JP2000090868A - Optical lens barrel and cleaning method thereof - Google Patents
Optical lens barrel and cleaning method thereofInfo
- Publication number
- JP2000090868A JP2000090868A JP10280495A JP28049598A JP2000090868A JP 2000090868 A JP2000090868 A JP 2000090868A JP 10280495 A JP10280495 A JP 10280495A JP 28049598 A JP28049598 A JP 28049598A JP 2000090868 A JP2000090868 A JP 2000090868A
- Authority
- JP
- Japan
- Prior art keywords
- lens barrel
- radicals
- optical
- radical
- sample chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、電子線縮小転写装
置等で鏡筒内部がコンタミネーションによって汚れ、ビ
ーム不安定が生じるのを防止する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for preventing the inside of a lens barrel from being contaminated by contamination and causing beam instability in an electron beam reduction transfer apparatus or the like.
【０００２】[0002]
【従来の技術】従来、光学鏡筒内のコンタミネーション
に起因するchargingを防止する方法として、次の４つの
方法が行われている。 （１）鏡筒を分解し、汚れた部分を研磨剤を用いて磨
き、再組立てを行う。 （２）鏡筒内部に酸化性ガスを流した状態で荷電粒子線
を汚れた部分に照射し、鏡筒を分解しないでクリーニン
グを行う。 （３）鏡筒内部に酸化性ガスを導入し、アースに対して
絶縁された金属部品とアース間に高周波電圧を印加し、
内部で放電を起こしてプラズマを作り、酸素プラズマで
汚れを分解除去する。 （４）鏡筒にラジカルを流す導入口と、反応生成物を排
気する排気口とを設け、鏡筒外部で放電を起こし、酸素
ラジカル鏡筒内部に流して汚れを除去する。 これらの方法は、特開平６３−３０８８５６号等に公開
されている。2. Description of the Related Art Conventionally, the following four methods have been used to prevent charging caused by contamination in an optical lens barrel. (1) The lens barrel is disassembled, and the dirty portion is polished with an abrasive, and reassembled. (2) A charged particle beam is irradiated to a contaminated portion while an oxidizing gas is flowing inside the lens barrel, and cleaning is performed without disassembling the lens barrel. (3) An oxidizing gas is introduced into the lens barrel, and a high-frequency voltage is applied between the metal part insulated from the ground and the ground,
Discharge is generated inside to create plasma, and dirt is decomposed and removed with oxygen plasma. (4) An introduction port for flowing radicals into the lens barrel and an exhaust port for exhausting reaction products are provided to cause discharge outside the lens barrel and to flow inside the oxygen radical lens barrel to remove dirt. These methods are disclosed in JP-A-63-308856 and the like.
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記の方法は
以下の問題点を有する。（１）の方法では分解再組立に
多くの時間を費やし、装置の稼働率を著しく低下させ
る。（２）の方法では電子線が入射しない面（例えばア
パーチャの裏面）の汚れが取り難い。（３）の方法では
酸素プラズマが強過ぎるため鏡筒内部の金属部品が酸化
され、酸化膜によって逆にchargingが生じることがあ
る。（４）の方法では、ラジカルの流れが直接当らない
開口の裏面等がクリーニングされ難い。また、ラジカル
の流れの中に小さい開口があると、ラジカルが開口に当
って中性のガスになってしまい不安定となり、開口の下
流側がクリーニングされ難くなる。さらに、ラジカルと
の反応によって金属表面に酸化膜が形成され、それが新
たなchargingを起こすことがあるので、クリーニング後
にＮ2 ラジカルを流し、ＮＯx に還元する必要があっ
た。However, the above method has the following problems. In the method (1), much time is required for disassembly and reassembly, and the operation rate of the apparatus is significantly reduced. In the method (2), it is difficult to remove dirt on the surface on which the electron beam does not enter (for example, the back surface of the aperture). In the method (3), since the oxygen plasma is too strong, the metal parts inside the lens barrel may be oxidized, and conversely, charging may occur due to the oxide film. In the method (4), it is difficult to clean the back surface of the opening to which the flow of the radical does not directly hit. In addition, if there is a small opening in the flow of radicals, the radicals hit the opening and become neutral gas, resulting in instability, making it difficult to clean the downstream side of the opening. Further, an oxide film is formed on the metal surface by the reaction with the radical, which may cause a new charging. Therefore, it is necessary to flow N 2 radicals after cleaning and reduce them to NOx.
