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EP3899497B1 - Laser device for polarization interferometry - Google Patents

Laser device for polarization interferometry Download PDF

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Publication number
EP3899497B1
EP3899497B1 EP19845705.3A EP19845705A EP3899497B1 EP 3899497 B1 EP3899497 B1 EP 3899497B1 EP 19845705 A EP19845705 A EP 19845705A EP 3899497 B1 EP3899497 B1 EP 3899497B1
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sample
modulated
photo
ref
phase
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German (de)
French (fr)
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EP3899497A1 (en
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Julien Vaillant
Aurélien BRUYANT
Tzu-Heng Wu
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Phaselab Instrument
Universite de Technologie de Troyes
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Phaselab Instrument
Universite de Technologie de Troyes
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons
    • G01N21/554Attenuated total reflection and using surface plasmons detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/005Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/06213Amplitude modulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06233Controlling other output parameters than intensity or frequency
    • H01S5/06246Controlling other output parameters than intensity or frequency controlling the phase
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/0683Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/06832Stabilising during amplitude modulation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
    • G01N2021/396Type of laser source
    • G01N2021/399Diode laser
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/061Sources
    • G01N2201/06113Coherent sources; lasers
    • G01N2201/0612Laser diodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/068Optics, miscellaneous
    • G01N2201/0683Brewster plate; polarisation controlling elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/16Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
    • H01S2301/163Single longitudinal mode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/0622Controlling the frequency of the radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]

Definitions

  • the present invention generally relates to the field of interferometry and noise reduction in interferometers and other measuring devices derived from or coupled to interferometers such as ellipsometers or biosensors.
  • interferometric devices for ellipsometric measurements, such as in the European patent EP1893977B1 or in the French patent FR2685962 . It is also known to use interferometric devices for surface plasmon resonance (SPR) measurements to detect molecular targets, for example in international patent applications WO2017153378 of the inventors of the present application and WO2009080998A2 , or the US patent US7233396B2 . These devices often implement bulky and expensive equipment, such as acousto-optic modulators, photo-elastic modulators, or Fresnel rhombohedrons.
  • SPR surface plasmon resonance
  • phase modulation obtained by modulation of the birefringence of a component of the measuring device, such as those described in the American patent US7339681 B2 , where a liquid crystal cell is used, or in US patent US8004676B1 , where a photoelastic modulator is used.
  • a phase modulation can be obtained by modulation of the source beam wavelength, as in the international patent application WO2017/153378 , proposed by the present inventors, which describes a compact interferometer as well as a biochemical sensor derived therefrom, but which requires a particular optical chip producing two reflections, coming from two distant layers to carry out this modulation, which limits its application to samples particular and does not allow any optical excitation condition.
  • the drawback of the above-mentioned techniques lies in the size of their implementation device as well as in their cost, in order to obtain high accuracy and high measurement sensitivity.
  • An interesting approach to minimize the noise of the interferometers consists in using a polarization interferometer which measures the phase difference between two orthogonal components of the field, because in this case the path followed by the two components of the field can be relatively common. Nevertheless, the phase modulation of one component with respect to the other requires an optical separation of the beams and a particular apparatus like those mentioned above, such as for example a photoelastic modulator.
  • the technical problem which the inventors propose to solve is to simplify the implementation and to improve the sensitivity of interferometric measuring devices of the polarization interferometer type, and the integration of this type of device both within ellipsometers than within SPR devices and to reduce their size and weight by avoiding the use of conventional active phase modulators and the use of moving parts to determine the state of the phase shift within said interferometer at polarization.
  • the applicant has developed a laser device for polarization interferometry, suitable for delivering a temporally phase modulated laser beam according to claim 1.
  • the longitudinal single-mode laser source of the laser device can be a semiconductor laser whose wavelength can be modulated by the electric current supplying the laser over a range of tunability less than one thousandth of the wavelength. This low tunability is achieved by most consumer laser diodes.
  • the semiconductor laser that can constitute the longitudinal monomode laser source of the laser device can be a laser diode with a vertical cavity emitting via the so-called VCSEL surface.
  • VCSEL VCSEL surface
  • the passive phase-retarding element of the laser device may comprise a birefringent crystal having an optical axis oriented along one of said polarization components TE or TM of the source laser beam S source .
  • said reference electronic analysis unit is connected to the time modulation means of the laser source so as to form a feedback loop to stabilize the average phase shift ⁇ ref .
  • beam splitters having reflective or anti-reflective treatments on different interfaces may be useful to use beam splitters having reflective or anti-reflective treatments on different interfaces to avoid having multiple parasitic reflections.
  • Other means can nevertheless be used alone or in addition to suppress the parasitic multiple reflections such as the use of non-parallel faces, and/or by spatially discriminating the first reflection and the first transmission, this including the use of thick blades.
  • the present application also proposes a polarization interferometer configured to measure characteristics of a sample, according to claim 7.
  • the present application also proposes an ellipsometer configured to determine an ellipsometric parameter ⁇ ellipsometry of a sample, according to claim 9.
  • the present application also proposes a biosensor of the surface plasmon resonance detection system type configured to determine the characteristics of a sample consisting of a microfluidic layer MF, corresponding to the biological or biochemical medium to be analyzed, according to claim 12.
  • a first embodiment of a laser device D comprises a longitudinal single-mode laser source 1.
  • longitudinal single-mode source is meant a laser source comprising a single mode, or a laser source essentially having a main longitudinal mode and possibly other longitudinal modes weak enough, in comparison, to be ignored or filtered out.
  • the source is not necessarily transverse single mode, in the sense that a possibly complex field spatial distribution can be employed provided that the field can be considered as monochromatic.
  • This laser source 1 is powered by an electrical supply current.
  • the wavelength ⁇ of the monomode laser source 1 is temporally modulated by a temporal modulation means 2.
  • the source laser beam S source coming from the laser source 1 comprises two non-zero orthogonal rectilinear polarization components called transverse electric, TE, and transverse magnetic, TM.
  • the source laser beam S source passes through a passive phase delay element 3 which introduces a phase shift between the TE and TM components of the source laser beam S source . Due to the temporal modulation of the wavelength of the laser source 1, the phase difference between the TE and TM components is also temporally modulated.
  • the beam coming from the passive phase delay element 3 is a modulated S-phase temporally modulated laser beam.
  • phase-modulated laser beam is meant a laser beam in which the two polarization components are modulated relative to each other. In said device, the phase modulation can be achieved by maintaining a constant geometric path for the two components of the field and without an active modulation device other than the modulation of the laser source itself, the component where the modulation occurs being passive. .
  • phase modulation can be achieved by maintaining a constant geometric path for the two field components
  • the geometric path traveled by the two field components does not change in time, in particular at the level of the element where the phase shift occurs between these components, that is to say in the passive phase retarding element which is therefore fixed and advantageously monolithic for better stability.
  • the laser source 1 is a semiconductor laser, for example a vertical cavity laser diode emitting through the VCSEL surface.
  • the temporal modulation of the wavelength of the laser source 1 can be carried out by temporally modulating the electrical supply current of the laser source 1.
  • the temporal modulation of the wavelength of the laser source 1 is typically performed over a tunability range less than one thousandth of the wavelength. Thus, it is not necessary to resort to birefringence modulation or another type of modulator to cause this phase modulation between said components of the field.
  • the passive phase delay element 3 can for example comprise or consist of a component exhibiting birefringence, such as a birefringent crystal.
  • the birefringent crystal advantageously has an optical axis along one of the two orthogonal transverse components of polarization of the source laser beam.
  • these two polarization components are named TE and TM for "transverse electric” and “transverse magnetic” with reference to a certain plane of predetermined incidence.
  • the geometric path followed by the components of the TE and TM field can then be entirely common.
  • the phase modulation between the two components of the field is thus generated independently of the nature of any sample intercepting the beam, and of the optics used to excite the sample such as lenses, prisms or coupling gratings.
  • the light beams of the TE and TM field components are spatially superimposed.
  • Such a configuration allows, for example, a pooling of the noise undergone by the different beams, making the device more stable, this despite the difference in the optical paths traveled by the TE and TM components.
  • the optical path is defined by the product of the refractive index encountered by the geometric path.
  • the optics used to excite the sample make it possible, for example, to define the angle(s) of incidence and more generally the lighting conditions on the sample.
  • exciting the sample it is understood to generate, using the laser device, an electromagnetic field, within the sample.
  • the laser device D may also have a reference arm comprising a reference beam splitter 4 which makes it possible to take from the output of the passive phase delay element 3 a reference portion of the modulated laser beam temporally modulated in phase S, called S reference , propagating in a direction other than that of the modulated S phase temporally modulated laser beam.
  • This reference portion S reference is sent to a reference polarizer 5' through which the two components TE and TM of this reference portion S reference interfere. Following its passage through the reference polarizer 5', the reference portion S reference is intercepted by a reference photo-detector 5 which delivers a modulated electrical signal I ref .
  • the modulated electrical signal I ref is received and analyzed by a reference electronic analysis unit 6a.
  • the modulated electrical signal I ref includes an interferometric term modulated temporally in phase and having an amplitude A ref proportional to the product of the amplitudes of the two transverse electrical TE and transverse magnetic TM components of the reference portion S reference .
  • the reference electronic analysis unit 6a is capable of extracting from this electrical signal I ref , comprising a phase-modulated interferometric term, the average phase shift ⁇ ref between the two transverse electrical TE and transverse magnetic TM components of the portion of reference S reference , and in extracting said amplitude term A ref .
  • This method thus makes it possible to extract said phase shift ⁇ ref without ambiguity over its definition interval.
  • other extraction methods can be considered for particular temporal modulation functions, such as methods based on successive constant phase shifts, or the use of so-called serodyne ramp modulation. Particular attention should be paid to the fact that the current modulation also leads to a temporal modulation of the laser intensity, which leads to a modulation of the intensity terms.
  • This additional modulation can falsify the measurement of the phase shift if it is not taken into account in the processing.
  • a generalized synchronous detection such as that mentioned, makes it possible to process signals whose amplitude is also modulated temporally and makes it possible to overcome this difficulty, ideally by adjusting the depth of phase modulation. Otherwise, this modulation on said intensity terms E YOU 2 , E TM 2 And AT ref 2 can be neglected at the cost of a certain error, or else the intensity I ref measured can be corrected to compensate for this modulation, knowing the modulation function used.
  • the laser device thus formed is called D′.
  • the reference electronic analysis unit 6a can supply a correction coefficient to the temporal modulation means 2 of the laser source 1 so as to adjust the temporal modulation of the laser source 1 and to stabilize its average wavelength ⁇ .
  • the reference electronic analysis unit 6a can be connected to the time modulation means 2 of the laser source so as to form a control loop to stabilize the average phase shift ⁇ ref .
  • THE figures 2a and 2b illustrate two polarization interferometers, one, I, following the figure 2a , comprising a laser device D, and the other, I', according to the figure 2b , comprising a laser device D′.
  • the interferometers I and I' comprise, in a part A at the output of the laser devices respectively D, or D', an opto-mechanical interface 70 illuminated by a temporally modulated laser beam in phase S modulated coming from the laser device D, or D' , and transmitting the modulated S phase temporally modulated laser beam towards a sample 7 of which it is desired to optically measure certain characteristics by the relative phase shift and possibly the relative attenuation that it induces between the two components of the field.
  • the modulated S phase temporally modulated laser beam then interacts with the sample 7 so as to generate an output beam S sample which can be transmitted, reflected or even diffracted by the sample.
  • the sample S output beam passes through an analysis polarizer 8' through which the two components TE and TM of the sample S output beam interfere.
  • the output beam S sample is intercepted by an analysis photo-detector 8 which delivers a modulated electrical signal I sample representative of the interference between the two components TE and TM of the output beam S sample .
  • This modulated electric signal I sample is received and analyzed by an electronic analysis unit 6b.
  • the modulated electrical signal I sample representative of the output beam S sample includes a squared amplitude term AT e sample 2 proportional to the product of the amplitudes of the two transverse electric TE and transverse magnetic TM components of the output beam S sample , a phase term ⁇ sample , and a temporal modulation of the phase, that is to say of the phase shift between the two components of polarization.
  • said phase shift includes an optical phase shift increment ⁇ between the two transverse electric TE and transverse magnetic TM components which is induced by the sample 7 during the reflection, transmission or diffraction resulting from the interaction with the sample, produced by one or more optical components such as lenses, mirrors, or gratings, used in particular to convey light onto the solid, gaseous or liquid sample under the illumination conditions desired by the user.
  • optical components such as lenses, mirrors, or gratings
  • the type l' polarization interferometer illustrated in figure 2b can also be used as an ellipsometer operating in reflection or in transmission.
  • a sample 7 is placed at the level of the interface 70 of the interferometer with polarization I′.
  • the modulated S-phase modulated laser beam, incident on the sample 7, is reflected specularly at the surface of the latter, or else is transmitted specularly by the latter for transmission, and propagates into an output beam S sample intercepted by the analysis polarizer 8' and the analysis photo-detector 8.
  • the electronic analysis unit 6b makes it possible, as explained above, to extract the ellipsometric parameter ⁇ ellipsometry , by the formula ⁇ ellipsometry + ⁇ sample - ⁇ ref up to an additive constant.
  • FIG. 3a illustrates a first variant of the ellipsometer presented at the figure 2b , in which Part A includes additional elements described below.
  • the ellipsometer previously described further comprises a first additional detection channel making it possible to determine an ellipsometric parameter tan ⁇ of a sample 7.
  • This additional channel comprises a first polarization-selective beam splitter device 9a in upstream of the analysis polarizer 8', which makes it possible to take a portion of the output beam S sample and to filter one of the two transverse electric TE or transverse magnetic TM components of this portion of the output beam S sample in the form of a S tan ⁇ beam called polarized portion.
  • This polarized portion S tan ⁇ is intercepted by a photo-detector for complete ellipsometry 10 which generates an electrical signal I tan ⁇ characteristic of the light intensity of the polarized portion.
  • the ellipsometric parameter tan ⁇ of the sample is then determined using the quantities A sample and I tan ⁇ resulting respectively from the analysis of the signal I sample resulting from the analysis photo-detector 8 and from the photo-detector for complete ellipsometry 10 .
  • FIG 3b illustrates a second variant of the ellipsometer presented at the figure 2b , in which Part A includes additional elements described below.
  • the ellipsometer previously described in figure 2b further comprises a second additional detection channel making it possible to determine an ellipsometric parameter tan ⁇ of a sample 7.
  • This additional detection channel comprises a second polarization-selective beam splitter device 9b upstream of the analysis polarizer 8', which allows to take a portion of the output beam S sample and to select the two transverse electric TE and transverse magnetic TM components of this portion of the output beam S sample in the form of two beams S tan ⁇ _TE and S tan ⁇ _TM called respectively polarized portion TE and portion polarized TM and propagating in two different directions.
  • the polarized portion TE and the polarized portion TM are each received respectively by a photo-detector 101 and a photo-detector 102, respectively called photo-detector TE and photo-detector TM.
  • the ellipsometric parameter tan ⁇ of the sample is then determined using the electrical signals I tan ⁇ _TE and I tan ⁇ _TM from the photo-detector TE 101 and photo-detector TM 102.
  • FIG. 5 schematically illustrates a biosensor of the surface plasmon resonance detection system type, comprising a laser device D and able to determine the characteristics of a sample consisting of an optical resonator ME interacting with a microfluidic layer MF, corresponding to the biological medium or biochemical to be analyzed 7.
  • This biosensor comprises in a part A at the output of the laser device D (like the interferometer I described above), and receiving a temporally modulated laser beam in phase S modulated , a removable biochip 11 which may comprise a prism 110 or more generally a coupling optic able to optically excite the sample formed by the optical resonator ME in interaction with the microfluidic layer MF representing the medium 7 to be analyzed.
  • This biochip is positioned at an interface 70 and intercepts the modulated S phase temporally modulated laser beam.
  • This excites a surface plasmon resonance wave at the surface of the metal layer ME of the biochip, which interacts with the medium to be analyzed 7 at the level of the interface with the microfluidic layer before being reflected producing a beam S sample .
  • the output beam S sample is intercepted by an analysis polarizer 8' followed by an analysis photo-detector 8 delivering an electrical signal I sample .
  • An electronic analysis unit 6b connected to the analysis photo-detector 8 makes it possible, as explained above, to determine the characteristics of said sample 7.
  • the figures 6a and 6b illustrate the type of measurements that can be obtained with a biosensor as described previously and illustrated on the figure 5 . These figures will be described in more detail in the examples presented below.
  • the temporal modulation is typically performed by modulating the injection current of the longitudinal monomode laser source used.
  • the modulation is preferably sinusoidal but other modulations can be used with a view to carrying out discrete or continuous phase shift interferometric detection.
  • the modulation of the injection current i(t) is, as mentioned, of the type: i 0 + ⁇ sin( ⁇ t).
  • i 0 is typically of the order of 4 mA.
  • a phase modulation is created between the TE and TM components as soon as the beam passes through the birefringent crystal YVO4 mentioned above.
  • ⁇ l is the optical path difference between the two components of the field within the delay element 3.
  • Sensors and Actuators A Physical, 268, 188-192 .
  • this choice of phase modulation depth makes it easier to analyze the resulting interferometric signal and to extract the amplitude information A sample and the phase term sought ⁇ sample simply.
  • the birefringence (n e -n o ) and the length L of the YVO4 crystal are such that the optical path difference given by the product L(n e -n o ) is at minimum of the order of magnitude of a millimeter, which corresponds to a cumulative phase shift between the TM component and the TE component of the order of 10,000 radians for visible light.
  • This cumulative optical path difference is achieved with the previously mentioned components.
  • An ellipsometer is produced as described previously and illustrated in figure 2b to determine a parameter ⁇ ellipsometry , from the laser device described in example 1.
  • EXAMPLE 3 Ellipsometric measurements of indices and thicknesses of samples of multilayers of the thin film type
  • the ellipsometric parameter ⁇ ellipsometry is obtained as in example 2.
  • the parameter (tan ⁇ ) 2 can be obtained, depending on the experimental configuration used, either by the equation tan ⁇ 2 ⁇ AT e sample 2 I you To not ⁇ , if the TE component is recovered by the first additional detection channel, or the reverse if the TM component is recovered by the first additional detection channel.
  • the proportionality coefficient between (tan ⁇ ) 2 and A 2 sample /I tan ⁇ can be predetermined simply by a calibration experiment on a known sample. In this example, the proportionality coefficient is determined beforehand by measuring the parameter tan ⁇ on a known sample.
  • EXAMPLE 4 Ellipsometric measurements of indices and thicknesses of samples of the thin layers or multilayer stacks type
  • the ellipsometric parameter ⁇ ellipsometry is obtained as in examples 2 and 3.
  • the parameter tan ⁇ is directly obtained by its square: tan ⁇ 2 ⁇ I you To not ⁇ _ TM I you To not ⁇ _ YOU with I tan ⁇ _TE and I tan ⁇ _TM the signals coming from the photo-detector TE and photo-detector TM.
  • the proportionality coefficient is equal to unity if the beams are shared in identical proportions. In practice, the coefficient can be predetermined simply by a calibration experiment, for example on a known sample. From the parameters ⁇ ellipsometry and tan ⁇ , it is possible to determine, as conventionally in ellipsometry, the complex index and the thickness of layers within the measured sample.
  • the analysis photo-detector 8 is an imager allowing multipoint measurement.
  • the biosensor is used in the so-called Kretschmann configuration via the prism (110).
  • FIG 6a illustrates the measurement of the functionalization of the gold layer in contact with the microfluidic layer of thiolated PEG. This type of measurement makes it possible to obtain optogeometric information on the deposited layer and here in particular to know the time at the end of which the reaction only changes slightly (eg 3500 seconds).
  • EXAMPLE 6 Surface plasmon resonance type measurements and detection of different amounts of 40 mer DNA
  • FIG. 6b illustrates measurements aimed at detecting different amounts of DNA binding to the surface (phase sensorgrams), via the variations of the parameter ⁇ over time within the different regions of interest.
  • the comparison with the reference signals makes it possible to overcome fluctuations in the parameters amplitude and phase unrelated to the target itself, such as environmental variations such as temperature variations at the level of the chip itself.
  • the microfluidic layer used here is composed of complementary DNA strands of 40 mer codons.
  • the curves of different color levels black to light gray
  • the curves of different color levels thus show a kinetics of variation characteristic of the concentrations analyzed, here from 25 nM to 500 nM.
  • the curves observed follow a conventional adsorption process of the isothermal Langmuir type.
  • the SPR type measurements above, carried out with a laser device according to example 1, can also be carried out using a laser device as proposed in the present application having other characteristics.
  • a laser source operating at a completely different wavelength, such as in the mid-infrared or near-infrared, for example with a VCSEL operating at a wavelength of about 850 mm with the same modulation of phase, or 3.84rad, and adapting the current modulation in mA to achieve this phase modulation, as well as the system components to operate at this wavelength.
  • another embodiment may include multi-angle measurements, where, in both cases of applications to ellipsometry or surface plasmon resonance detection, measurements at several angles of incidence are performed, or conversely, the beam at the output of the measured sample is separated after interaction with the sample at several different angles.
  • a cylindrical lens can for example be placed upstream of the interface receiving the samples to be tested to obtain a focused beam in the plane of incidence, thus giving a plurality of angles of incidence illuminating the sample, the latter reflecting the extended beam received in several directions picked up by a linear detector (of the diode array type for example).
  • the analysis photo-detectors 8, photo-detector for complete ellipsometry 10, and TE photo-detector and TM photo-detector 101 and 102 can be two-dimensional sensors making it possible to image samples to be measured and to obtain two-dimensional maps of the characteristics of these samples.
  • all types two-dimensional sensors can be used, such as CCD or CMOS sensors, or photodetectors having a reduced number of detection zones such as quadrant photodiodes which can also help in centering the beam.
  • ellipsometric measurements in transmission can be carried out in the case of sufficiently transparent samples.
  • a plurality of laser optical sources can also be employed to extend the spectral domain of analysis.
  • the ellipsometric analysis can be extended to obtain additional information on the sample from the ellipsometric parameters determined from a model that can take into account in particular the density or the roughness of a layer.
  • the SPR device being able to integrate an ellipsometric measurement
  • the latter can be used to determine the characteristics of the layers making up the biochip, for example the thickness of the gold deposit, or the thickness (or the density) of a layer of functionalization, or even the molecular layers resulting from the analyte crossing the microfluidic layer clinging to the surface.
  • the biochip can be prepared for the measurement of any biochemical species (pathogens, proteins, bacteria, biomarkers) using the ellipsometric measurement device at each step of the functionalization process, which is typically carried out on SPR biochips to allow the detection of a target in particular using antibodies, DNA or aptamers.
  • optomechanical interfaces 70 are not limiting.
  • SPR devices typically require a coupling element as in the examples given in this description.
  • the coupling element makes it possible to obtain, if necessary, a plurality of excitation angles.
  • the preferred excitation of SPR devices is excitation at a supercritical angle known as the Kretschmann configuration.
  • the essential role of the opto-mechanical interface is to define the angle(s) of incidence and more generally the lighting conditions on the sample.

