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JP2001209056A - Device for production of liquid crystal panel - Google Patents

Device for production of liquid crystal panel

Info

Publication number
JP2001209056A
JP2001209056A JP2000016067A JP2000016067A JP2001209056A JP 2001209056 A JP2001209056 A JP 2001209056A JP 2000016067 A JP2000016067 A JP 2000016067A JP 2000016067 A JP2000016067 A JP 2000016067A JP 2001209056 A JP2001209056 A JP 2001209056A
Authority
JP
Japan
Prior art keywords
substrates
surface plate
heat
heating means
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000016067A
Other languages
Japanese (ja)
Inventor
Ichiro Ishizaka
一朗 石坂
Noriyuki Takefushi
憲之 竹節
Yuzuru Aoyama
譲 青山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Engineering Co Ltd
Original Assignee
Shin Etsu Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Engineering Co Ltd filed Critical Shin Etsu Engineering Co Ltd
Priority to JP2000016067A priority Critical patent/JP2001209056A/en
Priority to KR1020010002866A priority patent/KR20010076340A/en
Publication of JP2001209056A publication Critical patent/JP2001209056A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To realize rapid and uniform conduction of heat from a surface board to the whole substrate. SOLUTION: The surface board 1 is formed into one body from a heat- resistant material having high rigidity and an almost same coefficient of thermal expansion as that of substrates A, B, so that it maintains its form without causing deformation by heat. A heating means 2 and a cooling means 3 are embedded as two-dimensionally and densely arranged near to each other in the surface board, so that the whole pressurizing face 1a of the surface board 1 is uniformly and rapidly heated by operating the heating means 2 and is rapidly cooled by operating the cooling means 3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液晶ディスプレイ
(LCD)に使用する液晶パネルの製造装置に関する。
詳しくは、精度良く貼り合わされた2枚の基板を定盤上
にセットし、その精度のままで基板を加圧して所定のギ
ャップまで潰しながら、上記定盤の加熱手段により加熱
して、両基板間の熱硬化性接着剤を硬化させる液晶パネ
ル製造装置に関する。
The present invention relates to an apparatus for manufacturing a liquid crystal panel used for a liquid crystal display (LCD).
Specifically, the two substrates bonded together with high accuracy are set on a surface plate, and the substrate is heated by the heating means of the surface plate while pressing the substrate with the accuracy and crushing to a predetermined gap. The present invention relates to a liquid crystal panel manufacturing apparatus for curing a thermosetting adhesive therebetween.

【0002】[0002]

【従来の技術】従来、この種の液晶パネル製造装置とし
て、例えば特許第2934438号公報に開示される如
く、定盤が上層部材と下層部材に2分割されて、その上
層部材には冷却手段を埋設し、下層部材には加熱手段を
装備したものがある。このものは、基板の加圧状態で、
下層部材の加熱手段を作動させることにより、下層部材
からの熱伝導で上層部材を介して基板が加熱され、加熱
成形後の冷却時は上層部材から下層部材を切り離すこと
により、上層部材を急速冷却している。
2. Description of the Related Art Conventionally, as a liquid crystal panel manufacturing apparatus of this kind, for example, as disclosed in Japanese Patent No. 2934438, a platen is divided into an upper layer member and a lower layer member, and a cooling means is provided in the upper layer member. Some are buried and the lower layer members are equipped with heating means. This is a pressurized state of the substrate,
By operating the heating means of the lower layer member, the substrate is heated via the upper layer member by heat conduction from the lower layer member, and at the time of cooling after thermoforming, the lower layer member is separated from the upper layer member to rapidly cool the upper layer member. are doing.

【0003】[0003]

【発明が解決しようとする課題】しかし乍ら、このよう
な従来の液晶パネル製造装置では、上層部材と下層部材
の接合面を介して下層部材からの熱が上層部材を経て基
板に伝えるため、上層部材と下層部材の接合面を完全な
平坦に加工して全面的に面接触できれば上層部材及び基
板の全体を均一に伝熱できるが、上下接合面を夫々完全
な平坦に加工するのは困難な作業であって製作コストが
高額になるという問題がある。特に基板の大型化に伴っ
て定盤の上層部材及び下層部材を大型化する必要がある
場合には、これら上下接合面を完全な平坦に加工するの
は非常に困難となり、これら接合面に僅かな凹凸が発生
すれば、部分的に接触する箇所と不接触な箇所ができ、
部分的に接触する箇所から先に熱伝導して不接触な箇所
は熱伝導が遅れてしまい、基板の全体を均一に加熱し難
くいと共に、熱伝達するまでに時間を要して熱応答性に
劣り、その結果として温度コントロールが難しいという
問題がある。
However, in such a conventional liquid crystal panel manufacturing apparatus, heat from the lower layer member is transmitted to the substrate via the upper layer member via the joint surface between the upper layer member and the lower layer member. If the joint surface between the upper layer member and the lower layer member is completely flat and the entire surface can be brought into contact, heat can be uniformly transmitted to the entire upper layer member and the substrate, but it is difficult to process the upper and lower joint surfaces completely flat respectively. And the production cost is high. In particular, when it is necessary to increase the size of the upper layer member and the lower layer member of the platen with the increase in the size of the substrate, it is very difficult to completely flatten the upper and lower joining surfaces, and it If irregularities occur, there will be partially contacting and non-contacting parts,
Heat conduction delays from the part that comes in partial contact to the part that does not come into contact, which delays the heat conduction, making it difficult to heat the entire substrate uniformly, and it takes time for heat transfer to take place. And, as a result, there is a problem that temperature control is difficult.

