JP2001208272A - Manifold - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manifold easily providing a liquid flow quantity according to the liquid flow cross section at low cost in each branch pipe. SOLUTION: This manifold is provided with a manifold body 401 comprising a closed cylindrical body having a main opening 401a for connecting pipes in one end and the other end 401b closed, and a plurality of branch pipes 402, 403 connected to the manifold body 401. The manifold body 401 has the same cross section in the approximately whole length of the cylindrical body and little larger than the total cross section of the branch pipes 402, 403, and the main opening 401a of the manifold body has the cross section equivalent to the total cross section of the branch pipes. The branch pipes are projected and inserted into the manifold body 401 inside so that the internal pressure of the manifold pipe body 401 is set to the same negative pressure or the same positive pressure in the approximately whole length of the cylindrical body inside and the liquid flow rate of each branch pipe per unit cross section is substantially equal to each other. Each branch pipe is projected and inserted into the manifold body by the length α within the range of approximately not less than 1/2 and not more than 3/5 of the inside diameter of the closed cylindrical body constituting the manifold body 401.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to manifolds for liquid circuits. For example, an article processing apparatus that requires filtration of a processing liquid, such as an article processing apparatus such as a plating apparatus, a photographic processing apparatus, or a dyeing apparatus that performs processing with a liquid, or water without the article processing. The present invention relates to a manifold that can be used in a liquid filtration circuit in a liquid processing apparatus or the like that performs a filtration process on a liquid.

[0002]

2. Description of the Related Art Treating an article with a treatment liquid involves:
2. Description of the Related Art As is known in various fields, such as a plating process for an article with a plating solution, a photographic developing process with a developing solution, a dyeing process of a cloth or the like with a dyeing solution, and a washing process for an article.

[0003] In addition, the article processing using such a processing liquid is performed by various methods such as spraying the liquid onto the article or causing the liquid to flow down into the article. One of the typical methods is to put the processing liquid into the liquid tank. The object to be treated is stored and immersed in the processing liquid in the liquid tank while controlling the liquid quality or liquid composition of the liquid, the amount of the processing liquid in the liquid tank, the amount of filtration, the temperature, etc. as required. A case in which the processing is performed can be given. The above-described plating, photographic development, dyeing, and the like are usually performed by this method.

[0004] Such treatment involving immersion may be performed using only one liquid tank, but in many cases, a plurality of liquid tanks are employed in order to process a large number of articles or to process various kinds of articles. .

In any case, in a liquid-based article processing apparatus which employs an article processing liquid tank, the processing liquid in the liquid tank is used to remove impurities brought in by the article to be processed and the processing liquid during repeated use. Impurities such as impurities generated due to deterioration of the processing liquid such as deterioration and impurities that may fall into the liquid in the liquid tank from the outside increase, so this processing liquid is used while being filtered by a filtration device including a pump and a filter. It is widely done. A typical example is a case where the treatment liquid is circulated and filtered by a circulating filtration device including a liquid circulating pump and a filter.

[0006] Further, a process for removing impurities in a liquid without carrying out article processing is also performed. A typical example thereof is a water filtration treatment.

In a liquid circuit for performing such liquid filtration, a manifold is widely used in order to join the liquids or divide the liquids.

[0008] The manifold 9 conventionally used is generally shown in FIG.
As shown in FIG. 5, a main opening 91a for liquid circulation is provided in one place, and branch pipes 92 are connected to a plurality of places except for the position of the main opening 91a. The connection of the branch pipe 92 is made by connecting one end of the branch pipe to a hole 91 b provided in the wall of the manifold main body 91.

[0009]

However, in such a conventional manifold, the hydraulic pressure does not work uniformly at each part of the entire length of the manifold body, and the filtration pressure particularly in the filter increases with the removal of impurities. When the filtration has been performed, even if the filtration pressure is within the permissible range of the filter itself, the liquid pressure does not act uniformly in each part. For example, the liquid is introduced into the manifold body 91 under a positive pressure from the main opening 91a by a pump. If it is introduced, a large amount of liquid flows out to the branch pipe near the main opening 91a, and at each position gradually distant from the main opening 91a, the liquid pressure due to the liquid flowing out to the branch pipe at a position earlier than that. And a smaller amount of liquid flows into the branch at that location.

On the other hand, when a liquid flows from the outside into the branch pipe 92 under the liquid suction pressure (negative pressure) of the pump and is sucked from the main opening 91a, the liquid flows from the branch pipe close to the main opening 91a. Of the main opening 91
The liquid suction action of the pump decreases as the distance from the point a gradually increases, and only a smaller amount of liquid can be sucked from the branch pipe 92 at that position.

A liquid circuit for filtering the processing liquid, a liquid circuit for maintaining the processing liquid in a plurality of liquid tanks to be described later uniformly, and a liquid level for controlling the liquid surface position in each liquid tank. If it is used in a liquid circuit or the like, it will hinder desired filtration processing, maintenance of the processing liquid quality, and liquid level control.

In order to solve such a problem, it is necessary to provide a flow control valve 90 in each branch pipe. However, this increases the cost and reduces the amount of the impurities with the passage of time in accordance with the amount of impurities removed by filtration. In order to equalize the amount of filtration, the amount of suction due to pipe resistance, and the reduction of the flow rate of each liquid feed pipe, it is extremely time-consuming to adjust the degree of opening or throttling of the flow control valve 90.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a manifold capable of easily and inexpensively obtaining a flow rate corresponding to a cross-sectional area of a liquid flow in each branch pipe.

[0014]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a manifold body comprising a closed cylinder having a main opening at one end for connecting a pipe and having the other end closed. A plurality of branch pipes connected to the pipe main body, wherein the manifold main body has the same cross-sectional area over substantially the entire length of the closed cylinder constituting the manifold pipe, and a total of the plurality of branch pipes. A cross-sectional area slightly larger than a cross-sectional area, the main opening of the manifold body has a cross-sectional area corresponding to a total cross-sectional area of the plurality of branch pipes, and each of the branch pipes is The manifold is arranged so that the pressure in the pipe main body is kept under the same negative pressure or the same positive pressure over substantially the entire length of the closed cylinder so that the flow rate per unit sectional area of the branch pipe becomes substantially equal. Provide a manifold that is protrudingly inserted into the main body.

As a typical example, the degree of insertion of each of the branch pipes into the manifold main body is about 1/2 to 3/5 of the inner diameter of the closed cylinder constituting the manifold main body. Within the range, there can be mentioned a case where it is inserted protruding into the manifold body.

[0016] As a connection portion and a connection direction of each branch pipe to the manifold body, the branch pipe is connected to each of a plurality of portions in the longitudinal direction of the manifold body.
In addition, a case where it is inserted into the manifold body from a direction perpendicular to the longitudinal direction can be exemplified.

However, the connection part of the branch pipe to the manifold main body is not particularly limited, and can be connected to any part around the manifold main body according to the liquid circuit configuration. Further, the angle of the branch pipe at the time of the connection does not necessarily have to be a direction orthogonal to the longitudinal direction of the manifold main body.

According to the manifold of the present invention, the pressure in the manifold main body can be kept under the same negative pressure or the same positive pressure over substantially the entire length of the closed cylinder. It is possible to obtain an equal amount of liquid per unit cross-sectional area through the pipes, thereby obtaining an amount of liquid flowing through each branch pipe according to the cross-sectional area.

According to the manifold according to the present invention,
In each of the branch pipes, it is possible to easily and inexpensively obtain a liquid flow amount corresponding to the liquid flow sectional area.

[0020]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows a plating apparatus which is an example of a liquid-based article processing apparatus employing a manifold according to the present invention.

The plating apparatus shown in FIG. 1 has five article processing liquid tanks 11, 12, 13, 14, and 15.
Here, each of the liquid tanks is a plating liquid tank for plating the article. Each liquid tank may contain a different amount of plating solution, for example, a different amount of plating solution in each tank of the same liquid quality. Have.

The five liquid tanks are divided into three groups. That is, a first group including one liquid tank 11, a second group including two liquid tanks 12 and 13, and a third group including liquid tanks 14 and 15. Each liquid tank stores a predetermined plating solution L.

In the figure, on the left side of a liquid tank 11, a pretreatment washing tank 1 is provided.
The cleaning water W is stored in the cleaning water 6 so that the plating object can be cleaned as needed before the plating process. On the left side of the liquid tank 16, a work deck D1 is provided.

A work deck D2 is provided between the liquid tanks 11 and 12, a work deck D3 is provided between the liquid tanks 13 and 14, and a work deck D4 is provided outside the liquid tank 15.

Each of the liquid tanks has substantially the same structure. The structure of the liquid tank will be described with reference to FIGS. 1 to 4 taking the liquid tanks 12 and 13 as examples. FIG. 2 is an enlarged plan view of the liquid tanks 12 and 13 and their peripheral parts, and FIG. 3 is an enlarged side view of the liquid tank 12 and its peripheral parts. Note that FIG. 3 also shows an exchange device 51, which will be described later. FIG.
3 is a perspective view of a part of the liquid tank 12. FIG.

Each of the liquid tanks is rectangular in plan view (when viewed from a plane), and a liquid overflow box B1 is provided along one long side of the rectangle and a liquid overflow box B2 is provided along one short side of the rectangle. have.

The box B1 is formed shallower than the box B2, and the box B2 is formed deeper than the box B1. The box B1 communicates with the upper part of the box B2 so that the liquid overflowing here flows into the box B2, and the bottom of the box B1 is inclined downward toward the box B2. Box B1
Does not necessarily have to be so inclined.

The box B1 is installed via a weir 21 provided along the long side direction of the liquid tank.
Reference numeral 2 is provided via a weir 22 provided along the short side direction of the liquid tank. The weir portions 21 and 22 will be described later in detail.

As shown in FIG. 2, FIG. 3 and FIG.
An inner bottom groove 102 is integrally formed at one position on the peripheral edge of the inner bottom 101 of the liquid tank. The inner bottom groove 102 here extends along the short side direction of one side of the liquid tank over the length of the short side.

Anode busbars A are installed parallel to each other above the longitudinal sides of the liquid tank, and a cathode busbar C is installed parallel to the anode busbars above the central part of the liquid tank. Have been.

In plating the article, for example, as shown in FIGS. 2, 3 and 5, one or two or more conductive hangers H (see FIG. 5C) are placed on a cathode bus bar C at a predetermined interval. And a conductive anode case CS (see FIG. 5 (A)) containing an anode material m ′ is hung at a predetermined position of each anode bus bar A and immersed in the plating solution L, thereby plating the articles a1, a2. Hook member S
(See FIG. 5 (C)). The hook member S may be hung on a hanger H and immersed in the plating solution L together with the articles a1 and a2. FIG.
CSb shown in (B) is an anode bag made of a filter cloth, which is attached to the anode case CS in order to prevent impurities generated on the anode side from leaking into the plating solution.

