EP0741319A1 - Photothermographic photosensitive recording material with reduced fog - Google Patents
Photothermographic photosensitive recording material with reduced fog Download PDFInfo
- Publication number
- EP0741319A1 EP0741319A1 EP96106486A EP96106486A EP0741319A1 EP 0741319 A1 EP0741319 A1 EP 0741319A1 EP 96106486 A EP96106486 A EP 96106486A EP 96106486 A EP96106486 A EP 96106486A EP 0741319 A1 EP0741319 A1 EP 0741319A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- photosensitive
- compound
- material according
- fog
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000463 material Substances 0.000 title claims abstract description 29
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 8
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 7
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 7
- 239000011230 binding agent Substances 0.000 claims abstract description 6
- 150000007524 organic acids Chemical class 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims description 35
- -1 silver halide Chemical class 0.000 claims description 34
- 229910052709 silver Inorganic materials 0.000 claims description 30
- 239000004332 silver Substances 0.000 claims description 30
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 17
- 239000000460 chlorine Substances 0.000 claims description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 8
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 8
- 230000002401 inhibitory effect Effects 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical group 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical group 0.000 claims description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 238000011066 ex-situ storage Methods 0.000 claims description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- 125000000101 thioether group Chemical group 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 abstract description 3
- 150000004820 halides Chemical class 0.000 abstract description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 150000003568 thioethers Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 26
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000011160 research Methods 0.000 description 5
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 4
- 229920000847 nonoxynol Polymers 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- IEORSVTYLWZQJQ-UHFFFAOYSA-N 2-(2-nonylphenoxy)ethanol Chemical compound CCCCCCCCCC1=CC=CC=C1OCCO IEORSVTYLWZQJQ-UHFFFAOYSA-N 0.000 description 3
- AGLQURQNVJVJNB-UHFFFAOYSA-N 4,5-dibromo-1h-pyridazin-6-one Chemical compound BrC=1C=NNC(=O)C=1Br AGLQURQNVJVJNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- 235000021357 Behenic acid Nutrition 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 229940116226 behenic acid Drugs 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- LWJROJCJINYWOX-UHFFFAOYSA-L mercury dichloride Chemical compound Cl[Hg]Cl LWJROJCJINYWOX-UHFFFAOYSA-L 0.000 description 2
- IJAPPYDYQCXOEF-UHFFFAOYSA-N phthalazin-1(2H)-one Chemical compound C1=CC=C2C(=O)NN=CC2=C1 IJAPPYDYQCXOEF-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- ORYURPRSXLUCSS-UHFFFAOYSA-M silver;octadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCC([O-])=O ORYURPRSXLUCSS-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- IHAWQAMKUMLDIT-UHFFFAOYSA-N 1,1,1,3,3,3-hexabromopropan-2-one Chemical class BrC(Br)(Br)C(=O)C(Br)(Br)Br IHAWQAMKUMLDIT-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- DMSSTTLDFWKBSX-UHFFFAOYSA-N 1h-1,2,3-benzotriazin-4-one Chemical compound C1=CC=C2C(=O)N=NNC2=C1 DMSSTTLDFWKBSX-UHFFFAOYSA-N 0.000 description 1
- AAILEWXSEQLMNI-UHFFFAOYSA-N 1h-pyridazin-6-one Chemical class OC1=CC=CN=N1 AAILEWXSEQLMNI-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- PZTWFIMBPRYBOD-UHFFFAOYSA-N 2-acetylphthalazin-1-one Chemical compound C1=CC=C2C(=O)N(C(=O)C)N=CC2=C1 PZTWFIMBPRYBOD-UHFFFAOYSA-N 0.000 description 1
- MARXMDRWROUXMD-UHFFFAOYSA-N 2-bromoisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(Br)C(=O)C2=C1 MARXMDRWROUXMD-UHFFFAOYSA-N 0.000 description 1
- KSBRTGXRNZVPAT-UHFFFAOYSA-N 2-chlorophthalazin-1-one Chemical compound C1=CC=C2C(=O)N(Cl)N=CC2=C1 KSBRTGXRNZVPAT-UHFFFAOYSA-N 0.000 description 1
- KTWCUGUUDHJVIH-UHFFFAOYSA-N 2-hydroxybenzo[de]isoquinoline-1,3-dione Chemical compound C1=CC(C(N(O)C2=O)=O)=C3C2=CC=CC3=C1 KTWCUGUUDHJVIH-UHFFFAOYSA-N 0.000 description 1
- CFMZSMGAMPBRBE-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(O)C(=O)C2=C1 CFMZSMGAMPBRBE-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
- AOHAPDDBNAPPIN-UHFFFAOYSA-N 3-Methoxy-4,5-methylenedioxybenzoic acid Chemical compound COC1=CC(C(O)=O)=CC2=C1OCO2 AOHAPDDBNAPPIN-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical class NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 1
- REUJCMPVVNETJW-UHFFFAOYSA-N 6-tert-butyl-2-[(3-tert-butyl-2-hydroxy-6-methylphenyl)methyl]-3-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1CC1=C(C)C=CC(C(C)(C)C)=C1O REUJCMPVVNETJW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- GACKUJRBNDEVHV-UHFFFAOYSA-N BrC(Br)(Br)S(=O)(=O)C1=CSN=N1 Chemical class BrC(Br)(Br)S(=O)(=O)C1=CSN=N1 GACKUJRBNDEVHV-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007336 electrophilic substitution reaction Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical class NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- VBTQNRFWXBXZQR-UHFFFAOYSA-N n-bromoacetamide Chemical compound CC(=O)NBr VBTQNRFWXBXZQR-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006316 polyvinylpyrrolidine Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/34—Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
- G03C1/49836—Additives
- G03C1/49845—Active additives, e.g. toners, stabilisers, sensitisers
Definitions
- the invention relates to a heat-developable light-sensitive recording material having at least one binder layer applied to a layer which contains at least one light-sensitive silver halide, a light-insensitive silver salt of an organic acid, and at least one reducing agent in this layer or in a further layer which is in a reactive relationship to it.
