FR2111866A1 - - Google Patents
Info
- Publication number
- FR2111866A1 FR2111866A1 FR7138633A FR7138633A FR2111866A1 FR 2111866 A1 FR2111866 A1 FR 2111866A1 FR 7138633 A FR7138633 A FR 7138633A FR 7138633 A FR7138633 A FR 7138633A FR 2111866 A1 FR2111866 A1 FR 2111866A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42324—Gate electrodes for transistors with a floating gate
- H01L29/42332—Gate electrodes for transistors with a floating gate with the floating gate formed by two or more non connected parts, e.g. multi-particles flating gate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
- H01L29/7883—Programmable transistors with only two possible levels of programmation charging by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Non-Volatile Memory (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP45094482A JPS5036955B1 (en) | 1970-10-27 | 1970-10-27 | |
JP1895971A JPS5641182B1 (en) | 1970-10-27 | 1971-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2111866A1 true FR2111866A1 (en) | 1972-06-09 |
FR2111866B1 FR2111866B1 (en) | 1976-10-29 |
Family
ID=26355728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7138633A Expired FR2111866B1 (en) | 1970-10-27 | 1971-10-27 |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE7139683U (en) |
FR (1) | FR2111866B1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1984000852A1 (en) * | 1982-08-12 | 1984-03-01 | Ncr Co | Non-volatile semiconductor memory device |
FR2533740A1 (en) * | 1982-09-24 | 1984-03-30 | Hitachi Ltd | REMANENT MEMORY |
EP0843360A1 (en) * | 1996-11-15 | 1998-05-20 | Hitachi Europe Limited | Memory device |
EP0843361A1 (en) * | 1996-11-15 | 1998-05-20 | Hitachi Europe Limited | Memory device |
US6169308B1 (en) | 1996-11-15 | 2001-01-02 | Hitachi, Ltd. | Semiconductor memory device and manufacturing method thereof |
US6642574B2 (en) | 1997-10-07 | 2003-11-04 | Hitachi, Ltd. | Semiconductor memory device and manufacturing method thereof |
US6753568B1 (en) | 1996-11-15 | 2004-06-22 | Hitachi, Ltd. | Memory device |
-
1971
- 1971-10-20 DE DE19717139683 patent/DE7139683U/en not_active Expired
- 1971-10-27 FR FR7138633A patent/FR2111866B1/fr not_active Expired
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1984000852A1 (en) * | 1982-08-12 | 1984-03-01 | Ncr Co | Non-volatile semiconductor memory device |
FR2533740A1 (en) * | 1982-09-24 | 1984-03-30 | Hitachi Ltd | REMANENT MEMORY |
EP0843360A1 (en) * | 1996-11-15 | 1998-05-20 | Hitachi Europe Limited | Memory device |
EP0843361A1 (en) * | 1996-11-15 | 1998-05-20 | Hitachi Europe Limited | Memory device |
US5952692A (en) * | 1996-11-15 | 1999-09-14 | Hitachi, Ltd. | Memory device with improved charge storage barrier structure |
US6169308B1 (en) | 1996-11-15 | 2001-01-02 | Hitachi, Ltd. | Semiconductor memory device and manufacturing method thereof |
US6753568B1 (en) | 1996-11-15 | 2004-06-22 | Hitachi, Ltd. | Memory device |
US6825527B2 (en) | 1996-11-15 | 2004-11-30 | Hitachi, Ltd. | Semiconductor memory device and manufacturing method |
US6642574B2 (en) | 1997-10-07 | 2003-11-04 | Hitachi, Ltd. | Semiconductor memory device and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
DE7139683U (en) | 1972-09-21 |
FR2111866B1 (en) | 1976-10-29 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property |