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JP2001015555A - Method for mounting bare ic chip - Google Patents

Method for mounting bare ic chip

Info

Publication number
JP2001015555A
JP2001015555A JP11186873A JP18687399A JP2001015555A JP 2001015555 A JP2001015555 A JP 2001015555A JP 11186873 A JP11186873 A JP 11186873A JP 18687399 A JP18687399 A JP 18687399A JP 2001015555 A JP2001015555 A JP 2001015555A
Authority
JP
Japan
Prior art keywords
chip
bare chip
circuit
base material
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11186873A
Other languages
Japanese (ja)
Inventor
Yasuhiro Endo
康博 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Edge Inc
Original Assignee
Toppan Forms Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Forms Co Ltd filed Critical Toppan Forms Co Ltd
Priority to JP11186873A priority Critical patent/JP2001015555A/en
Publication of JP2001015555A publication Critical patent/JP2001015555A/en
Pending legal-status Critical Current

Links

Landscapes

  • Wire Bonding (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To make simple the manufacturing process of mechanical equipment or a wiring board constituted by mounting a bare IC chip on a circuit, by emitting electromagnetic waves upon the bare IC chip from the side opposite to the arranging side of the chip while the chip is press-contacted with a base material. SOLUTION: A circuit 1 is formed on a base material 2, and an insulating adhering section 5 for the terminals 3 of a bare IC chip 3 is formed by printing an insulating adhesive substance B. Then terminal adhering sections 6 are formed in the circuit 1 so that the sections 6 may necessarily come into contact with the terminals 4 of the chip 3, by printing a conductive adhesive substance A until thicknesses of the sections 6 become thicker than that of the section 5. Thereafter, the chip 3 is placed on the base material 2 by aligning the chip 3 with the insulating adhering section 4 and terminal adhering sections 6 and press-contacted with the material 2. While the chip 3 is press-contacted with the material 3, electromagnetic waves are emitted upon the chip 3 from the side opposite to the arranging side of the chip 3. Thus, the chi 3 is mounted on the circuit 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は予め端子部分にバン
プを形成していないICベアチップでも回路基板などに
接続して、信頼性のある接続を行なえるようにしたIC
ベアチップの実装方法に関するものであり、例えば、非
接触ICタグのアンテナ形成を始めとするRF−ID
(Radio Frequency IDentifi
cation)用途機材、各種電気機器用のプリント配
線板などに利用することのできるICベアチップの実装
方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an IC which can be connected to a circuit board or the like even in the case of an IC bare chip in which bumps are not formed in the terminal portion in advance, so that reliable connection can be made.
The present invention relates to a method for mounting a bare chip, for example, RF-ID including formation of an antenna of a non-contact IC tag.
(Radio Frequency IDentifi
The present invention relates to a method of mounting an IC bare chip that can be used for equipment for use, printed wiring boards for various electric devices, and the like.

【0002】[0002]

【発明が解決しようとする課題】従来からICベアチッ
プを回路に実装する場合には、ICベアチップの端子部
分に予めバンプを形成しておく必要があって、前記バン
プを端子部分に有した状態でICベアチップを回路に実
装していた。このために工程が増えることにより加工コ
ストがかかること、およびバンプが安定に形成されてい
るかどうかによって回路接続の歩留まりが影響されるこ
となどの問題がある。また現在のバンプ形成法ではバン
プの高さや幅が必ずしも一定にならないために接続信頼
性を向上し難いという欠点があった。そこで、本発明は
ICベアチップを回路に実装するに際して予めバンプを
ICベアチップの端子部分に設けることなく回路に実装
できるようにすることを課題とし、ICベアチップを回
路に実装してなる機材や配線板の製造工程を簡単にして
コストを下げるようにすることを目的とする。
Conventionally, when mounting an IC bare chip on a circuit, it is necessary to previously form bumps on terminal portions of the IC bare chip. An IC bare chip was mounted on the circuit. For this reason, there are problems that processing costs are increased due to the increase in the number of steps, and that the yield of circuit connection is affected by whether or not the bumps are formed stably. In addition, the current bump formation method has a drawback that it is difficult to improve connection reliability because the height and width of the bump are not always constant. In view of the above, an object of the present invention is to make it possible to mount an IC bare chip on a circuit without previously providing bumps on a terminal portion of the IC bare chip when mounting the IC bare chip on the circuit. It is an object of the present invention to simplify the manufacturing process and reduce the cost.

