DE102005018604A1 - Open hole-based diffractive light modulator used in e.g. optical memory, has upper micromirror comprising open holes at center, such that it reflects/diffracts incident light based on height difference between upper and lower micromirrors - Google Patents

Abstract

The modulator includes lower micromirror (503a) and upper micromirror (530a) that is spaced at center from the lower micromirror. The upper micromirror has multiple open holes (531a) formed at the center, such that upper micromirror reflects or diffracts incident light depending on height difference between upper and lower micromirrors. An actuator moves center portion of upper micromirror layer comprising holes.

Description

BACKGROUND OF THE INVENTION

1. Field of the invention

The The present invention relates generally to a diffraction light modulator. and in particular an open-hole diffractive light modulator, comprising a lower micromirror mounted on a silicon substrate is arranged, and an upper micromirror provided with open holes and spaced from the silicon substrate, whereby the upper and lower micromirrors can form pixels.

Usually has the optical signal processing technology advantages insofar on, as a big one Amount of data in parallel rapidly as opposed to a conventional one digital information processing technology can be processed in the case of a large amount of data can not be processed in real time. Investigations have been carried out in terms of the construction and manufacture of a binary phase filter, an optical one Logic gate, a light amplifier, an image processing technique, an optical device and a light modulator using a spatial light modulation theory.

Of the spatial Light modulator is applied to optical memories, optical display devices, Printers, optical connections and hologram fields and examinations have been carried out for developing a display device using this Modulator.

The spatial light modulator is embodied by a reflective deformable grating light modulator 10 , as in 1 shown. The modulator 10 is in the on Bloom et al. receding US Patent No. 5,311,360. The modulator 10 includes several reflective deformable bands 18 having reflective surface portions and on an upper portion of a silicon substrate 16 suspended and spaced apart from each other with regular intervals. An insulating layer 11 is on the silicon substrate 16 deposited. A sacrificial silicon dioxide thin film 12 and a low-voltage silicon nitride thin film 14 are separated.

The nitride film 14 is through the bands 18 structured and a part of the silicon dioxide thin film 12 is etched, causing the tapes 18 on the oxide spacer layer 12 through a nitride frame 20 being held.

To modulate light with a single wavelength λ, the modulator is designed so that the thicknesses of the band 18 and the oxide spacer 12 each λ / 4 amount.

Limited by a vertical distance (d) between a reflective surface 22 from every band 18 and a reflective surface of the substrate 16 becomes a grating amplitude of the modulator 10 controlled by applying a voltage between the band 18 (the reflective surface 22 of the band 18 acting as the first electrode) and the substrate 16 (a conductive layer 24 on the bottom of the substrate 16 is formed to act as a second electrode).

in the undeformed state of the light modulator without voltage application is the lattice amplitude λ / 2, while the total concentricity path difference between light rays emitted by the band are reflected, and the substrate λ is. This will be a phase amplifies the reflected light.

In the undeformed state, the modulator acts 10 therefore as a planar mirror when it reflects incident light. In 2 denotes the reference numeral 20 the incident light coming through the modulator 10 is reflected in the undeformed state.

If between the band 18 and the substrate 16 When a suitable voltage is applied, the electrostatic force causes the band to be displaced 18 able to move downwards towards the surface of the substrate 16 to move. At this time, the grating amplitude is changed to λ / 4. The total true path difference is one-half of a wavelength, and of the deformed band 18 reflected light as well as from the substrate 16 reflected light is subjected to destructive interference.

The modulator diffracts light 26 using the interference. In 3 denote the reference numerals 28 and 30 Light rays which are diffracted in the deformed state in each case with +/- diffraction modes (D + 1, D - 1).

Of the However, Bloom's light modulator uses an electrostatic process to control the position of a micromirror, which has the disadvantage that the operating voltage is relatively high (usually about 30 V) and the relationship between the applied voltage and the displacement is not is linear, resulting in insufficient reliability in controlling light leads.

In order to overcome these problems, Korean Patent No. P2003-077389 discloses a thin film piezoelectric modulator and a Ver to make the same "explained.