【０００４】本発明は、このような問題点に鑑みてなさ
れたもので、電子線縮小転写装置等において、開口の裏
面や下流もクリーニングされ、さらに酸化膜が形成され
難く、酸化膜ができても容易に除去できる光学鏡筒及び
そのクリーニング方法を提供することを目的とする。The present invention has been made in view of such problems, and in an electron beam reduction transfer apparatus or the like, the back surface and downstream of an opening are also cleaned, and it is difficult to form an oxide film. It is an object of the present invention to provide an optical lens barrel and a cleaning method thereof that can easily remove the lens.
【０００５】[0005]
【課題を解決するための手段及び発明の実施の形態】上
記の課題を解決するため、本発明の光学鏡筒及びそのク
リーニング方法は、エネルギ線光源から試料に至る光学
系を収容する光学鏡筒であって； 光源側から試料室側
にラジカルを流す手段と、 試料室側から光源側にラジ
カルを流す手段と、を備えることを特徴とする。２方向
からラジカルを流すことにより、開口の裏面もクリーニ
ングされ、開口の下流も反対方向からラジカルを流す時
にクリーニングされるため、開口の裏面や下流も問題な
くクリーニングできる。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, an optical lens barrel and a method of cleaning the same according to the present invention provide an optical lens barrel for accommodating an optical system from an energy ray light source to a sample. A means for flowing radicals from the light source side to the sample chamber side; and a means for flowing radicals from the sample chamber side to the light source side. By flowing the radicals from two directions, the back surface of the opening is also cleaned, and the downstream of the opening is also cleaned when the radical is flowed from the opposite direction. Therefore, the back surface and the downstream of the opening can be cleaned without any problem.
【０００６】また、光学鏡筒内のラジカルに触れる部分
の表面は白金コーティングされていることが好ましい。
真空部品の大部分が、金よりも酸化され難い白金でコー
ティングされているので、十分時間をかけてクリーニン
グしても酸化膜は生じない。さらに、ラジカルの流れの
経路内にある小開口部にラジカルのバイパス通路が設け
られていることが好ましい。ラジカルの流れの途中に小
面積の開口があっても、開口から離れた位置に、大面積
のラジカルが流れ易いバイパス開口があるので、ラジカ
ルが通過しやすく、下流の面も良くクリーニングされ
る。さらに、酸化性ラジカルを流してクリーニングした
後に水素ラジカルを流すことが好ましい。白金が酸化さ
れた場合に、Ｎ2 ラジカルよりもより還元力の強い水素
ラジカルを流すため容易に酸化膜は除去できる。It is preferable that the surface of the portion of the optical barrel that comes into contact with radicals is coated with platinum.
Since most of the vacuum components are coated with platinum, which is less oxidizable than gold, no oxide film is formed even if cleaning is performed for a sufficient time. Further, it is preferable that a radical bypass passage is provided in the small opening in the flow path of the radical. Even if there is an opening with a small area in the middle of the flow of radicals, there is a bypass opening at a position distant from the opening so that the radicals with a large area can easily flow, so that the radicals can easily pass and the downstream surface can be cleaned well. Further, it is preferable to flow hydrogen radicals after cleaning by flowing oxidizing radicals. When platinum is oxidized, an oxide film can be easily removed because hydrogen radicals having a stronger reducing power than N 2 radicals flow.