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Description

La présente invention concerne de manière générale le domaine de l'interférométrie et la réduction de bruit dans les interféromètres et autres dispositifs de mesure dérivés ou couplés à des interféromètres tels que des ellipsomètres ou des biocapteurs.The present invention generally relates to the field of interferometry and noise reduction in interferometers and other measuring devices derived from or coupled to interferometers such as ellipsometers or biosensors.

Il est connu d'utiliser des dispositifs interférométriques pour des mesures ellipsométriques, tels que dans le brevet européen EP1893977B1 ou dans le brevet français FR2685962 . Il est également connu d'utiliser des dispositifs interférométriques pour des mesures de résonance de plasmon de surface (SPR) permettant de détecter des cibles moléculaires, par exemple dans les demandes de brevet international WO2017153378 des inventeurs de la présente demande et WO2009080998A2 , ou le brevet américain US7233396B2 . Ces dispositifs mettent en oeuvre souvent du matériel encombrant et coûteux, tels que des modulateurs acousto-optiques, des modulateurs photo-élastiques, ou des rhomboèdres de Fresnel.It is known to use interferometric devices for ellipsometric measurements, such as in the European patent EP1893977B1 or in the French patent FR2685962 . It is also known to use interferometric devices for surface plasmon resonance (SPR) measurements to detect molecular targets, for example in international patent applications WO2017153378 of the inventors of the present application and WO2009080998A2 , or the US patent US7233396B2 . These devices often implement bulky and expensive equipment, such as acousto-optic modulators, photo-elastic modulators, or Fresnel rhombohedrons.

Les documents suivants concernent le domaine de l'invention :

  • Aurélien Bruyant ET AL : « Interferometry Using Generalized Lock-in Amplifier (G-LIA): A versatile approach for Phase-Sensitive Sensing and Imaging" in "Optical Interferometry", 15 février 2017, InTech, XP55635442, pages 210-211 ;
  • US 5305330A ;
  • US 5374991 A ;
Watkins L R: "Novel interferometric ellipsometer with wavelength swept source", LASER AND ELECTRO-OPTICS, 2004 (CLEO), CONFERENCE ON SAN FRANCISCO, CA, USA, May 20-21, 2004, Piscataway, NJ, USA, IEEE, vol. 1, 17 mai 2004, pages 1043-1045, XP010745760 .The following documents relate to the field of the invention:
  • Aurélien Bruyant ET AL: "Interferometry Using Generalized Lock-in Amplifier (G-LIA): A versatile approach for Phase-Sensitive Sensing and Imaging" in "Optical Interferometry", February 15, 2017, InTech, XP55635442, pages 210-211 ;
  • US 5305330A ;
  • US 5374991A ;
Watkins LR: "Novel interferometric ellipsometer with wavelength swept source", LASER AND ELECTRO-OPTICS, 2004 (CLEO), CONFERENCE ON SAN FRANCISCO, CA, USA, May 20-21, 2004, Piscataway, NJ, USA, IEEE, vol. 1, 17 May 2004, pages 1043-1045, XP010745760 .

Dans les deux cas, mesures ellipsométriques ou mesures par résonance de plasmon de surface, une grande résolution en phase est nécessaire afin d'améliorer la sensibilité des mesures. Cette grande résolution peut être apportée par une modulation temporelle de la phase des signaux traversant les dispositifs de mesure. En effet, un avantage intrinsèque des divers systèmes à modulation de phase par rapport à d'autre systèmes de mesure de signaux stationnaires dépourvus de modulateur de phase est la réduction de bruit que permet une analyse fréquentielle dans la récupération de l'amplitude et de la phase, notamment grâce à l'emploi de détections synchrones aux fréquences de modulation du signal interférométrique détecté. Le brevet américain US5485271A décrit un ellipsomètre interférométrique incorporant un modulateur de phase électro-optique. D'autres techniques permettent une modulation de phase obtenue par modulation de la biréfringence d'un composant du dispositif de mesure, telles celles décrites dans le brevet américain US7339681 B2 , où une cellule à cristaux liquides est utilisée, ou dans le brevet américain US8004676B1 , où un modulateur photo-élastique est utilisé. Aussi, une modulation de phase peut être obtenue par modulation de la longueur d'onde du faisceau source, comme dans la demande de brevet international WO2017/153378 , proposé par les présents inventeurs, qui décrit un interféromètre compact ainsi qu'un capteur biochimique en dérivant, mais qui nécessite une puce optique particulière produisant deux réflexions, issues de deux couches distantes pour réaliser cette modulation, ce qui limite son application à des échantillons particuliers et ne permet pas une condition d'excitation optique quelconque.In both cases, ellipsometric measurements or measurements by surface plasmon resonance, a high phase resolution is necessary in order to improve the sensitivity of the measurements. This high resolution can be provided by temporal modulation of the phase of the signals passing through the measurement devices. Indeed, an intrinsic advantage of the various systems with phase modulation compared to other systems for measuring stationary signals without a phase modulator is the noise reduction that allows a frequency analysis in the recovery of the amplitude and the phase, in particular thanks to the use of detections synchronous to the modulation frequencies of the detected interferometric signal. The US patent US5485271A describes an interferometric ellipsometer incorporating an electro-optical phase modulator. Other techniques allow phase modulation obtained by modulation of the birefringence of a component of the measuring device, such as those described in the American patent US7339681 B2 , where a liquid crystal cell is used, or in US patent US8004676B1 , where a photoelastic modulator is used. Also, a phase modulation can be obtained by modulation of the source beam wavelength, as in the international patent application WO2017/153378 , proposed by the present inventors, which describes a compact interferometer as well as a biochemical sensor derived therefrom, but which requires a particular optical chip producing two reflections, coming from two distant layers to carry out this modulation, which limits its application to samples particular and does not allow any optical excitation condition.

Il est par ailleurs connu d'utiliser des interféromètres dits à chemin commun, dans lesquels le faisceau de référence et le faisceau signal lié à un échantillon se déplacent autant que possible le long d'un même trajet, pour réduire le bruit des mesures interférométriques, du fait de la bonne immunité de ce type d'interféromètres vis-à-vis des vibrations environnementales.It is also known to use so-called common path interferometers, in which the reference beam and the signal beam linked to a sample move as much as possible along the same path, to reduce the noise of the interferometric measurements, due to the good immunity of this type of interferometer with respect to environmental vibrations.

Il est connu également d'utiliser des interféromètres asymétriques où la différence de chemin optique entre les deux bras interférant est suffisamment grande pour qu'une faible modulation de longueur d'onde de la source de lumière utilisée entraîne une modulation de phase suffisante pour pouvoir extraire un signal d'amplitude et un signal de phase du signal interférométrique comme expliqué par Vaillant et al. dans « An unbalanced interferometer insensitive to wavelength drift ». Sensors and Actuators A: Physical, 268, 188-192 (2017 ). Dans ce type de dispositifs cependant, le chemin géométrique des deux faisceaux n'est pas commun, limitant ainsi la stabilité du système.It is also known to use asymmetric interferometers where the optical path difference between the two interfering arms is large enough for a low wavelength modulation of the light source used to cause a sufficient phase modulation to be able to extract an amplitude signal and a phase signal of the interferometric signal as explained by Valiant et al. in “An unbalanced interferometer insensitive to wavelength drift”. Sensors and Actuators A: Physical, 268, 188-192 (2017 ). In this type of device, however, the geometric path of the two beams is not common, thus limiting the stability of the system.

