GB2393321B - Plasma generation - Google Patents
Plasma generationInfo
- Publication number
- GB2393321B GB2393321B GB0208007A GB0208007A GB2393321B GB 2393321 B GB2393321 B GB 2393321B GB 0208007 A GB0208007 A GB 0208007A GB 0208007 A GB0208007 A GB 0208007A GB 2393321 B GB2393321 B GB 2393321B
- Authority
- GB
- United Kingdom
- Prior art keywords
- plasma generation
- plasma
- generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3452—Magnet distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3455—Movable magnets
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0208007A GB2393321B (en) | 2002-04-06 | 2002-04-06 | Plasma generation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0208007A GB2393321B (en) | 2002-04-06 | 2002-04-06 | Plasma generation |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0208007D0 GB0208007D0 (en) | 2002-05-15 |
GB2393321A GB2393321A (en) | 2004-03-24 |
GB2393321B true GB2393321B (en) | 2005-06-29 |
Family
ID=9934401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0208007A Expired - Fee Related GB2393321B (en) | 2002-04-06 | 2002-04-06 | Plasma generation |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2393321B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004027897A1 (en) * | 2004-06-09 | 2006-01-05 | Leybold Optics Gmbh | Apparatus and method for atomization with a movable planar target |
GB0423032D0 (en) * | 2004-10-16 | 2004-11-17 | Trikon Technologies Ltd | Methods and apparatus for sputtering |
RU2385967C2 (en) * | 2005-10-07 | 2010-04-10 | Тохоку Юниверсити | Apparatus of magnetron sputtering |
KR20080085893A (en) * | 2005-12-22 | 2008-09-24 | 오씨 외를리콘 발처스 악티엔게젤샤프트 | Method of manufacturing at least one sputter-coated substrate and sputter source |
EP1873809A1 (en) * | 2006-06-26 | 2008-01-02 | M2 Engineering AB (publ) | Sputtering device |
JP4942005B2 (en) * | 2007-03-16 | 2012-05-30 | 国立大学法人東北大学 | Magnetron sputtering equipment |
EP2778253B1 (en) * | 2013-02-26 | 2018-10-24 | Oerlikon Surface Solutions AG, Pfäffikon | Cylindrical evaporation source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5399253A (en) * | 1992-12-23 | 1995-03-21 | Balzers Aktiengesellschaft | Plasma generating device |
US5944968A (en) * | 1996-09-18 | 1999-08-31 | Anelva Corporation | Sputtering apparatus |
US5980707A (en) * | 1998-12-18 | 1999-11-09 | Sierra Applied Sciences, Inc. | Apparatus and method for a magnetron cathode with moving magnet assembly |
-
2002
- 2002-04-06 GB GB0208007A patent/GB2393321B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5399253A (en) * | 1992-12-23 | 1995-03-21 | Balzers Aktiengesellschaft | Plasma generating device |
US5944968A (en) * | 1996-09-18 | 1999-08-31 | Anelva Corporation | Sputtering apparatus |
US5980707A (en) * | 1998-12-18 | 1999-11-09 | Sierra Applied Sciences, Inc. | Apparatus and method for a magnetron cathode with moving magnet assembly |
Also Published As
Publication number | Publication date |
---|---|
GB0208007D0 (en) | 2002-05-15 |
GB2393321A (en) | 2004-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20070406 |
|
S28 | Restoration of ceased patents (sect. 28/pat. act 1977) |
Free format text: APPLICATION FILED |
|
S28 | Restoration of ceased patents (sect. 28/pat. act 1977) |
Free format text: RESTORATION ALLOWED Effective date: 20100721 |
|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20150406 |