JP2001247332A - Glass plate for flat panel displaying unit - Google Patents
Glass plate for flat panel displaying unitInfo
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- JP2001247332A JP2001247332A JP2000060589A JP2000060589A JP2001247332A JP 2001247332 A JP2001247332 A JP 2001247332A JP 2000060589 A JP2000060589 A JP 2000060589A JP 2000060589 A JP2000060589 A JP 2000060589A JP 2001247332 A JP2001247332 A JP 2001247332A
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、フラットパネルディス
プレイ装置、特にプラズマディスプレイ装置用ガラス基
板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display device, and more particularly to a glass substrate for a plasma display device.
【0002】[0002]
【従来の技術】プラズマディスプレイ装置は一般に、前
面ガラス基板表面にITO膜、ネサ膜等からなる透明電
極、誘電体ペーストを、背面ガラス基板表面には、A
l、Ag、Niからなる電極、リブペーストを塗布して
から500〜600℃程度の温度で焼成することにより
回路を形成し、その後、前面ガラス基板と背面ガラス基
板を対向させ、周囲を500〜600℃程度の温度でフ
リットシールすることにより作製される。従来、ガラス
基板としては、建築用または自動車用として広く用いら
れているソーダ石灰ガラス(熱膨張係数 約84×10
-7/℃)が一般的に用いられてきた。また、絶縁ペース
ト、リブペースト、フリットシールといった周辺材料の
熱膨張係数もソーダ石灰ガラスに合わせて、70〜90
×10-7/℃の範囲に調整されている。2. Description of the Related Art In a plasma display device, a transparent electrode and a dielectric paste, such as an ITO film and a Nesa film, are generally provided on the surface of a front glass substrate, and A
A circuit is formed by applying an electrode made of l, Ag, and Ni and a rib paste and baking at a temperature of about 500 to 600 ° C., and thereafter, the front glass substrate and the back glass substrate are opposed to each other, and the periphery is 500 to 600 ° C. It is manufactured by frit sealing at a temperature of about 600 ° C. Conventionally, as a glass substrate, soda-lime glass (coefficient of thermal expansion of about 84 × 10
−7 / ° C.). In addition, the thermal expansion coefficient of peripheral materials such as insulating paste, rib paste, and frit seal is 70 to 90 in accordance with soda-lime glass.
It is adjusted to the range of × 10 -7 / ° C.
【0003】ところが、ソーダ石灰ガラスは歪点が50
0℃程度と低く、570〜600℃の温度で熱処理する
際に、熱変形や熱収縮が起こり、寸法が著しく変化する
ため、前面ガラス基板と背面ガラス基板を対向させる
際、電極の位置合わせを精度よく実現することが難し
く、特に大型高精細のプラズマディスプレイ装置を作製
する上で困難を生じていた。[0003] However, soda-lime glass has a strain point of 50%.
When the heat treatment is performed at a temperature of 570 to 600 ° C., which is as low as about 0 ° C., thermal deformation and thermal shrinkage occur, and the dimensions are significantly changed. It is difficult to realize the plasma display device with high accuracy, and it has been particularly difficult to manufacture a large-sized, high-definition plasma display device.
【0004】また、ソーダ石灰ガラスは、150℃での
体積電気抵抗率(log ρ)が8.4Ω・cmと低
く、ガラス中のアルカリ成分の移動度が大きい。従っ
て、ガラス中のアルカリ成分がITO膜やネサ膜等の薄
膜電極と反応し、電極材料の電気抵抗値を変化させる問
題も有している。[0004] Soda lime glass has a low volume electrical resistivity (log ρ) at 150 ° C of 8.4 Ω · cm, and has a high mobility of alkali components in the glass. Therefore, there is also a problem that an alkali component in the glass reacts with a thin film electrode such as an ITO film or a Nesa film to change the electric resistance value of the electrode material.
