EP2845920A1 - Oxide compounds as a coating composition - Google Patents
Oxide compounds as a coating composition Download PDFInfo
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- EP2845920A1 EP2845920A1 EP14186650.9A EP14186650A EP2845920A1 EP 2845920 A1 EP2845920 A1 EP 2845920A1 EP 14186650 A EP14186650 A EP 14186650A EP 2845920 A1 EP2845920 A1 EP 2845920A1
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- laser
- composite structure
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- oxide
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- 150000001875 compounds Chemical class 0.000 title description 16
- 239000008199 coating composition Substances 0.000 title description 11
- 239000002131 composite material Substances 0.000 claims abstract description 64
- 238000000576 coating method Methods 0.000 claims abstract description 44
- 239000011248 coating agent Substances 0.000 claims abstract description 31
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 238000000354 decomposition reaction Methods 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 239000011253 protective coating Substances 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 150000002902 organometallic compounds Chemical group 0.000 claims description 3
- 229910052716 thallium Inorganic materials 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 55
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 41
- 238000010438 heat treatment Methods 0.000 description 33
- 238000000034 method Methods 0.000 description 33
- 239000010410 layer Substances 0.000 description 31
- 238000006243 chemical reaction Methods 0.000 description 20
- 239000002243 precursor Substances 0.000 description 19
- 238000010521 absorption reaction Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 13
- 239000000919 ceramic Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000002441 X-ray diffraction Methods 0.000 description 9
- 239000011230 binding agent Substances 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- -1 aluminum halides Chemical class 0.000 description 8
- 230000008901 benefit Effects 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 238000011161 development Methods 0.000 description 7
- 230000018109 developmental process Effects 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 238000005245 sintering Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 238000000149 argon plasma sintering Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000010431 corundum Substances 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000035515 penetration Effects 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000002070 nanowire Substances 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000001149 thermolysis Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000013532 laser treatment Methods 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- XMTQQYYKAHVGBJ-UHFFFAOYSA-N 3-(3,4-DICHLOROPHENYL)-1,1-DIMETHYLUREA Chemical compound CN(C)C(=O)NC1=CC=C(Cl)C(Cl)=C1 XMTQQYYKAHVGBJ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 239000011246 composite particle Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000005293 duran Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000005244 neohexyl group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to a coating composition consisting of oxide compounds, a process for producing these oxide compounds and their use.
- Oxide layers particularly ceramic and especially alumina (Al 2 O 3 ), are used as a coating material for a variety of applications requiring high heat and heat shock stability or resistance to wear, oxidation or hot corrosion, thermal stability and electrical insulation put.
- Such layers can act as a diffusion barrier for ions and have high chemical stability and radiation resistance. They are therefore used in many areas.
- aluminum oxide serves as an insulating material in the field of microelectronics. Because of its chemical resistance and biocompatibility, it is also used in the field of medicine. Coatings with oxides are a good way to protect surfaces against, for example, oxidation or molten salt corrosion. This high chemical stability coupled with very favorable mechanical properties makes oxides an ideal material for protective coatings.
- alumina is present both as an amorphous phase and in various crystalline modifications with different properties. The latter have the more advantageous properties for protective coatings since amorphous phases are usually softer.
- Crystalline alumina can exist in various modifications, of which only ⁇ -Al 2 O 3 (corundum) is thermodynamically stable.
- transition aluminas such as ⁇ , ⁇ , ⁇ , ⁇ , ⁇ , ⁇ '-Al 2 O 3 and Al 2 O 3 -KII, are metastable and can be converted irreversibly into ⁇ -Al 2 O 3 . Above 1200 ° C, corundum is the only stable modification. Corundum is also the hardest modification of alumina. The low ionic conductivity and its high thermodynamic stability make it an important coating against oxidation.
- a number of methods are known in the art for producing coatings and films of alumina, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), hydrothermal synthesis , sputtering, or sol-gel deposition. Method.
- US 5,302,368 describes the preparation of coatings by applying a dispersion of aluminum hydroxide and / or a transition alumina in an aqueous medium. After adjustment of the suspension and spray drying, the dry powder is calcined at 1100 ° C to 1500 ° C in the presence of a chlorine-containing substance.
- CVD chemical vapor deposition
- US 5,654,035 describes such a process wherein the body to be coated is contacted at high temperature with a hydrogen carrier gas containing one or more aluminum halides and a hydrolyzing or oxidizing agent. Additionally describes US 6,713,172 the application of this method for coating cutting tools, again at high temperatures of about 1000 ° C.
- US 7,238,420 describes a nanotemplate of relatively pure and completely crystalline ⁇ -Al 2 O 3 on a metal alloy.
- crystalline ⁇ -Al 2 O 3 is generated directly on the surface of the alloy by CVD.
- CVD chemical vapor deposition
- it is pretreated before deposition with a CO 2 / H 2 mixture at high temperatures of 1000 ° C to 1200 ° C.
- PVD physical vapor deposition
- US 5,683,761 describes a method for depositing ⁇ -Al 2 O 3 using electron beam PVD.
- the substrate must be heated to about 1000 ° C.
- the deposition of pure oxide, in this case ⁇ -Al 2 O 3 thus requires high temperatures.
- Variants of the CVD methods such as plasma assisted / enhanced chemical vapor deposition (PACVD / PECVD) or metal organic chamical vapor deposition (MOCVD) also offer the possibility of using lower temperatures.
- PCVD / PECVD plasma assisted / enhanced chemical vapor deposition
- MOCVD metal organic chamical vapor deposition
- MOCVD processes offer many advantages, such as lower temperatures, simple processes, uniform coatings or the use of a single precursor, but they also lead to carbonaceous impurities in the coating.
- the degree of crystallinity and the crystalline phases within the deposited oxide layer are very important for their mechanical properties.
- a pure phase with high thermal and mechanical stability is clearly preferred over a mixture of different phases.
- a suitable heat treatment of the coated substrate is necessary, which not only leads to the transformation into the desired phase, but in addition to a densification of the coating, which also plays a major role for the mechanical stability of the layer.
- Such heat treatment often requires temperatures above 1200 ° C, which are not suitable for many substrates.
- a local heat treatment is recommended.
- lasers for the treatment of such ceramic materials have already been used successfully (laser sintering).
- the coating is heated in a small area by means of a laser beam.
- these methods are used because they absorb in the field of CO 2 laser used.
- a particular problem is the formation of thermally induced jumps in the reconsolidation and cooling of the material. They result from the brittleness of the ceramics and from the high temperature gradient between the impact area and surrounding material, and the different thermal expansion coefficients of the coating and substrate.
- binders to the oxide compounds, for example the aluminum oxide particles. So describes US 6,048,954 such a binder composition for refractory inorganic particles. Although such binders increase the compaction of the coating, they are only applicable to powdered materials and the binder and its residues must be removed after laser sintering or even remain in the oxide layer.
- DE 10 2006 013 484 A1 describes the fabrication of an element / element oxide composite, that is, a material containing element and the corresponding element oxide, in this case, metal core and oxide sheath nanowires.
- the disadvantage of most processes for the production of oxide layers is the high temperatures of the process. at the laser sintering method, the main drawbacks are that only very specific lasers in a particular wavelength range, usually CO 2 laser, are suitable to be used, the precursor used does not absorb other wavelengths. This causes high temperature gradients and leads to a higher load on the substrate and to thermally induced cracks and defects. Therefore, the addition of additional binders is often necessary to increase the absorption of the laser energy and to achieve a high quality of the coating. However, residues of these binders remain in the coating. Also, the production of high-quality and defect-free coatings requires a high degree of experience, since an influence on the underlying substrate or an excessive heating must be avoided.
- the present invention has for its object to overcome the disadvantages of the prior art in the preparation of oxide layers as a coating composition.
- the object of the invention is, in particular, to provide a process which enables the preparation of suitable oxide compounds as a coating composition.
- oxide layers are obtained which have few to no defects and high hardness and densification.
- the composite structure is called a composite structure because it consists of both the element and element oxide.
- the inventive coating of the surface with the element / element oxide composite structure is preferably carried out by the metal organic chamical vapor deposition (MOCVD) method.
- MOCVD metal organic chamical vapor deposition
- organometallic precursors precursors
- precursors are converted into the gas phase and thermally decomposed, the non-volatile decomposition product usually being deposited on or on the substrate.
- the precursors used in the invention have the general formula El (OR) n H 2 wherein El is Al, Ga, In, Tl, Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2.
- the aliphatic and alicyclic hydrocarbon radical is preferably saturated and has, for example, a length of 1 to 20 carbon atoms. Preferred are alkyl or unsubstituted or alkyl-substituted cycloalkyl.
- the alkyl radical preferably has 2 to 15 C atoms, preferably 3 to 10 C atoms, and may be linear or branched, with branched alkyl radicals being preferred.
- Examples which may be mentioned here are ethyl, n-propyl, n-butyl and the corresponding higher linear homologues, isopropyl, sec-butyl, neo-pentyl, neohexyl and the corresponding higher isoalkyl and neoalkyl homologues or 2-ethylhexyl.
- the alicyclic rings may comprise one, two or more rings, each of which may be substituted with alkyl.
- the alicyclic radical preferably has 5 to 10, particularly preferably 5 to 8, C atoms. Examples include cyclopentyl, cyclohexyl, methylcyclohexyl, norbornyl and adamantyl.
- Aluminiumalkoxydihydride having branched alkoxy having 4 to 8 carbon atoms in particular aluminum tert-butoxydihydrid.
- the preparation of such compounds is described in DE 19529241 A1 described. They may be obtained, for example, by reacting aluminum hydride with the corresponding 1: 1 molar ratio alcohol, the aluminum hydride being prepared in situ by reaction of an alkali aluminum hydride with an aluminum halide.
- the preparation of such compounds from Veith et al. (Chem. Ber. 1996, 129, 381-384 It is also shown that the compounds of formula El (OR) H 2 may also comprise dimeric forms.
- the compounds are preferably converted to the gas phase and thermally decomposed, the non-volatile decomposition product usually being formed on or on a substrate in the form of the element / element oxide composite structure.
- Suitable substrates for applying the coating are all customary materials, for example metal, ceramics, alloys, quartz, glass or glass-like, preferably inert to the starting and end products.
- the thermolysis can be carried out, for example, in an oven, on an inductively heated surface or on a surface located on an inductively heated sample carrier. In inductive heating only conductive substrates, such as metals, alloys or graphite can be used. For substrates with low conductivity, an electrically conductive substrate carrier or oven should be used with inductive heating.
- the substrate may therefore be both a surface of the reaction space and a substrate placed therein.
- the reactor space used may have any shape and consist of any conventional inert material, such as Duran- or quartz glass. Reactor rooms with hot or cold walls can be used. The heating can be done electrically or by other means, preferably by means of a high-frequency generator.
- the oven, as well as the substrate carrier can have any shapes and sizes according to the type and shape of the substrate to be coated, the substrate may for example be a plate, planar surface, tubular, cylindrical, cuboid or have a more complex shape.
- the substrate to be coated for example metal, alloy, semiconductor, ceramic, quartz, glass or glass-like, to above 500 ° C. before the introduction of the organometallic precursor in order to clean the surface.
- the desired element / element oxide composite structure is preferably formed at temperatures of above 400 ° C, more preferably above 450 ° C. Preference is given to temperatures of not more than 1200 ° C, especially not more than 600 ° C, e.g. 400 ° C to 1200 ° C, and preferably 450 ° C to 650 ° C, particularly preferably 450 ° C to 600 ° C.
- the substrate on or at which the thermolysis takes place is accordingly heated to the desired temperature.
- the generation of the element / element oxide composite structure according to the invention is independent of the substrate material used and its nature.
- the (organometallic) compound, or the precursor can be introduced from a storage vessel, which is preferably heated to a desired evaporation temperature in the reactor.
- a desired evaporation temperature in the reactor may be heated to a temperature between -50 ° C. and 120 ° C., preferably between -10 ° C. and 40 ° C.
- the thermolysis in the reactor chamber is generally carried out at a reduced pressure of 10 -6 mbar to atmospheric pressure, preferably in a range of 10 -4 mbar to 10 -1 mbar, preferably 10 -4 mbar to 10 -2 mbar.
- a vacuum pump system can be connected to the reactor on the output side.
- the storage vessel for the precursor is mounted on the side of the reactor space and on the other side of the vacuum pump system.
- the substrate When the substrate is heated by induction, e.g. square centimeter-sized, electrically conductive metal platelets or foils are arranged as a substrate in a reaction tube of duran or quartz glass.
