DE2243621A1 - CHROMOPHORUS SUBSTITUTED VINYL HALOMETHYL S-TRIAZINE - Google Patents
CHROMOPHORUS SUBSTITUTED VINYL HALOMETHYL S-TRIAZINEInfo
- Publication number
- DE2243621A1 DE2243621A1 DE2243621A DE2243621A DE2243621A1 DE 2243621 A1 DE2243621 A1 DE 2243621A1 DE 2243621 A DE2243621 A DE 2243621A DE 2243621 A DE2243621 A DE 2243621A DE 2243621 A1 DE2243621 A1 DE 2243621A1
- Authority
- DE
- Germany
- Prior art keywords
- compound
- triazine
- parts
- lower alkyl
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/0091—Methine or polymethine dyes, e.g. cyanine dyes having only one heterocyclic ring at one end of the methine chain, e.g. hemicyamines, hemioxonol
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
- C09B23/06—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups three >CH- groups, e.g. carbocyanines
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/14—Styryl dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/14—Styryl dyes
- C09B23/145—Styryl dyes the ethylene chain carrying an heterocyclic residue, e.g. heterocycle-CH=CH-C6H5
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Description
M 3174M 3174
PATENTANWÄLTE
Dr.-tng.H*::SRU3CHKE
LRPATENT LAWYERS
Dr.-tng.H * :: SRU3CHKE LR
Au-usl-vi ,o.i.-.-OwaQs 6SAu-usl-vi, o.i.-.- OwaQs 6S
Minnesota Mining and Manufacturing Company, Saint Paul, Minnesota 55101, V.St.v.A.Minnesota Mining and Manufacturing Company, Saint Paul, Minnesota 55101, V.St.v.A.
Chroniophor-substituierte Vinyl-halomethyl-js-triazine'Chroniophore-substituted vinyl-halomethyl-js-triazine '
Die Erfindung betrifft Chromophor-substituierte Vinyl-halomethyl-s_-triazin-Verb indungen und strahlungsempfindliche Massen und Elemente, in denen diese Verbindungen verwendet werden.The invention relates to chromophore-substituted vinyl-halomethyl-s_-triazine-Verb indications and radiation-sensitive Masses and elements in which these compounds are used.
Jodoform und Tetrabromkohlenstoff sind zwei Verbindungen, die zur Erzeugung halogenhaltiger freier Radikale bei Belichtung fähig sind, welche aus der Technik bekannt sind. Diese freie Radikale erzeugenden Verbindungen besitzen eine ziemlich begrenzte Spektralempfindlichkeit, nämlich bei Wellenlängen in der Ultraviolettregion, die kleiner sind als normalerweise aus herkömmlichen Quellen nutzbar. Daher besitzen sie nicht die Fähigkeit, die emittierte Strahlungsenergie der hohen Ultraviolett- und sichtbaren Regionen wirksam ausdünnt?.en, wodurch ihre Fähigkeit oder die Ausbeute zur Erzeugung freier Radikale herabgesetzt ist.Iodoform and carbon tetrabromide are two compounds that produce halogen-containing free radicals when exposed to light are capable, which are known from the art. These free radical generating compounds have quite a bit limited spectral sensitivity, namely at wavelengths in the ultraviolet region, which are smaller than can normally be used from conventional sources. So they don't have that Ability to effectively thin out the emitted radiant energy of the high ultraviolet and visible regions? their ability or the yield to generate free radicals is reduced.
Als Folge dieser unwirksamen Nutzung von Strahlung wegen der engen Spektralempfindlichkeit werden Verbindungen mit den freie Radikale erzeugenden Verbindungen kombiniert, die gewissermaßen zur Ausweitung ihrer Spektralansprechbarke it dienen. In Wirklichkeit zeigt die zusätzliche Verbindung eine breiteAs a result of this ineffective use of radiation because of the narrow spectral sensitivity, compounds with the Free radical generating compounds combined, which serve to expand their spectral responsiveness it. In reality, the additional connection shows a wide one
309810/1185309810/1185
spektrale Ansprechbarkeit, und es wird vermutet, daß nach Absorption der Strahlung in teils ungeklärter Weise die absorbierte Energie zu der freie Radikale erzeugenden Verbindung transmittiert wird, welche dann in der Lage ist, ihre Funktion auszuüben, d.h. freie Radikale zu erzeugen. Diese bildformenden Massen sind gegenüber sichtbarem Licht wegen der Anwesenheit von zwei Bestandteilen empfindlich, der halogenierten Quelle für freie Radikale und des Farbstoffs; sie sind nicht voll befriedigend, da sie hinsichtlich der Verträglichkeit miteinander und mit den Bestandteilen der Masse ausgewählt werden müssen. Außerdem ist es oft schwierig, ein inniges Mischen und die richtige Gewichtsausgewogenheit zwischen den beiden Komponenten zu erreichen.spectral responsiveness, and it is assumed that after absorption of the radiation in a partly unexplained manner, the absorbed Energy is transmitted to the free radical generating compound, which is then able to perform its function exercise, i.e. generate free radicals. These image forming compositions are opposed to visible light because of their presence sensitive to two components, the halogenated free radical source and the dye; you are not fully satisfactory, since they were selected with regard to compatibility with one another and with the constituents of the mass Need to become. In addition, it is often difficult to achieve intimate mixing and the right weight balance between the to achieve both components.
Ziel der Erfindung sind Verbindungen, die bei Bestrahlung freie Radikale erzeugen, mit einer breiten Spektralansprechbarkeit, vorzugsweise im Bereich des sichtbaren Lichtes. Ein anderes Ziel sind Verbindungen, die eine lichtinstabile halogenhaltige Gruppierung und eine chromophore Gruppe innerhalb eines Moleküls enthalten, um die Notwendigkeit zu einer Kombination von Verbindungen zu eliminieren. Ziel sind auch Verbindungen, die äußerst wirksame Absorber für Strahlung aus herkömmlichen Lichtquellen, insbesondere Quellen für sichtbares Licht, darstellen und photopolymerisierbare und photovernetzbare Massen und Elemente, die beim Drucken, Duplizieren, Kopieren und anderen bildformenden Systemen verwendbar sind, welche solche Verbindungen enthalten. Noch andere Ziele werden aus der folgenden Beschreibung der Erfindung hervorgehen.The aim of the invention are compounds that generate free radicals on irradiation, with a broad spectral response, preferably in the visible light range. Another target are compounds that contain a light-unstable halogen Grouping and a chromophoric group contained within a molecule, the need for a combination of connections to be eliminated. The aim is also compounds that are extremely effective absorbers for radiation from conventional Light sources, in particular sources of visible light, represent and photopolymerizable and photocrosslinkable Masses and elements usable in printing, duplicating, copying and other image-forming systems, which contain such compounds. Still other objects will appear from the following description of the invention.
Die Ziele der Erfindung werden erreicht mit ^-Triazin-Verbindungen, die durch mindestens eine Halomethy!gruppe, vorzugsweise eine Trihaloraethylgruppe substituiert sind und durch eine chromophore, mit demTriazinring durch äthylenisch ungesättigte Gruppen konjugierte Gruppierung, wobei diese Verbindung zur Erzeugung freier RadikaLe bei Anregung durch aktinische Strahlung einer Wellenlänge von etwa 330 bis etwa 700 " /u fähig ist.The objects of the invention are achieved with ^ -triazine compounds, by at least one halomethyl group, preferably are substituted by a trihaloraethyl group and by a chromophores, with the triazine ring through ethylenically unsaturated Groups conjugated moiety, this compound generating free radicals when excited by actinic radiation capable of a wavelength of about 330 to about 700 "/ u is.
3 0 9 8 10/1 185 original inspected3 0 9 8 10/1 185 originally inspected
Bevorzugte Chromophor-substituierte Vinyl-halomethyl-js-tri azin-Verbindungen können durch die FormelPreferred chromophore substituted vinyl halomethyl-js-tri Azin compounds can be represented by the formula
CCU-C C-(CH=CH) -W Formel I CCU-C C- (CH = CH) -W Formula I.
5 I! - I n N N 5 I! - I n NN
wiedergegeben werden, in welcher Q Brom oder Chlor, P gleich -CQ5 , -NH2 , -NHR , -NR2 oder -OR ist, mit R gleich Phenyl oder niederem Alkyl (niederes Alkyl bedeutet hier eine Alkylgruppe mit nicht mehr als 6 Kohlenstoffatomen); η eine ganze Zahl von 1 bis 3» und W ein wahlweise substituierter aromatischer oder heterocyclischer Kern oderin which Q is bromine or chlorine, P is -CQ 5 , -NH 2 , -NHR, -NR 2 or -OR, with R being phenyl or lower alkyl (lower alkyl here means an alkyl group with no more than 6 Carbon atoms); η is an integer from 1 to 3 »and W is an optionally substituted aromatic or heterocyclic nucleus or
Formel IIFormula II
darstellt, worin Z Sauerstoff oder Schwefel und R Wasserstoff, eine niedere Alkyl- oder Phenylgruppe ist. Natürlich kann, wenn ¥ ein aromatischer oder heterocyclischer Kern ist, der Ring wahlweise substituiert sein. Ohne hier eine erschöpfende Anführung von Substituenten zu versuchen, seien die folgenden als typisch mitgeteilt: Chlor, Brom, Phenyl, niederes Alkyl ( eine Alkylgruppe mit nieht mehr als 6 Kohlenstoffatomen ), Nitro, Phenoxy, Alkoxy, Acetoxy, Acetyl, Amino und Alkylamino.represents wherein Z is oxygen or sulfur and R is hydrogen, a lower alkyl or phenyl group. Naturally when ¥ is an aromatic or heterocyclic nucleus, the ring may optionally be substituted. Without an exhaustive one here To try to list substituents, the following are typical: chlorine, bromine, phenyl, lower alkyl (an alkyl group with no more than 6 carbon atoms ), Nitro, phenoxy, alkoxy, acetoxy, acetyl, amino and alkylamino.
Die oben beschriebenen s^-Triazin-Verbindungen erzeugen freie Radikale, wenn sie mit aktinischer Strahlung einer Wellenlänge von etwa 330 bis etwa 700 m/u bestrahlt werden. Aus diesem Grunde sind die Verbindungen als Photoinitiatoren in lichtempfindlichen Massen und Elementen brauchbar. So können sie in polymerisierbaren, vernetzbaren und Ausdruck-Massen einverleibt sein zur Verwendung bei der Herstellung von Reliefdruckplatlen, Photoätzgründen und photοgraphischenThe s ^ -triazine compounds described above produce free ones Radicals when they are irradiated with actinic radiation of a wavelength of about 330 to about 700 m / u. the end For this reason, the compounds can be used as photoinitiators in light-sensitive compositions and elements. So can be incorporated into polymerizable, crosslinkable and expression compositions for use in the manufacture of Relief printing plates, photo etching grounds and photographic
309810/1185309810/1185
ORIGINAL INSPECTEDORIGINAL INSPECTED
Elementen.Elements.
Die erfindungsgemäßen Verbindungen sind die Kondensationsreaktionsprodukte bestimmter Methyl-halomethyl-£-triazine und bestimmter Aldehyde oder Aldehyd-Derivate.The compounds of the invention are the condensation reaction products certain methyl-halomethyl-ε-triazines and certain aldehydes or aldehyde derivatives.
Die zur Herstellung der erfindungsgemäßen Verbindungen verwendeten Methyl-halomethyl-s_-triazine haben die Struktur:Those used to prepare the compounds of the invention Methyl-halomethyl-s_-triazines have the structure:
CCU-C ^ C-CH,CCU-C ^ C-CH,
Ί ' Formel IIIΊ ' Formula I II
NNNN
worin Q und P die gleiche Bedeutung wie in Formel I haben.wherein Q and P have the same meaning as in formula I.
Geeignete Methyl-halomethyl-s_-triazine sind unter anderen: 2,4-Bis-(trichlormethyl)-6-methyl-£-triazin 2,4-Bis-(tribrommethyl)-6-methyl-£3-triazin 2,4-Bis-(dichloraethyl)-6-methyl-£ä-triazin 2-Trichlormethyl-4-me-thoxy-6-methyl-£-triazin 2-Trichlormethyl-4-phenoxy-6-methyl-is-triazin 2-Trichloraethyl-4-diäthylamino-6-methyl-s_-triazin 2-Tribrommethyl-4-methylamino-6-methyl-£-triaisin 2-Tribrommethy 1-4-amino-6-methyl-iB-trlaz in.Suitable methyl-halomethyl-s-triazines are, among others: 2,4-bis- (trichloromethyl) -6-methyl-ε-triazine 2,4-bis- (tribromomethyl) -6-methyl-ε 3-triazine 2,4 bis (dichloraethyl) -6-methyl-£ ä-triazine 2-trichloromethyl-4-me - thoxy-6-methyl £ -triazine 2-trichloromethyl-4-phenoxy-6-methyl-i-s-triazine 2- Trichloroethyl-4-diethylamino-6-methyl-s_-triazine 2-tribromomethyl-4-methylamino-6-methyl-ε-triaisine 2-tribromomethyl 1-4-amino-6-methyl-iB-trlaz in.
Das bevorzugte Methyl-halomethyl-£-triazin zur Verwendung bei der Herstellung der erfindungsgemäßen Verbindungen 1st 2,4-Bis- (trichlormethyl )-6-methyl-s.-triazin, welches Chromophor-haltige Vinyl-bis-(trichlormethyl)-s-triazine ergibt, die die bevorzugtesten Chromophor-haltigen Vinyl-halomethyl-s,-triazine der Erfindung darstellen.The preferred methyl-halomethyl-ε-triazine for use in the preparation of the compounds according to the invention is 2,4-bis (trichloromethyl) -6-methyl-s.-triazine, which Chromophore-containing vinyl-bis- (trichloromethyl) -s-triazines results in the most preferred chromophore-containing vinyl halomethyl-s, -triazines represent the invention.
Allgemein können die Methyl-halomethyl-£-triazine durch die Cotrimerisation organischer Nitrile und Haloacetonitrile gemäß den Lehren von Wakabayashi et al., Bulletin of the Chemical Society of Japan, 42, 2924-30 (1969), hergestellt werden.In general, the methyl-halomethyl- ε -triazines by the Cotrimerization of organic nitriles and haloacetonitriles according to the teachings of Wakabayashi et al., Bulletin of the Chemical Society of Japan, 42, 2924-30 (1969).