【0005】これらの事情から、ガラス基板の熱変形、
熱収縮及び体積電気抵抗率の問題を解決するために、ソ
ーダ石灰ガラスと同等の熱膨張係数を有し、歪点及び体
積電気抵抗率の高いプラズマディスプレイ装置用ガラス
基板が提案されており、現在、これらのガラス基板が使
用され、大型高精細のプラズマディスプレイ装置が作製
されている。[0005] From these circumstances, thermal deformation of the glass substrate,
In order to solve the problems of heat shrinkage and volume resistivity, glass substrates for plasma display devices having a thermal expansion coefficient equivalent to that of soda-lime glass, a high strain point and a high volume resistivity have been proposed. Large and high-definition plasma display devices have been manufactured using these glass substrates.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、前記し
た従来の歪点、体積電気抵抗率の高いガラス基板は、プ
ラズマディスプレイ装置の製造工程において、ソーダ石
灰ガラスに比べて割れが生じやすい。そのため、装置の
歩留まりが低く、生産性向上を妨げる原因の一つとなっ
ている。従って、生産性向上のため、ガラス基板を割れ
にくくする必要がある。つまり、耐クラック性の高いガ
ラス基板が望まれている。However, the above-mentioned conventional glass substrate having a high strain point and high volume electrical resistivity is more likely to be cracked in the manufacturing process of the plasma display device than soda-lime glass. For this reason, the yield of the apparatus is low, which is one of the causes that hinders improvement in productivity. Therefore, in order to improve the productivity, it is necessary to make the glass substrate hard to break. That is, a glass substrate having high crack resistance is desired.
【0007】本発明の目的は、耐クラック性に優れ、5
70〜600℃の温度で熱処理しても熱変形や熱収縮が
起こらず、また、熱膨張係数が70〜90×10-7/
℃、体積電気抵抗率(log ρ)が10.5Ω・cm
以上の特性を有するフラットパネルディスプレイ装置用
ガラス基板を提供することである。[0007] An object of the present invention is to provide excellent crack resistance.
Even when heat-treated at a temperature of 70 to 600 ° C., no thermal deformation or thermal contraction occurs, and the coefficient of thermal expansion is 70 to 90 × 10 −7 /
° C, volume resistivity (log ρ) is 10.5Ω · cm
An object of the present invention is to provide a glass substrate for a flat panel display device having the above characteristics.
【0008】[0008]
【課題を解決するための手段】本発明者は、基礎ガラス
成分であるSiO2を種々の成分と置換する実験を行っ
た結果、アルカリ土類金属酸化物(MgO、CaO、S
rO、BaO)及びZrO2が下記の条件を満たせばガ
ラス基板の耐クラック性が向上することを見いだした。
アルカリ土類金属酸化物の総量を低く抑える。アル
カリ土類金属酸化物の中でも、特にCaOの含有量を低
くする。ZrO2の含有量を低く抑える。The present inventor conducted an experiment in which the basic glass component, SiO 2, was replaced with various components. As a result, alkaline earth metal oxides (MgO, CaO, S
It has been found that when rO, BaO) and ZrO 2 satisfy the following conditions, the crack resistance of the glass substrate is improved.
Keep the total amount of alkaline earth metal oxides low. Among the alkaline earth metal oxides, the content of CaO is particularly reduced. Keep the ZrO 2 content low.
【0009】ただし、これらの成分の含有量を低くしす
ぎると、歪点、体積電気抵抗率、溶融性及び成形性が著
しく悪化する。そこで本発明者は、アルカリ土類金属酸
化物及びZrO2の含有量を適切に設定することによ
り、上記した特性を維持しつつ、高い耐クラック性を有
するガラス基板が得られることを見いだし、本発明とし
て提案するものである。However, if the content of these components is too low, the strain point, the volume electrical resistivity, the melting property and the moldability are remarkably deteriorated. Therefore, the present inventor has found that by appropriately setting the contents of the alkaline earth metal oxide and ZrO 2 , a glass substrate having high crack resistance can be obtained while maintaining the above characteristics. It is proposed as an invention.