- a reaction tube On the reaction tube, the supply vessel, which is tempered to the desired evaporation temperature, is connected on the input side to the precursor and, on the output side, a vacuum pump system.
- the reaction tube is located in a high-frequency induction field, with the aid of which the substrate platelets or foils are heated to the desired temperature. After setting the desired pressure and introducing the precursor, the substrate is covered with the element / element oxide composite structure.
- valve can be controlled manually or automatically.
- duration of the addition of the precursor may be a few minutes to several hours.
- the morphology of the element / element oxide composite structure can be controlled.
- the element / element oxide composite structure obtained can be subjected to a treatment with a mixture, a solution and / or a suspension of organic and / or inorganic substances.
- the substrate can be coated only in desired areas with the element / element oxide composite structure, which also limits the treatment by local heating to these areas.
- the element / element oxide composite is heated locally, more preferably by means of a laser. This process is also called sintering.
- the element / element oxide composite structure is converted into the desired element oxide structure. This change may also involve the conversion to one or more modifications of a crystal structure, most preferably the formation of a single modification of the element oxide.
- the element / element oxide composite structure has better thermal conductivity than the pure element oxide and thereby results in a reduced temperature gradient during local heating. This reduces the cracks induced thereby.
- the elemental component of the element / element oxide composite structure can function as a binder by melting during heating and thus filling out any cracks and pores that may have resulted from the heating in the element / element oxide composite structure.
- no addition of a separate binder is necessary, which could lead to undesirable residues.
- the element / element oxide composite structure at the place of heating is not completely converted into the corresponding element oxide.
- the degree of conversion can be controlled very accurately. This allows the selective production of areas of specific structure and morphology, and thus, for example, the production of nanowires, nanoparticles and fractal surfaces.
- the element / element oxide composite structure is completely converted at the place of heating into the corresponding element oxide.
- the degree of conversion can be controlled up to complete conversion.
- the melting of the metallic component of the element / element oxide composite structure makes it possible to produce particularly defect-free and uniform oxide layers.
- the fabricated element / element oxide composite structure may be a broad band absorber and thus absorb light from a very broad wavelength range.
- the wavelength of the laser can range from UV to electromagnetic waves, preferably in the range of 300 nm to 15 ⁇ m, more preferably in the range of 500 nm to 11 ⁇ m, even more advantageously, but not limited to, lasers with wavelengths of 488 nm. 514 nm, 532 nm, 635 nm, 1064 nm or 10.6 ⁇ m. Continuous (CW) or pulsed lasers can be used.
- the laser energy used is between 1 milliwatt per square centimeter and several watts per square centimeter, preferably between 1 milliwatt per square centimeter and 10 watts per square centimeter, more preferably between 1 mW / cm 2 and 5, depending on the wavelength and element / element oxide composite used W / cm 2 .
- a particular advantage of the invention is the realization of very low penetration depths of the laser.
- the penetration depth can be reduced to a range of less than approximately 400 nm, preferably less than approximately 300 nm, particularly preferably less than approximately 200 nm, particularly preferably less than approximately 100 nm.
- the layer thickness of the element oxide layer produced can accordingly be between about 400 nm and about 10 nm, preferably between about 300 nm and about 10 nm, more preferably between about 200 nm and about 10 nm, particularly preferably between about 100 nm and about 10 nm.
- Another particular advantage of the invention lies in the possibility of being able to produce not only particularly thin, but also particularly hard oxide layers, which are particularly preferred offer high corrosion protection due to low permeability.
- the light absorption of the element / element oxide composite structure is measured at the point of the treatment, during the heating or between several sintering processes.
- the absorption for example of light in the visible region
- the site of heating may change. From this change, it is possible to produce a certain degree of conversion by adjusting process parameters such as but not limited to laser intensity, wavelength, laser exposure time, repetition of heating. After reaching the desired level, the heating can be stopped at this location.
- the wavelength of the laser is chosen such that it is reflected by a pure element oxide layer.
- lasers having wavelengths in the visible range of the light are particularly preferably selected. Due to the absorption properties of the element / element oxide composite structure according to the invention, local heating with lasers with this wavelength range is possible.
- the "overheating" of the oxide layer produced can also be used to adjust a certain porosity by the targeted generation of defects.
- Another advantage of the present invention lies in the possibility of heating locally, i. not only with the protection of the underlying substrate, but also to perform only in desired areas of the element / element oxide composite structure, for example if such a coating is desired only on the outside of the substrate.
- Another advantage of the present invention is the ability to create a particular desired structure on the surface of the substrate by targeted proportionate or complete conversion of the element / element oxide composite structure. Due to the possibility of using lasers with shorter wavelengths, structures with a significantly higher resolution than with the usual CO 2 lasers are possible, theoretically limited by half the wavelength used.
- the local heating according to the invention can be carried out with the aid of a computer-controlled laser scanner, preferably with focusing optics, in order to better focus the laser beam.
- the present invention further relates to a coating composition, in particular preparable by the abovementioned method according to the invention, comprising oxide layers with high to complete oxide content, which are formed by thermolytic decomposition of organometallic compounds of the formula El (OR) n H 2 where El Al, Ga, In, Tl Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2, are prepared at a temperature of more than 400 ° C to form an element / element oxide composite structure and the produced element / element oxide composite structure by brief, local heating, preferably by means of a laser (sintered) is converted into the oxide compound.
- a coating composition in particular preparable by the abovementioned method according to the invention, comprising oxide layers with high to complete oxide content, which are formed by thermolytic decomposition of organometallic compounds of the formula El (OR) n H 2 where El Al, Ga, In, Tl Si, Ge, Sn, Pb or Zr
- the proportion of the oxide compound in the coating composition is preferably at least 80%, preferably at least 95%, particularly preferably almost 100%.
- the oxide compound is a ceramic oxide, more preferably aluminum or gallium oxide, more preferably alumina and most preferably alumina as ⁇ -Al 2 O 3 (corundum).
- the coating composition may have a high hardness, for example, in the case of alumina, a hardness of about 28 GPa can be achieved.
- the coating compositions of the invention are characterized by a high adhesion to the substrate.
- the coating compositions according to the invention have a low diffusion coefficient for ions and a low permeability to water. By these properties make them particularly suitable as protection of the substrate against corrosion or wear and abrasion.
- the invention relates to the use of the coating composition according to the invention for coating substrates of, for example, metal, semiconductor, alloy, ceramic, quartz, glass or glass-like materials.
- the coating composition according to the invention can be applied to (almost) all substrates. Suitable substrates are known to the person skilled in the art.
- the versatility of the element / element oxide composite structure conversion process of the present invention allows numerous applications.
- very hard, wear-resistant protective layers can be produced for components with high wear and tear.
- the possibility of producing very defect-free layers makes it possible to use the protective layers for electrical or thermal insulation.
- applications in the field of medicine, in particular as a coating for implants are possible.
- Purposefully structured surfaces according to the invention are suitable for example in the field of catalysis, filtration or lithography up to storage media, such as information storage.
- the element / element composite structure according to the invention is suitable for the production of surfaces with absorption of a broad wavelength range because of their absorption properties.
- surfaces with absorption of a broad wavelength range because of their absorption properties.
- Lichtenergyaborbierende coatings for solar cells for example, for Licht energieaborbierende coatings for solar cells, sunscreen coatings, solar panels and the like ..
- the invention comprises a device for carrying out the local heating, preferably with the aid of a laser, preferably with a computer-controlled laser scanner, particularly preferably with a laser beam focusing optics.
- a further advantageous development of the device according to the invention comprises the possibility of measuring the light absorption of the element / element oxide composite structure at the point of the treatment, during the heating or between several sintering processes. This can be done by measuring the intensity of the reflection of the laser at the point of heating or by measuring the intensity of the reflection at the point of heating with another light source of suitable wavelength during sintering or between several sintering operations. This allows complete automation of the method according to the invention.
- area information always includes all - not mentioned - intermediate values and all imaginable subintervals.
- the picture series Fig. 1 to 3 clearly shows the influence of the action of the laser as a function of the exposure time, in this case given by the speed with which the laser was moved over the sample.
- Fig. 1 an untreated Al / Al 2 O 3 composite structure before laser treatment. Neither a uniform surface nor a structuring of the surface can be recognized.
- Fig. 2 shows an Al / Al 2 O 3 composite structure after a short laser treatment. This leads to the formation of new morphologies and structures, in this case nanowires and fractal structures.
- Fig. 3 shows a treated to complete conversion Al / Al 2 O 3 composite structure. There are only a few defects and the surface appears uniform.
- Fig. 4 shows the broad absorption of the Al / Al 2 O 3 composite structure (thickness: 200-400 nm). The absorption in a wide wavelength range allows the use of lasers in a wide wavelength range.
- Fig. 5 and Fig. 6 show a X-ray diffraction analysis of different Al / Al 2 O 3 composite structures treated for different times on two different substrates. It can be clearly seen that the signals of the ⁇ -Al 2 O 3 crystal structure increase and the signals of the metallic aluminum decrease. This shows an increasing crystallization and formation of ⁇ -Al 2 O 3 .
- Fig. 7 shows the selective conversion in certain range depending on the energy.
- strip-shaped regions with increasing treatment intensity towards the left which are each separated by untreated strips, were produced according to the method according to the invention. It is clear to recognize the precise resolution and the accuracy with which the inventive method allows the targeted production of structures on surfaces.
- Fig. 8 shows the water permeability of differently treated Al / Al 2 O 3 composite structures. While the untreated Al / Al 2 O 3 composite structure (top, squares) shows a high permeability to water and is therefore unsuitable as corrosion protection, the fully converted Al / Al 2 O 3 composite structure according to the invention exhibits no permeability (bottom, triangles) , On the other hand, an Al 2 O 3 coating with defects (center, circles) has a significantly higher permeability. This shows how important is a precise control of the conversion conditions to produce tough and safe protective coatings.
- FIG. 9 shows the measurement of the hardness of a fully converted Al / Al 2 O 3 composite structure by means of nano intention. A hardness of 28 (+/- 2) GPa was measured.
- the precursor alumuninium tert-butoxide dihydride (Al (tBu) H 2 ) was deposited in a CVD apparatus under argon at a temperature of 600 ° C on a metal substrate (steel, copper, nickel or platinum) or alternatively on glass or ceramics deposited.
- the heating of the furnace was carried out inductively, wherein in the case of the glass, a conductive sample holder was used.
- the pressure in the reactor was about 6.0 ⁇ 10 -2 mbar.
- the volatile decomposition products of the precursor were detected with an attached mass spectrometer.
- the duration of the precursor flow was about 10 minutes. With longer duration (30 to 90 minutes) higher thicknesses could be obtained.
- the resulting Al / Al 2 O 3 composite structure is dark to black because of its absorption.
- the local heating was carried out by means of a laser.
- an air-cooled CO 2 laser with a wavelength of 10.6 ⁇ m was used, which is guided by a biconvex ZnSe lens was focused with a focal length of 120 mm.
- the exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns.
- the intensity of the laser was varied between 1 W / cm 2 and 5 W / cm 2 . This laser is absorbed by the Al / Al 2 O 3 composite structure and the alumina layer.
- an argon ion laser with wavelengths in the range of visible light was used, which was focused by means of a biconvex lens with the focal length of 120 mm.
- the exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns.
- the wavelengths 514 nm, 488 nm and a wavelength range from 450 nm to 532 nm (mixed line) were used.
- the intensity was varied between 0.4 W / cm 2 and 2 W / cm 2 . This laser is absorbed only by the Al / Al 2 O 3 composite structure and not by the fully converted aluminum oxide layer.
- a pulsed laser was used for brittle substrates, especially some glasses and ceramics. It was possible to treat thin, and very thin layers of Al / Al 2 O 3 composite structure influencing the substrate. For this purpose, lasers with the wavelengths 266 nm, 355 nm, 532 nm or 1064 nm were used. The intensity was kept low and was 200 joules with a pulse length of 4-8 ns. The exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns. The treatment was carried out with a single pulse as well as a repetition of pulses at a rate of 10 Hz. This allowed a low penetration depth of the laser of only 200-300 nm can be achieved. This allowed the production of very thin oxide layers ( ⁇ 300 nm and even ⁇ 200 nm) with particularly high corrosion protection and with a hardness of 28 (+/- 2) GPa.
