CN113867106B - Mask table vibration isolation device of lithography machine - Google Patents
Mask table vibration isolation device of lithography machine Download PDFInfo
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- CN113867106B CN113867106B CN202111110725.2A CN202111110725A CN113867106B CN 113867106 B CN113867106 B CN 113867106B CN 202111110725 A CN202111110725 A CN 202111110725A CN 113867106 B CN113867106 B CN 113867106B
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- 238000002955 isolation Methods 0.000 title claims abstract description 34
- 238000001459 lithography Methods 0.000 title claims abstract description 21
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 25
- 239000010432 diamond Substances 0.000 claims abstract description 25
- 239000010935 stainless steel Substances 0.000 claims description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims description 7
- 229910001374 Invar Inorganic materials 0.000 claims description 3
- 229910000639 Spring steel Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 12
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000001629 suppression Effects 0.000 abstract description 2
- 230000000712 assembly Effects 0.000 description 19
- 238000000429 assembly Methods 0.000 description 19
- 239000000463 material Substances 0.000 description 10
- 238000001259 photo etching Methods 0.000 description 7
- 230000033001 locomotion Effects 0.000 description 6
- 238000009434 installation Methods 0.000 description 5
- 239000010438 granite Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000013016 damping Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011900 installation process Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
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- 238000012545 processing Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
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- 238000005286 illumination Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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Abstract
The invention relates to the field of vibration suppression, and discloses a mask table vibration isolation device of a lithography machine, which comprises the following components: the mask table comprises a mask table base, a projection objective sleeve and a connecting device for connecting the mask table base and the projection objective sleeve, wherein the connecting device is a device with flexible support, and a hinge which is vertically arranged is arranged in a diamond shape. The beneficial effects of the invention are as follows: the mask table base and the projection objective sleeve are connected in a mode of being changed from rigid connection to flexible connection through the flexible connecting device, four supporting components of the connecting device are arranged in a square mode, the supporting is stable and reliable, and meanwhile the connecting device has the characteristic of low rigidity and even zero rigidity in the horizontal direction of the mask table by utilizing the vertically placed hinge, so that the vibration isolation effect is achieved in the horizontal direction of the mask table.
Description
Technical Field
The invention relates to the field of vibration suppression, in particular to a mask table vibration isolation device of a lithography machine.
Background
In the development of the Integrated Circuit (IC) industry, photolithography has played a vital role. The photoetching machine, which is represented by the method, integrates ultra-precise measurement, motion control technology and photoetching technology into a whole, and realizes the function of exposing the chip pattern on the mask plate onto the silicon chip on the workpiece table. In a stepper, a mask table is used to expose and etch a mask pattern onto a wafer by means of a light source illumination system, a projection objective and a workpiece table, wherein the mask table system base is directly rigidly connected to the top of the projection objective sleeve. In the working process of the mask table of the photoetching machine, fine vibration generated by the mask table in high-speed and high-acceleration motion is easy to cause deviation of alignment positions between the mask table and a projection objective lens connected with the mask table, and the photoetching quality of a subsequent wafer can be directly influenced even if the precision of the photoetching machine is in a nanometer level and even in a very small position deviation. In order to eliminate the influence of vibration factors on the movement and positioning precision of a mask table of a photoetching machine, a supporting device connected with the base of a mask table system and the top of a projection objective sleeve is required to have vibration isolation and supporting functions. However, in the prior art there is no vibration isolation support specifically designed for the connection of the mask table system base to the projection objective sleeve top.
Disclosure of Invention
The utility model provides a mask table vibration isolation device of a lithography machine, which not only can support a mask table base to be stably fixed on a projection objective sleeve, but also can realize vibration isolation of the mask table in the horizontal direction and improve lithography quality and precision.