4 Fig. 10 is a cutaway view of a piezoelectric thin film light modulator in accordance with a conventional technique.

Referring to the drawing, the recess type piezoelectric thin film light modulator comprises silicon substrates in accordance with the conventional art 401 and elements 410 ,

In this case, the elements can 410 have a predetermined width and regularly arranged to form the recess-type piezoelectric thin film light modulator. Alternatively, these elements can 410 have different widths and alternately arranged so as to form the recess-type piezoelectric thin film light modulator. The Elements 410 may be spaced from each other by a predetermined gap (nearly the same gap as the width of an element 410 ). In this case, micromirror layers bend over the entire tops of the silicon substrates 401 are formed, incident light by reflecting the incident light.

Each of the silicon substrates 401 includes a recess for providing an air space for an element 410 , an insulating layer 402 placed on the top of the silicon substrate 401 is deposited, and both sides of the element 410 are on both sides of the silicon substrate 401 mounted outside the recess.

The element 410 is formed in a rod shape and both sides of the element are on both sides of the silicon substrate 401 outside the recess of the silicon substrate 401 appropriate. The element 410 includes a lower carrier 411 , the section of which is above the recess of the silicon substrate 401 comes to rest, is vertically movable.

The element 410 includes a bottom electrode layer 412 on the left side of the lower beam 411 is formed and configured to provide a piezoelectric voltage, a piezoelectric material layer 413 on the lower electrode layer 412 is formed and adapted to generate a vertical actuation force by shrinkage and expansion when a voltage is applied to both sides thereof, and an upper electrode layer 414 on the piezoelectric material layer 413 is formed and adapted to a piezoelectric voltage to the piezoelectric material layer 413 provided.

The element 410 includes a bottom electrode layer 412 ' on the right side of the lower beam 411 is formed and configured to provide a piezoelectric voltage, a piezoelectric material layer 413 ' on the lower electrode layer 412 ' is formed and adapted to generate a vertical actuation force by shrinkage and expansion when a voltage is applied to both sides thereof, and an upper electrode layer 414 ' on the piezoelectric material layer 413 ' is formed and adapted to a piezoelectric voltage to the piezoelectric material layer 413 ' provide.

in the Korean Patent No. P2003-077389 is a light modulator of explained above type, which differs from the above-mentioned recess type light modulator different.

The in the patents of Bloom, Samsung Electro-Mechanics, et al. explained Light modulators can are used as devices for displaying images. In this case can at least two adjacent elements form a single pixel. Three Elements can self-evident form a single pixel or four or six elements can be one form the single pixel.

The in the patents of Bloom, Samsung Electro-Mechanics, et al. explained However, light modulators are limited in terms of achievement a miniaturization. This means, the light modulators are limited in that the widths of their Elements not smaller than 3 μm can be formed and that the space between the elements is not lower than 0.5 μm can be formed.

Minimal two elements are as well required to form a diffraction pixel, creating a limitation in the With regard to the miniaturization of a device.

Around to overcome these problems is a light modulator in Korean Patent No. P2004-29925 entitled "Hybrid Light Modulator" discloses that is capable of miniaturization by forming several projections on the micromirror layer.

In The disclosed hybrid light modulator has a plurality of projections provided the micromirror layer and diffract incident light by reflecting the incident light. The projections are in square columns Formed (rod) form and arranged so that they communicate with each other spaced at regular intervals are (for example, the same distance as the width of the projections), and though along the long sides of the element, enforcing a depression.

Everyone the projections comprises a carrier whose Bottom or bottom at the top of the micromirror of the element is attached, and a mirror layer on top of the carrier is formed and designed to reflect incident light by reflecting to bend the incoming light.

In In this case, the only mirror layer of one of the projections and the portion of the mirror layer of the element that is between the protrusions too lie comes, a single pixel.

Around However, to make the hybrid light modulator with these protrusions is a process for separately forming protrusions on the micromirror layer required, resulting in additional costs incurred at the time of manufacture of the hybrid light modulator.

SUMMARY OF THE INVENTION

The The present invention has been made to be in the state of the Technique overcome problems encountered, and a task The present invention is one based on open holes Diffraction light modulator to create a lower micromirror includes, which is disposed on the silicon substrate, and a upper micromirror with holes is provided, spaced from the silicon substrate, whereby the upper and lower micromirror pixels can form.

