DE60310735D1 - SILYLALKYLESTER VON ANTHRACEN- UND PHENANTHRENCARBONSuUREN - Google Patents

SILYLALKYLESTER VON ANTHRACEN- UND PHENANTHRENCARBONSuUREN

Info

Publication number: DE60310735D1
Authority: DE; Germany
Prior art keywords: alkyl esters; anthracene; phenanthrene; silyl alkyl; carbonesuures
Prior art date: 2002-06-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE60310735T

Other languages

English (en)

Other versions

DE60310735T2 (de

Inventor

Uwe Lehmann

Ralph Lonsky

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Honeywell Specialty Chemicals Seelze GmbH

Original Assignee

Honeywell Specialty Chemicals Seelze GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-06-21

Filing date

2003-06-20

Publication date

2007-02-08

2003-06-20 Application filed by Honeywell Specialty Chemicals Seelze GmbH filed Critical Honeywell Specialty Chemicals Seelze GmbH

2007-02-08 Application granted granted Critical

2007-02-08 Publication of DE60310735D1 publication Critical patent/DE60310735D1/de

2007-10-31 Publication of DE60310735T2 publication Critical patent/DE60310735T2/de

2023-06-21 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Silicon Polymers (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Materials For Photolithography (AREA)

DE60310735T 2002-06-21 2003-06-20 Silylalkylester von anthracen- und phenanthrencarbonsäuren Expired - Fee Related DE60310735T2 (de)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
DE10227807A DE10227807A1 (de)	2002-06-21	2002-06-21	Silylalkylester von Anthracen- und Phenanthrencarbonsäuren
DE10227807		2002-06-21
PCT/EP2003/006534 WO2004000853A1 (en)	2002-06-21	2003-06-20	Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids

Publications (2)

Publication Number	Publication Date
DE60310735D1 true DE60310735D1 (de)	2007-02-08
DE60310735T2 DE60310735T2 (de)	2007-10-31

Family

ID=29761325

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
DE10227807A Withdrawn DE10227807A1 (de)	2002-06-21	2002-06-21	Silylalkylester von Anthracen- und Phenanthrencarbonsäuren
DE60310735T Expired - Fee Related DE60310735T2 (de)	2002-06-21	2003-06-20	Silylalkylester von anthracen- und phenanthrencarbonsäuren

Family Applications Before (1)

Application Number	Title	Priority Date	Filing Date
DE10227807A Withdrawn DE10227807A1 (de)	2002-06-21	2002-06-21	Silylalkylester von Anthracen- und Phenanthrencarbonsäuren

Country Status (9)

Country	Link
US (1)	US20060052569A1 (de)
EP (1)	EP1539771B1 (de)
JP (1)	JP2005535616A (de)
CN (1)	CN1307186C (de)
AT (1)	ATE349454T1 (de)
AU (1)	AU2003242741A1 (de)
DE (2)	DE10227807A1 (de)
TW (1)	TW200400418A (de)
WO (1)	WO2004000853A1 (de)

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DE602004009791T2 (de) *	2003-05-23	2008-10-30	Dow Corning Corp., Midland	Siloxan-harz basierte anti-reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
JP5412037B2 (ja) *	2004-12-17	2014-02-12	ダウ・コーニング・コーポレイション	シロキサン樹脂、シロキサン樹脂の調製方法および抗反射コーティング組成物
US20070238847A1 (en) *	2006-04-11	2007-10-11	Xerox Corporation	Method for forming reactive silane esters
US8168109B2 (en) *	2009-08-21	2012-05-01	International Business Machines Corporation	Stabilizers for vinyl ether resist formulations for imprint lithography
CN102321115A (zh) *	2011-11-01	2012-01-18	上海爱默金山药业有限公司	一种电子级二甲基二乙氧基硅烷的提纯方法
JP6497143B2 (ja) *	2015-03-13	2019-04-10	Jsr株式会社	レジスト下層膜形成用組成物及び該組成物を用いたパターン形成方法
KR101881815B1 (ko) *	2016-02-03	2018-08-24	한국생산기술연구원	알콕시실릴기 및 활성 에스테르기를 갖는 화합물, 이의 제조방법, 이를 포함하는 조성물 및 용도
JP2018053283A (ja) *	2016-09-27	2018-04-05	セイコーエプソン株式会社	パターン形成方法、装飾品の製造方法、腕時計用ベルトの製造方法、配線実装構造の製造方法、半導体装置の製造方法、および、プリント配線基板の製造方法

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US4935583A (en) *	1980-05-30	1990-06-19	Kyle James C	Insulated conductor with ceramic-connected elements
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TW354392B (en) *	1996-07-03	1999-03-11	Du Pont	Photomask blanks
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JP2001109150A (ja) *	1999-10-05	2001-04-20	Fuji Photo Film Co Ltd	ポジ型フォトレジスト組成物
EP1472574A4 (de) *	2001-11-15	2005-06-08	Honeywell Int Inc	Aufschleuder-antireflexbeschichtungen für die photolithographie
US20090275694A1 (en) *	2001-11-16	2009-11-05	Honeywell International Inc.	Spin-on-Glass Anti-Reflective Coatings for Photolithography
US20060155594A1 (en) *	2005-01-13	2006-07-13	Jess Almeida	Adaptive step-by-step process with guided conversation logs for improving the quality of transaction data

2002
- 2002-06-21 DE DE10227807A patent/DE10227807A1/de not_active Withdrawn
2003
- 2003-06-03 TW TW092115124A patent/TW200400418A/zh unknown
- 2003-06-20 JP JP2004514820A patent/JP2005535616A/ja not_active Withdrawn
- 2003-06-20 WO PCT/EP2003/006534 patent/WO2004000853A1/en active IP Right Grant
- 2003-06-20 CN CNB038144212A patent/CN1307186C/zh not_active Expired - Fee Related
- 2003-06-20 US US10/518,060 patent/US20060052569A1/en not_active Abandoned
- 2003-06-20 EP EP03760669A patent/EP1539771B1/de not_active Expired - Lifetime
- 2003-06-20 AT AT03760669T patent/ATE349454T1/de not_active IP Right Cessation
- 2003-06-20 AU AU2003242741A patent/AU2003242741A1/en not_active Abandoned
- 2003-06-20 DE DE60310735T patent/DE60310735T2/de not_active Expired - Fee Related

Also Published As

Publication number	Publication date
DE60310735T2 (de)	2007-10-31
WO2004000853A1 (en)	2003-12-31
TW200400418A (en)	2004-01-01
CN1307186C (zh)	2007-03-28
ATE349454T1 (de)	2007-01-15
EP1539771A1 (de)	2005-06-15
JP2005535616A (ja)	2005-11-24
CN1662546A (zh)	2005-08-31
EP1539771B1 (de)	2006-12-27
US20060052569A1 (en)	2006-03-09
DE10227807A1 (de)	2004-01-22
AU2003242741A1 (en)	2004-01-06

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Legal Events

Date	Code	Title	Description
2008-01-17	8364	No opposition during term of opposition
2010-04-22	8339	Ceased/non-payment of the annual fee