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Abstract
Die vorliegende Erfindung betrifft Element/Elementoxid-Kompositstrukturen als lichtabsorbierende Beschichtung insbesondere für Solarzellen, Sonnenkollektoren und Lichtschutzbeschichtungen.The present invention relates to element / element oxide composite structures as a light-absorbing coating, in particular for solar cells, solar collectors and light protection coatings.
Description
Die vorliegende Erfindung betrifft eine Beschichtungszusammensetzung bestehend aus Oxidverbindungen, ein Verfahren zur Herstellung dieser Oxidverbindungen sowie deren Verwendung.The present invention relates to a coating composition consisting of oxide compounds, a process for producing these oxide compounds and their use.
Oxidschichten ,insbesondere keramische und besonders Aluminiumoxid (Al2O3), werden als Beschichtungsmaterial für eine Vielzahl von Anwendung verwendet, die hohe Ansprüche an Hitze- und Hitzeschockstabilität oder Widerstand gegen Abnutzung, Oxidation oder Salzschmelzenkorrosion (hot corrosion), thermische Stabilität und elektrische Isolation stellen.Oxide layers, particularly ceramic and especially alumina (Al 2 O 3 ), are used as a coating material for a variety of applications requiring high heat and heat shock stability or resistance to wear, oxidation or hot corrosion, thermal stability and electrical insulation put.
Solche Schichten können als eine Diffusionsbarriere für Ionen wirken und besitzen hohe chemische Stabilität und Strahlungsresistenz. Sie werden daher in vielen Bereichen eingesetzt. So dient beispielsweise Aluminiumoxid als Isolationsmaterial im Bereich der Mikroelektronik. Wegen seiner chemischen Resistenz und Biokompatibilität wird es auch im Bereich der Medizin verwendet. Beschichtungen mit Oxiden sind eine gute Möglichkeit, Oberflächen zum Beispiel gegen Oxidation oder Salzschmelzenkorrosion zu schützen. Diese hohe chemische Stabilität gepaart mit sehr vorteilhaften mechanischen Eigenschaften, machen Oxide zu einem idealen Material für Schutzschichten.Such layers can act as a diffusion barrier for ions and have high chemical stability and radiation resistance. They are therefore used in many areas. For example, aluminum oxide serves as an insulating material in the field of microelectronics. Because of its chemical resistance and biocompatibility, it is also used in the field of medicine. Coatings with oxides are a good way to protect surfaces against, for example, oxidation or molten salt corrosion. This high chemical stability coupled with very favorable mechanical properties makes oxides an ideal material for protective coatings.
Dabei stellt die Herstellung geeigneter Oxidverbindungen eine große Herausforderung dar, insbesondere die Herstellung geeigneter Oxidverbindungen mit hoher Homogenität und Reinheit ist schwierig. So liegt bspw. Aluminiumoxid sowohl als amorphe Phase als auch in verschiedenen kristallinen Modifikationen mit unterschiedlichen Eigenschaften vor. Letztere weisen die für schützende Beschichtungen vorteilhafteren Eigenschaften auf, da amorphe Phasen normalerweise weicher sind. Kristallines Aluminiumoxid kann in verschiedenen Modifikationen vorliegen, von denen nur α-Al2O3 (Korund) thermodynamisch stabil ist. Die anderen, sogenannten Übergangs-Aluminiumoxide, wie γ, δ, η, θ, χ, χ'- Al2O3 und Al2O3-KII, sind metastabil und können irreversibel in α-Al2O3 überführt werden. Oberhalb von 1200 °C ist Korund die einzige stabile Modifikation. Dabei ist Korund auch die härteste Modifikation von Aluminiumoxid. Die geringe Ionenleitfähigkeit und seine hohe thermodynamische Stabilität machen es zu einer wichtigen Beschichtung gegen Oxidationen.The preparation of suitable oxide compounds is a great challenge, especially the production of suitable oxide compounds with high homogeneity and purity is difficult. For example, alumina is present both as an amorphous phase and in various crystalline modifications with different properties. The latter have the more advantageous properties for protective coatings since amorphous phases are usually softer. Crystalline alumina can exist in various modifications, of which only α-Al 2 O 3 (corundum) is thermodynamically stable. The other so-called transition aluminas, such as γ, δ, η, θ, χ, χ'-Al 2 O 3 and Al 2 O 3 -KII, are metastable and can be converted irreversibly into α-Al 2 O 3 . Above 1200 ° C, corundum is the only stable modification. Corundum is also the hardest modification of alumina. The low ionic conductivity and its high thermodynamic stability make it an important coating against oxidation.
Im Stand der Technik sind eine Reihe von Verfahren bekannt, um Beschichtungen und Filme aus Aluminiumoxid herzustellen, wie zum Beispiel chemical vapour deposition (CVD), physical vapour deposition (PVD), hydrothermische Synthese (hydrothermal synthesis), Sputtern oder die Sol-Gel-Methode.A number of methods are known in the art for producing coatings and films of alumina, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), hydrothermal synthesis , sputtering, or sol-gel deposition. Method.
Für industrielle Anwendungen zur Abscheidung von Oxidschichten wird üblicherweise chemical vapour deposition (CVD) bei hohen Temperaturen, normalerweise um die 1000 °C, verwendet, da diese Technik die Möglichkeit bietet auch komplexe Geometrien bei gut kontrollierbarer Stärke der Beschichtung zu beschichten.For industrial applications for deposition of oxide layers, chemical vapor deposition (CVD) is usually used at high temperatures, typically around 1000 ° C, since this technique offers the possibility of coating even complex geometries with well controllable thickness of the coating.
Alle beschriebenen Verfahren benötigen hohe Temperaturen. Diese limitieren nicht nur die möglichen Substrate, sondern können auch zu thermischen Sprüngen in der Beschichtung führen. So haben die Oxidbeschichtungen und das Substrat häufig verschiedene thermischen Ausdehnungskoeffizienten von Film und Substrat, was zu thermisch induzierten Sprüngen in der Beschichtung führt.All procedures described require high temperatures. These not only limit the possible substrates, but can also lead to thermal cracks in the coating. Thus, the oxide coatings and the substrate often have different thermal expansion coefficients of film and substrate, resulting in thermally induced cracks in the coating.
Um die hohen Temperaturen zu umgehen, wurden große Anstrengungen unternommen Verfahren zu entwickeln, die es ermöglichen Oxidschichten bei niedrigeren Temperaturen abzuscheiden, zum Beispiel durch physical vapour deposition (PVD).In order to avoid the high temperatures, great efforts have been made to develop processes which make it possible to deposit oxide layers at lower temperatures, for example by physical vapor deposition (PVD).
Varianten der CVD-Verfahren, wie plasma assisted/enhanced chemical vapour deposition (PACVD/PECVD) oder metal organic chamical vapour deposition (MOCVD) bieten ebenso die Möglichkeit niedrigere Temperaturen zu verwenden.Variants of the CVD methods, such as plasma assisted / enhanced chemical vapor deposition (PACVD / PECVD) or metal organic chamical vapor deposition (MOCVD) also offer the possibility of using lower temperatures.
So beschreibt
MOCVD-Verfahren bieten zwar viele Vorteile, wie zum Beispiel niedrigere Temperaturen, einfache Prozesse, gleichmäßige Beschichtungen oder die Verwendung eines einzigen Vorläufers, aber sie führen auch zu kohleartigen Verunreinigungen in der Beschichtung.Although MOCVD processes offer many advantages, such as lower temperatures, simple processes, uniform coatings or the use of a single precursor, but they also lead to carbonaceous impurities in the coating.
Der Grad der Kristallinität und die kristallinen Phasen innerhalb der abgelagerten Oxidschicht sind sehr wichtig für ihre mechanischen Eigenschaften. Eine reine Phase mit hoher thermischer und mechanischer Stabilität ist gegenüber einer Mischung unterschiedlicher Phasen deutlich bevorzugt. Allerdings ist dazu eine geeignete Hitzebehandlung des beschichteten Substrats nötig, die nicht nur zur Transformation in die gewünschte Phase führt, sondern noch zusätzlich zu einer Verdichtung der Beschichtung, was ebenfalls für die mechanische Stabilität der Schicht eine große Rolle spielt. Eine solche Hitzebehandlung erfordert häufig Temperaturen von über 1200 °C, die für viele Substrate nicht geeignet sind.The degree of crystallinity and the crystalline phases within the deposited oxide layer are very important for their mechanical properties. A pure phase with high thermal and mechanical stability is clearly preferred over a mixture of different phases. However, a suitable heat treatment of the coated substrate is necessary, which not only leads to the transformation into the desired phase, but in addition to a densification of the coating, which also plays a major role for the mechanical stability of the layer. Such heat treatment often requires temperatures above 1200 ° C, which are not suitable for many substrates.
Um das Erhitzen des gesamten beschichteten Substrats zu vermeiden, bietet sich eine lokale Hitzebehandlung an. In diesem Zusammenhang wurden bereits Laser zur Behandlung von solchen keramischen Materialien mit Erfolg eingesetzt (Lasersintern). Dabei wird die Beschichtung in einem kleinen Bereich mit Hilfe eines Laserstrahls erhitzt. Gerade im Gebiet der Oxidkeramiken werden diese Verfahren eingesetzt, da sie im Bereich der verwendeten CO2-Laser absorbieren. Ein besonderes Problem stellt dabei die Bildung von thermisch bedingten Sprüngen bei der Wiederverfestigung und Abkühlung des Materials dar. Sie resultieren aus der Sprödigkeit der Keramiken und aus dem hohen Temperaturgefälle zwischen Einwirkungsbereich und umgebenden Material, sowie den unterschiedlichen thermischen Ausdehnungskoeffizienten von Beschichtung und Substrat.In order to avoid the heating of the entire coated substrate, a local heat treatment is recommended. In this context, lasers for the treatment of such ceramic materials have already been used successfully (laser sintering). The coating is heated in a small area by means of a laser beam. Especially in the field of oxide ceramics, these methods are used because they absorb in the field of CO 2 laser used. A particular problem is the formation of thermally induced jumps in the reconsolidation and cooling of the material. They result from the brittleness of the ceramics and from the high temperature gradient between the impact area and surrounding material, and the different thermal expansion coefficients of the coating and substrate.
So beschreiben
Diese Effekte lassen sich durch Zugabe von Bindemitteln zu den Oxidverbindungen, bspw. den Aluminiumoxidpartikeln, vermindern. So beschreibt
Da die Effizienz des Lasersinterns im hohen Maße von der Absorption des zu sinternden Materials abhängt, ist die Absorption ein wichtiges Kriterium. Dabei kann auch das Bindemittel zur Absorption beitragen. So beschreibt
Der Nachteil der meisten Verfahren zur Herstellung von Oxidschichten liegt in den hohen Temperaturen des Verfahrens. Bei den Lasersinter-Verfahren liegen die wesentlichen Nachteile darin, dass nur sehr spezielle Laser in einem bestimmten Wellenlängenbereich, meistens CO2-Laser, geeignet sind zum Einsatz zu kommen, die verwendeten Vorläufer andere Wellenlängen nicht absorbieren. Dies bedingt hohe Temperaturgradienten und führt zu einer höheren Belastung des Substrats und zu thermisch induzierten Rissen und Fehlstellen. Daher ist häufig die Zugabe von zusätzlichen Bindemitteln nötig, um die Absorption der Laserenergie zu erhöhen und eine hohe Qualität der Beschichtung zu erreichen. Allerdings bleiben Rückstände dieser Bindemittel in der Beschichtung zurück. Auch erfordert die Herstellung von hochwertigen und fehlerfreien Beschichtungen ein hohes Maß an Erfahrung, da eine Beeinflussung des darunterliegenden Substrats oder eine zu starke Erhitzung vermieden werden muss.The disadvantage of most processes for the production of oxide layers is the high temperatures of the process. at the laser sintering method, the main drawbacks are that only very specific lasers in a particular wavelength range, usually CO 2 laser, are suitable to be used, the precursor used does not absorb other wavelengths. This causes high temperature gradients and leads to a higher load on the substrate and to thermally induced cracks and defects. Therefore, the addition of additional binders is often necessary to increase the absorption of the laser energy and to achieve a high quality of the coating. However, residues of these binders remain in the coating. Also, the production of high-quality and defect-free coatings requires a high degree of experience, since an influence on the underlying substrate or an excessive heating must be avoided.
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, die Nachteile des Standes der Technik bei der Herstellung von Oxidschichten als Beschichtungszusammensetzung zu überwinden. Aufgabe der Erfindung ist es insbesondere ein Verfahren anzugeben, dass die Herstellung geeigneter Oxidverbindungen als Beschichtungszusammensetzung ermöglicht.The present invention has for its object to overcome the disadvantages of the prior art in the preparation of oxide layers as a coating composition. The object of the invention is, in particular, to provide a process which enables the preparation of suitable oxide compounds as a coating composition.
