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EP1060291A2 - Method for producing a corrosion protective coating and a coating system for substrates made of light metal - Google Patents

Method for producing a corrosion protective coating and a coating system for substrates made of light metal

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Publication number
EP1060291A2
EP1060291A2 EP99911717A EP99911717A EP1060291A2 EP 1060291 A2 EP1060291 A2 EP 1060291A2 EP 99911717 A EP99911717 A EP 99911717A EP 99911717 A EP99911717 A EP 99911717A EP 1060291 A2 EP1060291 A2 EP 1060291A2
Authority
EP
European Patent Office
Prior art keywords
layer
conductive
substrate
light metal
metallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP99911717A
Other languages
German (de)
French (fr)
Other versions
EP1060291B1 (en
Inventor
Andreas Dietz
Volker Von Der Heide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
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Publication date
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Publication of EP1060291A2 publication Critical patent/EP1060291A2/en
Application granted granted Critical
Publication of EP1060291B1 publication Critical patent/EP1060291B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B05D5/067Metallic effect
    • B05D5/068Metallic effect achieved by multilayers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1889Multistep pretreatment with use of metal first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing

Definitions

  • the invention relates to a method for producing a corrosion-protective coating for a substrate made of a light metal or a light metal alloy.
  • Light metals especially aluminum
  • the disadvantage here is that they are very susceptible to corrosion due to their electrochemically base character. They are therefore provided with a wide variety of corrosion protection layers.
  • a known method of this type is to deposit metal layers on the light metal electrolessly or galvanically. This is particularly interesting if there are high decorative demands on the surface.
  • DE 196 21 881 A1 it is therefore proposed to first apply a primer layer of powder or wet lacquer in a method for chrome-plating car rims made of an aluminum alloy, then drying the rim, applying a plastic wet lacquer layer, drying it again and finally performing galvanic chrome plating.
  • These different process steps are quite complex and require multiple rearrangements of the intermediate products in other devices. Added to this is the time required for drying.
  • a method known from DE 195 39 645 A1 works in a similar manner.
  • a light metal rim for motor vehicle wheels is also coated there, and this rim is initially provided with a full paint job.
  • An intermediate coating is formed over it as a powder coating or as a bright nickel plating in order to level the surface structure. This creates a smooth base for a decorative gloss metallization that can finally be deposited by electroplating.
  • This layer system provides sufficient corrosion protection for the aluminum substrate as long as there is no mechanical damage in the layer that affects the metal substrate. If there is such deep damage to the layer or the layer system, a so-called galvanic element is created in which the outer layer acts as a cathode and the substrate as an anode, which is oxidized.
  • chromium is a chemically very base metal
  • passivation the formation of a thin oxide layer on the surface
  • Oxygen is then reduced on this surface, which is very large compared to the aluminum exposed by the damage.
  • the oxidation process is the conversion of metallic aluminum to Al 3+ . Due to the very large cathode surface of the chromium oxide, the corrosion of the aluminum at this damaged point is dramatic. One speaks here of a catastrophic failure of the corrosion protection layer.
  • the object of the present invention is to propose an alternative method for producing a corrosion-protective coating for a substrate made of a light metal and a corresponding layer system which is less sensitive to such damage.
  • This object is achieved by a method for producing a corrosion-protective coating for a substrate made of a light metal or a light metal alloy, in which an electrically non-conductive first layer is first applied to the substrate, the non-conductive first layer being produced by anodic oxidation of the substrate , later the non-conductive first layer formed by anodic oxidation is subsequently densified, then a metallized layer is applied without current to the non-conductive first layer and later a third layer is applied to the metallic second layer.
  • a layer system comprising a substrate made of light metal or a light metal alloy, but not one conductive first layer, which consists of an oxide of the substrate material, an electrolessly applied second layer of one or more metals, a third layer.
  • a smoothing metallic intermediate layer is preferably applied between the electrolessly applied second layer and the third layer.
  • the third layer is particularly preferably a decorative third layer.
  • the problems can be solved with such a method and such a layer system.
  • the invention makes use of the knowledge that the prerequisite for the catastrophic failure of the known layer systems is the electrical conductivity between the anode and cathode in the oxidation process after the damage.
  • the electrical conductivity is now reliably prevented at precisely this point.
  • the electrode flow is provided by an electrically non-conductive layer between the substrate on the one hand and the outer layers on the other.
  • These outer layers can both continue to maintain the previous corrosion protection properties which have led to the good functionality in undamaged layer systems, and on the other hand they can have the decorative effects such as a bright chrome layer and / or be wear-resistant and / or low-friction.
  • the electrically non-conductive layer can be produced by physical processes, for example PVD (physical vapor deposition) or plasma CVD (chemical vapor deposition), by simple polymer layers, that is to say lacquers, or by electrochemical processes.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • the non-conductive layer is produced by anodic oxidation of the substrate.
  • the substrate is preferably aluminum, an anodizing process is used to produce the non-conductive layer.
  • the metal substrate is simply switched as an anode and the surface is oxidized by applying a voltage. This oxide layer is chemically relatively inert and forms an ideal electrical barrier, especially after appropriate post-treatments.
  • a metal layer preferably made of nickel, copper or another metal, which can be deposited without current, is then applied to this non-conductive first layer, here preferably the oxide layer.
  • Copper can then be applied to this metal layer by means of galvanic processes in order to level the still rough surface, to compensate for mechanical stresses or to give it a shine, and nickel for similar purposes and in particular for additional corrosion protection is also conceivable.
  • the decorative layer in particular chromium, which is also external in the prior art, can then be applied to this layer.
  • This effect is now also used to activate the surface simultaneously with this compaction step.
  • Activation in the sense of metallizing non-conductive surfaces is possible in this case by applying conductive crystallization nuclei.
