CN1304782C - chemical supply system - Google Patents

Abstract

The invention relates to a chemical supply system and a valve box design thereof. The first chemical supply device is arranged on a first floor and is internally provided with a control unit. The plurality of main pipelines are communicated with the first supply device, and one main pipeline is used for distributing chemicals to the using end of the first floor. The second chemical supply device is arranged on a second floor, and the other main pipeline is communicated with the second chemical supply device from the first chemical supply device so as to distribute chemicals to a use end of the second floor. The present invention uses a plurality of main pipelines to distribute chemical reagents or gases, thereby solving the problem of pipeline flow restriction.

Description

chemical supply system

technical field

The present invention relates to a chemical supply system (chemical supply system) and its valve box (valve box) design, in particular to a kind of multi-function (multi-function) chemical supply system and its valve box design for manufacturing plants .

Background technique

Generally, an integrated circuit or a semiconductor device needs to go through many process steps to complete, and these process steps almost all need to use chemical reagents or gases to carry out. Therefore, generally in a semiconductor factory, a chemical supply system will be installed to distribute chemical reagents or gases to each process machine by using its pipeline configuration and control devices, and these process machines are also called point-of-use. of use, POU).

Generally, in a multi-floor factory, the chemical supply system includes a chemical supply device arranged on the ground floor and chemical supply devices respectively arranged on other floors, and the chemical supply devices on each floor have their own control system. unit. By controlling the control unit in the chemical supply device on the ground floor, chemical reagents or gases can be delivered to the use end on the ground floor. The chemical supply devices on other floors will require the distribution of required chemical reagents or gases from the chemical supply devices on the ground floor through their control units, and then distribute the chemical reagents or gases to the use ends on the floors. In particular, the existing known main pipeline connected to the chemical supply device on the ground floor will be branched into a plurality of pipelines to supply chemical reagents or gases to the use end of the bottom floor and the chemical supply equipment on other floors, so when When demand surges, flow limitation or supply failure often occurs. Moreover, because the chemical supply devices on each floor have their own control units, the control systems on each floor are not integrated, so it is not easy to control the supply status of chemical reagents or gases in the entire factory.

In order to solve the above problems, one way is to install a transfer unit (transfer unit) on the ground floor, wherein there are several control units in the transfer unit that respectively control the chemical supply device of each floor, through the inside of the transfer unit The control of several control units can distribute the chemical reagents or gases to the chemical supply devices on each floor, and then the chemical supply devices on each floor deliver the chemical reagents or gases to their use ends.

Although the problem of current limitation can be solved by using the conversion unit, the purchase of the conversion unit has the disadvantage of greatly increasing the cost.

In addition, a valve box is generally installed on the pipeline for distributing chemical reagents or gases to control the flow of chemical reagents or gases delivered to the end of use. However, under the long-term use of the above-mentioned chemical supply system, it is often found that there are seeping chemicals or chemical fumes on the pipeline, especially on the pipeline near the valve box. Smoke, which will not only affect the visibility of the pipeline, but also may cause contamination of other equipment components.

It can be seen that there are still many defects in the above-mentioned existing chemical supply system and its valve box design, and it is urgent to be further improved. In order to solve the problems existing in the design of the chemical supply system and its valve box, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and there is no suitable structure for general products to solve The above-mentioned problem is obviously a problem that relevant industry players are eager to solve.

In view of the defects in the above-mentioned existing chemical supply system and its valve box design, the inventor actively researches and innovates based on years of rich practical experience and professional knowledge in the design and manufacture of such products, in order to create a new type of chemical supply system. The system and its valve box design can improve the general existing chemical supply system and its valve box design, making it more practical. Through continuous research, design, and after repeated trial samples and improvements, the present invention with practical value is finally created.

Contents of the invention

The purpose of the present invention is to overcome the defects of the existing chemical supply system and provide a new chemical supply system. When using the terminal, there is often a problem of limited flow or no supply, so it is more suitable for practical use and has industrial utilization value.