The purpose of the application is realized through the following technical scheme:
a mask table vibration isolation device of a lithography machine comprises: a mask table base, a projection objective sleeve, and a connecting device connecting the mask table base and the projection objective sleeve;
the connecting device comprises two first support components and two second support components, wherein the two first support components and the two second support components are positioned on the same plane, and the first support components comprise: the device comprises a first bottom connecting part, a first top connecting part and a first hinge, wherein two sides of the first hinge are respectively connected with the first bottom connecting part and the first top connecting part, the first top connecting part is connected with a mask table base, and the first bottom connecting part is connected with a projection objective sleeve;
the second support assembly includes: the two sides of the second hinge are respectively connected with the second bottom connecting part and the second top connecting part, the second top connecting part is connected with the mask table base, and the second bottom connecting part is connected with the projection objective sleeve;
viewed in a top view of the connection device:
two first connecting lines are formed by extending along the length direction of the two first hinges, two second connecting lines are formed by extending along the length direction of the two second hinges, two first connecting lines and two second connecting lines enclose to form a diamond, and the geometric center of the cross section of the two first hinges encloses to form a square with the connecting lines of the geometric center of the cross section of the two second hinges.
In some embodiments of the present application, the smaller interior angle of the diamond is 60 ° to 90 °, and the larger interior angle of the diamond is 90 ° to 120 °.
In some embodiments of the present application, the smaller interior angle of the diamond is 80 ° to 90 °, and the larger interior angle of the diamond is 90 ° to 100 °.
In some embodiments of the present application, the mask stage further comprises four connecting plates, wherein the four connecting plates are respectively disposed between the two first top connecting portions and the mask stage base, between the two second top connecting portions and the mask stage base, and the areas of the four connecting plates are larger than the areas of the first top connecting portions and the second top connecting portions.
In some embodiments of the present application, one of the bottom surfaces of the first bottom connecting portion is provided with a first positioning pin hole, the other of the bottom surfaces of the first bottom connecting portion is provided with a second positioning pin hole, the first positioning pin hole is a circular hole, the second positioning pin hole is a kidney-shaped hole, and a positioning pin is arranged at a corresponding position of the top surface of the projection objective sleeve.
In some embodiments of the present application, a first positioning pin hole is formed in the bottom surface of the second bottom connecting portion, a second positioning pin hole is formed in the bottom surface of the second bottom connecting portion, the first positioning pin hole is a circular hole, a waist-shaped hole is formed in the second positioning pin hole, and a positioning pin is arranged at a corresponding position of the top surface of the projection objective sleeve.
In some embodiments of the present application, the geometric center of the mask stage base, the geometric center of the diamond shape, and the central axis of the projection objective sleeve are located on a straight line.
In some embodiments of the present application, the minimum thickness of the first hinge and the second hinge is 1-3 mm, the radius of the circular incision semicircle of the first hinge and the second hinge is 6-9 mm, and the structures of the first hinge and the second hinge are the same.
In some embodiments of the present application, the material of the connection device is spring steel, stainless steel or invar.
In some embodiments of the present application, the first bottom connection portion and the first top connection portion are arranged vertically in a horizontal direction, and the second bottom connection portion and the second top connection portion are arranged vertically in a horizontal direction.
Compared with the prior art, the mask table vibration isolation device of the photoetching machine has the beneficial effects that: the utility model provides a mask table vibration isolation device of lithography machine sets up connecting device between mask table base and projection objective sleeve, changes traditional rigid connection into flexonics, through top connecting portion, hinge and the bottom connecting portion that from the top down set gradually in the connecting device to adopt the supporting point to be square form of arranging with mask table base and projection objective sleeve and be connected, support steadily reliably, and hinge structure's connecting device has the characteristic of low rigidity even zero rigidity in mask table horizontal direction, and then plays vibration isolation effect in mask table horizontal direction.