【０００７】以下、図を参照しつつ説明する。図１は、
本発明の実施例に係る光学鏡筒の概略を示す図である。
電子銃１のすぐ下にはゲートバルブ２が設けられてお
り、クリーニング中にカソードにラジカルが入ることを
防いでいる。ゲートバルブ２の下は、電子銃１から試料
室１９までの真っ直ぐな鏡筒となっている。ゲートバル
ブ２のすぐ下からバルブ２８を備えた配管が分岐してお
り、配管の先はバルブ１０を通って排気ポンプ３に接続
されている。この配管のバルブ２８とバルブ１０の間
に、バルブ１１を介して放電チャンバ１２が接続されて
いる。放電チャンバ１２の先にはバルブを介して酸化性
ガスボンベ１３が接続されている。さらに試料室１９の
下にはバルブ２７を備えた配管が接続している。この配
管は分岐して、一方は真空バルブ２１を介して排気ポン
プ２４に接続されている。他方は真空バルブ２２を介し
て放電チャンバ２３が接続されている。さらに放電チャ
ンバ２３にはバルブを介してガスボンベ２４が接続され
ている。Hereinafter, description will be made with reference to the drawings. FIG.
FIG. 2 is a diagram schematically illustrating an optical barrel according to an embodiment of the present invention.
A gate valve 2 is provided immediately below the electron gun 1 to prevent radicals from entering the cathode during cleaning. Below the gate valve 2 is a straight lens barrel from the electron gun 1 to the sample chamber 19. A pipe provided with a valve 28 branches from immediately below the gate valve 2, and the end of the pipe is connected to the exhaust pump 3 through a valve 10. The discharge chamber 12 is connected via a bulb 11 between the bulb 28 and the bulb 10 of this piping. An oxidizing gas cylinder 13 is connected to the end of the discharge chamber 12 via a bulb. Further, a pipe provided with a valve 27 is connected below the sample chamber 19. This pipe is branched, and one of the pipes is connected to an exhaust pump 24 via a vacuum valve 21. The other is connected to a discharge chamber 23 via a vacuum valve 22. Further, a gas cylinder 24 is connected to the discharge chamber 23 via a bulb.
【０００８】電子銃の下の真空鏡筒内には、ゲートバル
ブ２と試料室１９の間に、円形開口４、正方形の成形開
口６、ブランキング開口２５、レチクル８、コントラス
ト開口１５が上から連続して配置されている。レチクル
８は、成形開口６の下方の、配管のほぼ中央に設けられ
たレチクル室９内を、レチクルステージ１４上に載置さ
れて移動する。ウエハ１７は、コントラスト開口１５の
下方の試料室１９内を、ウエハステージ１８上に載置さ
れて移動する。In the vacuum column below the electron gun, a circular opening 4, a square forming opening 6, a blanking opening 25, a reticle 8, and a contrast opening 15 are provided between the gate valve 2 and the sample chamber 19 from above. They are arranged consecutively. The reticle 8 is placed on a reticle stage 14 and moves within a reticle chamber 9 provided below the forming opening 6 and substantially at the center of the pipe. The wafer 17 is placed on the wafer stage 18 and moves within the sample chamber 19 below the contrast opening 15.
【０００９】レチクル室９、試料室１９を含む鏡筒、配
管内の壁や部品は、全てメッキ、スパッタリング、真空
蒸着等により白金コーティングがなされている。The lens barrel including the reticle chamber 9 and the sample chamber 19, and the walls and parts in the piping are all coated with platinum by plating, sputtering, vacuum evaporation or the like.
【００１０】円形開口４、成形開口６、ブランキング開
口２５、コントラスト開口１５には、各開口部の周辺
の、散乱ビームの存在しない位置に、各々バイパス５、
７、２６、１６が設けられている。各バイパスは複数の
円形の貫通孔で、散乱ビームを通過させない程度の、各
開口部の径より大きい径を有する。これにより、鏡筒の
上流（電子銃側）及び下流（試料室側）からのラジカル
の流れをスムーズにしている。The circular opening 4, the shaping opening 6, the blanking opening 25, and the contrast opening 15 are respectively provided with bypasses 5 at positions around the respective openings where no scattered beam exists.