- Dry silver materials are usually processed in a step lasting about 10 s at temperatures above 100 ° C. Under these circumstances, it is particularly difficult to achieve the optimal relationship between sensitivity and contrast on the one hand and obscuring on the other. Because of the strong temperature dependence of the chemical reactions involved and the short reaction time, even small deviations in time and temperature mean that the sensitivity is not fully exploited or the image is too blurred.
- EP 04 97 053-A1 proposes in particular 1-hydroxybenzotriazole and 1,2,3-benzotriazin-4 (3H) -one to reduce the tendency to fog.
- EP-06 00 587-A1 describes tribromomethyl ketones as fog-inhibiting compounds.
- EP-06 05 981-A1 claims dry silver materials which contain certain tribromomethylsulfonylthiadiazoles as fog-inhibiting compounds.
- the object of the invention is to provide a dry silver material which has a low tendency to obscure during the development of heat.
- Preferred antifoggant compounds are described by one of the following general formulas (I) or (II):
- radicals R 1 , R 2 , R 3 are alkyl or alkylene groups, they preferably contain 1 to 20 carbon atoms.
- Preferred aryl groups are those having 6 to 14 carbon atoms, for example phenyl or naphthyl.
- Aralkyl groups preferably contain 7 to 20 carbon atoms, examples are benzyl and phenethyl.
- Preferred cycloalkyl groups have 5 to 10 carbon atoms.
- Heterocyclic residues in the function of R 1 , R 2 , R 3 are preferably residues of heterocyclic compounds which are bonded via a carbon atom and are known as antifoggants for aqueous silver halide emulsions, for example residues of triazole, imidazole, thiazole, the tri- and tetraazaindenes, des Benzotriazole, benzimidazole, benzothiazole and purine.
- radicals mentioned can be further substituted, in particular with hydroxyl groups, amino groups and with halogen atoms.
- an ester group can also take the place of the amino group and an amide or sulfonamide group.
- the ring optionally formed by the radicals R 1 and R 2 can be, for example, a pyrrolidine, piperidine, pyrazane, thiazine, pyrazine or morpholine ring.
- Table 2 contains examples of compounds of the general formula (II).
- Table 2 connection X R 3 Melting point (° C) II-1 Br n-dodecyl 58-58.5 II-2 Br Phenyl 168-171 II-3 Br o-aminophenyl 190-191 II-4 Br 3- (4H) -1.2.4-triazolyl 243.5-244.5 (d) II-5 Br N-benzoyl-p-aminophenyl 236.5-237.5 II-6 Br 2-benzothiazolyl 233-235 (d) II-7 Br 2-imidazolyl 212-213 II-8 Br 6-purinyl > 310 II-9 Br Acetyl-p-aminophenyl 237 (d) II-10 Br Trifluoroacetyl-p-aminophenyl 245 (d)
- the antifoggant compounds are incorporated into the photosensitive layer or a layer that is reactive with it. “Reactive relationship” here means that constituents of this layer, at least under the conditions of heat development, can pass into the light-sensitive layer and react there.
- the compounds are expediently dissolved in a solvent which is compatible with the coating composition for the corresponding layer.
- a solvent which is compatible with the coating composition for the corresponding layer.
- methanol, ethanol, i-butanol, ethyl acetate, acetone are suitable.
- the amounts to be used are between 0.5 and 30 g, preferably 5 to 15 g, of the compounds (I) and between 0.2 and 10 g, preferably 2 to 5 g, of the compounds (II) per mol of silver.
- the dry silver materials according to the invention consist at least of a light-sensitive layer on a support.
- This light-sensitive layer contains at least one binder, a light-insensitive silver salt of an organic acid and a silver halide, and a reducing agent for this silver salt and the fog-inhibiting compound according to the invention.
- the dry silver materials can contain further layers which are reactive in relation to the photosensitive layer.
- Natural and synthetic polymers such as cellulose acetates, polyvinyl acetals, polyolefins, polymeric esters, for example of terephthalic acid, polyamides, poly- (N-vinyl) amides, polyvinyl / vinylidene chloride, polystyrene, polyacrylonitrile, polycarbonates and the like, and copolymers of the polymers mentioned are used as binders Monomers in question.
- the non-photosensitive silver salt is preferably a salt of an unbranched fatty acid having 12 to 22 carbon atoms, for example lauric, myristic, palmitic, stearic, arachic or behenic acid, or a mixture of such salts. Silver stearate is particularly preferred.
- Aromatic dihydroxy compounds such as hydroquinone and pyrocatechol can be used as reducing agents.
- Other compounds which act as photographic developers are also suitable, such as m- or p-aminophenols, 3-pyrazolidinones, ascorbic acid and their derivatives, and further compounds listed in the above-mentioned prior art.
- Bisphenols for example bis (2-hydroxy-3-t-butyl-6-methylphenyl) methane, are preferred.
- the reducing agent can be contained in the light-sensitive layer or in an adjacent auxiliary layer. Its amount is usually 0.1 to 3 equivalents based on the total amount of reducible silver salts.
- the photosensitive silver halide can be prepared in situ from the non-photosensitive silver salt by reaction with a limited amount of a compound that can release halide ions.
- a compound that can release halide ions are, for example, the halides of the alkali metals and ammonium or organic N-halogen compounds such as N-bromosuccinimide, N-bromophthalimide, N-chlorophthalazinone, N-bromoacetamide and others.
- N-bromosuccinimide N-bromophthalimide
- N-chlorophthalazinone N-bromoacetamide
- Other methods of this type are described in the publications cited in Research Disclosure No. 17029, Chapter I (June 1978) and No. 29963, Chapter XV (March 1989).
- the silver halide is preferably produced in a separate operation ("ex situ") in an aqueous solution which contains a hydrophilic colloid, preferably gelatin.