There are many plating processes for plating an object to be treated, such as plating of copper, nickel, zinc, tin, and alloys thereof. In the case of nickel plating, for example, a plating solution is used. The case where L is a nickel plating solution, the anode case CS is a corrosion-resistant titanium cage, and a nickel chip is accommodated in the anode case m ′ as the anode material m ′ can be exemplified. An aeration device 1 is provided on the inner bottom 101 of each liquid tank.
03 is installed. This is formed by connecting a perforated pipe for air ejection, is connected to a compressed air supply device (not shown), and a bubble 103a is formed in each part of the processing liquid L.
And so-called aeration is performed. The treatment liquid L is agitated by this aeration, so that the liquid quality in each part is uniform and the liquid temperature is also uniform in terms of the liquid composition and the like. In addition, impurities in the liquid are appropriately moved so as to be smoothly sucked from each part of the processing liquid upon circulating filtration described below. In addition, articles a1, a2 by aeration
Adhesion of liquid impurities to the liquid is also suppressed.

A first suction head 104 shown in FIG. 6 is installed in the inner bottom groove 102 of each liquid layer so as to extend in the longitudinal direction of the inner bottom groove 102. The suction head 104 is a cylindrical body having a pipe connection port 104a at one end and a closed end at the other end, and is provided with a plurality of liquid suction holes 104b.

An air blocking wall plate 105 is provided between the first suction head 104 and the aeration device 103. The air blocking wall plate 105 is slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, so that the liquid can flow under the wall plate 105. A support plate 105b is provided between the support piece 105a and the air blocking wall plate 105, and supports the first suction head 104.

The first suction head 104 is also slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, so that the liquid can flow under the suction head 104.

Liquid suction hole 104b of first suction head 104
Are within an angle range θ1 of 90 degrees or less from the lower end of the suction head to the side opposite to the air blocking wall plate 105 around the central axis in the longitudinal direction of the suction head, and
The center angle θ (θ1 in the angle range θ2 of 45 degrees or less toward
+ Θ2) = 135 °. The angle θ is set so that the precipitated impurities accumulated in the inner bottom groove 102 can be smoothly sucked, and the aeration device 103 is used.
This is an angle range for orienting the liquid suction hole so as to make it difficult to suck air from the nozzle, and is approximately 135 degrees here.

Further, the liquid suction hole 10 of the first suction head 104
Reference numerals 4b are dispersedly formed so that a uniform amount of liquid can be sucked in each part extending in the longitudinal direction of the suction head.

In order for each part of the suction head to be able to absorb a uniform amount of liquid, the total cross-sectional area of the liquid-absorbing hole at a portion near the pipe connection port of the suction head should be larger than the total cross-sectional area of the liquid-absorbing hole at a portion farther away. The number and / or diameter of the liquid-absorbing holes may be adjusted so as to be small, and the liquid-absorbing holes may be dispersedly formed.
Here, the diameter of each of the liquid suction holes is the same, and the pipe connection port portion 10 is formed.
In the part close to 4a and the part farther therefrom, the liquid suction holes 104b are formed more sparsely in the near part than in the far part, and more densely formed in the far part.

According to the first suction head 104, impurities that are hard to suck in air and that easily precipitate at the bottom of the inner bottom groove 102 can be uniformly and smoothly sucked from the entire inner bottom groove as much as possible.

In order to more efficiently suck impurities that easily accumulate in the bottom of the liquid tank, in addition to the first suction head 104, a portion of the inner bottom 101 of the liquid tank other than the inner bottom groove 102, for example, the periphery of the inner bottom 101 One or more third suction heads may be provided in a part of the unit or the like. FIG. 3 shows an example in which the third suction head 108 is installed at a peripheral portion along the longitudinal direction of the liquid tank bottom 101 by a chain line.

The third suction head 108 also has the same structure as that of the first suction head 104, and the liquid suction holes are preferably formed so as to be able to absorb a uniform amount of liquid at each portion of the suction head in the longitudinal direction. The third suction head 10
It is preferable to install an air blocking wall plate 109 between the aeration device 8 and the aeration device 103.

Further, each liquid suction port of the third suction head 108 also has an angle range θ1 of 90 degrees or less from the lower end of the suction head to the side opposite to the air blocking wall plate 109 around the central axis in the longitudinal direction of the suction head. And a center angle θ within an angle range θ2 of 45 degrees or less from the lower end of the head to the blocking wall plate 109 side.
It is preferable to form a dispersion within the range of (θ1 + θ2) = 135 °.

The deeper overflow box B2
A second suction head 106 (not shown in FIGS. 1 and 4) shown in FIG. 6C, FIG.

The second suction head 106 is supported by a support piece 106c and a support plate 106d erected on the support piece 106c, and the liquid can flow below the suction head 106. The suction head 106 extends substantially parallel to the short side of the liquid tank, has a pipe connection port 106a at one end, is a closed cylinder at the other end, and has a plurality of liquid suction holes 106b. are doing. The liquid suction holes 106b are formed so as to be able to absorb a uniform amount of liquid in each part of the suction head 106 extending in the longitudinal direction.

For the second suction head installed in the overflow box B2 as well, in order for each part of the suction head to be able to absorb an equal amount of liquid, it is necessary to cut off the liquid suction hole at a position near the pipe connection port of the suction head. The number and / or diameter of the liquid-absorbing holes may be adjusted so that the liquid-absorbing holes are dispersed and formed such that the total area is smaller than the total cross-sectional area of the liquid-absorbing holes at a farther part. Here, the diameter of each of the liquid suction holes 106b is the same, and in a portion near the pipe connection port portion 106a and a portion farther from the port connection portion 106a, the liquid suction holes are sparser in the near portion than in the far portion, and more in the far portion. It is densely dispersed and formed.

According to the second suction head 106, liquid and impurities can be sucked uniformly and smoothly from the entirety of the overflow box B2 as much as possible.

Conventionally, when a liquid is sucked from the overflow box, a liquid outlet to the outside is provided at the bottom of the overflow box, a liquid suction pipe is connected to the liquid flow port, and the liquid is sucked downward by the liquid suction pipe. Since the liquid was condensed, impurities in the liquid were easily clogged at the liquid inlet and the connection part thereof, causing a significant trouble in the filtering operation.Here, the liquid suction pipe of the second suction head 106 is Since the liquid can be absorbed upward from the bottom of the box, clogging of the head 106 and the liquid suction tube connected thereto with impurities is sufficiently suppressed.

This will be further described. FIG. 16 shows a conventional example (one example of a plating solution tank). FIG.
In (A) and (B), 10 ′ is a liquid tank, B1 ′, B
2 'and B3' are overflow boxes attached to the liquid tank, 21 ', 22' and 23 'are conventional rectangular weirs facing the overflow box, and V' is a conventional foot valve installed at the bottom of the liquid tank. It is.

In FIG. 16A, an overflow box B1 'is a groove-shaped box, and the processing liquid L' flowing therein flows into a box B2 '. A liquid inlet Lb is provided at the bottom of the overflow box B2 'shown in FIG. Have been. The liquid tank foot valve V 'is connected to the liquid inlet of the liquid filter F via valves v7' and v2 'and a pump P. The liquid discharge port of the filter F is connected to a liquid-heating heat exchanger H via valves v3 ', v4' and v5 ', and further to the liquid tank 1 via a valve v6'.
While the pipe is connected to the liquid return port 100 ′ to 0 ′,
A pipe is connected between the valves v3 'and v4' to a liquid discharge port 511 'to the replacement tank 511 via a valve V8'.
A foot valve 511 for absorbing liquid is provided at the bottom of the replacement tank 511.
v, which is connected to the pump P via a valve v9 '.
The pipe is connected to the liquid suction port.

At the bottom of the overflow box B3 'shown in FIG. 16 (B), there is provided a liquid passage Lb' via a valve v1 ".
7 "via the same valve v as shown in FIG.
It is connected to the pipe to 2 '. Figure 1 for other points
6 (A) is the same as the liquid circuit.

The circuit for pre-coating the filter aid in the filter is not shown.

The opening and closing of each valve is as follows.

Valve For normal renewal filtration For renewal filtration During plating process When transferring liquid to tank 511 When returning liquid from tank 511 to 10 ′ Pump operation Operation operation v1 ′ open open v2 ′ open Open Close v3 'Open Open Open v4' Open Close Open v5 'Open Close Open v6' Open Close Open v7 'Open Open Close v1 "Open Open Close v7" Open Open Close v8' Close Open Close v9 'Close Close Open In the processing operation, when the amount of overflow liquid to the overflow box B2 '(B3') decreases and the inside of the box becomes dry, the pump P
Valve V1 '(V1 ") to prevent air suction
Close.

Thus, conventionally, as shown in FIG. 16, when the liquid is sucked from the overflow box B2 'or B3', the liquid inlet L at the bottom of the overflow box is used.
Since the liquid was absorbed from b and Lb ', impurities in the liquid were easily clogged at the liquid inlet and the pipe connecting portion to the liquid inlet, causing a serious problem in the filtration work. Since the liquid suction pipe of the suction head 106 can absorb liquid upward from the bottom of the box, clogging of the head 106 and the liquid suction pipe connected thereto with impurities is sufficiently suppressed.

Returning to the description, the description will be continued.

Each liquid suction hole 104 of the first suction head 104
b, the diameter of each of the liquid suction holes 106b of the second suction head 106 and the diameter of each of the liquid suction ports of the third suction head 108 is the same as that of the liquid filtration through which the suction head is connected via a manifold described later. Is set to be equal to or smaller than the height of the impeller blades in the liquid circulation centrifugal pump.

By reducing the aperture in this way,
Prevents pumps from breaking down due to the centrifugal pump sucking into the centrifugal pump and causing the pump to break down, such as a part or part of the article to be plated that may fall into the liquid tank and other miscellaneous goods brought in from the outside. can do.

Note that another type of suction head may be used instead of the second suction head 106. For example, a suction head 107 shown in FIG. 8 may be employed.

The suction head 107, which can be called a dust removing strainer, is in the form of a small box, has a pipe connection port 107a at the top, and has a plurality of liquid suction holes 107b formed on the side peripheral wall and the bottom wall in a dispersed manner. Things. The foot 107c is attached, and it stands at the bottom of the overflow box B2. The diameter of each of the liquid suction holes 107b may be set to be equal to or smaller than the height of the impeller blade in the centrifugal pump for liquid circulation.

The first suction head 104 and the second suction head
The suction head 106 (or 107) or the third suction head 108 is a component of the circulating filtration device described below.

The first group including one liquid tank 11 described above, the second group including two liquid tanks 12 and 13, the liquid tank 1
A circulating filtration device is provided for each of the third group including 4 and 15. Further, from the liquid tank 11 to the liquid tank 1
There is also provided a circulating filtration device for a fourth group containing up to 5 liquid tanks.