  • Preference is given to using a noble metal seed as the crystallization seed, in particular conductive palladium seeds.
  • These palladium nuclei or other crystallization nuclei are applied to the surface during compaction and thus also penetrate into the pores during their size reduction.
  • FIG. 1 shows a schematic section through a layer system according to the invention.
  • FIG. 2 shows an enlarged schematic sectional illustration through an enlarged detail from FIG. 1.
  • FIG. 1 shows a layer system in a very schematic form.
  • a substrate 5 consists of a light metal or a light metal alloy, in particular aluminum.
  • it can be a light alloy rim for a motor vehicle.
  • an electrically non-conductive first layer 10 can be seen, which in particular can be an oxide made of the material of the substrate 5, for example aluminum oxide.
  • the aluminum oxide can have been produced by an anodizing process.
  • the second layer 20 is followed by a further metallic intermediate layer 25, which is used in particular to flatten the usually relatively rough surface of electrolessly deposited layers 20.
  • the intermediate layer 25 is in particular electrodeposited. This leads to slight material differences between the second layer 20 and the intermediate layer 25, even if both should consist of nickel, for example, since chemically "electrolessly" deposited nickel contains, among other things, phosphorus or boron constituents, but electrodeposited nickel does not. However, this is irrelevant to the functionality of the layer system.
  • the intermediate layer 25 is followed by a layer 30, for example a bright chrome layer, which on the outside represents the decorative and / or low-friction and / or wear-resistant properties of the finished product. If the decorative properties of the finished product are particularly important, for example in the case of motor vehicle rims, a bright chrome layer is applied. If the layer is to be particularly wear-resistant, hard chrome would be considered, for low-friction outer decorative layers nickel-teflon or lead.
  • the non-conductive first layer 10, which is produced in particular by anodic oxidation of the substrate 5, has a surface 12.
  • this surface 12 is not completely flat, but rather has a large number of pores 13; this is, in particular, a result of the manufacture of an anodizing process.
  • pores 13 are now reduced in size or the layer 10 is “compressed” by immersing the substrate 5 with the surface 12 in boiling water in a so-called hot water compression.
  • the activation of the surface 12 is also preferably effected by the application of conductive crystallization nuclei 18, in particular palladium nuclei. These crystallization nuclei 18 get into them due to the initially large pores 13 and remain there even after the compression process when the pores 13 have become smaller.
  • the palladium or crystallization nuclei 18 remain on the surface 12 and in particular in the pores 13. Now the metallization takes place precisely through the crystallization nuclei 18 through the materials which are now applied without current second layer 20 instead, in particular of copper and / or nickel. As a result, these materials extend into the pores or form particularly intensive contacts with the material of the layer 10 there. This leads to firm adhesion of the layer 20 not yet shown in FIG. 2 to the layer 10 by forming undercuts.
  • Substrate non-conductive first layer surface of the non-conductive layer pores nuclei metallic second layer intermediate layer decorative third layer

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  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention relates to a method for producing a corrosion protective coating for a substrate made of light metal or of a light metal alloy. According to the invention, a non-electrically conductive first layer (10) is first deposited on the substrate (5), whereby the non-electrically conductive first layer (10) is produced by anodic oxidation of the substrate (5). Later, the non-electrically conductive first layer produced by anodic oxidation is subjected to a redensification. Afterwards, a metallic layer (20) is deposited on the non-electrically conductive first layer (10) without using current. Later, a third layer (30) is deposited on the metallic second layer (20). By using this method, wheel rims and wheel trim, for example, for motor vehicles can be chromed.

Description

Verfahren zur Herstellung einer korrosionsschützenden Beschichtung und Schichtsystem für Substrate aus Leichtmetall Process for the production of a corrosion-protective coating and layer system for substrates made of light metal
Die Erfindung betrifft ein Verfahren zur Herstellung einer korrionsschützenden Beschichtung für ein Substrat aus einem Leichtmetall bzw. einer Leichtmetallegierung.The invention relates to a method for producing a corrosion-protective coating for a substrate made of a light metal or a light metal alloy.
Leichtmetalle, insbesondere Aluminium, finden aufgrund ihres geringen spezifischen Gewichtes in immer mehr Technologien Verwendung. Nachteilig dabei ist, daß sie aufgrund ihres elektrochemisch unedlen Charakters sehr korrosionsanfällig sind. Sie werden deshalb mit Korrosionsschutzschichten verschiedenster Art versehen. Ein bekanntes derartiges Verfahren besteht darin, Metallschichten stromlos oder galvanisch auf dem Leichtmetall abzuscheiden. Dies ist insbesondere dann interessant, wenn zusätzlich hohe dekorative Ansprüche an die Oberfläche gestellt werden.Light metals, especially aluminum, are used in more and more technologies due to their low specific weight. The disadvantage here is that they are very susceptible to corrosion due to their electrochemically base character. They are therefore provided with a wide variety of corrosion protection layers. A known method of this type is to deposit metal layers on the light metal electrolessly or galvanically. This is particularly interesting if there are high decorative demands on the surface.
Ein praktisches Beispiel hierfür sind Leichtmetallfelgen oder eigentlich Leichtmetallzierfelgen. Aufgrund der hohen dekorativen Ansprüche gerade bei zum Beispiel diesem Produkt wäre es wünschenswert, wenn es verchromt sein könnte. Bekannte derartige verchromte Felgen genügen zwar zunächst den hohen dekorativen Ansprüchen, sind jedoch sehr beschädigungsanfällig und verlieren dann rasch an Attraktivität.A practical example of this are light metal rims or actually light metal decorative rims. Due to the high decorative demands, especially for this product, for example, it would be desirable if it could be chrome-plated. Known chrome-plated rims of this type initially meet the high decorative requirements, but are very susceptible to damage and then quickly lose their attractiveness.