【0010】即ち、本発明のフラットパネルディスプレ
イ装置用ガラス基板は、質量百分率でSiO2 55〜
70%、Al2O3 5%超〜10%未満、MgO 0〜
7%、CaO 0〜10%、SrO 0〜9%未満、B
aO 0〜9%未満、Li2O 0〜1.5%、 Na2
O 0〜5%、K2O 5〜16%、ZrO2 0.3〜
5%、SrO+BaO 4〜9%未満、MgO+CaO
+SrO+BaO8〜17%未満、Li2O+Na2O+
K2O 6〜18%の組成を有し、かつCaO/MgO
の値が質量比で0.10〜1.48の範囲にあることを
特徴とする。That is, the glass substrate for a flat panel display device of the present invention has a SiO 2 content of 55
70%, Al 2 O 3 less than 5 percent to 10%, MgO 0 to
7%, CaO 0-10%, SrO 0-9%, B
aO 0 to less than 9%, Li 2 O 0 to 1.5%, Na 2
O 0-5%, K 2 O 5-16%, ZrO 2 0.3-
5%, SrO + BaO 4 to less than 9%, MgO + CaO
+ SrO + BaO 8 to less than 17%, Li 2 O + Na 2 O +
K 2 O having a composition of 6 to 18% and CaO / MgO
Is in the range of 0.10 to 1.48 by mass ratio.
【0011】[0011]
【作用】本発明のガラス基板において、各成分の割合を
上記のように限定した理由を以下に述べる。The reason why the proportion of each component in the glass substrate of the present invention is limited as described above will be described below.
【0012】SiO2は、ガラスのネットワークフォー
マーであるが、55%より少なくなるとガラスの歪点が
低くなり、熱変形や熱収縮が起こりやすくなる。一方、
70%より多くなるとガラスの熱膨張係数が小さくなり
すぎる。熱膨張係数が小さくなりすぎると絶縁(誘電
体)材料やリブ材料と熱膨張差が大きくなり、焼成時に
絶縁層やリブに割れや剥離が生じるため好ましくない。
なおSiO2の好ましい範囲は56〜68%である。[0012] SiO 2 is a glass network former, but if it is less than 55%, the strain point of the glass decreases, and thermal deformation and thermal shrinkage tend to occur. on the other hand,
If it exceeds 70%, the thermal expansion coefficient of the glass becomes too small. If the coefficient of thermal expansion is too small, the difference in thermal expansion between the insulating (dielectric) material and the rib material becomes large, and the insulating layer and the rib are undesirably cracked or peeled off during firing.
The preferred range of SiO 2 is 56 to 68%.
【0013】Al2O3は、ガラスの歪点を高める成分で
あるが、5%以下では前記効果が得られず、10%以上
になると体積電気抵抗が低下し、また溶融性が悪化する
ため好ましくない。なおAl2O3の好ましい範囲は5%
超〜9.5%である。さらに好ましくは5.1〜9%で
ある。Al 2 O 3 is a component that increases the strain point of glass. However, if the content is less than 5%, the above effect cannot be obtained. If the content is more than 10%, the volume electric resistance decreases and the meltability deteriorates. Not preferred. The preferred range of Al 2 O 3 is 5%.
Ultra-9.5%. More preferably, it is 5.1 to 9%.
【0014】MgOは、ガラスの熱膨張係数を制御した
り、ガラスの溶融性を高める成分であるが、7%より多
くなるとガラスが失透しやすくなり、成形が困難となる
ため好ましくない。MgOの好ましい範囲は1〜5%で
ある。MgO is a component that controls the coefficient of thermal expansion of the glass and enhances the melting property of the glass. However, if it exceeds 7%, the glass tends to be devitrified, and molding is difficult. The preferred range of MgO is 1-5%.
【0015】CaOは、ガラスの溶融性を高める成分で
あるが、10%より多くなるとガラスの耐クラック性が
著しく低下するため好ましくない。なおCaOの好まし
い範囲は1〜5%である。さらに好ましくは1〜4%で
ある。[0015] CaO is a component that enhances the melting property of the glass, but if it exceeds 10%, the crack resistance of the glass is significantly reduced, which is not preferable. The preferred range of CaO is 1 to 5%. More preferably, it is 1 to 4%.
