DE69717182D1 - Excimerlasergenerator - Google Patents

Excimerlasergenerator

Info

Publication number: DE69717182D1
Authority: DE; Germany
Prior art keywords: excimer laser; excimer; laser
Prior art date: 1996-03-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69717182T

Other languages

English (en)

Other versions

DE69717182T2 (de

Inventor

Tadahiro Ohmi

Yasuyuki Shirai

Naoto Sano

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-03-07

Filing date

1997-03-06

Publication date

2003-01-02

1997-03-06 Application filed by Canon Inc filed Critical Canon Inc

2003-01-02 Publication of DE69717182D1 publication Critical patent/DE69717182D1/de

2003-07-24 Application granted granted Critical

2003-07-24 Publication of DE69717182T2 publication Critical patent/DE69717182T2/de

2017-03-07 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0305—Selection of materials for the tube or the coatings thereon
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

Physics & Mathematics (AREA)
Electromagnetism (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Optics & Photonics (AREA)
Lasers (AREA)

DE69717182T 1996-03-07 1997-03-06 Excimerlasergenerator Expired - Lifetime DE69717182T2 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP7957496		1996-03-07
JP7956996		1996-03-07
JP7956896		1996-03-07
JP7957096		1996-03-07

Publications (2)

Publication Number	Publication Date
DE69717182D1 true DE69717182D1 (de)	2003-01-02
DE69717182T2 DE69717182T2 (de)	2003-07-24

Family

ID=27466327

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69717182T Expired - Lifetime DE69717182T2 (de)	1996-03-07	1997-03-06	Excimerlasergenerator

Country Status (4)

Country	Link
US (1)	US6215806B1 (de)
EP (1)	EP0794598B1 (de)
DE (1)	DE69717182T2 (de)
TW (1)	TW432763B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3697036B2 (ja)	1997-10-03	2005-09-21	キヤノン株式会社	露光装置及びそれを用いた半導体製造方法
US20020011215A1 (en)	1997-12-12	2002-01-31	Goushu Tei	Plasma treatment apparatus and method of manufacturing optical parts using the same
US6379492B2 (en) *	1998-10-31	2002-04-30	Applied Materials, Inc.	Corrosion resistant coating
JP3927327B2 (ja) *	1998-11-06	2007-06-06	株式会社小松製作所	ハロゲンガスを含むガスレーザ装置
DE69841643D1 (de) *	1998-12-04	2010-06-10	Stella Chemifa K K	Rostfreier stahl mit darauf geformten passivem fluoridfilm und daraus hergestellter gegenstand
JP3444350B2 (ja) *	1999-11-17	2003-09-08	ウシオ電機株式会社	エキシマレーザ装置
KR100767762B1 (ko) *	2000-01-18	2007-10-17	에이에스엠 저펜 가부시기가이샤	자가 세정을 위한 원격 플라즈마 소스를 구비한 cvd 반도체 공정장치
US6765201B2 (en) *	2000-02-09	2004-07-20	Hitachi, Ltd.	Ultraviolet laser-generating device and defect inspection apparatus and method therefor
US6644324B1 (en)	2000-03-06	2003-11-11	Cymer, Inc.	Laser discharge chamber passivation by plasma
US7006546B2 (en) *	2000-03-15	2006-02-28	Komatsu Ltd.	Gas laser electrode, laser chamber employing the electrode, and gas laser device
US20030010288A1 (en) *	2001-02-08	2003-01-16	Shunpei Yamazaki	Film formation apparatus and film formation method
DE20110048U1 (de) *	2001-06-18	2001-08-16	Lambda Physik AG, 37079 Göttingen	Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
US6810061B2 (en) *	2001-08-27	2004-10-26	Komatsu Ltd.	Discharge electrode and discharge electrode manufacturing method
US8428095B2 (en) *	2008-12-22	2013-04-23	Ams Research Corporation	Laser resonator
CN102517540B (zh) *	2011-12-20	2013-11-20	广东华南特种气体研究所有限公司	一种准分子激光气配置装置的钝化方法
US9583369B2 (en) *	2013-07-20	2017-02-28	Applied Materials, Inc.	Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US8929419B1 (en)	2013-08-13	2015-01-06	Lightmachinery Inc.	Excimer laser with gas purification
KR101773695B1 (ko) *	2013-08-13	2017-08-31	니폰게이긴조쿠가부시키가이샤	전자기기 하우징용 고강도 알루마이트 피막이 부착된 알루미늄 합금판 및 그 제조 방법
CN108884548A (zh) *	2016-04-05	2018-11-23	关东电化工业株式会社	材料、使用该材料的保存容器、安装于该保存容器的阀以及ClF的保存方法、ClF容器的使用方法
CN111139428A (zh) *	2019-12-30	2020-05-12	中船重工（邯郸）派瑞特种气体有限公司	一种储存含氟化合物电子级气体钢瓶的钝化处理方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4888203A (en) *	1987-11-13	1989-12-19	Massachusetts Institute Of Technology	Hydrolysis-induced vapor deposition of oxide films
US5029177A (en) *	1988-01-15	1991-07-02	Cymer Laser Technologies	Compact excimer laser
US5018161A (en) *	1988-01-15	1991-05-21	Cymer Laser Technologies	Compact excimer laser
US5009963A (en) *	1988-07-20	1991-04-23	Tadahiro Ohmi	Metal material with film passivated by fluorination and apparatus composed of the metal material
DE68918365T2 (de) *	1988-07-20	1995-05-04	Hashimoto Chemical Ind Co	Metallischer Werkstoff mit durch Fluorierung passiviertem Film und aus dem metallischen Werkstoff bestehende Anlage.
JPH0254751A (ja)	1988-08-17	1990-02-23	Tadahiro Omi	金属酸化処理装置及び金属酸化処理方法並びに金属装入方法
DE59002997D1 (de) *	1989-04-04	1993-11-11	Eltro Gmbh	Elektrode für gepulste gas-laser und verfahren zu ihrer herstellung.
JP3030351B2 (ja)	1990-01-19	2000-04-10	ステラケミファ株式会社	フッ化不働態膜が形成されたステンレス鋼、その製造方法並びにそのステンレスを用いた装置
JP2954716B2 (ja) *	1990-03-08	1999-09-27	三菱アルミニウム株式会社	フッ化不働態膜を形成した工業材料およびその製造方法
JP2986859B2 (ja)	1990-07-05	1999-12-06	三菱アルミニウム株式会社	アルミニウム合金材およびその製造方法
US5343270A (en) *	1990-10-30	1994-08-30	Nikon Corporation	Projection exposure apparatus
US5260961A (en) *	1990-11-01	1993-11-09	Florod Corporation	Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
CH683188A5 (de) *	1991-01-11	1994-01-31	Alusuisse Lonza Services Ag	Aluminiumoberflächen.
JP3017301B2 (ja) *	1991-02-18	2000-03-06	大阪酸素工業株式会社	不動態膜の形成方法
US5450436A (en) *	1992-11-20	1995-09-12	Kabushiki Kaisha Komatsu Seisakusho	Laser gas replenishing apparatus and method in excimer laser system
JP3691089B2 (ja)	1994-09-27	2005-08-31	ステラケミファ株式会社	フッ化処理用アルミニウム合金
JP3175515B2 (ja) *	1994-12-26	2001-06-11	キヤノン株式会社	露光装置及びそれを用いたデバイスの製造方法
CA2152567C (en) *	1995-06-23	2000-01-11	Kenneth M. Buckland	Approach to directly performing asynchronous transfer mode (atm) adaptation layer 5 reassembly
US5748656A (en) *	1996-01-05	1998-05-05	Cymer, Inc.	Laser having improved beam quality and reduced operating cost
ATE217366T1 (de) *	1996-08-15	2002-05-15	Alcan Tech & Man Ag	Reflektor mit resistenter oberfläche