309810/1185 original inspected309810/1185 original inspected
Geeignete aromatische und heterocyclische Aldehyde, welche mit den Methyl-halomethyl-s^triazinen zur Synthese der erfindungsgemäßen Verbindungen reagieren, haben die FormelSuitable aromatic and heterocyclic aldehydes, which with the methyl-halomethyl-s ^ triazines for the synthesis of the invention Compounds react, have the formula
Formel_ IVFormula_ IV
worin η und ¥ die gleiche Bedeutung wie in Formel I haben. Zu geeigneten Aldehyden zählen: Aromatische Aldehyde, z.B. Benzaldehyd, 4-Chlor-benzaldehyd, 3-Nitro-benzaldehyd, Benzaldehyd-4-sulfonsäure, Benzaldehyd-4-dimethylsulfonamid, Benzaldehyd-2-carbonsäure, Benzaldehyd-2-carbonsäuremethylester, Zimtaldehyd, Anisaldehyd, 3>4-Diphenoxy-benzaldehyd, 4[2'-Nitro-phenyl]-benzaldehyd, 4-Phenylazobenzaldehyd; aromatische Polyaldehyde, z.B. Terephthaldehyd; heterocyclische Aldehyde, z.B. 3-Pyrrolaldehyd, 2-Phenyl-4-oxazolcarboxaldehyd, 3-Benzopyrrol-aldehyd, Benzoazol-2-carboxaldehyd, Benzthiazol-2-carboxaldehyd, Benzoxazolyliden-acetaldehyd; und heterocyclische Polymethin-aldehyde, die zur Synthese von Cyanin-Farbstoffen verwendet werden, wie nach Hamer, "Cyanine Dyes and Related Compounds", Interscience Publishers, 1964, vorgeschlagen wurde.where η and ¥ have the same meaning as in formula I. Suitable aldehydes include: aromatic aldehydes, e.g. Benzaldehyde, 4-chloro-benzaldehyde, 3-nitro-benzaldehyde, Benzaldehyde-4-sulfonic acid, benzaldehyde-4-dimethylsulfonamide, Benzaldehyde-2-carboxylic acid, benzaldehyde-2-carboxylic acid methyl ester, Cinnamaldehyde, anisaldehyde, 3> 4-diphenoxy-benzaldehyde, 4 [2'-nitro-phenyl] -benzaldehyde, 4-phenylazobenzaldehyde; aromatic polyaldehydes such as terephthalaldehyde; heterocyclic aldehydes, e.g. 3-pyrrole aldehyde, 2-phenyl-4-oxazolecarboxaldehyde, 3-benzopyrrole aldehyde, benzoazole-2-carboxaldehyde, Benzthiazole-2-carboxaldehyde, benzoxazolylidene acetaldehyde; and heterocyclic polymethine aldehydes used for the synthesis of Cyanine dyes are used as, according to Hamer, "Cyanine Dyes and Related Compounds ", Interscience Publishers, 1964.
Viele der Aldehyde der Formel IV, die zur Verwendung bei der Herstellung der erfindungsgemäßen Verbindungen geeignet sind, stehen im Handel zur Verfügung. Andere geeignete Aldehyde können nach dem für die Herstellung von Imidazol-2-carboxaldehyden von Pyman, J.Chem.Soc., 101, 542 (1912) gelehrten Verfahren und dem Verfahren zur Herstellung heterocyclischer Aldehyde aus den entsprechenden Oximen nach Forman in der US-Patentschrift 3 150 125 hergestellt werden»Many of the aldehydes of Formula IV suitable for use in preparing the compounds of the invention are available commercially. Other suitable aldehydes can be prepared according to the method taught by Pyman, J. Chem. Soc., 101 , 542 (1912) for the preparation of imidazole-2-carboxaldehydes and the method for the preparation of heterocyclic aldehydes from the corresponding oximes according to Forman in US Patent 3 150 125 are produced »
Geeignete Aldehyd-Derivate, die mit den Methyl-halomethyl-s,- -triazinen zur Synthese der erfindungsgemäßen Verbindungen reagieren, haben die FormelSuitable aldehyde derivatives with the methyl-halomethyl-s, - -triazines for the synthesis of the compounds according to the invention react, have the formula
309810/1185309810/1185
ORKaINAL fNSPEGTEDORKaINAL fNSPEGTED
Formel VFormula V
worin R , Z und η die gleiche Bedeutung haben wie in Formel II; D eine Gruppe ist, die mit reaktionsfähigen Methylengruppen reagiert, eingeschlossen solche Gruppen wie Arylamino, z.B. -NH(CgH1-); Acetarylamino, z.B. -N(CgH^)-COCH,; Alkoxy, z.B. -OC^IL· ; und Alkylthio, z.B. -SCH, ; und X ein Anion ist, wie zum Beispiel Chlorid, Bromid, Jodid, Sulfat, Toluolsulfonat, Äthoxyäthylsulfat. Diese Aldehyd-Derivate sind quaternäre Salze mit -NH(C6H5), -N(C6H5)COCH,, -OC2H5 und -SCpHpj-Gruppen, die durch ein oder mehrere Vinylen-Segmen te an eine heterocyclische Verbindung mit einem quaternisierten Stickstoff gebunden sind. Solche Verbindungen finden ausgedehnte Verwendung in der photographischen Industrie als Zwischenprodukte für die Herstellung von Sensibilisierungsfarbstoff en. Beispiele für solche Zwischenprodukte, die zur Herstellung der Vinyl-halomethyl-s^-triazin-Verbindungen der Erfindung verwendbar sind, sind 2-(2'-Acetanilidovinyl)-benzoxazol-äthjodid (i.Orig.ethiodide), 2-(2'-Acetanilidovinyl)- -benzthiazol-äthjodid, 2-(4'-Acetanilidobutadienyl)-benzoxazol-äthjodid, und Zwischenprodukte wiewherein R, Z and η have the same meaning as in formula II; D is a group that will react with reactive methylene groups including such groups as arylamino, e.g., -NH (CgH 1 -); Acetarylamino, e.g., -N (CgH ^) - COCH ,; Alkoxy, for example -OC ^ IL ·; and alkylthio, for example -SCH,; and X is an anion such as chloride, bromide, iodide, sulfate, toluenesulfonate, ethoxyethyl sulfate. These aldehyde derivatives are quaternary salts with -NH (C 6 H 5 ), -N (C 6 H 5 ) COCH ,, -OC 2 H 5 and -SCpHpj groups, which are linked to one or more vinylene segments heterocyclic compound are bonded with a quaternized nitrogen. Such compounds find extensive use in the photographic industry as intermediates for the preparation of sensitizing dyes. Examples of such intermediates which can be used to prepare the vinyl halomethyl-s ^ -triazine compounds of the invention are 2- (2'-acetanilidovinyl) -benzoxazole-ethiodide (i.Orig.ethiodide), 2- (2 ' -Acetanilidovinyl) - -benzthiazole-ethyodide, 2- (4'-acetanilidobutadienyl) -benzoxazole-ethyodide, and intermediates such as
I
C2H NC C
I.
C 2 H
C2H5 ^ N ^
C 2 H 5
Geeignete Aldehyd-Derivate der Formel V sind Verbindungen, die gewöhnlich in der photographischen Industrie zur Synthese optischer PhoLosensibilisatoren verwendet werden. Diese Verbindungen sind in der Technik gut beschrieben, eine Zusammen-Suitable aldehyde derivatives of formula V are compounds commonly used in the photographic industry for synthesis optical phosensitizers can be used. These connections are well described in technology, a compilation
309810/1185 0R1Q1NAL1NSPECTE0 309810/1185 0R1Q1NAL1NSPECTE0
fassung derselben findet sich bei Hämer "Cyanine Dyes and Related Compounds", Seite 116-147» Interscience Publishers, 1964.version of the same can be found in Hämer "Cyanine Dyes and Related Compounds ", pp. 116-147," Interscience Publishers, 1964.
Ein Verfahren, nach welchem Photoinitiator-Verbindungen der Erfindung hergestellt werden, besteht in der Kondensation der Methyl-halomethyl-£3-triazine mit den Aldehyden unter Bedingungen, die typisch für die allgemein bekannte Knoevenagel-Reaktion zur Kondensation von Aldehyden mit reaktionsfähigen Methylen-Verbindungen sind. Die Herstellung von 2,4-Bis(trichlormethyl)-6-styryl-i3-triazin in Piperidiniumacetat als Katalysator enthaltendem Toluol unter Rückfluß ist ein Beispiel für dieses Herstellungsverfahren. Die Reaktion kann in Gegenwart anderer Lösungsmittel durchgeführt werden, darunter Pyridin, Benzol, Äthylacetat, Methanol, Äthanol, tert.-Butanol, Xylol, Essigsäure, Acetanhydrid, Tetrahydrofuran und Lösungsmittelgemische. Da während der Reaktion Wasser gebildet wird, ist es auch vorteilhaft,zu dessen Entfernung zum Beispiel eine Codestillation mit lösungsmittel oder Reaktion mit dem Lösungsmittel vorzusehen. Die Zeit und Temperatur des Erhitzens, die für die Kondensationsreaktion erforderlich ist, hängt von den speziellen Verbindungen, die kondensiert werden, und dem für die Reaktion gewählten Katalysator ab. Allgemein reichen Temperaturen von etwa 25 bis 1500C innerhalb 1 bis etwa 24 Stunden aus, um die Reaktion ablaufen zu lassen. Vorzugsweise wird die Reaktion bei Temperaturen von etwa 50 bis 1300C während etwa 3 bis 12 Stunden durchgeführt. Die Kondensationsreaktion kann auch in Abwesenheit von Lösungsmitteln einfach durch Erhitzen der beiden Reaktionspartner zusammen mit einem Katalysator bei Temperaturen von 100 bis etwa 14O°C durchgeführt werden.One method by which photoinitiator compounds of the invention are prepared is the condensation of the methyl halomethyl-3-triazines with the aldehydes under conditions typical of the well-known Knoevenagel reaction for the condensation of aldehydes with reactive methylene compounds are. The preparation of 2,4-bis (trichloromethyl) -6-styryl-i3-triazine in toluene containing piperidinium acetate as a catalyst under reflux is an example of this preparation process. The reaction can be carried out in the presence of other solvents including pyridine, benzene, ethyl acetate, methanol, ethanol, tert-butanol, xylene, acetic acid, acetic anhydride, tetrahydrofuran, and mixed solvents. Since water is formed during the reaction, it is also advantageous to provide for its removal, for example, by codistillation with solvent or reaction with the solvent. The time and temperature of heating required for the condensation reaction will depend on the particular compounds being condensed and the catalyst chosen for the reaction. In general, temperatures of about 25 to 150 ° C. within 1 to about 24 hours are sufficient to allow the reaction to proceed. The reaction is preferably carried out at temperatures of about 50 to 130 ° C. for about 3 to 12 hours. The condensation reaction can also be carried out in the absence of solvents simply by heating the two reactants together with a catalyst at temperatures from 100 to about 140.degree.
Wegen der reaktiven Natur der Halomethylgruppe gegenüber Nukleophilen sind die bevorzugten Katalysatoren für die Kondensationsreaktion der Methyl-halomethyl-js-triazine mit Aldehyden und Aldehyd-Derivaten Salze, wie zum Beispiel Piperidiniumacetat.Because of the reactive nature of the halomethyl group towards nucleophiles, the preferred catalysts for the Condensation reaction of the methyl-halomethyl-js-triazine with Aldehydes and aldehyde derivatives salts, such as, for example, piperidinium acetate.
309810/1186309810/1186
Bei einem anderen Verfahren zur Synthese der Photoinitiatoren der Erfindung werden Methyl-halomethyl-£>-triazine mit verschiedenen ß-Anilino-, ß-Acetoxy-anilino- und ß-Alkylthio- -Zwischenverbindungen kondensiert, die bei der Herstellung von Cyanin-Farbstoffen verwendbar sind. Bedingungen zur Durchführung dieser Kondensationen sind die gleichen wie jene, die zur Kondensation der Methyl-halomethyl-j[-triazine mit Aldehyden, wie oben beschrieben, angewendet werden.In another method of synthesizing the photoinitiators of the invention, methyl-halomethyl- £> -triazines are used with various ß-anilino, ß-acetoxy-anilino and ß-alkylthio - Intermediate compounds condensed that can be used in the manufacture of cyanine dyes. Conditions for implementation these condensations are the same as those used for the condensation of methyl-halomethyl-j [-triazines with aldehydes, as described above.
Besonders wertvoll sind die Photoinitiatoren der Erfindung mit der in Tabelle 1 wiedergegebenen Struktur.The photoinitiators of the invention with the structure shown in Table 1 are particularly valuable.
0CMelting
0 C
maximumAbsorption
maximum
koeffizientAbsorbance
coefficient
C1,C-C C-CH=CHC \>
3 H ι W
N N
V
I AA ^
C1, CC C-CH = CHC \>
3 H ι W
NN
V
I.
2. Cl-C-C XC-(CH=CH) 9^Λ 147-149 378 3,68 5 Il ! l V/ 2. Cl-CC X C- (CH = CH) 9 ^ Λ 147-149 378 3.68 5 II! l  V /
N NN N
3. C1,C-C C-CH=CH-C V)-Cl 199-201 343 3,03 2 j) V/3. C1, C-C C-CH = CH-C V) -Cl 199-201 343 3.03 2 j) V /
CCl5 CCl 5
309810/1185309810/1185
ORlGlNAtINSPECTEOORlGlNAtINSPECTEO
ti , N N ti , NN
CClCCl
-9-Tabelle 1 (Fortsetzung)-9- Table 1 (continued)
190-192190-192
^-OCH,
—/ 3^ -OCH,
- / 3
Cl-C-C
3Cl-CC
3
:-C ^C-CH=CH-Vy-OCH-: -C ^ C-CH = CH-Vy-OCH-
I) I ^=^I) I ^ = ^
N N ■ OCH,N N ■ OCH,
186-187186-187
22438212243821
377377
394394
6. Cl-C-C NC-CH=CH-^ VOCH,6. Cl-CC N C-CH = CH- ^ VOCH,
CCl.CCl.
OCH.OCH.