【0003】[0003]

【課題を解決するための手段】本発明は上記課題を考慮
してなされたもので、予め回路が形成された基材上に、
ICベアチップの端子との接続部に導電性接着物質を印
刷法により塗布し、前記端子を前記導電性接着物質の塗
布部分に対応させてICベアチップを基材に配置し、該
ICベアチップの基材への圧着時にICベアチップの配
置側とは反対側から電磁波照射することを特徴とするI
Cベアチップの実装方法を提供して、上記課題を解消す
るものである。
SUMMARY OF THE INVENTION The present invention has been made in consideration of the above problems, and has been described in which a base material on which a circuit is formed in advance is provided.
A conductive adhesive substance is applied to a connection portion of the IC bare chip with a terminal by a printing method, and the terminal is arranged on the base material so that the terminal corresponds to the application part of the conductive adhesive substance, and the base material of the IC bare chip is provided. The electromagnetic wave is irradiated from the side opposite to the side on which the IC bare chip is arranged at the time of crimping to the IC.
An object of the present invention is to provide a method for mounting a C bare chip to solve the above-mentioned problem.

【0004】[0004]

【発明の実施の形態】つぎに本発明を実施の形態に基づ
いて詳細に説明する。即ち、本発明は、ICベアチップ
が基材上で配置されることになる実装位置中について、
回路を形成した基材上に、ICベアチップの端子と対応
する回路端子部分には導電性を有する接着物質(A)
を、ICベアチップの端子のない部分に対応する部分に
は絶縁性を有する接着物質(B)をそれぞれ印刷で形成
し、その上からICベアチップを圧着しながら基材裏面
から電磁波照射することで接着し、ICベアチップの位
置固定と接続信頼性を得るようにするものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail based on embodiments. That is, the present invention relates to a mounting position where an IC bare chip is to be arranged on a substrate,
On the substrate on which the circuit is formed, on the circuit terminal portion corresponding to the terminal of the IC bare chip, a conductive adhesive material (A)
Is formed by printing an adhesive material (B) having an insulating property on a portion corresponding to a portion of the IC bare chip having no terminal, and applying an electromagnetic wave from the back surface of the base material while pressing the IC bare chip from above. Then, the position of the IC bare chip is fixed and the connection reliability is obtained.

【0005】まず、基材としては、ガラス繊維、アルミ
ナ繊維、ポリエステル繊維、ポリアミド繊維等の無機ま
たは有機繊維からなる織布、不織布、マット、紙あるい
はこれらを組み合わせたもの、あるいはこれらに樹脂ワ
ニスを含浸させて成形した複合基材、ポリアミド系樹脂
基材、ポリエステル系樹脂基材、ポリプロピレン系樹脂
基材、ポリイミド系樹脂基材、エチレン・ビニルアルコ
ール共重合体基材、ポリビニルアルコール系樹脂基材、
ポリ塩化ビニル系樹脂基材、ポリ塩化ビニリデン系樹脂
基材、ポリスチレン系樹脂基材、ポリカーボネート系樹
脂基材、アクリロニトリルブタジエンスチレン共重合系
樹脂基材、ポリエーテルスルホン系樹脂基材などのプラ
スチック基材、あるいはこれらにコロナ放電処理、プラ
ズマ処理、紫外線照射処理、電子線照射処理、フレーム
プラズマ処理およびオゾン処理などの表面処理を施した
もの、などの公知のものを用いることが出来る。基材上
の回路形成については、金属エッチング、金属巻線溶
着、金属蒸着膜転写、金属薄膜テープ貼付、導電性ペー
スト印刷などの公知の方法で行うことが出来る。
[0005] First, as a base material, a woven fabric, a nonwoven fabric, a mat, a paper made of inorganic or organic fibers such as glass fiber, alumina fiber, polyester fiber, polyamide fiber or the like, or a combination thereof, or a resin varnish is used. Impregnated and molded composite substrate, polyamide resin substrate, polyester resin substrate, polypropylene resin substrate, polyimide resin substrate, ethylene vinyl alcohol copolymer substrate, polyvinyl alcohol resin substrate,
Plastic substrates such as polyvinyl chloride-based resin substrates, polyvinylidene chloride-based resin substrates, polystyrene-based resin substrates, polycarbonate-based resin substrates, acrylonitrile-butadiene-styrene copolymer-based resin substrates, and polyethersulfone-based resin substrates Alternatively, known materials such as those subjected to surface treatment such as corona discharge treatment, plasma treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, flame plasma treatment, and ozone treatment can be used. The circuit formation on the substrate can be performed by a known method such as metal etching, metal winding welding, metal vapor deposition film transfer, metal thin film tape sticking, and conductive paste printing.