Around To achieve the above object, the present invention Invention one on open holes based diffractive light modulator having a substrate; a bottom micromirror layer on the portion of the surface of the Substrate formed and adapted to incident light through Reflecting the incoming light to bend; a band-shaped upper Micromirror layer, in its central section from the bottom Micromirror layer is spaced and with both sides of the Top of the substrate is attached, with several open holes in the central portion of the lower micromirror layer spaced are formed so that the upper micromirror layer incident Light reflects or bends depending from the height difference between the upper and lower micromirror layers; and a operating unit for vertically moving the central portion of the upper micromirror layer, in which the holes are formed.

Around To achieve the above object, the present invention Invention one on open holes based diffractive light modulator having a substrate, which has a recess; a band-shaped lower micromirror layer, the set with both ends on the side walls of a depression is to be at a medium depth in the recess come, so that the central portion of the lower micromirror layer move vertically to reflect incident light or to bow; a band-shaped upper Micromirror layer corresponding to the lower micromirror layer is arranged, and with both sides on both sides of the substrate outside the recess of the substrate is attached, with several open holes are formed on the upper micromirror layer, so that incident Light there through towards the bottom micromirror layer can reach, so that the upper micromirror layer the incident Light dependent from the height difference reflected between the upper and lower micromirror layers or bends; and an operating unit for moving the lower micromirror vertically.

SHORT DESCRIPTION THE DRAWINGS

The above and other objects, features and advantages The present invention will become more apparent from the following detailed Description in conjunction with the attached drawings; in these demonstrate:

1 a grating light modulator utilizing an electrostatic method in accordance with a conventional art;

2 the reflection of incident light by the grating light modulator applying the electrostatic process in an undeformed state in accordance with the conventional art;

3 the diffraction of incident light by the grating light modulator in accordance with the conventional art in a deformed state caused by an electrostatic force;

4 a sectional view of a piezoelectric diffraction thin film cutting micro-mirror with piezoelectric materials and a recess in accordance with the conventional art;

5a a cutaway view of an open-hole-based diffractive light modulator in accordance with a first embodiment of the present invention;

5b a cutaway view of an open-hole-based diffractive light modulator in accordance with a second embodiment of the present invention;

5c a cutaway view of a on-hole-based diffractive light modulator in accordance with a third embodiment of the present invention;

5d 5 is a cutaway view of an open-hole based diffractive light modulator in accordance with a fourth embodiment of the present invention;

5e 5 is a cutaway view of an open-hole based diffractive light modulator in accordance with a fifth embodiment of the present invention;

5f 5 is a cutaway view of an open-hole based diffractive light modulator in accordance with a sixth embodiment of the present invention;

5g 5 is a cutaway view of an open-hole based diffractive light modulator in accordance with a seventh embodiment of the present invention;

5h 5 is a cutaway view of an open-hole based diffractive light modulator in accordance with an eighth embodiment of the present invention;

6 a view of the 1-D array of an open-hole-based micromirror in accordance with the present invention; and

7 a view of the 2-D array of an open-hole-based micromirror in accordance with the present invention.

DESCRIPTION THE PREFERRED EMBODIMENTS

Now Reference is made to the drawings, in which the same reference numerals used in the different representations to the same or similar To designate components.

Preferred embodiments of the present invention will now be described with reference to FIG 5a to 7 explained.

5a Figure 11 is a cutaway view of an open-hole based diffractive light modulator in accordance with a first embodiment of the present invention.

As shown in the drawing, the diffraction light modulator based on open holes in accordance with the first embodiment of the present invention comprises a silicon substrate 501 , an insulating layer 502a , an insulating layer 502a and an element 510a , Where the insulating layer and the lower micromirror are formed as separate layers in this embodiment, the insulating layer may be implemented to serve as a lower micromirror if it has light-reflecting properties.