Diese Aufgabe wird durch die Erfindung mit den Merkmalen der unabhängigen Ansprüche gelöst. Vorteilhafte Weiterbildungen der Erfindungen sind in den Unteransprüchen gekennzeichnet. Der Wortlaut sämtlicher Ansprüche wird hiermit durch Bezugnahme zum Inhalt dieser Beschreibung gemacht. Die Erfindung umfasst auch alle sinnvollen und insbesondere alle erwähnten Kombinationen von unabhängigen und/oder abhängigen Ansprüchen.This object is achieved by the invention with the features of the independent claims. Advantageous developments of the inventions are characterized in the subclaims. The wording of all claims is hereby incorporated by reference into the content of this specification. The invention also includes all reasonable and in particular all mentioned combinations of independent and / or dependent claims.
Im Folgenden werden einzelne Verfahrensschritte näher beschrieben. Die Schritte müssen nicht notwendigerweise in der angegebenen Reihenfolge durchgeführt werden, und das zu schildernde Verfahren kann auch weitere, nicht genannte Schritte aufweisen.In the following, individual process steps are described in more detail. The steps do not necessarily have to be performed in the order given, and the method to be described may also have other steps not mentioned.
Zur Lösung der genannten Aufgabe wird ein Verfahren zur Herstellung von Oxidschichten vorgeschlagen, welches folgende Verfahrensschritte umfasst:
- a) Aufbringen einer Element/Elementoxid-Kompositstruktur auf dem Substrat
- b) (Kurzes) lokales Erhitzen der Element/Elementoxid-Kompositstruktur, vorzugsweise mittels eines Lasers.
- a) applying an element / element oxide composite structure on the substrate
- b) (Brief) local heating of the element / element oxide composite structure, preferably by means of a laser.
Durch das erfindungsgemäße Verfahren werden überraschenderweise Oxidschichten erhalten, die wenige bis keine Defekte und eine hohe Härte und Verdichtung aufweisen. Die Kompositstruktur wird als Kompositstruktur bezeichnet, da sie sowohl aus dem Element, als auch aus dem Elementoxid besteht.By the method according to the invention, surprisingly, oxide layers are obtained which have few to no defects and high hardness and densification. The composite structure is called a composite structure because it consists of both the element and element oxide.
Die erfindungsgemäße Beschichtung der Oberfläche mit den Element/Elementoxid-Kompositstruktur wird vorzugsweise nach dem metal organic chamical vapour deposition (MOCVD) Verfahren durchgeführt. In diesem Verfahren werden metallorganischen Vorläufer (Precursoren) in die Gasphase überführt und thermolytisch zersetzt, wobei das nichtflüchtige Zersetzungsprodukt sich in der Regel an oder auf dem Substrat anlagert. Die in der Erfindung eingesetzten Vorläufer besitzen die allgemeine Formel
El(OR)nH2
wobei El Al, Ga, In, Tl, Si, Ge, Sn, Pb oder Zr bedeutet und R für einen aliphatischen oder alicyclischen Kohlenwasserstoffrest steht und n den Wert 1 oder 2 hat.The inventive coating of the surface with the element / element oxide composite structure is preferably carried out by the metal organic chamical vapor deposition (MOCVD) method. In this process, organometallic precursors (precursors) are converted into the gas phase and thermally decomposed, the non-volatile decomposition product usually being deposited on or on the substrate. The precursors used in the invention have the general formula
El (OR) n H 2
wherein El is Al, Ga, In, Tl, Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2.
Der aliphatische und alicyclische Kohlenwasserstoffrest ist bevorzugt gesättigt und besitzt beispielsweise eine Länge von 1 bis 20 C-Atomen. Bevorzugt sind Alkyl oder unsubstituiertes oder Alkyl-substituiertes Cycloalkyl. Der Alkylrest besitzt vorzugsweise 2 bis 15 C-Atome, bevorzugt 3 bis 10 C-Atome und kann linear oder verzweigt sein, wobei verzweigte Alkylreste bevorzugt sind. Als Beispiele seien hier aufgeführt: Ethyl, n-Propyl, n-Butyl und die entsprechenden höheren linearen Homologe, Isopropyl, sek.-Butyl, Neopentyl, Neohexyl und die entsprechenden höheren Isoalkyl- und Neoalkylhomologe oder 2-Ethylhexyl. Die alicyclischen Ringe können einen, zwei oder mehr Ringe umfassen, die jeweils mit Alkyl substituiert sein können. Der alicyclische Rest besitzt vorzugsweise 5 bis 10, besonders bevorzugt 5 bis 8 C-Atome. Als Beispiele seien aufgeführt: Cyclopentyl, Cyclohexyl, Methylcyclohexyl, Norbonyl und Adamantyl.The aliphatic and alicyclic hydrocarbon radical is preferably saturated and has, for example, a length of 1 to 20 carbon atoms. Preferred are alkyl or unsubstituted or alkyl-substituted cycloalkyl. The alkyl radical preferably has 2 to 15 C atoms, preferably 3 to 10 C atoms, and may be linear or branched, with branched alkyl radicals being preferred. Examples which may be mentioned here are ethyl, n-propyl, n-butyl and the corresponding higher linear homologues, isopropyl, sec-butyl, neo-pentyl, neohexyl and the corresponding higher isoalkyl and neoalkyl homologues or 2-ethylhexyl. The alicyclic rings may comprise one, two or more rings, each of which may be substituted with alkyl. The alicyclic radical preferably has 5 to 10, particularly preferably 5 to 8, C atoms. Examples include cyclopentyl, cyclohexyl, methylcyclohexyl, norbornyl and adamantyl.
Vorzugsweise kommen erfindungsgemäß Oxidverbindungen zum Einsatz, die keramische Oxide bilden.According to the invention, preference is given to using oxide compounds which form ceramic oxides.
Besonders bevorzugt sind Aluminiumalkoxydihydride, die verzweigte Alkoxyreste mit 4 bis 8 C-Atomen aufweisen, insbesondere Aluminium-tert.-butoxydihydrid. Die Herstellung solcher Verbindungen wird in
Die Verbindungen werden vorzugsweise in die Gasphase überführt und thermolytisch zersetzt, wobei das nicht flüchtige Zersetzungsprodukt in der Regel an oder auf einem Substrat in Form der Element/Elementoxid-Kompositstruktur gebildet wird. Als Substrate zum Aufbringen der Beschichtung kommen alle üblichen Materialien in Betracht, beispielsweise Metall, Keramik, Legierungen, Quarz, Glas oder Glas-ähnliche, vorzugsweise inert gegenüber den Ausgangs- und Endprodukten. Die Thermolyse kann z.B. in einem Ofen, an einer induktiv beheizten Oberfläche oder an einer auf einem induktiv geheizten Probenträger befindlichen Oberfläche durchgeführt werden. Bei induktiver Heizung können lediglich leitfähige Substrate, wie beispielsweise Metalle, Legierung oder Graphit verwendet werden. Bei Substraten mit geringer Leitfähigkeit sollte bei induktiver Heizung ein elektrisch leitendender Substratträger oder Ofen verwendet werden. Das Substrat kann daher sowohl eine Oberfläche des Reaktionsraums, als auch ein darin platziertes Substrat sein. Der eingesetzte Reaktorraum kann jede beliebige Gestalt aufweisen und aus jedem üblichem inertem Material bestehen, beispielsweise Duran- oder Quarzglas. Es können Reaktorräume mit heißen oder kalten Wänden verwendet werden. Die Heizung kann elektrisch oder mit anderen Mitteln erfolgen, vorzugsweise mit Hilfe eines Hochfrequenzgenerators. Der Ofen, sowie der Substratträger können beliebige Formen und Größen entsprechend der Art und Form des zu beschichtenden Substrats aufweisen, so kann das Substrat beispielsweise eine Platte, plane Oberfläche, röhrenförmig, zylindrisch, quaderförmig sein oder ein komplexere Form aufweisen.The compounds are preferably converted to the gas phase and thermally decomposed, the non-volatile decomposition product usually being formed on or on a substrate in the form of the element / element oxide composite structure. Suitable substrates for applying the coating are all customary materials, for example metal, ceramics, alloys, quartz, glass or glass-like, preferably inert to the starting and end products. The thermolysis can be carried out, for example, in an oven, on an inductively heated surface or on a surface located on an inductively heated sample carrier. In inductive heating only conductive substrates, such as metals, alloys or graphite can be used. For substrates with low conductivity, an electrically conductive substrate carrier or oven should be used with inductive heating. The substrate may therefore be both a surface of the reaction space and a substrate placed therein. The reactor space used may have any shape and consist of any conventional inert material, such as Duran- or quartz glass. Reactor rooms with hot or cold walls can be used. The heating can be done electrically or by other means, preferably by means of a high-frequency generator. The oven, as well as the substrate carrier can have any shapes and sizes according to the type and shape of the substrate to be coated, the substrate may for example be a plate, planar surface, tubular, cylindrical, cuboid or have a more complex shape.
Es kann vorteilhaft sein, den Reaktorraum vor dem Einleiten des Precursors mehrmals mit einem inertem Gas, vorzugsweise Stickstoff oder Argon, zu spülen. Außerdem kann es von Vorteil sein, gegebenenfalls ein zwischenzeitliches Vakuum anzulegen, um den Reaktorraum zu inertisieren.It may be advantageous to rinse the reactor space several times with an inert gas, preferably nitrogen or argon, before introducing the precursor. In addition, it may be advantageous to apply an intermediate vacuum if necessary, in order to render the reactor space inert.
Desweiteren kann es vorteilhaft sein, vor dem Einleiten des metallorganischen Vorläufers das zu beschichtende Substrat, beispielsweise Metall, Legierung, Halbleiter, Keramik, Quarz, Glas oder Glasähnlich, auf über 500 °C zu erhitzen, um die Oberfläche zu reinigen.Furthermore, it can be advantageous to heat the substrate to be coated, for example metal, alloy, semiconductor, ceramic, quartz, glass or glass-like, to above 500 ° C. before the introduction of the organometallic precursor in order to clean the surface.
Die gewünschte Element/Elementoxid-Kompositstruktur entsteht bevorzugt bei Temperaturen von über 400 °C, besonders bevorzugt über 450 °C. Bevorzugt sind Temperaturen von nicht über 1200 °C, insbesondere nicht mehr als 600 °C, z.B. 400 °C bis 1200 °C und vorzugsweise 450 °C bis 650 °C insbesondere bevorzugt 450 °C bis 600 °C. Das Substrat auf bzw. an dem die Thermolyse stattfindet wird dementsprechend auf die gewünschte Temperatur erhitzt. Die Erzeugung der erfindungsgemäßen Element/Elementoxid-Kompositstruktur ist dabei unabhängig vom verwendeten Substratmaterial und dessen Beschaffenheit.The desired element / element oxide composite structure is preferably formed at temperatures of above 400 ° C, more preferably above 450 ° C. Preference is given to temperatures of not more than 1200 ° C, especially not more than 600 ° C, e.g. 400 ° C to 1200 ° C, and preferably 450 ° C to 650 ° C, particularly preferably 450 ° C to 600 ° C. The substrate on or at which the thermolysis takes place is accordingly heated to the desired temperature. The generation of the element / element oxide composite structure according to the invention is independent of the substrate material used and its nature.