En outre, l'inconvénient des techniques précédemment citées réside dans l'encombrement de leur dispositif de mise en oeuvre ainsi que dans leur coût, afin d'obtenir une grande précision et une grande sensibilité de mesure. Une approche intéressante pour minimiser le bruit des interféromètres consiste à utiliser un interféromètre à polarisation qui mesure le déphasage entre deux composantes orthogonales du champ, car dans ce cas le trajet suivi par les deux composantes du champ peut être relativement commun. Néanmoins la modulation de phase d'une composante par rapport à l'autre nécessite une séparation optique des faisceaux et un appareillage particulier comme ceux mentionnés précédemment, comme par exemple un modulateur photo-élastique.In addition, the drawback of the above-mentioned techniques lies in the size of their implementation device as well as in their cost, in order to obtain high accuracy and high measurement sensitivity. An interesting approach to minimize the noise of the interferometers consists in using a polarization interferometer which measures the phase difference between two orthogonal components of the field, because in this case the path followed by the two components of the field can be relatively common. Nevertheless, the phase modulation of one component with respect to the other requires an optical separation of the beams and a particular apparatus like those mentioned above, such as for example a photoelastic modulator.

Le problème technique que se propose de résoudre les inventeurs est de simplifier la mise en oeuvre et d'améliorer la sensibilité d'appareils de mesure interférométriques de type interféromètre à polarisation, et l'intégration de ce type d'appareil aussi bien au sein d'ellipsomètres qu'au sein de dispositifs SPR et d'en réduire l'encombrement et le poids en évitant l'emploi de modulateurs de phase actifs conventionnels et l'usage de pièces mobiles pour déterminer l'état du déphasage au sein dudit interféromètre à polarisation.The technical problem which the inventors propose to solve is to simplify the implementation and to improve the sensitivity of interferometric measuring devices of the polarization interferometer type, and the integration of this type of device both within ellipsometers than within SPR devices and to reduce their size and weight by avoiding the use of conventional active phase modulators and the use of moving parts to determine the state of the phase shift within said interferometer at polarization.

Afin de résoudre ce problème tout en palliant les inconvénients précités, le demandeur a mis au point un dispositif laser pour interférométrie à polarisation, adapté pour délivrer un faisceau laser modulé temporellement en phase selon la revendication 1.In order to solve this problem while overcoming the aforementioned drawbacks, the applicant has developed a laser device for polarization interferometry, suitable for delivering a temporally phase modulated laser beam according to claim 1.

Avantageusement, la source laser monomode longitudinal du dispositif laser peut être un laser à semi-conducteur modulable en longueur d'onde par le courant électrique d'alimentation du laser sur une plage d'accordabilité inférieure à un millième de la longueur d'onde. Cette faible accordabilité est réalisée par l'essentiel des diodes laser grand public.Advantageously, the longitudinal single-mode laser source of the laser device can be a semiconductor laser whose wavelength can be modulated by the electric current supplying the laser over a range of tunability less than one thousandth of the wavelength. This low tunability is achieved by most consumer laser diodes.

De préférence, le laser à semi-conducteur pouvant constitué la source laser monomode longitudinal du dispositif laser peut être une diode laser à cavité verticale émettant par la surface dite VCSEL. Cependant, à défaut de VCSEL, des lasers plus largement accordables et typiquement plus onéreux peuvent être utilisés.Preferably, the semiconductor laser that can constitute the longitudinal monomode laser source of the laser device can be a laser diode with a vertical cavity emitting via the so-called VCSEL surface. However, in the absence of VCSEL, more widely tunable and typically more expensive lasers can be used.

Par ailleurs, l'élément retardateur de phase passif du dispositif laser peut comprendre un cristal biréfringent ayant un axe optique orienté selon l'une des dites composantes de polarisation TE ou TM du faisceau laser source Ssource.Furthermore, the passive phase-retarding element of the laser device may comprise a birefringent crystal having an optical axis oriented along one of said polarization components TE or TM of the source laser beam S source .

Le dispositif laser peut de plus comprendre :

  • un séparateur de faisceau de référence en sortie de l'élément retardateur de phase destiné à séparer le faisceau en au moins deux parties Sréférence et Smodulé, la première partie Sréférence étant une portion de référence du faisceau laser modulé temporellement en phase Smodulé, et ledit séparateur de faisceau étant configuré pour propager la portion de référence dans une direction différente de celle du faisceau laser modulé temporellement en phase Smodulé,
  • un photo-détecteur de référence comprenant une entrée destinée à recevoir par l'intermédiaire d'un polariseur de référence ladite portion de référence Sréférence, et ledit photo-détecteur de référence étant configuré pour générer un premier signal interférométrique, sous forme d'un premier signal électrique modulé Iref représentatif de ladite portion de référence Sréférence,
  • une unité d'analyse électronique de référence configurée pour recevoir et analyser ledit signal électrique Iref pour extraire un déphasage moyen Δref entre les deux composantes orthogonales transverse électrique TE et transverse magnétique TM de la portion de référence Sréférence,
  • ledit signal électrique modulé Iref représentatif de ladite portion de référence Sréférence incluant un terme d'amplitude Aref proportionnel au produit des amplitudes des deux composantes transverse électrique TE et transverse magnétique TM et un terme de phase,
  • ladite unité d'analyse électronique de référence étant configurée pour, par analyse dudit signal électrique Iref, extraire le déphasage moyen Δref entre les deux composantes transverse électrique TE et transverse magnétique TM de la portion de référence Sréférence, et extraire ledit terme d'amplitude Aref, et
  • l'unité d'analyse électronique de référence étant en outre configurée pour fournir un coefficient de correction au moyen de modulation temporelle de la source de sorte à ajuster la modulation temporelle de la source laser et à en stabiliser la longueur d'onde λ moyenne par stabilisation du déphasage moyen Δref.
The laser device may further comprise:
  • a reference beam splitter at the output of the phase delay element intended to separate the beam into at least two parts S reference and S modulated , the first part S reference being a reference portion of the temporally modulated laser beam in phase S modulated , and said beam splitter being configured to propagate the reference portion in a direction different from that of the modulated S-phase temporally modulated laser beam,
  • a reference photo-detector comprising an input intended to receive via a reference polarizer said reference portion S reference , and said reference photo-detector being configured to generate a first interferometric signal, in the form of a first modulated electrical signal I ref representative of said reference portion S reference ,
  • a reference electronic analysis unit configured to receive and analyze said electrical signal I ref to extract an average phase shift Δ ref between the two orthogonal transverse electrical TE and transverse magnetic TM components of the reference portion S reference ,
  • said modulated electrical signal I ref representative of said reference portion S reference including an amplitude term A ref proportional to the product of the amplitudes of the two transverse electrical TE and transverse magnetic TM components and a phase term,
  • said reference electronic analysis unit being configured to, by analysis of said electrical signal I ref , extract the average phase shift Δ ref between the two transverse electrical TE and transverse magnetic TM components of the reference portion S reference , and extracting said amplitude term A ref , and
  • the reference electronic analysis unit being further configured to supply a correction coefficient to the source temporal modulation means so as to adjust the temporal modulation of the laser source and to stabilize the mean wavelength λ thereof by stabilization of the average phase shift Δ ref .

Avantageusement, ladite unité d'analyse électronique de référence est reliée au moyen de modulation temporelle de la source laser de sorte à constituer une boucle d'asservissement pour stabiliser le déphasage moyen Δref.Advantageously, said reference electronic analysis unit is connected to the time modulation means of the laser source so as to form a feedback loop to stabilize the average phase shift Δ ref .

De manière optionnelle, pour faciliter l'alignement, il peut être utile d'utiliser des séparateurs de faisceau possédant des traitements réfléchissant ou anti-réfléchissant sur différentes interfaces pour éviter d'avoir des réflexions multiples parasites. D'autres moyens peuvent néanmoins être employés seuls ou en sus pour supprimer les réflexions multiples parasites comme l'utilisation de faces non parallèles, ou/et en discriminant spatialement la première réflexion et la première transmission, ceci incluant l'utilisation de lames épaisses.Optionally, to facilitate alignment, it may be useful to use beam splitters having reflective or anti-reflective treatments on different interfaces to avoid having multiple parasitic reflections. Other means can nevertheless be used alone or in addition to suppress the parasitic multiple reflections such as the use of non-parallel faces, and/or by spatially discriminating the first reflection and the first transmission, this including the use of thick blades.

La présente demande propose également un interféromètre à polarisation configuré pour mesurer des caractéristiques d'un échantillon, selon la revendication 7.The present application also proposes a polarization interferometer configured to measure characteristics of a sample, according to claim 7.

Le signal électrique modulé Iéchantillon représentatif du faisceau de sortie Séchantillon inclut un terme d'amplitude Aéchantillon proportionnel au produit des amplitudes des deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon et un terme de phase Δéchantillon incluant un incrément de déphasage optique Δ entre les deux composantes transverse électrique TE et transverse magnétique TM induit par l'échantillon. En conséquence, l'unité d'analyse électronique est configurée pour, par analyse dudit signal électrique Iéchantillon, extraire ledit terme d'amplitude Aéchantillon et ledit terme de phase moyen Δéchantillon entre les deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon permettant de déterminer les caractéristiques optiques dudit échantillon. Lorsque le dispositif laser comprend en outre:

  • un séparateur de faisceau de référence en sortie de l'élément retardateur de phase configuré pour séparer le faisceau en au moins deux parties Sréférence et Smodulé, ladite partie Sréférence étant une portion de référence du faisceau laser modulé temporellement en phase Smodulé, et étant configurée pour se propager dans une direction différente de celle du faisceau laser modulé temporellement en phase Smodulé,
  • un photo-détecteur de référence comprenant une entrée configurée pour recevoir par l'intermédiaire d'un polariseur de référence ladite portion de référence Sréférence, et ledit photo-détecteur de référence étant configuré pour générer un premier signal interférométrique, sous forme d'un premier signal électrique modulé Iref représentatif de ladite portion de référence Sréférence,
  • une unité d'analyse électronique de référence configurée pour recevoir et analyser ledit signal électrique Iref et déterminer Δéchantillon et Aéchantillon, alors l'incrément de déphasage optique Δ induit par l'échantillon est obtenu par la formule Δ = Δ échantillon Δ ref à une constante additive près .
    Figure imgb0001
The modulated electrical signal I sample representative of the output beam S sample includes an amplitude term A sample proportional to the product of the amplitudes of the two transverse electrical TE and transverse magnetic TM components of the output beam S sample and a phase term Δ sample including an optical phase shift increment Δ between the two transverse electric TE and transverse magnetic TM components induced by the sample. Consequently, the electronic analysis unit is configured to, by analyzing said electrical signal I sample , extract said amplitude term A sample and said mean phase term Δ sample between the two transverse electrical TE and transverse magnetic TM components of the output beam S sample making it possible to determine the optical characteristics of said sample. When the laser device further comprises:
  • a reference beam splitter at the output of the phase delay element configured to split the beam into at least two parts S reference and S modulated , said part S reference being a reference portion of the modulated laser beam temporally in phase S modulated , and being configured to propagate in a direction different from that of the modulated S-phase temporally modulated laser beam,
  • a reference photo-detector comprising an input configured to receive via a reference polarizer said reference portion S reference , and said reference photo-detector being configured to generate a first interferometric signal, in the form of a first modulated electrical signal I ref representative of said reference portion S reference ,
  • a reference electronic analysis unit configured to receive and analyze said electrical signal I ref and determine Δ sample and A sample , then the optical phase shift increment Δ induced by the sample is obtained by the formula Δ = Δ sample Δ ref To a constant additive close .
    Figure imgb0001

La présente demande propose également un ellipsomètre configuré pour déterminer un paramètre ellipsométrique Δellipsométrie d'un échantillon, selon la revendication 9.The present application also proposes an ellipsometer configured to determine an ellipsometric parameter Δ ellipsometry of a sample, according to claim 9.

Dans une première variante de l'ellipsomètre proposé, ce dernier peut comprendre en outre une première voie de détection supplémentaire, ladite première voie de détection supplémentaire comprenant :

  • un premier dispositif séparateur de faisceau sélectif en polarisation, configuré pour prélever une portion du faisceau de sortie Séchantillon et sélectionner une des deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon sous la forme d'un faisceau StanΨ appelé portion polarisée,
  • un photo-détecteur pour ellipsométrie complète configuré pour recevoir ladite portion polarisée StanΨ et générer un signal électrique ItanΨ caractéristique de l'intensité lumineuse de la portion polarisée,
où ladite première voie de détection supplémentaire est configurée pour déterminer le paramètre ellipsométrique tanΨ de l'échantillon à l'aide des signaux électriques Iéchantillon et ItanΨ issus respectivement du photo-détecteur d'analyse et du photo-détecteur pour ellipsométrie complète.In a first variant of the proposed ellipsometer, the latter may also comprise a first additional detection channel, said first additional detection channel comprising:
  • a first polarization-selective beam splitter device, configured to take a portion of the output beam S sample and select one of the two transverse electric TE and transverse magnetic TM components of the output beam S sample in the form of a beam S tanΨ called polarized portion,
  • a photo-detector for complete ellipsometry configured to receive said polarized portion S tanΨ and generate an electrical signal I tanΨ characteristic of the light intensity of the polarized portion,
where said first additional detection channel is configured to determine the ellipsometric parameter tanΨ of the sample using the electrical signals I sample and I tanΨ coming respectively from the analysis photo-detector and from the photo-detector for complete ellipsometry.

Dans une deuxième variante de l'ellipsomètre proposé, différente de la première variante décrite ci-dessus, celui-ci peut comprendre en outre une deuxième voie de détection supplémentaire, ladite deuxième voie de détection supplémentaire comprenant :

  • un deuxième dispositif séparateur de faisceau sélectif en polarisation configuré pour prélever une portion du faisceau de sortie Séchantillon et sélectionner les deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon sous la forme de deux faisceaux StanΨ_TE et StanΨ_TM appelés respectivement portion polarisée TE et portion polarisée TM,
  • deux photo-détecteurs appelés photo-détecteur TE et photo-détecteur TM configurés pour recevoir respectivement lesdites portion polarisée TE StanΨ_TE et portion polarisée TM StanΨ_TM et pour générer respectivement un signal électrique ItanΨ_TE caractéristique de l'intensité lumineuse de la portion polarisée TE StanΨ_TE et un signal électrique ItanΨ_TM caractéristique de l'intensité lumineuse de la portion polarisée TM StanΨ_TM,
dans lequel
la deuxième voie de détection supplémentaire est configurée pour déterminer le paramètre ellipsométrique tanΨ de l'échantillon à l'aide des signaux électriques ItanΨ_TE et ItanΨ_TM issus des photo-détecteur TE et photo-détecteur TM.In a second variant of the proposed ellipsometer, different from the first variant described above, the latter may also comprise a second additional detection channel, said second additional detection channel comprising:
  • a second polarization-selective beam splitter device configured to take a portion of the output beam S sample and select the two transverse electric TE and transverse magnetic TM components of the output beam S sample in the form of two beams S tanΨ_TE and S tanΨ_TM called respectively TE polarized portion and TM polarized portion,
  • two photo-detectors called photo-detector TE and photo-detector TM configured to respectively receive said polarized portion TE S tanΨ_TE and polarized portion TM S tanΨ_TM and to respectively generate an electrical signal I tanΨ_TE characteristic of the light intensity of the polarized portion TE S tanΨ_TE and an electrical signal I tanΨ_TM characteristic of the light intensity of the polarized portion TM S tanΨ_TM ,
in which
the second additional detection channel is configured to determine the ellipsometric parameter tanΨ of the sample using the electrical signals I tanΨ_TE and I tanΨ_TM from the photo-detector TE and photo-detector TM.