The silicon substrate 501 includes a recess for providing an air space for the element 510a ; the insulating layer 502a is on the silicon substrate 501 educated; the lower micromirror 503a is above the silicon substrate 501 deposited, and the bottom or the bottom of the element 510a is on both sides of the silicon substrate 501 mounted outside the recess. A material such as Si, Al ₂ O ₃ , ZrO ₂ , quartz and SiO ₂ is used to form the silicon substrate 501 and the lower and upper layers of the silicon substrate 501 (divided by a dotted line) may be formed using different materials.

The lower micromirror 503a is above the silicon substrate 501 deposited and diffracts incident light by reflecting the incident light. Metal, such as Al, Pt, Cr or Ag, can be used to form the lower micromirror 503a to build.

The element 510a is formed in band form. The element 510a includes a lower carrier 511a , whose bottoms or bottoms are on both sides on both sides of the silicon substrate 501 outside the recess of the silicon substrate 501 are attached so that the central section of the element 510a spaced from the recess comes to rest.

Piezoelectric layers 520a and 520a ' are on both sides of the lower beam 511a provided and the actuation force of the element 510a is provided by shrinkage and expansion of the provided piezoelectric layers 520a and 520a ' ,

Si oxide (for example, SiO ₂ and the like), Si nitride (for example, Si 3 N ₄ and the like), a ceramic substrate (Si, ZrO ₂ and Al ₂ O ₃ and the like) or Si carbide may be used to form the lower support 511a to build. Such a lower carrier 511a may be omitted.

The left and right piezoelectric layer 520a respectively. 520a ' includes a bottom electrode layer 521 respectively. 521a ' , which is designed to provide a piezoelectric voltage, a piezoelectric material layer 522a respectively. 522a ' on the lower electrode layer 521 respectively. 521a ' formed and adapted to a vertical Actu To generate force by shrinkage and expansion when a voltage is applied to both sides, and an upper electrode layer 523a respectively. 523a ' on the piezoelectric material layer 521 respectively. 521a ' is formed and adapted to a piezoelectric voltage on the piezoelectric material layer 521 respectively. 521a ' provide. When to the upper electrode layers 523a and 523a ' and the lower electrode layer 521 and 521a ' When a voltage is applied, the piezoelectric material layers shrink 521 and 521a ' and expand, creating the lower carrier 511a is caused to move in a vertical direction.

Pt, Ta / Pt, Ni, Au, Al, Ti / Pt, IrO ₂ and RuO ₂ can be used as materials for the electrodes 521 . 521a ' . 523a and 523a ' are used and these materials are deposited to have a depth in the range of 0.01 to 3 microns using a vaporization or sputtering process.

An upper micromirror 530a gets onto the central section of the lower girder 511a deposited. The upper micromirror 530a includes several open holes 531a ₁ to 531a ₃ , In this case, the holes are open 531a ₁ to 531a ₃ preferably formed in a rectangular shape; however, they may be formed in any closed form, such as a circle or ellipse. If the lower carrier 511a made of light-reflecting material, a separate upper micromirror need not be deposited and the lower support 511a serves as the upper micromirror.

Such open holes 531a ₁ to 531a ₃ allow it on the element 510a incident light passes through it, allowing the light on the sections of the lower micromirror 503a according to the open holes 531a ₁ to 531a ₃ invades, causing the upper and lower micromirror 503a and 530a are able to form pixels.

That is, for example, a section (A) of the upper micromirror 530a in which the open holes 531a ₁ to 531a ₃ are formed, and a portion (B) of the lower micromirror 503a can form a single pixel.

In this case, the open holes 531a ₁ to 531a ₃ of the upper micromirror 530a penetrating incident light to collapse on the corresponding portions of the lower micromirror 503a are brought and maximum diffracted light or a maximum amount of movement light is generated when the height difference between the upper micromirror 530a and the lower micromirror 503a is an odd multiple of λ / 4.

5b Fig. 12 is a cutaway view of an open-hole based diffractive light modulator in accordance with a second embodiment of the present invention. The open-hole diffractive light modulator comprises a silicon substrate 501b , a lower micromirror 503b and an element 510b ,

The second embodiment, which is in 5b shown is different from the one in 5a shown first embodiment in that open holes 531b ₁ to 531b ₂ are not arranged in the longitudinal direction, but in the transverse direction. The remaining structures are the same as those of the 5a shown on open holes based diffraction light modulator.