1997
- 1997-03-06 US US08/812,288 patent/US6215806B1/en not_active Expired - Lifetime
- 1997-03-06 EP EP97301522A patent/EP0794598B1/de not_active Expired - Lifetime
- 1997-03-06 DE DE69717182T patent/DE69717182T2/de not_active Expired - Lifetime
- 1997-03-07 TW TW086102808A patent/TW432763B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
EP0794598A1 (de)	1997-09-10
TW432763B (en)	2001-05-01
DE69717182T2 (de)	2003-07-24
US6215806B1 (en)	2001-04-10
EP0794598B1 (de)	2002-11-20

Publication	Publication Date	Title
DE69703782D1 (de)	2001-02-01	Laservorrichtung
DE69714859D1 (de)	2002-09-26	Laservorrichtung
DE69819547D1 (de)	2003-12-11	Schmalbandiger excimerlaser
DE69703697D1 (de)	2001-01-18	Laservorrichtung
DE69817099D1 (de)	2003-09-18	Laserdrucker
DE69725631D1 (de)	2003-11-27	Laser-Nivelliervorrichtung
DE59606916D1 (de)	2001-06-21	Lasergravuranlage
DE59700907D1 (de)	2000-01-27	Monolithische laserdioden-modulator-kombination
DE19680508T1 (de)	1997-07-24	Konfokal-bis-konzentrischer diodengepumpter Laser
DE69717182D1 (de)	2003-01-02	Excimerlasergenerator
DE69734223D1 (de)	2006-02-02	Laserstrahlemittierendes Gerät
DE69605245D1 (de)	1999-12-30	Laser
DE19750586B4 (de)	2007-05-16	Laser-Lötverfahren
DE69701275D1 (de)	2000-03-16	Lasersysteme
DE69617254D1 (de)	2002-01-03	Laservorrichtung
DE69733470D1 (de)	2005-07-14	Laserbearbeitung
DE59700416D1 (de)	1999-10-14	Bandleiterlaser
DE69419231D1 (de)	1999-07-29	Laserschneidevorrichtung
DE69702675D1 (de)	2000-09-07	Heterostrukturlaser
DE69404047D1 (de)	1997-08-14	Lasereinheit
DE69738632D1 (de)	2008-05-21	Lasergerät
DE69813465D1 (de)	2003-05-22	Laserschneideinrichtung
DE59505168D1 (de)	1999-04-08	Lasermodul
DE69519719D1 (de)	2001-02-01	Laservorrichtung
DE69736650D1 (de)	2006-10-26	Lasermanipulationsvorrichtung

Legal Events

Date	Code	Title	Description
2003-12-18	8364	No opposition during term of opposition