157-158157-158
401401
7. Cl-C-C N 7. Cl-CC N
Ii J N NIi Y N N
> 23Od,> 23Od,
468468
CCl.CCl.
I) ίI) ί
N NN N
CCl,CCl,
CH.CH.
CH.CH.
Cl^C-C NC-(CH=CH)„-Cl ^ CC N C- (CH = CH) "-
f/ i ^f / i ^
ecuecu
220e 220 e
i80-182i80-182
491491
495 . 0,71495 0.71
309 810/1 1 8 B309 810/1 1 8 B.
2 2 A 3 ο 2 12 2 A 3 ο 2 1
-10-Tabelle 1 (Fortsetzung)-10- Table 1 (continued)
10. Cl3C-C \-CH=CH-^)-O-C5H11 128-129 380 3,54 N N10. Cl 3 CC \ -CH = CH - ^) - OC 5 H 11 128-129 380 3.54 NN
I
CCl3 I.
CCl 3
11. C1-.C11. C1-.C
3 Il I 3 Il I
-C ^C-CH=CH-CH=C If J 155-157 488 4,00-C ^ C-CH = CH-CH = C If J 155-157 488 4.00
NN VNN V
V C2H5 VC 2 H 5
I
CCl- I.
CCl-
12. Cl-.C-e' ^C-CH=CH-C 175d* 4^7 2'12 12. Cl-.Ce '^ C-CH = CH-C 175d * 4 ^ 7 2 ' 12
13. H0N-C ^C-CH=CH-^~VoCH, 248-249 340 3,3213. H 0 NC ^ C-CH = CH- ^ ~ VoCH, 248-249 340 3.32
2 ,ι , Vss/ 32, ι, Vss / 3
Nv χΝN v χ Ν
sc'^ s c '^
f
CCl3 f
CCl 3
a. bestimmt auf dem Kofler-Heizblocka. determined on the Kofler heating block
Die Photoinitiatoren der Erfindung sind insbesondere in lichtempfindlLehen Massen anwendbar, die in verschiedenen blLdformenden Systemen aur Anwendung kommen,wo eLne erhöhte LichtenipfLndLlchkeLt erwünscht ist. So sind die die erfindungsgemä(3en PhotoLnLtiatoren enthaltenden photopoLymerLsierbaren Hansen von Bedeutung für die Hers te L Lung von Kloinenten, die auf dem Gebiet des !Hirokupiereni; eingesetzt werden, undThe photoinitiators of the invention can be used in particular in light-sensitive compositions which are used in various image-forming systems where increased light edges are desired. For example, the photopolymerizable Hansen containing the photopolymerizable agents according to the invention are of importance for the production of clusters which are used in the field of hirokupiereni, and
3 0 9 8 1 0 / 1 1 0 H bad original3 0 9 8 1 0/1 1 0 H bad original
22435212243521
besonders für die Herstellung von brauchbaren Elementen für das Reflexkopieren. Sie sind ebenfalls bedeutsam für Elemente, die bei der Herstellung lithographischer Photopolymerisatplatten verwendbar sind. Die Photoinitiatoren können auch in lichtempfindlichen Nichtsilber-Massen zugegen sein, die in Photoreproduktionssystemen verwendbar sind, die auf der Freisetzung von Säure basieren, wie in den in den US-Patentschriften 3 512 975 und 3 525 616 vorgeschlagenen Systemen, und in Systemen , bei welchen Farbausdrucke oder Bleichbilder gebildet werden.especially for the production of useful elements for reflex copying. They are also important for elements which can be used in the production of lithographic photopolymer plates. The photoinitiators can also be used in light-sensitive non-silver masses should be present, which in Photo-reproduction systems based on acid release are useful, as in those disclosed in US patents 3,512,975 and 3,525,616 proposed systems, and in systems in which color printouts or bleaching images are formed will.
Die photopolymerisierbaren Massen, in welchen die erfindungs— gemäßen Photoinitiatoren vorteilhaft verwendet werden können, setzen sich gewöhnlich aus einer äthylenisch ungesättigten, durch freie Radikale initiierten, kettenwachsenden additionspolymer isierbaren Verbindung! einem Photoinitiator und wahlweise einem oder mehreren Füllstoffen, Bindern, Farbstoffen, Polymerisationsinhibitoren, Farbvorläufern, Sauerstoffängern usw. zusammen. Die s-Triazin-Verbindungen dieser Erfindung sind in einer ausreichenden Menge zugegen, um die Polymerisation besagter polymerisierbarer Verbindung zu bewirken. Zu geeigneten Bestandteilsverhältnissen zählen folgende: je 100 Teile polymerisierbare Verbindung können 0,0005 bis 10 Teile Photoinitiator, 0 bis 200 Teile Füllstoff, 0 bis 200 Teile Binder und 0 bis 10 oder mehr Teile Farbstoffe, Polymerisationsinhibitoren, Farbvorläufer t Sauerstoffanger usw., wie sie für eine spezielle Verwendung der photopolymerisierbaren Masse benötigt werden, zugegen sein. Vorzugsweise werden je 100 Teile polymerisierbare Verbindungen 1 bis 7>5 Teile Photoinitiator und 25 bis 150 Teile Binder verwendet.The photopolymerizable compositions in which the photoinitiators according to the invention can advantageously be used are usually composed of an ethylenically unsaturated, chain-growing addition polymerizable compound initiated by free radicals! a photoinitiator and optionally one or more fillers, binders, dyes, polymerization inhibitors, color precursors, oxygen scavengers, etc. together. The s-triazine compounds of this invention are present in an amount sufficient to cause said polymerizable compound to polymerize. Suitable component ratios are as follows: per 100 parts of polymerizable compound can be 0.0005 to 10 parts of photoinitiator, from 0 to 200 parts of filler, from 0 to 200 parts binder and 0 to 10 or more parts of dyes, polymerization inhibitors, color precursors t oxygen Anger, etc., as are required for a specific use of the photopolymerizable composition, be present. Preferably, 1 to 7> 5 parts of photoinitiator and 25 to 150 parts of binder are used per 100 parts of polymerizable compounds.
Geeignete äthylenisch ungesättigte, durch freie Radikale initiierte, kettenwachsende additionspolymerisierbare Verbindungen sind Alkylen- oder Polyalkylenglykol-diacrylate, z.B. Äthylenglykol-diacrylat, Diäthylenglykol-diacrylat, Glycerin-diacrylat, Glycerin - triacrylat, Äthylenglykol-diraethacrylat, 1,3-Propan-Suitable ethylenically unsaturated, free radical initiated, chain-growing addition-polymerizable compounds are alkylene or polyalkylene glycol diacrylates, e.g. ethylene glycol diacrylate, Diethylene glycol diacrylate, glycerine diacrylate, Glycerin - triacrylate, ethylene glycol diraethacrylate, 1,3-propane
t.r i.o'l-t-rimiiUiHorylat, 1, A-Cycl oheyandiol-diacrylat, Pentaery-t.r i.o'l-t-rimiiUiHorylat, 1, A-Cycl oheyandiol-diacrylat, Pentaery-
309810/118b309810 / 118b
thritol-tetramethacrylat, Pentaerythritol-triacrylat, Sorbitol-hexacrylat; Bis [1-(3-acryloxy-2-hydroxy)]-p-propoxyphenyl-dimethylmethan, Bis [1-f(2-acryloxy)]-p-äthoxyphenyl-dimethylmethan, Trishydroxyäthyl-isocyanurat-trimethacrylat, die Bisacrylate und Bismethacrylate von Polyäthylenglykolen eines Molekulargewichts von 200-500 und ähnliche; ungesättigte Amide, z.B. Methyl en-bisacrylamid,. Methylen-blsmethacrylamid, 1,6-Hexamethylen-bisacrylamid, Diäthylen-triamin-trisacrylamid, ß-Methacrylaminoäthyl-methacrylat; Vinylester, wie Divinyl-succinat, Divinyl-adipat, Divinyl-phthalat, wobei die bevorzugten äthylenisch ungesättigten Verbindungen Pentaerythritol-tetraacrylat, Bis [p-(3-acryloxy-2-hydroxypropoxy)phenyl]- -dimethylmethan und Bis [p-(2-acryloxyäthoxy)phenyl]dimethylmethan sind. Gemische dieser Ester können ebenfalls verwendet werden, wie auch Gemische dieser Ester mit Alkylestern der Acrylsäure und Methacrylsäure, eingeschlossen die Ester, wie Methylacrylat, Methylmethacrylat, Äthylacrylat, Isopropylmethacrylat, n-Hexylacrylat, Stearylacrylat, Allylacrylat; Styrol, Diallylphthalat und ähnliche.thritol tetramethacrylate, pentaerythritol triacrylate, sorbitol hexacrylate; Bis [1- (3-acryloxy-2-hydroxy)] - p-propoxyphenyl-dimethylmethane, Bis [1-f (2-acryloxy)] - p-ethoxyphenyl-dimethylmethane, Trishydroxyethyl isocyanurate trimethacrylate, the bisacrylates and bis-methacrylates of polyethylene glycols a molecular weight of 200-500 and the like; unsaturated amides, e.g., methylene bisacrylamide. Methylene-b-methacrylamide, 1,6-hexamethylene-bisacrylamide, diethylene-triamine-trisacrylamide, ß-methacrylaminoethyl methacrylate; Vinyl ester, like Divinyl succinate, divinyl adipate, divinyl phthalate, whereby the preferred ethylenically unsaturated compounds pentaerythritol tetraacrylate, Bis [p- (3-acryloxy-2-hydroxypropoxy) phenyl] - dimethyl methane and bis [p- (2-acryloxyethoxy) phenyl] dimethyl methane are. Mixtures of these esters can also be used, as can mixtures of these esters with alkyl esters of the Acrylic acid and methacrylic acid, including the esters, such as methyl acrylate, methyl methacrylate, ethyl acrylate, isopropyl methacrylate, n-hexyl acrylate, stearyl acrylate, allyl acrylate; Styrene, diallyl phthalate and the like.
Bei der Herstellung der lichtempfindlichen Massen werden die Komponenten in irgendeiner Reihenfolge zusammengemischt und gerührt oder gemahlen, um eine Lösung oder gleichmäßige Dispersion zu bilden. Die lichtempfindlichen Elemente werden durch Aufziehen einer geeigneten lichtempfindlichen Masse auf eine geeignete Grundlage oder einen Träger mit einer Trockendicke von etwa 0,000127 cm bis 0,1905 cm und Trocknen des Überzugs hergestellt.In the preparation of the photosensitive compositions, the components are mixed together and in any order stirred or ground to form a solution or uniform dispersion. The photosensitive elements are by mounting a suitable photosensitive composition on a suitable base or support with a dry thickness of about 0.000127 cm to 0.1905 cm and drying the Cover made.
Zu geeigneten Grundlagen oder Trägern für die lichtempfindlichen Massen zählen Metalle, z.B. Stahl- und Aluminiumplatten, Blattmaterialien und Folien, und aus verschiedenen filmbildenden synthetischen oder Hochpolymeren zusammengesetzte Filme oder Platten, eingeschlossen Additionspolymerisate, z.B.Vinylidenchlorid-, Vinylchlorid-, Vinylacetat-, Styrol-, Isobutylen-Polymerisate und -Copolymerisate; lineare Kondensationspolymerisate, z.B. Polyäthylen-terephthalat, Polyhexamethylen-adipat, Polyhexamethylen-adipamid/-adip,Iat.Suitable bases or supports for the photosensitive compositions include metals, e.g. steel and aluminum plates, Sheet materials and films, and composed of various film-forming synthetic or high polymers Films or plates, including addition polymers, e.g. vinylidene chloride, vinyl chloride, vinyl acetate, styrene, Isobutylene polymers and copolymers; linear condensation polymers, e.g. polyethylene terephthalate, polyhexamethylene adipate, Polyhexamethylene adipamide / adip, Iat.
3098Ί0/1 1853098-0 / 1 185
Ein Element zum Reflexkopieren wird zum Beispiel durch Überziehen eines Polyester-Filmes mit einer lichtempfindlichen Masse unter Dunkelkammerbedingungen angefertigt, welche durch gründliches Mischen von 100 Teilen Trimethylol-propan-trimethacrylat, 166 Teilen Polyvinylbutyral und 6,6 Teilen eines erfindungsgemäßen Photoinitiators, wie 2,4-Bis(trichlormethyl)- -o-p-methoxy-styryl-s.-triazin in 3 300 Teilen eines Lösungsmittels, wie Äthylendichlorid, hergestellt wurde. Der Überzug wird getrocknet, auf der klebrigen Oberfläche mit einem anderen Polyester-Film beschichtet und zu Elementen geeigneter Abmessung geschnitten. Die erhaltenen Elemente werden zum Kopieren von Originalen verwendet, die schwarz und weiß oder verschieden gefärbt sein können, indem man das Element auf das Original legt und durch das Element einer Strahlung aussetzt. Nach dem Belichten wird der aufgeschichtete Polyester-Film entfernt und das belichtete Element entwickelt, um ein Negativ des Originals durch Bestäuben mit einem Tonerpulver, das an den klebrigen nichtbelichteten Bereichen, jedoch nicht an den photopolymerisierten belichteten Bereichen haftet, zu enthüllen.For example, an element for reflex copying is provided by Coating of a polyester film with a photosensitive mass prepared under darkroom conditions, which by thorough mixing of 100 parts of trimethylol propane trimethacrylate, 166 parts of polyvinyl butyral and 6.6 parts of a photoinitiator according to the invention, such as 2,4-bis (trichloromethyl) - -o-p-methoxy-styryl-s.-triazine in 3,300 parts of a solvent, such as ethylene dichloride. The coating is dried on the sticky surface with another Polyester film coated and cut into elements of suitable dimensions. The received items are ready to be copied Used by originals that can be black and white or differently colored by placing the item on the original and exposes it to radiation through the element. After exposure, the coated polyester film is removed and The exposed element is developed to be a negative of the original by dusting it with a toner powder that adheres to the sticky unexposed areas, but not in the photopolymerized areas exposed areas adheres to reveal.
Die Erfindung wird durch die folgenden Beispiele spezieller erläutert.The invention is illustrated more specifically by the following examples.