5c FIG. 10 is a cutaway view of an open-hole based diffractive light modulator in accordance with a third embodiment of the present invention. FIG.

As shown in the drawing, the diffraction light modulator based on open holes differs from the diffraction light modulator based on open holes in accordance with the second embodiment in that the lower support 511c of an element 510c from the silicon substrate 501c is so high that an airspace is formed. This allows the element 510c to move in a vertical direction.

That is, the element 510c has a micromirror 530c for diffracting incident light by reflecting the incident light, and it can move in the vertical direction while being away from the silicon substrate 501c stands tall. In this case, when the lower substrate has light-reflecting properties, the lower substrate may be implemented to serve as a micromirror without requiring a separate micromirror.

The lower carrier 511c of the element 510c is so high that the airspace over the element 510c is provided, and both sides of it are on the silicon substrate 501c appropriate.

An insulating layer 502c and a micromirror 503c are deposited and the micromirror 503c prevents incident light by reflecting the incoming light. If in this case the insulating layer 502c Has light-reflecting properties, the insulating layer can 502c be implemented so that it serves as a micromirror, without the formation of a separate micromirror is required.

The element 510c is formed in a band shape, its central portion is arranged so that it stands up and from the silicon substrate 501c is spaced, and the bottoms of both sides thereof are on the silicon substrate 501c appropriate.

Piezoelectric layers 520c and 520c ' Form the left and right sides of the top section of the item 510c , The piezoelectric layer 520c or and 520c ' includes a bottom electrode layer 521c respectively. 521c ' , which is designed to provide a piezoelectric voltage, a piezoelectric material layer 522c respectively. 522c ' on the lower electrode layer 521c respectively. 521c ' is formed and adapted to generate a vertical actuation force by shrinkage and expansion when a voltage is applied to both sides thereof, and an upper electrode layer 523c respectively. 523c ' on the piezoelectric material layer 522c respectively. 522c ' is formed and designed for the piezoelectric material layer 522a respectively. 522a ' to provide a piezoelectric voltage.

When to the upper electrode layers 523c and 523c ' and the lower electrode layer 521c and 521c ' When a voltage is applied, the element moves 510c in the upward direction and diffracts incident light by reflecting the incident light.

An upper micromirror 530c is on the central section of the element 510c deposited, in which the piezoelectric layers 520c and 520c ' of the lower carrier 511c are removed, and open holes 531c ₁ to 531c ₃ are in the upper micromirror 530c intended. In this case, the holes are open 531c ₁ to 531c ₃ preferably rectangular formed; however, they may be formed in another closed form, such as a circle or ellipse.

These open holes allow the sections of the lower micromirror 503c according to the open holes 531c ₁ to 531c ₃ , together with the sections of the upper micromirror 530c adjacent to the open holes 531c ₁ to 531c ₃ of the upper micromirror 530c To make pixels.

That is, for example, a section (A) of the upper micromirror 530c in which the open holes 531c ₁ to 531c ₃ are formed, and a portion (B) of the lower micromirror 503c form a single pixel.

In this case, incident light can enter the open holes 531c ₁ to 531c ₃ of the upper micromirror 530c interspersed, on the corresponding sections of the lower micromirror 503c and it is noted that maximum diffracted light is generated when the height difference between the upper micromirror 530c and the lower micromirror 503c an odd multiple of λ / 4 forms.

5d FIG. 12 is a cutaway view of an open-hole based diffractive light modulator in accordance with a fourth embodiment of the present invention. FIG.

As shown in the drawing, the diffraction light modulator based on open holes differs from the diffraction light modulator based on open holes in accordance with the fourth embodiment in that the open holes are arranged transversely. The remaining structures are the same as those of the 5c shown on open holes based diffraction light modulator.

