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DE60229591D1 - Trägerplattenvorrichtung - Google Patents

Trägerplattenvorrichtung

Info

Publication number
DE60229591D1
DE60229591D1 DE60229591T DE60229591T DE60229591D1 DE 60229591 D1 DE60229591 D1 DE 60229591D1 DE 60229591 T DE60229591 T DE 60229591T DE 60229591 T DE60229591 T DE 60229591T DE 60229591 D1 DE60229591 D1 DE 60229591D1
Authority
DE
Germany
Prior art keywords
stage apparatus
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60229591T
Other languages
English (en)
Inventor
Nobushige Korenaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60229591D1 publication Critical patent/DE60229591D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Machine Tool Units (AREA)
DE60229591T 2001-07-09 2002-06-26 Trägerplattenvorrichtung Expired - Lifetime DE60229591D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001208550A JP2003022960A (ja) 2001-07-09 2001-07-09 ステージ装置及びその駆動方法

Publications (1)

Publication Number Publication Date
DE60229591D1 true DE60229591D1 (de) 2008-12-11

Family

ID=19044346

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60229591T Expired - Lifetime DE60229591D1 (de) 2001-07-09 2002-06-26 Trägerplattenvorrichtung

Country Status (4)

Country Link
US (1) US6873404B2 (de)
EP (1) EP1276015B1 (de)
JP (1) JP2003022960A (de)
DE (1) DE60229591D1 (de)