【0016】またCaO/MgOの値が0.10未満で
は、高温粘性が高くなって溶融性が悪化し、また歪点が
低くなる。一方、この値が1.48を超えると、耐クラ
ック性が著しく悪化する。なおCaO/MgOの値の好
ましい範囲は0.20〜1.35である。On the other hand, if the value of CaO / MgO is less than 0.10, the viscosity at high temperature becomes high, the melting property is deteriorated, and the strain point is lowered. On the other hand, when this value exceeds 1.48, crack resistance is significantly deteriorated. A preferred range of the value of CaO / MgO is 0.20 to 1.35.
【0017】SrOは、ガラスの溶融性及び体積電気抵
抗率を高める成分であるが、8.5%以上、特に9%以
上になるとガラスが失透したり、ガラスの密度が上昇し
て基板の重量が重くなりすぎるため好ましくない。なお
SrOの好ましい範囲はBaOの含有量によって異な
り、BaOが5%超〜9%未満の場合に0〜3%であ
り、BaOが0〜3%の場合は6%超〜9%未満であ
る。SrO is a component that enhances the melting property and volume resistivity of glass. However, when the content is 8.5% or more, particularly 9% or more, the glass is devitrified or the density of the glass is increased to increase the density of the substrate. It is not preferable because the weight becomes too heavy. The preferred range of SrO varies depending on the content of BaO, and is 0 to 3% when BaO is more than 5% to less than 9%, and is more than 6% to less than 9% when BaO is 0 to 3%. .
【0018】BaOは、SrOと同様、ガラスの溶融性
及び体積電気抵抗率を高める成分であるが、8.5%以
上、特に9%以上になるとガラスが失透したり、ガラス
の密度が上昇して基板の重量が重くなりすぎるため好ま
しくない。なおBaOの好ましい範囲はSrOの含有量
によって異なり、SrOが6%超〜9%未満の場合に0
〜3%であり、SrOが0〜3%の場合は5%超〜9%
未満である。BaO, like SrO, is a component that enhances the melting property and volume resistivity of glass. However, when it is 8.5% or more, especially 9% or more, the glass is devitrified or the glass density is increased. As a result, the weight of the substrate becomes too heavy, which is not preferable. The preferable range of BaO varies depending on the content of SrO, and 0% when SrO is more than 6% to less than 9%.
33%, when SrO is 093%, more than 5 %% 9%
Is less than.
【0019】またSrOとBaOの合量が4%未満であ
ると電気抵抗が低下し、9%以上になるとクラック抵抗
が低下する。なおSrOとBaOの合量は5〜8%の範
囲が好ましい。If the total amount of SrO and BaO is less than 4%, the electric resistance decreases, and if it exceeds 9%, the crack resistance decreases. The total amount of SrO and BaO is preferably in the range of 5 to 8%.
【0020】またMgO、CaO、SrO及びBaOの
合量が8%より少なくなるとガラスの溶融性が低下し、
17%以上になるとガラス基板の耐クラック性が著しく
低下する。なおこれらの成分の合量は10〜16%であ
ることが好ましい。When the total amount of MgO, CaO, SrO and BaO is less than 8%, the melting property of the glass decreases,
If it exceeds 17%, the crack resistance of the glass substrate is significantly reduced. The total amount of these components is preferably 10 to 16%.
【0021】Li2Oは、ガラスの熱膨張係数を制御し
たり、ガラスの溶融性を高める成分であるが、1.5%
より多くなるとガラスの歪点が低下し、プラズマディス
プレイ装置を製造する際の熱処理工程で、熱変形や熱収
縮が起こりやすくなるため好ましくない。なおLi2O
の好ましい範囲は0〜1%である。Li 2 O is a component that controls the thermal expansion coefficient of glass and enhances the melting property of glass.
If the number is too large, the strain point of the glass is lowered, and heat deformation or heat shrinkage is likely to occur in a heat treatment step when manufacturing a plasma display device, which is not preferable. Li 2 O
Is preferably 0 to 1%.
