CN216672159U - Excimer laser ceramic insulating frame for photoetching machine - Google Patents
Excimer laser ceramic insulating frame for photoetching machine Download PDFInfo
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- CN216672159U CN216672159U CN202122821329.2U CN202122821329U CN216672159U CN 216672159 U CN216672159 U CN 216672159U CN 202122821329 U CN202122821329 U CN 202122821329U CN 216672159 U CN216672159 U CN 216672159U
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Abstract
The utility model belongs to the technical field of excimer laser, and particularly relates to an excimer laser ceramic insulating frame for a photoetching machine. The excimer laser ceramic insulating frame for the photoetching machine comprises an inflation hole and an air outlet hole, wherein one end of the inflation hole is connected with an inflation device, the other end of the inflation hole is connected with a hollow cavity, one end of the air outlet hole is connected with the hollow cavity, the other end of the air outlet hole is connected with the air outlet device, and the hollow cavity is arranged in the outer wall of a cavity; the outer wall of the chamber is connected with an excimer laser device. The utility model has reasonable structure and can meet the light beam pulse flow with high repeatability and short duration generated in the environment with high voltage and strong corrosivity.
Description
Technical Field
The utility model belongs to the technical field of excimer laser, and particularly relates to an excimer laser ceramic insulating frame for a photoetching machine.
Background
Excimer laser is widely used as a high-power ultraviolet light source in the fields of scientific research, industry, medical treatment and the like. In scientific research applications, the method has applications such as excimer laser Pulse Laser Deposition (PLD), Laser Induced Fluorescence (LIF) spectrum detection and the like. The excimer laser pulse laser deposition is to focus the high power pulse laser beam generated by the excimer laser to act on the surface of the target material, so that the surface of the target material generates high temperature and erosion, and further generates high temperature and high pressure plasma, and the plasma is directionally locally expanded and emitted and deposited on a substrate to form a film.
In industrial application, the industrial application of excimer laser focuses on micromachining and material surface modification, and mainly includes laser marking of materials such as metal and ceramic, nozzle drilling of an inkjet printer, fabrication of a microstructure, bragg grating fabrication, etching of a high-density circuit board, semiconductor lithography, low-temperature annealing of a liquid crystal display thin film transistor, stripping of a thin wire insulating layer and the like. Due to the characteristics of short wavelength and high power, the excimer laser is the main light source for the current large-scale semiconductor integrated circuit photoetching. The lithography machine is the largest industrial application field of the excimer laser.
Excimer lasers need to operate in a high voltage, highly corrosive environment to produce a highly repetitive, short duration pulse stream. First, due to the high thermal stability of alumina, it is able to cope with high pulse rate currents and repeated high temperature shocks. Secondly, the working medium of the excimer laser is usually composed of a mixture of a plurality of gases, such as halogen gas of fluorine, chlorine and the like and inert gas of argon, krypton, xenon and the like, so the used insulator has to be tough and resistant to the halogen gas of strong corrosion, alumina has excellent dielectric strength of 20kV/mm, which makes the insulator an excellent corrosion-resistant insulator, and the material does not generate organic substances which pollute laser gas and reduce the service life of the insulator.
Due to the strength, stability, insulation property and corrosion resistance of the high-purity alumina ceramic laser component, the high-purity alumina ceramic is widely used in industrial excimer lasers, especially in excimer laser light sources for the semiconductor industry.
The prior excimer laser for the photoetching machine is mainly small, and the length of an insulating frame of the excimer laser is mostly below 800 mm. Products with the length of more than 1.2m, especially hollow structures with round holes at two ends, have great difficulty in isostatic pressing, high-temperature sintering and the like, and have the problems of cracking, deformation and the like. In addition, because the existing domestic production of 99.8% alumina ceramic granulated powder has technical barriers, the imported 99.8% alumina granulated powder is high in price, more than 100 yuan per kilogram, and therefore, many manufacturers use alumina ceramic with the content of 99% or less, the product purity is low, and the service life is low under the strong corrosion condition due to the existence of impurity elements; and during use, impurity flare occurs.