Herstellung des Photosensibilisators 2,4-Bis(trichlormethyl)- -6-p-methoxystyryl-s-triazin.Production of the photosensitizer 2,4-bis (trichloromethyl) - -6-p-methoxystyryl-s-triazine.
Zu einem Gemisch aus 330 Teilen 2,4-Bis(trichlormethyl)- -6-methyl-s^triazin und 149»6 Teilen p-Anisaldehyd in 1 Liter Toluol werden 45 Teile Piperidiniumacetat als Kondensationskatalysator hinzugegeben. Das Gemisch wird am Rückfluß erhitzt und das freigesetzte Wasser in einem Dean-Stark-Extraktor gesammelt. Nach Auffangen der theoretischen Menge Wasser wird das meiste Toluol durch Destillation entfernt und das erhaltene Gemisch abgekühlt. Der ausgefallene Festkörper wird abfiltriert und mehrere Male mit Petroläther und dreimal mit kaltem Äthanol gewaschen. Es wird eine 77 %ige Ausbeute verzeichnet. Eine Analysenprobe, Schmelzpunkt 190 - 1920C, wird45 parts of piperidinium acetate are added as a condensation catalyst to a mixture of 330 parts of 2,4-bis (trichloromethyl) -6-methyl-s ^ triazine and 149 »6 parts of p-anisaldehyde in 1 liter of toluene. The mixture is heated to reflux and the released water is collected in a Dean-Stark extractor. After collecting the theoretical amount of water, most of the toluene is removed by distillation and the resulting mixture is cooled. The precipitated solid is filtered off and washed several times with petroleum ether and three times with cold ethanol. A 77% yield is recorded. An analysis sample, melting point 190-192 0 C, is
3 0 9 810/11853 0 9 810/1185
durch Umkristallisieren des Produktes aus einem Gemisch aus Äthanol-Äthylacetat erhalten.obtained by recrystallizing the product from a mixture of ethanol-ethyl acetate.
Die Reaktion kann in Abwesenheit von Lösungsmittel durch thermisches Schmelzen des Triazine und des Aldehyds in Gegenwart von Piperidiniumacetat durchgeführt werden. Das geschmolzene Gemisch wird auf 14O0C (Ölbadtemperatur) 60 Minuten erhitzt. Umkristallisieren liefert reines Produkt, Schmp, 190-1920C (Verbindung 4 der Tabelle 1).The reaction can be carried out in the absence of solvent by thermal melting of the triazine and the aldehyde in the presence of piperidinium acetate. The molten mixture is heated to 14O 0 C (oil bath temperature) 60 minutes. Recrystallization yields pure product, mp, 190-192 0 C (compound 4 of Table 1).
Herstellung von 2,4-Bis(trichlormethyl)-6-(1-p-dimethylaminophenyl-1 , 3-butadienyl)-iä-triazin.Preparation of 2,4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl-1 , 3-butadienyl) -iä-triazine.
Ein Gemisch, das 16,6 Teile 2,4-Bis(trichlormethyl)-6-methyl-s-triazin, 9»6 Teile p-Dimethylaminozimtaldehyd und 3,6 Teile Piperidiniumacetat in 65 Teilen Toluol enthielt, wurde am Rückfluß erhitzt (etwa 1 Std.), bis die theoretische Menge Wasser in einer Dean-Stark-Falle aufgefangen war. Beim Abkühlen trennten sich glänzend schwarze Nadeln ab, welche dann durch Filtration gesammelt wurden.Diese Kristalle wurden in heißem Äthanol aufgeschlämmt, und es wurden 14 Teile Produkt (Verbindung 7 der Tabelle 1) in Form blauschwarzer glänzender Nadeln vom Schmelzpunkt 218-2Ä) 0C (Kofier Heizblock) isoliert.A mixture containing 16.6 parts of 2,4-bis (trichloromethyl) -6-methyl-s-triazine, 9 »6 parts of p-dimethylaminocinnamaldehyde and 3.6 parts of piperidinium acetate in 65 parts of toluene was heated to reflux (approx 1 hour) until the theoretical amount of water was caught in a Dean-Stark trap. Upon cooling, shiny black needles separated out, which was then collected by filtration wurden.Diese crystals were slurried in hot ethanol, and 14 parts of product (Compound 7 of Table 1) blue-black in the form of shiny needles melting at 218-2Ä) 0 C (Kofier heating block) insulated.
Herstellung eines Merocyanin-Farbstoffes, 2,4-Bis(trichlormethyl )-6-(N-äthy 1-2 (3H )-benzoxazolyliden)-äthyliden-s-triazin. Preparation of a merocyanine dye, 2,4-bis (trichloromethyl ) -6- (N-ethy 1-2 (3H) -benzoxazolylidene) -ethylidene-s-triazine.
Ein Gemisch aus 9,78 Teilen 2-(N'-Acetoxyanilinovinyliden)-N-äthylbenzoxÄzolium-p-toluolsulfonat, 9,90 Teilen 2,4-Bis (trichlormethyl )-6-methyl-£j-triazin und 50 Teilen Pyridin wurde 0,5 Stunden am Rückfluß erhitzt. 16 Teile Methanol wurden zugegeben, und es wurde weitere 15 Minuten am Rückfluß erhitzt. Die Reaktionsmasse wurde dann in 200 Teile Wasser, die 20 Teile 30 #iges Ammoniumhydroxid enthielten,A mixture of 9.78 parts of 2- (N'-acetoxyanilinovinylidene) -N-ethylbenzox-azolium-p-toluenesulfonate, 9.90 parts of 2,4-bis (trichloromethyl) -6-methyl-£ j-triazine and 50 parts Pyridine was refluxed for 0.5 hour. 16 parts of methanol were added and it was continued for an additional 15 minutes Heated to reflux. The reaction mass was then dissolved in 200 parts of water containing 20 parts of 30% ammonium hydroxide,
309810/1185309810/1185
gegossen und mit Benzol extrahiert. Die Extrakte wurden mit verdünntem HCl gewaschen, über wasserfreiem MgSO- getrocknet und konzentriert, um ein rotes glasiges Material zu geben, %das nach Zugabe von Hexan fest wurde. Es wurden 5»6 Teile Rohprodukte (Verbindung 11 in Tabelle 1) gesammelt, Schmp. 125-13O°C. Säulenchromatographie, unter Verwendung neutraler Tonerde und Benzol als Lösungsmittel ergab annähernd 2,0 Teile des gewünschten Produktes, Schmp, 155-157°C, welches eine kleinere Verunreinigung enthielt, wie sich nach der NMR-Analyse zeigte.poured and extracted with benzene. The extracts were washed with dilute HCl, to give over anhydrous MgSO- dried and concentrated to a red glassy material,% which solidified upon addition of hexane. 5 »6 parts of crude products (compound 11 in Table 1) were collected, melting point 125-130 ° C. Column chromatography using neutral alumina and benzene as the solvent gave approximately 2.0 parts of the desired product, m.p. 155-157 ° C, which contained a minor impurity as indicated by NMR analysis.
Die Herstellung von 2-Trichlormethyl-4-amino-6-p-methoxystyryl-s_-triazin. The preparation of 2-trichloromethyl-4-amino-6-p-methoxystyryl-s_-triazine.
Zu einer 5 Teile 2,4-Bis(trichlormethyl)-6-p-methoxystyryl-iS-triazin in 57 Teilen Dioxan enthaltenden Lösung wurden 9 Teile 30 ?6iges Ammoniumhydroxid gegeben. Nach 5 Minuten bei Raumtemperatur begann sich ein Niederschlag zu bilden. Nach 1 Stunde wurde dieser Festkörper durch Filtration gesammelt, mit 2:1 Dioxan/Methanol gewaschen und getrocknet, um 3,8 Teile Produkt (Verbindung 13 der Tabelle 1) als leicht gelben Feststoff zu ergeben, Schmp. 248-249°CTo a 5 parts of 2,4-bis (trichloromethyl) -6-p-methoxystyryl-iS-triazine 9 parts of 30% ammonium hydroxide were added to a solution containing 57 parts of dioxane. After 5 minutes a precipitate began to form at room temperature. After 1 hour this solid was collected by filtration, Washed with 2: 1 dioxane / methanol and dried to give 3.8 parts of product (compound 13 of Table 1) as easily yellow solid, m.p. 248-249 ° C
Erläuterung der Herstellung von lichtempfindlichen Elementen unter Verwendung der erfindungsgemäßen Chromophor-enthaltenden Vinyl-j^-triazine und die spektrale Ansprechbarkeit einiger der Verbindungen in solchen Elementen.Explanation of the preparation of photosensitive elements using the chromophore-containing elements according to the invention Vinyl-j ^ -triazines and the spectral responsiveness of some of the connections in such elements.
Eine 5»0 Teile Butvar B-72A (Handelsname für ein PoIyvinylbutyral-Harz der Monsanto Chemical Co.), 3,0 Teile Trimethylol-propan-trimethacrylat und 0,2 Teile 2,4-Bis(trichlormethyl )-6-p-methoxystyryl-s-triazin in 100 Teilen Äthylendichlorid enthaltende Lösung wurde zu 0,05 mm mit einem Messer naß auf Polyester-Film aufgezogen.Nachdem das Lösungsmittel verdampft war, wurde der klebrige Überzug mit einem anderen Polyester-Film überschichtet und die Sandwich-Anordnung dannA 5 »0 part Butvar B-72A (trade name for a polyvinyl butyral resin from Monsanto Chemical Co.), 3.0 parts of trimethylol propane trimethacrylate and 0.2 parts of 2,4-bis (trichloromethyl ) -6-p-methoxystyryl-s-triazine in 100 parts of ethylene dichloride containing solution was made 0.05 mm with a knife wet on polyester film. After that the solvent was evaporated, the tacky coating was overlaid with another polyester film and the sandwich was then
309810/118S309810 / 118S
10 Sekunden mit einer Wolfram-jodid-Lampe durch einen photographischen Stufenkeil belichtet. Die Filme wurden abgezogen und der Überzug unter Verwendung eines 3M-Brand-System A-90 (Handelsname) schmelzbaren Tonerpulvers bestäubt, welches an den klebrigen nichtbelichteten Bereichen, jedoch nicht an den photopolymerisierten Regionen haftete. Ein dauerhaftes, nichtschmierendes Positiv wurde entsprechend den 4 offenen Stufen auf dem Keil hergestellt.10 seconds with a tungsten iodide lamp through a photographic Step wedge exposed. The films were peeled off and the coating was peeled off using a 3M Brand System A-90 (Trade name) fusible toner powder dusted on the tacky unexposed areas but not on the photopolymerized regions adhered. A permanent, non-smearing positive was obtained according to the 4 open levels made on the wedge.
Ähnliche Konstruktionen wurden unter Verwendung derselben Mengen (0,2 Teile) der in Tabelle 2 angeführten Photoinitiatoren hergestellt und ihr Wirkungsspektrum einzeln unter Benutzung eines für Laboratoriumszwecke konstruierten Keilspektrographen gemessen. Die angeführten beobachteten Ansprechbarkeiten stimmten innerhalb der Experimentalfehler mit dem Absorptionsspektrum und -maximum dieser Materialien überein.Similar constructions were made using the same Quantities (0.2 parts) of the photoinitiators listed in Table 2 and their spectrum of activity individually measured using a wedge spectrograph designed for laboratory use. The cited observed Responsibilities were correct within the experimental error with the absorption spectrum and maximum of these materials.
AnnäherndeApproximate
Photoinitiator Absorptions spektrale maximum Ansprechbarkeit Photoinitiator absorption spectral maximum response
Verbindung 4 der Tabelle 1 377 m/u 380-440 m/u Verbindung 5 der Tabelle 1 394 m/u 390-450 nyu Verbindung 8 der Tabelle 1 491 m/U 480-560 nyuConnection 4 of Table 1 377 m / u 380-440 m / u Compound 5 of Table 1 394 m / u 390-450 nyu Compound 8 of Table 1 491 m / U 480-560 nyu
Herstellung von Druckplatten zur Veranschaulichung der überlegenen Wirksamkeit der erfindungsgemäßen Chromophor-haltigen Photoinitiatoren in Gegenwart von Sauerstoff gegenüber herkömmlichen freie Radikale erzeugenden Initiatoren.Manufacture of printing plates to illustrate the superior Effectiveness of the chromophore-containing photoinitiators according to the invention in the presence of oxygen compared to conventional ones free radical initiators.
Eine Reihe von Gußüberzügen wurden auf anodisierten Aluminiumplatten (im Handel erhältlich als Western Granite Grain (Handelsname) von Western Litho and Supply Company) unter Verwendung homogener Lösungen in Äthylendichlorid hergestellt:A number of cast coatings were placed on anodized aluminum panels (commercially available as Western Granite Grain (trade name) from Western Litho and Supply Company) using homogeneous solutions in ethylene dichloride manufactured:
309810/118S309810 / 118S
Formvar 15/95S (Handelsname für ein Polyvinylformal-Harz, erhältlich von der MonsantoFormvar 15 / 95S (trade name for a polyvinyl formal resin, available from Monsanto
Chemical Co.) 7,38Chemical Co.) 7.38
VMCH vinyl resin (Handelsname für ein Vinylacetat /Vinylchlorid/Maleinanhydrid-Copolymerisat, erhältlich von "Union Carbide Co.) 2,46VMCH vinyl resin (trade name for a vinyl acetate / vinyl chloride / maleic anhydride copolymer, available from Union Carbide Co.) 2.46
Trimethylol-propan-trimethacrylat 6,00Trimethylol propane trimethacrylate 6.00
Trismethacrylat von Trishydroxyäthyl-isocyanurat 2,00Trismethacrylate of trishydroxyethyl isocyanurate 2.00
Cyan XR-55375B (Handelsname für ein Phthalocyanin-Pigment, erhältlich von American CyanamidJ) 1,22Cyan XR-55375B (trade name for a phthalocyanine pigment available from American CyanamidJ) 1.22
Initiator (siehe Tabelle 3) 0,40Initiator (see Table 3) 0.40
Die Gewichte der Überzüge betrugen etwa 0,216 mg/cm nach Trocknen bei 60,00 0C für 2 Minuten.The weights of the coatings were about 0.216 mg / cm after drying at 60.00 0 C for 2 minutes.