Die (metallorganische) Verbindung, bzw. der Precursor kann aus einem Vorratsgefäß, das bevorzugt auf eine gewünschte Verdampfungstemperatur temperiert ist, in den Reaktor eingeleitet werden. So kann es zum Beispiel auf eine Temperatur zwischen -50°C und 120 °C, bevorzugt zwischen -10°C und 40°c temperiert sein. Die Thermolyse im Reaktorraum erfolgt in der Regel bei einem Unterdruck von 10-6 mbar bis Atmosphärendruck, vorzugsweise in einem Bereich von 10-4 mbar bis 10-1 mbar, bevorzugt 10-4 mbar bis 10-2 mbar. Zur Erzeugung des Vakuums kann ausgangsseitig ein Vakuumpumpensystem an den Reaktor angeschlossen werden. Es können alle üblichen Vakuumpumpen verwendet werden, bevorzugt ist eine Kombination aus Drehschieberpumpe und Turbomolekularpumpe oder eine Drehschieberpumpe. Zweckmäßigerweise ist auf der Seite des Reaktorraums das Vorratsgefäß für den Precursor angebracht und auf der anderen Seite das Vakuumpumpensystem.The (organometallic) compound, or the precursor can be introduced from a storage vessel, which is preferably heated to a desired evaporation temperature in the reactor. Thus, for example, it may be heated to a temperature between -50 ° C. and 120 ° C., preferably between -10 ° C. and 40 ° C. The thermolysis in the reactor chamber is generally carried out at a reduced pressure of 10 -6 mbar to atmospheric pressure, preferably in a range of 10 -4 mbar to 10 -1 mbar, preferably 10 -4 mbar to 10 -2 mbar. To generate the vacuum, a vacuum pump system can be connected to the reactor on the output side. It can All conventional vacuum pumps are used, preferred is a combination of rotary vane pump and turbomolecular pump or a rotary vane pump. Conveniently, the storage vessel for the precursor is mounted on the side of the reactor space and on the other side of the vacuum pump system.
Bei Erhitzung des Substrats durch Induktion können z.B. quadratzentimetergroße, elektrisch leitende Metallplättchen oder - folien als Substrat in einem Reaktionsrohr aus Duran- oder Quarzglas angeordnet werden. Bei Anpassung der Dimensionen der Apparatur sind ebenso Substratflächen im Bereich von Quadratdezimetern bis hin zu mehreren Quadratmetern möglich. An dem Reaktionsrohr sind eingangsseitig das auf die gewünschte Verdampfungstemperatur temperierte Vorratsgefäß mit dem Precursor und ausgangsseitig ein Vakuumpumpensystem angeschlossen. Das Reaktionsrohr befindet sich in einem Hochfrequenzinduktionsfeld, mit dessen Hilfe die Substratplättchen oder -folien auf die gewünschte Temperatur erhitzt werden. Nach Einstellen des gewünschten Drucks und Einleiten des Precursors wird das Substrat mit der Element/Elementoxid-Kompositstruktur bedeckt.When the substrate is heated by induction, e.g. square centimeter-sized, electrically conductive metal platelets or foils are arranged as a substrate in a reaction tube of duran or quartz glass. When adapting the dimensions of the apparatus, substrate areas in the range of square decimeters up to several square meters are also possible. On the reaction tube, the supply vessel, which is tempered to the desired evaporation temperature, is connected on the input side to the precursor and, on the output side, a vacuum pump system. The reaction tube is located in a high-frequency induction field, with the aid of which the substrate platelets or foils are heated to the desired temperature. After setting the desired pressure and introducing the precursor, the substrate is covered with the element / element oxide composite structure.
Es ist vorteilhaft, die Flussrate des Precursors mit einem Ventil zu regulieren. Das Ventil kann manuell oder automatisch gesteuert werden. Abhängig von der gewünschten Dicke der Beschichtung kann die Dauer der Zugabe des Precursors wenige Minuten bis zu mehreren Stunden betragen.It is advantageous to regulate the flow rate of the precursor with a valve. The valve can be controlled manually or automatically. Depending on the desired thickness of the coating, the duration of the addition of the precursor may be a few minutes to several hours.
Durch Variation eines oder mehrerer Prozessparameter ausgewählt aus Substrattemperatur, Gasdruck, Precursorvorlagentemperatur, Precursorfluss (Menge an eingeleitetem Precursor pro Zeiteinheit) und Bedampfungszeit kann die Morphologie der Element/Elementoxid-Kompositstruktur gesteuert werden.By varying one or more process parameters selected from substrate temperature, gas pressure, precursor temperature, precursor flow (amount of precursor introduced per unit time) and evaporation time, the morphology of the element / element oxide composite structure can be controlled.
In einer weiteren Weiterbildung kann die erhaltene Element/Elementoxid-Kompositstruktur einer Behandlung mit einem Gemisch, einer Lösung und/oder einer Suspension von organischen und/oder anorganischen Substanzen unterzogen werden.In a further development, the element / element oxide composite structure obtained can be subjected to a treatment with a mixture, a solution and / or a suspension of organic and / or inorganic substances.
In einer weiteren Ausprägung der Erfindung kann das Substrat nur in gewünschten Bereichen mit der Element/Elementoxid-Kompositstruktur überzogen werden, was auch die Behandlung durch lokales Erhitzen auf diese Bereiche beschränkt.In a further embodiment of the invention, the substrate can be coated only in desired areas with the element / element oxide composite structure, which also limits the treatment by local heating to these areas.
Nach Abkühlen wird die Element/Elementoxid-Kompositstruktur lokal erhitzt, besonders bevorzugt mit Hilfe eines Lasers. Dieser Vorgang wird auch als Sintern bezeichnet. Dabei wird die Element/Elementoxid-Kompositstruktur in die gewünschte Elementoxidstruktur umgewandelt. Diese Veränderung kann auch die Umwandlung in eine oder mehrere Modifikationen einer Kristallstruktur beinhalten, besonders bevorzugt ist dabei die Bildung einer einzigen Modifikation des Elementoxids.After cooling, the element / element oxide composite is heated locally, more preferably by means of a laser. This process is also called sintering. In this case, the element / element oxide composite structure is converted into the desired element oxide structure. This change may also involve the conversion to one or more modifications of a crystal structure, most preferably the formation of a single modification of the element oxide.
Als besonderer Vorteil der Erfindung besitzt die Element/Elementoxid-Kompositstruktur eine bessere thermische Leitfähigkeit als das reine Elementoxid und führt dadurch zu einem reduzierten Temperaturgradienten während des lokalen Erhitzens. Dies reduziert die dadurch induzierten Risse.As a particular advantage of the invention, the element / element oxide composite structure has better thermal conductivity than the pure element oxide and thereby results in a reduced temperature gradient during local heating. This reduces the cracks induced thereby.
In einer vorteilhaften Weiterbildung der Erfindung kann die elementare Komponente der Element/Elementoxid-Kompositstruktur als Bindemittel fungieren, indem sie während des Erhitzens schmilzt und so eventuell durch das Erhitzen in der Element/Elementoxid-Kompositstruktur entstandenen Risse und Poren ausfüllen kann. Dadurch ist keine Zugabe eines separaten Bindemittels nötig, was zu ungewünschten Rückständen führen könnte.In an advantageous development of the invention, the elemental component of the element / element oxide composite structure can function as a binder by melting during heating and thus filling out any cracks and pores that may have resulted from the heating in the element / element oxide composite structure. As a result, no addition of a separate binder is necessary, which could lead to undesirable residues.
In einer vorteilhaften Weiterbildung der Erfindung wird die Element/Elementoxid-Kompositstruktur am Ort der Erhitzung nicht vollständig in das entsprechende Elementoxid umgewandelt. Durch Steuerung der Laserintensität und der Einwirkdauer kann der Grad der Umwandlung sehr genau gesteuert werden. Dies ermöglicht die selektive Herstellung von Bereichen bestimmter Struktur und Morphologie, und damit beispielsweise die Herstellung von Nanodrähten, Nanopartikeln und fraktalen Oberflächen.In an advantageous development of the invention, the element / element oxide composite structure at the place of heating is not completely converted into the corresponding element oxide. By controlling the laser intensity and exposure time, the degree of conversion can be controlled very accurately. This allows the selective production of areas of specific structure and morphology, and thus, for example, the production of nanowires, nanoparticles and fractal surfaces.
In einer weiteren vorteilhaften Weiterbildung der Erfindung wird die Element/Elementoxid-Kompositstruktur am Ort der Erhitzung vollständig in das entsprechende Elementoxid umgewandelt. Durch Steuerung der Laserintensität und der Einwirkdauer kann der Grad der Umwandlung bis hin zur vollständigen Umwandlung gesteuert werden. Durch das Schmelzen der metallischen Komponente der Element/Elementoxid-Kompositstruktur ist die Herstellung besonders defektfreier und gleichmäßiger Oxidschichten möglich.In a further advantageous embodiment of the invention, the element / element oxide composite structure is completely converted at the place of heating into the corresponding element oxide. By controlling the laser intensity and exposure time, the degree of conversion can be controlled up to complete conversion. The melting of the metallic component of the element / element oxide composite structure makes it possible to produce particularly defect-free and uniform oxide layers.
Ein weiterer großer Vorteil der vorliegenden Erfindung ist die Möglichkeit, die Wellenlänge des Lasers aus einem großen Wellenlängenbereich wählen zu können. Die hergestellte Element/Elementoxid-Kompositstruktur kann ein Breitbandabsorber sein und folglich Licht aus einem sehr breiten Wellenlängenbereich absorbieren. Die Wellenlänge des Lasers kann im Bereich von UV bis zu elektromagnetischen Wellen liegen, vorzugsweise im Bereich von 300 nm bis 15 µm, besonders bevorzugt im Bereich von 500 nm bis 11 µm, noch vorteilhafter, aber nicht beschränkt auf Laser mit den Wellenlängen 488 nm, 514 nm, 532 nm, 635 nm, 1064 nm oder 10.6 µm. Es können kontinuierliche (CW) oder gepulste Laser verwendet werden.Another great advantage of the present invention is the ability to select the wavelength of the laser from a large wavelength range. The fabricated element / element oxide composite structure may be a broad band absorber and thus absorb light from a very broad wavelength range. The wavelength of the laser can range from UV to electromagnetic waves, preferably in the range of 300 nm to 15 μm, more preferably in the range of 500 nm to 11 μm, even more advantageously, but not limited to, lasers with wavelengths of 488 nm. 514 nm, 532 nm, 635 nm, 1064 nm or 10.6 μm. Continuous (CW) or pulsed lasers can be used.
Vorzugsweise liegt die verwendete Laserenergie abhängig von der verwendeten Wellenlänge und der Element/Elementoxid-Kompositstruktur zwischen 1 Milliwatt pro Quadratzentimeter und mehreren Watt pro Quadratzentimeter, bevorzugt zwischen 1 Milliwatt pro Quadratzentimeter und 10 Watt pro Quadratzentimeter, besonders bevorzugt zwischen 1 mW/cm2 und 5 W/cm2.Preferably, the laser energy used is between 1 milliwatt per square centimeter and several watts per square centimeter, preferably between 1 milliwatt per square centimeter and 10 watts per square centimeter, more preferably between 1 mW / cm 2 and 5, depending on the wavelength and element / element oxide composite used W / cm 2 .
Ein besonderer Vorteil der Erfindung ist die Realisierung von sehr geringen Eindringtiefen des Lasers. So kann die Eindringtiefe beispielsweise bei Verwendung eines gepulsten Lasers auf einen Bereich von kleiner ca. 400 nm reduziert werden, bevorzugt kleiner ca. 300 nm, besonders bevorzugt kleiner ca. 200 nm, insbesondere bevorzugt kleiner ca. 100 nm reduziert werden. Dies ermöglicht nicht nur die Herstellung sehr dünner Schichten, sondern auch eine besondere Schonung des Substrats. Die Schichtdicke der hergestellten Elementoxidschicht kann dementsprechend zwischen ca. 400 nm und ca. 10 nm, bevorzugt zwischen ca. 300 nm und ca. 10 nm, besonders bevorzugt zwischen ca. 200 nm und ca. 10 nm, insbesondere bevorzugt zwischen ca. 100 nm und ca. 10 nm liegen. Theoretisch wäre sogar die Erzeugung nur weniger Monolagen Elementoxid möglich, d.h. nur wenige Lagen von Atomen. Desweiteren schützt die geringe Eindringtiefe ein temperaturempfindliches Substrat vor thermischem Energieeintrag und zusätzlich werden mechanische Spannungen an der Grenzfläche zwischen Beschichtung und Substrat vermieden. So können auch Substrate verwendet werden, die selbst die verwendete Laserwellenlänge absorbieren. Außerdem kann auch nur die Oberfläche einer Element/Elementoxid-Kompositstruktur mit größerer Schichtdicke umgewandelt werden.A particular advantage of the invention is the realization of very low penetration depths of the laser. For example, when using a pulsed laser, the penetration depth can be reduced to a range of less than approximately 400 nm, preferably less than approximately 300 nm, particularly preferably less than approximately 200 nm, particularly preferably less than approximately 100 nm. This not only allows the production of very thin layers, but also a special protection of the substrate. The layer thickness of the element oxide layer produced can accordingly be between about 400 nm and about 10 nm, preferably between about 300 nm and about 10 nm, more preferably between about 200 nm and about 10 nm, particularly preferably between about 100 nm and about 10 nm. Theoretically, even the production of only a few monolayers of element oxide would be possible, i. only a few layers of atoms. Furthermore, the low penetration depth protects a temperature-sensitive substrate from thermal energy input and, in addition, mechanical stresses at the interface between coating and substrate are avoided. Thus, it is also possible to use substrates which themselves absorb the laser wavelength used. In addition, only the surface of an element / element oxide composite structure with a greater layer thickness can be converted.