- the methods of precipitation and chemical and spectral sensitization known from the conventional technique of photographic silver halide emulsions are used.
- the silver halide can then be separated from the protective colloid, for example by the method of GB 13 54 186.
- the isolated and optionally sensitized silver halide is then added to the coating composition for the light-sensitive layer of the dry silver material.
- Silver bromide and silver bromoiodide with a are preferred as silver halide Iodide content up to 10 mole percent.
- the grain size of the silver halide is preferably between 0.05 and 0.5 ⁇ m, its share in the total silver salt content of the light-sensitive layer is generally less than 10, preferably 0.2 to 2 mol percent.
- toner it is advantageous to add a so-called toner to the dry silver materials according to the invention, so that the developed silver image acquires a neutral black color and a high density.
- Known toners are described in Research Disclosure 17029 (June 1978), Chapter V, and 29963 (March 1989), Chapter XXII.
- useful toners are phthalazinone and its derivatives, for example 2-acetylphthalazinone, phthalimide and derivatives such as N-hydroxyphthalimide, succinimide, N-hydroxy-1,8-naphthalimide.
- Particularly preferred toners are pyridazones, for example 6-pyridazones of the general formula wherein M is a hydrogen or alkali metal atom, R 1 , R 2 and R 3 may be the same or different and hydrogen, methyl, ethyl, propyl, R 1 and R 2 may also be chlorine or bromine.
- the toners are preferably added to a layer that is reactive with the photosensitive layer.
- the dry silver materials can also contain further layers, for example auxiliary layers such as arranged above or below the light-sensitive layer Protective layers or adhesion-promoting layers or antihalo or anti-curl layers attached to the back of the layer support.
- Both clear and colored or pigmented plastic films for example made of polyethylene terephthalate or cellulose acetate, and also raw or coated papers can serve as layer supports.
- the materials according to the invention can be used for the production of images by means of exposure and heat development, in particular for contact copies, projection enlargements and camera recordings in reproduction technology.
- a photosensitive coating composition for a dry silver material was prepared in the following way:
- Coating solution B was applied with a layer thickness of 60 ⁇ m to a polyethylene terephthalate support and dried.
- the coating solution C was applied to the dry layer with a layer thickness of 100 ⁇ m and dried again.
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Abstract
Description
Die Erfindung betrifft ein wärmeentwickelbares lichtempfindliches Aufzeichnungsmaterial mit mindestens einer auf einem Schichtträger aufgetragenen Bindemittelschicht, welche mindestens ein lichtempfindliches Silberhalogenid, ein lichtunempfindliches Silbersalz einer organischen Säure, sowie in dieser Schicht oder in einer in reaktiver Beziehung zu ihr stehenden weiteren Schicht mindestens ein Reduktionsmittel enthält.The invention relates to a heat-developable light-sensitive recording material having at least one binder layer applied to a layer which contains at least one light-sensitive silver halide, a light-insensitive silver salt of an organic acid, and at least one reducing agent in this layer or in a further layer which is in a reactive relationship to it.
Materialien dieser Art sind auch unter den Bezeichnungen "photothermographische Materialien" oder "Trockensilbermaterialien" bekannt. Sie sind zusammenfassend beispielsweise in der Research Disclosure 170 029 (Juni 1978), insbesondere unter "System B", und in der Research Disclosure 299 063 (März 1989) beschrieben.Materials of this type are also known under the names "photothermographic materials" or "dry silver materials". They are summarized, for example, in Research Disclosure 170 029 (June 1978), in particular under "System B", and in Research Disclosure 299 063 (March 1989).
Die Verarbeitung von Trockensilbermaterialien erfolgt üblicherweise in einem Schritt von etwa 10 s Dauer bei Temperaturen von über 100 °C. Unter diesen Umständen ist es besonders schwierig, das optimale Verhältnis zwischen Empfindlichkeit und Kontrast einerseits und Verschleierung andererseits zu erreichen. Wegen der starken Temperaturabhängigkeit der beteiligten chemischen Reaktionen und der kurzen Reaktionszeit bewirken schon geringe Abweichungen der Zeit und der Temperatur, daß die Empfindlichkeit nicht voll ausgenutzt oder das Bild zu stark verschleiert wird.Dry silver materials are usually processed in a step lasting about 10 s at temperatures above 100 ° C. Under these circumstances, it is particularly difficult to achieve the optimal relationship between sensitivity and contrast on the one hand and obscuring on the other. Because of the strong temperature dependence of the chemical reactions involved and the short reaction time, even small deviations in time and temperature mean that the sensitivity is not fully exploited or the image is too blurred.
Es ist daher üblich, den lichtempfindlichen Schichten der Trockensilbermaterialien spezielle schleierhemmende Verbindungen zuzusetzen. Eine Reihe solcher Stoffe ist in den genannten Research Disclosures angeführt. Die EP 04 97 053-A1 schlägt insbesondere 1-Hydroxybenzotriazol und 1,2,3-Benzotriazin-4(3H)-on zur Verminderung der Schleierneigung vor.It is therefore customary to add special anti-fog compounds to the photosensitive layers of the dry silver materials. A number of such substances are listed in the research disclosures mentioned. EP 04 97 053-A1 proposes in particular 1-hydroxybenzotriazole and 1,2,3-benzotriazin-4 (3H) -one to reduce the tendency to fog.
EP-06 00 587-A1 beschreibt Tribrommethylketone als schleierhemmende Verbindungen.EP-06 00 587-A1 describes tribromomethyl ketones as fog-inhibiting compounds.
In EP-06 05 981-A1 werden Trockensilbermaterialien beansprucht, die bestimmte Tribrommethylsulfonylthiadiazole als schleierhemmende Verbindungen enthalten.EP-06 05 981-A1 claims dry silver materials which contain certain tribromomethylsulfonylthiadiazoles as fog-inhibiting compounds.
