CN113405782A - Wide-range distortion measuring device - Google Patents
Wide-range distortion measuring device Download PDFInfo
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- CN113405782A CN113405782A CN202110858830.8A CN202110858830A CN113405782A CN 113405782 A CN113405782 A CN 113405782A CN 202110858830 A CN202110858830 A CN 202110858830A CN 113405782 A CN113405782 A CN 113405782A
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- 238000005259 measurement Methods 0.000 claims abstract description 33
- 238000005286 illumination Methods 0.000 claims abstract description 17
- 230000003287 optical effect Effects 0.000 claims abstract description 15
- 238000013519 translation Methods 0.000 claims description 17
- 238000003384 imaging method Methods 0.000 claims description 14
- 239000004579 marble Substances 0.000 claims description 13
- 239000005337 ground glass Substances 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 239000010937 tungsten Substances 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 6
- 210000001747 pupil Anatomy 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000010330 laser marking Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 238000012360 testing method Methods 0.000 claims description 3
- -1 tungsten halogen Chemical class 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Length Measuring Devices By Optical Means (AREA)
Abstract
本发明公开了一种宽范围的畸变测量装置，包括畸变靶标模块、大视场平行光管、调整台模块、照明光源；所述大视场平行光管位于畸变靶标模块中间部分，光轴与畸变靶标模块中心法线重合；调整台模块位于地面，与地面通过膨胀螺钉连接；照明光源位于畸变靶标两侧，用于畸变靶标照明。本发明将测量小视场光电测量系统的大视场平行光管和测量大视场光电测量系统的标准畸变靶标合理的结合在同一光电测量系统中，大大简化了光电测量的复杂度。使光电测量系统在军事上的应用更加简便。
The invention discloses a wide-range distortion measurement device, comprising a distortion target module, a large field of view collimator, an adjustment stage module, and an illumination light source; the large field of view collimator is located in the middle part of the distortion target module, and the optical axis is the same as the one in the middle of the distortion target module. The center normal of the distortion target module is coincident; the adjustment stage module is located on the ground, and is connected to the ground through expansion screws; the illumination light source is located on both sides of the distortion target for illumination of the distortion target. The invention reasonably combines the large-field collimator for measuring the small-field photoelectric measuring system and the standard distortion target for measuring the large-field photoelectric measuring system in the same photoelectric measuring system, which greatly simplifies the complexity of the photoelectric measurement. It makes the application of the photoelectric measurement system in the military easier.
Description
Technical Field
The invention relates to an optical system, in particular to a wide-range distortion measuring device.
Background
At present, the distortion of an optical system has a great influence on the measurement, and the distortion measuring devices on the market are only single small-field distortion measurement or large-field distortion measurement. The photoelectric system has the advantages of high precision, strong anti-interference performance and the like, and is widely applied to various fields, particularly military fields. However, the conventional small-field or large-field optoelectronic system has certain limitations, and in order to solve this problem, it is necessary to provide a wide-range distortion measuring apparatus.
Disclosure of Invention
The invention mainly aims to provide a wide-range distortion measuring device, which combines a large-view-field collimator for measuring the distortion of a small-view-field photoelectric system and a standard distortion target for measuring the distortion of the large-view-field photoelectric system to form a distortion comprehensive target for measuring the distortion of the large-view-field photoelectric system.
According to one aspect of the invention, a wide-range distortion measuring device is provided, which comprises a distortion target module, a large-view-field collimator, an adjusting table module and an illumination light source; the large-view-field collimator is positioned in the middle of the distortion target module, and the optical axis is superposed with the central normal of the distortion target module; the adjusting platform module is positioned on the ground and is connected with the ground through an expansion screw; the illumination light sources are positioned on two sides of the distortion target and used for illuminating the distortion target.
Further, the distortion target module comprises a marble supporting structure, an aluminum plate target pattern and a laser pointer; the marble supporting structure supports and fixes the marble panel through the two marble columns; the distorted pattern is made by laser marking, and the pattern is in a dot matrix-grid form.