【0022】Na2Oは、Li2Oと同様、ガラスの熱膨
張係数を制御したり、ガラスの溶融性を高める成分であ
るが、5%より多くなるとガラスの歪点が低下するため
好ましくない。なおNa2Oの好ましい範囲は0.5〜
5%である。さらに好ましくは1〜4%である。Na 2 O, like Li 2 O, is a component that controls the thermal expansion coefficient of the glass and enhances the melting property of the glass. However, if it exceeds 5%, the strain point of the glass decreases, which is not preferable. . The preferred range of Na 2 O is 0.5 to
5%. More preferably, it is 1 to 4%.
【0023】K2Oも、Li2O及びNa2Oと同様、ガ
ラスの熱膨張係数を制御したり、ガラスの溶融性を高め
る成分であるが、5%より少なくなると溶融性が損なわ
れる。一方、16%より多くなると歪点が低下するため
好ましくない。なおK2Oの好ましい範囲は6〜15%
である。K 2 O, like Li 2 O and Na 2 O, is a component that controls the coefficient of thermal expansion of the glass and enhances the melting property of the glass. However, if it is less than 5%, the melting property is impaired. On the other hand, if it exceeds 16%, the strain point decreases, which is not preferable. The preferred range of K 2 O is 6 to 15%.
It is.
【0024】またLi2O、Na2O及びK2Oの合量が
6%より少なくなると溶融性が低下し、18%より多く
なると歪点が低下するため好ましくない。また、ガラス
の体積電気抵抗率を高くするために、ガラス中にLi2
O、Na2O及びK2Oの内、2種以上のアルカリ金属酸
化物を含有させることが好ましい。なおこれらの成分の
合量は8〜17%の範囲にあることが好ましい。When the total amount of Li 2 O, Na 2 O and K 2 O is less than 6%, the meltability decreases, and when the total amount exceeds 18%, the strain point decreases, which is not preferable. Further, in order to increase the volume resistivity of the glass, Li 2 is contained in the glass.
It is preferable to contain two or more kinds of alkali metal oxides among O, Na 2 O and K 2 O. The total amount of these components is preferably in the range of 8 to 17%.
【0025】ZrO2は、ガラスの歪点を高める成分で
あるが、0.3%より少ないとその効果がなく、5%よ
り多くなるとガラスの耐クラック性が著しく低下するた
め好ましくない。なおZrO2の好ましい範囲は0.3
〜3%である。さらに好ましくは0.3〜1%である。ZrO 2 is a component that increases the strain point of the glass. However, if it is less than 0.3%, its effect is not obtained, and if it is more than 5%, the crack resistance of the glass is remarkably deteriorated, which is not preferable. The preferred range of ZrO 2 is 0.3
~ 3%. More preferably, it is 0.3 to 1%.
【0026】また本発明においては、上記成分以外にも
種々の成分を添加することができる。例えば紫外線によ
る着色を防止するためにTiO2を5%まで、耐クラッ
ク性を向上させるためにP2O5を4%まで添加すること
が可能である。更に、As2O3、Sb2O3、SO3、C
l等の清澄剤成分を合量で1%まで、Fe2O3、Co
O、NiO、Cr2O3、CeO2等の着色剤成分を各1
%まで添加することが可能である。In the present invention, various components can be added in addition to the above components. For example, it is possible to add TiO 2 up to 5% in order to prevent coloring by ultraviolet rays, and up to 4% P 2 O 5 in order to improve crack resistance. Further, As 2 O 3 , Sb 2 O 3 , SO 3 , C
l to 1% in total of Fe 2 O 3 , Co
O, NiO, Cr 2 O 3 , CeO 2, etc.
% Can be added.
【0027】以上の組成を有する本発明のガラス基板
は、板ガラスの成形方法として知られているフロート
法、フュージョン法、ロールアウト法等の方法によって
製造できる。The glass substrate of the present invention having the above composition can be manufactured by a method such as a float method, a fusion method, or a roll-out method, which is known as a method for forming a sheet glass.
【0028】[0028]
【実施例】以下、本発明を実施例に基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.
