IL84388A - Stripping compositions and methods of stripping resists from substrates - Google Patents

Stripping compositions and methods of stripping resists from substrates

Info

Publication number: IL84388A
Authority: IL; Israel
Prior art keywords: stripping; substrates; methods; resists; compositions
Prior art date: 1986-11-10

Application number

IL84388A

Other languages

English (en)

Other versions

IL84388A0 (en

Original Assignee

Baker J T Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-11-10

Filing date

1987-11-06

Publication date

1991-06-10

1987-11-06 Application filed by Baker J T Inc filed Critical Baker J T Inc

1988-04-29 Publication of IL84388A0 publication Critical patent/IL84388A0/xx

1991-06-10 Publication of IL84388A publication Critical patent/IL84388A/xx

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Cleaning Or Drying Semiconductors (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Polyethers (AREA)
Pyrrole Compounds (AREA)
Paints Or Removers (AREA)

IL84388A 1986-11-10 1987-11-06 Stripping compositions and methods of stripping resists from substrates IL84388A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US92940886A	1986-11-10	1986-11-10

Publications (2)

Publication Number	Publication Date
IL84388A0 IL84388A0 (en)	1988-04-29
IL84388A true IL84388A (en)	1991-06-10

Family

ID=25457818

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL84388A IL84388A (en)	1986-11-10	1987-11-06	Stripping compositions and methods of stripping resists from substrates

Country Status (10)

Country	Link
EP (1)	EP0267540B1 (xx)
JP (1)	JPS63186243A (xx)
KR (1)	KR950000238B1 (xx)
AT (1)	ATE88285T1 (xx)
AU (1)	AU594509B2 (xx)
CA (1)	CA1329037C (xx)
DE (1)	DE3785418T2 (xx)
ES (1)	ES2055697T3 (xx)
IE (1)	IE59971B1 (xx)
IL (1)	IL84388A (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4806506A (en) *	1987-09-14	1989-02-21	E. I. Du Pont De Nemours And Company	Process for detackifying photopolymer flexographic printing plates
JP2759462B2 (ja) *	1988-11-11	1998-05-28	ナガセ電子化学株式会社	水性剥離剤組成物
JP3716429B2 (ja) *	1995-11-10	2005-11-16	東レ株式会社	「水なし平版製版用処理液」
US5909744A (en) *	1996-01-30	1999-06-08	Silicon Valley Chemlabs, Inc.	Dibasic ester stripping composition
US5741368A (en) *	1996-01-30	1998-04-21	Silicon Valley Chemlabs	Dibasic ester stripping composition
US6511547B1 (en)	1996-01-30	2003-01-28	Siliconvalley Chemlabs, Inc.	Dibasic ester stripping composition
KR100335011B1 (ko)	1999-08-19	2002-05-02	주식회사 동진쎄미켐	레지스트 제거용 조성물
JP4501248B2 (ja) *	2000-07-24	2010-07-14	東ソー株式会社	レジスト剥離剤
JP4501256B2 (ja) *	2000-08-22	2010-07-14	東ソー株式会社	レジスト剥離剤
TWI275903B (en) *	2001-03-13	2007-03-11	Nagase Chemtex Corp	A composition for stripping photo resist
ATE463763T1 (de)	2004-12-10	2010-04-15	Mallinckrodt Baker Inc	Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren
JP5236217B2 (ja) *	2006-06-22	2013-07-17	東進セミケム株式会社	レジスト除去用組成物
WO2010091045A2 (en) *	2009-02-05	2010-08-12	Advanced Technology Materials, Inc.	Non-fluoride containing composition for the removal of polymers and other organic material from a surface
US8444768B2 (en)	2009-03-27	2013-05-21	Eastman Chemical Company	Compositions and methods for removing organic substances
US8309502B2 (en)	2009-03-27	2012-11-13	Eastman Chemical Company	Compositions and methods for removing organic substances
US8614053B2 (en)	2009-03-27	2013-12-24	Eastman Chemical Company	Processess and compositions for removing substances from substrates
KR101089211B1 (ko) *	2010-12-02	2011-12-02	엘티씨 (주)	1차 알칸올 아민을 포함하는 ｌｃｄ 제조용 포토레지스트 박리액 조성물
US9029268B2 (en)	2012-11-21	2015-05-12	Dynaloy, Llc	Process for etching metals