Auch mit den bekannten schleierhemmenden Verbindungen läßt sich nicht vermeiden, daß der Schleier des Trockensilbermaterials bei der Verarbeitung mit wachsender Temperatur oder Dauer der Wärmebehandlung ständig ansteigt. Es besteht daher weiterhin das Bedürfnis nach alternativen und wirksamen schleierhemmenden Verbindungen.Even with the known fog-inhibiting compounds, it cannot be avoided that the fog of the dry silver material increases continuously during processing with increasing temperature or duration of the heat treatment. There is therefore still a need for alternative and effective anti-fog compounds.
Aufgabe der Erfindung ist es, ein Trockensilbermaterial zu schaffen, das eine geringe Neigung zur Verschleierung während der Wärmeentwicklung hat.The object of the invention is to provide a dry silver material which has a low tendency to obscure during the development of heat.
Diese Aufgabe wird gelöst durch ein photothermographisches lichtempfindliches Aufzeichnungsmaterial mit mindestens einer auf einem Schichtträger aufgetragenen Bindemittelschicht, welche mindestens ein lichtempfindliches Silberhalogenid und ein lichtunempfindliches Silbersalz einer organischen Säure enthält, wobei das Aufzeichnungsmaterial in dieser Schicht oder in einer in reaktiver Beziehung zu ihr stehenden weiteren Schicht mindestens ein Reduktionsmittel und eine schleierhemmende Verbindung enthält, und das dadurch gekennzeichnet ist, daß die schleierhemmende Verbindung die allgemeine Formel (A)
- X
- Chlor oder Brom und
- A
- eine ggf. substituierte Aminogruppe oder eine Thioethergruppe bedeuten.
- X
- Chlorine or bromine and
- A
- is an optionally substituted amino group or a thioether group.
Bevorzugte schleierhemmende Verbindungen werden durch eine der folgenden allgemeinen Formeln (I) oder (II) beschrieben:
Darin bedeuten
- R1, R2, R3
- Alkyl, Alkenyl, Cycloalkyl, Aryl, Aralkyl oder einen heterocyclischen Rest, wobei diese Reste mit Hydroxyl, Halogen oder mit einer ggf. weiter substituierten Aminogruppe substituiert sein können,
- R1
- auch eine ggf. substituierte Aminogruppe,
- R2
- auch Wasserstoff,
- R1 und R2
- auch Alkylengruppen, deren freie Bindungen unmittelbar oder über ein Sauerstoff- oder Schwefelatom oder über eine ggf. substituierte Iminogruppe zu einem Ring geschlossen sind,
- X
- Chlor oder Brom.
- R 1 , R 2 , R 3
- Alkyl, alkenyl, cycloalkyl, aryl, aralkyl or a heterocyclic radical, where these radicals can be substituted with hydroxyl, halogen or with an optionally further substituted amino group,
- R 1
- also an optionally substituted amino group,
- R 2
- also hydrogen,
- R 1 and R 2
- also alkylene groups, the free bonds of which are closed to form a ring directly or via an oxygen or sulfur atom or via an optionally substituted imino group,
- X
- Chlorine or bromine.
Wenn die Reste R1, R2, R3 Alkyl- oder Alkylengruppen sind, dann enthalten diese bevorzugt 1 bis 20 Kohlenstoffatome. Als Arylgruppen werden solche mit 6 bis 14 Kohlenstoffatomen bevorzugt, beispielsweise Phenyl oder Naphthyl. Aralkylgruppen enthalten bevorzugt 7 bis 20 Kohlenstoffatome, Beispiele sind Benzyl und Phenethyl. Bevorzugte Cycloalkylgruppen weisen 5 bis 10 Kohlenstoffatome auf.If the radicals R 1 , R 2 , R 3 are alkyl or alkylene groups, they preferably contain 1 to 20 carbon atoms. Preferred aryl groups are those having 6 to 14 carbon atoms, for example phenyl or naphthyl. Aralkyl groups preferably contain 7 to 20 carbon atoms, examples are benzyl and phenethyl. Preferred cycloalkyl groups have 5 to 10 carbon atoms.
Heterocyclische Reste in der Funktion von R1, R2, R3 sind bevorzugt über ein Kohlenstoffatom gebundene Reste von heterocyclischen Verbindungen, die als Antischleiermittel für wäßrige Silberhalogenidemulsionen bekannt sind, beispielsweise Reste des Triazols, Imidazols, Thiazols, der Tri- und Tetraazaindene, des Benztriazols, Benzimidazols, Benzthiazols und des Purins.Heterocyclic residues in the function of R 1 , R 2 , R 3 are preferably residues of heterocyclic compounds which are bonded via a carbon atom and are known as antifoggants for aqueous silver halide emulsions, for example residues of triazole, imidazole, thiazole, the tri- and tetraazaindenes, des Benzotriazole, benzimidazole, benzothiazole and purine.
Die genannten Reste können weiter substituiert sein, insbesondere mit Hydroxylgruppen, Aminogruppen und mit Halogenatomen. Anstelle der Hydroxylgruppe kann auch eine Estergruppe, anstelle der Aminogruppe auch eine Amid- oder Sulfonamidgruppe treten.The radicals mentioned can be further substituted, in particular with hydroxyl groups, amino groups and with halogen atoms. Instead of the hydroxyl group, an ester group can also take the place of the amino group and an amide or sulfonamide group.
Der von den Resten R1 und R2 ggf. gebildete Ring kann beispielsweise ein Pyrrolidin-, Piperidin-, Pyrazan-, Thiazin-, Pyrazin- oder Morpholinring sein.The ring optionally formed by the radicals R 1 and R 2 can be, for example, a pyrrolidine, piperidine, pyrazane, thiazine, pyrazine or morpholine ring.