In FIG. 1, reference numeral 3 denotes a circulating filtration device for the liquid tank 11, reference numeral 4A denotes a circulating filtration device for the liquid tanks 12 and 13, and reference numeral 4 denotes a circulating filtration device for the liquid tanks 14 and 15.
In B, the circulation filtration device for all the liquid tanks 11 to 15 is denoted by reference numeral 6.
Indicated by

In the circulating filtration apparatus, the circulating filtration apparatus 3 of the first group includes a liquid circulating pump (here, a centrifugal pump) 1
It is a single-circulation filtration device of one liquid tank with a single unit, and the second group of circulation filtration devices 4A and the third group of circulation filtration devices 4B are each equipped with one liquid circulation pump (here, a centrifugal pump) for two treatment liquid tanks. Is a circulating filtration device. Further, the circulation filter 6 belonging to the fourth group is a circulation filter using one liquid circulation pump (here, a centrifugal pump) for all five treatment liquid tanks.

Each of the second group filtration device 4A and the third group filtration device 4B is a two-liquid tank circulating filtration device using one liquid circulating pump, and the processing liquid in the two liquid tanks in each group is circulated and filtered. In the process, the liquid flow rate in the circulation circuit slightly increases or decreases, and as time passes, the liquid level of one of the two liquid tanks falls, and in contrast, the liquid level of the other liquid tank decreases. An increase and inflow of the liquid amount corresponding to the liquid reduction in the descending liquid tank occurs, and finally the processing liquid overflows from the other liquid tank, and the liquid surface level of the processing liquid in one liquid tank falls too much, and both liquids are dropped. In some cases, plating with the processing solution cannot be performed in both tanks.

Therefore, in this case, a circulating filtration device 6 for simultaneously performing circulating filtration with one liquid circulating pump is installed and operated in all five liquid tanks so as to suppress a vertical difference in liquid level between the liquid tanks. In addition, the liquid level is controlled and the liquid is mixed, so that the circulating filtration is performed while the composition and temperature of the liquid in each liquid tank are made uniform. That is, the circulation filtration device 6 is a device for mixing liquids and for controlling the liquid level position as well as a circulation filtration device.

The apparatus for mixing and controlling the liquid surface position can perform the circulation filtration while performing the liquid mixing and the liquid surface position control in each liquid tank even when the capacity of each liquid tank is different.

The circulating filtration device 3 for the liquid tank 11 includes a filter 31 and a circulating pump 32 for liquid circulation (in this example, a centrifugal pump is used). The liquid tank 11 can communicate with the liquid suction port of the circulation pump 32 via a liquid suction circuit. The filter 31 can communicate with the liquid tank 11 via a liquid sending circuit.

As shown in FIG. 1, the liquid suction circuit includes a liquid tank 11.
Suction head 104 and second suction head 10 in FIG.
6 (omitted in FIG. 1; see FIGS. 2, 6, 7 and the like), a manifold 33 for liquid merging, pipe connection ports 104a of suction heads 104 and 106 (see FIG. 6), 106a (see FIGS. 7) are connected to the branch pipe of the manifold 33 via the manual open / close valves v11 and v12, respectively, and the main opening of the manifold 33 is connected to the liquid suction port of the circulation pump 32 via the manual open / close valve v13. Including plumbing.

When employing the third suction head 108,
The liquid aspirated by this is ultimately the valve v1
1, the pipe is connected to the pump 32 via a valve or the like so as to be mixed and merged with the liquid sucked through the v12 and flow into the pump 32.

The liquid feed circuit includes a pipe for connecting the liquid feed port of the filter 31 to two locations of the liquid tank 11 via the manual open / close valve v14 and the temperature control circuit 45 and two manual open / close valves v15. I have. The communication with the liquid tank 11 is not limited to two places as described above, but may be one place or three or more places.

The discharge port of the circulation pump 32 is connected to the liquid supply port of the filter 31 via a check valve v16.

The filter 31 can be of various types adapted to the type of liquid and the amount of filtrate. In this case, the liquid to be injected into the filter is a filter having a precoat layer with a suitable filter aid. This is a type of filter in which impurities are filtered and purified by passing through a bed. The filters in the circulating filtration devices 4A and 4B, which will be described later, and in the device 6 for liquid mixing and liquid level position control are also of the same type.

Further, in the liquid sending circuit, an exchanging device 51 for restoring the liquid structure that changes due to the deterioration, consumption, etc. of the plating solution in one liquid tank, and for removing and filtering the accumulated impurities.
(See FIGS. 1 and 3).

The basic structure of the temperature control circuit 45 and the replacement device 51 in the circulating filtration device 3 is the same as that of the temperature control circuit 45 and the replacement device 51 in the circulating filtration devices 4A and 4B, which will be described later. The circuit 45 and the device 51 in the filtration device 4A will be described, and the description of the temperature control circuit 45 and the device 51 will be omitted.

Since the circulating filtration devices 4A and 4B have exactly the same structure and operation, only the device 4A will be described and the description of the device 4B will be omitted. In the devices 4A and 4B, the same parts are denoted by the same reference numerals.

As shown in FIG. 1, the circulation filter 4A includes a filter 41 and a circulation pump 42 (here, a centrifugal pump) for circulating the liquid. The liquid tanks 12 and 13 can communicate with the liquid suction port of the circulation pump 42 via a liquid suction circuit. Filter 41
Can communicate with the liquid tanks 12 and 13 via a liquid sending circuit.

The liquid suction circuit includes a first suction head 104 and a second suction head 10 in each of the liquid tanks 12 and 13.
6 (omitted in FIG. 1; see FIG. 2 etc.); manifolds 431, 432, and 430 for liquid confluence;
106a (see FIGS. 6 and 7) are respectively connected to the manual open / close valve v4.
1, pipes connected to the branch pipe of one manifold 431 via V42, and suction heads 104, 10
6 are connected to the liquid tanks 12a and 106a, respectively.
And a pipe connected to the branch pipe of the other manifold 432 via the same manual open / close valves v41 and v42 as in
A pipe connecting the main openings of the manifolds 431 and 432 to the branch pipe of the manifold 430 and a manual open / close valve v4
3 and a pipe connected to the liquid suction port of the circulation pump 42 via

The third suction head 1 in the liquid tanks 12 and 13
When 08 is adopted, the liquid sucked by this is finally mixed with the liquid sucked through the valves v41 and v42, merged, and flows into the pump 42 via a valve or the like so as to flow into the pump 42. The piping is connected to the pump 42.

The liquid supply circuit includes a pipe connecting the liquid supply port of the filter 41 to the main opening of the liquid distribution manifold 433 via the manual open / close valve v44 and the temperature control circuit 45, and a manifold 433.
A pipe for branching one branch pipe to two places of the liquid tank 12 via two manual opening / closing valves v45, and two manual opening / closing valves for the other branch pipe of the manifold 433 as in the case of the liquid tank 12. and a pipe that branches and communicates with two portions of the liquid tank 13 via v45.

The discharge port of the pump 42 is connected to the liquid supply port of the filter 41 via a check valve v46.

The filter 41 is of the same type as the filter 31 in the circulating filter 3. Note that different types may be used.

Further, two liquid tanks 12, 13 are provided in the liquid sending circuit.
, A replacement tank 51 (FIG. 3) for restoring the liquid structure that changes due to the deterioration and consumption of the plating solution in the tank, and for removing and filtering the accumulated impurities.
Reference).

The temperature control circuit 45, as shown in FIG.
Manual on-off valve va ', heat exchanger 451, manual on-off valve vb'
Are connected in series with a flow control valve V in a circuit in which the inlet of the valve va 'on the heat exchanger inlet side and the flow control valve V
Is connected to the valve v4 through the manifold 452 for liquid distribution.
4 (a valve on the outlet side of the filter), and the outlet of the valve vb 'and the outlet of the flow rate regulating valve V are connected to the liquid distribution manifold 433 which leads to the liquid tank.

The temperature control circuit 45 in the circulation filtration device 3
Has basically the same structure as the temperature control circuit 45 in the circulation filtration devices 4A and 4B. However, in the temperature control circuit 45 in the circulating filtration device 3, the outlets of the valve corresponding to the valve vb 'and the valve corresponding to the flow rate regulating valve V are collected in one pipe without passing through the manifold, and two more On-off valve v15
And two branches of the liquid tank 11 are branched and communicated.

[0086] As shown in FIG.
The piping is connected so that the liquid supply port of the filter 41 can be communicated with the drainage tank 511 via the manual opening / closing valve v51, and the liquid suction port of the pump 42 is connected to the bottom of the drainage tank 511 via the manual opening / closing valve v52. Installed conventional foot valve
ve) A pipe connected to v53.

The refilling device 51 in the circulating filtration device 3
The structure of the replacement device 51 is basically the same as that of the replacement device 51.

Here, the "manifold" described hereinbefore and hereinafter will be described. The manifold comprises a manifold body in the form of a closed cylinder having one end closed, and a plurality of branches connected thereto. Including tube. And in a circulating filtration device using the manifold for the liquid suction circuit from the liquid tank and the liquid sending circuit from the filter to the liquid tank by the circulation pump, a plurality of the same or different cross-sectional areas provided on the main body of the manifold are provided. The flow rate of liquid absorption or liquid transfer from each of the branch pipes is determined by the cross-sectional area of the branch pipe.

More specifically, in each of the plurality of branch pipes, the flow rate per unit sectional area is, for example, such that the precoat layer of the filter aid of the filter exceeds the allowable range for removing impurities, and the precoat layer becomes extremely clogged. The pressure difference before and after, in other words, unless there is any inconvenience such as the pressure difference between the stock solution chamber and the filtration chamber in the filter fluctuates remarkably, the amount is substantially the same, and each branch pipe has the same amount per unit cross-sectional area. It has a cross-sectional area to obtain a required predetermined flow rate based on the flow rate. The manifold body has the same cross-sectional area over substantially the entire length of the cylinder constituting the manifold body, and has a cross-sectional area slightly larger than the total cross-sectional area of the plurality of manifolds. The pressure in the manifold main body is set to the same negative pressure or the same positive pressure under the same cross-sectional area over substantially the entire length of the inside of the cylinder, and a predetermined flow rate for each branch pipe can be obtained without excess or shortage.

Returning to the original description, the liquid junction manifold 33 and the manifold (not shown) of the temperature control circuit 45 in the circulation filtration device 3 described above, and the liquids in the circulation filtration devices 4A and 4B are omitted. Manifolds 431, 43 for merging
2, 430, the manifold 433 for liquid distribution, and the manifold 452 of the temperature control circuit 45 have basically the same structure as the manifold shown in FIG. 9, and are made of a vinyl chloride resin (PVC). The same applies to the manifold shown in FIG. 10 described later. These manifolds may be made of another material, for example, another synthetic resin or metal.

