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FR2704355B1 - Procédés pour la formation de revêtements céramiques notamment sur des dispositifs électroniques. - Google Patents

Procédés pour la formation de revêtements céramiques notamment sur des dispositifs électroniques.

Info

Publication number
FR2704355B1
FR2704355B1 FR9002018A FR9002018A FR2704355B1 FR 2704355 B1 FR2704355 B1 FR 2704355B1 FR 9002018 A FR9002018 A FR 9002018A FR 9002018 A FR9002018 A FR 9002018A FR 2704355 B1 FR2704355 B1 FR 2704355B1
Authority
FR
France
Prior art keywords
processes
formation
electronic devices
ceramic coatings
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9002018A
Other languages
English (en)
Other versions
FR2704355A1 (fr
Inventor
Loren Andrew Haluska
Winton Michael Keith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of FR2704355A1 publication Critical patent/FR2704355A1/fr
Application granted granted Critical
Publication of FR2704355B1 publication Critical patent/FR2704355B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5035—Silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
FR9002018A 1989-02-21 1990-02-20 Procédés pour la formation de revêtements céramiques notamment sur des dispositifs électroniques. Expired - Fee Related FR2704355B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/312,457 US5336532A (en) 1989-02-21 1989-02-21 Low temperature process for the formation of ceramic coatings

Publications (2)

Publication Number Publication Date
FR2704355A1 FR2704355A1 (fr) 1994-10-28
FR2704355B1 true FR2704355B1 (fr) 1996-05-31

Family

ID=23211539

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9002018A Expired - Fee Related FR2704355B1 (fr) 1989-02-21 1990-02-20 Procédés pour la formation de revêtements céramiques notamment sur des dispositifs électroniques.

Country Status (8)