【0004】本発明のうち請求項1記載の発明は、定盤
から素早く基板の全体へ均一に熱伝導可能することを目
的としたものである。請求項2記載の発明は、請求項1
に記載の発明の目的に加えて、温度変化による定盤の変
形を完全に防止することを目的としたものである。
[0004] An object of the present invention is to quickly and uniformly conduct heat from the surface plate to the entire substrate. The invention described in claim 2 is claim 1
In addition to the object of the invention described in (1), an object of the present invention is to completely prevent deformation of the surface plate due to a temperature change.

【0005】[0005]

【課題を解決するための手段】前述した目的を達成する
ために、本発明のうち請求項1記載の発明は、定盤を剛
性が高くて基板と同程度の熱膨張率を有する耐熱性材料
で一体的に形成し、その内部に加熱手段と冷却手段を平
面的に密な状態でしかも互いに接近させて埋設したこと
を特徴とするものである。請求項2記載の発明は、請求
項1記載の発明の構成に、前記定盤の上下中間位置に直
線状の加熱手段と冷却手段を交互に接近させて配置した
構成を加えたことを特徴とする。
In order to achieve the above-mentioned object, according to the first aspect of the present invention, there is provided a heat resistant material having a high rigidity and a thermal expansion coefficient substantially equal to that of a substrate. And the heating means and the cooling means are embedded in the inside thereof in a planarly dense state and close to each other. According to a second aspect of the present invention, in addition to the configuration of the first aspect of the present invention, a configuration is provided in which linear heating means and cooling means are alternately arranged close to the upper and lower positions of the surface plate. I do.

【0006】[0006]

【作用】請求項1の発明は、定盤を剛性が高くて基板と
同程度の熱膨張率を有する耐熱性材料で一体的に形成す
ることにより、熱による変形が発生せずに形状保持され
ると共に、その内部に加熱手段と冷却手段を平面的に密
な状態でしかも互いに接近させて埋設することにより、
加熱手段の作動で該定盤の上面全体が均一に急速加熱さ
れ、冷却手段の作動で急速冷却されるものである。請求
項2の発明は、請求項1記載の構成に対して、前記定盤
の上下中間位置に直線状の加熱手段と冷却手段を交互に
接近させて配置した構成を追加したので、加熱手段及び
冷却手段を挟んで定盤の上半部と下半部が同条件とな
り、加熱及び冷却によって定盤の上半部と下半部に温度
差ができない。
According to the first aspect of the present invention, the base is integrally formed of a heat-resistant material having high rigidity and a thermal expansion coefficient substantially equal to that of the substrate, thereby maintaining the shape without deformation due to heat. By embedding the heating means and the cooling means in the interior thereof in a plane dense state and close to each other,
The entire upper surface of the platen is rapidly and uniformly heated by the operation of the heating means, and rapidly cooled by the operation of the cooling means. According to the second aspect of the present invention, in addition to the configuration of the first aspect, a configuration is provided in which linear heating means and cooling means are alternately arranged at the upper and lower intermediate positions of the surface plate so as to be close to each other. The upper and lower halves of the surface plate have the same condition with the cooling means interposed therebetween, and there is no temperature difference between the upper and lower halves of the surface plate due to heating and cooling.

【0007】[0007]

【発明の実施の形態】以下、本発明の実施例を図面に基
づいて説明する。この実施例は、図1〜図2に示す如
く、大気中で精度良く貼り合わされた2枚のガラス製基
板A,Bを定盤1上にセットし、上蓋4を下降して環状
シール材5に接触させることにより、定盤1と上蓋4と
の間に環状シール材5で囲まれた閉空間6を形成し、こ
の閉空間6内の減圧により、上蓋4が大気圧で押し下げ
られ緩衝材7を介して基板A,Bが加圧されるものであ
る。
Embodiments of the present invention will be described below with reference to the drawings. In this embodiment, as shown in FIGS. 1 and 2, two glass substrates A and B, which are accurately bonded in the air, are set on a surface plate 1, and an upper cover 4 is lowered to form an annular sealing material 5. To form a closed space 6 surrounded by an annular sealing material 5 between the surface plate 1 and the upper lid 4. Substrates A and B are pressurized via the switch 7.