That is, the manifold 33 for the liquid confluence in the circulating filtration device 3 and the manifold (not shown) of the temperature control circuit 45.
And manifold 4 for merging liquids in circulation filtration devices 4A and 4B
31, 432, 430, the manifold 433 for liquid distribution, and the manifold 452 of the temperature control circuit 45 are all structurally not limited as shown in FIG. And two connected thereto, but not limited thereto, a branch pipe 40 having a circular cross section here.
2, 403. The manifold main body 401 is a closed cylindrical body having a substantially uniform inner diameter (substantially uniform liquid flow cross-sectional area) having a main opening 401a at one end for connecting another pipe and closing the other end 401b.

The opening 4 of the manifold body 401 under the same positive or negative pressure on the branch pipes 402 and 403
The cross-sectional area of 01a has a cross-sectional area corresponding to the total cross-sectional area of the branch pipes 402 and 403 that provide the required predetermined liquid flow rates.

The cross-sectional area of the manifold main body 401 has a cross-sectional area slightly larger than that of the opening 401a as a marginal cross-sectional area with respect to the total cross-sectional area of the plurality of branch pipes.

The branch pipes 402 and 403 are connected to the manifold main body 401.
At two locations in the longitudinal direction of the manifold body, they are inserted into the manifold body from a direction perpendicular to the longitudinal direction of the manifold body, and the degree of projection (projection insertion height) α of each branch pipe 402, 403 into the manifold body. Is in the range of about 1/2 to 3/5 of the inner diameter R of the main body 401.

The manifold body 40 of the branch pipes 402 and 403
The height of the protruding insertion into 1 is determined by the pressure (negative or positive pressure) in the manifold main body under the suction pressure (negative pressure) or the liquid sending pressure (positive pressure) of the pump over the manifold main body. It is kept under uniform pressure.

The manifold body 401 is connected to the two branch pipes 40.
2, 403 are connected in a liquid-tight manner by an adhesive, welding or the like.

The basic structure of the manifold shown in FIG. 10, which will be described later, and the manifold main body 600 and the branch pipes 601 to 605 are the same as those of the manifold described above.

In any of the manifolds, the connecting portion of the branch pipe to the manifold main body is not particularly limited, and can be connected to an arbitrary portion around the manifold main body according to the liquid circuit configuration. Further, the angle of the branch pipe at the time of the connection does not necessarily have to be a direction orthogonal to the longitudinal direction of the manifold main body.

According to the manifold having such a structure, when the suction port of the liquid circulation pump is connected to the main opening 401a of the manifold main body 401 and used as a manifold for liquid merging, the suction pressure of the pump (negative pressure) Pressure), that is, the liquid pressure (suction pressure) in the manifold main body is made uniform in each part in the manifold main body. Therefore, the amount of liquid absorbed from each branch pipe 402 and 403 into the manifold main body 401 is equal to the liquid in each branch pipe. It depends on the flow cross section.

Further, the main opening 401 of the manifold body 401 is provided.
When the outlet of the pump is communicated with a and used as a manifold for liquid distribution, the discharge pressure (positive pressure) of the pump, that is, the liquid pressure (positive pressure) in the manifold main body, is uniform at each part in the manifold main body. Therefore, the amount of liquid discharged from each of the branch pipes 402 and 403 depends on the liquid flow cross-sectional area of the branch pipe.

Here, the manifold having such a structure is used as a manifold (not shown) of the manifold 33 and the temperature control circuit 45 in the circulating filtration device 3, and a manifold 431 for liquid merging in the circulating filtration devices 4A and 4B. 432, 430, the manifold 433 for liquid distribution and the manifold 452 of the temperature control circuit 45, a predetermined amount of liquid is sucked from the inner bottom groove 102 of the liquid tank and the overflow box B2, and the circulation filtration device 3 In the above, a predetermined amount of the filtered liquid can be returned to the liquid tank 11, and for the circulating filtration devices 4A and 4B provided for the plurality of liquid tanks, a predetermined amount is filtered into the plurality of liquid tanks. In each temperature control circuit 45, a manifold 452 is provided as shown in FIG. 3, and heat exchange is easily performed at an arbitrary heat exchange flow rate set by the flow control valve V. It can be fed to the vessel.

Next, the filtering device and the like described above will be described from the filtering device 4A for convenience of explanation.

According to the circulating filtration device 4A, in normal circulating filtration, the valves v41 to v45 are opened, and the valves va ', vb', and V in the temperature control circuit 45 are set to arbitrary predetermined opening degrees. (Always open) and the manual on-off valves v51, v
52 is closed.

Then, a circulation pump (a centrifugal pump in this example)
By driving the valve 42, the liquid tanks 12, 1 are connected via the valve v43.
3, a plating solution containing precipitating impurities is mainly suctioned by the first suction head 104 from the inner bottom groove 102, and the third suction head 108 is transferred to another portion of the inner bottom of the liquid tank as shown by a chain line in FIG. Is also installed, the third suction head also sucks the plating solution containing impurities in the bottom of the liquid tank and the vicinity thereof from the third suction head, while the weir 21 is supplied to the overflow boxes B1 and B2 in the liquid tanks 12 and 13, respectively. , 22 and with the plating solution, the floating impurities collected in the box B2 are sucked together with the plating solution in the box B2 by the second suction head 106, and these impurities are filtered by the filter 41, and the filtered plating solution is filtered. The liquid is returned to each of the liquid tanks 12 and 13
Reflux to the point. In this way, the filtered liquid is returned to a plurality of locations instead of a single location in each liquid tank, thereby improving the cleanliness of the liquid in each part of the liquid tank.

During the circulating filtration, the plating solution is controlled to a predetermined temperature by the heat exchanger 451 in the temperature control circuit 45.

When starting the operation of the plating apparatus during consecutive holidays or opening a holiday, if the temperature of the plating solution greatly deviates from the predetermined temperature, the flow rate in the temperature control circuit 45 is reduced until the temperature reaches or approaches the predetermined temperature. Regulating valve V
By squeezing or closing the plating solution and intensively flowing the plating solution into the heat exchanger 451, a predetermined working temperature of the plating solution can be promptly obtained.

In general, in the case of an article processing liquid tank, the processing liquid contains impurities that are attached to the object to be processed from the beginning and impurities generated during the pre-processing step of the object to be processed. The impurities that are brought into the object and the impurities and the like generated by electrolysis, deterioration, and the like in the process of processing the object in the processing solution synergistically accumulate the impurities every day, thereby increasing the cost. Frequent washing and restoration of the filtration bed of the filter and refilling of the liquid tank must be performed.

Taking an article plating solution tank as an example, the plating solution contains impurities which are attached to the object to be processed from the beginning and which are generated during the pretreatment process of the object. Impurities which are brought in by being adhered to the object to be processed, and impurities generated due to anode electrolysis, deterioration of the processing solution, etc. in the process of processing the object to be processed in the plating solution tank, and fall into the liquid tank from outside. Impurities accumulate every day due to the synergistic effect of certain impurities and the like, which necessitates frequent cleaning and restoring operations of the filter bed in the filter, and liquid tank replacement filtration. In addition, due to these operations, the production of plating products is interrupted, overtime is increased, labor costs are increased, expensive plating solutions are lost, chemicals and drainage management costs are increased, and energy such as electricity is excessive. This leads to wear and, consequently, soaring of plated products.

In the case of replacement filtration, the cycle of the replacement filtration is greatly affected by the liquid quality, the product type, and the like, but is generally between one month and three months. Activated carbon treatment for removing inorganic and organic impurities, filtration and the like are performed by replacement filtration to regenerate and restore the liquid composition, and the recovered liquid is returned to the original liquid tank again.

The plating solution baths 11 to 1 which have just been described.
In step 5, the re-filtering process is performed as follows.

That is, when performing the replacement filtration of the plating solution in the liquid tank 12, the liquid tank 12 in the circulating filtration device 4A is used.
Valve v42 on the side, valve v41, v42 on the liquid tank 13 side, valve v44 communicating with the inlet of the temperature control circuit 45, the opening change device 5
1 valve v52 is closed, the valve v41 on the liquid tank 12 side, the pump 4
The valve v51 of the replacement device 51 is opened together with the valve v43 communicating with the liquid suction port 2 to operate the pump.

Thus, the valve v41 on the liquid tank 12, the manifold 431, the manifold 430 (not shown in FIG. 3; see FIG. 1), the valve v43 on the pump suction side, the pump 42, the check valve v
The plating solution in the liquid tank 12 can be collected in the replacement tank 511 via the filter 46, the filter 41, and the valve v51. The liquid collected in the replacement tank 511 is subjected to activated carbon filtration, liquid composition restoration, and the like.

[0113] From the draining tank 511 of the treated liquid to the liquid tank 12
For the recirculation, the valve v51 of the replacement device 51 and the pump 4
The valve v43 connected to the liquid suction port 2 and the valve v45 on the liquid tank 13 side are closed, and the valve v52 of the refilling device, the valve v44 connected to the temperature control circuit 45, the valve V of the temperature control circuit 45, and the valve on the liquid tank 12 side are closed. Open v45 and operate the pump 42.

As a result, the plating solution restored from the foot valve v53 at the bottom of the replacement tank 511 is sucked,
Valve v52, pump 42, check valve v46,
Filter 41, valve v44, manifold 45 of temperature control circuit 45
2. The valve v4 on the liquid tank 12 side via the valve V and the manifold 433
Reflux from 5 to the liquid tank 12.

On the other hand, when performing the replacement filtration of the plating solution in the liquid tank 13, the liquid tank 13 in the circulating filtration device 4A is used.
The valve v42 on the side, the valves v41 and v42 on the side of the liquid tank 12 and the valve v44 leading to the temperature control circuit 45, the valve v52 of the refilling device 51 are closed, and the valve v41 on the side of the liquid tank 13 and the suction port of the pump 42 are closed. The valve v51 in the replacement device 51 is opened together with the valve v43, and the pump 42 is operated.

Thus, the liquid tank 13 passes through the valve v41, manifold 432, manifold 430, pump suction side valve v43, pump 42, check valve v46, filter 41, and valve v51 on the liquid tank 13 side. The plating solution in 13 can be collected in the replacement tank 511. The liquid collected in the replacement tank 511 is subjected to a filtration treatment or the like.

To return the liquid from the drainage tank 511 to the liquid tank 13, the valve v51 of the drainage device 51, the valve v43 communicating with the suction port of the pump 42, and the valve v45 of the liquid tank 12 are closed. Valve v52, valve v leading to the temperature control circuit 45
44, valve V of temperature control circuit 45, valve v45 on liquid tank 13 side
Is opened, and the pump 42 is operated.