7, 26, and 16 are provided. Each bypass is a plurality of circular through-holes, and has a diameter larger than the diameter of each opening that does not allow the scattered beam to pass. This makes the flow of radicals from the upstream (electron gun side) and downstream (sample chamber side) of the lens barrel smooth.
【００１１】通常の電子線縮小転写露光は、ゲートバル
ブ２を開き、バルブ２８、２７を閉じた状態で行われ
る。Normal electron beam reduction transfer exposure is performed with the gate valve 2 opened and the valves 28 and 27 closed.
【００１２】クリーニングを行う際は、まずバルブ２を
閉じ、バルブ２８、２７を開く。次に、バルブ１０、２
２を閉じ、バルブ１１、２１を開け、電子銃１側からの
ラジカルの流路を形成する。この状態でガスボンベ１３
からガスを供給し、放電チャンバ１２で高周波放電を起
こし、プラズマ、ラジカルを発生させる。寿命が短いＯ
2 イオンは鏡筒に入る前に無くなり、寿命の長い酸素ラ
ジカルのみが、排気ポンプ２０により鏡筒内部に導か
れ、電子銃１側から、円形開口４、成形開口６、ブラン
キング開口２５、コントラスト開口１５に設けられたバ
イパス５、７、２６、１６を通って鏡筒内を下方に流れ
る。ＣＯガスやＣＯ2 ガスは酸素ラジカルと結合し、ポ
ンプ２０で排気される。この動作を４０分間行った。When performing cleaning, first, the valve 2 is closed, and the valves 28 and 27 are opened. Next, the valves 10, 2
2 is closed, the valves 11 and 21 are opened, and a flow path of radicals from the electron gun 1 side is formed. In this state, the gas cylinder 13
To generate a high-frequency discharge in the discharge chamber 12 to generate plasma and radicals. O with short life
The two ions disappear before entering the lens barrel, and only oxygen radicals having a long life are guided into the lens barrel by the exhaust pump 20, and from the electron gun 1 side, the circular opening 4, the forming opening 6, the blanking opening 25, the contrast It flows downward through the lens barrel through the bypasses 5, 7, 26, 16 provided in the opening 15. CO gas and CO 2 gas are combined with oxygen radicals and exhausted by the pump 20. This operation was performed for 40 minutes.
【００１３】次に、バルブ２１、１１を閉じ、バルブ２
２、１０を開き、試料室１９側からのラジカルの流路を
形成する。ガスボンベ２４からガスを供給し、放電チャ
ンバ２３で高周波放電を起こし、酸素ラジカルを発生さ
せる。酸素ラジカルは、排気ポンプ３により鏡筒内部に
導かれ、試料室１９側から、コントラスト開口１５、ブ
ランキング開口２５、成形開口６、円形開口４に設けら
れたバイパス１６、２５、７、５を通って鏡筒内部を上
方に流れる。ＣＯガスやＣＯ2 ガスは酸素ラジカルと結
合し、ポンプ３で排気される。この動作を２０分間行っ
た。Next, the valves 21 and 11 are closed, and the valve 2 is closed.
2 and 10 are opened to form a radical flow path from the sample chamber 19 side. A gas is supplied from a gas cylinder 24 to cause high-frequency discharge in the discharge chamber 23 to generate oxygen radicals. Oxygen radicals are guided into the lens barrel by the exhaust pump 3, and pass through the contrast openings 15, blanking openings 25, forming openings 6, and bypasses 16, 25, 7, 5 provided in the circular openings 4 from the sample chamber 19 side. It flows upward through the lens barrel. CO gas and CO 2 gas are combined with oxygen radicals and exhausted by the pump 3. This operation was performed for 20 minutes.