【0006】本発明の方法において用いる導電性接着物
質(A)、絶縁性接着物質(B)は、圧着時に揮発成分
がほとんど出ないもので、熱処理後にICベアチップと
の接着性がよく発現し、実装後の信頼性、例えば、耐衝
撃性、耐水性、耐湿性、耐熱性などを保持するものから
選択する。形態保持の点からは架橋構造を有しているも
の、または熱処理により架橋構造を形成するものが好ま
しい。上記導電性接着物質(A)は、ICベアチップの
端子との導電接続性を保証するものであるから、導電性
粒子とバインダーとなる樹脂を必須成分として含み、か
つ基材上の回路とICベアチップの端子の金属との接着
性が共に強い導電ペーストを用いることが好ましい。導
電性粒子としては、金属粉末、とりわけ銀粉末が代表的
である。銀以外の導電性金属、たとえば金、白金、銅、
ニッケル、コバルト、パラジウム、ロジウムなどを用い
てもよい。上記絶縁性接着物質(B)は、接着によるI
Cベアチップの位置固定と、導電接続部同士の短絡を防
ぎ、さらに外的衝撃から導電接続部の保護という働きを
もつために、金属、基材、基材上の回路部いずれにも接
着性が高く、絶縁性に優れ、しかも熱衝撃や物理衝撃な
どからくる応力ひずみが吸収できるような樹脂を含むこ
とが好ましい。樹脂単独で絶縁が達成されにくい場合に
は、絶縁性フィラー、例えばシリカ、アルミナ、ガラ
ス、タルク、ゴムなどを添加してもよい。
[0006] The conductive adhesive material (A) and the insulating adhesive material (B) used in the method of the present invention hardly emit volatile components at the time of pressing, and exhibit good adhesion to the IC bare chip after heat treatment. It is selected from those that maintain reliability after mounting, for example, impact resistance, water resistance, moisture resistance, heat resistance, and the like. From the viewpoint of shape retention, those having a crosslinked structure or those forming a crosslinked structure by heat treatment are preferred. Since the conductive adhesive substance (A) assures conductive connectivity with the terminals of the IC bare chip, the conductive adhesive substance (A) contains conductive particles and a resin serving as a binder as essential components. It is preferable to use a conductive paste that has both strong adhesion to the metal of the terminal. A typical example of the conductive particles is a metal powder, especially a silver powder. Conductive metals other than silver, such as gold, platinum, copper,
Nickel, cobalt, palladium, rhodium, or the like may be used. The insulating adhesive substance (B) is formed by bonding
It has the function of fixing the position of the C bare chip, preventing short-circuiting between the conductive connection parts, and protecting the conductive connection parts from external impact. It is preferable to include a resin that is high, has excellent insulation properties, and can absorb stress and strain caused by thermal shock and physical shock. When insulation is not easily achieved by the resin alone, an insulating filler such as silica, alumina, glass, talc, rubber, and the like may be added.

【0007】導電性接着物質(A)、あるいは絶縁性接
着物質(B)の必須成分となる樹脂は、公知の熱可塑性
樹脂あるいは架橋性樹脂、またその両方を用いることが
できる。熱可塑性樹脂は、例示すれば、ポリエチレン、
ポリプロピレン、ポリスチレン、ABS樹脂、ポリメタ
クリル酸メチル、ポリ塩化ビニル、ポリ塩化ビニリデ
ン、ポリ酢酸ビニル、ポリビニルアルコール、ポリアセ
タール、ポリカーボネート、ホリエステル、ポリフェニ
レンオキサイド、ポリスルフォン、ポリイミド、ポリエ
ーテルスルフォン、ポリアリレート、ポリエーテルエー
テルケトン、ホリ4フッ化エチレン、シリコーン樹脂な
どが挙げられ、一種または二種以上の組み合わせも可能
であるがこれらに限定されない。
As a resin which is an essential component of the conductive adhesive substance (A) or the insulating adhesive substance (B), a known thermoplastic resin or cross-linkable resin, or both can be used. Thermoplastic resin, for example, polyethylene,
Polypropylene, polystyrene, ABS resin, polymethyl methacrylate, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, polyvinyl alcohol, polyacetal, polycarbonate, polyester, polyphenylene oxide, polysulfone, polyimide, polyethersulfone, polyarylate, poly Examples thereof include ether ether ketone, polytetrafluoroethylene, and silicone resin, and one kind or a combination of two or more kinds is also possible, but not limited thereto.