As a result, the reconstituted plating solution is sucked from the hood valve v53 at the bottom of the refilling tank 511, and the valve v52, the pump 42, the check valve v46, the filter 41, and the valve v44 of the refilling device 51. The liquid is returned from the valve v45 on the liquid tank 13 side to the liquid tank 13 via the manifold 452, the valve V, and the manifold 433 of the temperature control circuit 45.

Thus, in this case, the replacement filtration of the plating solution in the solution tanks 12 and 13 can be performed by replacing the entire plating solution in each tank.

The reason that the plating solutions in the liquid tanks 12 and 13 are individually changed and the filtration treatment is performed is that if the two tanks are to be exchanged together, the capacity of the exchange tank 511 must be increased accordingly. This is because the installation space of the replacement tank 511 becomes large and the cost increases.
Further, the reason why the replacement filtration is required often occurs in each tank.

When there is a space for installing a large-capacity refill tank 511 or the like, the refill filtration work may be performed on two tanks at once.

In the circulation filtration device 4B, the filtration device 4
As in the case A, the plating solution in the solution tanks 14 and 15 can be circulated and filtered. Also, the temperature of the plating solution can be controlled. Further, the entire amount of the plating solution in each of the liquid tanks 14 and 15 can be changed and filtered.

According to the circulating filtration device 3, in normal circulating filtration, the valves v11 to v15 are opened, the on-off valve and the flow control valve in the temperature control circuit 45 are set to predetermined openings, respectively, The on-off valve leading to 51 is closed. By operating the circulation pump 32, the second suction head 104 is moved from the inner bottom groove 102 of the liquid tank 11.
In the main, the precipitating impurities are sucked together with the plating solution,
Also, as shown by the chain line in FIG.
When the suction head 108 is also installed, the third suction head also sucks the plating solution containing impurities at the bottom in the liquid tank and in the vicinity thereof.

On the other hand, the floating impurities flowing into the overflow boxes B1 and B2 attached to the liquid tank 11 together with the plating solution over the weirs 21 and 22 are collected by the second suction head 106 in the box B2. By sucking together with the plating solution, these impurities are filtered by the filter 31, and the filtered plating solution can be returned to two places of the liquid tank 11 again. In this way, the liquid after filtration is placed in the liquid tank 11.
Since it is returned to a plurality of locations instead of locations, the degree of cleanliness of the liquid in each part of the liquid tank 11 improves accordingly.

During the circulating filtration, the plating solution can be controlled to a predetermined temperature by the temperature controller 45.

When starting the operation of the plating apparatus during consecutive holidays and holidays, when the temperature of the plating solution greatly deviates from the predetermined temperature, the flow rate in the temperature control circuit 45 is reduced until the temperature reaches or approaches the predetermined temperature. By squeezing or closing the regulating valve V and intensively flowing the plating solution into the heat exchanger, a predetermined plating solution temperature can be quickly obtained.

When performing the replacement filtration of the plating solution in the liquid tank 11, the valve v11 on the liquid tank 11 side is opened and the v12 is closed in the filtration device 3 in the same manner as the above-described replacement device 51 for the liquid tanks 12, 13. , And a valve v4 leading to the temperature control circuit 45
4 and the valve v52 of the apparatus 51 are closed, and the opening / closing valve v51 for liquid supply to the replacement tank 511 is opened. By operating the pump 32, the plating solution in the liquid tank 11 can be recovered to the replacement tank.

[0128] The recovered, regenerated and reconstituted plating solution is supplied to the above-mentioned solution tanks 12 and 13 by an exchanging device 51.
The liquid can be returned to the liquid tank 11 in the same manner as described above.

The plating apparatus described above further collects and mixes the plating liquid from each of the liquid tanks 11 to 15 and controls the liquid surface position in each liquid tank to a predetermined position while returning the liquid to each liquid tank again. A device 6 for mixing and controlling the liquid level is provided. This will be described below.

As shown in FIG. 1, the device 6 for mixing and controlling the liquid level is manually opened and closed by a liquid circulation pump 61 (here, a centrifugal pump) and overflow boxes B2 of the liquid tanks 11 to 15. A circuit for guiding the liquid to the suction port of the pump 61 via a valve v71, a first manifold J1 for liquid merging and a second manifold J2 for liquid merging, and a manual open / close valve v62; From each overflow box B2, via a manual opening / closing valve v61 and a liquid discharge electric valve Va corresponding to each liquid tank (there are five in total), to a third manifold J3 for liquid merging, and further to the third manifold J3 A circuit that can guide liquid from the pump to the suction port of the pump 61 through the second manifold J2 and the manual on-off valve v62;
1 through the check valve Vo and the filter 60, further through the manual open / close valve v63, the fourth manifold J4 for liquid distribution and the fifth manifold J5 for liquid distribution, 12,
A circuit for guiding the liquid to 13, 14, 15 and a discharge port of the pump 61, through the check valve Vo and the filter 60, a valve v63, the fourth manifold J4, and a sixth manifold for liquid distribution. Each liquid tank 1 is connected via a pipe J6 and an electric valve Vb for liquid supply corresponding to each liquid tank (there are a total of five valves), and further through a manual opening / closing valve v64.
A circuit capable of guiding the liquid to 1, 12, 13, 14, and 15. The device 6 for liquid mixing and liquid level control further includes a liquid level detecting device 62 installed in the overflow box B2 of each liquid tank.

Electric valve for discharging liquid Va, electric valve for supplying liquid Vb
Here, all are valves provided with a valve opening / closing drive motor.

The plating apparatus shown in FIG.
A control unit 7 for controlling the operation of the entire apparatus as shown in FIG.
And a part of the control unit 7 constitutes a part of the device 6 for liquid mixing and liquid surface position control described here.

An operation panel 71 is connected to the control section 7, and a switch for starting and stopping each pump is mounted on the operation panel 71.

As shown in FIG. 11A, each of the pumps 32, 42, 42, and 61 is connected to the control unit and operates based on an instruction from the control unit. In addition, the liquid discharge electric valve Va, the liquid supply electric valve Vb, and the liquid surface position detecting device 62 corresponding to each liquid tank in the device 6 for liquid mixing and liquid surface position control are also connected to the control unit. .

Each of the liquid surface position detecting devices 62 has the same structure, and one of them is suspended and inserted into the overflow box B2 from above, as schematically shown in FIG. 11B. Five electrode rods 621-
625.

These electrode rods are electrode rods 621, 622, 6
23, 624, long, box B deep
2 has been inserted. The electrode rod 625 is a ground electrode rod, and is inserted into the box B2 substantially the same as or deeper than the electrode rod 624.

In the overflow box B2 of each liquid tank, the electrode rod 621 is an electrode rod for detecting an abnormal upper limit of the liquid level, and the electrode rod 622 changes the liquid level when the liquid level reaches the upper limit of the allowable range. An electrode rod for detection,
The electrode rod 623 is an electrode rod that detects when the liquid level reaches the lower limit of the allowable range, and the electrode rod 624 is an electrode rod that detects that the overflow box is in a dry state.

In any of the liquid tanks 11 to 15, the liquid level of the liquid contained in the overflow box over the weirs 21 and 22 in the liquid tank is within a predetermined upper limit and a lower limit. When the liquid level in the box B2 is lower than the lower end of the electrode rod 622 and higher than the lower end of the electrode rod 623, the liquid discharge corresponding to the liquid tank is performed. Electric valve Va, liquid supply electric valve V
b remains open under the instruction of the control unit 7,
Discharge and supply of the liquid to the liquid tank are continued.

However, when the liquid level of the liquid stored in the box B2 exceeds the predetermined range beyond the weir portions 21 and 22 in the liquid tank and comes into contact with the lower end of the electrode rod 622, Under the instruction of the control unit 7, a valve v64
The liquid supply motor-operated valve Vb, which is communicated via the (usually open) valve, is closed and the liquid supply to the liquid tank is stopped, while the liquid discharge motor-operated valve Va is opened and the valve v61 (normally opened) , Is opened), the liquid is discharged from the liquid tank.

At this time, separately from the discharge circuit via the motor-operated valve Va, the liquid discharged via the valve v71 (normally opened) and the manifold J1 is supplied to the motor-operated valve Va and the valve V71 in the manifold J2. The liquid merges with the liquid discharged from the manifold J3, and these liquids are sucked into the pump 61 via the valve v62.

When the liquid level in the liquid tank falls and leaves the lower end of the electrode rod 623, the electric valve for liquid discharge Va is closed under the instruction of the control unit 7, while the electric valve for liquid supply is closed. Valve V
b is opened and sent to the liquid tank via the valve v64. At this time, the liquid sent from the pump 61 passes through the check valve Vo and the filter 60, and the manifold J6, the electric valve Vb, and the valve v64 are passed through one of the two branch pipes of the manifold J4. At the same time, the liquid is refluxed to the liquid tank from the other branch pipe of the manifold J4 to the manifold J5, and further to the liquid outlet 63 to the liquid tank.

(1) In the circulating filtration device 6, the amount of liquid discharged from the valve v61 in the suction circuit of the pump 61 via the electric valve Va and the valve v7 without passing through the electric valve Va
And (2) the motor-operated valve V in the pumping circuit of the pump.
b, the total amount of liquid sent back to the liquid tank via the valve v64 and the amount of liquid refluxed from the liquid outlet 63 to the liquid tank via manifolds J4 and J5 without passing through the electric valve Vb. Are initially set to be approximately equal.

During this time, the operation of the pump 61 is continued.

In the overflow box B2,
When the liquid level of the processing liquid becomes lower than the predetermined height due to an unexpected situation or the like and the liquid level leaves the electrode rod 624, or when the liquid level of the processing liquid becomes higher than the predetermined height, When the surface comes into contact with the electrode rod 621, not only the pump 61 but also all the pumps are emergency-stopped under the instruction of the control unit 7 for both the front and rear sides. An alarm device for issuing an alarm in this case may be provided for safety management.

The manifolds J1 to J3 for liquid merging are:
A manifold body having a liquid-absorbing space for liquid-absorbing and a liquid-flow main opening communicating with the liquid-absorbing space in one place;
A branch pipe connected to each of a plurality of predetermined locations except for the position of the main opening of the manifold main body, wherein the liquid flows into each branch pipe and merges in the manifold main body to form a main opening. It flows out of the department.

Also, the manifolds J4 to J6 for liquid distribution are used.
A manifold body having a liquid sending space for liquid sending and having a liquid circulation main opening in one place communicating with the liquid sending space, and a plurality of except for the main opening position of the manifold body. A branch pipe connected to each of the predetermined locations,
The liquid flows into the main opening, separates from each branch pipe, and flows out.