La présente demande propose aussi un biocapteur de type système de détection à résonance de plasmon de surface configuré pour déterminer des caractéristiques d'un échantillon constitué d'une couche microfluidique MF, correspondant au milieu biologique ou biochimique à analyser, selon la revendication 12.The present application also proposes a biosensor of the surface plasmon resonance detection system type configured to determine the characteristics of a sample consisting of a microfluidic layer MF, corresponding to the biological or biochemical medium to be analyzed, according to claim 12.

D'autres avantages et particularités de la présente demande résulteront de la description qui va suivre, donnée à titre d'exemple non limitatif et faite en référence aux figures annexées :

  • La figure 1a illustre de manière schématique un premier mode de réalisation d'un dispositif laser tel que proposé ;
  • La figure 1b illustre de manière schématique un deuxième mode de réalisation d'un dispositif laser tel que proposé ;
  • La figure 2a illustre de manière schématique un premier mode de réalisation d'un interféromètre à polarisation tel que proposé ;
  • La figure 2b illustre de manière schématique un deuxième mode de réalisation d'un interféromètre à polarisation tel que proposé ;
  • La figure 3a illustre de manière schématique la partie nommée A d'un interféromètre à polarisation tel que proposé pour la mise en oeuvre d'une première variante d'un ellipsomètre pour ellipsométrie complète ;
  • La figure 3b illustre de manière schématique la partie nommée A d'un interféromètre à polarisation tel que proposé pour la mise en oeuvre d'une deuxième variante d'un ellipsomètre pour ellipsométrie complète ;
  • La figure 4a montre des résultats expérimentaux obtenus avec un ellipsomètre pour ellipsométrie complète ;
  • La figure 4b montre des résultats expérimentaux obtenus avec un ellipsomètre pour ellipsométrie complète ;
  • La figure 5 illustre de manière schématique la partie nommée A d'un interféromètre à polarisation tel que proposé pour la mise en oeuvre d'un biocapteur de type système de détection à résonance plasmon de surface ;
  • La figure 6a montre des résultats expérimentaux obtenus avec un biocapteur de type système de détection à résonance plasmon de surface comme illustré sur la figure 5 ; et
  • La figure 6b montre des résultats expérimentaux obtenus avec un biocapteur de type système de détection à résonance plasmon de surface comme illustré sur la figure 5.
  • Les figures 1 à 6b sont commentées plus en détail au niveau de la description détaillée et des exemples qui suivent, qui illustrent l'invention sans en limiter la portée.
Other advantages and features of the present application will result from the following description, given by way of non-limiting example and made with reference to the appended figures:
  • There picture 1a schematically illustrates a first embodiment of a laser device as proposed;
  • There figure 1b schematically illustrates a second embodiment of a laser device as proposed;
  • There figure 2a schematically illustrates a first embodiment of a polarization interferometer as proposed;
  • There figure 2b schematically illustrates a second embodiment of a polarization interferometer as proposed;
  • There picture 3a schematically illustrates the part named A of a polarization interferometer as proposed for the implementation of a first variant of an ellipsometer for complete ellipsometry;
  • There figure 3b schematically illustrates the part named A of a polarization interferometer as proposed for the implementation of a second variant of an ellipsometer for complete ellipsometry;
  • There figure 4a shows experimental results obtained with an ellipsometer for full ellipsometry;
  • There figure 4b shows experimental results obtained with an ellipsometer for full ellipsometry;
  • There figure 5 schematically illustrates the part named A of a polarization interferometer as proposed for the implementation of a biosensor of the surface plasmon resonance detection system type;
  • There figure 6a shows experimental results obtained with a surface plasmon resonance detection system type biosensor as shown in the figure 5 ; And
  • There figure 6b shows experimental results obtained with a surface plasmon resonance detection system type biosensor as shown in the figure 5 .
  • THE figures 1 to 6b are commented on in more detail at the level of the detailed description and the examples which follow, which illustrate the invention without limiting its scope.

DESCRIPTION DETAILLEEDETAILED DESCRIPTION

En référence à la figure 1a, un premier mode de réalisation d'un dispositif laser D comprend une source laser monomode longitudinal 1. Par source monomode longitudinal, on entend une source laser comprenant un mode unique, ou une source laser présentant essentiellement un mode longitudinal principal et éventuellement d'autres modes longitudinaux suffisamment faibles, en comparaison, pour être ignorés ou filtrés. La source n'est pas nécessairement monomode transverse, dans le sens où une distribution spatiale de champ éventuellement complexe peut être employée pourvu que le champ puisse être considéré comme monochromatique. Cette source laser 1 est alimentée par un courant d'alimentation électrique. La longueur d'onde λ de la source laser monomode 1 est modulée temporellement par un moyen de modulation temporelle 2. Le faisceau laser source Ssource issu de la source laser 1 comprend deux composantes de polarisation rectilignes orthogonales non nulles nommées transverse électrique, TE, et transverse magnétique, TM. Le faisceau laser source Ssource traverse un élément retardateur de phase passif 3 qui introduit un déphasage entre les composantes TE et TM du faisceau laser source Ssource. Du fait de la modulation temporelle de la longueur d'onde de la source laser 1, le déphasage entre les composantes TE et TM est aussi modulé temporellement. Ainsi, le faisceau issu de l'élément retardateur de phase passif 3 est un faisceau laser modulé temporellement en phase Smodulé. Par faisceau laser modulé en phase, on entend un faisceau laser dans lequel les deux composantes de polarisations sont modulées l'une par rapport à l'autre. Dans ledit dispositif, la modulation de phase peut être réalisée en conservant un chemin géométrique constant pour les deux composantes du champ et sans dispositif de modulation actif autre que la modulation de la source laser elle-même, le composant où se produit la modulation étant passif.With reference to the picture 1a , a first embodiment of a laser device D comprises a longitudinal single-mode laser source 1. By longitudinal single-mode source is meant a laser source comprising a single mode, or a laser source essentially having a main longitudinal mode and possibly other longitudinal modes weak enough, in comparison, to be ignored or filtered out. The source is not necessarily transverse single mode, in the sense that a possibly complex field spatial distribution can be employed provided that the field can be considered as monochromatic. This laser source 1 is powered by an electrical supply current. The wavelength λ of the monomode laser source 1 is temporally modulated by a temporal modulation means 2. The source laser beam S source coming from the laser source 1 comprises two non-zero orthogonal rectilinear polarization components called transverse electric, TE, and transverse magnetic, TM. The source laser beam S source passes through a passive phase delay element 3 which introduces a phase shift between the TE and TM components of the source laser beam S source . Due to the temporal modulation of the wavelength of the laser source 1, the phase difference between the TE and TM components is also temporally modulated. Thus, the beam coming from the passive phase delay element 3 is a modulated S-phase temporally modulated laser beam. By phase-modulated laser beam is meant a laser beam in which the two polarization components are modulated relative to each other. In said device, the phase modulation can be achieved by maintaining a constant geometric path for the two components of the field and without an active modulation device other than the modulation of the laser source itself, the component where the modulation occurs being passive. .

Pour être plus précis, lorsqu'il est énoncé que la modulation de phase peut être réalisée en conservant un chemin géométrique constant pour les deux composantes du champ, il doit être compris que le chemin géométrique parcouru par les deux composantes du champ ne change pas dans le temps, notamment au niveau de l'élément où se produit le déphasage entre ces composantes, c'est-à-dire dans l'élément retardateur de phase passif qui est donc fixe et avantageusement monolithique pour une meilleure stabilité.To be more specific, when it is stated that phase modulation can be achieved by maintaining a constant geometric path for the two field components, it should be understood that the geometric path traveled by the two field components does not change in time, in particular at the level of the element where the phase shift occurs between these components, that is to say in the passive phase retarding element which is therefore fixed and advantageously monolithic for better stability.

De préférence, la source laser 1 est un laser à semi-conducteur, par exemple une diode laser à cavité verticale émettant par la surface VCSEL.Preferably, the laser source 1 is a semiconductor laser, for example a vertical cavity laser diode emitting through the VCSEL surface.

Par ailleurs, la modulation temporelle de la longueur d'onde de la source laser 1 peut être effectuée en modulant temporellement le courant électrique d'alimentation de la source laser 1. La modulation temporelle de la longueur d'onde de la source laser 1 est typiquement réalisée sur une plage d'accordabilité inférieure à un millième de la longueur d'onde. Ainsi, il n'est pas nécessaire de recourir à une modulation de biréfringence ou un autre type de modulateur pour provoquer cette modulation de phase entre lesdites composantes du champ.Furthermore, the temporal modulation of the wavelength of the laser source 1 can be carried out by temporally modulating the electrical supply current of the laser source 1. The temporal modulation of the wavelength of the laser source 1 is typically performed over a tunability range less than one thousandth of the wavelength. Thus, it is not necessary to resort to birefringence modulation or another type of modulator to cause this phase modulation between said components of the field.

En particulier, l'élément retardateur de phase passif 3 peut par exemple comprendre ou consister en un composant présentant une biréfringence, tel qu'un cristal biréfringent. Dans ce cas particulier, le cristal biréfringent possède avantageusement un axe optique selon l'une des deux composantes transverses orthogonales de polarisation du faisceau laser source. Conventionnellement, ces deux composantes de polarisation sont nommées TE et TM pour « transverse électrique » et « transverse magnétique » en référence à un certain plan d'incidence prédéterminé. Le chemin géométrique suivi par les composantes du champ TE et TM peut alors être entièrement commun. La modulation de phase entre les deux composantes du champ est ainsi générée indépendamment de la nature d'un éventuel échantillon interceptant le faisceau, et des optiques utilisées pour exciter l'échantillon comme des lentilles, des prismes ou des réseaux de couplage.In particular, the passive phase delay element 3 can for example comprise or consist of a component exhibiting birefringence, such as a birefringent crystal. In this particular case, the birefringent crystal advantageously has an optical axis along one of the two orthogonal transverse components of polarization of the source laser beam. Conventionally, these two polarization components are named TE and TM for "transverse electric" and "transverse magnetic" with reference to a certain plane of predetermined incidence. The geometric path followed by the components of the TE and TM field can then be entirely common. The phase modulation between the two components of the field is thus generated independently of the nature of any sample intercepting the beam, and of the optics used to excite the sample such as lenses, prisms or coupling gratings.

Par chemin géométrique commun, il doit être compris que les faisceaux lumineux des composantes du champ TE et TM sont spatialement superposés. Une telle configuration permet, par exemple, une mise en commun du bruit subi par les différents faisceaux, rendant le dispositif plus stable, ceci malgré la différence des chemins optiques parcourus par les composantes TE et TM. Il est rappelé que le chemin optique est défini par le produit de l'indice de réfraction rencontré par le chemin géométrique.By common geometric path, it should be understood that the light beams of the TE and TM field components are spatially superimposed. Such a configuration allows, for example, a pooling of the noise undergone by the different beams, making the device more stable, this despite the difference in the optical paths traveled by the TE and TM components. It is recalled that the optical path is defined by the product of the refractive index encountered by the geometric path.

Les optiques utilisées pour exciter l'échantillon, citées au paragraphe précédent, permettent par exemple de définir le ou les angles d'incidence et plus généralement les conditions d'éclairage sur l'échantillon. Par l'expression « exciter l'échantillon », il est entendu de générer, à l'aide du dispositif laser, un champ électromagnétique, au sein de l'échantillon.The optics used to excite the sample, mentioned in the previous paragraph, make it possible, for example, to define the angle(s) of incidence and more generally the lighting conditions on the sample. By the expression “exciting the sample”, it is understood to generate, using the laser device, an electromagnetic field, within the sample.

Différents éléments peuvent également être ajoutés à ce dispositif, notamment en vue de stabiliser ou même de contrôler le déphasage moyen existant entre les deux composantes du champ ou plus généralement pour contrôler l'état de polarisation émanant du dispositif laser. En particulier, en référence à la figure 1b, le dispositif laser D peut en outre posséder un bras de référence comprenant un séparateur de faisceau de référence 4 qui permet de prélever en sortie de l'élément retardateur de phase passif 3 une portion de référence du faisceau laser modulé temporellement en phase Smodulé, appelée Sréférence, se propageant dans une autre direction que celle du faisceau laser modulé temporellement en phase Smodulé. Cette portion de référence Sréférence est envoyée vers un polariseur de référence 5' à travers lequel les deux composantes TE et TM de cette portion de référence Sréférence interfèrent. Suite à son passage à travers le polariseur de référence 5', la portion de référence Sréférence est interceptée par un photo-détecteur de référence 5 qui délivre un signal électrique modulé Iref.Various elements can also be added to this device, in particular with a view to stabilizing or even controlling the average phase shift existing between the two components of the field or more generally to controlling the state of polarization emanating from the laser device. In particular, with reference to the figure 1b , the laser device D may also have a reference arm comprising a reference beam splitter 4 which makes it possible to take from the output of the passive phase delay element 3 a reference portion of the modulated laser beam temporally modulated in phase S, called S reference , propagating in a direction other than that of the modulated S phase temporally modulated laser beam. This reference portion S reference is sent to a reference polarizer 5' through which the two components TE and TM of this reference portion S reference interfere. Following its passage through the reference polarizer 5', the reference portion S reference is intercepted by a reference photo-detector 5 which delivers a modulated electrical signal I ref .

Ce signal électrique modulé Iref est reçu et analysé par une unité d'analyse électronique de référence 6a. Le signal électrique modulé Iref inclut un terme interférométrique modulé temporellement en phase et présentant une amplitude Aref proportionnelle au produit des amplitudes des deux composantes transverse électrique TE et transverse magnétique TM de la portion de référence Sréférence.This modulated electrical signal I ref is received and analyzed by a reference electronic analysis unit 6a. The modulated electrical signal I ref includes an interferometric term modulated temporally in phase and having an amplitude A ref proportional to the product of the amplitudes of the two transverse electrical TE and transverse magnetic TM components of the reference portion S reference .

