitor 6 to 12 g / l, and water-soluble polymer 3 to 6 g / l. Is preferred.

【0014】この防錆膜の厚さは、数オングストローム
と非常に薄いものであり、銅箔表面に形成され内層銅箔
と樹脂との密着性を向上させている凹凸面を錆びないよ
うにし、耐熱性を維持している。
The thickness of the rust-preventive film is as thin as several angstroms, so that the uneven surface formed on the copper foil surface and improving the adhesion between the inner copper foil and the resin is prevented from rusting. Maintains heat resistance.

【0015】しかしながら、腐食防止剤や防錆効果のあ
る有機皮膜は、内層銅箔と樹脂との密着力を低下させる
という欠点があった。
However, an organic film having a corrosion inhibitor and a rust-preventing effect has a drawback that the adhesion between the inner copper foil and the resin is reduced.

【0016】この問題点に対し、処理液中の腐食防止剤
の含有量を減らすことによって、防錆層の厚さを薄くす
ることは可能であるが、この方法では、防錆層の厚さの
コントロールが難しいばかりでなく、処理に時間がかか
るため生産性の低下を招くことになった。また、最初に
形成する防錆膜や有機皮膜層を薄くすれば、内層銅箔と
樹脂との密着力は向上するが、処理後の保管時間が長い
と内層銅箔が錆びてしまうという問題があった。
To solve this problem, it is possible to reduce the thickness of the rust preventive layer by reducing the content of the corrosion inhibitor in the processing solution. Not only is difficult to control, but also takes time to process, which leads to a decrease in productivity. In addition, if the anti-corrosion film or organic film layer formed first is made thinner, the adhesion between the inner copper foil and the resin is improved, but if the storage time after treatment is long, the inner copper foil will rust. there were.

【0017】本発明は、内層銅箔凹凸表面上に防錆層、
有機皮膜層を形成後、アルカリ溶液で膜厚を適当な厚さ
まで薄くして、防錆効果を損なわずに内層銅箔と樹脂と
の密着力を向上させるものである。
According to the present invention, there is provided a rust-preventive layer on the uneven surface of the inner copper foil,
After forming the organic film layer, the film thickness is reduced to an appropriate thickness with an alkali solution to improve the adhesion between the inner copper foil and the resin without impairing the rust prevention effect.

【0018】防錆層、有機皮膜層を薄くする溶液は、ア
ルカリタイプであれば特に制限なく用いられるが、水酸
化ナトリウムが安価で扱いやすい。水酸化ナトリウム水
溶液の濃度は、0.5〜2.0Nの範囲で、浸漬処理温
度・時間などは実験によって決めればよい。
The solution for thinning the rust preventive layer and the organic coating layer can be used without any particular limitation as long as it is an alkaline type, but sodium hydroxide is inexpensive and easy to handle. The concentration of the aqueous sodium hydroxide solution is in the range of 0.5 to 2.0 N, and the immersion temperature and time may be determined by experiments.

【0019】[0019]

【作用】本発明は、耐熱性向上の手法として、硫酸、過
酸化水素、腐食防止剤を含む処理液によるエッチング処
理後にアルカリ溶液処理することで、さらなる銅箔と樹
脂との密着力を向上することを特徴とするものであり、
これにより、はんだ耐熱性、内層引剥がし強さ等に優れ
る多層プリント配線板を製造することができたものであ
る。
According to the present invention, the adhesion between the copper foil and the resin is further improved by performing an alkali solution treatment after the etching treatment with a treatment solution containing sulfuric acid, hydrogen peroxide and a corrosion inhibitor as a method of improving heat resistance. Characterized by the fact that
Thereby, a multilayer printed wiring board having excellent solder heat resistance, inner layer peeling strength, and the like can be manufactured.

【0020】[0020]

【発明の実施の形態】次に本発明を実施例によって具体
的に説明する。本発明はこれらの実施例にって限定され
るものではない。なお、以下の実施例および比較例にお
いて「部」とは「重量部」を意味する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described specifically with reference to embodiments. The present invention is not limited by these examples. In the following Examples and Comparative Examples, “parts” means “parts by weight”.