Die Platten wurden alle 70 Sekunden durch einen Stufenkeil in einem Vakuumrahmen unter Verwendung einer reflektorisierten 135 Amp.High Intensity Photo 118 Carbon Are Rod-Quelle (Handelsname, Union Carbide) in einem Abstand von 137»2 cm belichtet. Zur Entwicklung wurden sie mit einer Lösung, die 35 % n-Propylalkohol, 60 % destilliertes Wasser, 1,5 9^ Ammoniumsulfat und 1,5 % Ammoniumdihydrogenphosphat enthielt, bestrichen. Die nichtbelichteten Bereiche wurden unter Verwendung eines 3M Brand (Handelsname) Developing Pad bei einer gleichmäßigen leichten bis mäßigen Scheuerwirkung entfernt. Tabelle 3 gibt die relativen Wirksamkeiten der verschiedenen Photoinitiatoren wieder, die verwendet wurden, und zwar anhand der Anzahl Stufen, die entwickelt wurden. Es ist zu sehen, daß 11 Stufen auf Platten entwickelt wurden, die unter Verwendung der Chromophor-haltigen Photoinitiatoren der Erfindung hergestellt waren, während nicht mehr als 7 Stufen auf Platten entwickelt wurden, bei denen vom Stand der Technik vorgeschlagene Photoinitiatoren verwendet wurden.The panels were exposed every 70 seconds through a step wedge in a vacuum frame using a 135 Amp. High Intensity Photo 118 Carbon Are Rod (trade name, Union Carbide) reflective source at a distance of 137 »2 cm. For development, they were coated with a solution containing 35% n-propyl alcohol, 60 % distilled water, 1.5 % ammonium sulfate and 1.5% ammonium dihydrogen phosphate. The unexposed areas were removed using a 3M Brand (trade name) Developing Pad with an even, light to moderate amount of abrasion. Table 3 shows the relative efficiencies of the various photoinitiators that were used, based on the number of levels that were developed. It can be seen that 11 steps were developed on plates made using the chromophore-containing photoinitiators of the invention, while no more than 7 steps were developed on plates using photoinitiators suggested by the prior art.
309810/1185309810/1185
Tabelle 3 Photoinitiator Table 3 Photoinitiator
1. 0,4 Teile Benzoin-methyläther 0-11. 0.4 parts of benzoin methyl ether 0-1
2. 0,4 Teile Anthrachinon 0-12. 0.4 parts of anthraquinone 0-1
3. 0,4 Teile Phenanthrachinon 0-13. 0.4 parts phenanthraquinone 0-1
4. 0,4 Teile 2-Äthyl-9,10-dimethoxyanthracen 0-1 0,4 Teile Jodoform4. 0.4 part of 2-ethyl-9,10-dimethoxyanthracene 0-1 0.4 parts of iodoform
5. 0,4 Teile Jodoform 0-15. 0.4 parts iodoform 0-1
6. 0,4 Teile Äthyl-9,10-dimethoxyanthracen 7 0,4 Teile 2,4,6-Tris(tribrommethyl)-s_-6. 0.4 part of ethyl-9,10-dimethoxyanthracene 7 0.4 parts of 2,4,6-tris (tribromomethyl) -s_-
-triazin , "~-triazine, "~
7. 0,4 Teile 2-Äthyl-9,10-dimethoxyanthracen 3 0,4 Teile 2,4~Bis(trichlormethyl)-6-7. 0.4 part of 2-ethyl-9,10-dimethoxyanthracene 3 0.4 parts 2.4 bis (trichloromethyl) -6-
methyl-s_-triazinmethyl-s_-triazine
8. 0,4 Teile l-(p-Methoxyphenyl)-3-(p-diphe- 48. 0.4 part of 1- (p-methoxyphenyl) -3- (p-diphe- 4
nylaminophenyl)-2-propen-l-on 0,4 Teile 2,4-Bis(trichlormethyl)-6- -methyl-si-triazinnylaminophenyl) -2-propen-l-one 0.4 parts 2,4-bis (trichloromethyl) -6- -methyl-si-triazine
9. 0,4 Teile Chromophor-haltiger Photo- 11 9. 0.4 parts of chromophore-containing photo 11
initiator (Verbindung 4 der Tabelle 1)initiator (compound 4 of table 1)
10. 0,4 Teile Chromophor-haltiger Photo- .... initiator (Verbindung 5 der Tabelle 1)10. 0.4 parts of chromophore-containing photo initiator (compound 5 of table 1)
Erläuterung der Nutzanwendbarkeit der Chromophor-haltigen Photoinitiatoren in Photoreproduktionssystemen, die auf der Freisetzung von Säure basieren.Explanation of the usefulness of the chromophore-containing Photoinitiators in photo-reproduction systems based on the release of acid.
Eine lichtempfindliche Masse, dieA photosensitive mass that
Butvar B-72A (Handelsname) 2,5 TeileButvar B-72A (trade name) 2.5 parts
p-Dimethylaminophenyl-bis-(2-methyl-p-Dimethylaminophenyl-bis- (2-methyl-
indolyl)-methan 1,0 Teileindolyl) methane 1.0 part
Verbindung 4 der Tabelle 1 0,5 TeileCompound 4 of Table 1 0.5 parts
Methanol/Äthylendichlorid 3,0 TeileMethanol / ethylene dichloride 3.0 parts
enthielt, wurde zu 0,075 mm naß auf Polyester-Film aufgezogen,contained, was drawn down to 0.075 mm wet on polyester film,
309810/1 165309810/1 165
Nach Belichtung bildete sich eine tiefe Fuchsin-Farbe, die für die oxidierte Form des Leu ko farbstoffs kennzeichnend ist.After exposure, a deep fuchsine color was formed, which is characteristic of the oxidized form of the leuco dye is.
In ähnlicher Weise gaben auch die leukobase 2-p-Dimethyl- -styrylchinolin und der Leukofarbstoff Leukokristallviolett Ausdruck-Bilder, die auf der photolytischen Säurebildung und auf Photooxidationsprozessen basierten, wenn sie anstelle des p-Dimethyl-aminophenyl-bis- (2-methylindolyl)-methan eingesetzt wurden.In a similar way, the leukobase gave 2-p-dimethyl- -styrylquinoline and the leuco dye leuco crystal violet Expression images based on photolytic acidification and based on photooxidation processes when used instead of p-dimethyl-aminophenyl-bis- (2-methylindolyl) -methane became.
3UyB1O/11853UyB10 / 1185
Claims (10)
CGL5-C ^C- (CH=CH)-W N
CGL 5 -C ^ C- (CH = CH) -W
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/177,851 US3987037A (en) | 1971-09-03 | 1971-09-03 | Chromophore-substituted vinyl-halomethyl-s-triazines |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2243621A1 true DE2243621A1 (en) | 1973-03-08 |
DE2243621C2 DE2243621C2 (en) | 1987-08-20 |
Family
ID=22650203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2243621A Granted DE2243621A1 (en) | 1971-09-03 | 1972-09-01 | CHROMOPHORUS SUBSTITUTED VINYL HALOMETHYL S-TRIAZINE |
Country Status (12)
Country | Link |
---|---|
US (1) | US3987037A (en) |
JP (2) | JPS591281B2 (en) |
BE (1) | BE788295A (en) |
BR (1) | BR7206066D0 (en) |
CA (1) | CA986512A (en) |
CH (1) | CH576967A5 (en) |
DE (1) | DE2243621A1 (en) |
FR (1) | FR2152039A5 (en) |
GB (1) | GB1388492A (en) |
IT (1) | IT965195B (en) |
NL (1) | NL172155C (en) |
SU (1) | SU618064A3 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2641100A1 (en) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | LIGHT SENSITIVE COPY LAYER |
EP0137452A1 (en) * | 1983-10-12 | 1985-04-17 | Hoechst Aktiengesellschaft | Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds |
EP0398018A1 (en) * | 1989-04-18 | 1990-11-22 | Hoechst Aktiengesellschaft | Process for the preparation of light-sensitive bis-trichloro-methyl-s-triazines |
US5015554A (en) * | 1987-08-04 | 1991-05-14 | Hoechst Aktiengesellschaft | Positive radiation-sensitive mixture |
US5403697A (en) * | 1987-09-13 | 1995-04-04 | Hoechst Aktiengesellschaft | Positive radiation-sensitive mixture and recording material produced therefrom |
EP0717317A2 (en) | 1994-12-15 | 1996-06-19 | Hoechst Aktiengesellschaft | Radiation-sensitive composition |
EP0775706A2 (en) | 1995-11-24 | 1997-05-28 | Ciba SC Holding AG | Borates photoinitiators from polyboranes |
EP1627736A1 (en) | 2004-08-18 | 2006-02-22 | Konica Minolta Medical & Graphic, Inc. | Method of manufacturing light sensitive planographic printing plates and method of using the same |
WO2018164076A1 (en) | 2017-03-06 | 2018-09-13 | Ricoh Company, Ltd. | Film electrode, resin layer forming ink, inorganic layer forming ink, and electrode printing apparatus |
Families Citing this family (310)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5363506A (en) * | 1976-11-19 | 1978-06-07 | Toyo Electric Mfg Co Ltd | Method of manufacturing vvshaped insulation of commutator |
US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
US4212970A (en) * | 1977-11-28 | 1980-07-15 | Fuji Photo Film Co., Ltd. | 2-Halomethyl-5-vinyl-1,3,4-oxadiazole compounds |
JPS5474728A (en) * | 1977-11-28 | 1979-06-15 | Fuji Photo Film Co Ltd | Photosensitive composition |
CA1116915A (en) * | 1977-12-28 | 1982-01-26 | Anthony Adin | Inhibition of image formation utilizing cobalt(iii) complexes |
JPS5495687A (en) * | 1978-01-11 | 1979-07-28 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS6053300B2 (en) * | 1978-08-29 | 1985-11-25 | 富士写真フイルム株式会社 | Photosensitive resin composition |
JPS5555335A (en) * | 1978-10-19 | 1980-04-23 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS5577742A (en) * | 1978-12-08 | 1980-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS55126235A (en) * | 1979-03-22 | 1980-09-29 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
US4391687A (en) * | 1980-02-14 | 1983-07-05 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-1-triazine |
US4330590A (en) * | 1980-02-14 | 1982-05-18 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine |
US4337303A (en) * | 1980-08-11 | 1982-06-29 | Minnesota Mining And Manufacturing Company | Transfer, encapsulating, and fixing of toner images |
US4500608A (en) * | 1980-11-03 | 1985-02-19 | Minnesota Mining And Manufacturing Company | Anaerobically-curing compositions |
US4413108A (en) * | 1980-11-03 | 1983-11-01 | Minnesota Mining & Manufacturing Company | Anaerobically-curing compositions |
US4447588A (en) * | 1980-11-03 | 1984-05-08 | Minnesota Mining & Manufacturing Company | Anaerobically-curing compositions |
JPS57200683A (en) * | 1981-06-05 | 1982-12-08 | Hitachi Ltd | Self-priming pump assembly |
US4404345A (en) * | 1981-09-16 | 1983-09-13 | Minnesota Mining And Manufacturing Company | Novel adhesive compositions |
JPS58190946A (en) * | 1982-04-30 | 1983-11-08 | Sharp Corp | Photoresist |
US4459350A (en) * | 1982-09-29 | 1984-07-10 | Eastman Kodak Company | Photothermographic material and processing comprising a substituted triazine |
JPS5989303A (en) * | 1982-11-12 | 1984-05-23 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
DE3327811A1 (en) * | 1983-08-02 | 1985-02-21 | Kali-Chemie Pharma Gmbh, 3000 Hannover | NEW VALEPOTRIATHYDRINE-CONTAINING MEDICINAL PRODUCTS |
JPS59148784A (en) * | 1983-02-10 | 1984-08-25 | Konishiroku Photo Ind Co Ltd | Free radical generator |
GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
DE3333450A1 (en) * | 1983-09-16 | 1985-04-11 | Hoechst Ag, 6230 Frankfurt | CARBONYL METHYLENE HETEROCYCLES CONTAINING TRIHALOGEN METHYL GROUPS, METHOD FOR THE PRODUCTION THEREOF AND LIGHT-SENSITIVE MIXTURE THAT CONTAINS THESE COMPOUNDS |
JPS60103343A (en) * | 1983-11-10 | 1985-06-07 | Shikoku Chem Corp | Photosetting resin composition |
US4476215A (en) * | 1983-11-25 | 1984-10-09 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist composition |
US4559401A (en) * | 1984-06-04 | 1985-12-17 | Polychrome Corporation | Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines |
US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
US4946373A (en) * | 1985-02-28 | 1990-08-07 | Hoechst Celanese Corporation | Radiation-polymerizable composition |
US4737426A (en) * | 1985-05-15 | 1988-04-12 | Ciba-Geigy Corporation | Cyclic acetals or ketals of beta-keto esters or amides |
JPH0766186B2 (en) * | 1985-07-02 | 1995-07-19 | 富士写真フイルム株式会社 | Photosensitive composition |
US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
DE3606155A1 (en) * | 1986-02-26 | 1987-08-27 | Basf Ag | PHOTOPOLYMERIZABLE MIXTURE, THIS CONTAINING LIGHT-SENSITIVE RECORDING ELEMENT, AND METHOD FOR PRODUCING A FLAT PRINT MOLD BY THIS LIGHT-SENSITIVE RECORDING ELEMENT |
EP0243159A3 (en) * | 1986-04-22 | 1988-11-30 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
DE3613632A1 (en) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | PHOTOPOLYMERIZABLE MIXTURE AND CONTAINING PHOTOPOLYMERIZABLE RECORDING MATERIAL |
JPH0642074B2 (en) * | 1986-09-10 | 1994-06-01 | 富士写真フイルム株式会社 | Photosensitive composition |
DE3716848A1 (en) * | 1987-05-20 | 1988-12-01 | Hoechst Ag | METHOD FOR IMAGING LIGHT-SENSITIVE MATERIALS |
DE3717933A1 (en) * | 1987-05-27 | 1988-12-08 | Hoechst Ag | PHOTOPOLYMERIZABLE MIXTURE, THESE RECORDING MATERIAL, AND METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES |
JPH07120036B2 (en) * | 1987-07-06 | 1995-12-20 | 富士写真フイルム株式会社 | Photopolymerizable composition |
DE3725949A1 (en) * | 1987-08-05 | 1989-02-16 | Hoechst Ag | LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF AND METHOD FOR PRODUCING NEGATIVE RELIEF COPIES |
JPS6442645A (en) * | 1987-08-11 | 1989-02-14 | Tomoegawa Paper Co Ltd | Optical coloring composition |
DE3807381A1 (en) * | 1988-03-07 | 1989-09-21 | Hoechst Ag | HETEROCYCLIC COMPOUNDS CONTAINING 4,6-BIS-TRICHLOROMETHYL-S-TRIAZIN-2-YL-GROUPS, PROCESS FOR THE PREPARATION THEREOF AND LIGHT-SENSITIVE MIXTURE CONTAINING THIS COMPOUND |
US5262276A (en) * | 1988-05-11 | 1993-11-16 | Fuji Photo Film Co., Ltd. | Light-sensitive compositions |
JPH0820734B2 (en) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | Photosensitive composition and photopolymerizable composition using the same |
US4985562A (en) * | 1988-09-07 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing an amine-containing moiety |
US5187045A (en) * | 1988-09-07 | 1993-02-16 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a sensitizer moiety |
US5387682A (en) * | 1988-09-07 | 1995-02-07 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a monomeric moiety |
US5034526A (en) * | 1988-09-07 | 1991-07-23 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a sensitizer moiety |