Another object of the present invention is to provide a chemical supply system. The technical problem to be solved is to solve the problems existing in the prior art without increasing costs.

Another object of the present invention is to provide a valve box design, the technical problem to be solved is to solve the problem that chemical fumes often seep out of the pipeline and affect the visibility of the pipeline.

The purpose of the present invention and the solution to its technical problems are achieved by adopting the following technical solutions. A chemical supply system proposed according to the present invention is suitable for distributing a chemical to multiple points of use (POUs) on multiple floors. The chemical supply system includes: a first chemical supply device configured on a first A floor, wherein the first chemical supply device has a control unit; a plurality of main pipelines, which communicate with the first supply device, and one of the main pipelines is used to deliver the chemical to the first floor and a second chemical supply device configured on a second floor, and the other main pipelines are connected from the first chemical supply device to the second chemical supply device, controlled by the control unit So that the chemical can be sent to the second chemical supply device, and then distributed to the use end of the second floor.

The purpose of the present invention and its technical problems can also be further realized by adopting the following technical measures.

In the aforementioned chemical supply system, the first chemical supply device further includes a plurality of reserved ports for additional installation of main pipelines.

The aforementioned chemical supply system further includes a plurality of valve boxes (valvc boxes), arranged between the first chemical supply device and the use end of the first floor, and between the second chemical supply device and the second floor Between the use ends, each of the valve boxes includes: a valve box main body, which communicates with the corresponding chemical supply device and communicates with the corresponding use ends; a discharge device, which communicates with the corresponding use ends. The main body of the valve box is connected to discharge pollutants in the pipeline; and a cleaning device is connected to the main body of the valve box and used to pass in cleaning materials to purify the pipeline.

In the aforementioned chemical supply system, the cleaning device includes an air cleaning device for feeding air to clean the pipeline.

The aforementioned chemical supply system further includes at least one chemical supply device, respectively arranged on each floor above the second floor, wherein each of the chemical supply devices communicates with the first chemical supply device through separate main pipelines, And through the control unit, the chemical is distributed from the first chemical supply device to each of the chemical supply devices, and then the chemical is distributed to the use end of each floor.

In the aforementioned chemical supply system, the chemical is selected from one of a chemical reagent and a gas.

The purpose of the present invention and the solution to its technical problems are also achieved by the following technical solutions. According to the design of a valve box proposed by the present invention, it is installed on a pipeline between a supply end and a plurality of use ends. The valve box includes: a valve box main body, which is connected by the pipe A discharge device communicates with the valve box main body to discharge pollutants in the pipeline; and a cleaning device communicates with the valve box The main body is connected, and is used to pass in the cleaning material to purify the pipeline.

The purpose of the present invention and the solution to its technical problems can also be further realized by adopting the following technical measures. In the aforementioned design of the valve box, the cleaning device includes an air cleaning device for introducing air to clean the pipeline.

Compared with the prior art, the present invention has obvious advantages and beneficial effects. As can be seen from the above technical scheme, in order to achieve the aforementioned object of the invention, the main technical contents of the present invention are as follows:

The present invention proposes a chemical supply system, which is suitable for distributing chemicals to multiple use ends on multiple floors. The chemicals are, for example, chemical reagents or gases. The chemical supply system includes a first chemical supply device, several main pipeline and a second chemical supply device. Wherein, the first chemical supply device is arranged on a first floor, and there is a control unit inside the first chemical supply device. Several main pipelines communicate with the first chemical supply device, and one of the main pipelines is used to distribute chemicals to the use end of the first floor. And the second chemical supply device is configured on a second floor, and another main pipeline is connected to the second chemical supply device by the first chemical supply device, controlled by the control unit in the first chemical supply system to make the chemical The material can be transported to the second chemical supply device, and then distributed to the use end on the second floor.