【0021】実施例1 厚さ180μmのガラスクロスに、臭素化エポキシ樹脂
(エポキシ当量480)90部、クレゾールノボラック
樹脂(エポキシ当量210)7部、ジシアンジアミド3
部、促進剤として2−エチル−4−メチルイミダゾー
ル、希釈溶剤としてメチルセロソルブを加えて調製した
粘度1.5ポイズの樹脂溶液を塗布、乾燥して樹脂分4
3%のプリプレグを得た。このプリプレグ6枚と厚さ3
5μmの銅箔を重ね加熱加圧成形し、得られた内層材に
回路形成を行った。次に、硫酸(4.0重量%)、過酸
化水素(5.0重量%)、腐食防止剤としてトリアゾー
ル(5.0g/l)、水溶性重合体として酸化エチレン
ポリマー(5g/l)を含む処理液により40℃で1分
間エッチング処理し、さらに0.9Nの水酸化ナトリウ
ム溶液に1分間浸漬した。その後、90℃で5分間乾燥
を行った。さらに、内層材に使用したものと同様のプリ
プレグを両側1枚ずつ重ね合わせ、厚さ18μmの銅箔
を両面に重ね加熱加圧成形をして、厚さ1.6mmの多
層銅張積層板を製造した。
Example 1 A glass cloth having a thickness of 180 μm was coated with 90 parts of a brominated epoxy resin (epoxy equivalent: 480), 7 parts of a cresol novolak resin (epoxy equivalent: 210), and dicyandiamide 3
Part, a resin solution having a viscosity of 1.5 poise prepared by adding 2-ethyl-4-methylimidazole as an accelerator and methyl cellosolve as a diluting solvent was applied and dried to obtain a resin component 4.
3% prepreg was obtained. 6 prepregs and thickness 3
A 5 μm copper foil was overlaid and heated and pressed, and a circuit was formed on the obtained inner layer material. Next, sulfuric acid (4.0% by weight), hydrogen peroxide (5.0% by weight), triazole (5.0 g / l) as a corrosion inhibitor, and ethylene oxide polymer (5 g / l) as a water-soluble polymer were used. Etching was performed at 40 ° C. for 1 minute with the treatment liquid containing the solution, and the substrate was further immersed in a 0.9N sodium hydroxide solution for 1 minute. Thereafter, drying was performed at 90 ° C. for 5 minutes. Furthermore, a prepreg similar to that used for the inner layer material was laminated on both sides one by one, and a copper foil having a thickness of 18 μm was laminated on both sides and heated and pressed to form a multilayer copper-clad laminate having a thickness of 1.6 mm. Manufactured.

【0022】実施例2 実施例1で使用したものと同様の内層材を、硫酸(4.
0重量%)、過酸化水素(5.0重量%)、腐食防止剤
としてトリアゾール(5.0g/l)を含む処理液によ
り40℃で2分間エッチング処理し、さらに0.9Nの
水酸化ナトリウム溶液に1分間浸漬した。その後、90
℃で5分間乾燥を行った。さらに、内層材に使用したも
のと同様のプリプレグを両側1枚ずつ重ね合わせ、厚さ
18μmの銅箔を両面に重ね加熱加圧成形をして、厚さ
1.6mmの多層銅張積層板を製造した。
Example 2 The same inner layer material as used in Example 1 was treated with sulfuric acid (4.
0% by weight), hydrogen peroxide (5.0% by weight), and a treatment solution containing triazole (5.0 g / l) as a corrosion inhibitor at 40 ° C. for 2 minutes, followed by 0.9N sodium hydroxide. Dipped in the solution for 1 minute. Then 90
Drying was performed at 5 ° C. for 5 minutes. Furthermore, a prepreg similar to that used for the inner layer material was laminated on both sides one by one, and a copper foil having a thickness of 18 μm was laminated on both sides and heated and pressed to form a multilayer copper-clad laminate having a thickness of 1.6 mm. Manufactured.

【0023】実施例3 実施例2において、アルカリ溶液として、0.9Nの水
酸化ナトリウム溶液の代わりに、0.9Nの水酸化カリ
ウム溶液を用いた以外は同様にして内層材を処理した。
さらに実施例2と同様にして、厚さ1.6mmの多層銅
張積層板を製造した。
Example 3 An inner layer material was treated in the same manner as in Example 2, except that a 0.9N potassium hydroxide solution was used instead of the 0.9N sodium hydroxide solution.
Further, in the same manner as in Example 2, a multilayer copper-clad laminate having a thickness of 1.6 mm was manufactured.