US5116977A (en) * | 1988-09-07 | 1992-05-26 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing an amine-containing moiety |
US5153323A (en) * | 1988-09-07 | 1992-10-06 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing a photoinitiator moiety |
DE69027717T2 (en) * | 1989-08-11 | 1996-11-28 | Fuji Photo Film Co Ltd | Light and heat sensitive recording material |
DE3930086A1 (en) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
DE3930087A1 (en) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
DE4006190A1 (en) * | 1990-02-28 | 1991-08-29 | Hoechst Ag | NEGATIVE WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
US5091287A (en) * | 1990-04-10 | 1992-02-25 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
TW207009B (en) * | 1991-01-31 | 1993-06-01 | Sumitomo Chemical Co | |
US5362874A (en) * | 1991-03-15 | 1994-11-08 | Fuji Photo Film Co., Ltd. | Light-sensitive bistrihalomethyl-s-triazine compounds |
DE4120174A1 (en) * | 1991-06-19 | 1992-12-24 | Hoechst Ag | RADIATION-SENSITIVE SULPHONIC ACID ESTERS AND THEIR USE |
US5298361A (en) * | 1991-08-30 | 1994-03-29 | Minnesota Mining And Manufacturing Company | Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator |
JP3070184B2 (en) * | 1991-10-18 | 2000-07-24 | 三菱化学株式会社 | Photopolymerizable composition and photosensitive material |
CA2085868A1 (en) * | 1991-12-25 | 1993-06-26 | Mitsubishi Chemical Corporation | Photosensitive composition |
DE4204949A1 (en) * | 1992-02-19 | 1993-09-09 | Hoechst Ag | METHOD FOR PRODUCING A MULTICOLORED IMAGE AND LIGHT-SENSITIVE MATERIAL FOR CARRYING OUT THIS PROCESS |
US5219709A (en) * | 1992-02-26 | 1993-06-15 | Mitsubishi Kasei Corporation | Photopolymerizable composition |
JP2566098B2 (en) * | 1992-05-01 | 1996-12-25 | 東京応化工業株式会社 | Negative radiation-sensitive resist composition |
AU674518B2 (en) * | 1992-07-20 | 1997-01-02 | Presstek, Inc. | Lithographic printing plates for use with laser-discharge imaging apparatus |
US5374501A (en) * | 1992-08-17 | 1994-12-20 | Minnesota Mining And Manufacturing Company | Alkali soluble photopolymer in color proofing constructions |
GB2273101B (en) * | 1992-11-10 | 1997-03-05 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition |
US6010824A (en) * | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
JPH06308729A (en) * | 1993-04-19 | 1994-11-04 | Japan Synthetic Rubber Co Ltd | Radiation sensitive resin composition |
DE69400595T2 (en) * | 1993-04-20 | 1997-04-30 | Japan Synthetic Rubber Co., Ltd., Tokio/Tokyo | Radiation sensitive resin composition |
US5529885A (en) * | 1993-06-04 | 1996-06-25 | Mitsubishi Chemical Corporation | Negative photosensitive composition and method for forming patterns using the composition |
US5489499A (en) * | 1993-10-26 | 1996-02-06 | Fuji Photo Film Co., Ltd. | Photosensitive trihalomethyl-s-triazine compound and photopolymerizable composition |
JPH07311462A (en) | 1994-05-16 | 1995-11-28 | Fuji Photo Film Co Ltd | Photopolymerizable composition and image forming method |
US5631307A (en) | 1994-06-28 | 1997-05-20 | Toyo Ink Manufacturing Co., Ltd. | Photopolymerization initiator composition and photopolymerizable composition |
DE69506970T2 (en) * | 1994-09-06 | 1999-06-10 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Bis (halogenomethyloxadiazole) photosensitive compound and photosensitive transfer sheet using this compound |
US5460918A (en) * | 1994-10-11 | 1995-10-24 | Minnesota Mining And Manufacturing Company | Thermal transfer donor and receptor with silicated surface for lithographic printing applications |
US5882843A (en) * | 1994-11-15 | 1999-03-16 | Hoechst Japan Limited | Photosensitive resin composition for color filter production |
WO1996020432A1 (en) * | 1994-12-28 | 1996-07-04 | Hoechst Japan Limited | Radiation-sensitive composition and recording medium produced therefrom |
US5885746A (en) * | 1994-12-29 | 1999-03-23 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate |
JP3442176B2 (en) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | Photopolymerizable composition |
US5660968A (en) * | 1995-05-05 | 1997-08-26 | Bayer Corporation | Negative working, peel developeable, single sheet color proofing system with improved background color |
JPH0954437A (en) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | Chemical amplification type positive resist composition |
EP0771796B1 (en) | 1995-11-02 | 2002-06-19 | Agfa-Gevaert | Substituted S-triazines and process for their preparation |
US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
US5821032A (en) * | 1996-12-19 | 1998-10-13 | Kodak Polychrome Graphics, Llc | Photosensitive polymer composition and negative working photosensitive element containing three photocrosslinkable polymers |
US5879858A (en) * | 1996-12-19 | 1999-03-09 | Kodak Polychrome Graphics, Llc | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element |
US5962189A (en) * | 1996-12-19 | 1999-10-05 | Kodak Polychrome Graphics Llc | Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element |
US5837586A (en) * | 1997-02-14 | 1998-11-17 | Kodak Polychrome Graphics Company, Ltd. | 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition |
US5847133A (en) * | 1997-05-23 | 1998-12-08 | Minnesota Mining And Manufacturing Company | Ionic halomethyl-1,3,5-triazine photoinitiators |
US6010821A (en) | 1997-05-23 | 2000-01-04 | Minnesota Mining And Manufacturing Company | Aqueous developable color proofing elements |
US5925498A (en) * | 1997-06-16 | 1999-07-20 | Kodak Polychrome Graphics Llc | Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates |
JPH1124252A (en) * | 1997-06-26 | 1999-01-29 | Agfa Gevaert Nv | Method for forming positive or negative color proof by using same material |
JP4130030B2 (en) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound |
US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001268465A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
DE60114820T2 (en) * | 2000-06-15 | 2006-09-14 | 3M Innovative Properties Co., St. Paul | MICRO MANUFACTURING PROCESS FOR ORGANIC OPTICAL COMPONENTS |
JP2004503928A (en) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | Multi-directional photoreaction absorption method |
KR100795759B1 (en) * | 2000-06-15 | 2008-01-21 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | Process for producing microfluidic articles |
WO2001096961A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multipass multiphoton absorption method and apparatus |
US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
US7118845B2 (en) * | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001270320A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
JP2005502074A (en) | 2001-09-04 | 2005-01-20 | コダック ポリクロウム グラフィクス リミティド ライアビリティ カンパニー | Hybrid calibration method |
US6750266B2 (en) * | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US6808657B2 (en) * | 2002-02-12 | 2004-10-26 | 3M Innovative Properties Company | Process for preparing a K-type polarizer |
US7521168B2 (en) | 2002-02-13 | 2009-04-21 | Fujifilm Corporation | Resist composition for electron beam, EUV or X-ray |
US7087194B2 (en) * | 2002-04-04 | 2006-08-08 | 3M Innovative Properties Company | K-type polarizer and preparation thereof |
US6949207B2 (en) * | 2002-04-04 | 2005-09-27 | 3M Innovative Properties Company | K-type polarizer and preparation thereof |
JP4382364B2 (en) | 2002-04-24 | 2009-12-09 | 株式会社東芝 | Liquid ink |
KR100955454B1 (en) | 2002-05-31 | 2010-04-29 | 후지필름 가부시키가이샤 | Positive-working resist composition |
US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
US7771915B2 (en) | 2003-06-27 | 2010-08-10 | Fujifilm Corporation | Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method |
JP4291638B2 (en) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | Alkali-soluble polymer and planographic printing plate precursor using the same |
EP1528087B1 (en) * | 2003-10-28 | 2007-11-21 | Toshiba Tec Kabushiki Kaisha | Ink for ink jet recording |
US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
JP2005309359A (en) | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | Hologram recording material, hologram recording method, optical recording medium, three-dimensional display hologram, and holographic optical element |
JP2005300908A (en) | 2004-04-12 | 2005-10-27 | Konica Minolta Medical & Graphic Inc | Photosensitive composition and photosensitive lithographic printing plate material |
US7553670B2 (en) * | 2004-04-28 | 2009-06-30 | 3M Innovative Properties Company | Method for monitoring a polymerization in a three-dimensional sample |
EP2246741A1 (en) | 2004-05-19 | 2010-11-03 | Fujifilm Corporation | Image recording method |
US20050263021A1 (en) | 2004-05-31 | 2005-12-01 | Fuji Photo Film Co., Ltd. | Platemaking method for lithographic printing plate precursor and planographic printing method |
JP4452572B2 (en) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | Photosensitive composition and image recording method using the same |
JP2006021396A (en) | 2004-07-07 | 2006-01-26 | Fuji Photo Film Co Ltd | Original lithographic printing plate and lithographic printing method |
EP1619023B1 (en) | 2004-07-20 | 2008-06-11 | FUJIFILM Corporation | Image forming material |
US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
EP1621339B1 (en) | 2004-07-29 | 2008-09-10 | FUJIFILM Corporation | Plate-making method of lithographic printing plate |
US20060032390A1 (en) | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
WO2006013697A1 (en) | 2004-08-02 | 2006-02-09 | Fujifilm Corporation | Colored curable compositions, color filters and process for production thereof |
US7745090B2 (en) | 2004-08-24 | 2010-06-29 | Fujifilm Corporation | Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method |
JP2006062188A (en) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | Color image forming material and original plate of lithographic printing plate |
JP2006068963A (en) | 2004-08-31 | 2006-03-16 | Fuji Photo Film Co Ltd | Polymerizable composition, hydrophilic film using this composition and original lithographic printing plate |
JP5089866B2 (en) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | Planographic printing method |
JP4715752B2 (en) | 2004-12-09 | 2011-07-06 | コニカミノルタエムジー株式会社 | Ink set, ink jet recording method and ink jet recording apparatus using photocurable ink |
US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
US7199192B2 (en) | 2004-12-21 | 2007-04-03 | Callaway Golf Company | Golf ball |
JP2006181838A (en) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | Original plate of lithographic printing plate |
EP1685957B1 (en) | 2005-01-26 | 2013-12-11 | FUJIFILM Corporation | Packaged body of lithographic printing plate precursors |
JP4439409B2 (en) | 2005-02-02 | 2010-03-24 | 富士フイルム株式会社 | Resist composition and pattern forming method using the same |
US7858291B2 (en) | 2005-02-28 | 2010-12-28 | Fujifilm Corporation | Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method |
US20060204732A1 (en) | 2005-03-08 | 2006-09-14 | Fuji Photo Film Co., Ltd. | Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4474317B2 (en) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
CA2610027A1 (en) * | 2005-05-26 | 2006-11-30 | Ensemble Discovery Corporation | Biodetection by nucleic acid-templated chemistry |
JP2006335826A (en) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | Ink composition for inkjet recording and method for manufacturing planographic printing plate using the same |
JP4815270B2 (en) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | Method and apparatus for producing a lithographic printing plate |
JP4759343B2 (en) | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | Planographic printing plate precursor and planographic printing method |
ATE410460T1 (en) | 2005-08-23 | 2008-10-15 | Fujifilm Corp | CURABLE INK CONTAINING MODIFIED OXETANE |
JP4757574B2 (en) | 2005-09-07 | 2011-08-24 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, planographic printing plate manufacturing method, and planographic printing plate |
ATE494341T1 (en) | 2005-11-04 | 2011-01-15 | Fujifilm Corp | CURABLE INK COMPOSITION AND OXETANE COMPOUND |
KR100763744B1 (en) * | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | Triazine based photoactive compound comprising oxime ester |
DE602007012161D1 (en) | 2006-03-03 | 2011-03-10 | Fujifilm Corp | Curable composition, ink composition, ink jet recording method and planographic printing plate |
JP2007241144A (en) | 2006-03-10 | 2007-09-20 | Fujifilm Corp | Photosensitive composition, optical recording medium and method for manufacturing the same, optical recording method, and optical recording device |
JP5171005B2 (en) | 2006-03-17 | 2013-03-27 | 富士フイルム株式会社 | Polymer compound, method for producing the same, and pigment dispersant |
JP4698470B2 (en) | 2006-03-31 | 2011-06-08 | 富士フイルム株式会社 | Optical recording medium processing method and processing apparatus, and optical recording / reproducing apparatus |
JP5276264B2 (en) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate |
WO2008054600A2 (en) * | 2006-09-28 | 2008-05-08 | Ensemble Discovery Corporation | Compositions and methods for biodetection by nucleic acid-templated chemistry |