The present invention also proposes a design of a valve box, which is installed on a pipeline between a supply end and several use ends. The valve box includes a valve box main body, a discharge device and a cleaning device. Wherein, the main body of the valve box communicates with the supply end and communicates with several use ends through pipelines. In addition, the discharge device is connected with the main body of the valve box to discharge the pollutants in the pipeline and the main body of the valve box, and the cleaning device is connected with the main body of the valve box to pass in cleaning materials to purify the pipeline and the main body of the valve box .

Since the chemical supply system of the present invention uses a plurality of main pipelines to respectively connect the chemical supply devices on each floor with the chemical supply devices on the ground floor, it can solve the problem of pipeline flow restriction or It's a question of not being able to supply.

Because the present invention only sets the control unit in the chemical supply device on the bottom floor to control the supply of the chemical supply devices on all floors, the present invention integrates the control systems of all the chemical supply devices and can easily control the chemical reagents and Gas supply status.

Since the present invention is provided with a discharge device and a cleaning device in the valve box, the chemical mist seeping out of the pipeline can be discharged or cleaned, and then the visibility of the pipeline can be restored.

It can be seen from the above that, by means of the above technical solution, the present invention has at least the following advantages:

1. The chemical supply system of the present invention can solve the problem of pipeline flow restriction or failure to supply when the usage increases sharply.

2. The present invention integrates the control systems of all chemical supply devices, and can easily control the supply status of chemical reagents and gases in the factory.

3. The present invention is designed with a discharge device and a cleaning device in the valve box, so that the chemical fumes seeping out of the pipeline can be discharged or cleaned, and then the visibility of the pipeline can be restored.

To sum up, the chemical supply system with special structure and its valve box design of the present invention can solve the problem that the existing known chemical supply system often has limited flow or cannot supply when supplying the use ends of different floors, thus It is more suitable for practical use and has industrial application value; it can solve the problems existing in the existing technology without increasing the cost, and can solve the problem that chemical fumes often seep out of the pipeline and affect the visibility of the pipeline question of degree. It has the above-mentioned many advantages and practical value, and there is no similar structural design publicly published or used in similar products, so it is indeed innovative. It has great improvements in both structure and function, and has a great technical advantage. It has improved and produced useful and practical effects. Compared with the existing chemical supply system and its valve box design, it has a number of enhanced functions, so it is more suitable for practical use, and has wide application value in the industry. It is really a novelty , Progressive and practical new design.

The above description is only an overview of the technical solutions of the present invention. In order to understand the technical means of the present invention more clearly and implement them according to the contents of the description, the preferred embodiments of the present invention and accompanying drawings are described in detail below.

Description of drawings

Fig. 1 is a schematic diagram of a chemical supply system according to a preferred embodiment of the present invention.

Fig. 2 is a schematic diagram of the design of a valve box according to a preferred embodiment of the present invention.

100, 200, 300: chemical supply device 102: control unit

104, 204, 304; valve box 106a, 106b: use end

110a, 110b, 110c: main road 112; reserved interface

206a, 206b: user end 306a, 306b: user end

406a, 406b: user end 400: supply end

402: pipeline 404: valve box main body

408: Discharging device 410: Cleaning device

Detailed ways

The specific implementation, structure, features and functions of the chemical supply system and its valve box design according to the present invention will be described in detail below with reference to the accompanying drawings and preferred embodiments.

In order to solve the situation that the chemical supply system used for multi-floors in the prior art is often limited or unable to supply, the present invention proposes a chemical supply system with a new structure, which uses multiple main pipelines to distribute chemicals to Different floors, where the chemical is, for example, a chemical reagent or gas, to solve the problem of current limitation or failure to supply when the main pipeline is branched into multiple pipelines in the prior art to supply chemical reagents or gases to different floors .

Please refer to FIG. 1 , which is a schematic diagram of a chemical supply system according to a preferred embodiment of the present invention. The chemical supply system of the present invention is suitable for distributing chemicals to multiple points of use (POUs) on multiple floors, wherein the chemicals are, for example, chemical reagents or gases, and these use points include the first The use ends 106a, 106b of one floor are arranged at the use ends 206a, 206b of the second floor, or even the use ends 306a, 306b of other floors. If the chemical supply system of the present invention is applied in a semiconductor factory, the above-mentioned end of use is, for example, an etching machine or a deposition machine or other process equipment.