Ein weiterer Besonderer Vorteil der Erfindung liegt in der Möglichkeit nicht nur besonders dünne, sondern auch besonders harte Oxidschichten herstellen zu können, welche besonders bevorzugt durch geringe Permeabilität einen hohen Korrosionsschutz bieten.Another particular advantage of the invention lies in the possibility of being able to produce not only particularly thin, but also particularly hard oxide layers, which are particularly preferred offer high corrosion protection due to low permeability.
In einer weiteren vorteilhaften Weiterbildung der Erfindung wird die Lichtabsorption der Element/Elementoxid-Kompositstruktur an der Stelle der Behandlung, während der Erhitzung oder zwischen mehreren Sintervorgängen, gemessen. Durch die Umwandlung der Element/Elementoxid-Kompositstruktur in das gewünschte Elementoxid kann sich die Absorption, beispielsweise von Licht im sichtbaren Bereich, am Ort der Erhitzung verändern. Aus dieser Veränderung ist es möglich einen bestimmten Grad der Umwandlung durch Anpassung von Verfahrensparametern, wie beispielsweise aber nicht beschränkt auf Laserintensität, Wellenlänge, Einwirkzeit des Lasers, Wiederholungen der Erhitzung, zu erzeugen. Nach Erreichen des gewünschten Grads kann die Erhitzung an diesem Ort beendet werden.In a further advantageous development of the invention, the light absorption of the element / element oxide composite structure is measured at the point of the treatment, during the heating or between several sintering processes. By converting the element / element oxide composite structure into the desired element oxide, the absorption, for example of light in the visible region, at the site of heating may change. From this change, it is possible to produce a certain degree of conversion by adjusting process parameters such as but not limited to laser intensity, wavelength, laser exposure time, repetition of heating. After reaching the desired level, the heating can be stopped at this location.
In einer besonders vorteilhaften Ausprägung der Erfindung wird die Wellenlänge des Lasers derart gewählt, dass sie von einer reinen Elementoxidschicht reflektiert wird. Dadurch kommt es nach erfolgter vollständiger Umwandlung der Element/Elementoxid-Kompositstruktur am Ort der Erhitzung zu keiner weiteren Absorption des Laserlichts, da das nun vorliegende Elementoxid dieses nicht absorbiert. Dadurch kann die Umwandlung beim Erreichen des reinen Elementoxids "von selbst" gestoppt werden, da es zu keiner weiteren Erwärmung durch den Laser kommt. Dadurch wird eine "Überhitzung" der Elementoxidschicht vermieden, die zu Fehlstellung, zum Beispiel durch Bildung von Körnung, in der Elementoxidschicht führen kann. Außerdem kann auf diese Weise das unter der Schicht liegende Substrat geschont werden. Gleichzeitig erlaubt diese Weiterbildung die Verwendung höherer Laserintensitäten als in herkömmlichen Verfahren bei gleicher Schichtdicke und Substrat möglich waren.In a particularly advantageous embodiment of the invention, the wavelength of the laser is chosen such that it is reflected by a pure element oxide layer. As a result, after complete conversion of the element / element oxide composite structure at the point of heating, no further absorption of the laser light occurs since the element oxide now present does not absorb it. As a result, the conversion can be stopped "on its own" upon reaching the pure element oxide, as there is no further heating by the laser. This avoids "overheating" of the element oxide layer, which can lead to misalignment, for example, by the formation of grain, in the element oxide layer. In addition, the underlying substrate can be spared in this way. At the same time, this development allows the use of higher laser intensities than in conventional methods with the same layer thickness and substrate were possible.
Besonders bevorzugt werden für diese Ausprägung der vorliegenden Erfindung Laser mit Wellenlängen im sichtbaren Bereich des Lichts gewählt. Durch die Absorptionseigenschaften der erfindungsgemäßen Element/Elementoxid-Kompositstruktur ist die lokale Erhitzung mit Lasern mit diesem Wellenlängenbereich möglich.For this embodiment of the present invention, lasers having wavelengths in the visible range of the light are particularly preferably selected. Due to the absorption properties of the element / element oxide composite structure according to the invention, local heating with lasers with this wavelength range is possible.
Alternativ kann das "Überhitzen" der erzeugten Oxidschicht auch dazu verwendet werden, eine bestimmte Porosität durch das gezielte Erzeugen von Fehlstellen einzustellen.Alternatively, the "overheating" of the oxide layer produced can also be used to adjust a certain porosity by the targeted generation of defects.
Ein weiterer Vorteil der vorliegenden Erfindung liegt in der Möglichkeit die Erhitzung lokal, d.h. nicht nur unter Schonung des darunterliegenden Substrats, sondern auch nur in gewünschten Bereichen der Element/Elementoxid-Kompositstruktur durchzuführen, wenn beispielsweise nur auf der Außenseite des Substrats eine solche Beschichtung gewünscht wird. Andererseits ist es ebenso möglich die gesamte Oberfläche des Substrats zu behandeln, besonders bevorzugt durch linienweises Abtasten mit Hilfe eines computergesteuerten Laserscanners.Another advantage of the present invention lies in the possibility of heating locally, i. not only with the protection of the underlying substrate, but also to perform only in desired areas of the element / element oxide composite structure, for example if such a coating is desired only on the outside of the substrate. On the other hand, it is also possible to treat the entire surface of the substrate, more preferably by line-by-line scanning with the aid of a computer-controlled laser scanner.
Ein weiterer Vorteil der vorliegenden Erfindung liegt in der Möglichkeit durch gezielte anteilige oder vollständige Umwandlung der Element/Elementoxid-Kompositstruktur eine bestimmte gewünschte Struktur auf der Oberfläche des Substrats zu erzeugen. Durch die Möglichkeit Laser kürzerer Wellenlängen zu verwenden, sind Strukturen mit deutlich höherer Auflösung als mit den bisher üblichen CO2-Lasern möglich, theoretisch begrenzt durch die Hälfte der verwendeten Wellenlänge.Another advantage of the present invention is the ability to create a particular desired structure on the surface of the substrate by targeted proportionate or complete conversion of the element / element oxide composite structure. Due to the possibility of using lasers with shorter wavelengths, structures with a significantly higher resolution than with the usual CO 2 lasers are possible, theoretically limited by half the wavelength used.
Desweiteren kann die erfindungsgemäße lokale Erhitzung mit Hilfe eines computergesteuerten Laserscanners durchgeführt werden, vorzugsweise mit einer fokussierenden Optik, um den Laserstrahl besser zu fokussieren.Furthermore, the local heating according to the invention can be carried out with the aid of a computer-controlled laser scanner, preferably with focusing optics, in order to better focus the laser beam.
Die vorliegende Erfindung betrifft ferner eine Beschichtungszusammensetzung, insbesondere herstellbar durch das oben genannte erfindungsgemäße Verfahren, umfassend Oxidschichten mit hohem bis vollständigen Oxidanteil, die durch thermolytische Zersetzung von metallorganischen Verbindungen der Formel El(OR)nH2 worin El Al, Ga, In, Tl, Si, Ge, Sn, Pb oder Zr bedeutet und R für einen aliphatischen oder alicyclischen Kohlenwasserstoffrest steht und n den Wert 1 oder 2 hat, bei einer Temperatur von mehr als 400 °C unter Bildung einer Element/Elementoxid-Kompositstruktur hergestellt sind und die hergestellte Element/Elementoxid-Kompositstruktur durch kurzes, lokales Erhitzen, vorzugsweise mittels eines Lasers (sintern) in die Oxidverbindung überführt wird.The present invention further relates to a coating composition, in particular preparable by the abovementioned method according to the invention, comprising oxide layers with high to complete oxide content, which are formed by thermolytic decomposition of organometallic compounds of the formula El (OR) n H 2 where El Al, Ga, In, Tl Si, Ge, Sn, Pb or Zr and R is an aliphatic or alicyclic hydrocarbon radical and n is 1 or 2, are prepared at a temperature of more than 400 ° C to form an element / element oxide composite structure and the produced element / element oxide composite structure by brief, local heating, preferably by means of a laser (sintered) is converted into the oxide compound.
Vorzugsweise beträgt der Anteil der Oxidverbindung in der Beschichtungszusammensetzung mindestens 80%, vorzugsweise mindestens 95%, besonders bevorzugt nahezu 100%The proportion of the oxide compound in the coating composition is preferably at least 80%, preferably at least 95%, particularly preferably almost 100%.
Vorzugsweise ist die Oxidverbindung ein keramisches Oxid, besonders bevorzugt ist Aluminium- oder Galliumoxid, insbesondere bevorzugt Aluminiumoxid und am bevorzugtesten Aluminiumoxid als α-Al2O3 (Korund).Preferably, the oxide compound is a ceramic oxide, more preferably aluminum or gallium oxide, more preferably alumina and most preferably alumina as α-Al 2 O 3 (corundum).
Erfindungsgemäß kann die Beschichtungszusammensetzung eine große Härte besitzen, beispielsweise kann im Falle von Aluminiumoxid eine Härte von ungefähr 28 GPa erreicht werden.According to the invention, the coating composition may have a high hardness, for example, in the case of alumina, a hardness of about 28 GPa can be achieved.
Desweiteren zeichnen sich die erfindungsgemäßen Beschichtungszusammensetzungen durch eine hohe Adhäsion an das Substrat aus. Als weiteren Vorteil besitzen die erfindungsgemäßen Beschichtungszusammensetzungen einen geringen Diffusionskoeffizienten für Ionen, sowie eine geringe Permeabilität für Wasser. Durch diese Eigenschaften eignen sie sich insbesondere als Schutz des Substrats vor Korrosion oder Abnutzung und Abrieb.Furthermore, the coating compositions of the invention are characterized by a high adhesion to the substrate. As a further advantage, the coating compositions according to the invention have a low diffusion coefficient for ions and a low permeability to water. By these properties make them particularly suitable as protection of the substrate against corrosion or wear and abrasion.
Desweiteren betrifft die Erfindung die Verwendung der erfindungsgemäßen Beschichtungszusammensetzung zur Beschichtung von Substraten aus bspw. Metall, Halbleiter, Legierung, Keramik, Quarz, Glas oder Glasähnlichen Materialien. Dies stellt lediglich eine Auswahl der möglichen Substrate und keinesfalls eine Einschränkung dar. Generell kann die erfindungsgemäße Beschichtungszusammensetzung auf (fast) alle Substrate aufgebracht werden. Geeignete Substrate sind dem Fachmann bekannt.Furthermore, the invention relates to the use of the coating composition according to the invention for coating substrates of, for example, metal, semiconductor, alloy, ceramic, quartz, glass or glass-like materials. This represents only a selection of the possible substrates and in no way a limitation. In general, the coating composition according to the invention can be applied to (almost) all substrates. Suitable substrates are known to the person skilled in the art.
Die Vielseitigkeit des erfindungsgemäßen Verfahrens bezüglich der Umwandlung der Element/Elementoxid-Kompositstruktur erlauben zahlreiche Anwendungen. Erfindungsgemäß können sehr harte, abnutzungsresistente Schutzschichten für Bauteile mit hohem Verschleiß und Abnutzung hergestellt werden. Die Möglichkeit sehr defektfreie Schichten herzustellen ermöglicht die Verwendung der Schutzschichten zur elektrischen oder thermischen Isolation. Weiterhin sind auch Anwendungen im Bereich der Medizin, insbesondere als Beschichtung für Implantate möglich. Gezielt strukturierte Oberflächen gemäß der Erfindung eignen sich beispielsweise im Bereich der Katalyse, Filtration oder Lithographie bis hin zu Speichermedien, wie Informationsspeicherung.The versatility of the element / element oxide composite structure conversion process of the present invention allows numerous applications. According to the invention, very hard, wear-resistant protective layers can be produced for components with high wear and tear. The possibility of producing very defect-free layers makes it possible to use the protective layers for electrical or thermal insulation. Furthermore, applications in the field of medicine, in particular as a coating for implants are possible. Purposefully structured surfaces according to the invention are suitable for example in the field of catalysis, filtration or lithography up to storage media, such as information storage.