The first manifold J1 and the third manifold J3, and the fifth manifold J5 and the sixth manifold J6 respectively include:
The same number (in this case, 5) of branch pipes as the number of liquid tanks are provided, and the second manifold J2 and the fourth manifold J4 are provided with 2 pipes.
A branch pipe is provided. The manifold J2 for liquid merging and the manifold J4 for liquid distribution employed in the device 6 are:
It has the same basic structure as the manifold having the structure shown in FIG. 9 employed in the circulating filtration apparatus, and can obtain a liquid flow rate corresponding to the liquid flow cross-sectional area in each branch pipe.

The manifolds J1 and J3 for liquid confluence and the manifolds J5 and J6 for liquid distribution employed in the apparatus 6 have the same structure as the manifold shown in FIG. It is based on vinyl chloride resin (PVC). Note that these manifolds may be made of other materials, for example, other synthetic resins or metals according to the treatment liquid quality, that is,
As shown in FIG. 10, each of the manifolds J1, J3, J5, and J6 is not limited thereto, but here is a manifold main body 600 having a circular cross-section and five connected thereto, but not limited thereto. Then, the branch pipes 601, 6 having a circular cross section
02, 603, 604, and 605.

The manifold body 600 has a main opening 600a at one end for connecting another pipe, and a closed cylindrical body having a substantially uniform inner diameter (a substantially uniform liquid flow cross-sectional area) closed at the other end 600b. It is.

The opening 6 of the manifold body 600 under the same positive or negative pressure on the branch pipes 601 to 605.
The cross-sectional area of 00a has a cross-sectional area corresponding to the total cross-sectional area of the branch pipes 601 to 605 that provide the required predetermined liquid flow rates. The liquid flow cross-sectional area of each branch pipe is the same here. The cross-sectional area of the manifold main body 600 has a cross-sectional area slightly larger than the opening 600a as a cross-sectional area having a margin with respect to the total cross-sectional area of the plurality of branch pipes.

The branch pipes 601 to 605 are inserted into the manifold main body at five positions in the longitudinal direction of the manifold main body 600 from a direction orthogonal to the longitudinal direction of the manifold main body, and the manifold main body of each branch pipe is inserted. Is greater than or equal to １ ／ and ３ of the inner diameter R ′ of the main body 600.
It is in the following range.

The protruding insertion height of each of the branch pipes 601 to 605 into the manifold main body 600 is determined under the liquid suction pressure (negative pressure) or the liquid sending pressure (positive pressure) of the pump 61 over the manifold main body. The pressure (negative or positive pressure) in the manifold body is kept under a uniform pressure.

The manifold body 600 includes branch pipes 601 to 605.
Are connected in a liquid-tight manner by an adhesive, welding or the like.

Also in the manifold having this structure, when the suction port of the pump 61 communicates with the main opening 600a of the manifold body 600 and is used as a manifold for liquid merging, the hydraulic pressure in the manifold body ( Negative pressure) is equalized in each part in the manifold body,
Therefore, the amount of liquid absorbed from each of the branch pipes 601 to 605 into the manifold main body 600 depends on the liquid flow cross-sectional area of the branch pipe. Here, the liquid absorption amounts are the same.

Further, the main opening 600 of the manifold body 600
When the discharge port of the pump 61 is connected to a and used as a manifold for liquid distribution, the liquid pressure (positive pressure) in the manifold main body is equalized in each part in the manifold main body.
The amount of liquid discharged from 605 depends on the liquid flow cross-sectional area of the branch pipe. Here, the same amount of liquid is discharged.

As described above, here, manifold J
As manifolds 1 to J6 (see FIG. 1), manifolds capable of obtaining a flow rate corresponding to the cross-sectional area of the liquid flow in each branch pipe are employed, thereby continuing the mutual liquid mixing of each liquid tank. The liquid level control in each of the liquid tanks 11 to 15 can be appropriately performed in a state corresponding to the liquid level in each liquid tank, and accordingly, each valve for controlling the liquid level can be controlled. V
The number of times of opening and closing a and Vb (see FIG. 1) can be reduced, and the opening and closing cycle can be lengthened accordingly, and the durability of the electric valves Va and Vb can be lengthened.

According to the apparatus 6 for liquid mixing and liquid level control described above, when the liquid level in the overflow box B2 of each liquid tank is at the normal position, each valve Va,
When Vb is opened and the liquid circulation pump 61 is operated,
The liquid is sucked from the respective overflow boxes B2 of the plurality of liquid tanks 11 to 15 via the valves v61 and v71,
The liquid in each tank is divided into a first manifold J1 and a third manifold J for liquid merging.
3, the branch pipes flow into the main body of the manifold from the branch pipes, merge, and further flow from the main body of the manifold to the branch pipe of the second manifold J2 for liquid merging, and the manifold J2 And the liquid circulation pump 61 in a state where the liquids in the respective tanks are mixed.
Sucked into.

The liquid sucked into the liquid circulating pump 61 is discharged from the pump, filtered by the filter 60, and then flows into the main body of the fourth manifold J4 for liquid distribution. The liquid flows into the main bodies of the fifth manifold J5 and the sixth manifold J6 for liquid distribution, and is returned to each of the liquid tanks 11 to 15 via each branch pipe of the manifold.

The plating liquids thus sucked from the respective liquid tanks join at manifolds J1 and J3, further join at manifold J2, are sucked and discharged by the liquid circulation pump 61, and further pass through the filter 60. Then, in the process of being distributed by the fourth manifold J4 and further distributed by the fifth manifold J5 and the sixth manifold J6, the plating solutions from the plurality of liquid tanks 11 to 15 are mixed, and this is continuously performed. As a result, the plating solution composition in each solution tank is maintained homogeneous.

As described above, the liquid surface position of each liquid tank is controlled.

As described above, by mixing the processing liquids in the respective liquid tanks, the production operation can be continuously performed under a uniform liquid composition. Moreover, these liquid mixing and liquid level control are achieved by one liquid circulation pump 61.

In this way, the processing liquid can be kept uniform between the liquid tanks while the complexity, size, and cost of the apparatus are suppressed, and the liquid level position in each liquid tank is determined. Can be suppressed.

It should be noted that at least the liquid circulating pump 6 like the device 6 for liquid mixing and liquid level position control described above is used.
By providing each circuit for guiding the liquid to 1 and the liquid surface position detecting device 62 for the overflow box B2, the plating processing is performed with little obstruction in the portion containing the liquid before passing over the weir of the liquid tank. I can do it. Further, in an overflow box in which the vertical fluctuation of the liquid level can be made large with respect to the fluctuation of the liquid amount in the entire liquid tank, the fluctuation of the liquid surface position in the liquid tank can be determined more finely, and appropriate liquid surface position control can be performed.

The size of the filter 60 may be smaller than that of the filters 31 and 41 for circulating filtration that can handle the amount of liquid flowing into the overflow box. Moreover, one filter 60 is sufficient as described above.

In the plating treatment apparatus shown in FIG. 1, the circulation filtration of the plating solution by the circulation filtration devices 3, 4A and 4B is performed according to the usual manner. It can be circulated and filtered about three times. That is, the filtration amount can be about three times the volume as a standard. The amount of liquid treatment for liquid mixing and liquid level control by the circulating filtration device 6 can be, for example, the amount of circulating filtration about 0.5 times per hour with respect to the liquid storage capacity of one liquid tank. That is, the filtration amount can be about 0.5 times the volume as a standard.

For example, assuming that the regular liquid storage amount in each of the five liquid tanks shown in FIG. 1 is 5 m ³ , the filtration amount per minute can be set as shown in the following table.

Number of filtration times × liquid storage amount × liquid tank number 液 filtration time = 1 minute filtration amount Filtration device 33 × 5 m ³ × 1 ÷ 60 minutes = 0.25 m ³ / min Filtration device 4A 3 × 5 m ³ × 2 ÷ 60 Min = 0.5 m ³ / min Filtration device 4B 3 × 5 m ³ × 2 ÷ 60 min = 0.5 m ³ / min Filtration device 6 0.5 × 5 m ³ × 5 ÷ 60 min = 0.208 m ³ / min At 15, weirs 21 and 22 (see also FIG. 4) facing overflow boxes B1 and B2 will be described.

Since the dams 21 and 22 are the same for any of the liquid tanks, the description will be made exemplifying the one provided in the liquid tank 12 here. Regarding other liquid tanks, the following description applies to the point of the weir.

The weir 21 is provided with an overflow notch 20 formed at the upper edge of a partition wall w1 (see FIG. 4) between the liquid tank 12 and the overflow box B1. The weir 22 is composed of the liquid tank 12 and the overflow box B2.
A notch (notch) 20 for overflow is formed at the upper end edge of the partition wall w2 (see FIG. 4). Here, the overflow notches 20 in the dams 21 and 22 have the same shape and size.

Here, each notch 20 has an inverted triangular shape, and a plurality of notches 20 and 22 are formed.

As described above, the notch 20 for liquid overflow is used.
The liquid overflows from the notch 20 to the overflow boxes B1 and B2 by adopting the weirs 21 and 22 formed with the above, so that the liquid flows from the weirs 21 and 22 together with the floating impurities to the overflow boxes B1 and B2. Once they have flowed in, they can be pumped out of the box as described above, and these aspirated liquids can be subjected to filtration.

The weirs 21 and 22 formed with the notch 20 for liquid overflow are employed so that the liquid overflows from the notch 20 to the overflow boxes B1 and B2. Even if it rises slightly from the liquid level position for overflow, as long as the rising liquid level position faces the notch 20,
The overflow does not suddenly increase at the same time over the entire length of the upper edge of the weir as in the conventional rectangular weir, so that the total overflow does not increase significantly. Only the overflow amount increases by the increase in the liquid flow cross-sectional area.

Even if the liquid level in the liquid tank 12 is lowered, as long as the lowered liquid level position faces the notch 20, the overflow amount is simultaneously increased over the entire length of the upper end edge of the weir portion as in a conventional rectangular weir. Does not significantly reduce the total amount of overflow.
The overflow amount is only reduced by the decrease in the liquid flow cross-sectional area due to the lowering of the liquid level at zero.

Therefore, even if the liquid level in the liquid tank 12 fluctuates up and down, the overflow amount increases or decreases very slowly as compared with the conventional rectangular weir. In other words, even if the liquid level in the liquid tank 12 fluctuates up and down, the fluctuation in the overflow amount is suppressed to be very small as compared with the conventional rectangular weir.

Thus, for appropriate filtration of the liquid, the amount of liquid absorbed from the bottom of the liquid tank 12 (for example, about 70% of the amount of circulating filtrate) is set according to the amount of circulating filtration corresponding to the capacity of the pump for filtration. ) And the amount of liquid absorbed from the overflow box (for example, approximately 30% of the amount of circulating filtrate), and appropriate filtration of the liquid is achieved.

Further, weirs 21 and 22 formed with a notch 20 for liquid overflow are adopted so that the liquid overflows from the notch 20 to the overflow boxes B1 and B2. Since the liquid extends in the depth direction of the liquid before passing over the notch 22, not only the buoyant impurities that easily float on the liquid surface in the liquid tank 12 but also the impurities that easily float below the liquid tank 12 are removed from the notch 20 by the overflow box B1. , B2, and impurities floating below the liquid level can be collected and filtered.