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4395479A (en) *	1981-09-23	1983-07-26	J. T. Baker Chemical Company	Stripping compositions and methods of stripping resists
US4403029A (en) *	1982-09-02	1983-09-06	J. T. Baker Chemical Company	Stripping compositions and methods of stripping resists
US4401747A (en) *	1982-09-02	1983-08-30	J. T. Baker Chemical Company	Stripping compositions and methods of stripping resists
US4401748A (en) *	1982-09-07	1983-08-30	J. T. Baker Chemical Company	Stripping compositions and methods of stripping resists
JPS6026340A (ja) *	1983-07-25	1985-02-09	ジエイ　ティー　ベイカー　インコーポレーテッド	ストリツピング組成物及びレジストをストリツピングする方法
JPS6026945A (ja) *	1983-07-25	1985-02-09	ジエイ・テイ・ベ−カ−・ケミカル・カンパニ−	ストリツピング組成物及びレジストをストリツピングする方法
JPS60131535A (ja) *	1983-12-20	1985-07-13	エッチエムシー・パテンツ・ホールディング・カンパニー・インコーポレーテッド	ポジのホトレジスト用のストリツピング組成物
JPH0612455B2 (ja) *	1985-08-10	1994-02-16	長瀬産業株式会社	剥離剤組成物

1987
- 1987-09-01 IE IE234187A patent/IE59971B1/en not_active IP Right Cessation
- 1987-09-24 CA CA000547687A patent/CA1329037C/en not_active Expired - Lifetime
- 1987-09-30 AU AU79098/87A patent/AU594509B2/en not_active Expired
- 1987-10-12 JP JP62254801A patent/JPS63186243A/ja active Granted
- 1987-11-03 KR KR1019870012310A patent/KR950000238B1/ko not_active IP Right Cessation
- 1987-11-05 AT AT87116317T patent/ATE88285T1/de not_active IP Right Cessation
- 1987-11-05 DE DE8787116317T patent/DE3785418T2/de not_active Expired - Lifetime
- 1987-11-05 EP EP87116317A patent/EP0267540B1/en not_active Expired - Lifetime
- 1987-11-05 ES ES87116317T patent/ES2055697T3/es not_active Expired - Lifetime
- 1987-11-06 IL IL84388A patent/IL84388A/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
EP0267540B1 (en)	1993-04-14
IE872341L (en)	1988-05-10
IL84388A0 (en)	1988-04-29
DE3785418T2 (de)	1993-08-19
EP0267540A2 (en)	1988-05-18
KR880006572A (ko)	1988-07-23
AU7909887A (en)	1988-05-12
IE59971B1 (en)	1994-05-04
JPS63186243A (ja)	1988-08-01
JPH0468624B2 (xx)	1992-11-02
KR950000238B1 (ko)	1995-01-12
DE3785418D1 (de)	1993-05-19
AU594509B2 (en)	1990-03-08
CA1329037C (en)	1994-05-03
EP0267540A3 (en)	1989-03-15
ES2055697T3 (es)	1994-09-01
ATE88285T1 (de)	1993-04-15

Publication	Publication Date	Title
IL84388A0 (en)	1988-04-29	Stripping compositions and methods of stripping resists from substrates
DE3369576D1 (en)	1987-03-05	Stripping compositions and methods of stripping resists
IE822119L (en)	1983-03-23	Stripping compositions
IE822090L (en)	1983-03-23	Stripping compositions for stripping resists
DE3369577D1 (en)	1987-03-05	Stripping compositions and methods of stripping resists
DE3369746D1 (en)	1987-03-12	Stripping compositions and methods of stripping resists
DK0879236T3 (da)	2010-01-18	Derivater af camptothecin til anvendelse ved behandling af cancer
DK1275375T3 (da)	2005-08-22	Fremgangsmåde til fremstilling af aerosolsammensætninger
AU6329794A (en)	1994-07-21	Nitrogen-containing spirocycles
FI875161A0 (fi)	1987-11-23	Vesipitoisia dietyleeniglykolimonoheksyylieetteriliuotinta sisältäviä detergenttikoostumuksia
GR3024586T3 (en)	1997-12-31	Retroviral protease inhibitors
ES2049256T3 (es)	1994-04-16	Composicion absorbente de gases acidos.
ES523030A0 (es)	1985-03-16	Procedimiento de obtencion de composiciones de revestimiento reticulantes a base de eteres alquilicos de acrilamidoglicolatos o glicoamidas.
DE59205450D1 (de)	1996-04-04	Salicyl(thio)etherderivate, Verfahren und Zwischenprodukte zu ihrer Herstellung
EP0289620A4 (en)	1989-08-22	COMPOSITIONS FOR ACID GAS ABSORBING.
ES2017473B3 (es)	1991-02-16	Jabon a base de un detergente sintetico.
JPS537696A (en)	1978-01-24	7-amino-3-methylenecephalosporin derivatives and their preparation

Legal Events

Date	Code	Title
1996-03-31	HC	Change of name of proprietor(s)
1998-04-05	KB	Patent renewed
2002-02-10	KB	Patent renewed
2006-02-05	KB	Patent renewed
2008-01-22	EXP	Patent expired