JP1648519S - - Google Patents
Info
- Publication number
- JP1648519S JP1648519S JPD2018-21799F JP2018021799F JP1648519S JP 1648519 S JP1648519 S JP 1648519S JP 2018021799 F JP2018021799 F JP 2018021799F JP 1648519 S JP1648519 S JP 1648519S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-21799F JP1648519S (en) | 2018-10-04 | 2018-10-04 | |
| TW108301945F TWD203027S (en) | 2018-10-04 | 2019-04-03 | Pedestal |
| US35/355,090 USD935425S1 (en) | 2018-10-04 | 2019-04-04 | Susceptor for use in production of a semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-21799F JP1648519S (en) | 2018-10-04 | 2018-10-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1648519S true JP1648519S (en) | 2019-12-23 |
Family
ID=68916791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2018-21799F Active JP1648519S (en) | 2018-10-04 | 2018-10-04 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD935425S1 (en) |
| JP (1) | JP1648519S (en) |
| TW (1) | TWD203027S (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD975665S1 (en) * | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
| USD965044S1 (en) * | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
| USD1012873S1 (en) | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
| USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
| JP1711119S (en) * | 2021-10-22 | 2022-03-29 | Susceptoring |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7122844B2 (en) * | 2002-05-13 | 2006-10-17 | Cree, Inc. | Susceptor for MOCVD reactor |
| US8366830B2 (en) * | 2003-03-04 | 2013-02-05 | Cree, Inc. | Susceptor apparatus for inverted type MOCVD reactor |
| EP1790757B1 (en) * | 2004-07-22 | 2013-08-14 | Toyo Tanso Co., Ltd. | Susceptor |
| US20100055318A1 (en) | 2008-08-29 | 2010-03-04 | Veeco Instruments Inc. | Wafer carrier with varying thermal resistance |
| US8801857B2 (en) * | 2008-10-31 | 2014-08-12 | Asm America, Inc. | Self-centering susceptor ring assembly |
| JP1438320S (en) * | 2011-09-20 | 2015-04-06 | ||
| JP1438319S (en) * | 2011-09-20 | 2015-04-06 | ||
| USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
-
2018
- 2018-10-04 JP JPD2018-21799F patent/JP1648519S/ja active Active
-
2019
- 2019-04-03 TW TW108301945F patent/TWD203027S/en unknown
- 2019-04-04 US US35/355,090 patent/USD935425S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWD203027S (en) | 2020-03-01 |
| USD935425S1 (en) | 2021-11-09 |