【0008】架橋性樹脂組成物は、硬化時に揮発成分を
発生しない反応をするものから選ばれ、例示すれば、 (1)ビスフェノールAやビスフェノールFのグリシジ
ル化物や、3,4−エポキシシクロヘキシルメチル−
3,4−エポキシシクロへキシルカルボキシレートに代
表される液状エポキシ樹脂と、アミノ化合物、フェノー
ル化合物、酸無水物化合物、有機酸化合物あるいはオニ
ウム塩化合物 (2)1,1−ビス(4−シアナートフェニル)エタン
に代表される液状シアン酸エステル樹脂と、金属塩触媒 (3)ビスマレイミド類またはビスマレイミド類とジア
ミン化合物との付加重合物と、アミノ化合物、アリル化
合物あるいはラジカル発生剤 (4)ジアリルフタレートに代表される液状アリル化合
物と、アミノ化合物あるいはラジカル発生剤 (5)トリアリルイソシアヌレートあるいはトリアリル
シアヌレートと、アミノ化合物あるいは過酸化物 (6)ポリエチレングリコール、ヘキサメチレングリコ
ール、グリセリンに代表される多価活性水素化合物と、
イソシアネート化合物 (7)ポリエチレングリコールジアクリレート、トリメ
チロールプロパンアルキレンオキシド変性トリアクリレ
ートなどに代表される、液状アクリレート化合物と、ラ
ジカル発生剤 (8)ビニル基含有液状ポリオレフィンと、ラジカル発
生剤 (9)ビニルシラン化合物とSiH基を有する化合物
と、白金触媒等の熱硬化性樹脂組成物、あるいは、光輻
射によりフリーラジカル活性種あるいはカチオン活性種
を発生させる光開始剤(例えばフリーラジカル活性種を
発生するものとしては、ベンゾフェノン誘導体、チオキ
サントン誘導体、アントラキノン誘導体、トリクロロメ
チルトリアジン誘導体、アシルホスフィンオキサイド誘
導体、α−ヒドロキシケトン誘導件、α−アミノケトン
誘導体、ペンゾイン誘導体、ペンジルケタール誘導体、
アクリジン誘導体、カルバゾール・フェノン誘導体、あ
るいはそれらの組み合わせが好ましく、カチオン活性種
を発生するものとしては、芳香族スルホニウム塩化合
物、芳香族ヨードニウム塩化合物あるいはそれらの組み
合わせが好ましい。)と、それらの活性種と反応する官
能基を有する光反応性樹脂(例えばフリーラジカル種で
反応するものとしては、アクリレート化合物およびメタ
クリレート化合物が好ましく、カチオン活性種で反応す
るものとしては、脂環式エポキシ化合物、オキセタン化
合物、アルケンオキシド化合物、グリシジルエーテル化
合物、ビニルエーテル化合物が好ましい。また、いずれ
の場合にも2種以上を混合して用いてもよい。)とを、
配合した光硬化性樹脂組成物を用いることが出来る。
The crosslinkable resin composition is selected from those which react so as not to generate volatile components during curing. Examples thereof include: (1) a glycidylated product of bisphenol A or bisphenol F, or 3,4-epoxycyclohexylmethyl-
Liquid epoxy resin represented by 3,4-epoxycyclohexylcarboxylate, amino compound, phenol compound, acid anhydride compound, organic acid compound or onium salt compound (2) 1,1-bis (4-cyanate (3) a bismaleimide or an addition polymer of bismaleimide and a diamine compound, an amino compound, an allyl compound or a radical generator (4) diallyl Liquid allyl compound represented by phthalate, amino compound or radical generator (5) triallyl isocyanurate or triallyl cyanurate, amino compound or peroxide (6) Polyethylene glycol, hexamethylene glycol, glycerin Polyvalent active hydrogen And compounds,
Isocyanate compound (7) Liquid acrylate compound represented by polyethylene glycol diacrylate, trimethylolpropane alkylene oxide-modified triacrylate, etc., radical generator (8) Vinyl group-containing liquid polyolefin, and radical generator (9) Vinyl silane compound And a compound having a SiH group, and a thermosetting resin composition such as a platinum catalyst, or a photoinitiator that generates free radical active species or cation active species by light radiation (for example, those that generate free radical active species include: Benzophenone derivative, thioxanthone derivative, anthraquinone derivative, trichloromethyltriazine derivative, acylphosphine oxide derivative, α-hydroxyketone derivative, α-aminoketone derivative, benzoin derivative, pendiyne Luketal derivatives,
An acridine derivative, a carbazole-phenone derivative, or a combination thereof is preferable, and an aromatic sulfonium salt compound, an aromatic iodonium salt compound, or a combination thereof is preferable as a compound generating a cationic active species. ) And a photoreactive resin having a functional group that reacts with those active species (for example, an acrylate compound and a methacrylate compound are preferable as those reacting with a free radical species, and an alicyclic compound is preferable as a compound reacting with a cationic active species). Formula epoxy compounds, oxetane compounds, alkene oxide compounds, glycidyl ether compounds, and vinyl ether compounds are preferable. In any case, two or more of them may be used in combination.)
The compounded photocurable resin composition can be used.