In der DE 196 21 881 A1 wird daher vorgeschlagen, bei einem Verfahren zum Verchromen von Autofelgen aus einer Aluminiumlegierung zunächst eine Grundierungsschicht aus Pulver oder Naßlack aufzutragen, dann die Felge zu trocknen, eine Kunststoffnaßlackschicht aufzubringen, nochmals zu trocknen und letztlich eine galvanische Verchromung vorzunehmen. Diese unterschiedlichen Verfahrensschritte sind recht aufwendig und erfordern mehrfache Umlagerung der Zwischenprodukte in andere Vorrichtungen. Hinzu kommt der Zeitaufwand für das Trocknen. Ähnlich arbeitet ein aus der DE 195 39 645 A1 bekanntes Verfahren. Auch dort wird eine Leichtmetallfelge für Kraftfahrzeugräder beschichtet, und zwar wird diese Felge zunächst mit einer Ganzlackierung versehen. Darüber wird eine Zwischenbeschichtung als Pulverlackierung oder als Glanzvernickelung ausgebildet, um die Oberflächenstruktur einzuebnen. Dadurch wird eine glatte Basis für eine schließlich darauf abgeschiedene galvanisch abscheidbare, dekorative Glanzmetallisierung geschaffen.In DE 196 21 881 A1 it is therefore proposed to first apply a primer layer of powder or wet lacquer in a method for chrome-plating car rims made of an aluminum alloy, then drying the rim, applying a plastic wet lacquer layer, drying it again and finally performing galvanic chrome plating. These different process steps are quite complex and require multiple rearrangements of the intermediate products in other devices. Added to this is the time required for drying. A method known from DE 195 39 645 A1 works in a similar manner. A light metal rim for motor vehicle wheels is also coated there, and this rim is initially provided with a full paint job. An intermediate coating is formed over it as a powder coating or as a bright nickel plating in order to level the surface structure. This creates a smooth base for a decorative gloss metallization that can finally be deposited by electroplating.
Für das Galvanisieren von Aluminium wird im Handbuch der Galvanotechnik, herausgegeben von Heinz W. Dettner und Johannes Elze (1964), Band 1 , Teil 2, Kapiltel 15, Seite 1034 vorgeschlagen, zunächst eine Metallzwischenschicht mit guter Haftfestigkeit aufzubringen, alternativ wird auch ein poröser Oxydfilm erwähnt. Die nachfolgenden metallischen Schichten werden jeweils galvanisch aufgebracht. Dies ist möglilch, da sowohl die metallische Zwischenschicht als auch die poröse Oxydschicht leitfähig sind. In dem gleichen Aufsatz wird bereits festgestellt, daß dadurch das Substrat leicht angreifbar wird. Derart hergestellte Beschichtungen sind daher nicht korrosionsschützend, im Gegenteil.For the electroplating of aluminum, the handbook of electroplating, published by Heinz W. Dettner and Johannes Elze (1964), volume 1, part 2, chapter 15, page 1034, suggests firstly applying an intermediate metal layer with good adhesive strength, alternatively a porous one Oxide film mentioned. The subsequent metallic layers are each applied galvanically. This is possible because both the metallic intermediate layer and the porous oxide layer are conductive. In the same article it is already stated that this makes the substrate easily vulnerable. Coatings produced in this way are therefore not corrosion-protecting, on the contrary.
Konkret und in der Praxis sehen die Verfahren im Stand der Technik zur Herstellung dekorativer Schichten mit gutem Korrosionsschutz zum Beispiel auf Aluminium etwa wie folgt aus: Auf ein Aluminiumsubstrat wird stromlos eine dünne Zinkschicht mit einer Zinkatbeize aufgebracht. Anschließend erfolgt ein galvanisches Direktverkupfern und danach ein galvanisches Aufbringen einer Duplex- oder Tri-Nickelschicht mit dem Ziel der Einebnung und des Korrosionsschutzes. Darüber wird dann galvanisch eine dünne Glanzchromschicht aufgebracht.Specifically and in practice, the methods in the prior art for producing decorative layers with good corrosion protection, for example on aluminum, look something like this: A thin zinc layer with a zincate stain is applied to an aluminum substrate without current. This is followed by direct galvanic copper plating and then a galvanic application of a duplex or tri-nickel layer with the aim of leveling and corrosion protection. A thin layer of shiny chrome is then electroplated over it.
Dieses Schichtsystem bietet solange einen ausreichenden Korrosionsschutz für das Aluminiumsubstrat, wie es in der Schicht keinerlei mechanische Beschädigung gibt, die bis auf das Metallsubstrat wirkt. Kommt es zu einer derart tiefen Beschädigung der Schicht bzw. des Schichtsystems, so entsteht ein sogenanntes galvanisches Element, bei dem die äußere Schicht als Kathode wirkt und das Substrat als Anode, welche oxidiert wird.This layer system provides sufficient corrosion protection for the aluminum substrate as long as there is no mechanical damage in the layer that affects the metal substrate. If there is such deep damage to the layer or the layer system, a so-called galvanic element is created in which the outer layer acts as a cathode and the substrate as an anode, which is oxidized.
