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FR2883661B1 - Transistor a effet de champ multi-grille a canal multi-couche - Google Patents

Transistor a effet de champ multi-grille a canal multi-couche

Info

Publication number
FR2883661B1
FR2883661B1 FR0603975A FR0603975A FR2883661B1 FR 2883661 B1 FR2883661 B1 FR 2883661B1 FR 0603975 A FR0603975 A FR 0603975A FR 0603975 A FR0603975 A FR 0603975A FR 2883661 B1 FR2883661 B1 FR 2883661B1
Authority
FR
France
Prior art keywords
layer channel
field effect
effect transistor
channel field
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0603975A
Other languages
English (en)
Other versions
FR2883661A1 (fr
Inventor
Frederic Allibert
Bruno Ghyselen
Takeshi Akatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soitec SA filed Critical Soitec SA
Priority to FR0603975A priority Critical patent/FR2883661B1/fr
Publication of FR2883661A1 publication Critical patent/FR2883661A1/fr
Application granted granted Critical
Publication of FR2883661B1 publication Critical patent/FR2883661B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/62Fin field-effect transistors [FinFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6741Group IV materials, e.g. germanium or silicon carbide
    • H10D30/6748Group IV materials, e.g. germanium or silicon carbide having a multilayer structure or superlattice structure
FR0603975A 2006-05-04 2006-05-04 Transistor a effet de champ multi-grille a canal multi-couche Expired - Fee Related FR2883661B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0603975A FR2883661B1 (fr) 2006-05-04 2006-05-04 Transistor a effet de champ multi-grille a canal multi-couche

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0603975A FR2883661B1 (fr) 2006-05-04 2006-05-04 Transistor a effet de champ multi-grille a canal multi-couche

Publications (2)

Publication Number Publication Date
FR2883661A1 FR2883661A1 (fr) 2006-09-29
FR2883661B1 true FR2883661B1 (fr) 2008-04-25

Family

ID=36956234

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0603975A Expired - Fee Related FR2883661B1 (fr) 2006-05-04 2006-05-04 Transistor a effet de champ multi-grille a canal multi-couche

Country Status (1)

Country Link
FR (1) FR2883661B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8817358B2 (en) * 2012-08-02 2014-08-26 Qualcomm Mems Technologies, Inc. Thin film stack with surface-conditioning buffer layers and related methods

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5461250A (en) * 1992-08-10 1995-10-24 International Business Machines Corporation SiGe thin film or SOI MOSFET and method for making the same
US6326667B1 (en) * 1999-09-09 2001-12-04 Kabushiki Kaisha Toshiba Semiconductor devices and methods for producing semiconductor devices
FR2799305B1 (fr) * 1999-10-05 2004-06-18 St Microelectronics Sa Procede de fabrication d'un dispositif semi-conducteur a grille enveloppante et dispositif obtenu
JP3782021B2 (ja) * 2002-02-22 2006-06-07 株式会社東芝 半導体装置、半導体装置の製造方法、半導体基板の製造方法
FR2842350B1 (fr) * 2002-07-09 2005-05-13 Procede de transfert d'une couche de materiau semiconducteur contraint

Also Published As

Publication number Publication date
FR2883661A1 (fr) 2006-09-29

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Legal Events

Date Code Title Description
CD Change of name or company name

Owner name: SOITEC, FR

Effective date: 20120423

ST Notification of lapse

Effective date: 20131031