【0029】本発明の実施例(試料No.1〜8)を表
1、2に、比較例(試料No.9〜16)を表3,4に
示す。尚、試料No.16は、ソーダ石灰ガラスであ
る。Examples of the present invention (samples Nos. 1 to 8) are shown in Tables 1 and 2, and comparative examples (samples Nos. 9 to 16) are shown in Tables 3 and 4. In addition, sample No. 16 is a soda-lime glass.
【0030】[0030]
【表1】 [Table 1]
【0031】[0031]
【表2】 [Table 2]
【0032】[0032]
【表3】 [Table 3]
【0033】[0033]
【表4】 [Table 4]
【0034】表中の各試料は、次のようにして作製し
た。Each sample in the table was prepared as follows.
【0035】まず、表の組成となるようにガラス原料を
調合し、白金ポットで1450〜1600℃で4時間溶
融した。その後、溶融ガラスをカーボン板の上に流し出
して板状に成形し、徐冷後、板厚が2.8mmになるよ
うに両面研磨して、得られた板ガラスを200mm角の
大きさに切断加工することで試料ガラスを作製した。First, a glass raw material was prepared so as to have the composition shown in the table, and was melted in a platinum pot at 1450 to 1600 ° C. for 4 hours. Thereafter, the molten glass is poured out onto a carbon plate, formed into a plate shape, cooled slowly, and polished on both sides so that the plate thickness becomes 2.8 mm, and the obtained plate glass is cut into a size of 200 mm square. The sample glass was produced by processing.
【0036】このようして得られた各試料について、耐
クラック性、密度、歪点、熱膨張係数、体積電気抵抗率
を測定し、表に示した。The samples thus obtained were measured for crack resistance, density, strain point, coefficient of thermal expansion, and volume resistivity, and the results are shown in the table.
【0037】本発明におけるガラスの耐クラック性の評
価は、和田らが提案した方法(M.Wada et a
l. Proc., the Xth ICG, vo
l.11, Ceram. Soc., Japan,
Kyoto, 1974,p39)を用いた。この方
法は、ビッカース硬度計のステージに試料ガラスを置
き、試料ガラスの表面に菱形状のダイヤモンド圧子を種
々の荷重で15秒間押し付ける。そして、除荷後15秒
までに圧痕の四隅から発生するクラック数をカウント
し、最大発生しうるクラック数(4ヶ)に対する割合を
求め、クラック発生率とする。なおこの評価は、同一荷
重におけるクラック発生率を20回測定し、その平均値
をクラック発生率とする。このようにしてクラック発生
率が50%になるときの荷重を「クラック抵抗」とし、
この値を表に示した。クラック抵抗が大きいということ
は、高い荷重でもクラックが発生しにくい、つまり、耐
クラック性に優れているということである。なおクラッ
ク抵抗は湿度の影響を受けるため、測定は気温25℃、
湿度30%の条件で行った。In the present invention, the evaluation of the crack resistance of the glass is performed by the method proposed by Wada et al. (M. Wada et a).
l. Proc. , The Xth ICG, vo
l. 11, Ceram. Soc. , Japan,
(Kyoto, 1974, p39) was used. In this method, a sample glass is placed on a stage of a Vickers hardness tester, and a diamond-shaped diamond indenter is pressed against the surface of the sample glass with various loads for 15 seconds. Then, by 15 seconds after unloading, the number of cracks generated from the four corners of the indentation is counted, and the ratio to the maximum number of possible cracks (four) is determined to be the crack occurrence rate. In this evaluation, the crack occurrence rate under the same load was measured 20 times, and the average value was defined as the crack occurrence rate. In this way, the load at which the crack occurrence rate becomes 50% is referred to as "crack resistance",
This value is shown in the table. High crack resistance means that cracks are unlikely to occur even under a high load, that is, the crack resistance is excellent. Since the crack resistance is affected by humidity, the measurement was performed at a temperature of 25 ° C.
The test was performed under the condition of humidity of 30%.
【0038】密度については、周知のアルキメデス法
で、歪点については、ASTM C336−71に基づ
いて測定した。また、熱膨張係数については、ディラト
メーターで30〜380℃における平均熱膨張係数を、
体積電気抵抗率については、ASTM C657−78
に基づいて150℃における値を測定した。乳白の有無
については、ガラスの徐冷後に目視で観察した。The density was measured by the well-known Archimedes method, and the strain point was measured based on ASTM C336-71. For the coefficient of thermal expansion, the average coefficient of thermal expansion at 30 to 380 ° C.