With the national emphasis on the semiconductor industry field and the advanced demand of science and technology, the research and development demand of the excimer laser for the large-scale photoetching machine is increased, and the independent research and development of the excimer laser for the large-scale photoetching machine are increased by domestic semiconductor equipment manufacturers, so that the research and development of the large-scale alumina ceramic insulating frame (more than 1.2 m) which is urgently needed by equipment are urgent.
SUMMERY OF THE UTILITY MODEL
Aiming at the defects in the prior art, the utility model aims to provide the excimer laser ceramic insulating frame for the photoetching machine, which has a reasonable structure, the length of more than or equal to 1.2m and the content of aluminum oxide of more than 99.8 percent, and can meet the requirements of high repeatability and short duration of light beam pulse flow generated in a high-voltage and strong-corrosivity environment.
The excimer laser ceramic insulating frame for the photoetching machine comprises an inflation hole and an air outlet hole, wherein one end of the inflation hole is connected with an inflation device, the other end of the inflation hole is connected with a hollow cavity, one end of the air outlet hole is connected with the hollow cavity, the other end of the air outlet hole is connected with an air outlet device, and the hollow cavity is arranged in the outer wall of a cavity; the outer wall of the chamber is connected with an excimer laser device.
The length of the outer wall of the chamber is more than or equal to 1.2 m.
Preferably, the longitudinal sections of the air charging hole and the air outlet hole are round holes.
Preferably, the inflation hole and the air outlet hole are both cylindrical and are positioned in the center of two end faces of the outer wall of the cavity.
Preferably, the hollow cavity is rectangular.
Preferably, the parallelism of the outer wall surface of the chamber is less than or equal to 0.1mm, the flatness is less than or equal to 0.05mm, seamless accurate installation with the excimer laser can be realized, and the sealing performance is good.
Preferably, the ceramic insulating frame adopts high-purity alumina powder with the purity of more than or equal to 99.9 percent and the grain diameter of less than or equal to 1 mu m.
The hollow cavity has smooth inner wall, two ends connected with the gas filling hole and the gas outlet hole respectively, can cope with high pulse rate current and repeated high temperature impact, and can resist strong corrosive halogen gas.
The preparation process of the excimer laser ceramic insulating frame for the photoetching machine comprises the following steps:
the method comprises the steps of grinding high-purity alumina powder into slurry by adding a dispersing agent, deionized water, a binder, a release agent, a defoaming agent and the like, performing spray granulation to obtain alumina ceramic granulated powder with the content of more than 99.8%, sintering at 1600-1680 ℃ for 2-4 hours after cold isostatic pressing and ceramic green body processing, and performing cold machining to obtain the aluminum-based ceramic green body.
Compared with the prior art, the utility model has the following beneficial effects:
(1) the structure of the utility model is reasonable in design, the gas charging hole and the gas outlet hole are positioned on two end faces, and the gas charging and discharging of the halogen gas with strong corrosivity are easy to control; the outer wall of the chamber has smaller parallelism and flatness, can realize seamless accurate installation with the excimer laser, has good sealing performance, and prevents gas leakage;
(2) the alumina ceramic insulating frame used by the utility model has the alumina content of more than 99.8 percent, less impurities, high strength, high stability, insulating property and corrosion resistance, large product size and the product length of more than 1.2m, breaks through the current technical barrier, does not have products with the length at home at present for large excimer lasers, and assists the independent research and development of large lasers in China.
Drawings
FIG. 1 is a cross-sectional view of the present invention;
FIG. 2 is a top view of the present invention;
FIG. 3 is a side view of the present invention;
in the figure: 1. an inflation hole; 2. an air outlet; 3. an outer wall of the chamber; 4. a hollow cavity.
Detailed Description
The present invention is further described below with reference to examples.