JP4777226B2 (en) | 2006-12-07 | 2011-09-21 | 富士フイルム株式会社 | Image recording materials and novel compounds |
US8771924B2 (en) | 2006-12-26 | 2014-07-08 | Fujifilm Corporation | Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
JP2008163081A (en) | 2006-12-27 | 2008-07-17 | Fujifilm Corp | Laser-decomposable resin composition and pattern-forming material and laser-engravable flexographic printing plate precursor using the same |
EP1952998B1 (en) | 2007-02-01 | 2011-04-06 | FUJIFILM Corporation | Ink-jet recording device |
JP2008189776A (en) | 2007-02-02 | 2008-08-21 | Fujifilm Corp | Active radiation-curable polymerizable composition, ink composition, inkjet recording method, printed matter, preparation method of lithographic printing plate, and lithographic printing plate |
EP1955858B1 (en) | 2007-02-06 | 2014-06-18 | FUJIFILM Corporation | Ink-jet recording method and device |
JP4881756B2 (en) | 2007-02-06 | 2012-02-22 | 富士フイルム株式会社 | Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dye |
US8240808B2 (en) | 2007-02-07 | 2012-08-14 | Fujifilm Corporation | Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method |
WO2008096618A1 (en) | 2007-02-09 | 2008-08-14 | Konica Minolta Medical & Graphic, Inc. | Inkjet head, inkjet printer, and inkjet recording method |
JP2008203573A (en) * | 2007-02-20 | 2008-09-04 | Fujifilm Corp | Photosensitive composition and two-photon absorption optical recording medium |
JP5227521B2 (en) | 2007-02-26 | 2013-07-03 | 富士フイルム株式会社 | Ink composition, ink jet recording method, printed matter, and ink set |
JP2008208266A (en) | 2007-02-27 | 2008-09-11 | Fujifilm Corp | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate |
JP5224699B2 (en) | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed material, method for producing lithographic printing plate, and lithographic printing plate |
JP2008233660A (en) | 2007-03-22 | 2008-10-02 | Fujifilm Corp | Automatic development device for immersion type lithographic printing plate and method thereof |
JP5238292B2 (en) | 2007-03-23 | 2013-07-17 | 三菱製紙株式会社 | Water-developable photosensitive lithographic printing plate material |
DE602008001572D1 (en) | 2007-03-23 | 2010-08-05 | Fujifilm Corp | Negative lithographic printing plate precursor and lithographic printing method therewith |
JP4860525B2 (en) | 2007-03-27 | 2012-01-25 | 富士フイルム株式会社 | Curable composition and planographic printing plate precursor |
EP1975702B1 (en) | 2007-03-29 | 2013-07-24 | FUJIFILM Corporation | Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device |
EP1974914B1 (en) | 2007-03-29 | 2014-02-26 | FUJIFILM Corporation | Method of preparing lithographic printing plate |
JP5030638B2 (en) | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | Color filter and manufacturing method thereof |
EP1975706A3 (en) | 2007-03-30 | 2010-03-03 | FUJIFILM Corporation | Lithographic printing plate precursor |
JP5243072B2 (en) | 2007-03-30 | 2013-07-24 | 富士フイルム株式会社 | Ink composition, and image recording method and image recorded material using the same |
JP5306681B2 (en) | 2007-03-30 | 2013-10-02 | 富士フイルム株式会社 | Polymerizable compound, polymer, ink composition, printed matter, and inkjet recording method |
EP1975710B1 (en) | 2007-03-30 | 2013-10-23 | FUJIFILM Corporation | Plate-making method of lithographic printing plate precursor |
JP5159141B2 (en) | 2007-03-30 | 2013-03-06 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, lithographic printing plate preparation method |
JP5046744B2 (en) | 2007-05-18 | 2012-10-10 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method using the same |
US7651830B2 (en) * | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
DE602008002963D1 (en) | 2007-07-02 | 2010-11-25 | Fujifilm Corp | Planographic printing plate precursor and planographic printing method with it |
JP5213375B2 (en) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device |
EP2048539A1 (en) | 2007-09-06 | 2009-04-15 | FUJIFILM Corporation | Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element |
JP5247093B2 (en) | 2007-09-14 | 2013-07-24 | 富士フイルム株式会社 | Azo compound, curable composition, color filter and production method thereof |
JP2009091555A (en) | 2007-09-18 | 2009-04-30 | Fujifilm Corp | Curable composition, image forming material and planographic printing plate precursor |
US9442372B2 (en) | 2007-09-26 | 2016-09-13 | Fujifilm Corporation | Pigment dispersion composition, photocurable composition and color filter |
JP5111039B2 (en) | 2007-09-27 | 2012-12-26 | 富士フイルム株式会社 | Photocurable composition containing a polymerizable compound, a polymerization initiator, and a dye |
JP5055077B2 (en) | 2007-09-28 | 2012-10-24 | 富士フイルム株式会社 | Image forming method and planographic printing plate precursor |
EP2042311A1 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
JP5227560B2 (en) | 2007-09-28 | 2013-07-03 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, and method for producing molded printed matter |
JP4951454B2 (en) | 2007-09-28 | 2012-06-13 | 富士フイルム株式会社 | How to create a lithographic printing plate |
EP2042928B1 (en) | 2007-09-28 | 2010-07-28 | FUJIFILM Corporation | Negative-working photosensitive material and negative-working planographic printing plate precursor |
JP5265165B2 (en) | 2007-09-28 | 2013-08-14 | 富士フイルム株式会社 | Coating apparatus and ink jet recording apparatus using the same |
JP5002399B2 (en) | 2007-09-28 | 2012-08-15 | 富士フイルム株式会社 | Processing method of lithographic printing plate precursor |
JP4898618B2 (en) | 2007-09-28 | 2012-03-21 | 富士フイルム株式会社 | Inkjet recording method |
JP5244518B2 (en) | 2007-09-28 | 2013-07-24 | 富士フイルム株式会社 | Planographic printing plate precursor and lithographic printing plate preparation method |
KR101548196B1 (en) | 2007-11-01 | 2015-08-28 | 후지필름 가부시키가이샤 | Pigment dispersion composition, curable color composition, color filter and method for producing the same |
EP2058123B1 (en) | 2007-11-08 | 2012-09-26 | FUJIFILM Corporation | Resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
US8240838B2 (en) | 2007-11-29 | 2012-08-14 | Fujifilm Corporation | Ink composition for inkjet recording, inkjet recording method, and printed material |
JP2009139852A (en) | 2007-12-10 | 2009-06-25 | Fujifilm Corp | Method of preparing lithographic printing plate and lithographic printing plate precursor |
JP5068640B2 (en) | 2007-12-28 | 2012-11-07 | 富士フイルム株式会社 | Dye-containing negative curable composition, color filter, method for producing the same, and solid-state imaging device |
JP5066452B2 (en) | 2008-01-09 | 2012-11-07 | 富士フイルム株式会社 | Development processing method for lithographic printing plate |
JP2009186997A (en) | 2008-01-11 | 2009-08-20 | Fujifilm Corp | Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
JP5500831B2 (en) | 2008-01-25 | 2014-05-21 | 富士フイルム株式会社 | Method for preparing relief printing plate and printing plate precursor for laser engraving |
JP5241252B2 (en) | 2008-01-29 | 2013-07-17 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
JP5052360B2 (en) | 2008-01-31 | 2012-10-17 | 富士フイルム株式会社 | Dye-containing negative curable composition, color filter and method for producing the same |
JP5371449B2 (en) | 2008-01-31 | 2013-12-18 | 富士フイルム株式会社 | Resin, pigment dispersion, colored curable composition, color filter using the same, and method for producing the same |
JP2009184188A (en) | 2008-02-05 | 2009-08-20 | Fujifilm Corp | Lithographic printing original plate and printing method |
JP5150287B2 (en) | 2008-02-06 | 2013-02-20 | 富士フイルム株式会社 | Preparation method of lithographic printing plate and lithographic printing plate precursor |
JP5254632B2 (en) | 2008-02-07 | 2013-08-07 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, and molded printed matter |
JP5147499B2 (en) | 2008-02-13 | 2013-02-20 | 富士フイルム株式会社 | Photosensitive coloring composition, color filter and method for producing the same |
US20090214797A1 (en) | 2008-02-25 | 2009-08-27 | Fujifilm Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
JP5137618B2 (en) | 2008-02-28 | 2013-02-06 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
EP2095970A1 (en) | 2008-02-29 | 2009-09-02 | Fujifilm Corporation | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
JP5448352B2 (en) | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | Colored curable composition, color filter, and solid-state imaging device |
JP5175582B2 (en) | 2008-03-10 | 2013-04-03 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP2009214428A (en) | 2008-03-11 | 2009-09-24 | Fujifilm Corp | Original plate of lithographic printing plate and lithographic printing method |
JP5583329B2 (en) | 2008-03-11 | 2014-09-03 | 富士フイルム株式会社 | Pigment composition, ink composition, printed matter, inkjet recording method, and polyallylamine derivative |
JP5334624B2 (en) | 2008-03-17 | 2013-11-06 | 富士フイルム株式会社 | Colored curable composition, color filter, and method for producing color filter |
EP2270110B1 (en) | 2008-03-17 | 2015-02-25 | FUJIFILM Corporation | Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element |
KR20090100262A (en) | 2008-03-18 | 2009-09-23 | 후지필름 가부시키가이샤 | Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor |
JP2009229771A (en) | 2008-03-21 | 2009-10-08 | Fujifilm Corp | Automatic developing method for lithographic printing plate |
JP4940174B2 (en) | 2008-03-21 | 2012-05-30 | 富士フイルム株式会社 | Automatic development equipment for lithographic printing plates |
JP5422134B2 (en) | 2008-03-25 | 2014-02-19 | 富士フイルム株式会社 | Automatic development method for immersion lithographic printing plates |
JP5473239B2 (en) | 2008-03-25 | 2014-04-16 | 富士フイルム株式会社 | Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter |
JP5422146B2 (en) | 2008-03-25 | 2014-02-19 | 富士フイルム株式会社 | Processing solution for preparing a lithographic printing plate and processing method of a lithographic printing plate precursor |
JP2009236942A (en) | 2008-03-25 | 2009-10-15 | Fujifilm Corp | Planographic printing plate precursor and plate making method of the same |
JP5020871B2 (en) | 2008-03-25 | 2012-09-05 | 富士フイルム株式会社 | Planographic printing plate manufacturing method |
JP4914862B2 (en) | 2008-03-26 | 2012-04-11 | 富士フイルム株式会社 | Inkjet recording method and inkjet recording apparatus |
JP5173528B2 (en) | 2008-03-28 | 2013-04-03 | 富士フイルム株式会社 | Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device |
EP2105298B1 (en) | 2008-03-28 | 2014-03-19 | FUJIFILM Corporation | Negative-working lithographic printing plate precursor and method of lithographic printing using same |
JP5322575B2 (en) | 2008-03-28 | 2013-10-23 | 富士フイルム株式会社 | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method for producing relief printing plate |
JP5137662B2 (en) | 2008-03-31 | 2013-02-06 | 富士フイルム株式会社 | Curable composition, color filter and method for producing the same, and solid-state imaging device |
JP5528677B2 (en) | 2008-03-31 | 2014-06-25 | 富士フイルム株式会社 | Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor |
JP5155920B2 (en) | 2008-03-31 | 2013-03-06 | 富士フイルム株式会社 | Photosensitive transparent resin composition, method for producing color filter, and color filter |
JP5305793B2 (en) | 2008-03-31 | 2013-10-02 | 富士フイルム株式会社 | Relief printing plate and method for producing relief printing plate |
US20090260531A1 (en) | 2008-04-18 | 2009-10-22 | Fujifilm Corporation | Aluminum alloy plate for lithographic printing plate, lithographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
KR101441998B1 (en) | 2008-04-25 | 2014-09-18 | 후지필름 가부시키가이샤 | Polymerizable composition, light shielding color filter, black curable composition, light shielding color filter for solid-state imaging device, method of manufacturing the same, and solid-state imaging device |
JP5222624B2 (en) | 2008-05-12 | 2013-06-26 | 富士フイルム株式会社 | Black photosensitive resin composition, color filter, and method for producing the same |
JP5414367B2 (en) | 2008-06-02 | 2014-02-12 | 富士フイルム株式会社 | Pigment dispersion and ink composition using the same |
JP4951784B2 (en) | 2008-06-23 | 2012-06-13 | コニカミノルタホールディングス株式会社 | Inkjet recording apparatus and inkjet recording method |
JP5296434B2 (en) | 2008-07-16 | 2013-09-25 | 富士フイルム株式会社 | Master for lithographic printing plate |
JP2010044273A (en) | 2008-08-14 | 2010-02-25 | Fujifilm Corp | Color filter and production method thereof, and solid-state image sensor using the same |
JP5274151B2 (en) | 2008-08-21 | 2013-08-28 | 富士フイルム株式会社 | Photosensitive resin composition, color filter, method for producing the same, and solid-state imaging device |
JP5383133B2 (en) | 2008-09-19 | 2014-01-08 | 富士フイルム株式会社 | Ink composition, ink jet recording method, and method for producing printed product |
US8151705B2 (en) | 2008-09-24 | 2012-04-10 | Fujifilm Corporation | Method of preparing lithographic printing plate |
JP2010077228A (en) | 2008-09-25 | 2010-04-08 | Fujifilm Corp | Ink composition, inkjet recording method and printed material |
ATE541905T1 (en) | 2008-09-26 | 2012-02-15 | Fujifilm Corp | INK COMPOSITION AND INK RECORDING METHOD |
JP5461809B2 (en) | 2008-09-29 | 2014-04-02 | 富士フイルム株式会社 | Ink composition and inkjet recording method |
JP5079653B2 (en) | 2008-09-29 | 2012-11-21 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing the same, and solid-state imaging device |
JP5171514B2 (en) | 2008-09-29 | 2013-03-27 | 富士フイルム株式会社 | Colored curable composition, color filter, and method for producing color filter |