Drawings
FIG. 1 is a schematic overall structure of the present solution;
FIG. 2 is a bottom view of the connection device in the first support assembly;
FIG. 3 is a bottom view of the connection device in the second support assembly;
FIG. 4 is a schematic top view of the arrangement of the hinge of the present embodiment at a first angle;
FIG. 5 is a schematic top view of the arrangement of the hinge of the present embodiment at a second angle;
FIG. 6 is a front view of the first support assembly of the present embodiment;
FIG. 7 is a left side view of the first support assembly of the present solution;
FIG. 8 is a top view of the first support assembly of the present embodiment;
fig. 9 is a perspective view of the first support assembly of the present embodiment;
FIG. 10 is a front view of the second support assembly of the present embodiment;
FIG. 11 is a left side view of the second support assembly of the present solution;
FIG. 12 is a top view of the second support assembly of the present embodiment;
fig. 13 is a perspective view of the second support assembly of the present embodiment.
In the figure, 1, a mask stage base; 2. a connecting device; 21. a first support assembly; 211. a first bottom connection; 212. a first hinge; 2121. a first connecting line; 213. a first top connection; 22. a second support assembly; 221. a second bottom connection; 222. a second hinge; 2221. a second connecting line; 223. a second top connection; 3. a projection objective sleeve; 4. a connecting plate; 5. a first positioning pin hole; 6. and a second locating pin hole.
Detailed Description
The following describes in further detail the embodiments of the present invention with reference to the drawings and examples. The following examples are illustrative of the invention and are not intended to limit the scope of the invention.
In the description of the present application, it should be understood that the use of the terms "bottom," "top," "center," and the like in this application indicates an orientation or a positional relationship based on that shown in the drawings, merely for convenience in describing the present invention and simplifying the description, and does not indicate or imply that the apparatus or element in question must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
As shown in fig. 1-13, an embodiment of the present application provides a mask stage vibration isolation device of a lithography machine, including: a mask table base 1, a projection objective sleeve 3, and a connecting device 2 connecting the mask table base 1 and the projection objective sleeve 3;
the connecting device 2 comprises two first support assemblies 21 and two second support assemblies 22, the two first support assemblies 21 and the two second support assemblies 22 are in the same plane, and the first support assemblies 21 comprise: the first bottom connecting part 211, the first top connecting part 213 and the first hinge 212, wherein two sides of the first hinge 212 are respectively connected with the first bottom connecting part 211 and the first top connecting part 213, the first top connecting part 213 is connected with the mask table base 1, and the first bottom connecting part 211 is connected with the projection objective sleeve 3;
the second support assembly 22 includes: a second bottom connecting portion 221, a second top connecting portion 223, and a second hinge 222, wherein two sides of the second hinge 222 are respectively connected with the second bottom connecting portion 221 and the second top connecting portion 223, the second top connecting portion 223 is connected with the mask stage base 1, and the second bottom connecting portion 221 is connected with the projection objective sleeve 3;
viewed in a top view of the connection device 2:
two first connection lines 2121 are formed along the length direction of the two first hinges 212, two second connection lines 2221 are formed along the length direction of the two second hinges 222, the two first connection lines 2121 and the two second connection lines 2221 form a diamond shape, and the two connection lines of the geometric centers of the cross sections of the two first hinges 212 and the geometric centers of the cross sections of the two second hinges 222 form a square shape.
Based on the above technical scheme, the connecting device 2 is added between the mask table base 1 and the projection objective sleeve 3, and the connecting device 2 comprises four hinges which are vertically placed, so that the original rigid connection between the mask table base 1 and the projection objective sleeve 3 is changed into flexible connection, and the vibration reduction effect is achieved. Meanwhile, the length extending directions of the four hinges can form a diamond structure, the structure not only can realize negative stiffness vibration isolation in the horizontal direction, but also is stable and reliable in the whole supporting structure.
The negative stiffness vibration isolation principle is described herein, and according to the vibration theory, the mode of the transfer function of the passive vibration isolation displacement to the displacement in the vibration is:
As can be seen from formula (1), when
In this case, the vibration isolation effect is achieved, and therefore, if the vibration damping effect is to be good, only the natural frequency of the object needs to be reduced, that is, only the rigidity k of the object needs to be reduced.