En effet, le signal électrique modulé Iref représente le signal interférométrique détecté par le photo-détecteur de référence, qui peut s'écrire sous la forme : I ref E TE 2 + E TM 2 + 2 mE TE E TM cos Δ mod + Δ ref = E TE 2 + E TM 2 + A ref 2 cos Δ mod + Δ ref

Figure imgb0002

  • ETE et ETM sont les amplitudes des composantes TE et TM de la portion de référence Sréférence,
  • M est un coefficient inférieur ou égal à 1, et A ref 2 = 2 mE TE E TM ,
    Figure imgb0003
    et
  • Δmod est un terme de phase modulé temporellement, préférablement sinusoïdalement, mais pas nécessairement, suivant le choix de la fonction de modulation du courant. L'analyse de ce type de signal modulé Iref est en particulier détaillée dans les références Al Mohtar, Abeer, et al. "Generalized lock-in détection for interferometry: application to phase sensitive spectroscopy and near-field nanoscopy." Optics express 22.18 (2014): 22232-22245 et le brevet US9518869B2 qui propose l'utilisation d'une détection synchrone modifiée dites détection synchrone généralisée pour effectuer l'analyse. L'emploi d'une détection synchrone généralisée permet effectivement d'extraire les informations d'amplitude Aref et de phase Δref , où Δref caractérise dans notre cas le déphasage entre lesdites composantes TE et TM.
Indeed, the modulated electrical signal I ref represents the interferometric signal detected by the reference photo-detector, which can be written in the form: I ref E YOU 2 + E TM 2 + 2 me YOU E TM cos Δ mod + Δ ref = E YOU 2 + E TM 2 + AT ref 2 cos Δ mod + Δ ref
Figure imgb0002
Or
  • E TE and E TM are the amplitudes of the TE and TM components of the reference portion S reference ,
  • M is a coefficient less than or equal to 1, and AT ref 2 = 2 me YOU E TM ,
    Figure imgb0003
    And
  • Δ mod is a time-modulated phase term, preferably sinusoidally, but not necessarily, depending on the choice of the current modulation function. The analysis of this type of modulated signal I ref is particularly detailed in the references Al Mohtar, Abeer, et al. "Generalized lock-in detection for interferometry: application to phase sensitive spectroscopy and near-field nanoscopy." Optics express 22.18 (2014): 22232-22245 and the patent US9518869B2 which proposes the use of a modified synchronous detection called generalized synchronous detection to carry out the analysis. The use of a generalized synchronous detection effectively makes it possible to extract the information of amplitude A ref and of phase Δ ref , where Δ ref characterizes in our case the phase shift between said components TE and TM.

Ainsi, l'unité d'analyse électronique de référence 6a est apte à extraire de ce signal électrique Iref, comprenant un terme interférométrique modulé en phase, le déphasage moyen Δref entre les deux composantes transverse électrique TE et transverse magnétique TM de la portion de référence Sréférence, et à extraire ledit terme d'amplitude Aref. Cette méthode permet ainsi d'extraire ledit déphasage Δref sans ambiguïté sur son intervalle de définition. A défaut d'autres méthodes d'extraction peuvent être envisagées pour des fonctions de modulation temporelles particulières, tel que des méthodes reposant sur des décalages de phase constants successifs, ou l'emploi d'une modulation rampe dite sérodyne. Une attention particulière doit être portée sur le fait que la modulation de courant entraine également une modulation temporelle de l'intensité du laser, ce qui entraine une modulation des termes d'intensité E TE 2 , E TM 2

Figure imgb0004
et A ref 2
Figure imgb0005
autour de leurs valeurs moyennes. Cette modulation supplémentaire peut fausser la mesure du déphasage si elle n'est pas prise en compte dans le traitement. Une détection synchrone généralisée, comme celle mentionnée, permet de traiter les signaux dont l'amplitude est également modulée temporellement et permet de s'affranchir de cette difficulté, idéalement en ajustant la profondeur de modulation de phase. A défaut, cette modulation sur lesdits termes d'intensité E TE 2
Figure imgb0006
, E TM 2
Figure imgb0007
et A ref 2
Figure imgb0008
peut être négligée au prix d'une certaine erreur, ou bien l'intensité Iref mesurée peut être corrigée pour compenser cette modulation, connaissant la fonction de modulation utilisée. Le dispositif laser ainsi constitué est nommé D'.Thus, the reference electronic analysis unit 6a is capable of extracting from this electrical signal I ref , comprising a phase-modulated interferometric term, the average phase shift Δ ref between the two transverse electrical TE and transverse magnetic TM components of the portion of reference S reference , and in extracting said amplitude term A ref . This method thus makes it possible to extract said phase shift Δ ref without ambiguity over its definition interval. In the absence of other extraction methods can be considered for particular temporal modulation functions, such as methods based on successive constant phase shifts, or the use of so-called serodyne ramp modulation. Particular attention should be paid to the fact that the current modulation also leads to a temporal modulation of the laser intensity, which leads to a modulation of the intensity terms. E YOU 2 , E TM 2
Figure imgb0004
And AT ref 2
Figure imgb0005
around their mean values. This additional modulation can falsify the measurement of the phase shift if it is not taken into account in the processing. A generalized synchronous detection, such as that mentioned, makes it possible to process signals whose amplitude is also modulated temporally and makes it possible to overcome this difficulty, ideally by adjusting the depth of phase modulation. Otherwise, this modulation on said intensity terms E YOU 2
Figure imgb0006
, E TM 2
Figure imgb0007
And AT ref 2
Figure imgb0008
can be neglected at the cost of a certain error, or else the intensity I ref measured can be corrected to compensate for this modulation, knowing the modulation function used. The laser device thus formed is called D′.

En outre, par stabilisation du déphasage moyen Δref, l'unité d'analyse électronique de référence 6a peut fournir un coefficient de correction au moyen de modulation temporelle 2 de la source laser 1 de sorte à ajuster la modulation temporelle de la source laser 1 et à en stabiliser la longueur d'onde λ moyenne. Ainsi, comme indiqué en trait pointillé sur la figure 1b, l'unité d'analyse électronique de référence 6a peut être reliée au moyen de modulation temporelle 2 de la source laser de sorte à constituer une boucle d'asservissement pour stabiliser le déphasage moyen Δref.In addition, by stabilizing the average phase shift Δ ref , the reference electronic analysis unit 6a can supply a correction coefficient to the temporal modulation means 2 of the laser source 1 so as to adjust the temporal modulation of the laser source 1 and to stabilize its average wavelength λ. Thus, as indicated by the dotted line on the figure 1b , the reference electronic analysis unit 6a can be connected to the time modulation means 2 of the laser source so as to form a control loop to stabilize the average phase shift Δ ref .

Les figures 2a et 2b illustrent deux interféromètres à polarisation, l'un, I, suivant la figure 2a, comprenant un dispositif laser D, et l'autre, I', suivant la figure 2b, comprenant un dispositif laser D'. Les interféromètres I et I' comprennent, dans une partie A en sortie des dispositifs laser respectivement D, ou D', une interface opto-mécanique 70 éclairée par un faisceau laser modulé temporellement en phase Smodulé issu du dispositif laser D, ou D', et transmettant le faisceau laser modulé temporellement en phase Smodulé vers un échantillon 7 dont on souhaite mesurer optiquement certaines caractéristiques par le déphasage relatif et éventuellement l'atténuation relative qu'il induit entre les deux composantes du champ. Le faisceau laser modulé temporellement en phase Smodulé interagit alors avec l'échantillon 7 de façon à générer un faisceau de sortie Séchantillon qui peut être transmis, réfléchi ou encore diffracté par l'échantillon. En sortie de l'interface opto-mécanique 70, le faisceau de sortie Séchantillon traverse un polariseur d'analyse 8' à travers lequel les deux composantes TE et TM du faisceau de sortie Séchantillon interfèrent. Suite à son passage à travers le polariseur d'analyse 8', le faisceau de sortie Séchantillon est intercepté par un photo-détecteur d'analyse 8 qui délivre un signal électrique modulé Iéchantillon représentatif des interférences entre les deux composantes TE et TM du faisceau de sortie Séchantillon. Ce signal électrique modulé Iéchantillon est reçu et analysé par une unité d'analyse électronique 6b. En particulier, le signal électrique modulé Iéchantillon représentatif du faisceau de sortie Séchantillon, inclut un terme d'amplitude au carré A é chantillon 2

Figure imgb0009
proportionnel au produit des amplitudes des deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon, un terme de phase Δéchantillon, et une modulation temporelle de la phase, c'est-à-dire du déphasage entre le deux composantes de polarisation. Outre la modulation temporelle de phase, ledit déphasage inclut un incrément de déphasage optique Δ entre les deux composantes transverse électrique TE et transverse magnétique TM qui est induit par l'échantillon 7 lors de la réflexion, transmission ou diffraction résultant de l'interaction avec l'échantillon, produites par un ou plusieurs composants optiques tels que des lentilles, des miroirs, ou réseaux, utilisés notamment en vue de convoyer la lumière sur l'échantillon solide, gazeux ou liquide dans les conditions d'illumination souhaitées par l'utilisateur. Mathématiquement, on peut traduire cette propriété par : I échantillon = I 0 + A échantillon 2 cos Δ mod + Δ échantillon .
Figure imgb0010
THE figures 2a and 2b illustrate two polarization interferometers, one, I, following the figure 2a , comprising a laser device D, and the other, I', according to the figure 2b , comprising a laser device D′. The interferometers I and I' comprise, in a part A at the output of the laser devices respectively D, or D', an opto-mechanical interface 70 illuminated by a temporally modulated laser beam in phase S modulated coming from the laser device D, or D' , and transmitting the modulated S phase temporally modulated laser beam towards a sample 7 of which it is desired to optically measure certain characteristics by the relative phase shift and possibly the relative attenuation that it induces between the two components of the field. The modulated S phase temporally modulated laser beam then interacts with the sample 7 so as to generate an output beam S sample which can be transmitted, reflected or even diffracted by the sample. At the output of the opto-mechanical interface 70, the sample S output beam passes through an analysis polarizer 8' through which the two components TE and TM of the sample S output beam interfere. Following its passage through the analysis polarizer 8', the output beam S sample is intercepted by an analysis photo-detector 8 which delivers a modulated electrical signal I sample representative of the interference between the two components TE and TM of the output beam S sample . This modulated electric signal I sample is received and analyzed by an electronic analysis unit 6b. In particular, the modulated electrical signal I sample representative of the output beam S sample includes a squared amplitude term AT e sample 2
Figure imgb0009
proportional to the product of the amplitudes of the two transverse electric TE and transverse magnetic TM components of the output beam S sample , a phase term Δ sample , and a temporal modulation of the phase, that is to say of the phase shift between the two components of polarization. In addition to the temporal phase modulation, said phase shift includes an optical phase shift increment Δ between the two transverse electric TE and transverse magnetic TM components which is induced by the sample 7 during the reflection, transmission or diffraction resulting from the interaction with the sample, produced by one or more optical components such as lenses, mirrors, or gratings, used in particular to convey light onto the solid, gaseous or liquid sample under the illumination conditions desired by the user. Mathematically, we can translate this property by: I sample = I 0 + AT sample 2 cos Δ mod + Δ sample .
Figure imgb0010

En particulier aussi, l'unité d'analyse électronique de référence peut être configurée pour, par analyse dudit signal électrique Iéchantillon, extraire ledit terme d'amplitude Aéchantillon et ledit terme de phase moyen Δéchantillon entre les deux composantes transverse électrique TE et transverse magnétique TM du faisceau de sortie Séchantillon permettant de déterminer des caractéristiques optiques dudit échantillon, spécifiquement par l'intermédiaire de l'incrément de déphasage optique Δ, calculé, dans le cas où l'interféromètre est de type I', c'est-à-dire dans le cas où il comprend un dispositif laser avec bras de référence D', par : Δ=Δéchantillonref à une constante additive près aisément déterminable, par exemple par calibration sur un échantillon au Δ connu.Also in particular, the reference electronic analysis unit can be configured to, by analysis of said electric signal I sample , extract said amplitude term A sample and said average phase term Δ sample between the two transverse electrical components TE and transverse magnetic TM of the output beam S sample making it possible to determine the optical characteristics of said sample, specifically by means of the optical phase shift increment Δ, calculated, in the case where the interferometer is of type I', it is that is to say in the case where it comprises a laser device with reference arm D′, by: Δ=Δ sample −Δ ref to within an additive constant easily determinable, for example by calibration on a sample with a known Δ.

L'interféromètre à polarisation de type l' illustré à la figure 2b peut en outre être utilisé comme ellipsomètre fonctionnant en réflexion ou en transmission. Dans ces deux cas, un échantillon 7 est placé au niveau de l'interface 70 de l'interféromètre à polarisation I'. Le faisceau laser modulé en phase Smodulé, incident sur l'échantillon 7, se réfléchit spéculairement à la surface de celui-ci, ou bien est transmis spéculairement par celui-ci pour une transmission, et se propage en un faisceau de sortie Séchantillon intercepté par le polariseur d'analyse 8' et le photo-détecteur d'analyse 8. L'unité d'analyse électronique 6b permet, comme expliqué plus haut, d'extraire le paramètre ellipsométrique Δellipsométrie, par la formule Δ ellipsométrie + Δéchantillon - Δref à une constante additive près.The type l' polarization interferometer illustrated in figure 2b can also be used as an ellipsometer operating in reflection or in transmission. In these two cases, a sample 7 is placed at the level of the interface 70 of the interferometer with polarization I′. The modulated S-phase modulated laser beam, incident on the sample 7, is reflected specularly at the surface of the latter, or else is transmitted specularly by the latter for transmission, and propagates into an output beam S sample intercepted by the analysis polarizer 8' and the analysis photo-detector 8. The electronic analysis unit 6b makes it possible, as explained above, to extract the ellipsometric parameter Δ ellipsometry , by the formula Δ ellipsometry + Δ sample - Δ ref up to an additive constant.

La figure 3a illustre une première variante de l'ellipsomètre présenté à la figure 2b, dans laquelle la partie A comprend des éléments supplémentaires décrits ci-après. En effet, dans cette première variante, l'ellipsomètre précédemment décrit comprend en outre une première voie de détection supplémentaire permettant de déterminer un paramètre ellipsométrique tanΨ d'un échantillon 7. Cette voie supplémentaire comprend un premier dispositif séparateur de faisceau sélectif en polarisation 9a en amont du polariseur d'analyse 8', qui permet de prélever une portion du faisceau de sortie Séchantillon et de filtrer une des deux composantes transverse électrique TE ou transverse magnétique TM de cette portion du faisceau de sortie Séchantillon sous la forme d'un faisceau StanΨ appelé portion polarisée. Cette portion polarisée StanΨ est interceptée par un photo-détecteur pour ellipsométrie complète 10 qui génère un signal électrique ItanΨ caractéristique de l'intensité lumineuse de la portion polarisée. Le paramètre ellipsométrique tanΨ de l'échantillon est alors déterminé à l'aide des quantités Aéchantillon et ItanΨ issus respectivement de l'analyse du signal Iéchantillon issu du photo-détecteur d'analyse 8 et du photo-détecteur pour ellipsométrie complète 10.There picture 3a illustrates a first variant of the ellipsometer presented at the figure 2b , in which Part A includes additional elements described below. Indeed, in this first variant, the ellipsometer previously described further comprises a first additional detection channel making it possible to determine an ellipsometric parameter tanΨ of a sample 7. This additional channel comprises a first polarization-selective beam splitter device 9a in upstream of the analysis polarizer 8', which makes it possible to take a portion of the output beam S sample and to filter one of the two transverse electric TE or transverse magnetic TM components of this portion of the output beam S sample in the form of a S tanΨ beam called polarized portion. This polarized portion S tanΨ is intercepted by a photo-detector for complete ellipsometry 10 which generates an electrical signal I tanΨ characteristic of the light intensity of the polarized portion. The ellipsometric parameter tanΨ of the sample is then determined using the quantities A sample and I tanΨ resulting respectively from the analysis of the signal I sample resulting from the analysis photo-detector 8 and from the photo-detector for complete ellipsometry 10 .