【0008】上記定盤1は、剛性が高くて基板A,Bと
同程度の熱膨張率を有する耐熱性材料、例えばカーボン
などで一体的に形成され、その内部に埋設した加熱手段
2で加熱したり、冷却手段3で冷却しても簡単に変形し
ない厚さ寸法に形成する。
The platen 1 is integrally formed of a heat-resistant material having high rigidity and a thermal expansion coefficient similar to that of the substrates A and B, for example, carbon, and is heated by a heating means 2 embedded therein. Or a thickness that does not easily deform even when cooled by the cooling means 3.

【0009】これら加熱手段2と冷却手段3は、平面的
に密な状態でしかも互いに接近させて埋設する。本実施
例の場合には、図1及び図2に示す如く定盤1の上下中
間位置に、直線状の加熱手段2及び冷却手段3を水平方
向へ所定ピッチ、例えば50〜60mmで交互に接近させて夫
々複数本ずつ平行に配置し、加熱手段2としては通電に
より発熱する線状ヒーターを使用し、冷却手段3として
は冷却水が通る冷却パイプを使用している。
The heating means 2 and the cooling means 3 are buried in a dense state in a plane and close to each other. In the case of this embodiment, as shown in FIGS. 1 and 2, the linear heating means 2 and the cooling means 3 are alternately approached in the horizontal direction at a predetermined pitch, for example, 50 to 60 mm, at the upper and lower intermediate positions of the surface plate 1. A plurality of the heaters are arranged in parallel with each other, and a linear heater that generates heat when energized is used as the heating means 2, and a cooling pipe through which cooling water passes is used as the cooling means 3.

【0010】また、定盤1の中央部分に比べて外周部分
の方は、放熱されて冷え易いため、中央部分の加熱温度
より外周部分の加熱温度が高くなるように上記加熱手段
2を温度設定して、定盤1の加圧面1a全体が均一温度
となるように制御することも可能である。
Further, since the outer peripheral portion is more likely to be radiated and cooled as compared with the central portion of the surface plate 1, the temperature of the heating means 2 is set so that the heating temperature of the outer peripheral portion is higher than the heating temperature of the central portion. Thus, it is also possible to control so that the entire pressing surface 1a of the surface plate 1 has a uniform temperature.

【0011】更に、上記定盤1の加圧面1aには、後述
する上蓋4の加圧面4aと対向して例えばOリングなど
の環状シール材5が取り付けられ、この環状シール材5
の内側には、図示しない枠などの位置決め手段を介し
て、例えば所望のパターンが形成されたカラーフィルタ
ーとTFT基板からなる2枚の基板A,Bが定位置にセ
ットされる。これら環状シール材5と基板A,Bとの空
間に連通するように吸引通路1bを定盤1に開設し、こ
の吸引通路1bによって環状シール材5の内側から吸引
排気するように構成している。
Further, an annular sealing member 5 such as an O-ring is attached to the pressing surface 1a of the surface plate 1 so as to face a pressing surface 4a of an upper lid 4 described later.
Inside, are mounted two substrates A and B composed of, for example, a color filter on which a desired pattern is formed and a TFT substrate through a positioning means such as a frame (not shown). A suction passage 1b is opened in the surface plate 1 so as to communicate with the space between the annular sealing material 5 and the substrates A and B, and the suction passage 1b is configured to suck and exhaust the inside of the annular sealing material 5 from the inside. .

【0012】前記基板A,Bは、その一方の基板に熱硬
化性樹脂からなる接着剤Cを、その一部が液晶注入孔C
1として開口する枠状に塗布し、他方の基板には多数の
スペーサDを散布した後、大気中で精度良く位置合わせ
して貼り合わされる。図1〜図2に示したものは、接着
剤Cによる枠が一つしか存在しないが、これに限定され
ず、基板A,Bが大型であれば、その間に接着剤Cの枠
を複数配置させることもできる。
One of the substrates A and B is provided with an adhesive C made of a thermosetting resin on one of the substrates, and a part thereof is provided with a liquid crystal injection hole C.
It is applied in the shape of a frame which is opened as 1 and a large number of spacers D are scattered on the other substrate. 1 and 2 have only one frame of the adhesive C, but the present invention is not limited to this. If the substrates A and B are large, a plurality of frames of the adhesive C are disposed therebetween. It can also be done.