The chemical supply system proposed by the present invention includes a chemical supply device 100 disposed on the first floor, a chemical supply device 200 disposed on the second floor, a chemical supply device 300 disposed on other floors (such as the Nth floor) and Several main pipes 110a, 110b, 110c. In addition, the chemical supply system of the present invention further includes valve boxes 104, 204, 304 disposed on the pipelines of each floor.

Wherein, the chemical supply device 100 disposed on the first floor has a control unit 102, which is used to control the supply of chemical reagents or gases on all floors in the factory. The chemical supply device 100 includes conventionally known and commonly used device units such as a pressurizing unit (pump). And several main pipes 110a, 110b, 110c are all communicated with the chemical supply device 100, wherein the main pipe 110a is used to distribute chemical reagents or gases to the use ends 106a, 106b of the first floor, and between the chemical supply device 100 and The main pipeline 110a between the use ends 106a, 106b further includes a valve box 104 for controlling the supply of chemical reagents or gases distributed to each use end 106a, 106b.

The other main pipeline 110b is connected between the chemical supply device 100 and the chemical supply device 200 on the second floor. Under the control of the control unit 102, the chemical reagent or gas will be distributed from the chemical supply device 100 to the chemical supply device 100 through the main pipeline 110b. In the chemical supply device 200 on the second floor, the chemical reagent or gas is delivered to the use ends 206a, 206b on the second floor by the chemical supply device 200, and similarly, between the chemical supply device 200 and the use ends 206a, 206b The pipeline further includes a valve box 204, which is used to control the supply of chemical reagents or gases distributed to each use end 206a, 206b. Of course, the chemical supply device 200 also includes conventionally known and commonly used device units such as a pressurizing unit.

Therefore, in the chemical supply device 100, the chemical reagent or gas is distributed to the use ends 106a, 106b, 206a, 206b of the first floor and the second floor with separate main pipelines 110a, 110b, so the prior art can be solved. When the main pipeline is branched into several pipelines to distribute chemical reagents or gases to each floor, flow restriction or supply failure often occurs. Moreover, the present invention integrates the control system of the chemical supply device on each floor, and the single control unit 102 controls the supply state of the chemical reagent or gas on each floor, so that the chemical reagent or gas in the entire factory can be controlled. Supply status is easier to control.

If the chemical supply system of the present invention is applied in a factory with more than two floors, another main pipeline 110c is further connected to the chemical supply device 100 on the first floor to communicate with the chemical supply device 300 on the Nth floor . Similarly, under the control of the control unit 102, the chemical reagent or gas will be distributed from the chemical supply device 100 to the chemical supply device 300 on the Nth floor through the main pipeline 110c, and then the chemical supply device 300 will deliver the chemical reagent or gas. Gas to the use ends 306a, 306b on the Nth floor. Moreover, the pipeline between the chemical supply device 300 and the use ends 306a, 306b also includes a valve box 304 for controlling the supply amount of chemical reagents or gases distributed to each use end 306a, 306b. Of course, the chemical supply device 300 also includes conventionally known and commonly used device units such as a pressurizing unit.

It is particularly worth mentioning that the chemical supply device 100 further includes several reserved interfaces 112, which provide additional main pipeline interfaces, so that when the chemical reagent or gas consumption on a certain floor increases, additional connections can be added. Install main lines to meet the needs of this floor. Of course, the reserved interface 112 can also be reserved for the main pipeline connected to other floors when the factory adds floors.

In addition, in the chemical supply system of the present invention, valve boxes (104, 204, 206 as shown in Fig. Control the amount of chemical reagents or gases distributed to each end of use. Due to the long-term use of the chemical supply system, chemicals or chemical fumes are often found on the pipeline, especially in the pipeline near the valve box. Not only will it affect the visibility of the pipeline, but it may also cause contamination of other equipment components. Therefore, the present invention further proposes a valve box design to solve the above-mentioned problems.