5e FIG. 10 is a cutaway view of an open-hole based diffractive light modulator in accordance with a fifth embodiment of the present invention. FIG. As shown in the drawing, the diffraction light modulator based on open holes in accordance with the fifth embodiment comprises a silicon substrate 501e , a lower micromirror 503e that on the silicon substrate 501e is formed, and an upper micromirror 510e ,

In this case, the lower micromirror serves 503e as a lower electrode and diffracts incident light by reflecting the incident light.

The upper micromirror 510e includes open holes 511e ₁ to 511e ₃ , The open holes 511e ₁ to 511e ₃ are preferably formed rectangular, but they may have another closed shape, such as circular or elliptical shape.

These open holes 511e ₁ to 511e ₃ allow the sections of the lower micromirror 503e according to the open holes 511e ₁ to 511e ₃ along with the sections of the upper micromirror 510e adjacent to the open holes 511e ₁ to 511e ₃ Make pixels.

That is, for example, a section (A) of the upper micromirror forms 510e in which the open holes 511e ₁ to 511e ₃ are formed, and a portion (B) of the lower micromirror 503e a single pixel.

In this case, incident light can enter the open holes 511e ₁ to 511e ₃ of the upper micromirror 510e interspersed, on the corresponding Sections of the lower micromirror 503e and maximum diffracted light or amount of movement light is generated when the height difference between the upper micromirror 510e and the lower micromirror 503e an odd multiple of λ / 4 forms.

5f FIG. 12 is a cutaway view of an open-hole based diffractive light modulator in accordance with a sixth embodiment of the present invention. FIG.

As shown in the drawing, the diffraction light modulator based on open holes differs from the diffraction light modulator based on open holes in accordance with the fifth embodiment in that open holes are arranged transversely. The remaining structures are the same as those of the 5e shown on open holes based diffraction light modulator. A vertical actuation force is generated using the piezoelectric material layers in the first to fourth embodiments of the present invention, and a vertical actuation force is generated using an electrostatic force in the fifth and sixth embodiments of the present invention. However, such vertical actuating force can also be generated using electromagnetic force.

5g FIG. 12 is a cutaway view of an open-hole based diffractive light modulator in accordance with a seventh embodiment of the present invention. FIG.

As shown in the drawing, the diffraction light modulator based on open holes in accordance with the seventh embodiment includes a silicon substrate 501g , a lower micromirror 510g which is in the middle of the recess of the silicon substrate 501g is formed, and an upper micromirror 520g which is designed to the top sides of the silicon substrate 501g to span. The lower micromirror 510g not only can diffract incident light by reflecting the incoming light; rather, it is also used as the lower electrode.

A lower electrode layer 503g is at the bottom of the recess of the silicon substrate 501g educated. The lower electrode layer 503g together with the center of the recess provides the bottom micromirror 510g with a vertical actuation force caused by an electrostatic force.

That is, the lower electrode 503g and the bottom micromirror 510g They attract each other due to an electrostatic force and produce a downward operating force when voltage is applied to them or the lower electrode 503g and the bottom micromirror 510g generate an upward actuating force by a restoring force when no voltage is applied to them.

Open holes 521g ₁ to 521g ₃ are in the upper micromirror 520g intended. The open holes 521g ₁ to 521g ₃ are preferably formed rectangular in shape; however, they may have any other closed shape, such as circular or elliptical.

These open holes 521g ₁ to 521g ₃ offset the sections of the lower micromirror 510g according to the open holes 521g ₁ to 521g ₃ along with the sections of the upper micromirror 520g adjacent to the open holes 521g ₁ to 521g ₃ able to form pixels.

That is, for example, a section (A) of the upper micromirror forms 520g in which the open holes 521g ₁ to 521g ₃ are formed, and a portion (B) of the lower micromirror 510g a single pixel.

In this case, incident light, the open holes 521g ₁ to 521g ₃ of the upper micromirror 520g interspersed, on the corresponding sections of the lower micromirror 510g and it is noted that maximum diffracted light or maximum amount of movement light is generated when the height difference between the upper micromirror 520g and the lower micromirror 510g is an odd multiple of λ / 4.

5h shows an open-hole-based diffractive light modulator in accordance with an eighth embodiment of the present invention. The diffraction light modulator based on open holes in accordance with the eighth embodiment differs from the diffraction light modulator based on open holes in accordance with the seventh embodiment in that open holes are arranged transversely.