【0013】一方、前記上蓋4は、例えばカーボンなど
の剛体で構成し、図示しない例えば駆動シリンダーなど
の昇降機構により往復動自在に支持されるが、少なくと
も該上蓋4を下降させて環状シール材5に接触した以降
は、上記昇降機構との連係を解放して自由に昇降できる
ようにしている。
On the other hand, the upper cover 4 is made of a rigid body such as carbon, and is reciprocally supported by an elevating mechanism such as a drive cylinder (not shown). After the contact with the lifting mechanism, the link with the lifting mechanism is released so that the lifting mechanism can be moved up and down freely.

【0014】また、この上蓋4の加圧面4aには、加熱
・冷却手段7を配設し、この加熱・冷却手段7の熱を逃
がさないように、該上蓋4自体を断熱性に優れた材料で
形成するか、或いは図示せぬが、これら上蓋4の加圧面
4aと加熱・冷却手段7との間に断熱材を介在させる。
加熱・冷却手段7としては、本実施例の場合、通電によ
り発熱する面状ヒーターと、冷却水が通る複数の冷却パ
イプが内蔵された金属板とを一体的に積層して構成して
いる。
A heating / cooling means 7 is provided on the pressurizing surface 4a of the upper lid 4, and the upper lid 4 itself is made of a material having excellent heat insulating properties so that the heat of the heating / cooling means 7 is not released. Alternatively, although not shown, a heat insulating material is interposed between the pressing surface 4a of the upper lid 4 and the heating / cooling means 7.
In the case of the present embodiment, the heating / cooling means 7 is configured by integrally laminating a planar heater that generates heat by energization and a metal plate having a plurality of cooling pipes through which cooling water passes.

【0015】更に、この上蓋4の加圧面4aには、加熱
・冷却手段7を覆って基板A,Bと当接する緩衝材8が
固着される。この緩衝材8は、両基板A,B間の接着剤
Cを硬化させるため耐熱性(100℃以上)に優れた例
えばシリコン発泡ゴムやそれより耐久性に優れた材料な
どで構成される。その厚さ寸法は、前記上蓋4の加圧面
4aが環状シール材5に接触した時点では、図1(a)
に示す如くその先端面8aが基板A,Bの上端面と間隙
を介して不接触であると共に、上記環状シール材5Cに
囲まれた閉空間6内の減圧により、上蓋4が大気圧で押
し下げられた時には、図1(b)に示す如く先端面8a
を基板A,Bの上端面に接触させて圧縮変形するように
設定する。
Further, a cushioning material 8 covering the heating / cooling means 7 and abutting on the substrates A and B is fixed to the pressing surface 4a of the upper lid 4. The cushioning material 8 is made of, for example, silicon foam rubber having excellent heat resistance (100 ° C. or higher) and a material more excellent in durability than that, for curing the adhesive C between the substrates A and B. When the pressing surface 4a of the upper lid 4 comes into contact with the annular sealing material 5, its thickness dimension is as shown in FIG.
As shown in the figure, the front end surface 8a is not in contact with the upper end surfaces of the substrates A and B via a gap, and the upper lid 4 is pushed down at atmospheric pressure due to the reduced pressure in the closed space 6 surrounded by the annular sealing material 5C. When the end face 8a is turned on, as shown in FIG.
Are set so as to be brought into contact with the upper end surfaces of the substrates A and B to be compressed and deformed.

【0016】本実施例では、環状シール材5Cと対向す
る上蓋4の加圧面4a周縁部には、環状シール材5Cよ
り柔らかい緩衝材8′を配設し、閉空間6内の減圧によ
り上蓋4が大気圧で押し下げられた際には、環状シール
材5Cより先に周縁緩衝材8′が圧縮変形して上記緩衝
材8の先端面8aを基板A,Bの上端面に接触させて圧
縮変形するように設定している。なお、これに限定され
ず、上蓋4が大気圧で押し下げられることに伴って環状
シール材5Cが潰れる範囲内で、上記緩衝材8の先端面
8aを基板A,Bの上端面に接触させて圧縮変形できれ
ば、周縁緩衝材8′に代えて剛体からなる突起部を上蓋
4と一体的に形成しても良い。
In the present embodiment, a cushioning material 8 'which is softer than the annular sealing material 5C is provided at the peripheral portion of the pressing surface 4a of the upper lid 4 facing the annular sealing material 5C. Is pressed down at atmospheric pressure, the peripheral cushioning material 8 'is compressed and deformed prior to the annular sealing material 5C, and the tip end surface 8a of the cushioning material 8 is brought into contact with the upper end surfaces of the substrates A and B to be compressed and deformed. Is set to However, the present invention is not limited to this. The top surface 8a of the cushioning material 8 is brought into contact with the upper end surfaces of the substrates A and B within a range where the annular sealing material 5C is crushed as the upper lid 4 is pushed down at atmospheric pressure. If it can be compressed and deformed, a projection made of a rigid body may be formed integrally with the upper lid 4 instead of the peripheral cushioning material 8 '.