En effet, le paramètre tanΨ s'obtient, comme classiquement en ellipsométrie par la formule : tanψ = r TM r TE ,

Figure imgb0011

  • où rTM et rTE sont les coefficients de réflexion de l'échantillon portés par les composantes TM et TE du faisceau de sortie Séchantillon. Ainsi, le paramètre tanΨ peut être obtenu, suivant la configuration expérimentale utilisée, soit par son carré donné par l'équation : tanψ 2 A échantillon 2 I t a n Ψ ,
    Figure imgb0012
  • si la composante TE est récupérée par la première voie de détection supplémentaire,
  • soit par l'équation : tanψ 2 I t a n Ψ A échantillon 2
    Figure imgb0013
  • si la composante TM est récupérée par la première voie de détection supplémentaire.
Indeed, the parameter tanΨ is obtained, as classically in ellipsometry, by the formula: tanψ = r TM r YOU ,
Figure imgb0011
  • where r TM and r TE are the sample reflection coefficients carried by the TM and TE components of the output beam S sample . Thus, the parameter tanΨ can be obtained, depending on the experimental configuration used, either by its square given by the equation: tanψ 2 AT sample 2 I you To not Ψ ,
    Figure imgb0012
  • if the TE component is recovered by the first additional detection channel,
  • either by the equation: tanψ 2 I you To not Ψ AT sample 2
    Figure imgb0013
  • if the TM component is recovered by the first additional detection path.

La figure 4 présente des tableaux de mesures d'indice et d'épaisseur d'échantillons de verre et de silice sur silicium obtenues avec un ellipsomètre du type de la figure 3a.There figure 4 presents tables of index and thickness measurements of samples of glass and silica on silicon obtained with an ellipsometer of the type of picture 3a .

La figure 3b illustre une deuxième variante de l'ellipsomètre présenté à la figure 2b, dans laquelle la partie A comprend des éléments supplémentaires décrits ci-après. En effet, dans cette deuxième variante, l'ellipsomètre précédemment décrit à la figure 2b comprend en outre une deuxième voie de détection supplémentaire permettant de déterminer un paramètre ellipsométrique tanΨ d'un échantillon 7. Cette voie de détection supplémentaire comprend un deuxième dispositif séparateur de faisceau sélectif en polarisation 9b en amont du polariseur d'analyse 8', qui permet de prélever une portion du faisceau de sortie Séchantillon et de sélectionner les deux composantes transverse électrique TE et transverse magnétique TM de cette portion du faisceau de sortie Séchantillon sous la forme de deux faisceaux StanΨ_TE et StanΨ_TM appelés respectivement portion polarisée TE et portion polarisée TM et se propageant dans deux directions différentes. La portion polarisée TE et la portion polarisée TM sont reçues chacune respectivement par un photo-détecteur 101 et un photo-détecteur 102, appelés respectivement photo-détecteur TE et photo-détecteur TM. Le paramètre ellipsométrique tanΨ de l'échantillon est alors déterminé à l'aide des signaux électriques ItanΨ_TE et ItanΨ_TM issus des photo-détecteur TE 101 et photo-détecteur TM 102.There figure 3b illustrates a second variant of the ellipsometer presented at the figure 2b , in which Part A includes additional elements described below. Indeed, in this second variant, the ellipsometer previously described in figure 2b further comprises a second additional detection channel making it possible to determine an ellipsometric parameter tanΨ of a sample 7. This additional detection channel comprises a second polarization-selective beam splitter device 9b upstream of the analysis polarizer 8', which allows to take a portion of the output beam S sample and to select the two transverse electric TE and transverse magnetic TM components of this portion of the output beam S sample in the form of two beams S tanΨ_TE and S tanΨ_TM called respectively polarized portion TE and portion polarized TM and propagating in two different directions. The polarized portion TE and the polarized portion TM are each received respectively by a photo-detector 101 and a photo-detector 102, respectively called photo-detector TE and photo-detector TM. The ellipsometric parameter tanΨ of the sample is then determined using the electrical signals I tanΨ_TE and I tanΨ_TM from the photo-detector TE 101 and photo-detector TM 102.

La figure 5 illustre schématiquement un biocapteur de type système de détection à résonance de plasmon de surface, comprenant un dispositif laser D et apte à déterminer des caractéristiques d'un échantillon constitué d'un résonateur optique ME en interaction avec une couche microfluidique MF, correspondant au milieu biologique ou biochimique à analyser 7. Ce biocapteur comprend dans une partie A en sortie du dispositif laser D (à l'image de l'interféromètre I décrit plus haut), et recevant un faisceau laser modulé temporellement en phase Smodulé, une biopuce amovible 11 pouvant comprendre un prisme 110 ou plus généralement une optique de couplage à même d'exciter optiquement l'échantillon formé par le résonateur optique ME en interaction avec la couche microfluidique MF représentant le milieu 7 à analyser. Cette biopuce est positionnée au niveau d'une interface 70 et intercepte le faisceau laser modulé temporellement en phase Smodulé. Celui-ci excite une onde de résonance de plasmon de surface à la surface de la couche métallique ME de la biopuce, qui interagit avec le milieu à analyser 7 au niveau de l'interface avec la couche microfluidique avant d'être réfléchie produisant un faisceau Séchantillon. Le faisceau de sortie Séchantillon est intercepté par un polariseur d'analyse 8' suivi d'un photo-détecteur d'analyse 8 délivrant un signal électrique Iéchantillon. Une unité d'analyse électronique 6b reliée au photo-détecteur d'analyse 8 permet, comme expliqué plus haut, de déterminer des caractéristiques dudit échantillon 7. Les figures 6a et 6b illustrent le type de mesures pouvant être obtenues avec un biocapteur tel que décrit précédemment et illustré sur la figure 5. Ces figures seront décrites plus en détail dans les exemples présentés ci-après.There figure 5 schematically illustrates a biosensor of the surface plasmon resonance detection system type, comprising a laser device D and able to determine the characteristics of a sample consisting of an optical resonator ME interacting with a microfluidic layer MF, corresponding to the biological medium or biochemical to be analyzed 7. This biosensor comprises in a part A at the output of the laser device D (like the interferometer I described above), and receiving a temporally modulated laser beam in phase S modulated , a removable biochip 11 which may comprise a prism 110 or more generally a coupling optic able to optically excite the sample formed by the optical resonator ME in interaction with the microfluidic layer MF representing the medium 7 to be analyzed. This biochip is positioned at an interface 70 and intercepts the modulated S phase temporally modulated laser beam. This excites a surface plasmon resonance wave at the surface of the metal layer ME of the biochip, which interacts with the medium to be analyzed 7 at the level of the interface with the microfluidic layer before being reflected producing a beam S sample . The output beam S sample is intercepted by an analysis polarizer 8' followed by an analysis photo-detector 8 delivering an electrical signal I sample . An electronic analysis unit 6b connected to the analysis photo-detector 8 makes it possible, as explained above, to determine the characteristics of said sample 7. The figures 6a and 6b illustrate the type of measurements that can be obtained with a biosensor as described previously and illustrated on the figure 5 . These figures will be described in more detail in the examples presented below.

EXEMPLESEXAMPLES EXEMPLE 1 : Mise en oeuvre d'un dispositif laserEXAMPLE 1: Implementation of a laser device

On réalise un dispositif laser tel qu'illustré sur les figures 1a à 1b pour mettre en oeuvre un interféromètre à polarisation pouvant être appliqué à une mesure ellipsométrique « complète » ou la détection SPR sensible à la phase, et permettant de déterminer des caractéristiques d'un échantillon 7 par exemple de type couches minces ou multicouches comme du verre traité, ou des échantillons utilisés en micro-électronique, à partir des éléments suivants :

  • source laser monomode longitudinal 1 : VCSEL référencé "VC670M-TO46GL" à 670 nm, d'accordabilité de l'ordre de 0.2nm/mA ;
  • moyen de modulation temporelle électronique de la source laser 2 : modulation sinusoïdale du courant d'injection du VCSEL précité, de valeur moyenne i0 suffisante par exemple égale à 4mA et de fréquence préférablement élevée pour réduire les bruits, jusqu'à 100kHz ou plus (suivant les capacités de l'électronique), exprimée par la relation i(t)=i0+βsin(Ωt);
  • élément retardateur de phase passif 3 : cristal de vanadate d'yttrium YVO4 de biréfringence égale à 0.22 et de longueur 10 mm ;
  • séparateur de faisceau de référence 4 : lame séparatrice telle que la référence BSS04 (Thorlabs), ou cube séparateur ;
  • polariseur de référence 5' : polariseur adapté à la longueur d'onde utilisée tel que LPVISE050-A (Thorlabs) ;
  • photo-détecteur de référence 5 : photodétecteur adapté à la longueur d'onde utilisée et les fréquences de modulation employées, par exemple une photodiode en silicium pour le visible comme par exemple la référence PDA36A-EC (THORLABS) ;
  • unité d'analyse électronique de référence 6a : carte d'acquisition électronique par exemple la référence NI USB-6363 (National Instrument).
A laser device is produced as illustrated in the figures 1a to 1b to implement a polarization interferometer which can be applied to a "complete" ellipsometric measurement or phase-sensitive SPR detection, and which makes it possible to determine the characteristics of a sample 7, for example of the thin or multilayer type such as treated glass , or samples used in micro-electronics, from the following elements:
  • longitudinal single-mode laser source 1: VCSEL referenced "VC670M-TO46GL" at 670 nm, with a tunability of the order of 0.2 nm/mA;
  • means of electronic temporal modulation of the laser source 2: sinusoidal modulation of the injection current of the aforementioned VCSEL, of average value i 0 sufficient for example equal to 4mA and of preferably high frequency to reduce noise, up to 100 kHz or more ( depending on the capacities of the electronics), expressed by the relationship i(t)=i 0 +βsin(Ωt);
  • passive phase delay element 3: crystal of yttrium vanadate YVO4 with birefringence equal to 0.22 and length 10 mm;
  • reference beam splitter 4: beam splitter such as reference BSS04 (Thorlabs), or splitter cube;
  • 5' reference polarizer: polarizer adapted to the wavelength used, such as LPVISE050-A (Thorlabs);
  • reference photodetector 5: photodetector adapted to the wavelength used and the modulation frequencies used, for example a silicon photodiode for the visible such as for example the reference PDA36A-EC (THORLABS);
  • reference electronic analysis unit 6a: electronic acquisition card, for example the reference NI USB-6363 (National Instrument).

La modulation temporelle est typiquement réalisée par une modulation du courant d'injection de la source laser monomode longitudinale utilisée. La modulation est préférentiellement sinusoïdale mais d'autres modulations peuvent être utilisées en vue de réaliser une détection interférométrique à décalage de phase discrète ou continue. Dans le cas sinusoïdal, la modulation du courant d'injection i(t) est, comme mentionnée, du type : i0+βsin(Ωt). Dans le cas du type de VCSEL précité, i0 est typiquement de l'ordre de 4 mA. La modulation en courant induit une modulation de puissance optique approximativement égale à: P(t)=P0+γsin(Ωt)=P0 (1+µsin(Ωt)), où P0 est la composante DC de puissance, et µ*P0, l'amplitude AC de la modulation, Ω est la pulsation de la modulation. Cette modulation de puissance induit une modulation de longueur d'onde approximativement égale à λ(t)=λ0+δsin(Ωt), où λ0 est la longueur d'onde moyenne et δ est la profondeur de modulation en longueur d'onde. En présence d'une telle modulation (de courant, mais aussi depuissance et longueur d'onde), une modulation de phase est créée entre les composantes TE et TM dès lors que le faisceau traverse le cristal biréfringent YVO4 susmentionné. La modulation de phase induite s'écrit: asin(Ωt) dans le cas sinusoïdal, avec la profondeur de modulation en phase donnée par : a = 4 πΔlδ λ 0 2 ,

Figure imgb0014
où Δl est la différence de chemin optique entre les deux composantes du champ au sein de l'élément retardateur 3. En pratique, il est intéressant de travailler avec une modulation de phase a= 3.83 rad comme expliqué dans un autre cadre par Vaillant et al. dans « An unbalanced interferometer insensitive to wavelength drift ». Sensors and Actuators A: Physical, 268, 188-192 . Dans la référence ci-dessus, ce choix de profondeur de modulation de phase permet d'analyser plus simplement le signal interférométrique résultant et d'extraire l'information d'amplitude Aéchantillon et le terme de phase recherché Δéchantillon simplement.The temporal modulation is typically performed by modulating the injection current of the longitudinal monomode laser source used. The modulation is preferably sinusoidal but other modulations can be used with a view to carrying out discrete or continuous phase shift interferometric detection. In the sinusoidal case, the modulation of the injection current i(t) is, as mentioned, of the type: i 0 +βsin(Ωt). In the case of the aforementioned type of VCSEL, i 0 is typically of the order of 4 mA. The current modulation induces an optical power modulation approximately equal to: P(t)=P 0 +γsin(Ωt)=P 0 (1+µsin(Ωt)), where P 0 is the DC power component, and µ *P 0 , the AC amplitude of the modulation, Ω is the pulse of the modulation. This power modulation induces a wavelength modulation approximately equal to λ(t)=λ 0 +δsin(Ωt), where λ 0 is the average wavelength and δ is the wavelength modulation depth. In the presence of such modulation (of current, but also of power and wavelength), a phase modulation is created between the TE and TM components as soon as the beam passes through the birefringent crystal YVO4 mentioned above. The induced phase modulation is written: asin(Ωt) in the sinusoidal case, with the phase modulation depth given by: To = 4 πΔlδ λ 0 2 ,
Figure imgb0014
where Δ l is the optical path difference between the two components of the field within the delay element 3. In practice, it is advantageous to work with a phase modulation a=3.83 rad as explained in another context by Valiant et al. in “An unbalanced interferometer insensitive to wavelength drift”. Sensors and Actuators A: Physical, 268, 188-192 . In the above reference, this choice of phase modulation depth makes it easier to analyze the resulting interferometric signal and to extract the amplitude information A sample and the phase term sought Δ sample simply.

Dans notre cas, pour obtenir la modulation de phase temporelle, la biréfringence (ne-no) et la longueur L du cristal YVO4 sont telles que la différence de chemin optique donnée par le produit L(ne-no) est au minimum de l'ordre de grandeur du millimètre, ce qui correspond à un déphasage cumulé entre la composante TM et la composante TE de l'ordre de 10 000 radians pour de la lumière visible. Cette différence de chemin optique cumulée est réalisée avec les composants précédemment mentionnés.In our case, to obtain the temporal phase modulation, the birefringence (n e -n o ) and the length L of the YVO4 crystal are such that the optical path difference given by the product L(n e -n o ) is at minimum of the order of magnitude of a millimeter, which corresponds to a cumulative phase shift between the TM component and the TE component of the order of 10,000 radians for visible light. This cumulative optical path difference is achieved with the previously mentioned components.

EXEMPLE 2 : Mesure d'un paramètre Δellipsométrie EXAMPLE 2: Measurement of a parameter Δ ellipsometry

On réalise un ellipsomètre tel que décrit précédemment et illustré à la figure 2b pour déterminer un paramètre Δellipsométrie, à partir du dispositif laser décrit dans l'exemple 1.An ellipsometer is produced as described previously and illustrated in figure 2b to determine a parameter Δ ellipsometry , from the laser device described in example 1.