Furthermore, the shape of the notch 20 (in this case, the angle of the bottom apex of the inverted triangle of the notch and the depth of the notch in particular)
There is also an advantage that the overflow amount can be easily set by selecting the number and the number. Although the notch 20 is illustrated as having an inverted triangular shape, it may have another shape such as a rectangular shape or a U-shape.

When an inverted triangular notch is used as shown in the figure, the vertical angle at the lower end of the inverted triangle is not limited to 40 ° to 90 °, preferably 50 °.
６０60 ° can be exemplified.

As shown in FIG. 12A, the width is 500 mm.
And the standard liquid level in the liquid tank is at a position h = 10 mm higher than the upper end of the rectangular weir 200. At this time, the standard liquid amount (predetermined liquid amount) that overflows beyond the weir 200 is approximately Assuming that the liquid level in the liquid tank rises to 15 mm, 20 mm, and 25 mm, the amount of liquid overflowing the rectangular weir 200 is 101.4 liters / minute, as shown in the following table. Minutes, 15
6.1 liters / minute and 218.2 liters / minute.

Here, instead of the rectangular weir 200, a rectangular notch N1 having a width of 40 mm as shown in FIGS. 12B, 12C and 12D, and a notch N having an inverted triangular lower end having a vertex angle of 90 degrees are used.
2. When the weirs 201, 202, and 203 each having a notch N3 having an inverted triangular lower end apex angle of 60 degrees are used,
In order to obtain the same standard overflow liquid amount of 55.2 liters / minute as that of the rectangular weir 200, as shown in the following table, assuming that the number P of the notches N1 is 5 for the weir portion 201, the liquid of each notch N1 The height h1 of the flow cross section is 18.4 m
m.

As for the weir portion 202, assuming that the number P of the notches N2 is 5, the height h of the liquid flow section of each notch N2 is h.
2 may be set to 28 mm.

As for the weir portion 203, assuming that the number P of the notches N3 is four, the height h of the liquid flow section of each notch N3 is h.
3 may be 38.1 mm.

That is, in any of the weir portions 201, 202, and 203 having notches for liquid overflow, the notches extend in the depth direction of the liquid.
It is cut deeper than the height h = 10 mm from the upper end of 0 to the liquid surface. Thus, it can be seen that not only floating impurities that easily float on the liquid surface but also impurities that easily float in the lower layer can overflow from the notch.

Further, the liquid level of the liquid tank was changed to the rectangular weir 2 as described above.
When trying to obtain the same overflow liquid amount as the overflow liquid amount exceeding the weir 200 when h = 15 mm, 20 mm, and 25 mm, respectively, from the upper end of 00, the number of notches in each of the notched weir portions 201, 202, and 203 is obtained. The height h1, h of the liquid flow cross section at P and the notch
2, h3 is as shown in the following table. That is, according to the following table, the liquid level is 5 mm (when h = 15 mm), 10 mm (when h = 20 mm), and 15 mm (h
= 25 mm), but notch dam 20
It can be seen that the fluctuations of the overflow liquid amount can be suppressed to be smaller than that of the rectangular weir 200 in 1, 202, and 203.

In the following table, M is the rectangular weir 200
Bar flow liquid volume liter / min, m is for each notch
Liter / min of the overflow liquid in the sample
The number of switches. The unit of h, h1, h2, h3 is [mm]
is there. 500mm in width | 40mm in width rectangular notch | 90 degree lower end apex angle 90 degree | Lower end apex angle 60 degree rectangular weir 200 | chi N1 with weir part 201 |｜ ｜ ｜ Weir 203 ｜ ｜ ｜ hM | h1 mP | h2 mP | h3 mP | | | 10 55.2 | 18.4 11.0 5 | 28.0 11.0 5 | 38.1 13.8 4 15 101.4 | 27.6 20.3 5 | 39.0 25.2 4 | 48.6 25.2 4 20 156.1 | 36.8 31.2 5 | 46.5 39.2 4 | 57.9 39.2 4 25 218.2 ｜ 46.0 43.6 5 ｜ 53.0 54.3 4 ｜ 66.0 54.3 4 By the way, in a conventional so-called rectangular weir whose upper edge extends horizontally and straight,
According to the amount of liquid absorbed from the bottom of the liquid tank and the overflow
The amount of liquid absorbed from the filter depends on the capacity of the filtration pump.
Even if it is set to a predetermined ratio, it is slightly above the liquid level in the liquid tank.
Ascending also greatly increases the amount of overflow,
Fluid in the overflow box
More than the absorption capacity from the overflow box
Overfill, gradually the liquid level in the liquid tank and overflow box
The liquid level inside is close to the same position and the drop is small,
Floating impurities are sufficiently collected in the overflow box
We've already mentioned that things can't be done. In this regard
I will explain a little more about this.

For example, in the treatment of an article with an electroplating solution,
The amount of circulating filtration of the plating solution in the plating solution tank varies depending on the material to be plated, but a filtration amount that is approximately three times the amount of the treatment solution in the solution tank per hour is regarded as a standard. The following is an example of the amount of circulating filtration of a liquid tank having the overflow boxes B1 and B2 for overflowing the plating solution from a conventional so-called rectangular weir.

Liquid tank inner width Liquid tank inner length and liquid height Liquid amount Weir length (liquid depth) Liquid tank 1.0m 10m 1.1m Liquid tank Internal liquid amount 11m ³ Box B1 0.2m 10m 0.3m Box B1 circulating total filtration amount per hour of the liquid volume 0.6 m ³ box B2 0.4 m 1 m 0.5 m box B2 fluid volume 0.2 m ³ total 11.8 m ³ the liquid volume 11.8 m ³ is, 11.8 m ³ × 3 times = It becomes 35.4 m ³ / hr.

Then, the filtration amount of the processing liquid in the liquid tank and the overflow box was set to 70%, 30% of the total filtration amount, respectively.
Setting it to% gives:

Amount of filtration of liquid in liquid tank 35.4 m ³ /hr×70%=24.8 m ³ / hr Overflow box 35.4 m ³ /hr×30%=10.6 m ³ / hr overflow amount by total 35.4m ³ / hr However conventional rectangular weir, and the height h from the weir upper end to the liquid surface (see FIG. 12 (a)) and the general average h = 10 mm, as follows Become.

When the weir width is 500 mm as described above when h = 10 mm, the overflow amount is approximately 55.2 liters / min as described above, and the weir width is set to the box B1.
10m and the length of the box B2 1m are 11m in total, so 55.2 liters / min @ 500mm × 11m
× 60 minutes = 72.86 m ³ / hr, and the circulating filtrate amount set for the overflow box.
It is much more than 6 m ³ / hr.

This means that the amount of liquid in the overflow box becomes too large, exceeding the capacity of the pump to absorb the liquid from the overflow box, and the liquid level in the liquid tank and the liquid level in the overflow box rapidly become the same. This means that the head is close to the position and the head is eliminated, so that floating impurities cannot be sufficiently collected in the overflow box. As a result, there is a serious problem that defective liquids are frequently generated such that liquid filtration becomes insufficient, impurities adhere to the surface of the object to be plated, and roughness occurs.

The liquid surface position in the liquid tank is determined by bringing in the liquid adhering to the processing object in the preprocessing step of the processing object, pumping out the processing liquid by the processing object, and heating the liquid by the heat exchanger. Since it fluctuates every moment due to evaporation of water and the like, adjustment of the liquid surface position in each liquid tank and adjustment of the amount of liquid flowing into the overflow box have been frequent, cumbersome, and important operations.

In this respect, in the present invention, by adopting the weir portion provided with the notch for liquid orver flow as described above,
Even if the liquid level in the liquid tank rises and falls, the fluctuation of the overflow amount is suppressed to be smaller than that of the conventional rectangular weir, so that it is set according to the liquid amount of the circulating filtration that matches the filtration pump capacity. By maintaining the amount of liquid absorbed from the bottom of the liquid tank and the amount of liquid absorbed from the overflow box, appropriate filtration of the liquid is achieved, and the generation of defective products can be greatly reduced.

The weirs 21 and 22 are fixedly provided by forming a notch 20 at the upper end of partition walls w1 and w2 between the liquid tank and the overflow boxes B1 and B2. In order to more easily and easily perform the appropriate filtration of the liquid, a weir member that can be detachably installed at the upper edge of the partition wall between the liquid tank and the overflow box may be employed as the weir. FIG. 13 shows an example of such a detachable weir member, and FIG. 14 shows another example of the detachable weir member.

FIG. 13A is a perspective view of the dam member 8. FIG.
FIG. 13B shows a use state of the weir member, and FIG.
3 (A) is shown in a cross section along the line XX. Weir member 8
Is formed integrally with a plate body 81 in which four rectangular notches 80 for liquid overflow are formed, and a wall insertion portion 800 having a gate shape in section (or U-shape) is formed, and a reinforcing rib 83 is also integrally formed avoiding the notch 80. It is formed in.

Although not limited to this, the wall insertion portion 800 here is in the form of a recess, and is formed by integrally providing an inverted L-shaped bent plate portion 82 in the middle of one surface of the plate body 81. I have. In the lower part of the bent plate portion 82 and the plate body 81 located at a position overlapping with the bent plate portion 82, elongated holes 82a long in the vertical direction for bolt penetration are provided. This weir member 8 is
Although not limited to this, here, the whole is integrally formed of a synthetic resin (for example, vinyl chloride resin when the processing liquid is an electroplating liquid) that is resistant to the processing liquid in the liquid tank.

The weir member 8 is connected to the liquid tank 11 (12, 13,
14, 15) and the overflow boxes B1, B2. FIG. 13B shows a state in which the weir member 8 is inserted into the partition wall w2 between the liquid tank 11 and the overflow box B2 from above at the wall insertion portion 800. The weir member 8 may be 1 or 2 depending on the amount of liquid in the liquid tank, the size of the notch 80, and the like.
The above is used. When two or more dam members are used, the adjacent weir members 8 are brought into contact with each other and inserted into the partition wall w2. Although not shown, a weir member similar to the weir member 8 is also inserted into the partition wall w1 between the liquid tank and the overflow box B1.

As shown in FIG. 13 (A), when the weir member 8 is inserted into the partition wall w2, a liner LN for height adjustment is arranged at the back of the upper end of the wall insertion portion 800 as required. The dam member 8 can be placed directly or through the liner LN on the upper end of the partition wall w2.