Referring to FIG. 2, the valve box of the present invention is installed on a pipeline 402 between a supply end 400 and several use ends 406a, 406b. The supply end 400 is, for example, the chemical supply device 100 of FIG. 1 , 200 or 300, and the use end 406a, 406b is, for example, each process tool. The valve box includes a valve box body 404 , a discharge device 408 and a cleaning device 410 . The valve box main body 404 communicates with the supply end 400 and communicates with the use ends 406a, 406b through the pipeline 402 . The discharge device 408 communicates with the main body of the valve box to discharge pollutants in the main body 404 of the valve box and the pipeline 402 . The cleaning device 410 communicates with the valve box main body 404 and is used for feeding cleaning materials to purify the valve box main body 404 and the pipeline 402 . Of course, the cleaning materials passed in will also be discharged from the discharge device 408 . In a preferred embodiment, the cleaning device 410 is, for example, an air purge (air purge) device, by passing clean air into the valve box main body 404 and the pipeline 402 to remove the seeping chemicals or chemical fumes , thereby improving the visibility of the pipeline and avoiding contamination of equipment components.

The above-mentioned design of the valve box is not limited to other types of supply systems or distribution systems in the chemical supply system of the present invention. As long as the valve box is used in the system, the valve box of the present invention can be used.

The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Anyone familiar with this field Those skilled in the art, without departing from the scope of the technical solution of the present invention, can use the technical content disclosed above to make some changes or modify equivalent embodiments with equivalent changes, but all the content that does not depart from the technical solution of the present invention, according to the present invention Any simple modifications, equivalent changes and modifications made to the above embodiments by the technical essence still belong to the scope of the technical solution of the present invention.

Claims (6)

1, a kind of chemical supply system, it is to be applicable to dispensing one chemicals a plurality of using ends of floor at the most, it is characterized in that this chemistry supply system comprises:

One first chemical feeding mechanism is configured in one first floor, wherein has a control unit in this first chemical feeding mechanism;

A plurality of main lines, it is to be communicated with this first feeding mechanism, and those main lines one of them be to be used for providing and delivering the using end of these chemicals to this first floor; And

One second chemical feeding mechanism, be configured in one second floor, and another those main lines are to be communicated to this second chemical feeding mechanism by this first chemical feeding mechanism, so that this chemicals can be delivered to this second chemical feeding mechanism, and then be distributed to the using end of this second floor by the control of this control unit.

2, chemical supply system according to claim 1 is characterized in that more comprising in the wherein said first chemical feeding mechanism that design has a plurality of spare interfaces, in order to additionally to install main line additional.

3, chemical supply system according to claim 1, it is characterized in that it more comprises a plurality of clack boxes, be configured between the using end of this first chemical feeding mechanism and this first floor, and between the using end of this second chemical feeding mechanism and this second floor, wherein each those clack box comprises:

One clack box main body, this clack box main body are and corresponding this chemistry feeding mechanism is communicated with, and are communicated with corresponding those using ends;

One tapping equipment, it is to be communicated with this clack box main body, in order to give off the pollutant in the pipeline; And

One washing unit, it is to be communicated with this clack box main body, cleans thing to purify pipeline in order to feed.

4, chemical supply system according to claim 3 is characterized in that wherein said washing unit comprises an air cleaning device, in order to bubbling air to purify pipeline.

5, chemical supply system according to claim 1, it is characterized in that it more comprises at least one chemical feeding mechanism, be configured in each above floor of this second floor respectively, wherein each those chemical feeding mechanism all is communicated with this first chemical feeding mechanism with the main line that separates respectively, and by this control unit from this first chemical feeding mechanism provide and deliver these chemicals to each those chemical feeding mechanisms, and then the using end of these chemicals of providing and delivering to each floor.

6, chemical supply system according to claim 1, it is characterized in that wherein said chemicals be selected from group that a chemical reagent and a gas forms one of them.

Images