For the first support component 21 and the second support component 22, the first hinge 212 and the second hinge 222 can be simplified into euler compression bar models with fixed two ends, and then the theoretical model of the horizontal rigidity is:
k＝6EI[1-(p/p cr )]/l 3 (2)
wherein p is cr ＝4π 2 EI/l 2 The critical load of the hinge is E, the elastic modulus of the hinge is E, the cross section moment of inertia at the center of the hinge is I, the axial length of the hinge is l, and p is the axial load applied to the hinge.
As can be seen from equation (2), when the hinge is subjected to an axial load greater than the critical load (p>p cr ) When the horizontal rigidity of the hinge is negative, the natural frequency of the horizontal direction of the object is low, and the vibration isolation effect is good in the horizontal direction.
As can be seen from the above description, the mask stage of the lithography machine adopts the above-mentioned connecting device 2, and the vibration of the mask stage base 1 in the horizontal direction can be reduced by the horizontal negative stiffness characteristic of the connecting device 2, the flexible deformation generated by the vibration impact and the support with stable square installation layout, so as to reduce the positioning and movement errors caused by the horizontal direction movement impact and vibration of the mask stage during the high-speed and high-acceleration movement, and ensure the lithography precision of the lithography machine.
In some embodiments of the present application, as shown in fig. 4, the smaller inner angle of the diamond is 60 ° to 90 °, the larger inner angle of the diamond is 90 ° to 120 °, the position layout of the four hinges is more reasonable due to this angular arrangement, and the vibration isolation effect of the connecting line direction between the two larger inner angles of the diamond is obviously stronger than that of the connecting line direction between the two smaller inner angles of the diamond, and since the problem that vibration of a certain direction is large may exist in the working process of the lithography machine, the vibration isolation effect of the lithography machine in a certain direction may be changed by adjusting the angle.
Preferably, as shown in fig. 5, the smaller inner angle of the diamond is 80 ° to 90 °, the larger inner angle of the diamond is 90 ° to 100 °, the vibration isolation effect tends to be balanced in the connection direction between the two larger inner angles of the diamond and the connection direction between the two smaller inner angles of the diamond, more preferably, the four inner angles of the diamond are all 90 °, at this time, the vibration isolation effect on the two diagonal lines of the diamond is basically completely balanced, the vibration isolation effect is better, the arrangement positions of the four hinges are more reasonable, and the support is stable.
In some embodiments of the present application, as shown in fig. 1-3, four connection plates 4 are further included, where four connection plates 4 are respectively disposed between two first top connection portions 213 and the mask stage base 1 and between two second top connection portions 223 and the mask stage base 1, and the areas of four connection plates 4 are larger than the areas of the first top connection portions 213 and the second top connection portions 223. The mask table base 1 of the lithography machine is generally made of granite, while the flexible supporting component is generally made of stainless steel, and since the hardness of the stainless steel is far greater than that of the granite, the granite at the joint is easily damaged due to direct connection, so that the connecting plates 4 are required to be arranged between the mask table base 1 and the flexible supporting component, and the areas of the four connecting plates 4 are respectively greater than those of the first top connecting portion 213 and the second top connecting portion 223, so as to increase the contact area, avoid the damage of the mask table base 1 caused by overlarge contact stress, and protect the mask table base 1.
Preferably, the hardness of the material of the connection plate 4 is between the hardness of the material used for the mask stage base 1 and the first top connection portion 213 and the second top connection portion 223, and the material with the hardness between the two is used to perform the transitional and buffering effects between the mask stage base 1 and the four top connection portions, so that the mask stage base 1 can be better protected.