Desweiteren eignet sich die erfindungsgemäße Element/Element-Kompositstruktur wegen ihrer Absorptionseigenschaften zur Herstellung von Oberflächen mit Absorption eines breiten Wellenlängenbereichs. Beispielsweise für Lichtenergieabsorbierende Beschichtungen für Solarzellen, Lichtschutzbeschichtungen, Sonnenkollektoren und dgl..Furthermore, the element / element composite structure according to the invention is suitable for the production of surfaces with absorption of a broad wavelength range because of their absorption properties. For example, for Lichtenergieaborbierende coatings for solar cells, sunscreen coatings, solar panels and the like ..
Desweiteren umfasst die Erfindung eine Vorrichtung zur Durchführung der lokalen Erhitzung vorzugsweise mit Hilfe eines Lasers, bevorzugt mit einem computergesteuerten Laserscanner, besonders bevorzugt mit einer den Laserstrahl fokussierenden Optik.Furthermore, the invention comprises a device for carrying out the local heating, preferably with the aid of a laser, preferably with a computer-controlled laser scanner, particularly preferably with a laser beam focusing optics.
Eine weitere vorteilhafte Weiterbildung der erfindungsgemäßen Vorrichtung umfasst die Möglichkeit die Lichtabsorption der Element/Elementoxid-Kompositstruktur an der Stelle der Behandlung, während der Erhitzung oder zwischen mehreren Sintervorgängen, zu messen. Dies kann durch die Messung der Intensität der Reflektion des Lasers am Ort der Erhitzung oder durch Messung der Intensität der Reflektion am Ort der Erhitzung mit einer anderen Lichtquelle mit geeigneter Wellenlänge während des Sinterns oder zwischen mehreren Sintervorgängen geschehen. Dies erlaubt eine vollständige Automatisierung des erfindungsgemäßen Verfahrens.A further advantageous development of the device according to the invention comprises the possibility of measuring the light absorption of the element / element oxide composite structure at the point of the treatment, during the heating or between several sintering processes. This can be done by measuring the intensity of the reflection of the laser at the point of heating or by measuring the intensity of the reflection at the point of heating with another light source of suitable wavelength during sintering or between several sintering operations. This allows complete automation of the method according to the invention.
Weitere Einzelheiten und Merkmale ergeben sich aus der nachfolgenden Beschreibung von bevorzugten Ausführungsbeispielen in Verbindung mit den Unteransprüchen. Hierbei können die jeweiligen Merkmale für sich alleine oder zu mehreren in Kombination miteinander verwirklicht sein. Die Möglichkeiten, die Aufgabe zu lösen, sind nicht auf die Ausführungsbeispiele beschränkt. So umfassen beispielsweise Bereichsangaben stets alle - nicht genannten - Zwischenwerte und alle denkbaren Teilintervalle.Further details and features will become apparent from the following description of preferred embodiments in conjunction with the subclaims. In this case, the respective features can be implemented on their own or in combination with one another. The possibilities to solve the problem are not limited to the embodiments. For example, area information always includes all - not mentioned - intermediate values and all imaginable subintervals.
XRD-Analyse: Röntgenbeugungsanalyse
- Fig. 1
- Aufnahme einer unbehandelten Al/Al2O3-Kompositstruktur
- Fig. 2
- Aufnahme einer behandelten Al/Al2O3-Kompositstruktur (5
Watt Laser 5 mm/sec); - Fig. 3
- Aufnahme einer behandelten Al/Al2O3-Kompositstruktur (10 Watt Laser; 2 mm/sec);
- Fig. 4
- Absorptionsspektrum einer Al/Al2O3-Kompositstruktur (Dicke: 200-400 nm)
- Fig. 5
- Röntgenbeugungsanalyse (XRD) von verschiedenen Al/Al2O3-Kompositstrukturen auf rostfreiem Stahl
- Fig. 6
- Röntgenbeugungsanalyse (XRD) von verschiedenen Al/Al2O3-Kompositstrukturen auf Titan
- Fig. 7
- Aufnahme einer partiell und mit zunehmender Energie behandelte Al/Al2O3-Kompositstrukturen
- Fig. 8:
- Untersuchung der Wasserpermeabilität von verschiedenen Al/Al2O3-Kompositstrukturen
- Fig. 9:
- Messung der Härte einer erfindungsgemäß hergestellten α-Al2O3-Schicht.
- Fig. 1
- Image of an untreated Al / Al 2 O 3 composite structure
- Fig. 2
- Recording of a treated Al / Al 2 O 3 composite structure (5
watt laser 5 mm / sec); - Fig. 3
- Recording of a treated Al / Al 2 O 3 composite structure (10 Watt laser, 2 mm / sec);
- Fig. 4
- Absorption spectrum of an Al / Al 2 O 3 composite structure (thickness: 200-400 nm)
- Fig. 5
- X-ray diffraction analysis (XRD) of various Al / Al 2 O 3 composite structures on stainless steel
- Fig. 6
- X-ray diffraction analysis (XRD) of different Al / Al 2 O 3 composite structures on titanium
- Fig. 7
- Recording of a partially and with increasing energy treated Al / Al 2 O 3 composite structures
- Fig. 8:
- Investigation of the water permeability of different Al / Al 2 O 3 composite structures
- Fig. 9:
- Measurement of the hardness of an α-Al 2 O 3 layer produced according to the invention.
Die Abbildungsserie
Im Detail zeigt
Der Precursor Alumuninium-tert.-butoxiddihydrid (Al(tBu)H2) wurde in einer CVD-Apparatur unter Argon bei einer Temperatur von 600 °C auf einen metallenen Substrat (Stahl, Kupfer, Nickel oder Platin) oder alternativ auf Glas oder Keramiken abgeschieden. Die Heizung des Ofens erfolgte induktiv, wobei im Falle des Glas ein leitender Probenhalter eingesetzt wurde. Der Druck im Reaktor betrug ungefähr 6.0 x 10-2 mbar. Die flüchtigen Abbauprodukte des Precursors (darunter Wasserstoff und Isobuten) wurden mit einem angeschlossenen Massenspektrometer detektiert. Für eine Al/Al2O3-Kompositstruktur mit einer Schichtdicke von ungefähr 1 µm betrug die Dauer des Zustroms an Precursor ungefähr 10 Minuten. Bei längerer Dauer (30 bis 90 Minuten) konnten höhere Dicken erhalten werden. Die erhaltene Al/Al2O3-Kompositstruktur ist wegen ihrer Absorption dunkel bis schwarz gefärbt.The precursor alumuninium tert-butoxide dihydride (Al (tBu) H 2 ) was deposited in a CVD apparatus under argon at a temperature of 600 ° C on a metal substrate (steel, copper, nickel or platinum) or alternatively on glass or ceramics deposited. The heating of the furnace was carried out inductively, wherein in the case of the glass, a conductive sample holder was used. The pressure in the reactor was about 6.0 × 10 -2 mbar. The volatile decomposition products of the precursor (including hydrogen and isobutene) were detected with an attached mass spectrometer. For an Al / Al 2 O 3 composite having a layer thickness of about 1 μm, the duration of the precursor flow was about 10 minutes. With longer duration (30 to 90 minutes) higher thicknesses could be obtained. The resulting Al / Al 2 O 3 composite structure is dark to black because of its absorption.
Die lokale Erhitzung wurde mit Hilfe eines Lasers durchgeführt. Zum einen wurde ein luftgekühlter CO2-Laser mit einer Wellenlänge von 10.6 µm eingesetzt, der durch eine bikonvexe ZnSe-Linse mit einer Brennweite von 120 mm fokussiert wurde. Der Belichtungsdurchmesser betrug 10-12 mm und die Umwandlungsbreite des Lasers auf dem Substrat ca. 20-25 µm. Die Intensität des Lasers wurde zwischen 1 W/cm2 und 5 W/cm2 variiert. Dieser Laser wird von der Al/Al2O3-Kompositstruktur und der Aluminiumoxidschicht absorbiert.The local heating was carried out by means of a laser. On the one hand, an air-cooled CO 2 laser with a wavelength of 10.6 μm was used, which is guided by a biconvex ZnSe lens was focused with a focal length of 120 mm. The exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns. The intensity of the laser was varied between 1 W / cm 2 and 5 W / cm 2 . This laser is absorbed by the Al / Al 2 O 3 composite structure and the alumina layer.
Desweiteren wurde ein Argonionenlaser mit Wellenlängen im Bereich des sichtbaren Lichts eingesetzt, der mit Hilfe einer bikonvexen Linse mit der Brennweite von 120 mm fokussiert wurde. Der Belichtungsdurchmesser betrug 10-12 mm und die Umwandlungsbreite des Lasers auf dem Substrat ca. 20-25 µm. Für die Bestrahlung der Al/Al2O3-Kompositstruktur wurden die Wellenlängen 514 nm, 488 nm, sowie ein Wellenlängenbereich von 450 nm bis 532 nm (mixed line) verwendet. Die Intensität wurde zwischen 0.4 W/cm2 und 2 W/cm2 variiert. Dieser Laser wird nur von der Al/Al2O3-Kompositstruktur und nicht von der bei vollständiger Umwandlung erhaltenen Aluminiumoxidschicht absorbiert.Furthermore, an argon ion laser with wavelengths in the range of visible light was used, which was focused by means of a biconvex lens with the focal length of 120 mm. The exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns. For the irradiation of the Al / Al 2 O 3 composite structure, the wavelengths 514 nm, 488 nm and a wavelength range from 450 nm to 532 nm (mixed line) were used. The intensity was varied between 0.4 W / cm 2 and 2 W / cm 2 . This laser is absorbed only by the Al / Al 2 O 3 composite structure and not by the fully converted aluminum oxide layer.
Bei brüchigen Substraten, insbesondere bei einigen Gläsern und Keramiken, wurde ein gepulster Laser verwendet. Dabei konnten dünne, und sehr dünne Schichten von Al/Al2O3-Kompositstruktur Beeinflussung des Substrats behandelt werden. Dazu wurden Laser mit den Wellenlängen 266 nm, 355 nm, 532 nm oder 1064 nm verwendet. Die Intensität wurde gering gehalten und lag bei 200 Joule bei einer Pulslänge von 4-8 ns. Der Belichtungsdurchmesser betrug 10-12 mm und die Umwandlungsbreite des Lasers auf dem Substrat ca. 20-25 µm. Die Behandlung wurde sowohl mit einem einzelnen Puls, wie auch mit einer Wiederholung von Pulsen mit einer Rate von 10 Hz durchgeführt. Dadurch konnte eine geringe Eindringtiefe des Lasers von nur 200-300 nm erreicht werden. Dies erlaubte die Herstellung von sehr dünnen Oxidschichten (<300 nm und sogar <200 nm) mit besonders hohem Korrosionsschutz und mit einer Härte von 28 (+/- 2) GPa.For brittle substrates, especially some glasses and ceramics, a pulsed laser was used. It was possible to treat thin, and very thin layers of Al / Al 2 O 3 composite structure influencing the substrate. For this purpose, lasers with the wavelengths 266 nm, 355 nm, 532 nm or 1064 nm were used. The intensity was kept low and was 200 joules with a pulse length of 4-8 ns. The exposure diameter was 10-12 mm and the conversion width of the laser on the substrate about 20-25 microns. The treatment was carried out with a single pulse as well as a repetition of pulses at a rate of 10 Hz. This allowed a low penetration depth of the laser of only 200-300 nm can be achieved. This allowed the production of very thin oxide layers (<300 nm and even <200 nm) with particularly high corrosion protection and with a hardness of 28 (+/- 2) GPa.