Einzelne Verbindungen der allgemeinen Formeln (I) und (II) sind als Zwischen- oder Endprodukte bei der Herstellung von Farbstoffen oder Pharmazeutika bekannt (z. B. DE 30 48 487-A1, EP 02 75 997-A1, EP 02 01 765-A2, Angewandte Chemie 77 (1965), Seite 282 ff.). Dort finden sich auch allgemeine Hinweise zur Herstellung.Individual compounds of the general formulas (I) and (II) are known as intermediates or end products in the preparation of dyes or pharmaceuticals (e.g. DE 30 48 487-A1, EP 02 75 997-A1, EP 02 01 765- A2, Angewandte Chemie 77 (1965), page 282 ff.). There you will also find general information on manufacturing.
Bei der Synthese der Verbindungen geht man vom 4,5-Dichlor- bzw. 4,5-Dibrom-3(2H)-pyridazon aus, bei denen das Halogenatom in 5-Stellung für elektrophile Substitution zugänglich ist. Durch Umsetzung mit primären oder sekundären Aminen gelangt man zu Verbindungen der Formel (I), mit Thiolaten zu Verbindungen der Formel (II).The synthesis of the compounds is based on 4,5-dichloro- or 4,5-dibromo-3 (2H) -pyridazone, in which the halogen atom in the 5-position is accessible for electrophilic substitution. Reaction with primary or secondary amines leads to compounds of the formula (I), with thiolates to compounds of the formula (II).
10 mmol 4,5-Dichlor- bzw. 4,5-Dibrom-3(2H)-pyridazon werden in 75 ml Ethanol aufgerührt. 20 mmol des entsprechenden Amins werden zugesetzt und das Gemisch 10 bis 24 Stunden (Kontrolle des Umsatzes durch Dünnschichtchromatographie) am Rückfluß gekocht. Danach destilliert man zwei Drittel des Lösungsmittels ab und läßt in der Kälte auskristallisieren. Wenn das Produkt nicht kristallisiert, kann man das Ethanol vollständig abdestillieren, den Rückstand mit Ethylacetat extrahieren, den Extrakt trocknen und eindampfen.10 mmol 4,5-dichloro- or 4,5-dibromo-3 (2H) -pyridazone are stirred in 75 ml ethanol. 20 mmol of the corresponding amine are added and the mixture is boiled under reflux for 10 to 24 hours (control of the conversion by thin layer chromatography). Then distilled off two thirds of the solvent and allowed to crystallize in the cold. If the product does not crystallize, the ethanol can be distilled off completely, the residue extracted with ethyl acetate, the extract dried and evaporated.
10 mmol 4,5-Dichlor- bzw. 4,5-Dibrom-3(2H)-pyridazon werden in 75 ml Ethanol aufgerührt. Man fügt 10 mmol des Thiols sowie 5 ml 2 n-Natronlauge zu und erhitzt 10 bis 24 Stunden (Kontrolle des Umsatzes durch Dünnschichtchromatographie) am Rückfluß. Danach wird der Ethanol vollständig abdestilliert, der Rückstand mit Wasser aufgenommen, mit Ethylacetat extrahiert, der Extrakt getrocknet und eingedampft.10 mmol 4,5-dichloro- or 4,5-dibromo-3 (2H) -pyridazone are stirred in 75 ml ethanol. 10 mmol of the thiol and 5 ml of 2N sodium hydroxide solution are added and the mixture is heated under reflux for 10 to 24 hours (control of the conversion by thin-layer chromatography). The ethanol is then completely distilled off, the residue is taken up in water, extracted with ethyl acetate, the extract is dried and evaporated.
Die so erhaltenen Verbindungen der allgemeinen Formeln (I) und (II) sind farblos bis hellgelb.The compounds of general formulas (I) and (II) thus obtained are colorless to light yellow.
Beispiele für Verbindungen der allgemeinen Formel (I) sind in der folgenden Tabelle 1 aufgeführt:
Tabelle 2 enthält Beispiele für Verbindungen der allgemeinen Formel (II).
Die schleierhemmenden Verbindungen werden der lichtempfindlichen Schicht oder einer mit dieser in reaktiver Beziehung stehenden Schicht einverleibt. "Reaktive Beziehung" bedeutet hier, daß Bestandteile dieser Schicht zumindest unter den Bedingungen der Wärmeentwicklung in die lichtempfindliche Schicht übertreten und dort reagieren können.The antifoggant compounds are incorporated into the photosensitive layer or a layer that is reactive with it. “Reactive relationship” here means that constituents of this layer, at least under the conditions of heat development, can pass into the light-sensitive layer and react there.
Die Verbindungen werden zur Inkorporierung zweckmäßig in einem Lösungsmittel gelöst, welches mit der Beschichtungsmasse für die entsprechend Schicht verträglich ist. Geeignet sind beispielsweise Methanol, Ethanol, i-Butanol, Ethylacetat, Aceton.For incorporation, the compounds are expediently dissolved in a solvent which is compatible with the coating composition for the corresponding layer. For example, methanol, ethanol, i-butanol, ethyl acetate, acetone are suitable.
Die anzuwendenden Mengen liegen zwischen 0,5 und 30 g, bevorzugt 5 bis 15 g der Verbindungen (I) und zwischen 0,2 und 10 g, bevorzugt 2 bis 5 g der Verbindungen (II) je mol Silber.The amounts to be used are between 0.5 and 30 g, preferably 5 to 15 g, of the compounds (I) and between 0.2 and 10 g, preferably 2 to 5 g, of the compounds (II) per mol of silver.
Die erfindungsgemäßen Trockensilbermaterialien bestehen zumindest aus einer lichtempfindlichen Schicht auf einem Schichtträger. Diese lichtempfindliche Schicht enthält zumindest ein Bindemittel, ein lichtunempfindliches Silbersalz einer organischen Säure und ein Silberhalogenid, sowie ein Reduktionsmittel für dieses Silbersalz und die erfindungsgemäße schleierhemmende Verbindung.The dry silver materials according to the invention consist at least of a light-sensitive layer on a support. This light-sensitive layer contains at least one binder, a light-insensitive silver salt of an organic acid and a silver halide, and a reducing agent for this silver salt and the fog-inhibiting compound according to the invention.