【0009】導電性接着物質(A)、絶縁性接着物質
(B)は、ICベアチップの圧着の前に除くことが可能
ならば、溶剤を含んでいてもよい。添加溶剤は、公知の
ものが使用可能である。ただし硬化反応の後に系内への
残存を避けるため、沸点は250℃以下が好ましい。例
えば、トルエン、シクロへキサン、メチルシクロヘキサ
ン、n−ヘキサン、ペンタンなどの炭化水素溶媒、イソ
プロピルアルコール、ブチルアルコールなどのアルコー
ル類、シクロへキサノン、メチルエチルケトン、メチル
イソブチルケトン、ジエチルケトン、イソホロンなどの
ケトン類、酢酸エチル、酢酸プロピル、酢酸ブチルなど
のエステル類、エチレングリコールモノメチルエーテ
ル、プロピレングリコールモノエチルエーテル、ジエチ
レングリコールモノメチルエーテル、3−メトキシ−3
−メチルブチルアセテートなどのグリコールモノエーテ
ル類およびそれらのアセテート化物、さらに以上挙げた
溶剤の一種ないしは二種以上の混合系が用いられる。
The conductive adhesive substance (A) and the insulating adhesive substance (B) may contain a solvent if it can be removed before the IC bare chip is pressed. Known additives can be used as the additive solvent. However, the boiling point is preferably 250 ° C. or lower to avoid remaining in the system after the curing reaction. For example, hydrocarbon solvents such as toluene, cyclohexane, methylcyclohexane, n-hexane, and pentane; alcohols such as isopropyl alcohol and butyl alcohol; ketones such as cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, diethyl ketone, and isophorone. , Ethyl acetate, propyl acetate, esters such as butyl acetate, ethylene glycol monomethyl ether, propylene glycol monoethyl ether, diethylene glycol monomethyl ether, 3-methoxy-3
Glycol monoethers such as -methylbutyl acetate and acetates thereof, and one or more of the above-mentioned solvents are used as a mixed system.

【0010】また、あらかじめICベアチップを搭載す
る前に、加熱、電磁波照射あるいは電子線照射などによ
り半硬化の状態にして置いてもよい。さらに、離型剤、
表面処理剤、充填剤、顔料、染料等の公知の添加剤を加
えても良い。離型剤としてはワックス類、ステアリン酸
亜鉛等を、表面処理剤としてはシランカップリング剤を
挙げることができる。充填剤としてはシリカ、アルミ
ナ、タルク、クレー等を挙げることが出来る。
Further, before mounting the IC bare chip, it may be placed in a semi-cured state by heating, electromagnetic wave irradiation, electron beam irradiation, or the like. In addition, release agents,
Known additives such as a surface treatment agent, a filler, a pigment, and a dye may be added. Examples of the release agent include waxes and zinc stearate, and examples of the surface treatment agent include a silane coupling agent. Examples of the filler include silica, alumina, talc, clay and the like.