Obwohl Chrom an sich ein chemisch sehr unedles Metall ist, bekommt es durch die Bildung einer dünnen Oxidschicht an der Oberfläche (als Passivierung bezeichnet) ein sehr positives Potential. An dieser, im Vergleich zum durch die Beschädigung freigelegten Aluminium sehr großen Oberfläche wird nun anschließend Sauerstoff reduziert. Der Oxidationsprozeß ist dabei die Umwandlung von metallischem Aluminium zu Al3+. Aufgrund der sehr großen Kathodenoberfläche des Chromoxids ist die Korrosion des Aluminiums an dieser beschädigten Stelle dramatisch. Man spricht hier von einem katastrophalen Versagen der Korrosionsschutzschicht.Although chromium is a chemically very base metal, the formation of a thin oxide layer on the surface (called passivation) gives it a very positive potential. Oxygen is then reduced on this surface, which is very large compared to the aluminum exposed by the damage. The oxidation process is the conversion of metallic aluminum to Al 3+ . Due to the very large cathode surface of the chromium oxide, the corrosion of the aluminum at this damaged point is dramatic. One speaks here of a catastrophic failure of the corrosion protection layer.
Aufgabe der vorliegenden Erfindung ist es, ein alternatives Verfahren zur Herstellung einer korrosionsschützenden Beschichtung für ein Substrat aus einem Leichtmetall und ein entsprechendes Schichtsystem vorzuschlagen, das gegenüber derartigen Beschädigungen unempfindlicher ist.The object of the present invention is to propose an alternative method for producing a corrosion-protective coating for a substrate made of a light metal and a corresponding layer system which is less sensitive to such damage.
Diese Aufgabe wird gelöst durch ein Verfahren zur Herstellung einer korrosionsschützenden Beschichtung für ein Substrat aus einem Leichtmetall bzw. einer Leichtmetallegierung, bei dem zunächst auf das Substrat eine elektrisch nicht leitfähige erste Schicht aufgebracht wird, wobei die nichtleitfähige erste Schicht durch anodische Oxidation des Substrates erzeugt wird, später eine Nachverdichtung der nicht leitfähigen durch anodische Oxidation entstandenen ersten Schicht erfolgt, anschließend auf die nicht leitfähige erste Schicht eine metallisierte Schicht stromlos aufgebracht wird und später auf die metallische zweite Schicht eine dritte Schicht aufgebracht wird.This object is achieved by a method for producing a corrosion-protective coating for a substrate made of a light metal or a light metal alloy, in which an electrically non-conductive first layer is first applied to the substrate, the non-conductive first layer being produced by anodic oxidation of the substrate , later the non-conductive first layer formed by anodic oxidation is subsequently densified, then a metallized layer is applied without current to the non-conductive first layer and later a third layer is applied to the metallic second layer.
Gelöst wird diese Aufgabe ferner durch ein Schichtsystem, aufweisend ein Substrat aus Leichtmetall oder einer Leichtmetallegierung, darauf eine nicht leitende erste Schicht, die aus einem Oxid des Substratmaterials besteht, darauf eine stromlos aufgebrachte zweite Schicht aus einem oder mehreren Metallen, eine dritte Schicht.This object is further achieved by a layer system, comprising a substrate made of light metal or a light metal alloy, but not one conductive first layer, which consists of an oxide of the substrate material, an electrolessly applied second layer of one or more metals, a third layer.
Bevorzugt wird zur Glättung und Ebnung zwischen die stromlos aufgebrachte zweite Schicht und die dritte Schicht noch eine glättende metallische Zwischenschicht aufgebracht. Die dritte Schicht ist besonders bevorzugt eine dekorative dritte Schicht.For smoothing and leveling, a smoothing metallic intermediate layer is preferably applied between the electrolessly applied second layer and the third layer. The third layer is particularly preferably a decorative third layer.
Mit einem derartigen Verfahren und einem derartigen Schichtsystem sind die Probleme lösbar. Die Erfindung macht von der Erkenntnis Gebrauch, daß die Voraussetzung für das katastrophale Versagen der bekannten Schichtsysteme die elektrische Leitfähigkeit zwischen Anode und Kathode beim Oxidationsprozeß nach der Beschädigung ist.The problems can be solved with such a method and such a layer system. The invention makes use of the knowledge that the prerequisite for the catastrophic failure of the known layer systems is the electrical conductivity between the anode and cathode in the oxidation process after the damage.
Erfindungsgemäß wird nun die elektrische Leitfähigkeit an genau dieser Stelle zuverlässig unterbunden. Der Elektrodenfluß wird durch eine elektrisch nicht leitende Schicht zwischen dem Substrat einerseits und den äußeren Schichten andererseits vorgesehen. Diese äußeren Schichten können dabei sowohl die bisherigen Korrosionsschutzeigenschaften weiter beibehalten, die zu der guten Funktionsfähigkeit bei unbeschädigten Schichtsystemen geführt haben, und sie können andererseits die dekorativen Effekte wie eine Glanzchromschicht besitzen und/oder verschleißfest und/oder reibungsarm sein.According to the invention, the electrical conductivity is now reliably prevented at precisely this point. The electrode flow is provided by an electrically non-conductive layer between the substrate on the one hand and the outer layers on the other. These outer layers can both continue to maintain the previous corrosion protection properties which have led to the good functionality in undamaged layer systems, and on the other hand they can have the decorative effects such as a bright chrome layer and / or be wear-resistant and / or low-friction.
Die elektrisch nicht leitende Schicht kann durch physikalische Verfahren, beispielsweise PVD (physical vapor deposition) oder Plasma CVD (chemical vapor deposition), durch einfache Polymerschichten, also Lacke, oder durch elektrochemische Verfahren erzeugt werden.The electrically non-conductive layer can be produced by physical processes, for example PVD (physical vapor deposition) or plasma CVD (chemical vapor deposition), by simple polymer layers, that is to say lacquers, or by electrochemical processes.