Example 1
As shown in fig. 1, the excimer laser ceramic insulating frame for the lithography machine comprises an inflation hole 1 and an air outlet hole 2, wherein one end of the inflation hole 1 is connected with an inflation device, the other end of the inflation hole 1 is connected with a hollow cavity 4, one end of the air outlet hole 2 is connected with the hollow cavity 4, the other end of the air outlet hole 2 is connected with the air outlet device, and the hollow cavity 4 is arranged in an outer wall 3 of a cavity; the outer wall 3 of the chamber is connected to an excimer laser device.
The length of the outer wall 3 of the chamber is more than or equal to 1.2 m.
The inflation hole 1 and the air outlet hole 2 are both round holes.
The inflation hole 1 and the air outlet hole 2 are both in a cylindrical shape and are positioned in the central positions of two end faces of the outer wall 3 of the cavity.
The hollow cavity 4 is rectangular.
The parallelism of the surface of the outer wall 3 of the chamber is less than or equal to 0.1mm, the flatness is less than or equal to 0.05mm, seamless accurate installation with an excimer laser can be realized, and the sealing performance is good.
The ceramic insulating frame is made of high-purity alumina powder with the purity of more than or equal to 99.9 percent and the grain diameter of less than or equal to 1 mu m.
The hollow cavity is smooth in inner wall, two ends of the hollow cavity are respectively connected with the gas filling hole 1 and the gas outlet hole 2, high-pulse-rate current and repeated high-temperature impact can be handled, and halogen gas with strong corrosivity can be resisted.
The preparation process of the excimer laser ceramic insulating frame for the photoetching machine comprises the following steps:
high-purity alumina powder is adopted, dispersant, deionized water, binder, release agent, defoaming agent and the like are added and ball-milled into slurry, the slurry is sprayed and granulated into alumina ceramic granulated powder with the concentration of more than 99.8 percent, the alumina ceramic granulated powder is sintered for 2 hours at the temperature of 1650 +/-30 ℃ after cold isostatic pressing and ceramic green body processing, and then the alumina ceramic granulated powder is obtained by cold processing.
Claims (6)
1. The utility model provides an excimer laser ware ceramic insulation frame for lithography which characterized in that: the air-inflation structure comprises an air inflation hole (1) and an air outlet hole (2), wherein one end of the air inflation hole (1) is connected with an air inflation device, the other end of the air inflation hole (1) is connected with a hollow cavity (4), one end of the air outlet hole (2) is connected with the hollow cavity (4), the other end of the air outlet hole (2) is connected with the air outlet device, and the hollow cavity (4) is arranged in the outer wall (3) of a cavity; the outer wall (3) of the chamber is connected with an excimer laser device.
2. The excimer laser ceramic insulating frame for a lithography machine according to claim 1, wherein: the length of the outer wall (3) of the chamber is more than or equal to 1.2 m.
3. The excimer laser ceramic insulating frame for lithography machine according to claim 1, wherein: the longitudinal sections of the air charging hole (1) and the air outlet hole (2) are round holes.
4. The excimer laser ceramic insulating frame for lithography machine according to claim 1, wherein: the hollow cavity (4) is rectangular.
5. The excimer laser ceramic insulating frame for lithography machine according to claim 1, wherein: the surface parallelism of the outer wall (3) of the chamber is less than or equal to 0.1mm, and the planeness is less than or equal to 0.05 mm.
6. The excimer laser ceramic insulating frame for lithography machine according to claim 1, wherein: high-purity alumina powder with the purity of more than or equal to 99.9 percent and the grain diameter of less than or equal to 1 mu m is adopted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122821329.2U CN216672159U (en) | 2021-11-17 | 2021-11-17 | Excimer laser ceramic insulating frame for photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122821329.2U CN216672159U (en) | 2021-11-17 | 2021-11-17 | Excimer laser ceramic insulating frame for photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216672159U true CN216672159U (en) | 2022-06-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122821329.2U Active CN216672159U (en) | 2021-11-17 | 2021-11-17 | Excimer laser ceramic insulating frame for photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216672159U (en) |
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2021
- 2021-11-17 CN CN202122821329.2U patent/CN216672159U/en active Active
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