【0024】比較例1 実施例1で使用したのと同様の内層材を、硫酸(4.0
重量%)、過酸化水素(5.0重量%)、腐食防止剤と
してトリアゾール(5.0g/l)を含む処理液により
エッチング処理をし、処理後90℃で5分間乾燥を行っ
た。さらに、内層材に使用したものと同様のプリプレグ
を両側1枚ずつ重ね合わせ、厚さ18μmの銅箔を両面
に重ね加熱加圧成形をして、厚さ1.6mmの多層銅張
積層板を製造した。
COMPARATIVE EXAMPLE 1 The same inner layer material as used in Example 1 was treated with sulfuric acid (4.0
%), Hydrogen peroxide (5.0% by weight), and a treatment solution containing triazole (5.0 g / l) as a corrosion inhibitor, and dried at 90 ° C. for 5 minutes after the treatment. Furthermore, a prepreg similar to that used for the inner layer material was laminated on both sides one by one, and a copper foil having a thickness of 18 μm was laminated on both sides and heated and pressed to form a multilayer copper-clad laminate having a thickness of 1.6 mm. Manufactured.

【0025】比較例2 比較例1において、処理液として使用する腐食防止剤の
量を半分の2.5g/lにした以外は同様にして内層材
を処理した。さらに、比較例1と同様にして厚さ1.6
mmの多層銅張積層板を製造した。
Comparative Example 2 The inner layer material was treated in the same manner as in Comparative Example 1, except that the amount of the corrosion inhibitor used as the treatment solution was halved to 2.5 g / l. Further, a thickness of 1.6 was obtained in the same manner as in Comparative Example 1.
mm multilayer copper-clad laminates were produced.

【0026】実施例1〜3および比較例1〜2で得た銅
張積層板について、はんだ耐熱性、内層引き剥がし強
度、耐錆性を試験したので、その結果を表1に示した。
いずれも本発明が優れており、本発明の効果を確認する
ことができた。
The copper-clad laminates obtained in Examples 1 to 3 and Comparative Examples 1 and 2 were tested for solder heat resistance, inner layer peeling strength, and rust resistance. The results are shown in Table 1.
In each case, the present invention was excellent, and the effects of the present invention could be confirmed.

【0027】[0027]

【表1】 *1:260℃のはんだ浴に30秒フロートし、ふくれ
の発生を観察した。
[Table 1] * 1: Floating in a solder bath at 260 ° C. for 30 seconds, and occurrence of blister was observed.

【0028】*2:成形時に離型フィルムを内層板と外
層プリプレグ間に挿入しておき、成形後に内層引き剥が
し強さをJIS−C−6481に準じて測定した。
* 2: The release film was inserted between the inner layer plate and the outer layer prepreg during molding, and the inner layer peeling strength was measured according to JIS-C-6481 after molding.

【0029】*3:10%塩酸液処理後に1時間放置
し、銅箔表面の変色を観察した。
* 3: After being treated with a 10% hydrochloric acid solution, it was left for 1 hour, and the discoloration of the copper foil surface was observed.

【0030】[0030]

【発明の効果】以上の説明および表1から明らかなよう
に、本発明によれば、はんだ耐熱性、内層引き剥がし強
度に優れた多層プリント配線板を製造することができ
る。
As apparent from the above description and Table 1, according to the present invention, it is possible to manufacture a multilayer printed wiring board having excellent solder heat resistance and inner layer peeling strength.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E343 AA15 AA17 BB24 BB67 CC34 CC44 CC45 CC50 GG02 GG16 5E346 CC04 CC09 CC32 DD02 EE06 EE09 EE19 GG27 HH11 HH18 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E343 AA15 AA17 BB24 BB67 CC34 CC44 CC45 CC50 GG02 GG16 5E346 CC04 CC09 CC32 DD02 EE06 EE09 EE19 GG27 HH11 HH18