【００１４】次に、放電チャンバ１２、２３に接続して
いるガスボンベ１３、２４を、水素ガスボンベに替え
る。バルブ１０、２２を閉、バルブ１１、２１を開とし
た状態で放電チャンバ１２で水素ラジカルを発生させ、
電子銃側から還元を行う。次に、バルブ２２、１０を
開、バルブ２１、１１を閉とした状態で放電チャンバ２
３で水素ラジカルを発生させ、試料室側から還元を行
う。この動作をそれぞれ２０分間行った。この還元作用
により、白金が酸化された場合に生成する酸化膜を除去
する。Next, the gas cylinders 13 and 24 connected to the discharge chambers 12 and 23 are replaced with hydrogen gas cylinders. With the valves 10 and 22 closed and the valves 11 and 21 opened, hydrogen radicals are generated in the discharge chamber 12,
Reduction is performed from the electron gun side. Next, the discharge chamber 2 is opened with the valves 22 and 10 opened and the valves 21 and 11 closed.
In step 3, hydrogen radicals are generated, and reduction is performed from the sample chamber side. This operation was performed for 20 minutes. By this reducing action, an oxide film generated when platinum is oxidized is removed.
【００１５】この実施例においては、電子銃１から試料
室１９間に、円形開口４、成形開口６、ブランキング開
口２５、コントラスト開口１５と多くの開口があるにも
かかわらずビーム通路全体をきれいにクリーニングする
ことができた。また、ビーム通路の近くの部品や、ビー
ム通路から遠くてもビーム通路から見える部品は金属、
絶縁物の如何にかかわらず白金コーティングされている
ので、酸化膜が形成される恐れはほとんどない。また、
例え酸化膜ができても、後の水素ラジカルによって容易
に還元できる。In this embodiment, the entire beam path is clean even though there are many openings such as the circular opening 4, the forming opening 6, the blanking opening 25, and the contrast opening 15 between the electron gun 1 and the sample chamber 19. Could be cleaned. In addition, parts near the beam path and parts that can be seen from the beam path even if they are far from the beam path are metal,
Regardless of the insulator, it is coated with platinum, so there is almost no danger of forming an oxide film. Also,
Even if an oxide film is formed, it can be easily reduced by subsequent hydrogen radicals.
【００１６】[0016]
【発明の効果】以上の説明から明らかなように、本発明
によれば、電子線縮小転写装置等において、開口の裏面
や下流もクリーニングされ、さらに酸化膜が形成され難
く、酸化膜ができても容易に除去できる光学鏡筒及びク
リーニング方法を提供することができる。As is apparent from the above description, according to the present invention, in the electron beam reduction transfer apparatus and the like, the back surface and downstream of the opening are also cleaned, and it is difficult to form an oxide film. Can be provided, and an optical lens barrel and a cleaning method that can be easily removed.
【図１】本発明の実施例に係る光学鏡筒の概略を示す図
である。FIG. 1 is a view schematically showing an optical lens barrel according to an embodiment of the present invention.