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US 6,521,203US 6,521,203 -
US 5,302,368US 5,302,368 -
US 5,654,035US 5,654,035 -
US 6,713,172US 6,713,172 -
US 5,683,761US 5,683,761 -
US 7,238,420US 7,238,420 -
US 6,048,954US 6,048,954 -
US 6,007,764US 6,007,764 -
WO 2007/102143WO 2007/102143 -
DE 10 2006 013 484 A1DE 10 2006 013 484 A1 -
DE 19529241DE 19529241 -
Pradhan et al. "Crystallinity of Al2O3 films deposited by metalorganic chemical vapour deposition", Surface and Coating Technology, 176,(2004),382-384Pradhan et al. "Crystallinity of Al 2 O 3 Films deposited by Metalorganic Chemical Vapor Deposition", Surface and Coating Technology, 176, (2004), 382-384 -
Triantafyllids et al. "Surface treatment of alumina-based ceramics using combined laser sources", Applied Surface Science, 186,(2002),140-144Triantafyllids et al. "Surface treatment of alumina-based ceramics using combined laser sources", Applied Surface Science, 186, (2002), 140-144 -
Zheng et al. "Effect of core-shell composite particles on the sintering behaviour and properties of nano-Al2O3/polystyrene composite prepared by SLS", Materials Letters,60, (2006), 1219-1223Zheng et al. "Effect of core-shell composite particles on the sintering behavior and properties of nano-Al 2 O 3 / polystyrene composite prepared by SLS", Materials Letters, 60, (2006), 1219-1223
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AU2011258422C1 (en) | 2010-05-24 | 2017-03-30 | Lummus Technology Llc | Nanowire catalysts |
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BR112013030226A2 (en) | 2011-05-24 | 2022-05-10 | Siluria Technologies Inc | Catalysts for the oxidative coupling of methane |
US8962517B2 (en) | 2011-11-29 | 2015-02-24 | Siluria Technologies, Inc. | Nanowire catalysts and methods for their use and preparation |
US9446397B2 (en) | 2012-02-03 | 2016-09-20 | Siluria Technologies, Inc. | Method for isolation of nanomaterials |
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US9546284B1 (en) | 2014-07-10 | 2017-01-17 | Hkc-Us, Llc | Dust prevention compositions, coatings and processes of making |
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US9976230B2 (en) * | 2014-09-19 | 2018-05-22 | Corning Incorporated | Method for forming a scratch resistant crystallized layer on a substrate and article formed therefrom |
US9053124B1 (en) * | 2014-09-30 | 2015-06-09 | Code 42 Software, Inc. | System for a distributed file system element collection |
US10422028B2 (en) * | 2015-12-07 | 2019-09-24 | Lam Research Corporation | Surface coating treatment |
JP7149474B2 (en) * | 2016-05-17 | 2022-10-07 | 国立大学法人北海道大学 | Latent heat storage microcapsules and method for producing latent heat storage microcapsules |
NO347991B1 (en) | 2023-04-24 | 2024-06-10 | Floating Maintenance Solution As | Method for installation and maintenance of floating wind turbines |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5302368A (en) | 1987-01-29 | 1994-04-12 | Sumitomo Chemical Company, Limited | Process for preparation of alumina |
DE19529241A1 (en) | 1995-08-09 | 1997-02-13 | Basf Ag | Aluminium alkoxy-hydride compound for production of optically variable systems - is obtained by reacting aluminium hydride with alcohol in inert solvent |
US5654035A (en) | 1992-12-18 | 1997-08-05 | Sandvik Ab | Method of coating a body with an α-alumina coating |
US5683761A (en) | 1995-05-25 | 1997-11-04 | General Electric Company | Alpha alumina protective coatings for bond-coated substrates and their preparation |
WO1998026937A1 (en) * | 1996-12-16 | 1998-06-25 | Basf Aktiengesellschaft | Use of hydride-containing aluminium oxide for producing optically detectable markings and inscriptions |
US6007764A (en) | 1998-03-27 | 1999-12-28 | United Technologies Corporation | Absorption tailored laser sintering |
US6048954A (en) | 1994-07-22 | 2000-04-11 | The University Of Texas System Board Of Regents | Binder compositions for laser sintering processes |
US6521203B1 (en) | 1992-06-02 | 2003-02-18 | Sumitomo Chemical Co., Ltd. | Process for producing α-alumina |
US6713172B2 (en) | 2000-11-22 | 2004-03-30 | Sandvik Aktiebolag | Oxide coated cutting tool |
US7238420B2 (en) | 2001-05-18 | 2007-07-03 | Trustees Of Stevens Institute Of Technology | Alpha AL2O3 Nanotemplates |
WO2007102143A2 (en) | 2006-03-06 | 2007-09-13 | Technion Research And Development Foundation Ltd. | Method for manufacturing metal with ceramic coating |
DE102006013484A1 (en) | 2006-03-23 | 2007-09-27 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Unidimensional composite structure, useful e.g. for electronic and optic or magnetic components or materials, comprises a nano strand comprising a metal core coated with a metal oxide or a branched structure comprising the nano strand |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE470083B (en) * | 1992-04-02 | 1993-11-08 | Sandvik Ab | Method for manufacturing dental crowns and inserts |
US5489639A (en) * | 1994-08-18 | 1996-02-06 | General Electric Company | Copper salts for laser marking of thermoplastic compositions |
GB0017148D0 (en) | 2000-07-12 | 2000-08-30 | Isis Innovation | An improved bone-implant prosthesis |
AU2003268487A1 (en) * | 2002-09-05 | 2004-03-29 | Nanosys, Inc. | Nanocomposites |
US20050038498A1 (en) * | 2003-04-17 | 2005-02-17 | Nanosys, Inc. | Medical device applications of nanostructured surfaces |
US7420156B2 (en) * | 2003-08-06 | 2008-09-02 | University Of Pittsburgh | Metal nanowire based bandpass filter arrays in the optical frequency range |
SE528109C2 (en) * | 2004-07-12 | 2006-09-05 | Sandvik Intellectual Property | Phantom inserts, especially for phase milling of steel sheet for oil pipes, and ways of manufacturing the same |
EP1804958A4 (en) | 2004-09-17 | 2010-11-17 | Nanosys Inc | Nanostructured thin films and their uses |
CA2532388A1 (en) | 2005-01-07 | 2006-07-07 | Inframat Corporation | Coated medical devices and methods of making and using |
DE102006041023B4 (en) | 2006-09-01 | 2014-06-12 | Biocer Entwicklungs Gmbh | Structured coatings for implants and process for their preparation |
ES2315194B1 (en) | 2007-09-10 | 2010-02-26 | Francisco J. GARCIA SABAN | PROCEDURE TO OBTAIN A NEW SURFACE OF A METAL IMPLANT BASED ON TITANIUM INTENDED TO BE INSERTED IN OSEO FABRIC. |
DE102007053023A1 (en) | 2007-11-05 | 2009-05-07 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Oxide compounds as a coating composition |
EP2257971A4 (en) | 2008-01-18 | 2012-11-28 | Nanosurface Technologies Llc | Nanofilm protective and release matrices |
CN101556089B (en) * | 2008-04-11 | 2011-03-30 | 鸿富锦精密工业(深圳)有限公司 | Solar thermal collector |
US9108880B2 (en) | 2008-08-18 | 2015-08-18 | The Regents Of The University Of California | Nanostructured superhydrophobic, superoleophobic and/or superomniphobic coatings, methods for fabrication, and applications thereof |
DE102009035795A1 (en) * | 2009-07-31 | 2011-02-03 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Structured surfaces for implants |
DE102010027063A1 (en) * | 2010-07-13 | 2012-01-19 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Coating for the conversion of radiant energy |
-
2007
- 2007-11-05 DE DE102007053023A patent/DE102007053023A1/en not_active Withdrawn
-
2008
- 2008-11-04 WO PCT/EP2008/009287 patent/WO2009059740A1/en active Application Filing
- 2008-11-04 EP EP08846249A patent/EP2212446A1/en not_active Withdrawn
- 2008-11-04 US US12/741,219 patent/US8911834B2/en not_active Expired - Fee Related
- 2008-11-04 EP EP14186650.9A patent/EP2845920A1/en not_active Withdrawn
-
2014
- 2014-10-14 US US14/513,271 patent/US20150027543A1/en not_active Abandoned
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5302368A (en) | 1987-01-29 | 1994-04-12 | Sumitomo Chemical Company, Limited | Process for preparation of alumina |
US6521203B1 (en) | 1992-06-02 | 2003-02-18 | Sumitomo Chemical Co., Ltd. | Process for producing α-alumina |
US5654035A (en) | 1992-12-18 | 1997-08-05 | Sandvik Ab | Method of coating a body with an α-alumina coating |
US6048954A (en) | 1994-07-22 | 2000-04-11 | The University Of Texas System Board Of Regents | Binder compositions for laser sintering processes |
US5683761A (en) | 1995-05-25 | 1997-11-04 | General Electric Company | Alpha alumina protective coatings for bond-coated substrates and their preparation |
DE19529241A1 (en) | 1995-08-09 | 1997-02-13 | Basf Ag | Aluminium alkoxy-hydride compound for production of optically variable systems - is obtained by reacting aluminium hydride with alcohol in inert solvent |
WO1998026937A1 (en) * | 1996-12-16 | 1998-06-25 | Basf Aktiengesellschaft | Use of hydride-containing aluminium oxide for producing optically detectable markings and inscriptions |
US6007764A (en) | 1998-03-27 | 1999-12-28 | United Technologies Corporation | Absorption tailored laser sintering |
US6713172B2 (en) | 2000-11-22 | 2004-03-30 | Sandvik Aktiebolag | Oxide coated cutting tool |
US7238420B2 (en) | 2001-05-18 | 2007-07-03 | Trustees Of Stevens Institute Of Technology | Alpha AL2O3 Nanotemplates |
WO2007102143A2 (en) | 2006-03-06 | 2007-09-13 | Technion Research And Development Foundation Ltd. | Method for manufacturing metal with ceramic coating |
DE102006013484A1 (en) | 2006-03-23 | 2007-09-27 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Unidimensional composite structure, useful e.g. for electronic and optic or magnetic components or materials, comprises a nano strand comprising a metal core coated with a metal oxide or a branched structure comprising the nano strand |
Non-Patent Citations (10)
Title |
---|
GRAF W ET AL: "Optical properties and thermal stability of Al/Al2O3 cermet solar absorbers", PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING; OPTICAL MATERIALS TECHNOLOGY FOR ENERGY EFFICIENCY AND SOLAR ENERGY CONVERSION IX, EUROPEAN CONGRESS ON OPTICS ECO3, 12 - 13 MARCH 1990, DEN HAAG [NL], vol. 1272, 12 March 1990 (1990-03-12), SPIE, Bellingham, WA [US], pages 265 - 273, XP055166309, ISBN: 0-8194-0319-9, DOI: 10.1117/12.20455 * |
PRADHAN ET AL., SURF. COAT. TECH., vol. 176, 2004, pages 382 - 384 |
PRADHAN ET AL.: "Crystallinity of A1 0 films deposited by metalorganic chemical vapour deposition", SURFACE AND COATING TECHNOLOGY, vol. 176, 2004, pages 382 - 384 |
TRIANTAFYLLIDS ET AL., APPL. SURF, SCI., vol. 186, 2002, pages 140 - 144 |
TRIANTAFYLLIDS ET AL.: "Surface treatment of alumina-based ceramics using combined laser sources", APPLIED SURFACE SCIENCE, vol. 186, 2002, pages 140 - 144, XP027323230 |
VEITH ET AL., CHEM. BER., vol. 129, 1996, pages 381 - 384 |
VEITH M ET AL: "Preparation of a thin film of Al/Al2O3 using a single source precursor", JOURNAL OF METASTABLE AND NANOCRYSTALLINE MATERIALS - PROCEEDINGS OF THE 9TH INTERNATIONAL SYMPOSIUM ON METASTABLE MECHANICALLY ALLOYED AND NANOCRYSTALLINE MATERIALS (ISMANAM-2002), vol. 15-16, 8 September 2002 (2002-09-08), TRANS TECH PUBLICATIONS LTD [CH], pages 279 - 282, XP009113258, ISSN: 1422-6375, DOI: 10.4028/www.scientific.net/JMNM.15-16.279 * |
VEITH M ET AL: "The Metastable, Glasslike Solid-State Phase of HAIO and Its Transformation to Al/Al2O3 Using a CO2 Laser", EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, no. 24, 22 October 2003 (2003-10-22), WILEY-VCH VERLAG, WEINHEIM [DE], pages 4387 - 4393, XP009113266, ISSN: 1434-1948, DOI: 10.1002/ejic.200300485 * |
ZHENG ET AL., MAT. LETT., vol. 60, 2006, pages 1219 - 1223 |
ZHENG ET AL.: "Effect of core-shell composite particles on the sintering behaviour and properties of nano-A1 0 /polystyrene composite prepared by SLS", MATERIALS LETTERS, vol. 60, 2006, pages 1219 - 1223 |
Also Published As
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US20150027543A1 (en) | 2015-01-29 |
US8911834B2 (en) | 2014-12-16 |
WO2009059740A1 (en) | 2009-05-14 |
US20110017659A1 (en) | 2011-01-27 |
DE102007053023A1 (en) | 2009-05-07 |
EP2212446A1 (en) | 2010-08-04 |
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