JP5127651B2 (en) | 2008-09-30 | 2013-01-23 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing the same, and solid-state imaging device |
JP5660268B2 (en) | 2008-09-30 | 2015-01-28 | 富士フイルム株式会社 | Planographic printing plate precursor, lithographic printing plate making method and polymerizable monomer |
JP5393092B2 (en) | 2008-09-30 | 2014-01-22 | 富士フイルム株式会社 | Dye-containing negative curable composition, color filter using the same, method for producing the same, and solid-state imaging device |
JP5340102B2 (en) | 2008-10-03 | 2013-11-13 | 富士フイルム株式会社 | Dispersion composition, polymerizable composition, light-shielding color filter, solid-state imaging device, liquid crystal display device, wafer level lens, and imaging unit |
US8888262B2 (en) | 2008-11-07 | 2014-11-18 | Konica Minolta Holdings, Inc. | Actinic energy radiation curable inkjet ink and inkjet recording method |
JP2010115791A (en) | 2008-11-11 | 2010-05-27 | Konica Minolta Ij Technologies Inc | Image forming apparatus |
JP2010180330A (en) | 2009-02-05 | 2010-08-19 | Fujifilm Corp | Non-aqueous ink, ink set, method for recording image, device for recording image, and recorded matter |
JP5350827B2 (en) | 2009-02-09 | 2013-11-27 | 富士フイルム株式会社 | Ink composition and inkjet recording method |
JP2010198735A (en) | 2009-02-20 | 2010-09-09 | Fujifilm Corp | Optical member and organic electroluminescent display device equipped with the same |
JP5340198B2 (en) | 2009-02-26 | 2013-11-13 | 富士フイルム株式会社 | Dispersion composition |
JP5349095B2 (en) | 2009-03-17 | 2013-11-20 | 富士フイルム株式会社 | Ink composition and inkjet recording method |
JP5349097B2 (en) | 2009-03-19 | 2013-11-20 | 富士フイルム株式会社 | Ink composition, inkjet recording method, printed matter, and method for producing molded printed matter |
JP5315267B2 (en) | 2009-03-26 | 2013-10-16 | 富士フイルム株式会社 | Colored curable composition, color filter, production method thereof, and quinophthalone dye |
JP5383289B2 (en) | 2009-03-31 | 2014-01-08 | 富士フイルム株式会社 | Ink composition, ink composition for inkjet, inkjet recording method, and printed matter by inkjet method |
US8663880B2 (en) | 2009-04-16 | 2014-03-04 | Fujifilm Corporation | Polymerizable composition for color filter, color filter, and solid-state imaging device |
JP5572026B2 (en) | 2009-09-18 | 2014-08-13 | 富士フイルム株式会社 | Ink composition and inkjet recording method |
JP5530141B2 (en) | 2009-09-29 | 2014-06-25 | 富士フイルム株式会社 | Ink composition and inkjet recording method |
JP5701576B2 (en) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state imaging device |
JP5791874B2 (en) | 2010-03-31 | 2015-10-07 | 富士フイルム株式会社 | COLORING COMPOSITION, INKJET INK, COLOR FILTER AND ITS MANUFACTURING METHOD, SOLID-STATE IMAGING DEVICE, AND DISPLAY DEVICE |
JP2012031388A (en) | 2010-05-19 | 2012-02-16 | Fujifilm Corp | Printing method, method for preparing overprint, method for processing laminate, light-emitting diode curable coating composition, and light-emitting diode curable ink composition |
JP5638285B2 (en) | 2010-05-31 | 2014-12-10 | 富士フイルム株式会社 | Polymerizable composition, cured film, color filter, method for producing color filter, and solid-state imaging device |
JP5622564B2 (en) | 2010-06-30 | 2014-11-12 | 富士フイルム株式会社 | Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device |
EP2607433B1 (en) | 2010-08-19 | 2020-11-11 | Konica Minolta Holdings, Inc. | Active ray-curable ink and active ray-curable inkjet recording method |
US8814347B2 (en) | 2010-12-10 | 2014-08-26 | Konica Minolta, Inc. | Inkjet recording device |
KR101830206B1 (en) | 2010-12-28 | 2018-02-20 | 후지필름 가부시키가이샤 | Titanium black dispersion composition for forming light blocking film and method of producing the same, black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film |
JP5417364B2 (en) | 2011-03-08 | 2014-02-12 | 富士フイルム株式会社 | Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same |
CN103459469B (en) | 2011-03-30 | 2015-09-09 | 旭化成化学株式会社 | Organopolysiloxane, its manufacture method and the curable resin composition containing organopolysiloxane |
CN103492951A (en) | 2011-04-22 | 2014-01-01 | 3M创新有限公司 | Enhanced multi-photon imaging resolution method |
CN103502015B (en) | 2011-04-27 | 2016-07-06 | 柯尼卡美能达株式会社 | Ink-jet recording apparatus |
KR101622990B1 (en) | 2011-09-14 | 2016-05-20 | 후지필름 가부시키가이샤 | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
JP5922013B2 (en) | 2011-12-28 | 2016-05-24 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
JP5976523B2 (en) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
US9527310B2 (en) | 2012-03-01 | 2016-12-27 | Konica Minolta, Inc. | Inkjet printing method |
JP5934664B2 (en) | 2012-03-19 | 2016-06-15 | 富士フイルム株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device |
JP5775479B2 (en) | 2012-03-21 | 2015-09-09 | 富士フイルム株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device |
EP2644664B1 (en) | 2012-03-29 | 2015-07-29 | Fujifilm Corporation | Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article |
EP2845733B1 (en) | 2012-05-01 | 2017-06-21 | Konica Minolta, Inc. | Image formation device |
JP5909468B2 (en) | 2012-08-31 | 2016-04-26 | 富士フイルム株式会社 | Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device |
JP5894943B2 (en) | 2012-08-31 | 2016-03-30 | 富士フイルム株式会社 | Dispersion composition, curable composition using the same, transparent film, microlens, method for producing microlens, and solid-state imaging device |
JP5934682B2 (en) | 2012-08-31 | 2016-06-15 | 富士フイルム株式会社 | Curable composition for forming microlenses or undercoat film for color filter, transparent film, microlens, solid-state imaging device, and method for producing curable composition |
EP2917295A1 (en) | 2012-11-08 | 2015-09-16 | 3M Innovative Properties Company | Uv-curable silicone release compositions |
JP6170673B2 (en) | 2012-12-27 | 2017-07-26 | 富士フイルム株式会社 | Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor |
KR20150090142A (en) | 2012-12-28 | 2015-08-05 | 후지필름 가부시키가이샤 | Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same |
WO2014104137A1 (en) | 2012-12-28 | 2014-07-03 | 富士フイルム株式会社 | Curable resin composition, infrared cut-off filter, and solid-state imaging element using same |
JP5980702B2 (en) | 2013-03-07 | 2016-08-31 | 富士フイルム株式会社 | INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND MOLDED PRINTED PRODUCTION METHOD |
JP6183455B2 (en) | 2013-03-29 | 2017-08-23 | コニカミノルタ株式会社 | Image forming apparatus |
WO2015008777A1 (en) | 2013-07-16 | 2015-01-22 | 株式会社カネカ | Active energy-ray-curable resin composition for coating organic or inorganic substrate |
JP5939644B2 (en) | 2013-08-30 | 2016-06-22 | 富士フイルム株式会社 | Image forming method, in-mold molded product manufacturing method, and ink set |
JP6162084B2 (en) | 2013-09-06 | 2017-07-12 | 富士フイルム株式会社 | Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye |
TWI634135B (en) | 2015-12-25 | 2018-09-01 | 日商富士軟片股份有限公司 | Resin, composition, cured film, method for producing cured film, and semiconductor element |
JP6721670B2 (en) | 2016-03-14 | 2020-07-15 | 富士フイルム株式会社 | Composition, film, cured film, optical sensor and method for manufacturing film |
KR102681975B1 (en) | 2019-09-26 | 2024-07-05 | 후지필름 가부시키가이샤 | Method for manufacturing an insulating layer, method for manufacturing a laminate, and method for manufacturing a semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3198633A (en) * | 1961-12-01 | 1965-08-03 | Du Pont | Photopolymerizable elements and transfer processes |
US3617288A (en) * | 1969-09-12 | 1971-11-02 | Minnesota Mining & Mfg | Propenone sensitizers for the photolysis of organic halogen compounds |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2461943A (en) * | 1949-02-15 | Alpba | ||
US3163647A (en) * | 1960-11-10 | 1964-12-29 | American Cyanamid Co | Vinyl s-triazines, method of preparing the same and polymers derived therefrom |
-
1971
- 1971-09-03 US US05/177,851 patent/US3987037A/en not_active Expired - Lifetime
-
1972
- 1972-08-14 NL NLAANVRAGE7211076,A patent/NL172155C/en not_active IP Right Cessation
- 1972-08-30 CA CA150598A patent/CA986512A/en not_active Expired
- 1972-08-31 GB GB4049672A patent/GB1388492A/en not_active Expired
- 1972-09-01 BE BE788295D patent/BE788295A/en not_active IP Right Cessation
- 1972-09-01 DE DE2243621A patent/DE2243621A1/en active Granted
- 1972-09-01 FR FR7231062A patent/FR2152039A5/fr not_active Expired
- 1972-09-01 SU SU721826337A patent/SU618064A3/en active
- 1972-09-01 BR BR006066/72A patent/BR7206066D0/en unknown
- 1972-09-01 CH CH1293272A patent/CH576967A5/xx not_active IP Right Cessation
- 1972-09-02 IT IT52521/72A patent/IT965195B/en active
- 1972-09-02 JP JP47088304A patent/JPS591281B2/en not_active Expired
-
1980
- 1980-10-15 JP JP14424380A patent/JPS5685746A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3198633A (en) * | 1961-12-01 | 1965-08-03 | Du Pont | Photopolymerizable elements and transfer processes |
US3617288A (en) * | 1969-09-12 | 1971-11-02 | Minnesota Mining & Mfg | Propenone sensitizers for the photolysis of organic halogen compounds |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2641100A1 (en) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | LIGHT SENSITIVE COPY LAYER |
EP0137452A1 (en) * | 1983-10-12 | 1985-04-17 | Hoechst Aktiengesellschaft | Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds |
US5015554A (en) * | 1987-08-04 | 1991-05-14 | Hoechst Aktiengesellschaft | Positive radiation-sensitive mixture |
US5403697A (en) * | 1987-09-13 | 1995-04-04 | Hoechst Aktiengesellschaft | Positive radiation-sensitive mixture and recording material produced therefrom |
EP0398018A1 (en) * | 1989-04-18 | 1990-11-22 | Hoechst Aktiengesellschaft | Process for the preparation of light-sensitive bis-trichloro-methyl-s-triazines |
EP0717317A2 (en) | 1994-12-15 | 1996-06-19 | Hoechst Aktiengesellschaft | Radiation-sensitive composition |
EP0775706A2 (en) | 1995-11-24 | 1997-05-28 | Ciba SC Holding AG | Borates photoinitiators from polyboranes |
EP1627736A1 (en) | 2004-08-18 | 2006-02-22 | Konica Minolta Medical & Graphic, Inc. | Method of manufacturing light sensitive planographic printing plates and method of using the same |
WO2018164076A1 (en) | 2017-03-06 | 2018-09-13 | Ricoh Company, Ltd. | Film electrode, resin layer forming ink, inorganic layer forming ink, and electrode printing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS4836281A (en) | 1973-05-28 |
IT965195B (en) | 1974-01-31 |
DE2243621C2 (en) | 1987-08-20 |
NL172155C (en) | 1983-07-18 |
NL7211076A (en) | 1973-03-06 |
JPS5685746A (en) | 1981-07-13 |
CH576967A5 (en) | 1976-06-30 |
GB1388492A (en) | 1975-03-26 |
BE788295A (en) | 1973-03-01 |
US3987037A (en) | 1976-10-19 |
CA986512A (en) | 1976-03-30 |
NL172155B (en) | 1983-02-16 |
FR2152039A5 (en) | 1973-04-20 |
JPS591281B2 (en) | 1984-01-11 |
BR7206066D0 (en) | 1973-07-24 |
SU618064A3 (en) | 1978-07-30 |
JPS571819B2 (en) | 1982-01-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2243621A1 (en) | CHROMOPHORUS SUBSTITUTED VINYL HALOMETHYL S-TRIAZINE | |
US3954475A (en) | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines | |
DE68921019T2 (en) | Photosensitive compositions. | |
EP0137452B1 (en) | Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds | |
DE2718259C2 (en) | Radiation-sensitive mixture | |
DE69305334T2 (en) | VISIBLE PHOTOSENSIBILIZERS FOR PHOTOPOLYMERIZABLE COMPOSITIONS | |
DE1572136B1 (en) | Photopolymerizable mixture | |
DE69218719T2 (en) | Positive working photothermographic materials | |
DE2851472A1 (en) | LIGHT SENSITIVE MASS | |
DE3807381A1 (en) | HETEROCYCLIC COMPOUNDS CONTAINING 4,6-BIS-TRICHLOROMETHYL-S-TRIAZIN-2-YL-GROUPS, PROCESS FOR THE PREPARATION THEREOF AND LIGHT-SENSITIVE MIXTURE CONTAINING THIS COMPOUND | |
DE2164395A1 (en) | Photosensitive coating compound | |
EP0474009A1 (en) | Photopolymerisable composition and photopolymerisable recording material produced therefrom | |
DE2048561A1 (en) | Photographic light sensitive material | |
DE2717778A1 (en) | LIGHT SENSITIVE PHOTOGRAPHIC RECORDING MATERIAL | |
DE901498C (en) | Light sensitive photographic material | |
DE68922556T2 (en) | Halomethyl-1,3,5-triazines containing a monomer group. | |
DE68919617T2 (en) | Halogenmethyl-1,3,5-triazines containing amino part. | |
DE68926082T2 (en) | Halomethyl-1,3,5-triazines containing photoinitiator | |
DE2230936B2 (en) | ||
DE4112967A1 (en) | SUBSTITUTED 1-SULFONYLOXY-2-PYRIDONE, METHOD FOR THE PRODUCTION AND USE THEREOF | |
EP0398018B1 (en) | Process for the preparation of light-sensitive bis-trichloro-methyl-s-triazines | |
EP0040583B1 (en) | Process for the preparation of a uv-absorbing mask | |
EP0332043B1 (en) | Oxadiazole derivatives containing 4,6-bis-trichloromethyl-s-triazin-2-yl groups, process for their preparation and photosensitive mixture containing them | |
DE3788028T2 (en) | Photosensitizers and polymerizable compositions. | |
DE1293583B (en) | Copy layer with a merocyanine and a photolytic organic halogen compound |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OD | Request for examination | ||
8128 | New person/name/address of the agent |
Representative=s name: RUSCHKE, H., DIPL.-ING., 8000 MUENCHEN RUSCHKE, O. |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |