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EP3961671A8 - Ion milling apparatus and sample holder - Google Patents

Ion milling apparatus and sample holder Download PDF

Info

Publication number
EP3961671A8
EP3961671A8 EP21189481.1A EP21189481A EP3961671A8 EP 3961671 A8 EP3961671 A8 EP 3961671A8 EP 21189481 A EP21189481 A EP 21189481A EP 3961671 A8 EP3961671 A8 EP 3961671A8
Authority
EP
European Patent Office
Prior art keywords
sample
milling apparatus
ion milling
milled
sample holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21189481.1A
Other languages
German (de)
French (fr)
Other versions
EP3961671A1 (en
Inventor
Shogo Kataoka
Tatsuro Mino
Koji Todoroki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Publication of EP3961671A1 publication Critical patent/EP3961671A1/en
Publication of EP3961671A8 publication Critical patent/EP3961671A8/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

There is provided an ion milling apparatus capable of reliably supporting a part of a sample to be milled and of suppressing material sputtered off by ion beam irradiation from remaining on the sample. The ion milling apparatus (10) has: a sample holder (27) including a shield member (29) for shielding the sample (11) except for a portion to be milled (11b); and a sample locking member (31) cooperating with the shield member (29) such that the sample (11) is sandwiched and held therebetween (31, 29). The shield member (29) has an edge portion (29a) that determines a milling position on or in the sample (11). The sample locking member (31) is disposed downstream of the edge portion (29a) in the direction of irradiation by the ion beam (12) and has a support portion (33) cooperating with the edge portion (29a) to support the milled portion (11b) therebetween (29a, 33). The support portion (33) has a first surface (34) making contact with the sample (11) and a second surface (35) making a given angle (θ) to the first surface (34). The given angle (θ) is equal to or less than 90°.
EP21189481.1A 2020-08-14 2021-08-03 Ion milling apparatus and sample holder Pending EP3961671A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020136922A JP7208195B2 (en) 2020-08-14 2020-08-14 Ion milling device and sample holder

Publications (2)

Publication Number Publication Date
EP3961671A1 EP3961671A1 (en) 2022-03-02
EP3961671A8 true EP3961671A8 (en) 2022-04-13

Family

ID=77207035

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21189481.1A Pending EP3961671A1 (en) 2020-08-14 2021-08-03 Ion milling apparatus and sample holder

Country Status (3)

Country Link
US (1) US11562886B2 (en)
EP (1) EP3961671A1 (en)
JP (1) JP7208195B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7208195B2 (en) * 2020-08-14 2023-01-18 日本電子株式会社 Ion milling device and sample holder
KR20240130798A (en) * 2022-03-10 2024-08-29 주식회사 히타치하이테크 Ion milling device
EP4283277A1 (en) 2022-05-24 2023-11-29 Leica Mikrosysteme GmbH Sample holder, loading device, and method for inserting a sample into a sample holder

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4200665B2 (en) * 2001-05-08 2008-12-24 株式会社日立製作所 Processing equipment
KR100408415B1 (en) * 2001-06-20 2003-12-06 삼성전자주식회사 Sample holder, auxiliary apparatus for holding sample in the sample holder and Method of holding sample using the same
JP2006261070A (en) 2005-03-18 2006-09-28 Nagoya Institute Of Technology Sample fixing fixture
JP4922632B2 (en) 2006-03-17 2012-04-25 日本電子株式会社 Cross-section sample preparation method using ion beam
JP2010009774A (en) 2008-06-24 2010-01-14 Nippon Steel Corp Sample stand and sample holder
JP5491639B2 (en) * 2010-11-05 2014-05-14 株式会社日立ハイテクノロジーズ Ion milling equipment
JP5480110B2 (en) * 2010-11-22 2014-04-23 株式会社日立ハイテクノロジーズ Ion milling apparatus and ion milling processing method
WO2014199737A1 (en) * 2013-06-10 2014-12-18 株式会社 日立ハイテクノロジーズ Ion milling device
WO2015122713A1 (en) * 2014-02-14 2015-08-20 한국과학기술원 Cross section sample preparation apparatus and rotational cross section sample preparation apparatus
KR101522875B1 (en) 2014-02-14 2015-05-26 한국과학기술원 Specimen preparation apparatus
JP6336894B2 (en) 2014-11-21 2018-06-06 日本電子株式会社 Sample preparation equipment
WO2017134764A1 (en) * 2016-02-03 2017-08-10 株式会社日立ハイテクノロジーズ Sample holder, ion milling apparatus, sample processing method, sample observation method, and sample processing/observation method
US11621141B2 (en) 2016-02-26 2023-04-04 Hitachi High-Tech Corporation Ion milling device and ion milling method
US10832889B2 (en) * 2016-08-09 2020-11-10 Hitachi High-Tech Corporation Charged particle beam device
JP6817139B2 (en) 2017-05-09 2021-01-20 日本電子株式会社 Sample holder unit and sample observation device
JP6796552B2 (en) * 2017-05-26 2020-12-09 日本電子株式会社 Ion milling device and sample holder
JP6943641B2 (en) * 2017-06-12 2021-10-06 日本電子株式会社 Sample holder system and sample observation device
JP6843790B2 (en) * 2018-03-13 2021-03-17 日本電子株式会社 Ion milling device and sample holder
KR102478946B1 (en) * 2018-06-22 2022-12-19 주식회사 히타치하이테크 ion milling device
JP7208195B2 (en) * 2020-08-14 2023-01-18 日本電子株式会社 Ion milling device and sample holder

Also Published As

Publication number Publication date
EP3961671A1 (en) 2022-03-02
US11562886B2 (en) 2023-01-24
JP7208195B2 (en) 2023-01-18
US20220051870A1 (en) 2022-02-17
JP2022032762A (en) 2022-02-25

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