【0011】導電性接着物質(A)、絶縁性接着物質
(B)は、それぞれの各成分を混合することにより、均
一化したワニスの形態のもの、あるいはニーダー、3本
ロールなどの公知な適当な方法で混練して均一分散せし
めたものとして得られ、印刷時に基材が劣化しない温度
範囲で粘稠な液状であるように調整する。これを、印刷
法で回路形成後の基材上に塗工する。印刷法は公知の方
法で行われるが、スクリーン印刷法が特に望ましい。ま
た、これらの接着物質(A)、(B)は、チップ実装時
の最終的な圧着条件、望ましくは0.1〜30秒の時間
範囲内に0.1〜0.5MPaの圧力範囲内で、電磁波
をICベアチップ実装基材面の裏側から照射することに
よりICベアチップ接続を固定化するように反応性を調
整する。
The conductive adhesive material (A) and the insulating adhesive material (B) may be in the form of a uniform varnish by mixing the respective components, or may be a known suitable material such as a kneader or a three-roll. It is obtained by kneading and uniformly dispersing by a suitable method, and is adjusted to be a viscous liquid in a temperature range in which the base material does not deteriorate during printing. This is applied on the substrate after circuit formation by a printing method. The printing method is performed by a known method, and a screen printing method is particularly desirable. Further, these adhesive substances (A) and (B) are used under the final crimping condition at the time of chip mounting, preferably within a time range of 0.1 to 30 seconds and within a pressure range of 0.1 to 0.5 MPa. The reactivity is adjusted so that the connection of the IC bare chip is fixed by irradiating an electromagnetic wave from the back side of the IC bare chip mounting substrate surface.

【0012】つぎに実装方法の一例を具体的に図を用い
て説明する。まず、表面に回路1を形成した基材2にお
けるICベアチップ3の実装位置A中に対して以下、
(イ)(ロ)(ハ)(ニ)(ホ)を行なう。 (イ)回路1を基材2に形成する(図1(イ))。 (ロ)ICベアチップ3の端子4(ここでは二ヶ所)が
当たる部分を除いて上記絶縁性接着物質(B)を用いて
絶縁接着部5を印刷法により塗布形成する(図1
(ロ))。この絶縁接着部5に対してはつぎの工程に移
る前に、加熱、電磁波照射あるいは電子線照射などの処
理を行ってもよいし、そのまま次工程に移ってもよい。 (ハ)ICベアチップ3の端子4に必ず当たるように導
電性接着物質(A)を用いて端子接着部6を印刷法によ
り上記回路1に対して上記絶縁接着部5より厚肉にして
塗布形成する(図1(ハ))。前記端子接着部6に対し
てはつぎの工程に移る前に、加熱、電磁波照射あるいは
電子線照射などの処理を行ってもよいし、そのまま次工
程に移ってもよい。いずれにしてもつぎの工程に進む前
に揮発成分が極力除かれていなければならない。 (ニ)ICベアチップ3を上記(ロ)(ハ)で塗布形成
した絶縁接着部5、端子接着部6の位置に合わせて適当
な方法で置く(図1(ニ))。 (ホ)適当な装置を用いてICベアチップ3を圧着Bす
る(図1(ホ))。望ましくは上記接着部5、6が0.
1〜0.5MPaの圧力範囲内に収まる条件で行う。こ
の際に同時に基材2の裏面から電磁波照射Cを行う。圧
着の後さらに反応を完結させるために、加熱、あるいは
電磁波照射による後硬化を行ってもよい。 以上によりICベアチップ3の実装が完了される。な
お、ICベアチップ3の実装部を保護するために、本発
明の実装後に、実装部全体あるいは一部をポッティング
材やコーティング材などで被覆してもよい。
Next, an example of a mounting method will be specifically described with reference to the drawings. First, with respect to the mounting position A of the IC bare chip 3 on the substrate 2 on which the circuit 1 is formed on the surface,
Perform (a), (b), (c), (d), and (e). (A) A circuit 1 is formed on a substrate 2 (FIG. 1 (A)). (B) Except for the portion where the terminals 4 (here, two places) of the IC bare chip 3 are applied, the insulating adhesive portion 5 is applied and formed by printing using the insulating adhesive material (B) (FIG. 1).
(B)). Before moving to the next step, treatment such as heating, electromagnetic wave irradiation, or electron beam irradiation may be performed on the insulating bonding portion 5, or the processing may be moved to the next step as it is. (C) The terminal bonding portion 6 is formed to be thicker than the insulating bonding portion 5 on the circuit 1 by a printing method using a conductive bonding material (A) so that the terminal bonding portion 6 always touches the terminal 4 of the IC bare chip 3. (FIG. 1C). Before moving to the next step, the terminal bonding portion 6 may be subjected to processing such as heating, electromagnetic wave irradiation, or electron beam irradiation, or may be moved to the next step as it is. In any case, volatile components must be removed as much as possible before proceeding to the next step. (D) The IC bare chip 3 is placed by an appropriate method in accordance with the positions of the insulating bonding portion 5 and the terminal bonding portion 6 applied and formed in (b) and (c) above (FIG. 1 (d)). (E) The IC bare chip 3 is crimped B using an appropriate device (FIG. 1 (e)). Desirably, the bonding parts 5 and 6 are set to 0.
This is performed under the condition that the pressure falls within a range of 1 to 0.5 MPa. At this time, the electromagnetic wave irradiation C is simultaneously performed from the back surface of the substrate 2. After the pressure bonding, post-curing by heating or irradiation with electromagnetic waves may be performed to further complete the reaction. Thus, the mounting of the IC bare chip 3 is completed. In addition, in order to protect the mounting portion of the IC bare chip 3, after mounting according to the present invention, the whole or a part of the mounting portion may be covered with a potting material, a coating material, or the like.