6 FIG. 12 is a perspective view of a 1-D array of open hole based light modulator in accordance with one embodiment of the present invention. FIG.

As shown in the drawing, in the 1-D array of the open-hole-based light modulator in accordance with the embodiment of the present invention, a plurality of micromirrors 610a to 610n in lateral or lateral Direction arranged and diffract thereby different rays of incident light. Although the vertical operation of the lower micromirror layers caused by an electrostatic force has been explained, vertical operation using a piezoelectric method or an electromagnetic force may be employed.

7 FIG. 12 shows a perspective view of the 2-D array of an open-hole based light modulator in accordance with one embodiment of the present invention. FIG.

As shown in the drawing, open-hole based light modulators in the 2-D array of the open hole based light modulator in accordance with the embodiment of the present invention are open-hole based light modulators 710a ₁ to 710n _n arranged in lateral, forward and backward directions in accordance with the embodiment of the present invention.

The previously explained The present invention has the advantage of producing a light modulator can easily be diffracted light using a single micromirror without the use of additional processes.

Even though in the present case a single piezoelectric material layer explained may be a multi-species based piezoelectric material layer can be implemented, consisting of several piezoelectric material layers consists.

Even though the invention, on open holes based diffractive light modulator has been explained for illustrative purposes, tap Numerous modifications, modifications and substitutions without departing from the scope of the invention, which is in the appended claims is fixed.

Claims (16)