In some embodiments of the present application, as shown in fig. 2, a first positioning pin hole 5 is disposed on the bottom surface of the first bottom connecting portion 211, a second positioning pin hole 6 is disposed on the bottom surface of the first bottom connecting portion 211, and the first positioning pin hole 5 is a circular hole, the second positioning pin hole 6 is a kidney-shaped hole, and positioning pins are disposed at corresponding positions on the top surface of the projection objective sleeve 3, and because the distance between the two first support assemblies 21 is relatively large, and the position requirements of the four support assemblies are very strict, positioning needs to be achieved through the first positioning pin hole 5 and the second positioning pin hole 6. Firstly, mounting a positioning pin at a pin hole position at the top of a projection objective sleeve 3, then placing a mask table base 1 on which a connecting device 2 is mounted above the projection objective sleeve 3, and placing a first positioning pin hole 5 on the bottom surface of a first bottom connecting part 211 in alignment with the positioning pin, wherein the first positioning pin hole 5 is a circular hole, and the shape of the first positioning pin hole is matched with that of the positioning pin, so that the positioning can be accurately performed; the second positioning pin hole 6 on the bottom surface of the other first bottom connecting portion 211 is a kidney-shaped hole, and the semi-circle diameter on the kidney-shaped hole is matched with the positioning pin, so that the positioning pin can move along the length direction of the kidney-shaped hole, and the problem that the positioning pin and the second positioning pin hole 6 are misplaced due to processing or installation errors and cannot be installed is avoided; the two second support assemblies 22 are not provided with positioning pin holes, and in the actual installation process, the two second support assemblies 22 can be installed after the two first support assemblies 21 are installed, so that the installation errors and machining errors of the two first support assemblies 21 are compensated, and the fact that the four support assemblies can be assembled into the whole system is ensured.
Similarly, as shown in fig. 3, a first positioning pin hole 5 is formed on the bottom surface of one second bottom connecting portion 221, a second positioning pin hole 6 is formed on the bottom surface of the other second bottom connecting portion 221, the first positioning pin hole 5 is a circular hole, the second positioning pin hole 6 is a kidney-shaped hole, and positioning pins are disposed at corresponding positions on the top surface of the projection objective sleeve 3, and as the distance between the two second support assemblies 22 is relatively large, and the position requirements of the four support assemblies are very strict, positioning needs to be achieved through the first positioning pin hole 5 and the second positioning pin hole 6. Firstly, mounting a positioning pin at a pin hole position at the top of a projection objective sleeve 3, then placing a mask table base 1 on which a connecting device 2 is mounted above the projection objective sleeve 3, and placing a first positioning pin hole 5 on the bottom surface of a second bottom connecting part 221 in alignment with the positioning pin, wherein the first positioning pin hole 5 is a circular hole, and the shape of the first positioning pin hole is matched with that of the positioning pin, so that the positioning can be accurately performed; the second positioning pin hole 6 on the bottom surface of the other second bottom connecting part 221 is a kidney-shaped hole, and the semi-circle diameter on the kidney-shaped hole is matched with the positioning pin, so that the positioning pin can move along the length direction of the kidney-shaped hole, and the problem that the positioning pin and the second positioning pin hole 6 are misplaced due to processing or installation errors and cannot be installed is avoided; the two first support assemblies 21 are not provided with positioning pin holes, and in the actual installation process, the two first support assemblies 21 can be installed after the two second support assemblies 22 are installed, so that the installation errors and machining errors of the two second support assemblies 22 are compensated, and the fact that the four support assemblies can be assembled into the whole system is ensured.
In some embodiments of the present application, as shown in fig. 1, the geometric center of the mask stage base 1, the geometric center of the diamond shape, and the central axis of the projection objective sleeve 3 are located on a straight line, and the centers of the three are located on a straight line, so that the lithography precision can be ensured, and the four-point support of the diamond shape is more stable.