１ 電子銃 ２ ゲートバルブ ３ 排気ポンプ ４ 円形開口 ５ 円形開口用バイパス ６ 成形開口 ７ 成形開口用バイパス ８ レチクル ９ レチクル室 １０ バルブ １１ バルブ １２ 放電チャン
バ １３ ガスボンベ １４ レチクルス
テージ １５ コントラスト開口 １６ コントラス
ト開口用バイパス １７ ウエハ １８ ウエハステ
ージ １９ 試料室 ２０ 排気ポンプ ２１ 真空バルブ ２２ 真空バルブ ２３ 放電チャンバ ２４ ガスボンベ ２５ ブランキング開口 ２６ ブランキン
グ開口用バイパス ２７ バルブ ２８ バルブREFERENCE SIGNS LIST 1 electron gun 2 gate valve 3 exhaust pump 4 circular opening 5 circular opening bypass 6 forming opening 7 forming opening bypass 8 reticle 9 reticle chamber 10 valve 11 valve 12 discharge chamber 13 gas cylinder 14 reticle stage 15 contrast opening 16 bypass for contrast opening 17 Wafer 18 Wafer stage 19 Sample chamber 20 Exhaust pump 21 Vacuum valve 22 Vacuum valve 23 Discharge chamber 24 Gas cylinder 25 Blanking opening 26 Bypass for blanking opening 27 Valve 28 Valve
Claims (7)
収容する光学鏡筒であって；光源側から試料室側にラジ
カルを流す手段と、 試料室側から光源側にラジカルを流す手段と、を備える
ことを特徴とする光学鏡筒。1. An optical barrel for housing an optical system from an energy ray light source to a sample; a means for flowing radicals from the light source side to the sample chamber side; a means for flowing radicals from the sample chamber side to the light source side; An optical lens barrel comprising:
収容する光学鏡筒であって；光学鏡筒内にラジカルを流
す手段を備え、 光学鏡筒内のラジカルに触れる部分の表面が白金コーテ
ィングされていることを特徴とする光学鏡筒。2. An optical barrel for housing an optical system from an energy ray light source to a sample, comprising: means for flowing radicals into the optical barrel, wherein a surface of a portion of the optical barrel that comes into contact with the radicals is coated with platinum. An optical barrel characterized by being made.
収容する光学鏡筒であって；光学鏡筒内にラジカルを流
す手段を備え、 ラジカルの流れの経路内にある小開口部にラジカルのバ
イパス通路が設けられていることを特徴とする光学鏡
筒。3. An optical column for housing an optical system from an energy ray light source to a sample, comprising: means for flowing radicals in the optical column, wherein radicals are supplied to a small opening in a radical flow path. An optical lens barrel comprising a bypass passage.
にラジカルのバイパス通路が設けられていることを特徴
とする請求項１又は２記載の光学鏡筒。4. The optical lens barrel according to claim 1, wherein a radical bypass passage is provided in a small opening in a flow path of the radical.
以上の小開口を有することを特徴とする請求項１、２又
は３記載の光学鏡筒。5. The optical lens barrel according to claim 1, wherein the optical lens barrel has at least four or more small apertures through which an energy beam passes.
収容する光学鏡筒のクリーニング方法であって；光源側
から試料室側にラジカルを流すとともに、 試料室側から光源側にラジカルを流すことを特徴とする
鏡筒クリーニング方法。6. A method for cleaning an optical lens barrel containing an optical system from an energy ray light source to a sample, wherein radicals are flown from the light source side to the sample chamber side and radicals are flown from the sample chamber side to the light source side. A lens barrel cleaning method.
収容する光学鏡筒のクリーニング方法であって；光学鏡
筒内に酸化性ラジカルを流してクリーニングした後に水
素ラジカルを流すことを特徴とする鏡筒クリーニング方
法。7. A method for cleaning an optical column accommodating an optical system from an energy ray light source to a sample, wherein oxidizing radicals are flown into the optical column for cleaning and then hydrogen radicals are flown. How to clean the lens barrel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10280495A JP2000090868A (en) | 1998-09-17 | 1998-09-17 | Optical lens barrel and cleaning method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10280495A JP2000090868A (en) | 1998-09-17 | 1998-09-17 | Optical lens barrel and cleaning method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000090868A true JP2000090868A (en) | 2000-03-31 |
Family
ID=17625890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10280495A Pending JP2000090868A (en) | 1998-09-17 | 1998-09-17 | Optical lens barrel and cleaning method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000090868A (en) |
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1998
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| JP4516951B2 (en) * | 2005-12-22 | 2010-08-04 | エーエスエムエル ネザーランズ ビー．ブイ． | Method for cleaning a lithographic apparatus module, cleaning structure for a lithographic apparatus module and lithographic apparatus comprising a cleaning structure |
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