Country Link
US (1) US5336532A (fr)
AU (1) AU649215B1 (fr)
CA (1) CA2007726A1 (fr)
DE (1) DE4005472C2 (fr)
FR (1) FR2704355B1 (fr)
GB (1) GB2280203B (fr)
IT (1) IT1259407B (fr)
NL (1) NL194796C (fr)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0749500B1 (fr) * 1994-10-18 1998-05-27 Koninklijke Philips Electronics N.V. Procede de fabrication d'une couche mince en oxyde de silicium
US5530293A (en) * 1994-11-28 1996-06-25 International Business Machines Corporation Carbon-free hydrogen silsesquioxane with dielectric constant less than 3.2 annealed in hydrogen for integrated circuits
US5508238A (en) * 1995-05-11 1996-04-16 Dow Corning Corporation Monolithic ceramic bodies using modified hydrogen silsesquioxane resin
US5616202A (en) * 1995-06-26 1997-04-01 Dow Corning Corporation Enhanced adhesion of H-resin derived silica to gold
JP3070450B2 (ja) * 1995-07-14 2000-07-31 ヤマハ株式会社 多層配線形成法
JP3149739B2 (ja) * 1995-07-14 2001-03-26 ヤマハ株式会社 多層配線形成法
US5661092A (en) * 1995-09-01 1997-08-26 The University Of Connecticut Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof
EP0764704B1 (fr) * 1995-09-25 2000-03-08 Dow Corning Corporation Utilisation de polymères précéramiques comme adhésifs pour l'électronique
US5609925A (en) 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
US6323549B1 (en) * 1996-08-29 2001-11-27 L. Pierre deRochemont Ceramic composite wiring structures for semiconductor devices and method of manufacture
JP3123449B2 (ja) * 1996-11-01 2001-01-09 ヤマハ株式会社 多層配線形成法
JP3082688B2 (ja) * 1996-11-05 2000-08-28 ヤマハ株式会社 配線形成法
JP3225872B2 (ja) 1996-12-24 2001-11-05 ヤマハ株式会社 酸化シリコン膜形成法
JPH10247686A (ja) * 1996-12-30 1998-09-14 Yamaha Corp 多層配線形成法
CA2275972A1 (fr) * 1996-12-30 1998-07-09 Peter H. Farmer Structures de cablage composites en ceramique pour dispositifs a semi-conducteur et procedes de fabrication
US5707681A (en) * 1997-02-07 1998-01-13 Dow Corning Corporation Method of producing coatings on electronic substrates
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6043330A (en) * 1997-04-21 2000-03-28 Alliedsignal Inc. Synthesis of siloxane resins
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US5935638A (en) * 1998-08-06 1999-08-10 Dow Corning Corporation Silicon dioxide containing coating
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
US6440550B1 (en) 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
DE10083663T1 (de) * 1999-11-01 2002-05-02 Tdk Corp Mehrschichtiges elektronisches Keramikbauelement
JP3530938B2 (ja) * 2001-03-27 2004-05-24 独立行政法人産業技術総合研究所 シルセスキオキサン系ポリマーを含む耐熱性樹脂組成物、該組成物を用いて形成された被膜、及びその被膜の作成方法
JP3913638B2 (ja) * 2001-09-03 2007-05-09 東京エレクトロン株式会社 熱処理方法及び熱処理装置
FR2830856B1 (fr) * 2001-10-15 2004-07-30 Pechiney Aluminium Precurseur de revetement et procede pour revetir un substrat d'une couche refractaire
SE521977C2 (sv) * 2002-06-20 2003-12-23 Mobile Media Group Stockholm A Metod och apparat för att formatera en webbtjänst
JP3924286B2 (ja) * 2003-10-31 2007-06-06 Ｔｄｋ株式会社 積層セラミック電子部品の製造方法
WO2005097883A2 (fr) * 2004-03-26 2005-10-20 King Industries, Inc. Procede de production d'un revetement reticule dans la fabrication de circuits integres
DE102004058305B3 (de) * 2004-12-02 2006-05-18 Infineon Technologies Ag Halbleiterbauteil mit einem eine Passivierungsschicht aufweisenden Halbleiterchip sowie Verfahren zur Herstellung desselben
EP2969487B1 (fr) * 2013-03-14 2020-09-09 Stratasys, Inc. Procede de preparation d'une article imprime en trois dimensions
CN106542850B (zh) * 2016-09-26 2019-11-22 德化恒忆陶瓷艺术股份有限公司 复合多层保温陶瓷及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3834939A (en) * 1970-02-19 1974-09-10 Ibm Method of forming doped silicon oxide layers on substrates and paint-on compositions useful in such methods
US3987530A (en) * 1975-04-11 1976-10-26 International Business Machines Corporation Heat fuser roll and method of manufacture
US4411931A (en) * 1982-09-29 1983-10-25 Armstrong World Industries, Inc. Multiple step UV curing process for providing accurately controlled surface texture
JPS59111333A (ja) * 1982-12-09 1984-06-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ＳｉＯ領域をＳｉＯ↓２領域に変換してＳｉＯ↓２領を形成する方法
US4472510A (en) * 1982-12-23 1984-09-18 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS6177695A (ja) * 1984-09-20 1986-04-21 Applied Material Japan Kk 気相成長方法
US4822697A (en) * 1986-12-03 1989-04-18 Dow Corning Corporation Platinum and rhodium catalysis of low temperature formation multilayer ceramics
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4753855A (en) * 1986-12-04 1988-06-28 Dow Corning Corporation Multilayer ceramic coatings from metal oxides for protection of electronic devices
US4808653A (en) * 1986-12-04 1989-02-28 Dow Corning Corporation Coating composition containing hydrogen silsesquioxane resin and other metal oxide precursors
US4749631B1 (en) * 1986-12-04 1993-03-23 Multilayer ceramics from silicate esters
US4911992A (en) * 1986-12-04 1990-03-27 Dow Corning Corporation Platinum or rhodium catalyzed multilayer ceramic coatings from hydrogen silsesquioxane resin and metal oxides
JP2624254B2 (ja) * 1987-05-22 1997-06-25 東京応化工業株式会社 シリカ系被膜の膜質改善方法
US5003185A (en) * 1988-11-17 1991-03-26 Burgio Joseph T Jr System and method for photochemically curing a coating on a substrate

Also Published As

Publication number Publication date
NL194796C (nl) 2003-03-04
GB2280203B (en) 1995-06-28
DE4005472C2 (de) 1995-04-13
NL194796B (nl) 2002-11-01
AU649215B1 (en) 1994-05-19
IT9019237A0 (it) 1990-02-02
CA2007726A1 (fr) 1994-05-27
IT9019237A1 (it) 1990-08-22
FR2704355A1 (fr) 1994-10-28
GB2280203A (en) 1995-01-25
DE4005472A1 (de) 1994-11-10
GB9002497D0 (en) 1994-10-26
US5336532A (en) 1994-08-09
NL9000320A (nl) 2001-02-01
IT1259407B (it) 1996-03-18

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Legal Events

Date Code Title Description
ST Notification of lapse
RN Application for restoration
FC Decision of inpi director general to approve request for restoration
ST Notification of lapse