Die Trockensilbermaterialien können außer der lichtempfindlichen Schicht weitere Schichten enthalten, die in reaktiver Beziehung zur lichtempfindlichen Schicht stehen. In diesem Fall können das Reduktionsmittel, die schleierhemmende Verbindung und auch weitere Mittel zur Beeinflussung der Eigenschaften des Materials und der damit erzeugten Bilder, wie Toner, Mittel zur Verbesserung der Lagerstabilität des Materials und der Bilder, zur Steigerung der Empfindlichkeit und der Entwicklungsgeschwindigkeit, zusätzlich oder ausschließlich in solchen in reaktiver Beziehung zur lichtempfindlichen Schicht stehenden Schichten enthalten sein.In addition to the photosensitive layer, the dry silver materials can contain further layers which are reactive in relation to the photosensitive layer. In this case, the reducing agent, the antifoggant compound and also other means for influencing the properties of the material and the images formed therewith, such as toners, means for improving the storage stability of the material and the images, for increasing the sensitivity and the development speed, additionally or be contained exclusively in layers which are reactive in relation to the light-sensitive layer.
Als Bindemittel kommen natürliche und synthetische Polymere wie Celluloseacetate, Polyvinylacetale, Polyolefine, polymere Ester, beispielsweise der Terephthalsäure, Polyamide, Poly-(N-vinyl)amide, Polyvinyl/vinylidenchlorid, Polystyrol, Polyacrylnitril, Polycarbonate und dergleichen sowie Copolymere der den genannten Polymeren zugrundeliegenden Monomere in Frage.Natural and synthetic polymers such as cellulose acetates, polyvinyl acetals, polyolefins, polymeric esters, for example of terephthalic acid, polyamides, poly- (N-vinyl) amides, polyvinyl / vinylidene chloride, polystyrene, polyacrylonitrile, polycarbonates and the like, and copolymers of the polymers mentioned are used as binders Monomers in question.
Das nicht lichtempfindliche Silbersalz ist bevorzugt ein Salz einer unverzweigten Fettsäure mit 12 bis 22 Kohlenstoffatomen, beispielsweise der Laurin-, Myristin-, Palmitin-, Stearin-, Arachin- oder Behensäure, oder ein Gemisch solcher Salze. Besonders bevorzugt ist Silberstearat.The non-photosensitive silver salt is preferably a salt of an unbranched fatty acid having 12 to 22 carbon atoms, for example lauric, myristic, palmitic, stearic, arachic or behenic acid, or a mixture of such salts. Silver stearate is particularly preferred.
Als Reduktionsmittel können aromatische Dihydroxyverbindungen wie Hydrochinon, Brenzkatechin dienen. Geeignet sind auch andere als photographische Entwickler wirkende Verbindungen, wie m- oder p-Aminophenole, 3-Pyrazolidinone, Ascorbinsäure und ihre Derivate, sowie weitere, im oben genannten Stand der Technik aufgeführte Verbindungen. Bevorzugt werden Bisphenole, beispielsweise das Bis(2-hydroxy-3-t-butyl-6-methylphenyl)methan. Das Reduktionsmittel kann in der lichtempfindlichen Schicht oder auch in einer angrenzenden Hilfsschicht enthalten sein. Seine Menge beträgt gewöhnlich 0,1 bis 3 Äquivalente, bezogen auf die Gesamtmenge an reduzierbaren Silbersalzen.Aromatic dihydroxy compounds such as hydroquinone and pyrocatechol can be used as reducing agents. Other compounds which act as photographic developers are also suitable, such as m- or p-aminophenols, 3-pyrazolidinones, ascorbic acid and their derivatives, and further compounds listed in the above-mentioned prior art. Bisphenols, for example bis (2-hydroxy-3-t-butyl-6-methylphenyl) methane, are preferred. The reducing agent can be contained in the light-sensitive layer or in an adjacent auxiliary layer. Its amount is usually 0.1 to 3 equivalents based on the total amount of reducible silver salts.
Das lichtempfindliche Silberhalogenid kann in situ aus dem nicht lichtempfindlichen Silbersalz durch Umsetzung mit einer begrenzten Menge einer Verbindung, die Halogenidionen freisetzen kann, hergestellt werden. Solche Verbindungen sind beispielsweise die Halogenide der Alkalimetalle und des Ammoniums oder organische N-Halogenverbindungen wie N-Bromsuccinimid, N-Bromphthalimid, N-Chlorphthalazinon, N-Bromacetamid und andere. Weitere Verfahren dieser Art sind in den in Research Disclosure Nr. 17029, Kapitel I (Juni 1978) und Nr. 29963, Kapitel XV (März 1989) zitierten Veröffentlichungen beschrieben.The photosensitive silver halide can be prepared in situ from the non-photosensitive silver salt by reaction with a limited amount of a compound that can release halide ions. Such compounds are, for example, the halides of the alkali metals and ammonium or organic N-halogen compounds such as N-bromosuccinimide, N-bromophthalimide, N-chlorophthalazinone, N-bromoacetamide and others. Other methods of this type are described in the publications cited in Research Disclosure No. 17029, Chapter I (June 1978) and No. 29963, Chapter XV (March 1989).