【0013】上記ICベアチップの実装の際に用いる電
磁波は、マイクロ波から、赤外線、可視光、紫外光、真
空紫外線、X線に至る、波長にして1〜10-12 mの範
囲内で任意に用いることが出来る。マイクロ波で適切な
共振周波数を用いれば選択的に接着性物質の硬化をする
ことが可能であるし、赤外線は密度の低い基材を透過し
て接着部を加温することにより接着性物質が熱可塑性樹
脂であっても熱硬化性樹脂であっても適用できる。さら
に可視部、紫外部の光を一部透過する基析、例えばポリ
オレフィン、ポリエチレンテレフタレート、ポリブチレ
ンテレフタレート、ポリメタクリル酸エステル、ポリカ
ーボネート、ポリエーテルスルフォンなどの基材に関し
ては、透過光により接着部を光架橋して固定化すること
が出来る。さらにエネルギーの高い電磁波であれば基材
を貫通して接着性物質に作用を及ぼして接着することが
可能となる。
The electromagnetic wave used for mounting the IC bare chip may range from microwaves to infrared light, visible light, ultraviolet light, vacuum ultraviolet light, and X-rays, and may have any wavelength within a range of 1 to 10 -12 m. Can be used. Using an appropriate resonance frequency with microwaves can selectively cure the adhesive, and the infrared can penetrate through the low-density substrate and heat the adhesive to form the adhesive. The present invention can be applied to both a thermoplastic resin and a thermosetting resin. Further, the visible part, a base that partially transmits ultraviolet light, for example, for a base material such as polyolefin, polyethylene terephthalate, polybutylene terephthalate, polymethacrylate, polycarbonate, and polyether sulfone, the bonded part is illuminated by transmitted light. It can be fixed by crosslinking. Further, electromagnetic waves having higher energy can penetrate through the base material and exert an effect on the adhesive substance to be bonded.

【0014】[0014]