ASTM C657-78 for volume resistivity
The value at 150 ° C. was measured based on. The presence or absence of milky white was visually observed after the glass was gradually cooled.
【0039】表から明らかなように、実施例である試料
No.1〜8の各試料については、ソーダ石灰ガラスと
同等以上である850mN以上のクラック抵抗を示して
おり、耐クラック性に優れている。また密度は2.56
g/cm3以下と低く、歪点は573℃以上、体積電気
抵抗率(log ρ)は10.9Ω・cm以上と高く、
熱膨張係数は79〜85×10-7/℃の範囲であった。As is clear from the table, the sample No. Each of the samples 1 to 8 has a crack resistance of 850 mN or more, which is equal to or more than that of soda-lime glass, and is excellent in crack resistance. The density is 2.56
g / cm 3 or less, the strain point is 573 ° C. or more, and the volume resistivity (log ρ) is as high as 10.9 Ω · cm or more.
The coefficient of thermal expansion was in the range of 79 to 85 × 10 −7 / ° C.
【0040】これに対して、比較例である試料No.9
は、Al2O3が5%以下であるために歪点が低かった。
試料No.10は、Al2O3が10%以上であるために
電気抵抗が低かった。試料No.11は、ZrO2が
0.3%未満であるために歪点が低かった。試料No.
12は、SrOとBaOの合量が4%未満であるために
電気抵抗が低かった。試料No.13は、SrOとBa
Oの合量が9%以上であるためにクラック抵抗が低かっ
た。試料No.14は、CaO/MgOの値が0.1未
満であるために歪点が低かった。試料No.15は、C
aO/MgOの値が1.48より大きいためにクラック
抵抗が低かった。On the other hand, the sample No. 9
Has a low strain point because Al 2 O 3 is 5% or less.
Sample No. In No. 10, the electric resistance was low because Al 2 O 3 was 10% or more. Sample No. Sample No. 11 had a low strain point because ZrO 2 was less than 0.3%. Sample No.
In No. 12, the electric resistance was low because the total amount of SrO and BaO was less than 4%. Sample No. 13 is SrO and Ba
Crack resistance was low because the total amount of O was 9% or more. Sample No. In No. 14, the strain point was low because the value of CaO / MgO was less than 0.1. Sample No. 15 is C
Since the value of aO / MgO was larger than 1.48, the crack resistance was low.
【0041】[0041]
【発明の効果】以上のように本発明のプラズマディスプ
レイ装置用ガラス基板は、優れた耐クラック性を有して
いる。また歪点が高いため570〜600℃の温度の熱
処理で熱変形や熱収縮を起こさない。しかも70〜90
×10-7/℃の熱膨張係数を有し、体積電気抵抗率も高
いため、フラットパネルディスプレイ装置、特にプラズ
マディスプレイ装置のガラス基板として好適である。As described above, the glass substrate for a plasma display device of the present invention has excellent crack resistance. In addition, since the strain point is high, thermal deformation or thermal shrinkage does not occur in a heat treatment at a temperature of 570 to 600 ° C. And 70-90
Since it has a coefficient of thermal expansion of × 10 -7 / ° C and a high volume resistivity, it is suitable as a glass substrate for flat panel display devices, particularly plasma display devices.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4G062 AA18 BB01 DA06 DB03 DC01 DD01 DE01 DF01 EA01 EA02 EA03 EB01 EB02 EB03 EC03 EC04 ED01 ED02 ED03 EE01 EE02 EE03 EF01 EF02 EF03 EG01 EG02 EG03 FA01 FB01 FC02 FC03 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM12 MM27 NN30 NN33 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4G062 AA18 BB01 DA06 DB03 DC01 DD01 DE01 DF01 EA01 EA02 EA03 EB01 EB02 EB03 EC03 EC04 ED01 ED02 ED03 EE01 EE02 EE03 EF01 EF02 EF03 EG01 FE01 FC01 FF02 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM12 MM27 NN30 NN33
Claims (3)
Al2O3 5%超〜10%未満、MgO 0〜7%、C
aO 0〜10%、SrO 0〜9%未満、BaO 0
〜9%未満、Li2O 0〜1.5%、 Na2O 0〜
5%、K2O5〜16%、ZrO2 0.3〜5%、Sr
O+BaO 4〜9%未満、MgO+CaO+SrO+
BaO 8〜17%未満、Li2O+Na2O+K2O
6〜18%の組成を有し、かつCaO/MgOの値が質