In some embodiments of the present application, the minimum thickness of the first hinge 212 and the second hinge 222 is 1-3 mm, and the radius of the semicircular circular cut of the first hinge 212 and the second hinge 222 is 6-9 mm, and the structures of the first hinge 212 and the second hinge 222 are the same, herein, the basis for selecting the minimum thickness of the hinge is that, first, in order to achieve stable and reliable support, according to the material axial tension and compression allowable stress in the material mechanics, the strength of the bearing section is required to be within the allowable stress when the hinge works, and when the limit condition that a single hinge supports the whole mask stage is taken, the cross-sectional area of the hinge is:
A≥F N,max /[σ]＝G max /[σ] (3)
where a=d×l is the minimum cross-sectional area allowed by the hinge, d is the minimum thickness of the hinge, and l is the hinge length; f (F) N,max G for maximum load force applied max For the maximum weight of the mask stage, [ sigma ]]Is the allowable stress of the material.
The mask stage of a conventional lithography machine generally has a weight of 30kg to 90kg, a mask stage having a mass of 90kg is taken as a support object, stainless steel 304 is selected as a hinge material, the allowable stress of the stainless steel 304 is [ sigma ] =137 MPa, and as shown in fig. 6 to 13, as example data, the first hinge 212 and the second hinge 222 have a length of 56.57mm, a width of 15mm, and a minimum thickness of 1.5mm, and when the minimum thickness of the first hinge 212 or the second hinge 222 having the smallest bearing area is selected as a limit case of a single hinge support, it is known from the formula (3) that the minimum thickness of the first hinge 212 or the second hinge 222 is:
d≥G max /([σ]·l) (4)
as can be seen from equation (4), the minimum thickness of the first hinge 212 or the second hinge 222 is 0.14mm, and the thickness range of this embodiment is 1 mm-3 mm far above the minimum thickness requirement, and meets the design requirement.
In some embodiments of the present application, the material of the connection device 2 is spring steel, stainless steel or invar, which has the advantages of high durability, high fatigue strength, small thermal deformation, high stability, good corrosion resistance, and the like, and is easy to obtain, and is particularly suitable for being used as a structural material of a flexible support.
In some embodiments of the present application, as shown in fig. 6-13, the first bottom connecting portion 211 and the first top connecting portion 213 are vertically arranged in a horizontal direction, and the second bottom connecting portion 221 and the second top connecting portion 223 are vertically arranged in a horizontal direction, so that the bearing capacity of the whole support assembly in the orthogonal direction in the horizontal plane is uniform, and as a preferred embodiment, the six connecting portions are all cuboid structures, and the length of the cuboid structures is 70mm, the width is 40mm, and the height is 15mm.
In addition, besides the circular notch type flexible hinge, the scheme can also use a leaf spring, a hyperbolic type flexible hinge, a parabolic type flexible hinge, a reverse parabolic type flexible hinge, a secant type flexible hinge or a hyperbolic cosine type flexible hinge, and the vibration isolation and support functions of the scheme can be realized.
To sum up, the mask table vibration isolation device of the lithography machine of the application sets up connecting device 2 between mask table base 1 and projection objective sleeve 3, converts traditional rigid connection into flexible connection, through top connecting portion, hinge and bottom connecting portion that from the top down set gradually in connecting device 2 to adopt the supporting point to be square form of arranging and be connected mask table base 1 and projection objective sleeve 3, support steadily reliably, and hinge structure's connecting device 2 has the characteristic of low rigidity even zero rigidity in mask table horizontal direction, and then plays vibration isolation effect in mask table horizontal direction.
The foregoing is merely a preferred embodiment of the present application and it should be noted that modifications and substitutions will now occur to those skilled in the art without departing from the technical principles of the present application, and these modifications and substitutions should also be considered to be within the scope of the present application.