In bevorzugter Weise wird das Silberhalogenid in einem separaten Arbeitsgang ("ex situ") in einer wäßriger Lösung hergestellt, die ein hydrophiles Kolloid, bevorzugt Gelatine, enthält. Man wendet hierbei die aus der konventionellen Technik der photographischen Silberhalogenidemulsionen bekannten Verfahren der Fällung sowie der chemischen und spektralen Sensibilisierung an. Danach kann das Silberhalogenid von dem Schutzkolloid getrennt werden, beispielsweise nach dem Verfahren der GB 13 54 186. Das isolierte und ggf. sensibilisierte Silberhalogenid wird dann der Beschichtungsmasse für die lichtempfindliche Schicht des Trockensilbermaterials zugesetzt. Als Silberhalogenid bevorzugt werden Silberbromid und Silberbromoiodid mit einem Iodidanteil bis zu 10 Molprozent. Die Korngröße des Silberhalogenids liegt vorzugsweise zwischen 0,05 und 0,5 µm, sein Anteil am gesamten Silbersalzgehalt der lichtempfindlichen Schicht beträgt im allgemeinen weniger als 10, vorzugsweise 0,2 bis 2 Molprozent.The silver halide is preferably produced in a separate operation ("ex situ") in an aqueous solution which contains a hydrophilic colloid, preferably gelatin. The methods of precipitation and chemical and spectral sensitization known from the conventional technique of photographic silver halide emulsions are used. The silver halide can then be separated from the protective colloid, for example by the method of GB 13 54 186. The isolated and optionally sensitized silver halide is then added to the coating composition for the light-sensitive layer of the dry silver material. Silver bromide and silver bromoiodide with a are preferred as silver halide Iodide content up to 10 mole percent. The grain size of the silver halide is preferably between 0.05 and 0.5 μm, its share in the total silver salt content of the light-sensitive layer is generally less than 10, preferably 0.2 to 2 mol percent.
Es ist vorteilhaft, den erfindungsgemäßen Trockensilbermaterialien einen sogenannten Toner beizufügen, damit das entwickelte Silberbild einen neutralschwarzen Farbton und eine hohe Dichte erhält. Bekannte Toner sind in den Research Disclosure 17029 (Juni 1978), Kapitel V, und 29963 (März 1989), Kapitel XXII, beschrieben. Beispiele brauchbarer Toner sind Phthalazinon und dessen Derivate, beispielsweise 2-Acetylphthalazinon, Phthalimid und Derivate, wie N-Hydroxyphthalimid, Succinimid, N-Hydroxy-1,8-naphthalimid.It is advantageous to add a so-called toner to the dry silver materials according to the invention, so that the developed silver image acquires a neutral black color and a high density. Known toners are described in Research Disclosure 17029 (June 1978), Chapter V, and 29963 (March 1989), Chapter XXII. Examples of useful toners are phthalazinone and its derivatives, for example 2-acetylphthalazinone, phthalimide and derivatives such as N-hydroxyphthalimide, succinimide, N-hydroxy-1,8-naphthalimide.
Besonders bevorzugte Toner sind Pyridazone, beispielsweise 6-Pyridazone der allgemeinen Formel
Die Toner werden bevorzugt einer zu der lichtempfindlichen Schicht in reaktiver Beziehung stehenden Schicht zugesetzt.The toners are preferably added to a layer that is reactive with the photosensitive layer.
Die Trockensilbermaterialien können außer der lichtempfindlichen Schicht und den ggf. vorhandenen zu dieser in reaktiver Beziehung stehenden Schichten noch weitere Schichten enthalten, beispielsweise über oder unter der lichtempfindlichen Schicht angeordnete Hilfsschichten wie Schutzschichten oder haftungsvermittelnde Schichten oder auf der Rückseite des Schichtträgers angebrachte Antihalo- oder Anticurlschichten.In addition to the light-sensitive layer and any layers that are reactive to it, the dry silver materials can also contain further layers, for example auxiliary layers such as arranged above or below the light-sensitive layer Protective layers or adhesion-promoting layers or antihalo or anti-curl layers attached to the back of the layer support.
Als Schichtträger können beispielsweise sowohl klare und gefärbte bzw. pigmentierte Kunststoffolien, beispielsweise aus Polyethylenterephthalat oder Celluloseacetat, als auch rohe oder beschichtete Papiere dienen.Both clear and colored or pigmented plastic films, for example made of polyethylene terephthalate or cellulose acetate, and also raw or coated papers can serve as layer supports.
Die Trockensilbermaterialien nach der vorliegenden Erfindung sind durch geringe Schleierneigung und hohen Kontrast ausgezeichnet. Insbesondere steigt der Schleier während der Wärmeentwicklung nur geringfügig an, sodaß Entwicklungszeit und -temperatur nach den jeweiligen Anforderungen ohne Probleme angepaßt werden können. Insbesondere können die Maximaldichte und die Empfindlichkeit durch "Quälen" gesteigert werden. Auch wirken sich unvermeidliche Schwankungen der Entwicklungsbedingungen nicht auf die Bildqualität aus.The dry silver materials of the present invention are characterized by low fog and high contrast. In particular, the veil rises only slightly during the development of heat, so that the development time and temperature can be adapted without problems according to the respective requirements. In particular, the maximum density and sensitivity can be increased by "torturing". Inevitable fluctuations in the development conditions also have no effect on the image quality.
Die erfindungsgemäßen Materialien können für die Herstellung von Bildern mittels Belichtung und Wärmeentwicklung verwendet werden, insbesondere für Kontaktkopien, Projektionsvergrößerungen und Kameraaufnahmen in der Reproduktionstechnik.The materials according to the invention can be used for the production of images by means of exposure and heat development, in particular for contact copies, projection enlargements and camera recordings in reproduction technology.