The weir member 8 inserted into the partition wall w2 as described above is provided with the elongated hole 82a for bolt penetration therethrough from the side of the inverted L-shaped bent plate portion 82, for example, on the wall w2 in advance. Bolts 8 are inserted into bolt holes having an inner diameter through which the bolts 84 can just pass and elongated bolt holes 82 a of the plate body 81.
4 is passed through and tightened with a nut. At this time, if necessary, the liquid sealing material 840 fitted to the bolt 84 is applied to the respective outer surfaces of the bent plate portion 82 and the plate body 81, whereby the portion where the bolt through slot 82a is opened becomes liquid-tight. close.

Thus, the weir member 8 is provided at a predetermined height on the partition wall between the liquid tank and the overflow box, in other words,
The notch 80 is set with its height set to a height at which a predetermined liquid overflow amount is obtained.

According to the dam member 8, since the notch 80 for liquid overflow is formed, there is an advantage similar to the dam portions 21 and 22 having the notch 20 described above.

Further, according to this weir member 8, the overflow amount can be easily set by selecting and adopting an appropriate weir member from the weir members 8 of which overflow amount is variously set,
The overflow amount can be easily changed by changing the mounting height of the dam member 8 by changing the liner LN to one having a different height, or by replacing the dam member 8.

When the partition walls w2 and w1 have poor corrosion resistance to the processing liquid, for example, are made of a metal material, and when the surfaces thereof are coated with a corrosion-resistant synthetic resin or the like, holes for passing the bolts 84 are provided. The portion of the metal material or the like that is exposed at the time of providing the holes may be protected by putting a corrosion-resistant sealant into the bolt holes.

FIG. 14A is a perspective view of the weir member 8 '. FIG. 14B shows a use state of the weir member.
It is shown in a cross section along the line YY in FIG. The weir member 8 ′ is a modified example of the weir member 8 described above, and differs from the weir member 8 in the following points. The other points are the same as those of the weir member 8, and the same parts as those of the weir member 8 are denoted by the same reference numerals.

In this weir member 8 ', a long hole 82a for bolt penetration is also formed in the upper part of the plate body 81 having a rectangular notch 80 for liquid overflow. Such a long hole 82a
Are formed at both ends of the plate 81 here. The upper horizontal portion of the inverted L-shaped bent plate portion 82 is removed at positions outside the reinforcing ribs 83 at both ends of the plate body 81.

This weir member 8 'is similar to the weir member 8 in FIG.
As shown in FIG. 4B, the partition wall w is formed at the wall insertion portion 800.
Plug into 2. However, at this time, a rising wall W ′ which is integrally extended in advance from the upper end of the partition wall w2 in advance and penetrates through the deleted portion of the upper horizontal portion of the inverted L-shaped bent plate portion 82, and It overlaps the upper part of both ends of the body 81. Although not shown, a weir member similar to the weir member 8 'is also inserted into the partition wall w1 between the liquid tank and the overflow box B1.

The weir member 8 'is not only bolted and fastened to the partition wall w2 at the lower part of the plate body as in the case of the weir member 8, but also bolted to the rising wall W' at the upper part of the plate body 81. Is done. That is, the bolt 84 ′ is passed through a bolt hole having an inner diameter through which the bolt 84 ′ is provided in advance on the rising wall W ′ and an elongated hole 82 a for bolt penetration above the plate body 81, and tightened with a nut.
Also at this time, if necessary, the liquid sealing material 840 fitted to the bolt 84 ′ is applied to the plate body 81, thereby closing the open portion of the elongated bolt hole 82 a in a liquid-tight manner. Thus, the weir member 8 'is attached to the partition wall between the liquid tank and the overflow box at a predetermined height, in other words, the height position of the notch 80 is set to a height position to obtain a predetermined liquid overflow amount. Can be

This dam member 8 'has the same advantages as the dam member 8. Further, in the weir member 8 ', a wall W' corresponding to a part of the partition wall w2 is overlapped and fixed on a part thereof, so that the dam member 8 may be damaged by a large liquid pressure in the liquid tank. At some point, there is no danger in the weir member 8 '.

In the weir members 8 and 8 'described with reference to FIGS. 13 and 14, the notch 80 for liquid overflow is a rectangular notch, but the notch for liquid overflow is also provided in the weir members 8 and 8'. The above-mentioned weirs 21 and 22 may have inverted triangular notches, or may have other shapes.

Further, the weir members 8, 8 'are separated from the partition walls w1, w2.
In place of the above-mentioned through bolt 84, a member which is screwed into the weir members 8 and 8 'to abut against the wall surfaces of the partition walls w1 and w2 to fix the weir member to the partition wall is adopted. You may.

[0211]

As described above, according to the present invention, it is possible to provide a manifold capable of easily and inexpensively obtaining a flow rate corresponding to the liquid flow cross-sectional area in each branch pipe.

[Brief description of the drawings]

FIG. 1 is a schematic plan view of a plating apparatus which is an example of a liquid-based article processing apparatus employing a manifold according to the present invention.

FIG. 2 is an enlarged plan view of a part of a liquid tank and a peripheral part thereof.

FIG. 3 is an enlarged side view of one of the liquid tanks shown in FIG. 2 and a peripheral portion thereof.

FIG. 4 is a perspective view of a part of the liquid tank.

5A is a perspective view of an anode case and the like, FIG. 5B is a perspective view of an anode bag, and FIG. 5C is a perspective view of a cathode bus bar, a hanger, a hook member, and the like.

FIG. 6A is a plan view of a first suction head, and FIG.
Is a side view of the first suction head, and FIG. (C) is a cross-sectional view of the bottom groove in the liquid tank, the bottom of the overflow box, and components related thereto.

FIG. 7 is a side view of the second suction head.

FIG. 8 is a perspective view of another example of the second suction head.

FIG. 9 is a side view, partially in section, of a manifold having two branch pipes.

FIG. 10 is a side view showing a cross section of a part of a manifold having five branch pipes.

11A is a block diagram of a control circuit of the plating apparatus shown in FIG. 1, and FIG. 11B is a view showing a schematic configuration of a liquid level detection device.

FIG. 12A is a diagram showing an example of a conventional rectangular weir member, FIG. 12B is a diagram showing an example of a weir member having a rectangular notch for liquid overflow, and FIGS. It is a figure which shows the weir member example which has the inverted triangular notch for each liquid overflow.

FIG. 13A is a perspective view of an example of a detachable weir member, and FIG. 13B is a diagram illustrating a use state of the weir member.
It is sectional drawing which follows the X-ray.

14A is a perspective view of another example of a detachable weir member, and FIG. 14B is a cross-sectional view taken along line YY of FIG. is there.

FIG. 15 is a side view showing a partial example of a conventional manifold.

FIG. 16 is a schematic perspective view of a conventional liquid tank and its peripheral portion.

[Description of Signs] 11, 12, 13, 14, 15 Plating solution tank (example of article processing solution tank) 16 Pretreatment water washing tank L Plating solution W Washing water D1, D2, D3, D3, D4 Work deck 101 solution Inner bottom of tank 102 Inner bottom groove provided in liquid tank 103 Aeration device 103a Bubbles 104 First suction head 104a Pipe connection port 104b Suction hole 105 Air blocking wall plate 105a Support piece 105b Support plate 106 Second suction head 106a Tube Connection port 106b Suction hole 106c Support piece 106d Support plate 107 Suction head 107a Pipe connection port 107b Suction hole 107c Foot 108 Third suction head B1, B2 Overflow box w1, w2 Partition between liquid tank and overflow box Wall 21, 22 Weir 20 Notch A A anode bus bar C cathode bus bar Hanger S Hook member m 'Anode material CS Anode case CSb Anode bag a1, a2 Article to be plated 3 Circulating filter 31 Filter 32 Circulating pump (centrifugal pump in this example) 33 Manifold for liquid merging v11-v15 Manual open / close valve v16 check valve 4A, 4B circulating filtration device 41 filter 42 circulating pump (centrifugal pump in this example) 430, 431, 432 manifold for liquid merging 433 manifold for liquid distribution v41 to v45 Manual open / close valve v46 check Valve 45 Temperature control circuit 451 Heat exchanger va ', vb' Manual open / close valve V Flow control valve 452 Liquid distribution manifold 51 Opening changer v51, v52, v61-v64, v71 Manual open / close valve 511 Opening change tank v53 Foot Valve 401 Manifold body 402, 403 Branch pipe 401a Main opening of manifold body 401 401b Other end of manifold main body 401 9 Conventional manifold 91 Manifold main body 91a Main opening 91b hole 92 Branch pipe 90 Flow control valve 6 Device for liquid mixing and liquid level control 60 Filtration device 61 Circulating pump (In the example, a centrifugal pump) 62 Liquid level detection device 621-625 Electrode rod 63 Liquid outlet Vo Check valve J1, J2, J3 Manifold for liquid junction J4, J5, J6 Manifold for liquid distribution Va for liquid discharge Electric valve Vb Electric valve for liquid supply 7 Control unit 71 Operation panel 600 Manifold body 601 to 605 Branch pipe 600a Main opening of manifold body 600 600b Other end of manifold body 600 200 Conventional rectangular weir 201 to 203 Weir N1, N2, N3 Notch 8, 8 'Weir member 80 Rectangular notch for liquid overflow 81 Plate 82 Inverted L-shaped bent plate 82a Bolt penetration length Hole 83 Reinforcement rib 84, 84 'Bolt 800 Wall insertion portion 840 Liquid sealant LN liner W' Rising wall 10 'Liquid tank L' Liquid B1 ', B2', B3 'Overflow box 21', 22 ', 23' Rectangular weir v1 'to v7', v1 ", v7", v8 ', v9' Manual on-off valve V 'foot valve Lb, Lb' liquid inlet F filter P circulation pump H heat exchanger 100 'liquid return port 511v foot valve 511 '' Liquid outlet

Claims (3)

[Claims] 1. A manifold main body comprising a closed cylindrical body having a main opening for pipe connection at one end and a closed other end, and a plurality of branch pipes connected to the manifold main body. The manifold body has the same cross-sectional area over substantially the entire length of the closed cylinder constituting the manifold body, and has a cross-sectional area slightly larger than the total cross-sectional area of the plurality of branch pipes; The main opening of the manifold main body has a cross-sectional area corresponding to the total cross-sectional area of the plurality of branch pipes, and each of the branch pipes has the same manifold internal pressure over substantially the entire length in the closed cylinder. The manifold is characterized in that it is inserted under the manifold body so that the flow rate per unit sectional area of the branch pipe becomes substantially equal by being placed under the negative pressure or the same positive pressure. tube. 2. Each of the branch pipes is protruded into the manifold main body within a range of about 1/2 to 3/5 of the inner diameter of the closed cylindrical body constituting the manifold main body. Item 4. The manifold according to item 1. 3. Each of the branch pipes is connected to each of a plurality of portions in a longitudinal direction of the manifold body, and is inserted into the manifold body from a direction orthogonal to the longitudinal direction. The manifold according to claim 1 or 2.