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JP4323759B2 (ja) * 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
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JP3849932B2 (ja) 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
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JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
AU2003288583A1 (en) * 2002-12-16 2004-07-09 Koninklijke Philips Electronics N.V. Apparatus for processing an object with high position accurancy
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP4194383B2 (ja) * 2003-02-13 2008-12-10 キヤノン株式会社 リニアモータ
JP4386241B2 (ja) 2003-04-01 2009-12-16 キヤノン株式会社 鉄心、鉄心の製造方法、位置決め装置および露光装置
JP2004364392A (ja) * 2003-06-03 2004-12-24 Canon Inc リニアモータ、及びこれを備えるステージ装置、露光装置並びにデバイス製造方法
JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2005209670A (ja) * 2004-01-20 2005-08-04 Canon Inc 磁気浮上装置
US20050162802A1 (en) * 2004-01-22 2005-07-28 Nikon Research Corporation Of America Offset gap control for electromagnetic devices
JP4307288B2 (ja) 2004-02-25 2009-08-05 キヤノン株式会社 位置決め装置
JP2005317916A (ja) * 2004-03-30 2005-11-10 Canon Inc 露光装置及びデバイス製造方法
JP2006049384A (ja) * 2004-07-30 2006-02-16 Laserfront Technologies Inc ガントリー型ｘｙステージ
JP4617119B2 (ja) 2004-08-30 2011-01-19 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
JP2006086442A (ja) * 2004-09-17 2006-03-30 Nikon Corp ステージ装置及び露光装置
US20060061218A1 (en) * 2004-09-21 2006-03-23 Nikon Corporation Dual force wafer table
US7385678B2 (en) * 2004-10-05 2008-06-10 Asml Netherlands B.V. Positioning device and lithographic apparatus
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
JP2006211812A (ja) 2005-01-27 2006-08-10 Canon Inc 位置決め装置、露光装置、並びにデバイス製造方法
US20070152391A1 (en) * 2005-12-29 2007-07-05 Chitayat Anwar K Error corrected positioning stage
TWI457193B (zh) * 2006-03-02 2014-10-21 Sumitomo Heavy Industries Stage device
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
JP2007312516A (ja) * 2006-05-18 2007-11-29 Canon Inc 駆動装置、露光装置及びデバイス製造方法
JP2007329435A (ja) * 2006-06-09 2007-12-20 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2008004647A (ja) * 2006-06-20 2008-01-10 Canon Inc 位置決め装置、露光装置及びデバイスの製造方法
DE102006034455A1 (de) * 2006-07-26 2008-01-31 Carl Zeiss Industrielle Messtechnik Gmbh Lageveränderliche Werkstückauflage für eine Maschine und Bearbeitungsanlage mit einer entsprechenden Werkstückauflage
NL1032371C2 (nl) * 2006-08-28 2008-02-29 Assembleon Bv Verplaatsingsinrichting alsmede componentplaatsingsinrichting.
US7880864B2 (en) * 2006-12-27 2011-02-01 Canon Kabusiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
JP5448070B2 (ja) 2007-03-05 2014-03-19 株式会社ニコン 移動体装置、パターン形成装置及びパターン形成方法、デバイス製造方法、並びに移動体駆動方法
US8102505B2 (en) * 2007-03-20 2012-01-24 Asml Netherlands B.V. Lithographic apparatus comprising a vibration isolation support device
JP2009016385A (ja) * 2007-06-29 2009-01-22 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP5180555B2 (ja) * 2007-10-04 2013-04-10 キヤノン株式会社 位置決め装置、露光装置及びデバイス製造方法
JP5151568B2 (ja) * 2008-03-10 2013-02-27 株式会社ニコン ステージ装置及び露光装置
US8638026B2 (en) * 2008-10-08 2014-01-28 Hitachi High-Technologies Corporation Stage drive device
US8084896B2 (en) * 2008-12-31 2011-12-27 Electro Scientific Industries, Inc. Monolithic stage positioning system and method
EP2221668B1 (de) 2009-02-24 2021-04-14 ASML Netherlands B.V. Lithographischer Apparat und Positionierungsanordnung
WO2010126825A1 (en) 2009-04-26 2010-11-04 Nike International, Ltd. Athletic watch
US9141087B2 (en) 2009-04-26 2015-09-22 Nike, Inc. Athletic watch
US9269102B2 (en) 2009-05-21 2016-02-23 Nike, Inc. Collaborative activities in on-line commerce
US8952342B2 (en) * 2009-12-17 2015-02-10 Mapper Lithography Ip B.V. Support and positioning structure, semiconductor equipment system and method for positioning
CN102722088B (zh) * 2011-06-28 2014-06-18 清华大学 一种无接触式粗精动叠层定位系统及其运动控制方法
JP2014029957A (ja) * 2012-07-31 2014-02-13 Canon Inc ステージ装置、リソグラフィ装置及び物品の製造方法
JP6156716B2 (ja) * 2012-08-21 2017-07-05 シンフォニアテクノロジー株式会社 搬送装置
CN103066894B (zh) * 2012-12-12 2015-05-20 清华大学 一种六自由度磁悬浮工件台
KR101491636B1 (ko) 2013-08-12 2015-02-09 제이모션 주식회사 수평이송장치
JP6452338B2 (ja) * 2013-09-04 2019-01-16 キヤノン株式会社 ステージ装置、およびその駆動方法
CN103701294A (zh) * 2013-12-12 2014-04-02 肖俊东 电机驱动设备
US9996071B2 (en) * 2014-06-24 2018-06-12 Western Digital Technologies, Inc. Moveable slider for use in a device assembly process
US10548566B2 (en) * 2016-12-08 2020-02-04 Metal Industries Research & Development Centre System and method for tracking signal of wire in a blood vessel
CN107101793A (zh) * 2017-06-14 2017-08-29 苏州直为精驱控制技术有限公司 多方向运动平台
KR102653016B1 (ko) * 2018-09-18 2024-03-29 삼성전자주식회사 척 구동 장치 및 기판 처리 장치
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor
CN112563104B (zh) * 2021-02-19 2021-05-14 上海隐冠半导体技术有限公司 一种xy运动装置及电子束检测设备
US20240120235A1 (en) * 2022-10-05 2024-04-11 Kla Corporation Magnetically Opposed, Iron Core Linear Motor Based Motion Stages For Semiconductor Wafer Positioning

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Also Published As

Publication number Publication date
EP1276015A2 (de) 2003-01-15
US20030007140A1 (en) 2003-01-09
US6873404B2 (en) 2005-03-29
EP1276015A3 (de) 2006-01-11
JP2003022960A (ja) 2003-01-24
EP1276015B1 (de) 2008-10-29

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Legal Events

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8364 No opposition during term of opposition