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IN2015DN01149A - - Google Patents

Info

Publication number
IN2015DN01149A
IN2015DN01149A IN1149DEN2015A IN2015DN01149A IN 2015DN01149 A IN2015DN01149 A IN 2015DN01149A IN 1149DEN2015 A IN1149DEN2015 A IN 1149DEN2015A IN 2015DN01149 A IN2015DN01149 A IN 2015DN01149A
Authority
IN
India
Prior art keywords
electrode
substrate
energy source
segmented
bringing
Prior art date
Application number
Inventor
Andreas Gebeshuber
Daniel Heim
Johann Laimer
Thomas Müller
Michael Proschek
Otto Stadler
Herbert Störi
Original Assignee
Berndorf Hueck Band Und Pressblechtechnik Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Berndorf Hueck Band Und Pressblechtechnik Gmbh filed Critical Berndorf Hueck Band Und Pressblechtechnik Gmbh
Publication of IN2015DN01149A publication Critical patent/IN2015DN01149A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06—Platens or press rams
    • B30B15/062—Press plates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An apparatus (100..103) for the plasma coating of a substrate (2) in particular a press platen is provided comprising a vacuum chamber (3) and arranged therein an electrode (400..409) which is segmented wherein each of the electrode segments (500..512) has a dedicated connection (6) for an electrical energy source (700..702). Also provided is a method for operating said apparatus (100..103) in which a substrate (2) to be coated is positioned with respect to said electrode (400..409) and at least one energy source (700..706) that is assigned to an electrode segment (500..512) is activated. Moreover a gas is introduced with the effect of bringing about plasma enhanced chemical vapour deposition on the substrate (2).
IN1149DEN2015 2012-08-08 2013-08-06 IN2015DN01149A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ATA877/2012A AT513190B9 (en) 2012-08-08 2012-08-08 Apparatus and method for plasma coating a substrate, in particular a press plate
PCT/AT2013/050152 WO2014022872A2 (en) 2012-08-08 2013-08-06 Apparatus and method for the plasma coating of a substrate, in particular a press platen

Publications (1)

Publication Number Publication Date
IN2015DN01149A true IN2015DN01149A (en) 2015-06-26

Family

ID=49584535

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1149DEN2015 IN2015DN01149A (en) 2012-08-08 2013-08-06

Country Status (18)

Country Link
US (1) US9530624B2 (en)
EP (1) EP2882885B8 (en)
JP (1) JP6140286B2 (en)
KR (1) KR101742744B1 (en)
CN (1) CN104755653B (en)
AT (1) AT513190B9 (en)
AU (1) AU2013302202B2 (en)
BR (1) BR112015002657A8 (en)
CA (1) CA2881069C (en)
CL (1) CL2015000301A1 (en)
DK (1) DK2882885T3 (en)
ES (1) ES2587929T3 (en)
IN (1) IN2015DN01149A (en)
MY (1) MY176134A (en)
NZ (1) NZ704253A (en)
PL (1) PL2882885T3 (en)
RU (1) RU2615743C2 (en)
WO (1) WO2014022872A2 (en)

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JP2017025389A (en) * 2015-07-24 2017-02-02 株式会社ユーテック Plasma cvd device and film deposition method
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
CN107283551B (en) * 2017-08-21 2018-07-24 阜南盛原木业有限公司 A kind of glued board with good mildew and insect proof performance
JP6863199B2 (en) 2017-09-25 2021-04-21 トヨタ自動車株式会社 Plasma processing equipment
CN109055917B (en) * 2018-09-07 2020-09-08 信阳师范学院 Single-chamber double-sided coating plasma chemical vapor deposition system
DE102019127659A1 (en) * 2019-10-15 2021-04-15 Hueck Rheinische Gmbh Press tool and method of making a press tool
US11884426B2 (en) 2020-07-08 2024-01-30 Hamilton Sundstrand Corporation Compression apparatus and methods of making and using the same

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Also Published As

Publication number Publication date
NZ704253A (en) 2016-08-26
RU2015107784A (en) 2016-09-27
MY176134A (en) 2020-07-24
DK2882885T3 (en) 2016-09-05
EP2882885A2 (en) 2015-06-17
CA2881069C (en) 2017-11-07
JP6140286B2 (en) 2017-05-31
US9530624B2 (en) 2016-12-27
CN104755653B (en) 2017-09-19
AT513190B1 (en) 2014-03-15
CL2015000301A1 (en) 2015-09-21
RU2615743C2 (en) 2017-04-11
CN104755653A (en) 2015-07-01
WO2014022872A2 (en) 2014-02-13
AU2013302202A1 (en) 2015-02-26
US20150255254A1 (en) 2015-09-10
PL2882885T3 (en) 2016-11-30
WO2014022872A3 (en) 2014-05-15
EP2882885B1 (en) 2016-05-25
AU2013302202B2 (en) 2015-12-03
ES2587929T3 (en) 2016-10-27
JP2015531820A (en) 2015-11-05
AT513190A1 (en) 2014-02-15
KR20150042817A (en) 2015-04-21
BR112015002657A2 (en) 2017-07-04
AT513190B9 (en) 2014-05-15
KR101742744B1 (en) 2017-06-01
BR112015002657A8 (en) 2019-07-30
EP2882885B8 (en) 2016-08-31
CA2881069A1 (en) 2014-02-13

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