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DE69942486D1 - Grabenisolation für mikromechanische bauelemente - Google Patents

Grabenisolation für mikromechanische bauelemente

Info

Publication number
DE69942486D1
DE69942486D1 DE69942486T DE69942486T DE69942486D1 DE 69942486 D1 DE69942486 D1 DE 69942486D1 DE 69942486 T DE69942486 T DE 69942486T DE 69942486 T DE69942486 T DE 69942486T DE 69942486 D1 DE69942486 D1 DE 69942486D1
Authority
DE
Germany
Prior art keywords
micromechanical components
track insulation
track
insulation
micromechanical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69942486T
Other languages
English (en)
Inventor
Scott G Adams
Kevin A Shaw
Russell Y Webb
Bryan W Reed
Noel C Macdonald
Timothy J Davis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cornell Research Foundation Inc
Original Assignee
Cornell Research Foundation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cornell Research Foundation Inc filed Critical Cornell Research Foundation Inc
Application granted granted Critical
Publication of DE69942486D1 publication Critical patent/DE69942486D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76224Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00142Bridges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00642Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
    • B81C1/00698Electrical characteristics, e.g. by doping materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/01Suspended structures, i.e. structures allowing a movement
    • B81B2203/0118Cantilevers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0323Grooves
    • B81B2203/033Trenches

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Micromachines (AREA)
  • Element Separation (AREA)
  • Pressure Sensors (AREA)
DE69942486T 1998-01-15 1999-01-14 Grabenisolation für mikromechanische bauelemente Expired - Lifetime DE69942486D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7139098P 1998-01-15 1998-01-15
PCT/US1999/000784 WO1999036941A2 (en) 1998-01-15 1999-01-14 Trench isolation for micromechanical devices

Publications (1)

Publication Number Publication Date
DE69942486D1 true DE69942486D1 (de) 2010-07-22

Family

ID=22100999

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69942486T Expired - Lifetime DE69942486D1 (de) 1998-01-15 1999-01-14 Grabenisolation für mikromechanische bauelemente

Country Status (5)

Country Link
US (2) US6239473B1 (de)
EP (2) EP2221852B1 (de)
JP (1) JP2002510139A (de)
DE (1) DE69942486D1 (de)
WO (1) WO1999036941A2 (de)

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Also Published As

Publication number Publication date
EP2221852B1 (de) 2012-05-09
US6342430B1 (en) 2002-01-29
WO1999036941A3 (en) 2000-02-10
EP2221852A1 (de) 2010-08-25
US6239473B1 (en) 2001-05-29
EP1062684A2 (de) 2000-12-27
WO1999036941A2 (en) 1999-07-22
EP1062684A4 (de) 2006-07-26
EP1062684B1 (de) 2010-06-09
JP2002510139A (ja) 2002-04-02

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