DE60127294D1 - Vorrichtung und verfahren zur erfassung eines verringerten polarisationsgrads eines linear polarisierten lichtstrahls - Google Patents

Vorrichtung und verfahren zur erfassung eines verringerten polarisationsgrads eines linear polarisierten lichtstrahls

Info

Publication number: DE60127294D1
Authority: DE; Germany
Prior art keywords: detecting; light beam; polarized light; linear polarized; reduced polarization
Prior art date: 2000-12-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE60127294T

Other languages

English (en)

Other versions

DE60127294T2 (de

Inventor

Wolfgang Kuerner

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Qimonda Dresden GmbH and Co OHG

Original Assignee

Infineon Technologies SC300 GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-12-07

Filing date

2001-10-12

Publication date

2007-04-26

2001-10-12 Application filed by Infineon Technologies SC300 GmbH and Co KG filed Critical Infineon Technologies SC300 GmbH and Co KG

2007-04-26 Publication of DE60127294D1 publication Critical patent/DE60127294D1/de

2008-01-10 Application granted granted Critical

2008-01-10 Publication of DE60127294T2 publication Critical patent/DE60127294T2/de

2021-10-13 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/23—Bi-refringence
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Analytical Chemistry (AREA)
Life Sciences & Earth Sciences (AREA)
Chemical & Material Sciences (AREA)
Health & Medical Sciences (AREA)
Biochemistry (AREA)
General Health & Medical Sciences (AREA)
Immunology (AREA)
Pathology (AREA)
Investigating Or Analysing Materials By Optical Means (AREA)
Testing Or Measuring Of Semiconductors Or The Like (AREA)
Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

DE60127294T 2000-12-07 2001-10-12 Vorrichtung und verfahren zur erfassung eines verringerten polarisationsgrads eines linear polarisierten lichtstrahls Expired - Lifetime DE60127294T2 (de)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
EP00126888		2000-12-07
EP00126888A EP1213578A1 (de)	2000-12-07	2000-12-07	Verfahren und Vorrichtung zur Ermittlung des Depolarisierungsgrads eines linear polarisierten Lichtstrahls
PCT/EP2001/011841 WO2002046723A1 (en)	2000-12-07	2001-10-12	Apparatus and method for detecting an amount of depolarization of a linearly polarized beam

Publications (2)

Publication Number	Publication Date
DE60127294D1 true DE60127294D1 (de)	2007-04-26
DE60127294T2 DE60127294T2 (de)	2008-01-10

Family

ID=8170605

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE60127294T Expired - Lifetime DE60127294T2 (de)	2000-12-07	2001-10-12	Vorrichtung und verfahren zur erfassung eines verringerten polarisationsgrads eines linear polarisierten lichtstrahls

Country Status (6)

Country	Link
US (1)	US6794635B2 (de)
EP (2)	EP1213578A1 (de)
KR (1)	KR100532009B1 (de)
DE (1)	DE60127294T2 (de)
TW (1)	TW548764B (de)
WO (1)	WO2002046723A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20060012788A1 (en) *	2004-07-19	2006-01-19	Asml Netherlands B.V.	Ellipsometer, measurement device and method, and lithographic apparatus and method
TWI254128B (en) *	2004-12-29	2006-05-01	Optimax Tech Corp	Apparatus and method for measuring phase retardation
JP3909363B2 (ja)	2005-03-28	2007-04-25	オムロン株式会社	分光偏光計測方法
JP6978928B2 (ja) *	2017-12-25	2021-12-08	グローバルウェーハズ・ジャパン株式会社	シリコンウェーハの評価方法
RU2761781C1 (ru) *	2020-12-08	2021-12-13	Федеральное государственное казенное учреждение "12 Центральный научно-исследовательский институт" Министерства обороны Российской Федерации	Способ измерения степени поляризации светового излучения молний и устройство для его осуществления (варианты)
CN113155335B (zh) *	2021-02-07	2023-04-07	中北大学	一种两级式微飞片冲击应力测试装置及测试方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2422506A1 (de) *	1974-05-09	1975-11-20	Deutsche Bundespost	Verfahren zur messung extrem kleiner verluste in glaesern
US4890926A (en) *	1987-12-21	1990-01-02	Miles Inc.	Reflectance photometer
US5365067A (en) *	1993-06-30	1994-11-15	National Research Council Of Canada	Method and device for evaluation of surface properties, especially molecular orientation, in non-transparent layers
JP3381924B2 (ja) *	1995-03-10	2003-03-04	株式会社日立製作所	検査装置
US5835220A (en) *	1995-10-27	1998-11-10	Nkk Corporation	Method and apparatus for detecting surface flaws
US5936736A (en) *	1996-09-30	1999-08-10	Asahi Seimitsu Kabushiki Kaisha	Focusing method and apparatus for a surveying instrument having an AF function, and arrangement of an AF beam splitting optical system therein
US6381356B1 (en) *	1996-10-23	2002-04-30	Nec Corporation	Method and apparatus for inspecting high-precision patterns
MY123792A (en) *	1996-12-04	2006-06-30	Ade Optical Systems	Wafer inspection system for distinguishing pits and particles
US6097488A (en) *	1998-06-22	2000-08-01	Princeton University	Method and apparatus for measuring micro structures, anisotropy and birefringence in polymers using laser scattered light

2000
- 2000-12-07 EP EP00126888A patent/EP1213578A1/de not_active Withdrawn
2001
- 2001-10-12 WO PCT/EP2001/011841 patent/WO2002046723A1/en active IP Right Grant
- 2001-10-12 KR KR10-2003-7007542A patent/KR100532009B1/ko not_active IP Right Cessation
- 2001-10-12 DE DE60127294T patent/DE60127294T2/de not_active Expired - Lifetime
- 2001-10-12 EP EP01978410A patent/EP1340064B8/de not_active Expired - Lifetime
- 2001-10-19 TW TW090125917A patent/TW548764B/zh not_active IP Right Cessation
2003
- 2003-06-09 US US10/457,706 patent/US6794635B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP1340064B1 (de)	2007-03-14
US20040031909A1 (en)	2004-02-19
WO2002046723A1 (en)	2002-06-13
EP1213578A1 (de)	2002-06-12
KR20030053539A (ko)	2003-06-28
US6794635B2 (en)	2004-09-21
KR100532009B1 (ko)	2005-11-29
EP1340064A1 (de)	2003-09-03
DE60127294T2 (de)	2008-01-10
JP3825407B2 (ja)	2006-09-27
JP2004515760A (ja)	2004-05-27
EP1340064B8 (de)	2007-05-09
TW548764B (en)	2003-08-21

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Legal Events

Date	Code	Title	Description
2007-06-21	8327	Change in the person/name/address of the patent owner	Owner name: QIMONDA DRESDEN GMBH & CO. OHG, 01099 DRESDEN, DE
2008-04-03	8364	No opposition during term of opposition