量比で0.10〜1.48の範囲にあることを特徴とす
るフラットパネルディスプレイ装置用ガラス基板。1 to 55 to 70% by weight of SiO 2 ,
Al 2 O 3 More than 5% to less than 10%, MgO 0 to 7%, C
aO 0 to 10%, SrO 0 to less than 9%, BaO 0
99%, Li 2 O 0-1.5%, Na 2 O 0-
5%, K 2 O5~16%, ZrO 2 0.3~5%, Sr
O + BaO 4 to less than 9%, MgO + CaO + SrO +
BaO less than 8~17%, Li 2 O + Na 2 O + K 2 O
A glass substrate for a flat panel display device, wherein the glass substrate has a composition of 6 to 18% and the value of CaO / MgO is in the range of 0.10 to 1.48 by mass ratio.
満、BaO 0〜3%であることを特徴とする請求項1
のフラットパネルディスプレイ装置用ガラス基板。2. The method according to claim 1, wherein SrO is more than 6% to less than 9% and BaO is 0 to 3% by mass percentage.
Glass substrates for flat panel display devices.
5%超〜9%未満であることを特徴とする請求項1の
フラットパネルディスプレイ装置用ガラス基板。3. SrO 0 to 3% by mass percentage, BaO
The glass substrate for a flat panel display device according to claim 1, wherein the glass substrate is more than 5% to less than 9%.
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JP2000060589A JP4389257B2 (en) | 2000-03-06 | 2000-03-06 | Glass substrate for flat panel display |
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JP2001247332A true JP2001247332A (en) | 2001-09-11 |
JP4389257B2 JP4389257B2 (en) | 2009-12-24 |
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Cited By (7)
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JP2003335547A (en) * | 2002-05-20 | 2003-11-25 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display equipment |
JP2004244257A (en) * | 2003-02-13 | 2004-09-02 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
JP2005162536A (en) * | 2003-12-03 | 2005-06-23 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
JP2017061408A (en) * | 2011-10-25 | 2017-03-30 | コーニング インコーポレイテッド | Glass compositions with improved chemical and mechanical durability |
CN107531549A (en) * | 2015-03-26 | 2018-01-02 | 皮尔金顿集团有限公司 | New glass |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003335547A (en) * | 2002-05-20 | 2003-11-25 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display equipment |
JP2004244257A (en) * | 2003-02-13 | 2004-09-02 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
JP2005162536A (en) * | 2003-12-03 | 2005-06-23 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display device |
US10196298B2 (en) | 2011-10-25 | 2019-02-05 | Corning Incorporated | Glass compositions with improved chemical and mechanical durability |
CN106746599A (en) * | 2011-10-25 | 2017-05-31 | 康宁股份有限公司 | Glass composition with the chemistry for improving and mechanical endurance |
JP2017061408A (en) * | 2011-10-25 | 2017-03-30 | コーニング インコーポレイテッド | Glass compositions with improved chemical and mechanical durability |
US10577274B2 (en) | 2011-10-25 | 2020-03-03 | Corning Incorporated | Alkaline earth alumino-silicate glass compositions with improved chemical and mechanical durability |
US10597322B2 (en) | 2011-10-25 | 2020-03-24 | Corning Incorporated | Glass compositions with improved chemical and mechanical durability |
JP2020125235A (en) * | 2011-10-25 | 2020-08-20 | コーニング インコーポレイテッド | Glass compositions with improved chemical and mechanical durability |
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