On open holes based diffractive light modulator, comprising: A substrate; a bottom micromirror layer resting on a portion of a surface of the Substrate formed and adapted to incident light through Reflecting the incoming light to bend; a band-shaped upper Micromirror layer, in its central section from the bottom Micromirror layer spaced and with both sides at an upper side of the substrate, with several open holes in its central portion formed by the lower micromirror layer is spaced so that the upper micromirror layer is incident Light dependent from the height difference reflected between the upper and lower micromirror layers or bends; and an actuating unit for vertically moving the central portion of the upper micromirror layer, in FIG the open holes are formed. A diffraction light modulator according to claim 1, wherein said operating unit the upper micromirror layer is actuated such that the upper micromirror layer between a first position that allows the upper micromirror layer and the lower micromirror layer form a planar mirror, and a second position which allows the upper micromirror layer to move and the lower micromirror layer diffract incident light. A diffractive light modulator according to claim 1, wherein: The Substrate with a recess to provide an air space is provided; the bottom micromirror layer on a floor the recess of the substrate is formed; and the upper micromirror layer an operating room so ensured that its central portion is spaced from the recess of the substrate. A diffraction light modulator according to claim 1, wherein said Substrate a planar surface and wherein the upper micromirror layer has an operating space such that its central section stands high to move from the bottom micromirror layer to be spaced. A diffraction light modulator according to claim 1, wherein said open holes the upper micromirror layer are arranged in the longitudinal direction of the substrate. A diffraction light modulator according to claim 1, wherein said open holes the upper micromirror layer in a direction perpendicular to the longitudinal direction of the substrate are arranged. A diffraction light modulator according to claim 1, wherein the actuator unit comprises: a first piezoelectric layer attached with a first end to a left end of the upper micromirror layer and having a second end disposed on a left side of the central portion of the upper micromirror layer spaced from the center of the upper micromirror layer, wherein a piezoelectric thin film material layer is provided in the first piezoelectric layer to provide a vertical operation force by shrinkage and expansion when a voltage is applied to both sides of the piezoelectric material layer; a second piezoelectric layer provided with a first end is disposed at a right end of the upper micromirror layer and having a second end attached to a right side of the center of the upper micromirror layer so as to be spaced from the center of the upper micromirror layer, wherein a piezoelectric material layer is provided in the second piezoelectric layer is to provide a vertical operating force by shrinkage and expansion when a voltage is applied to both sides of the piezoelectric material layer. A diffractive light modulator according to claim 7, wherein: The first piezoelectric layer comprises: A first piezoelectric Material layer, which has a first end at a left end the lower micromirror layer is arranged, and with a second end on a left side of the central portion of the lower micromirror layer is arranged to from the center of the lower Micromirror layer to be spaced, and designed to is, an operating force by shrinking and widening when creating on both sides a voltage is applied, and a first upper electrode layer, formed on the first piezoelectric material layer and configured to provide a piezoelectric voltage; and the second piezoelectric layer comprises: A second piezoelectric material layer having a first end arranged at a right end of the lower micromirror layer is, and with a second end on a right side of the central Section of the lower micromirror layer is attached to the from Center of the lower micromirror layer to be spaced, and which is designed to be an actuating force by shrinking and widening when creating on both sides a voltage is applied, and a second upper electrode layer, formed on the second piezoelectric material layer and configured to provide a piezoelectric voltage; in which the lower micromirror layer as lower electrodes for the first ones and second piezoelectric layers. A diffractive light modulator according to claim 7, wherein: A first piezoelectric layer comprises: Several first piezoelectric Material layers, with first ends at a left end of the lower micromirror layer are arranged, with second ends on a left side of the central portion of the lower micromirror layer is arranged to be spaced from the center of the lower micromirror layer to be, and which is designed to be an operating force due to shrinkage and to create expansion when there is tension on both sides is created, a plurality of first upper electrode layers, the formed between the first piezoelectric material layers and configured to provide a piezoelectric voltage, and a second top electrode layer on the one furthest overhead side of the first piezoelectric material layers is formed and designed to be a piezoelectric voltage to provide, and the second piezoelectric layer comprises: Several second piezoelectric material layers having first ends arranged at a right end of the lower micromirror layer are, and those with second ends on a right side of the central Section of the lower micromirror layer are attached to the from Center of the lower micromirror layer to be spaced, and which is designed to be an actuating force by shrinking and widening when creating tension at her created on both sides, several third upper electrode layers, formed between the second piezoelectric material layers and configured to provide a piezoelectric voltage, and a fourth upper electrode layer on the farthest overhead side of the second piezoelectric material layers is formed and designed to be a piezoelectric voltage provide; the lower micromirror layer being lower Electrodes for the first and second piezoelectric layers are used. A diffraction light modulator according to claim 1, wherein said operating unit the upper micromirror layer as upper electrode and the lower one Micromirror layer uses as the lower electrode and the upper micromirror layer moved vertically using an electrostatic force, between the upper micromirror layer and the lower micromirror layer is generated. A diffraction light modulator according to claim 1, wherein said operating unit the upper micromirror layer using an electromagnetic force moved in the vertical direction. A hole-based diffractive light modulator comprising: a substrate having a recess; a band-shaped bottom micromirror layer fixedly attached to both sides of side walls of the recess so as to be located at a central depth in the recess so that the central portion of the bottom micromirror layer can move vertically to reflect incident light; to bend; a band-shaped upper micromirror layer to lie corresponding to the lower micromirror layer with both of its ends attached to both sides of the substrate outside the recess of the substrate with a plurality of open holes formed on the top micromirror layer for incident light to pass therethrough toward the bottom micromirror layer, so that the top micromirror layer is the bottom incident light reflects or diffracts depending on the height difference between the upper and lower micromirror layers; and an actuator unit for vertically moving the lower micromirror. A diffraction light modulator according to claim 12, wherein said operating unit the upper micromirror layer is actuated such that the upper micromirror layer between a first position, which is the upper micromirror layer and the lower micromirror layer allows a planar mirror to form and move to a second position, which is the upper one Micromirror layer and the bottom micromirror layer allows to bend incident light. A diffraction light modulator according to claim 12, wherein said operating unit comprising a lower electrode layer formed on a bottom of the recess is, and an upper electrode through the lower micromirror layer is formed and the lower micromirror layer using moved by electrostatic force acting between the lower electrode layer and the lower micromirror layer is generated when at the lower Micro-mirror layer is applied a voltage. A diffraction light modulator according to claim 12, wherein said open holes the upper micromirror layer are arranged in the longitudinal direction of the substrate. A diffraction light modulator according to claim 12, wherein said open holes the upper micromirror layer in a direction perpendicular to one longitudinal direction of the substrate are arranged.