【発明の効果】以上説明したように本発明のICベアチ
ップの実装方法によれば、予め回路が形成された基材上
に、ICベアチップの端子との接続部に導電性接着物質
を印刷法により塗布し、前記端子を前記導電性接着物質
の塗布部分に対応させてICベアチップを基材に配置
し、該ICベアチップの基材への圧着時にICベアチッ
プの配置側とは反対側から電磁波照射することを特徴と
するものである。これによって、従来ICベアチップを
基材上の回路に実装する上で必須とされていたICベア
チップへのバンプ形成が不要になり、このICベアチッ
プを回路に実装した機材や配線板の製造工程を簡素化で
きる。また、印刷法によりICベアチップと基材との間
での端子接続部分を形成でき、それぞれがチップとの接
続と、位置固定および応力緩和の役割を果たすようにな
るため、アンダーフィル材を改めて使用する必要が無く
なる。さらにICベアチップに対してバンプを形成する
工程を省くため、ICベアチップ実装の時間効率を高め
ることが出来る。そして、圧着して実装側とは反対側か
ら電磁波照射することで、ICベアチップと基材との間
の樹脂に高効率にエネルギーを加えることが可能となる
ためにさらに実装効率を向上させるようになるなど、実
用性に優れた効果を奏するものである。
As described above, according to the method for mounting an IC bare chip of the present invention, a conductive adhesive substance is printed on a base material on which a circuit is formed in advance at a connection portion with a terminal of the IC bare chip by a printing method. Applying, the terminals are arranged on the base material in correspondence with the application portions of the conductive adhesive material, and when the IC bare chips are pressed on the base material, electromagnetic waves are irradiated from the side opposite to the side on which the IC bare chips are arranged. It is characterized by the following. This eliminates the need to form bumps on the IC bare chip, which has been required for mounting the IC bare chip on the circuit on the base material, and simplifies the process of manufacturing equipment and wiring boards on which the IC bare chip is mounted on the circuit. Can be In addition, the terminal connection between the IC bare chip and the substrate can be formed by the printing method, and each plays a role of connection with the chip, fixing position and relaxing stress, so underfill material is used again There is no need to do it. Further, since the step of forming bumps on the IC bare chip is omitted, the time efficiency of mounting the IC bare chip can be improved. Then, by applying pressure and irradiating electromagnetic waves from the side opposite to the mounting side, it is possible to apply energy to the resin between the IC bare chip and the base material with high efficiency, so that the mounting efficiency is further improved. It has an effect that is excellent in practicality.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るICベアチップの実装方法の一例
を示す説明図である。
FIG. 1 is an explanatory diagram showing an example of a method for mounting an IC bare chip according to the present invention.

【符号の説明】[Explanation of symbols]

1…回路 2…基材 3…ICベアチップ 4…端子 5…絶縁接着部 6…端子接着部 A…実装位置 B…圧着 C…電磁波照射 DESCRIPTION OF SYMBOLS 1 ... Circuit 2 ... Base material 3 ... IC bare chip 4 ... Terminal 5 ... Insulation bonding part 6 ... Terminal bonding part A ... Mounting position B ... Crimping C ... Electromagnetic radiation

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】予め回路が形成された基材上に、ICベア
チップの端子との接続部に導電性接着物質を印刷法によ
り塗布し、前記端子を前記導電性接着物質の塗布部分に
対応させてICベアチップを基材に配置し、該ICベア
チップの基材への圧着時にICベアチップの配置側とは
反対側から電磁波照射することを特徴とするICベアチ
ップの実装方法。
1. A method according to claim 1, wherein a conductive adhesive substance is applied to a connection portion of the IC bare chip with a terminal on a substrate on which a circuit is formed in advance by a printing method, and the terminal is made to correspond to a portion to which the conductive adhesive substance is applied. A method for mounting an IC bare chip, comprising: arranging an IC bare chip on a base material, and irradiating an electromagnetic wave from a side opposite to a side on which the IC bare chip is arranged when the IC bare chip is pressed onto the base material.
JP11186873A 1999-06-30 1999-06-30 Method for mounting bare ic chip Pending JP2001015555A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11186873A JP2001015555A (en) 1999-06-30 1999-06-30 Method for mounting bare ic chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11186873A JP2001015555A (en) 1999-06-30 1999-06-30 Method for mounting bare ic chip

Publications (1)

Publication Number Publication Date
JP2001015555A true JP2001015555A (en) 2001-01-19

Family

ID=16196181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11186873A Pending JP2001015555A (en) 1999-06-30 1999-06-30 Method for mounting bare ic chip

Country Status (1)

Country Link
JP (1) JP2001015555A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006526892A (en) * 2003-06-04 2006-11-24 ユーピーエム ラフセック オサケ ユキチュア Method of forming the joint
JP2006332293A (en) * 2005-05-25 2006-12-07 Konica Minolta Holdings Inc Joining method of wiring board and electrode component, and manufacturing method of ink jet head
CN108172552A (en) * 2018-01-09 2018-06-15 木林森股份有限公司 A kind of encapsulating structure and its packaging method of stent-type electronic tag

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006526892A (en) * 2003-06-04 2006-11-24 ユーピーエム ラフセック オサケ ユキチュア Method of forming the joint
JP2006332293A (en) * 2005-05-25 2006-12-07 Konica Minolta Holdings Inc Joining method of wiring board and electrode component, and manufacturing method of ink jet head
CN108172552A (en) * 2018-01-09 2018-06-15 木林森股份有限公司 A kind of encapsulating structure and its packaging method of stent-type electronic tag

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