Claims (7)
1. A mask table vibration isolation device of a lithography machine is characterized by comprising: a mask table base, a projection objective sleeve, and a connecting device connecting the mask table base and the projection objective sleeve;
the connecting device comprises two first support components and two second support components, wherein the two first support components and the two second support components are positioned on the same plane, and the first support components comprise: the first hinge is a circular notch type flexible hinge, the first hinge is vertically arranged, two sides of the first hinge are respectively connected with the first bottom connecting part and the first top connecting part, the first top connecting part is connected with the mask table base, and the first bottom connecting part is connected with the projection objective sleeve;
the second support assembly includes: the first hinge and the second hinge have the same structure, the second hinge is a circular notch type flexible hinge, the second hinge is vertically arranged, two sides of the second hinge are respectively connected with the second bottom connecting part and the second top connecting part, the second top connecting part is connected with the mask table base, and the second bottom connecting part is connected with the projection objective sleeve; the four connecting plates are respectively arranged between the two first top connecting parts and the mask table base and between the two second top connecting parts and the mask table base, and the areas of the four connecting plates are larger than the areas of the first top connecting parts and the second top connecting parts;
viewed in a top view of the connection device:
two first connecting lines are formed along the length direction of the two first hinges, two second connecting lines are formed along the length direction of the two second hinges, the two first connecting lines and the two second connecting lines are enclosed to form a diamond, the smaller inner angle of the diamond is 80-90 degrees, the larger inner angle of the diamond is 90-100 degrees, and the geometric center of the cross section of the two first hinges and the connecting lines of the geometric center of the cross section of the two second hinges are enclosed to form a square.
2. The mask table vibration isolation device of claim 1, wherein a first positioning pin hole is formed in the bottom surface of one first bottom connecting portion, a second positioning pin hole is formed in the bottom surface of the other first bottom connecting portion, the first positioning pin hole is a circular hole, the second positioning pin hole is a kidney-shaped hole, and a positioning pin is arranged at a corresponding position on the top surface of the projection objective sleeve.
3. The mask table vibration isolation device of a lithography machine according to claim 1, wherein a first positioning pin hole is formed in the bottom surface of one second bottom connecting portion, a second positioning pin hole is formed in the bottom surface of the other second bottom connecting portion, the first positioning pin hole is a circular hole, a kidney-shaped hole is formed in the second positioning pin hole, and a positioning pin is arranged at a corresponding position on the top surface of the projection objective sleeve.
4. The mask stage vibration isolation apparatus of claim 1, wherein the geometric center of the mask stage base, the geometric center of the diamond shape, and the central axis of the projection objective sleeve are located on a straight line.
5. The vibration isolation device of a mask table of a lithography machine according to claim 1, wherein the minimum thickness of the first hinge and the second hinge is 1-3 mm, and the radius of the semicircle of the circular notch of the first hinge and the radius of the semicircle of the circular notch of the second hinge are 6-9 mm.
6. The mask stage vibration isolation device of claim 1, wherein the connecting means is made of spring steel, stainless steel or invar.
7. The mask table vibration isolation device of claim 1, wherein the first bottom connecting portion and the first top connecting portion are arranged vertically in a horizontal direction, and the second bottom connecting portion and the second top connecting portion are arranged vertically in a horizontal direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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| TWI266151B (en) * | 2002-07-11 | 2006-11-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| CN101581347B (en) * | 2009-06-23 | 2011-01-19 | 上海微电子装备有限公司 | Vibration reduction support device and photoetching machine using same |
| TWI514087B (en) * | 2009-08-07 | 2015-12-21 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
| CN103867622B (en) * | 2012-12-11 | 2016-02-03 | 上海微电子装备有限公司 | A kind of flexible apparatus for vibration isolation and use the lithographic equipment of this device |
| CN103062319B (en) * | 2012-12-19 | 2015-05-06 | 哈尔滨工业大学 | Zero-stiffness vibration isolator with two-dimensional flexible hinge angle decoupling characteristic and vibration isolating system |
| CN103982587B (en) * | 2013-02-07 | 2016-06-01 | 上海微电子装备有限公司 | The flexible supporting device of lithography machine and flexible strutting piece |
| CN104076612B (en) * | 2013-03-27 | 2016-04-20 | 上海微电子装备有限公司 | Heavy load flexible supporting device |
| CN107797217B (en) * | 2016-08-30 | 2020-04-10 | 上海微电子装备（集团）股份有限公司 | Projection objective supporting device and photoetching machine equipment |
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