Besonders bevorzugt ist es, wenn die nicht leitfähige Schicht durch anodische Oxidation des Substrates erzeugt wird. Ist Substrat dabei wie bevorzugt Aluminium, so wird für die Erzeugung der nicht leitfähigen Schicht ein Eloxalverfahren eingesetzt. Dabei wird einfach das Metallsubstrat als Anode geschaltet und durch Anlegen einer Spannung wird die Oberfläche oxidiert. Diese Oxidschicht ist chemisch relativ inert und bildet insbesondere nach entsprechenden Nachbehandlungen eine ideale elektrische Barriere.It is particularly preferred if the non-conductive layer is produced by anodic oxidation of the substrate. If the substrate is preferably aluminum, an anodizing process is used to produce the non-conductive layer. The metal substrate is simply switched as an anode and the surface is oxidized by applying a voltage. This oxide layer is chemically relatively inert and forms an ideal electrical barrier, especially after appropriate post-treatments.
Auf diese nicht leitfähige erste Schicht, hier also bevorzugt die Oxidschicht, wird dann mittels eines stromlosen Verfahrens eine Metallschicht bevorzugt aus Nickel, Kupfer oder einem anderen Metall, das sich stromlos abscheiden läßt, aufgebracht.A metal layer, preferably made of nickel, copper or another metal, which can be deposited without current, is then applied to this non-conductive first layer, here preferably the oxide layer.
Auf diese Metallschicht können dann mit galvanischen Verfahren Kupfer zur Einebnung der noch rauhen Oberfläche, zum mechanischen Spannungsausgleich oder auch als Glanz aufgebracht werden, auch Nickel zu ähnlichen Zwecken und insbesondere zum zusätzlichen Korrosionsschutz ist denkbar.Copper can then be applied to this metal layer by means of galvanic processes in order to level the still rough surface, to compensate for mechanical stresses or to give it a shine, and nickel for similar purposes and in particular for additional corrosion protection is also conceivable.
Auf diese Schicht kann dann die dekorative auch im Stand der Technik außen liegende Schicht, insbesondere Chrom, aufgebracht werden.The decorative layer, in particular chromium, which is also external in the prior art, can then be applied to this layer.
Im Stand der Technik gab es bisher die Überzeugung, daß es zwar möglich ist, Kunststoffe stromlos zu metallisieren, in dem die nicht leitende Kunststoffoberfläche aufgerauht und entsprechend aktiviert wird. Bei Keramiken hielt man dies bisher nur für sehr bedingt möglich. Oxidschichten sind Keramiken und die Aktivierung und haftfeste Metallisierung stieß auf Probleme. Zur Erzielung der sehr guten Haftfestigkeit von stromlos aufgebrachten Metallschichten, insbesondere auf Kunststoffen, wurde bisher eine mechanische Verklammerung der beiden Oberflächen miteinander in Aussicht genommen, der sogenannte Druckknopfeffekt. Bei oxidischen Oberflächen ist dies nur bedingt möglich. Erfindungsgemäß wird hier bevorzugt zu einem sehr erfolgreichen und vorteilhaften Verfahren gegriffen. Es wird nämlich die durch anodische Oxidation entstandene Schicht, bei Aluminium also die Eloxalschicht, nachverdichtet. Bei dem Prozeß der Oxidation entstehen nämlich Poren, die verkleinert werden sollten, um auszuschließen, daß doch Zerstörungen der nicht leitenden Schicht auftreten und dadurch womöglich leitfähige Brücken entstehen. Diese Nachverdichtung kann über verschiedene Verfahren geschehen, eines davon ist die sogenannte Heißwasserverdichtung. Durch Eintauchen in kochendes Wasser wandelt sich das entstehende wasserfreie AI2O3 in einen Böhmit-Typ AI2O3 x H2O um. Das führt zu einer Volumenvergrößerung des Materials um die Poren herum, so daß sich die Poren selbst verkleinern.In the prior art there was previously the conviction that it is possible to metallize plastics without current by roughening the non-conductive plastic surface and activating it accordingly. In the case of ceramics, this was previously thought to be possible only to a limited extent. Oxide layers are ceramics and the activation and adhesive metallization encountered problems. In order to achieve the very good adhesive strength of electrolessly applied metal layers, particularly on plastics, mechanical clinging of the two surfaces to one another, the so-called push-button effect, has previously been considered. This is only possible to a limited extent on oxidic surfaces. According to the invention, a very successful and advantageous method is preferably used here. This is because the layer created by anodic oxidation, that is to say the anodized layer in the case of aluminum, is compressed again. This is because the process of oxidation creates pores that should be reduced in size to prevent the non-conductive layer from being destroyed and possibly creating conductive bridges. This post-compression can be done using various methods, one of which is the so-called hot water compression. By immersing it in boiling water, the resulting anhydrous AI 2 O 3 is converted into a boehmite type AI 2 O 3 x H 2 O. This leads to an increase in the volume of the material around the pores, so that the pores shrink themselves.
Dieser Effekt wird nun zusätzlich genutzt, um gleichzeitig mit diesem Verdichtungsschritt eine Aktivierung der Oberfläche vorzunehmen. Eine Aktivierung im Sinne einer Metallisierung von nicht leitenden Oberflächen ist in diesem Falle durch das Aufbringen von leitfähigen Kristallisationskeimen möglich. Bevorzugt wird dabei als Kristallisationskeim ein Edelmetallkeim eingesetzt, insbesondere leitfähige Palladiumkeime.This effect is now also used to activate the surface simultaneously with this compaction step. Activation in the sense of metallizing non-conductive surfaces is possible in this case by applying conductive crystallization nuclei. Preference is given to using a noble metal seed as the crystallization seed, in particular conductive palladium seeds.
Diese Palladiumkeime bzw. anderen Kristallisationskeime werden während der Verdichtung auf die Oberfläche aufgebracht und dringen so auch in die Poren während deren Verkleinerung ein.These palladium nuclei or other crystallization nuclei are applied to the surface during compaction and thus also penetrate into the pores during their size reduction.