【0017】次に、斯かる液晶パネル製造装置の作動に
ついて説明する。先ず、初期状態で定盤1は、接着剤C
に影響を与えない温度、例えば60℃以下に保ってお
き、上蓋4を上昇させて、基板A,Bを定盤1上にセッ
トする。このセットが終了した後は、図1(a)に示す
如く上蓋4を重力又はシリンダー駆動により下降させて
環状シール材5に接触し、それにより、上蓋4と定盤1
との間に環状シール材5で囲まれた閉空間6が形成され
る。
Next, the operation of the liquid crystal panel manufacturing apparatus will be described. First, in the initial state, the surface plate 1 is made of an adhesive C
Is kept at a temperature that does not affect the temperature, for example, 60 ° C. or lower, and the upper cover 4 is raised to set the substrates A and B on the surface plate 1. After the completion of this setting, as shown in FIG. 1A, the upper lid 4 is lowered by gravity or driven by a cylinder to come into contact with the annular sealing material 5, whereby the upper lid 4 and the platen 1
A closed space 6 surrounded by the annular sealing material 5 is formed between the closed space 6.

【0018】その後、定盤1の吸引通路1bから吸引排
気を開始して、上記閉空間6内を減圧させる。それによ
り、図1(b)に示す如く上蓋4が大気圧で徐々に押し
下げられ、緩衝材8の先端面8aが基板A,Bに圧接し
て圧縮変形する。その結果、上蓋4の加圧面4aの平面
度と関係なく、上蓋4の加圧面4aと基板A,Bの上端
面との間の厚みむらが平均化される。従って、基板A,
Bを完全な平行状態に保ちながら所定のギャップまで確
実に押圧できる。
Thereafter, suction and exhaust are started from the suction passage 1b of the platen 1, and the pressure in the closed space 6 is reduced. Thereby, as shown in FIG. 1B, the upper lid 4 is gradually pushed down at atmospheric pressure, and the tip end surface 8a of the cushioning material 8 is pressed against the substrates A and B and is compressed and deformed. As a result, the thickness unevenness between the pressing surface 4a of the upper lid 4 and the upper end surfaces of the substrates A and B is averaged regardless of the flatness of the pressing surface 4a of the upper lid 4. Therefore, the substrates A,
B can be reliably pressed to a predetermined gap while keeping B completely parallel.

【0019】また、閉空間6の減圧に伴って両基板A,
Bの間に残った空気、詳しくは、接着剤Cにより囲まれ
た液晶封入用空間C2内に残った空気が、該接着剤Cの
一部に開口した液晶注入孔C1から抜き出される。従っ
て、液晶封入用空間C2内に残った空気が基板A,Bの
加圧に対する反力とならず、所定ギャップまでスムーズ
に潰せる。
Further, with the decompression of the closed space 6, both substrates A,
The air remaining between B, specifically, the air remaining in the liquid crystal enclosing space C2 surrounded by the adhesive C is extracted from the liquid crystal injection hole C1 opened in a part of the adhesive C. Therefore, the air remaining in the liquid crystal enclosing space C2 does not become a reaction force against the pressurization of the substrates A and B, and can be smoothly crushed to a predetermined gap.

【0020】そして、これら基板A,Bが所定ギャップ
近くまで潰れた時点で、定盤1の加熱手段2と上蓋4の
加熱・冷却手段7に通電し、均一に基板A,Bの温度を
上げ、接着剤Cを軟化させて所定のギャップを出し、硬
化するまで温度コントロールを行う。
When the substrates A and B are crushed to near the predetermined gap, the heating means 2 of the surface plate 1 and the heating / cooling means 7 of the upper lid 4 are energized to uniformly raise the temperature of the substrates A and B. Then, the adhesive C is softened to form a predetermined gap, and the temperature is controlled until the adhesive C is cured.

【0021】この際、定盤1を剛性が高くて基板A,B
と同程度の熱膨張率を有する耐熱性材料で一体的に形成
したから、熱による変形が発生せずに形状保持されると
共に、その内部に加熱手段2を平面的に密な状態でしか
も互いに接近させて埋設したから、定盤1の加圧面1a
全体が均一に急速加熱される。従って、定盤1から素早
く基板A,Bの全体へ均一に熱伝導できる。
At this time, the platen 1 has high rigidity and the substrates A and B
Since it is integrally formed of a heat-resistant material having the same coefficient of thermal expansion as above, the shape is maintained without deformation due to heat, and the heating means 2 is placed in the interior thereof in a planarly dense state and mutually The pressure surface 1a of the surface plate 1
The whole is rapidly heated uniformly. Therefore, heat can be quickly and uniformly transferred from the surface plate 1 to the entire substrates A and B.