Pour mettre en oeuvre l'ellipsomètre précité, on utilise en outre :

  • une interface opto-mécanique 70 configurée pour transmettre le faisceau laser modulé temporellement en phase Smodulé sortant du dispositif laser selon l'exemple 1 vers un échantillon 7 de sorte que le faisceau laser modulé temporellement en phase Smodulé interagisse avec l'échantillon de façon à générer un faisceau de sortie Séchantillon;
  • un polariseur d'analyse 8' : polariseur LPVISE050-A (Thorlabs) ;
  • un photo-détecteur d'analyse 8 : photodiode en silicium par exemple la référence PDA36A-EC (THORLABS) ;
  • une unité d'analyse électronique 6b : carte d'acquisition électronique par exemple la référence NI USB-6363 (National Instrument).
To implement the aforementioned ellipsometer, the following are also used:
  • an opto-mechanical interface 70 configured to transmit the modulated S-phase temporally modulated laser beam emerging from the laser device according to example 1 to a sample 7 so that the modulated laser beam temporally in-phase modulated S interacts with the sample to generate a sample S output beam;
  • an 8' analysis polarizer: LPVISE050-A polarizer (Thorlabs);
  • an analysis photo-detector 8: silicon photodiode, for example the reference PDA36A-EC (THORLABS);
  • an electronic analysis unit 6b: electronic acquisition card, for example the reference NI USB-6363 (National Instrument).

Le paramètre ellipsométrique Δellipsométrie est obtenu par la formule Δellipsométrieéchantillonref à une constante additive près, avec Δéchantillon le paramètre de phase extrait du signal électrique Iéchantillon issu du photo-détecteur d'analyse 8, et correspondant au déphasage entre les composantes TE et TM du faisceau de sortie Séchantillon induit par l'échantillon.The ellipsometric parameter Δ ellipsometry is obtained by the formula Δ ellipsometrysampleref up to an additive constant, with Δ sample the phase parameter extracted from the electrical signal I sample coming from the analysis photo-detector 8, and corresponding to the phase shift between the TE and TM components of the output beam S sample induced by the sample.

EXEMPLE 3 : Mesures ellipsométriques d'indices et d'épaisseurs d'échantillons de multicouches de type couches mincesEXAMPLE 3: Ellipsometric measurements of indices and thicknesses of samples of multilayers of the thin film type

On réalise un ellipsomètre comme illustré à la figure 3a pour déterminer des paramètres Δellipsométrie et tanΨ, à partir de l'ellipsomètre décrit dans l'exemple 2, et comprenant en outre :

  • un premier dispositif séparateur de faisceau sélectif en polarisation 9a, séparateur simple tel BSS04 (Thorlabs) suivi de polariseurs tels LPVISE050-A (Thorlabs) ;
  • un photo-détecteur pour ellipsométrie complète 10.
An ellipsometer is made as shown in picture 3a to determine parameters Δ ellipsometry and tanΨ, from the ellipsometer described in example 2, and further comprising:
  • a first polarization-selective beam splitter device 9a, simple splitter such as BSS04 (Thorlabs) followed by polarizers such as LPVISE050-A (Thorlabs);
  • a photo-detector for complete ellipsometry 10.

Le paramètre ellipsométrique Δellipsométrie est obtenu comme dans l'exemple 2. Le paramètre (tanΨ)2 peut être obtenu, suivant la configuration expérimentale utilisée, soit par l'équation tanψ 2 A é chantillon 2 I t a n Ψ

Figure imgb0015
, si la composante TE est récupérée par la première voie de détection supplémentaire, ou l'inverse si la composante TM est récupérée par la première voie de détection supplémentaire. En pratique, le coefficient de proportionnalité entre (tanΨ)2 et A2 échantillon/ItanΨ peut être prédéterminé simplement par une expérience de calibration sur un échantillon connu. Dans cet exemple, le coefficient de proportionnalité est préalablement déterminé en mesurant le paramètre tanΨ sur un échantillon connu.The ellipsometric parameter Δ ellipsometry is obtained as in example 2. The parameter (tan Ψ ) 2 can be obtained, depending on the experimental configuration used, either by the equation tanψ 2 AT e sample 2 I you To not Ψ
Figure imgb0015
, if the TE component is recovered by the first additional detection channel, or the reverse if the TM component is recovered by the first additional detection channel. In practice, the proportionality coefficient between (tanΨ) 2 and A 2 sample /I tanΨ can be predetermined simply by a calibration experiment on a known sample. In this example, the proportionality coefficient is determined beforehand by measuring the parameter tanΨ on a known sample.

A partir des paramètres Δellipsométrie et tanΨ, il est possible de déterminer, comme classiquement en ellipsométrie, l'indice optique complexe ou l'épaisseur de la couche mince connue ou d'autre paramètres inconnus lié par exemple à la rugosité. La figure 4 illustre un ensemble de résultats expérimentaux réalisés avec l'ellipsomètre précédemment décrit.From the parameters Δellipsometry and tanΨ, it is possible to determine, as conventionally in ellipsometry, the complex optical index or the thickness of the known thin layer or other unknown parameters linked for example to the roughness. There figure 4 illustrates a set of experimental results obtained with the ellipsometer previously described.

EXEMPLE 4 : Mesures ellipsométriques d'indices et d'épaisseurs d'échantillons de type couches minces ou empilements multicouchesEXAMPLE 4: Ellipsometric measurements of indices and thicknesses of samples of the thin layers or multilayer stacks type

On réalise un ellipsomètre comme illustré à la figure 3b pour déterminer des paramètres Δellipsométrie et tanΨ, à partir de l'ellipsomètre décrit dans l'exemple 2, et comprenant en outre :

  • un deuxième dispositif séparateur de faisceau sélectif en polarisation 9b : séparateur simple tel BSS04 (Thorlabs) suivi de polariseurs tels LPVISE050-A (Thorlabs), ou séparateurs simples fonctionnant en incidence Brewsterienne ;
  • deux photo-détecteurs 101 et 102 : photodiodes en silicium, éventuellement amplifiées, par exemple la référence PDA36A-EC (THORLABS).
An ellipsometer is made as shown in figure 3b to determine parameters Δ ellipsometry and tanΨ, from the ellipsometer described in example 2, and further comprising:
  • a second polarization-selective beam splitter device 9b: single splitter such as BSS04 (Thorlabs) followed by polarizers such as LPVISE050-A (Thorlabs), or single splitters operating at Brewsterian incidence;
  • two photo-detectors 101 and 102: silicon photodiodes, possibly amplified, for example the reference PDA36A-EC (THORLABS).

Le paramètre ellipsométrique Δellipsométrie est obtenu comme dans les exemples 2 et 3. Comme décrit plus haut, le paramètre tanΨ est directement obtenu par son carré : tanψ 2 I t a n Ψ _ TM I t a n Ψ _ TE

Figure imgb0016
avec ItanΨ_TE et ItanΨ_TM les signaux issus des photo-détecteur TE et photo-détecteur TM. Le coefficient de proportionnalité est égal à l'unité si les faisceaux sont partagés en proportions identiques. En pratique le coefficient peut être prédéterminé simplement par une expérience de calibration, par exemple sur un échantillon connu. A partir des paramètres Δellipsométrie et tanΨ, il est possible de déterminer, comme classiquement en ellipsométrie, l'indice complexe et l'épaisseur de couches au sein de l'échantillon mesuré.The ellipsometric parameter Δ ellipsometry is obtained as in examples 2 and 3. As described above, the parameter tanΨ is directly obtained by its square: tanψ 2 I you To not Ψ _ TM I you To not Ψ _ YOU
Figure imgb0016
with I tanΨ_TE and I tanΨ_TM the signals coming from the photo-detector TE and photo-detector TM. The proportionality coefficient is equal to unity if the beams are shared in identical proportions. In practice, the coefficient can be predetermined simply by a calibration experiment, for example on a known sample. From the parameters Δellipsometry and tanΨ, it is possible to determine, as conventionally in ellipsometry, the complex index and the thickness of layers within the measured sample.

EXEMPLE 5 : Mesures de type résonance de plasmon de surface et détection de PEG thiolé (poly-ethylene glycol-SH)EXAMPLE 5 Surface plasmon resonance type measurements and detection of thiolated PEG (poly-ethylene glycol-SH)

On réalise un biocapteur tel qu'illustré sur la figure 5 pour application à la détection de type résonance de plasmon de surface permettant de mesurer des paramètres d'un échantillon 7 afin de monitorer ici le dépôt de PEG thiolé sur celui-ci. L'échantillon est constitué d'un résonateur optique (ME) formé ici d'une couche d'or de 45nm environ mis en interaction avec la solution contenant le PEG thiolé (poly-ethylene glycol-SH) présente au sein de la couche microfluidique. Ce biocapteur illustré sur la figure 5 est réalisé à partir du dispositif laser décrit dans l'exemple 1, en y ajoutant comme illustré sur la figure 5 :

  • une interface opto-mécanique 70 : support ;
  • un polariseur d'analyse 8' : polariseur LPVISE050-A (Thorlabs) ;
  • un photo-détecteur d'analyse 8 : photodiode en silicium par exemple la référence PDA36A-EC (THORLABS) ;
  • une unité d'analyse électronique 6b : carte d'acquisition électronique par exemple la référence NI USB-6363 (National Instrument) ;
  • la biopuce préférablement amovible 11 disposée sur l'interface 70 et comprenant un prisme 110 sur lequel est déposée une couche métallique ME d'or (d'épaisseur 45nm) apte à recevoir la couche PEG thiolé constituant l'échantillon à analyser.
A biosensor is produced as illustrated in the figure 5 for application to surface plasmon resonance type detection making it possible to measure parameters of a sample 7 in order to monitor here the deposition of thiolated PEG thereon. The sample consists of an optical resonator (ME) formed here of a gold layer of about 45nm interacted with the solution containing the thiolated PEG (poly-ethylene glycol-SH) present within the microfluidic layer . This biosensor illustrated on the figure 5 is made from the laser device described in example 1, adding to it as illustrated in the figure 5 :
  • an opto-mechanical interface 70: support;
  • an 8' analysis polarizer: LPVISE050-A polarizer (Thorlabs);
  • an analysis photo-detector 8: silicon photodiode, for example the reference PDA36A-EC (THORLABS);
  • an electronic analysis unit 6b: electronic acquisition card, for example the reference NI USB-6363 (National Instrument);
  • the preferably removable biochip 11 placed on the interface 70 and comprising a prism 110 on which is deposited a metallic layer ME of gold (thickness 45 nm) capable of receiving the thiolated PEG layer constituting the sample to be analyzed.

Dans ce cas précis, le photo-détecteur d'analyse 8 est un imageur permettant une mesure multipoints. Le biocapteur est utilisé en configuration dite de Kretschmann via le prisme (110). Le paramètre Δ=Δéchantilonref qui peut être déterminé grâce à l'interféromètre à polarisation du biocapteur tel que décrit précédemment n'est en général pas accessible avec d'autres types de dispositifs de mesure SPR. La figure 6a illustre la mesure de la fonctionnalisation de la couche d'or en contact avec la couche microfluidique de PEG thiolé. Ce type de mesure permet d'obtenir des informations optogéométriques sur la couche déposée et ici en particulier de connaître le temps au bout duquel la réaction n'évolue plus que faiblement (e.g. 3500 secondes).In this specific case, the analysis photo-detector 8 is an imager allowing multipoint measurement. The biosensor is used in the so-called Kretschmann configuration via the prism (110). The parameter Δ=Δ sample −Δ ref which can be determined thanks to the polarization interferometer of the biosensor as described above is generally not accessible with other types of SPR measurement devices. There figure 6a illustrates the measurement of the functionalization of the gold layer in contact with the microfluidic layer of thiolated PEG. This type of measurement makes it possible to obtain optogeometric information on the deposited layer and here in particular to know the time at the end of which the reaction only changes slightly (eg 3500 seconds).

EXEMPLE 6 : Mesures de type résonance de plasmon de surface et détection de différentes quantités d'ADN 40 merEXAMPLE 6: Surface plasmon resonance type measurements and detection of different amounts of 40 mer DNA

La figure 6b illustre des mesures visant à détecter différentes quantité d'ADN se liant à la surface (sensorgrammes en phase), via les variations du paramètre Δ au cours du temps au sein des différentes régions d'intérêt. La comparaison avec les signaux de références permet de s'affranchir de fluctuations des paramètres d'amplitude et de phase non liées à la cible elle- même, tel que des variations environnementales comme des variations de température au niveau de la puce elle-même. La couche microfluidique utilisée est composée ici de brins d'ADN complémentaires de 40 mer codons. Les courbes de différents niveaux de couleur (noir à gris clair) présentent ainsi une cinétique de variation caractéristique des concentrations analysées, ici de 25 nM à 500 nM. Les courbes observées suivent un processus d'adsorption classique de type Langmuir isotherme.There figure 6b illustrates measurements aimed at detecting different amounts of DNA binding to the surface (phase sensorgrams), via the variations of the parameter Δ over time within the different regions of interest. The comparison with the reference signals makes it possible to overcome fluctuations in the parameters amplitude and phase unrelated to the target itself, such as environmental variations such as temperature variations at the level of the chip itself. The microfluidic layer used here is composed of complementary DNA strands of 40 mer codons. The curves of different color levels (black to light gray) thus show a kinetics of variation characteristic of the concentrations analyzed, here from 25 nM to 500 nM. The curves observed follow a conventional adsorption process of the isothermal Langmuir type.

Il est à noter que les mesures de type SPR ci-dessus, effectuées avec un dispositif laser selon l'exemple 1, peuvent être également réalisées à l'aide d'un dispositif laser tel que proposé dans la présente demande possédant d'autres caractéristiques, par exemple, avec une source laser fonctionnant à une toute autre longueur d'onde, comme dans l'infrarouge moyen ou le proche infrarouge, par exemple avec un VCSEL fonctionnant à une longueur d'onde de 850 mm environ avec la même modulation de phase, soit 3.84rad, et en adaptant la modulation de courant en mA pour atteindre cette modulation de phase, ainsi que les composants du système pour opérer à cette longueur d'onde.It should be noted that the SPR type measurements above, carried out with a laser device according to example 1, can also be carried out using a laser device as proposed in the present application having other characteristics. , for example, with a laser source operating at a completely different wavelength, such as in the mid-infrared or near-infrared, for example with a VCSEL operating at a wavelength of about 850 mm with the same modulation of phase, or 3.84rad, and adapting the current modulation in mA to achieve this phase modulation, as well as the system components to operate at this wavelength.

D'autres modes de réalisation peuvent être envisagés. Par exemple, un autre mode de réalisation peut comprendre des mesures multi-angles, où, dans les deux cas d'applications à l'ellipsométrie ou la détection par résonance de plasmon de surface, des mesures selon plusieurs angles d'incidence sont effectuées, ou inversement le faisceau en sortie de l'échantillon mesuré est séparé après interaction avec l'échantillon selon plusieurs angles différents. Dans le cas de la pluralité d'angles d'incidence, une lentille cylindrique peut par exemple être placée en amont de l'interface recevant les échantillons à tester pour obtenir un faisceau focalisé dans le plan d'incidence, donnant ainsi une pluralité d'angles d'incidence illuminant l'échantillon, celui-ci réfléchissant le faisceau étendu reçu selon plusieurs directions capté par un détecteur linéaire (de type barrette de diodes par exemple).Other embodiments can be considered. For example, another embodiment may include multi-angle measurements, where, in both cases of applications to ellipsometry or surface plasmon resonance detection, measurements at several angles of incidence are performed, or conversely, the beam at the output of the measured sample is separated after interaction with the sample at several different angles. In the case of the plurality of angles of incidence, a cylindrical lens can for example be placed upstream of the interface receiving the samples to be tested to obtain a focused beam in the plane of incidence, thus giving a plurality of angles of incidence illuminating the sample, the latter reflecting the extended beam received in several directions picked up by a linear detector (of the diode array type for example).