Dies ermöglicht nun, daß diese Kristallisationskeime eine Metallisierung im nächsten Verfahrensschritt nicht nur als Aufbringen einer weiteren Schicht auf die nicht leitfähige erste Schicht bewirken, sondern daß diese Metallisierung auch in den nun verkleinerten Poren stattfindet. Dadurch ragt die leitfähige, metallische zweite Schicht in die Poren hinein, wobei es auch zu Hinterschneidungen kommt und eine sehr gute Verzahnung und Haftung der nicht leitenden ersten Schicht mit der leitfähigen zweiten Schicht sicherstellt. Nachdem die zweite Schicht aufgebracht ist, ist es problemlos möglich, anschließend beispielsweise galvanisch weitere gewünschte Schichten und schließlich auch eine dekorative, insbesondere Chromschicht, abzuscheiden. Weitere bevorzugte Merkmale sind in den Unteransprüchen gekennzeichnet. This now enables these crystallization nuclei to not only cause metallization in the next process step as the application of a further layer to the non-conductive first layer, but also for this metallization to take place in the now reduced pores. As a result, the conductive, metallic second layer protrudes into the pores, undercuts also occurring and ensuring very good interlocking and adhesion of the non-conductive first layer with the conductive second layer. After the second layer has been applied, it is possible without problems to subsequently galvanically deposit further desired layers, and finally also a decorative, in particular chrome, layer. Further preferred features are characterized in the subclaims.
Im folgenden wird anhand der Zeichnungen die Erfindung anhand eines Ausführungsbeispiels beschrieben. Es zeigen:The invention is described below using an exemplary embodiment with reference to the drawings. Show it:
Figur 1 einen schematischen Schnitt durch ein erfindungsgemäßes Schichtsystem; und1 shows a schematic section through a layer system according to the invention; and
Figur 2 eine vergrößerte schematische Schnittdarstellung durch einen vergrößerten Ausschnitt aus Figur 1 .FIG. 2 shows an enlarged schematic sectional illustration through an enlarged detail from FIG. 1.
Figur 1 zeigt in sehr schematischer Form ein Schichtsystem. Ein Substrat 5 besteht aus einem Leichtmetall oder einer Leichtmetallegierung, insbesondere aus Aluminium. Es kann sich dabei zum Beispiel um eine Leichtmetallfelge für ein Kraftfahrzeug handeln.FIG. 1 shows a layer system in a very schematic form. A substrate 5 consists of a light metal or a light metal alloy, in particular aluminum. For example, it can be a light alloy rim for a motor vehicle.
Auf dem Substrat 5 ist eine elektrisch nicht leitfähige erste Schicht 10 zu erkennen, die insbesondere ein Oxid aus dem Material des Substrates 5 sein kann, beispielsweise Aluminiumoxid. Das Aluminiumoxid kann mittels eines Eloxalverfahrens erzeugt worden sein.On the substrate 5, an electrically non-conductive first layer 10 can be seen, which in particular can be an oxide made of the material of the substrate 5, for example aluminum oxide. The aluminum oxide can have been produced by an anodizing process.
Auf der nicht leitfähigen ersten Schicht 10 befindet sich eine leitfähige, metallische zweite Schicht 20. Diese wird stromlos auf der Schicht 10 abgeschieden.There is a conductive, metallic second layer 20 on the non-conductive first layer 10. This is deposited on the layer 10 without current.
An die zweite Schicht 20 schließt sich eine weitere metallische Zwischenschicht 25 an, die insbesondere zur Einebnung der üblicherweise relativ rauhen Oberfläche von stromlos abgeschiedenen Schichten 20 dient.The second layer 20 is followed by a further metallic intermediate layer 25, which is used in particular to flatten the usually relatively rough surface of electrolessly deposited layers 20.
Die Zwischenschicht 25 wird insbesondere galvanisch abgeschieden. Dies führt zu leichten Materialunterschieden zwischen der zweiten Schicht 20 und der Zwischenschicht 25, selbst wenn beide z.B. aus Nickel bestehen sollten, da chemisch "stromlos" abgeschiedenes Nickel u.a. Phosphor- oder Borbestandteiie enthält, galvanisch abgeschiedenes Nickel dagegen nicht. Für die Funktionstüchtigkeit des Schichtsystems spielt dies aber keine Rolle. An die Zwischenschicht 25 schließt sich schließlich noch eine Schicht 30 an, beispielsweise eine Glanzchromschicht, die nach außen die dekorativen und/oder reibungsarmen und/oder verschleißfesten Eigenschaften des fertigen Produktes darstellt. Stehen die dekorativen Eigenschaften des fertigen Produktes besonders im Vordergrund, beispielsweise bei Kraftfahrzeugfelgen, wird eine Glanzchromschicht aufgetragen. Soll die Schicht besonders verschleißfest sein, käme Hartchrom in Betracht, für reibungsarme äußere dekorative Schichten Nickel-Teflon oder Blei.The intermediate layer 25 is in particular electrodeposited. This leads to slight material differences between the second layer 20 and the intermediate layer 25, even if both should consist of nickel, for example, since chemically "electrolessly" deposited nickel contains, among other things, phosphorus or boron constituents, but electrodeposited nickel does not. However, this is irrelevant to the functionality of the layer system. Finally, the intermediate layer 25 is followed by a layer 30, for example a bright chrome layer, which on the outside represents the decorative and / or low-friction and / or wear-resistant properties of the finished product. If the decorative properties of the finished product are particularly important, for example in the case of motor vehicle rims, a bright chrome layer is applied. If the layer is to be particularly wear-resistant, hard chrome would be considered, for low-friction outer decorative layers nickel-teflon or lead.