【0022】上記接着剤Cの硬化が終了した後は、定盤
1の吸引通路1bからの吸引排気を停止させ、定盤1の
冷却手段3と上蓋4の加熱・冷却手段7の冷却パイプに
夫々通水して水冷し、その後、上蓋4を上昇して基板
A,Bを取り出し、それ以降は上述した作業を繰り返
す。
After the curing of the adhesive C is completed, the suction and exhaust from the suction passage 1b of the surface plate 1 is stopped, and the cooling means 3 of the surface plate 1 and the cooling pipe of the heating / cooling means 7 of the upper lid 4 are connected to the cooling pipe. Each of the substrates is cooled by passing water, and then the upper lid 4 is raised to take out the substrates A and B. Thereafter, the above-described operation is repeated.

【0023】一方、図3と図4に示すものは、夫々が本
発明の他の実施例である。図3のものは、前記定盤1の
加熱手段2が多数の線状ヒーターではなく面状ヒーター
であり、これを定盤1の上下中間位置に配置すると共
に、これの上下どちらか一方に冷却手段3として冷却パ
イプを水平方向へ所定ピッチ毎に複数本配置した構成
が、前記図1〜図2に示した実施例とは異なり、それ以
外の構成は図1〜図2に示した実施例と同じものであ
る。
On the other hand, FIGS. 3 and 4 each show another embodiment of the present invention. In FIG. 3, the heating means 2 of the surface plate 1 is not a large number of linear heaters but a planar heater, which is disposed at an intermediate position between the upper and lower surfaces of the surface plate 1 and is cooled on one of the upper and lower sides. The configuration in which a plurality of cooling pipes are arranged at predetermined pitches in the horizontal direction as means 3 is different from the embodiment shown in FIGS. 1 and 2, and the other configuration is the embodiment shown in FIGS. 1 and 2. Is the same as

【0024】従って、図3に示すものは、前記図1〜図
2に示した実施例よりも発熱源の隙間ができないので、
基板A,Bの全体を更に均一に加熱できると共に、多数
の線状ヒーターを配置するのに比べて構造が簡素化して
製造コストを低減できるというという利点がある。
Therefore, in the apparatus shown in FIG. 3, since there is no gap between the heat sources as compared with the embodiment shown in FIGS.
There is an advantage that the entire substrates A and B can be heated more uniformly, and the structure can be simplified and the manufacturing cost can be reduced as compared with the case where a large number of linear heaters are arranged.

【0025】図4のものは、前記上蓋4の構造が特許第
2934438号公報に記載されるようなヒーター付反
射板7′を内蔵した中空構造とすると共に基板A,Bと
当接する加圧面が基板A,Bと同程度の熱膨張率を有す
る可撓性フィルム9である構成が、前記図1〜図2に示
した実施例とは異なり、それ以外の構成は図1〜図2に
示した実施例と同じものである。
In FIG. 4, the structure of the upper lid 4 is a hollow structure having a built-in reflecting plate 7 'with a heater as described in Japanese Patent No. 2934438, and a pressing surface which contacts the substrates A and B is provided. The configuration of the flexible film 9 having the same coefficient of thermal expansion as the substrates A and B is different from the embodiment shown in FIGS. 1 and 2, and other configurations are shown in FIGS. 1 and 2. This is the same as the embodiment described above.

【0026】従って、図4に示すものも、前記図1〜図
2に示した実施例と同様に、定盤1から素早く基板A,
Bの全体へ均一に熱伝導できることに変わりない。
Therefore, the substrate shown in FIG. 4 can be quickly moved from the platen 1 similarly to the embodiment shown in FIGS.
It is still possible to conduct heat uniformly to the entire B.

【0027】尚、前示実施例では、基板A,Bを定盤1
上にセットし、上蓋4を下降して環状シール材5に接触
させることにより閉空間6を形成し、この閉空間6内の
減圧により、上蓋4が大気圧で押し下げられ緩衝材7を
介して基板A,Bが加圧される場合を示したが、これに
限定されず、基板A,Bを加圧して所定のギャップまで
潰しながら定盤1の加熱手段2により加熱して、両基板
A,B間の熱硬化性接着剤Cを硬化させる作用が得られ
れば、他の構造でも良い。更に、図1及び図2に示した
実施例では、直線状の加熱手段2及び冷却手段3を夫々
複数本ずつ平行に配置したが、これに限定されず、直線
状の加熱手段2及び冷却手段3を夫々上下方向に離して
複数本ずつ平面から見て交差するように配置しても良
い。
In the embodiment described above, the substrates A and B are
The closed space 6 is formed by setting the upper lid 4 and lowering the upper lid 4 to come into contact with the annular seal material 5. Although the case where the substrates A and B are pressurized is shown, the present invention is not limited to this, and the substrates A and B are heated by the heating means 2 of the platen 1 while being crushed to a predetermined gap. Other structures may be used as long as the effect of curing the thermosetting adhesive C between the first and second members B can be obtained. Further, in the embodiment shown in FIGS. 1 and 2, a plurality of linear heating means 2 and cooling means 3 are respectively arranged in parallel, but the present invention is not limited to this. 3 may be arranged in such a manner as to be separated from each other in the vertical direction so that a plurality of them intersect when viewed from the plane.