Egalement, comme évoqué dans l'exemple 6, les photo-détecteurs d'analyse 8, photo-détecteur pour ellipsométrie complète 10, et photo-détecteur TE et photo-détecteur TM 101 et 102 peuvent être des capteurs bidimensionnels permettant d'imager des échantillons à mesurer et d'obtenir des cartographies bidimensionnelles de caractéristiques de ces échantillons. Dans ce cas, tous types de capteurs bidimensionnels peuvent être utilisés, tels que des capteurs CCD ou CMOS, ou des photodétecteurs ayant un nombre réduit de zones de détection comme des photodiodes à quadrant pouvant également aider au centrage du faisceau.Also, as mentioned in example 6, the analysis photo-detectors 8, photo-detector for complete ellipsometry 10, and TE photo-detector and TM photo-detector 101 and 102 can be two-dimensional sensors making it possible to image samples to be measured and to obtain two-dimensional maps of the characteristics of these samples. In this case, all types two-dimensional sensors can be used, such as CCD or CMOS sensors, or photodetectors having a reduced number of detection zones such as quadrant photodiodes which can also help in centering the beam.

Egalement, des mesures ellipsométriques en transmission peuvent être réalisées dans le cas d'échantillon suffisamment transparents. Une pluralité de sources optiques laser peuvent également être employées pour étendre le domaine spectral d'analyse. Egalement, l'analyse ellipsométrique peut être étendue pour obtenir des informations complémentaires sur l'échantillon à partir des paramètres ellipsométriques déterminés à partir de modèle pouvant prendre en compte notamment la densité ou la rugosité d'une couche.Also, ellipsometric measurements in transmission can be carried out in the case of sufficiently transparent samples. A plurality of laser optical sources can also be employed to extend the spectral domain of analysis. Also, the ellipsometric analysis can be extended to obtain additional information on the sample from the ellipsometric parameters determined from a model that can take into account in particular the density or the roughness of a layer.

Egalement, le dispositif SPR pouvant intégrer une mesure ellipsométrique, ce dernier peut être utilisé pour déterminer les caractéristiques des couches composant la biopuce, par exemple l'épaisseur du dépôt d'or, ou l'épaisseur (ou la densité) d'une couche de fonctionnalisation, ou encore les couches moléculaires issues de l'analyte traversant la couche microfluidique s'accrochant à la surface. Ainsi la biopuce peut être préparée pour la mesure d'une espèce biochimique quelconque (pathogènes, protéines, bactéries, biomarqueurs) en s'aidant du dispositif de mesure ellipsométrique à chaque étape du processus de fonctionnalisation, qui est typiquement réalisée sur les biopuces SPR pour permettre la détection d'une cible notamment à l'aide d'anticorps, d'ADN ou d'aptamers.Also, the SPR device being able to integrate an ellipsometric measurement, the latter can be used to determine the characteristics of the layers making up the biochip, for example the thickness of the gold deposit, or the thickness (or the density) of a layer of functionalization, or even the molecular layers resulting from the analyte crossing the microfluidic layer clinging to the surface. Thus the biochip can be prepared for the measurement of any biochemical species (pathogens, proteins, bacteria, biomarkers) using the ellipsometric measurement device at each step of the functionalization process, which is typically carried out on SPR biochips to allow the detection of a target in particular using antibodies, DNA or aptamers.

Les exemples d'interfaces optomécaniques 70 donnés dans cette description ne sont pas limitatifs. Ainsi, en plus d'un simple support comme à l'exemple 5, ou d'un prisme de couplage pourvu ou non d'élément résonant comme à l'exemple 5, des réseaux de couplage ou des lentilles pourraient être utilisés pour exciter optiquement une résonance de l'échantillon. En particulier, les dispositifs SPR nécessitent typiquement un élément de couplage comme dans les exemples donnés dans cette description. L'élément de couplage permet d'obtenir, le cas échéant, une pluralité d'angles d'excitation. L'excitation privilégiée des dispositifs SPR est une excitation sous un angle supercritique connu sous l'appellation de configuration Kretschmann. Ainsi le rôle essentiel de l'interface opto-mécanique est de définir le ou les angles d'incidence et plus généralement les conditions d'éclairage sur l'échantillon.The examples of optomechanical interfaces 70 given in this description are not limiting. Thus, in addition to a simple support as in example 5, or a coupling prism provided or not with a resonant element as in example 5, coupling gratings or lenses could be used to optically excite a sample resonance. In particular, SPR devices typically require a coupling element as in the examples given in this description. The coupling element makes it possible to obtain, if necessary, a plurality of excitation angles. The preferred excitation of SPR devices is excitation at a supercritical angle known as the Kretschmann configuration. Thus the essential role of the opto-mechanical interface is to define the angle(s) of incidence and more generally the lighting conditions on the sample.

Claims (12)

  1. A laser device (D) for polarization interferometry adapted to deliver a temporally phase-modulated laser beam (Smodulated) and comprising:
    - a longitudinal single-mode laser source (1), powered by an electrical power supply current, and configured to deliver a polarized source laser beam (Ssource) of wavelength (λ), comprising two non-zero orthogonal rectilinear polarization components, respectively called electric transverse, TE, and magnetic transverse, TM,
    - means for electronic temporal modulation of the laser source (2) configured to drive a temporal modulation of the wavelength of the source laser beam (Ssource),
    - a passive phase delay element, producing two paths of different optical lengths for said TE and TM polarization components (3), configured to receive the source laser beam (Ssource) and to introduce, due to the wavelength modulation of the source laser beam (Ssource), a temporally modulated phase shift between said TE and TM components to provide said temporally phase-modulated laser beam (Smodulated), wherein the passive phase delay element comprises a component having a birefringence and is configured to create a common geometric path for the TE and TM components.
  2. The laser device (D) according to claim1 , wherein the laser source (1) is a semiconductor laser which can be wavelength-modulated by the electrical current for powering the laser over a tunability range of less than one thousandth of the wavelength.
  3. The laser device (D) according to claim 2, wherein the semiconductor laser type source (1) is a vertical-cavity surface-emitting laser diode VCSEL.
  4. The laser device (D) according to claim 3, wherein the phase delay element (3) comprises a birefringent crystal having an optical axis oriented along one of said TE or TM polarization components of the source laser beam (Ssource).
  5. The laser device (D') according to one of claims 1 to 4, further comprising:
    - a reference beam splitter (4) at the output of the phase delay element (3) intended to split the beam into at least two portions (Sreference) and (Smodulated), the first portion (Sreference) being a reference portion of the temporally phase-modulated laser beam (Smodulated), and said beam splitter being configured to propagate the reference portion in a direction different from that of the temporally phase-modulated laser beam (Smodulated)
    - a reference photo-detector (5) comprising an input intended to receive, via a reference polarizer (5'), said reference portion (Sreference), and said reference photo-detector (5) being configured to generate a first interferometric signal, in the form of a first modulated electrical signal (Iref) representative of said reference portion (Sreference)
    - a reference electronic analysis unit (6a) configured to receive and analyze said electrical signal (Iref) to extract an average phase shift (Δref) between the two electric transverse TE and magnetic transverse TM orthogonal components of the reference portion (Sreference), the modulated electrical signal (Iref) representative of said reference portion (Sreference) including an amplitude term (Aref) proportional to the product of the amplitudes of the two electric transverse TE and magnetic transverse TM components and a phase term,
    the reference electronic analysis unit (6a) being configured to, by analysis of said electrical signal (Iref), deduce therefrom the average phase shift (Δref) between the two electric transverse TE and magnetic transverse TM components of the reference portion (Sreference), and to extract said amplitude term (Aref), and
    the reference electronic analysis unit (6A) being further configured to provide a correction coefficient to the means for temporal modulation of the laser source (2) so as to adjust the temporal modulation of the laser source (1) and to stabilize the average wavelength λ thereof by stabilization of the average phase shift (Δref).
  6. The laser device (D') according to claim 5, wherein said reference electronic analysis unit (6a) is connected to the means for temporal modulation of the laser source (2) so as to constitute a servo-control loop for stabilizing the average phase shift (Δref).
  7. A polarization interferometer I configured to measure characteristics of a sample (7), comprising:
    - a laser device (D) or (D') according to any one of claims 1 to 6, adapted to deliver a temporally phase-modulated laser beam (Smodulated);
    - an opto-mechanical interface (70):
    - an analysis photo-detector (8) and an analysis polarizer (8');
    - an electronic analysis unit (6b);
    wherein
    said opto-mechanical interface (70) being a simple support of the sample or an optical coupling system, which can include different optics, configured to receive and transmit the temporally phase-modulated laser beam (Smodulated) toward the sample (7) so as to generate an output beam (Ssample),
    the analysis photo-detector (8) comprises an input configured to receive, via the analysis polarizer (8'), said output beam (Ssample), and said analysis photo-detector (8) being configured to generate a second interferometric signal, in the form of a second modulated electrical signal (Isample),
    said electronic analysis unit (6b) is connected to the analysis photo-detector (8) and is configured to receive and analyze said modulated electrical signal (Isample) to determine characteristics of said sample (7).
  8. The polarization interferometer I according to claim7, configured to determine optical characteristics of said sample (7), wherein the electronic analysis unit (6b) is configured to, by analysis of said electrical signal (Isample), extract an amplitude term (Asample) and an average phase term (Δsample) between the two electric transverse TE and magnetic transverse TM components of the output beam (Ssample) allowing determination of the optical characteristics of said sample (7), and
    when the polarization interferometer comprises:
    - a reference beam splitter (4) at the output of the phase delay element (3) configured to split the beam into at least two portions (Sreference) and (Smodulated), said portion (Sreference) being a reference portion of the temporally phase-modulated laser beam (Smodulated), and being configured to propagate in a direction different from that of the temporally phase-modulated laser beam (Smodulated),
    - a reference photo-detector (5) comprising an input configured to receive, via a reference polarizer (5'), said reference portion (Sreference), and said reference photo-detector (5) being configured to generate a first interferometric signal, in the form of a first modulated electrical signal (Iref) representative of said reference portion (Sreference),
    - a reference electronic analysis unit (6a) configured to receive and analyze said electrical signal (Iref),
    said reference electronic analysis unit (6a) is further configured to extract an average phase shift (Δref) between the two electric transverse TE and magnetic transverse TM components of the reference portion (Sreference), so as to calculate, to within an additive constant, an optical phase shift increment (Δ) induced by the sample by the formula Δ=Δsample- Δref.
  9. An ellipsometer configured to operate in reflection, and configured to determine an ellipsometric parameter (Δellipsometry) of a sample (7) comprising a polarization interferometer I according to claim 8 and wherein:
    the opto-mechanical interface (70) of the polarization interferometer (I) is able to receive the sample (7),
    and
    when the laser device is a laser device D', comprising:
    - a reference beam splitter (4) at the output of the phase delay element (3) configured to split the beam into at least two portions (Sreference) and (Smodulated), said portion (Sreference) being a reference portion of the temporally phase-modulated laser beam (Smodulated), and being configured to propagate in a direction different from that of the temporally phase-modulated laser beam (Smodulated),
    - a reference photo-detector (5) comprising an input configured to receive, via a reference polarizer (5'), said reference portion (Sreference), and said reference photo-detector (5) being configured to generate a first interferometric signal, in the form of a first modulated electrical signal (Iref) representative of said reference portion (Sreference),
    - a reference electronic analysis unit (6a) configured to receive and analyze said electrical signal (Iref), then
    the reference electronic analysis unit (6a) is configured, by analysis of said electrical signal (Iref), to extract an average phase shift (Δref) between the two electric transverse TE and magnetic transverse TM components of the reference portion (Sreference), to obtain the ellipsometric parameter (Δellipsometry) by the formula (Δellipsometry) = (Δsample▪ (Δref) to within an additive constant.
  10. The ellipsometer according to claim 9, configured to determine an ellipsometric parameter (tanΨ) of a sample (7) and comprising a first additional detection channel, said first additional detection channel comprising:
    - a first polarization-selective beam splitter device (9a), configured to take a portion of the output beam (Ssample) and select one of the two electric transverse TE and magnetic transverse TM components of the output beam (Ssample) in the form of a beam (StanΨ) called polarized portion
    - a photo-detector for complete ellipsometry (10) configured to receive said polarized portion (StanΨ) and to generate an electrical signal (ItanΨ) characteristic of the light intensity of the polarized portion, where said first additional detection channel is configured to determine the ellipsometric parameter (tanΨ) of the sample using the electrical signals (Isample) and (ItanΨ) respectively from the analysis photo-detector (8) and the photo-detector for complete ellipsometry (10).
  11. The ellipsometer according to claim 9, configured to determine an ellipsometric parameter (tanΨ) of a sample (7) and further comprising a second additional detection channel, said second additional detection channel comprising:
    - a second polarization-selective beam splitter device (9b) configured to take a portion of the output beam (Ssample) and select the two electric transverse TE and magnetic transverse TM components of the output beam (Ssample) in the form of two beams (StanΨ_TE) and (StanΨ_TM) called TE polarized portion and TM polarized portion, respectively,
    - two photo-detectors (101) and (102) called TE photo-detector and TM photo-detector configured to receive said TE polarized portion (StanΨ_TE) and TM polarized portion (StanΨ_TM), respectively, and to generate a respective electrical signal (ItanΨ_TE) characteristic of the light intensity of the TE polarized portion (StanΨ_TE) and an electrical signal (ItanΨ_TM) characteristic of the light intensity of the TM polarized portion (StanΨ_TM), where the second additional detection channel is configured to determine the ellipsometric parameter (tanΨ) of the sample using the electrical signals (ItanΨ_TE) and (ItanΨ_TM) from the TE photo-detector (101) and TM photo-detector (102).
  12. A biosensor of the surface plasmon resonance detection system type configured to determine characteristics of a sample (7) consisting of a microfluidic layer (MF), corresponding to the biological or biochemical medium to be analyzed, the biosensor comprising:
    - a polarization interferometer (I) according to any one of claims 7 or 8 or an ellipsometer according to any one of claims 9 to 11
    - a removable biochip (11), which is supported by a prism, on which is deposited a thin resonant metal layer or another optical resonator (ME) capable of receiving the microfluidic layer (MF) to be analyzed by said polarization interferometer or said ellipsometer, said biochip being configured so as to intercept the temporally phase-modulated laser beam (Smodulated) wherein:
    - the interaction between the temporally phase-modulated laser beam (Smodulated) and the sample consists of a resonant optical excitation of the resonator (ME) of the biochip in interaction with the microfluidic layer (MF), producing said output beam (Ssample)
    - said output beam (Ssample) characteristic of the sample (7) is configured to be sensed by the analysis photo-detector (8)
    - the electronic analysis unit (6b) is configured to analyze said modulated electrical signal (Isample) representative of the output beam (Ssample) generated by the analysis photo-detector (8) in order to determine characteristics of said sample (7).
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