In der Figur 2 ist nun der Grenzbereich zwischen den Schichten 10 und 20 während des Herstellungsverfahrens stark vergrößert, aber wiederum schematisch dargestellt.In FIG. 2, the boundary area between the layers 10 and 20 is greatly enlarged during the manufacturing process, but is again shown schematically.
Die nicht leitfähige und insbesondere durch anodische Oxidation des Substrates 5 erzeugte erste Schicht 10 besitzt eine Oberfläche 12. Diese Oberfläche 12 ist allerdings nicht völlig eben, sondern weist eine Vielzahl an Poren 13 auf; dieses ist insbesondere herstellungsbedingtes Ergebnis der Durchführung eines Eloxalverfahrens.The non-conductive first layer 10, which is produced in particular by anodic oxidation of the substrate 5, has a surface 12. However, this surface 12 is not completely flat, but rather has a large number of pores 13; this is, in particular, a result of the manufacture of an anodizing process.
Diese Poren 13 werden nun verkleinert bzw. die Schicht 10 "verdichtet", in dem in einer sogenannten Heißwasserverdichtung das Substrat 5 mit der Oberfläche 12 in kochendes Wasser getaucht wird. Bevorzugt wird gemeinsam mit dem kochenden Wasser auch das Aktivieren der Oberfläche 12 durch das Aufbringen von leitfähigen Kristallisationskeimen 18, insbesondere von Palladiumkeimen bewirkt. Diese Kristallisationskeime 18 gelangen nämlich aufgrund der zunächst noch großen Poren 13 in diese hinein und verbleiben dort auch nach dem Verdichtungsprozeß, wenn die Poren 13 kleiner geworden sind.These pores 13 are now reduced in size or the layer 10 is “compressed” by immersing the substrate 5 with the surface 12 in boiling water in a so-called hot water compression. Together with the boiling water, the activation of the surface 12 is also preferably effected by the application of conductive crystallization nuclei 18, in particular palladium nuclei. These crystallization nuclei 18 get into them due to the initially large pores 13 and remain there even after the compression process when the pores 13 have become smaller.
Nach Entfernung des kochenden Wassers verbleiben die Palladium- bzw. Kristallisationskeime 18 auf der Oberfläche 12 und insbesondere in den Poren 13. Nun anschließend findet die Metallisierung gerade durch die Kristallisationskeime 18 durch die nun stromlos aufgebrachten Materialien der zweiten Schicht 20 statt, insbesondere also von Kupfer und/oder Nickel. Diese Materialien reichen dadurch in die Poren hinein bzw. bilden gerade dort besonders intensive Kontakte mit dem Material der Schicht 10. Dies führt durch das Bilden von Hinterschneidungen zu einer festen Haftung der in der Figur 2 noch nicht dargestellten Schicht 20 auf der Schicht 10. After the boiling water has been removed, the palladium or crystallization nuclei 18 remain on the surface 12 and in particular in the pores 13. Now the metallization takes place precisely through the crystallization nuclei 18 through the materials which are now applied without current second layer 20 instead, in particular of copper and / or nickel. As a result, these materials extend into the pores or form particularly intensive contacts with the material of the layer 10 there. This leads to firm adhesion of the layer 20 not yet shown in FIG. 2 to the layer 10 by forming undercuts.
BezugszeichenlisteReference list
Substrat nicht leitfähige erste Schicht Oberfläche der nicht leitfähigen Schicht Poren Kristallisationskeime metallische zweite Schicht Zwischenschicht dekorative dritte Schicht Substrate non-conductive first layer surface of the non-conductive layer pores nuclei metallic second layer intermediate layer decorative third layer

Claims

A n s p r ü c h e Expectations
1 . Verfahren zur Herstellung einer korrosionsschützenden Beschichtung für ein Substrat aus einem Leichtmetall bzw. einer Leichtmetallegierung, bei dem1 . Method for producing a corrosion-protective coating for a substrate made of a light metal or a light metal alloy, in which
- zunächst auf das Substrat (5) eine elektrisch nicht leitfähige erste Schicht (10) aufgebracht wird, wobei die nichtleitfähige erste Schicht- An electrically non-conductive first layer (10) is first applied to the substrate (5), the non-conductive first layer
(10) durch anodische Oxidation des Substrates (5) erzeugt wird, später eine Nachverdichtung der nichtleitfähigen durch anodische Oxidation entstandenen ersten Schicht (10) erfolgt,(10) is produced by anodic oxidation of the substrate (5), later the non-conductive first layer (10) formed by anodic oxidation is subsequently compacted,
- anschließend auf die nicht leitfähige erste Schicht (10) eine metallisierte Schicht (20) stromlos aufgebracht wird,a metallized layer (20) is then applied without current to the non-conductive first layer (10),
- und später auf die metallische zweite Schicht (20) eine dritte Schicht (30) aufgebracht wird.- And later a third layer (30) is applied to the metallic second layer (20).
2. Verfahren nach Anspruch 1 , dadurch gekennzeichnet, daß als Substrat (5) Aluminium oder Magnesium oder eine Legierung unter Verwendung mindestens einer dieser beiden Leichtmetalle eingesetzt wird.2. The method according to claim 1, characterized in that aluminum or magnesium or an alloy is used as substrate (5) using at least one of these two light metals.
3. Verfahren nach Anspruch 2, dadurch gekennzeichnet, daß für das Substrat (5) Aluminium und zur Erzeugung der nicht leitfähigen ersten Schicht (10) ein Eloxalverfahren eingesetzt wird.3. The method according to claim 2, characterized in that an aluminum process is used for the substrate (5) and for producing the non-conductive first layer (10).
4. Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß zugleich mit der Nachverdichtung auch eine Aktivierung durch Aufbringung von leitfähigen Kristallisationskeimen (18) auf die Oberfläche (12) bzw. in die durch die anodische Oxidation entstandenen Poren (13) in der Oberfläche (12) der ersten Schicht (10) erfolgt. 4. The method according to any one of the preceding claims, characterized in that at the same time with the densification also an activation by applying conductive nuclei (18) on the surface (12) or in the pores (13) formed by the anodic oxidation in the surface (12) of the first layer (10).
5. Verfahren nach Anspruch 4, dadurch gekennzeichnet, daß als leitfähige Kristallisationskeime (18) Edelmetallkeime, insbesondere Palladiumkeime eingesetzt werden.5. The method according to claim 4, characterized in that noble metal nuclei, in particular palladium nuclei, are used as conductive crystallization nuclei (18).
6. Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß die zweite metallische Schicht (20) durch stromlose Metallisierung mittels Kupfer und/oder Nickel erzeugt wird.6. The method according to any one of the preceding claims, characterized in that the second metallic layer (20) is produced by electroless metallization using copper and / or nickel.
7. Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß zwischen der metallischen zweiten Schicht (20) und der dritten Schicht (30) noch eine glättende metallische Zwischenschicht (25) aufgebracht wird.7. The method according to any one of the preceding claims, characterized in that between the metallic second layer (20) and the third layer (30) still a smoothing metallic intermediate layer (25) is applied.
8. Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß als dritte Schicht (30) eine dekorative dritte Schicht aufgebracht wird.8. The method according to any one of the preceding claims, characterized in that a decorative third layer is applied as the third layer (30).
9. Verfahren nach Anspruch 8, dadurch gekennzeichnet, daß für die dekorative dritte Schicht (30) Chrom insbesondere galvanisch abgeschieden wird.9. The method according to claim 8, characterized in that for the decorative third layer (30) chromium is in particular electrodeposited.
10.Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß für die dritte Schicht (30) ein Material mit reibungsarmen und/oder verschleißfesten Eigenschaften eingesetzt wird.10.The method according to any one of the preceding claims, characterized in that a material with low-friction and / or wear-resistant properties is used for the third layer (30).
1 1. Schichtsystem, hergestellt mit einem Verfahren nach einem der vorstehenden Ansprüche. 1 1. layer system, produced by a method according to any one of the preceding claims.
12. Schichtsystem, aufweisend12. Layer system, having
- ein Substrat (5) aus Leichtmetall oder einer Leichtmetallegierung,- a substrate (5) made of light metal or a light metal alloy,
- darauf eine nicht leitende erste Schicht (10), die aus einem Oxid des Substratmaterials besteht, - darauf eine stromlos aufgebrachte zweite Schicht (20) aus einem oder mehreren Metallen,- a non-conductive first layer (10) thereon, which consists of an oxide of the substrate material, - a second layer (20) of one or more metals applied without current, thereon
- eine dritte Schicht (30).- A third layer (30).
13. Schichtsystem nach Anspruch 12, zusätzlich zwischen der zweiten Schicht (20) und der dritten Schicht (30) eine metallische glättende Zwischenschicht13. Layer system according to claim 12, additionally between the second layer (20) and the third layer (30) a metallic smoothing intermediate layer
(25) aufweisend.(25).
14. Schichtsystem nach Anspruch 12 oder 13, dadurch gekennzeichnet, daß das Substrat (5) aus Aluminium oder Magnesium oder einer Aluminiumoder Magnesiumlegierung besteht.14. Layer system according to claim 12 or 13, characterized in that the substrate (5) consists of aluminum or magnesium or an aluminum or magnesium alloy.
15. Schichtsystem nach einem der Ansprüche 12 bis 14, dadurch gekennzeichnet, daß die Schichtdicke der nicht leitenden ersten Schicht (10) zwischen 1 μm und 200 μm liegt.15. Layer system according to one of claims 12 to 14, characterized in that the layer thickness of the non-conductive first layer (10) is between 1 μm and 200 μm.
16.Schichtsystem nach einem der Ansprüche 12 bis 15, dadurch gekennzeichnet, daß die Schichtdicke der stromlos aufgebrachten zweiten Schicht (20) zwischen 0,5 μm und 20 μm liegt.16. Layer system according to one of claims 12 to 15, characterized in that the layer thickness of the electrolessly applied second layer (20) is between 0.5 μm and 20 μm.
17. Schichtsystem nach einem der Ansprüche 12 bis 16, dadurch gekennzeichnet, daß die Schichten der metallischen Zwischenschicht (25) zwischen 2 μm und17. Layer system according to one of claims 12 to 16, characterized in that the layers of the metallic intermediate layer (25) between 2 microns and
20 μm. 20 μm.
8. Felge oder Zierfelge aus Leichtmetall, insbesondere für Kraftfahrzeuge, beschichtet nach einem der Verfahren nach Anspruch 1 bis 10 bzw. versehen mit einem Schichtsystem nach einem der Ansprüche 11 bis 17. 8. rim or decorative rim made of light metal, in particular for motor vehicles, coated by one of the methods according to claims 1 to 10 or provided with a layer system according to one of claims 11 to 17.
EP99911717A 1998-02-26 1999-02-26 Method for producing a corrosion protective coating and a coating system for substrates made of light metal Expired - Lifetime EP1060291B1 (en)

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EP1060291B1 (en) 2001-12-19
US6703135B1 (en) 2004-03-09
WO1999043869A3 (en) 1999-12-29
JP2002505379A (en) 2002-02-19
DE59900592D1 (en) 2002-01-31
DE19807823A1 (en) 1999-09-09
WO1999043869A2 (en) 1999-09-02
JP4567187B2 (en) 2010-10-20

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