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FR2126906A1 - - Google Patents

Info

Publication number
FR2126906A1
FR2126906A1 FR7044759A FR7044759A FR2126906A1 FR 2126906 A1 FR2126906 A1 FR 2126906A1 FR 7044759 A FR7044759 A FR 7044759A FR 7044759 A FR7044759 A FR 7044759A FR 2126906 A1 FR2126906 A1 FR 2126906A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7044759A
Other languages
French (fr)
Other versions
FR2126906B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7044759A priority Critical patent/FR2126906B1/fr
Publication of FR2126906A1 publication Critical patent/FR2126906A1/fr
Application granted granted Critical
Publication of FR2126906B1 publication Critical patent/FR2126906B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
FR7044759A 1970-12-11 1970-12-11 Expired FR2126906B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7044759A FR2126906B1 (en) 1970-12-11 1970-12-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7044759A FR2126906B1 (en) 1970-12-11 1970-12-11

Publications (2)

Publication Number Publication Date
FR2126906A1 true FR2126906A1 (en) 1972-10-13
FR2126906B1 FR2126906B1 (en) 1977-01-21

Family

ID=9065653

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7044759A Expired FR2126906B1 (en) 1970-12-11 1970-12-11

Country Status (1)

Country Link
FR (1) FR2126906B1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1101796B (en) * 1958-05-24 1961-03-09 Zeiss Carl Fa Beam splitting changer for photomicroscopes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1101796B (en) * 1958-05-24 1961-03-09 Zeiss Carl Fa Beam splitting changer for photomicroscopes

Also Published As

Publication number Publication date
FR2126906B1 (en) 1977-01-21

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Legal Events

Date Code Title Description
ST Notification of lapse