【0028】[0028]

【発明の効果】以上説明したように、本発明のうち請求
項1記載の発明は、定盤を剛性が高くて基板と同程度の
熱膨張率を有する耐熱性材料で一体的に形成することに
より、熱による変形が発生せずに形状保持されると共
に、その内部に加熱手段と冷却手段を平面的に密な状態
でしかも互いに接近させて埋設することにより、加熱手
段の作動で該定盤の加圧面全体が均一に急速加熱され、
冷却手段の作動で急速冷却されるので、定盤から素早く
基板の全体へ均一に熱伝導できる。従って、定盤の上下
接合面に僅かな凹凸が発生した場合には部分的に接触す
る箇所から先に熱伝導して不接触な箇所は熱伝導が遅れ
る従来のものに比べ、基板の全面を均一に加熱できると
共に熱応答性に優れて温度コントロールが容易である。
この効果は特に基板の大型化に伴って定盤を大型化した
場合に顕著に現れる。更に、定盤の上下接合面を完全な
平坦に加工する従来のものに比べ、接合面を完全な平坦
に加工する作業が必要ないから、定盤の製作コストを大
幅に低減できる。
As described above, according to the first aspect of the present invention, the platen is integrally formed of a heat-resistant material having high rigidity and a thermal expansion coefficient similar to that of the substrate. As a result, the shape is maintained without deformation due to heat, and the heating means and the cooling means are buried inside thereof in a planarly dense state and close to each other, so that the platen is activated by the operation of the heating means. The entire pressurized surface is rapidly heated uniformly,
Because of the rapid cooling by the operation of the cooling means, heat can be quickly and uniformly transferred from the surface plate to the entire substrate. Therefore, when slight unevenness occurs on the upper and lower joint surfaces of the surface plate, the part of the substrate that is partially contacted conducts heat first and the part that is not contacted has a longer entire surface of the substrate than the conventional one where heat conduction is delayed. It can be heated uniformly and has excellent thermal response and easy temperature control.
This effect is particularly noticeable when the size of the surface plate is increased with the increase in the size of the substrate. Further, as compared with the prior art in which the upper and lower joint surfaces of the surface plate are completely flattened, there is no need to perform an operation of completely flattening the joint surface, so that the production cost of the surface plate can be greatly reduced.

【0029】請求項2の発明は、請求項1の発明の効果
に加えて、加熱手段及び冷却手段を挟んで定盤の上半部
と下半部が同条件となり、加熱及び冷却によって定盤の
上半部と下半部に温度差ができないので、温度変化によ
る定盤の変形を完全に防止できる。
According to a second aspect of the present invention, in addition to the effect of the first aspect, the upper half and the lower half of the platen have the same condition with the heating means and the cooling means interposed therebetween. Since there is no difference in temperature between the upper half and the lower half, deformation of the surface plate due to temperature change can be completely prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施例を示す液晶パネル製造装置
の縦断正面図であり、(a)は減圧前の状態を示し、
(b)は減圧による基板の加圧時を示している。
FIG. 1 is a vertical sectional front view of a liquid crystal panel manufacturing apparatus showing one embodiment of the present invention, wherein (a) shows a state before decompression,
(B) shows the time when the substrate is pressurized by decompression.

【図2】 図1(a)の(2)−(2)線に沿える同横
断平面図である。
FIG. 2 is a cross-sectional plan view taken along the line (2)-(2) of FIG. 1 (a).

【図3】 本発明の他の実施例を示す液晶パネル製造装
置の縦断正面図であり、減圧前の状態を示している。
FIG. 3 is a longitudinal sectional front view of a liquid crystal panel manufacturing apparatus showing another embodiment of the present invention, showing a state before decompression.

【図4】 本発明の他の実施例を示す液晶パネル製造装
置の縦断正面図であり、減圧前の状態を示している。
FIG. 4 is a longitudinal sectional front view of a liquid crystal panel manufacturing apparatus showing another embodiment of the present invention, showing a state before decompression.