Eine lichtempfindliche Beschichtungsmasse für ein Trockensilbermaterial wurde auf folgende Weise hergestellt:A photosensitive coating composition for a dry silver material was prepared in the following way:
In einer Perlmühle wurden
- 196 g
- Silberstearat,
- 1500 ml
- Ethanol,
- 40 g
- Polyvinylpyrrolidon K 30 (Molmasse 40 000),
- 4 ml
- Nonylphenolethoxylat (10 EO) und
- 7 g
- Behensäure
- 196 g
- Silver stearate,
- 1500 ml
- Ethanol,
- 40 g
- Polyvinylpyrrolidone K 30 (molecular weight 40,000),
- 4 ml
- Nonylphenol ethoxylate (10 EO) and
- 7 g
- Behenic acid
Dieser Dispersion wurden unter Rühren
- 60 g
- Polyvinylpyrrolidon,
- 1,28 g
- Quecksilber-(II)-chlorid in 200 ml Ethanol,
- 16 g
- Phthalazinon in 200 ml Ethanol und
- 6,4 g
- 5-Nitroindazol in 250 ml Ethanol
- 60 g
- Polyvinyl pyrrolidone,
- 1.28 g
- Mercury (II) chloride in 200 ml of ethanol,
- 16 g
- Phthalazinone in 200 ml ethanol and
- 6.4 g
- 5-nitroindazole in 250 ml of ethanol
In einem Lösungsmittelgemisch aus
- 400 ml
- Methylenchlorid und
- 80 ml
- Isopropanol wurden
- 4 ml
- Nonylphenolethoxylat (10 EO),
- 40 g
- Polyvinylbutyral (Molmasse 36 000),
- 34 g
- 3,3'-Di-t-butyl-2,2'-dihydroxy-5,5'-dimethyldiphenylmethan
- 400 ml
- Methylene chloride and
- 80 ml
- Wasopropanol
- 4 ml
- Nonylphenol ethoxylate (10 EO),
- 40 g
- Polyvinyl butyral (molecular weight 36,000),
- 34 g
- 3,3'-di-t-butyl-2,2'-dihydroxy-5,5'-dimethyldiphenylmethane
Die Beschichtungslösung B wurde mit einer Schichtdicke von 60 µm auf einen Polyethylenterephthalat-Schichtträger aufgetragen und getrocknet. Auf die trockene Schicht wurde die Beschichtungslösung C mit einer Schichtdicke von 100 µm aufgebracht und wiederum getrocknet.Coating solution B was applied with a layer thickness of 60 μm to a polyethylene terephthalate support and dried. The coating solution C was applied to the dry layer with a layer thickness of 100 μm and dried again.
Auf diese Weise erhielt man Trockensilberfilme, die sich nur in der Art der in der lichtempfindlichen Schicht enthaltenen schleierhemmenden Verbindung unterschieden. Proben dieser Filme wurden in einem Kontaktbelichtungsgerät mittels einer Maske bildmäßig belichtet und durch Berührung mit einer Metalloberfläche, die eine Temperatur von 105 °C hatte, über die in Tabelle 3 angegebene Zeit entwickelt. Beurteilt wurde die Transmissions-Minimaldichte Dmin an den Stellen, die unter den undurchlässigen Bereichen der Maske gelegen hatten.
Claims (5)
dadurch gekennzeichnet, daß
die schleierhemmende Verbindung die allgemeine Formel (A)
characterized in that
the antifoggant compound the general formula (A)
dadurch gekennzeichnet, daß
die schleierhemmende Verbindung der allgemeinen Formel (A) eine der nachstehenden Formeln (I) oder (II) hat,
characterized in that
the antifoggant compound of the general formula (A) has one of the formulas (I) or (II) below,
dadurch gekennzeichnet, daß
die Menge der schleierhemmenden Verbindung 0,5 bis 30 g je mol Silber beträgt.Material according to claim 1 or 2,
characterized in that
the amount of the fog-inhibiting compound is 0.5 to 30 g per mol of silver.
dadurch gekennzeichnet, daß
es in der lichtempfindlichen Schicht oder in einer zu dieser in reaktiver Beziehung stehenden Schicht eine Tonerverbindung der allgemeinen Formel
characterized in that
there is a toner compound of the general formula in the photosensitive layer or in a layer which is reactive with this
dadurch gekennzeichnet, daß
das lichtempfindliche Silberhalogenid ex situ gebildet und chemisch und ggf. spektral sensibilisiert ist.Material according to one of claims 1 to 4,
characterized in that
the light-sensitive silver halide is formed ex situ and is chemically and possibly spectrally sensitized.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19516350 | 1995-05-04 | ||
DE1995116350 DE19516350A1 (en) | 1995-05-04 | 1995-05-04 | Reduced fog photothermographic photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0741319A1 true EP0741319A1 (en) | 1996-11-06 |
Family
ID=7761052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96106486A Withdrawn EP0741319A1 (en) | 1995-05-04 | 1996-04-25 | Photothermographic photosensitive recording material with reduced fog |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0741319A1 (en) |
DE (1) | DE19516350A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6319660B1 (en) | 1998-12-28 | 2001-11-20 | Eastman Kodak Company | Color photographic element containing speed improving compound |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275997A1 (en) * | 1987-01-20 | 1988-07-27 | Nissan Chemical Industries Ltd. | 3(2H)pyridazinone, process for its preparation and antagonistic agent against SRS-A containing it |
EP0497053A1 (en) * | 1991-01-28 | 1992-08-05 | Minnesota Mining And Manufacturing Company | Improved dry silver constructions |
EP0587338A2 (en) * | 1992-09-02 | 1994-03-16 | Minnesota Mining And Manufacturing Company | Silver halide imaging materials |
-
1995
- 1995-05-04 DE DE1995116350 patent/DE19516350A1/en not_active Ceased
-
1996
- 1996-04-25 EP EP96106486A patent/EP0741319A1/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275997A1 (en) * | 1987-01-20 | 1988-07-27 | Nissan Chemical Industries Ltd. | 3(2H)pyridazinone, process for its preparation and antagonistic agent against SRS-A containing it |
EP0497053A1 (en) * | 1991-01-28 | 1992-08-05 | Minnesota Mining And Manufacturing Company | Improved dry silver constructions |
EP0587338A2 (en) * | 1992-09-02 | 1994-03-16 | Minnesota Mining And Manufacturing Company | Silver halide imaging materials |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6319660B1 (en) | 1998-12-28 | 2001-11-20 | Eastman Kodak Company | Color photographic element containing speed improving compound |
US6455242B1 (en) | 1998-12-28 | 2002-09-24 | Eastman Kodak Company | Color photographic element containing speed improving compound |
Also Published As
Publication number | Publication date |
---|---|
DE19516350A1 (en) | 1996-11-07 |
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