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガラスクロスに熱硬化性樹脂を含浸させ
て得られるプリプレグを所定枚数重ね、その外側に銅箔
を重ね合わせて一体成形した内層板に回路形成を行った
後、内層板の外側にさらにプリプレグを重ね一体成形し
て多層板を製造するにあたり、銅箔と樹脂との密着力向
上のため、上記回路形成をした内層銅箔を硫酸、過酸化
水素及び腐食防止剤を含むエッチング処理液によって処
理し、さらにアルカリ溶液で処理した後、上記多層板一
体成形をすることを特徴とする多層プリント配線板の製
造方法。
1. A predetermined number of prepregs obtained by impregnating a thermosetting resin into a glass cloth are laminated, a copper foil is laminated on the outside of the prepreg, a circuit is formed on an inner layer plate integrally formed, and then the outer layer of the inner layer plate is formed. In order to improve the adhesion between the copper foil and the resin, in order to improve the adhesion between the copper foil and the resin, an etching treatment containing sulfuric acid, hydrogen peroxide and a corrosion inhibitor was carried out to improve the adhesion between the copper foil and the resin. A method for producing a multilayer printed wiring board, comprising treating with a liquid, further treating with an alkaline solution, and then integrally molding the multilayer board.
【請求項2】 エッチング処理液が、硫酸、過酸化水素
及び腐食防止剤とともに水溶性重合体を含むものである
請求項1記載の多層プリント配線板の製造方法。
2. The method according to claim 1, wherein the etching solution contains a water-soluble polymer together with sulfuric acid, hydrogen peroxide and a corrosion inhibitor.
JP2000243542A 2000-08-11 2000-08-11 Manufacturing method of multilayered printed-wiring board Pending JP2002057457A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000243542A JP2002057457A (en) 2000-08-11 2000-08-11 Manufacturing method of multilayered printed-wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000243542A JP2002057457A (en) 2000-08-11 2000-08-11 Manufacturing method of multilayered printed-wiring board

Publications (1)

Publication Number Publication Date
JP2002057457A true JP2002057457A (en) 2002-02-22

Family

ID=18734376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000243542A Pending JP2002057457A (en) 2000-08-11 2000-08-11 Manufacturing method of multilayered printed-wiring board

Country Status (1)

Country Link
JP (1) JP2002057457A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030080546A (en) * 2002-04-09 2003-10-17 삼성전기주식회사 Process for making multi-layer printed circuit board
KR100872524B1 (en) * 2004-11-30 2008-12-08 가부시키가이샤후지쿠라 Method for manufacturing rigid-flex printed wiring board
JP2018538434A (en) * 2015-10-23 2018-12-27 アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングAtotech Deutschland GmbH Surface treatment agent for copper or copper alloy surface and method for treating copper or copper alloy surface

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030080546A (en) * 2002-04-09 2003-10-17 삼성전기주식회사 Process for making multi-layer printed circuit board
KR100872524B1 (en) * 2004-11-30 2008-12-08 가부시키가이샤후지쿠라 Method for manufacturing rigid-flex printed wiring board
JP2018538434A (en) * 2015-10-23 2018-12-27 アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングAtotech Deutschland GmbH Surface treatment agent for copper or copper alloy surface and method for treating copper or copper alloy surface

Similar Documents

Publication Publication Date Title
KR101268145B1 (en) Method for surface treatment of copper and copper
US5800859A (en) Copper coating of printed circuit boards
EP1255797B2 (en) Method for roughening copper surfaces for bonding to substrates
JP4033611B2 (en) Copper or copper alloy microetching agent and microetching method using the same
KR100714171B1 (en) Laminate and method for producing the same
JP5184699B2 (en) Composition for imparting acid resistance to metal surface and method for improving acid resistance of metal surface
JPS61176192A (en) Adhesion between copper and resin
JP2010109308A (en) Electroconductive layer, laminate using the same, and manufacturing processes of them
TWI396774B (en) A substrate manufacturing method and a copper surface treatment agent used therefor
TW538080B (en) Process for increasing the adhesion of a polymeric material to a metal surface and used composition thereof
TW467969B (en) Process for treating metal surfaces
JP2721632B2 (en) Processing method of copper circuit of circuit board
JP2012526200A (en) Method for improving adhesion of polymer material to metal surface
JP2000297387A (en) Surface treating agent for copper and copper alloy
JP2002057457A (en) Manufacturing method of multilayered printed-wiring board
JP5938948B2 (en) Semiconductor chip mounting substrate and manufacturing method thereof
JP4074885B1 (en) Post-dip aqueous solution and metal surface treatment method
JP4621293B2 (en) Copper surface treatment agent and surface treatment method
JP5317099B2 (en) Adhesive layer forming solution
JP2002036430A (en) Resin applied metal foil and multilayered printed wiring board
KR101590081B1 (en) A surface treatment method for pcb inner layer
KR101494618B1 (en) Conversion coating composition for flexible print circuit board and surface treating method using the same
KR20240143117A (en) Tin stripper for copper-tin alloy layer formation
TW202337984A (en) One-step oxide bath for improving adhesion of polymeric materials to metal substrates
JPH10190226A (en) Manufacture of multilayer board

Legal Events

Date Code Title Description
A02 Decision of refusal

Effective date: 20040113

Free format text: JAPANESE INTERMEDIATE CODE: A02