【符号の説明】[Explanation of symbols]

A,B 基板 C 接着剤 1 定盤 2 加熱手段 3 冷却手段 A, B substrate C adhesive 1 surface plate 2 heating means 3 cooling means

───────────────────────────────────────────────────── フロントページの続き (72)発明者 青山 譲 東京都千代田区神田錦町2丁目9番地 信 越エンジニアリング株式会社内 Fターム(参考) 2H088 FA04 FA30 2H089 NA45 NA48 NA60 QA12  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Joe Aoyama 2-9-9 Kandanishikicho, Chiyoda-ku, Tokyo Shin-Etsu Engineering Co., Ltd. F-term (reference) 2H088 FA04 FA30 2H089 NA45 NA48 NA60 NA60 QA12

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 精度良く貼り合わされた2枚の基板
(A,B)を定盤(1)上にセットし、その精度のまま
で基板(A,B)を加圧して所定のギャップまで潰しな
がら、上記定盤(1)の加熱手段(2)により加熱し
て、両基板(A,B)間の熱硬化性接着剤(C)を硬化
させる液晶パネル製造装置において、 前記定盤(1)を剛性が高くて基板(A,B)と同程度
の熱膨張率を有する耐熱性材料で一体的に形成し、その
内部に加熱手段(2)と冷却手段(3)を平面的に密な
状態でしかも互いに接近させて埋設したことを特徴とす
る液晶パネル製造装置。
1. The two substrates (A, B) bonded with high precision are set on a surface plate (1), and the substrates (A, B) are pressed and crushed to a predetermined gap while maintaining the precision. In the liquid crystal panel manufacturing apparatus, the heating means (2) of the surface plate (1) heats the thermosetting adhesive (C) between the two substrates (A, B). ) Is integrally formed of a heat-resistant material having high rigidity and a thermal expansion coefficient similar to that of the substrate (A, B), and the heating means (2) and the cooling means (3) are densely planarized inside. A liquid crystal panel manufacturing apparatus characterized by being buried in a state of being close to each other.
【請求項2】 前記定盤(1)の上下中間位置に直線状
の加熱手段(2)と冷却手段(3)を交互に接近させて
配置した請求項1記載の液晶パネル製造装置。
2. The liquid crystal panel manufacturing apparatus according to claim 1, wherein linear heating means and cooling means (3) are alternately arranged close to the upper and lower intermediate positions of the surface plate (1).
JP2000016067A 2000-01-25 2000-01-25 Device for production of liquid crystal panel Pending JP2001209056A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000016067A JP2001209056A (en) 2000-01-25 2000-01-25 Device for production of liquid crystal panel
KR1020010002866A KR20010076340A (en) 2000-01-25 2001-01-18 Apparatus of manufacturing a liquid crystal display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000016067A JP2001209056A (en) 2000-01-25 2000-01-25 Device for production of liquid crystal panel

Publications (1)

Publication Number Publication Date
JP2001209056A true JP2001209056A (en) 2001-08-03

Family

ID=18543273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000016067A Pending JP2001209056A (en) 2000-01-25 2000-01-25 Device for production of liquid crystal panel

Country Status (1)

Country Link
JP (1) JP2001209056A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7692756B2 (en) 2001-12-21 2010-04-06 Lg Display Co., Ltd. Liquid crystal display device and method of fabricating the same
US7785655B2 (en) 2003-05-09 2010-08-31 Lg Display Co., Ltd. Liquid crystal dispensing system and method of dispensing liquid crystal material using same
US7950345B2 (en) 2002-12-20 2011-05-31 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and dispensing method using the same
KR101422915B1 (en) * 2011-07-25 2014-07-23 도쿄엘렉트론가부시키가이샤 Temperature control unit, substrate mounting table, substrate processing apparatus, temperature control system and substrate processing method
US8899175B2 (en) 2002-03-23 2014-12-02 Lg Display Co., Ltd. Apparatus and method for dispensing liquid crystal material
USRE46146E1 (en) 2002-02-20 2016-09-13 Lg Display Co., Ltd Liquid crystal display device and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7692756B2 (en) 2001-12-21 2010-04-06 Lg Display Co., Ltd. Liquid crystal display device and method of fabricating the same
USRE46146E1 (en) 2002-02-20 2016-09-13 Lg Display Co., Ltd Liquid crystal display device and method of manufacturing the same
US8899175B2 (en) 2002-03-23 2014-12-02 Lg Display Co., Ltd. Apparatus and method for dispensing liquid crystal material
US7950345B2 (en) 2002-12-20 2011-05-31 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and dispensing method using the same
US9285614B2 (en) 2003-04-24 2016-03-15 Lg Display Co., Ltd. Liquid crystal dispensing system and method of dispensing liquid crystal material using same
US7785655B2 (en) 2003-05-09 2010-08-31 Lg Display Co., Ltd. Liquid crystal dispensing system and method of dispensing liquid crystal material using same
KR101422915B1 (en) * 2011-07-25 2014-07-23 도쿄엘렉트론가부시키가이샤 Temperature control unit, substrate mounting table, substrate processing apparatus, temperature control system and substrate processing method

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