Furthermore, the large-view-field collimator comprises a laser indicator installation datum, a shell structure, an objective lens, a reticle, ground glass and a halogen tungsten lamp; the shell structure is a supporting main body of the large-view-field collimator; the ground glass mainly has the function of enabling emergent light of a light source to be uniform; the halogen tungsten lamp is used for lighting the collimator reticle with a large view field and is supplied with power through a 12V direct current transformer.
Furthermore, the adjusting table module is used for adjusting the position, the pitch, the elevation (height) and the position (left and right) of the product; the adjusting platform module comprises a left-right translation adjusting platform, a height adjusting platform, an azimuth adjusting platform, a pitching adjusting platform, a rear translation guide rail and a laser range finder; the left-right translation adjusting platform is mainly used for left-right translation micro-motion of the product to the optical axis; the height adjusting platform is mainly used for lifting adjustment of a tested product so as to adapt to the tested products with different center heights; the azimuth and elevation adjusting platform is mainly used for adjusting the azimuth and elevation angle of a tested product, and is convenient for aligning an optical axis; the front and back translation guide rail is mainly used for adjusting the distance between the product and the target so as to adapt to the products of a telescopic system and a photographic system.
Still further, the illumination source is primarily used for distorted target illumination.
According to an aspect of the present invention, there is provided a wide-range distortion measuring apparatus method including: firstly, adjusting the alignment of a tested photoelectric imaging system and a test target plate, adjusting the distance between the tested photoelectric imaging system and a standard target according to the view field of the tested photoelectric system to ensure that a distorted target image is full of the view field of the tested photoelectric system, and adjusting the lifting, the direction, the pitching and the position of the tested photoelectric system according to the target image of a collimator tube with a large view field to ensure that the optical axis of the tested photoelectric system is aligned with the center of a distorted target;
and for an infinite imaging system with a view field of 10-22.5 degrees, a large-view-field collimator is adopted for measurement. Placing a distortion target on a focal plane, adjusting the position of a measured photoelectric system to ensure that an entrance pupil of the measured photoelectric system is superposed with an exit pupil of a large-view-field collimator, collecting an image of the distortion target, and analyzing by test software to obtain a distortion quantity; for an imaging system with a field of view of 22.5-90 degrees, standard distortion target measurement is adopted; the standard distortion target image shot by the photoelectric system to be measured is converted into a digital image through analog-to-digital conversion and transmitted to a computer, and the distortion quantity can be obtained through distortion measurement and analysis software; the distortion measurement adopts a polynomial model, the coordinates of the ideal image point position and the coordinates of the image point position in the distorted image are respectively represented by extracting image control points, a mathematical expression of the polynomial model is given, and the distortion measurement precision can be ensured to reach 0.5%.
The invention has the advantages that: the invention reasonably combines the large-view-field collimator for measuring the small-view-field photoelectric measurement system and the standard distortion target for measuring the large-view-field photoelectric measurement system in the same photoelectric measurement system, thereby greatly simplifying the complexity of photoelectric measurement. The application of the photoelectric measurement system in military affairs is simpler and more convenient.
In addition to the objects, features and advantages described above, other objects, features and advantages of the present invention are also provided. The present invention will be described in further detail below with reference to the drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention.
FIG. 1 is a schematic diagram of a wide range distortion measurement device of the present invention;
FIG. 2 is a schematic structural diagram of a distortion target module of the present invention;
FIG. 3 is a schematic diagram of the construction of a large field of view collimator of the present invention;
fig. 4 is a schematic structural diagram of the adjusting station module of the present invention.
Reference numerals:
1 is a distortion target module, 2 is a large-view-field collimator, 3 is an adjusting platform module, and 4 is an illumination light source;
11 is a marble supporting structure, 12 is an aluminum plate target pattern, and 13 is a laser indicator; 21 is a laser indicator installation reference, 22 is a shell structure, 23 is an objective lens, 24 is a reticle, 25 is ground glass, and 26 is a halogen tungsten lamp; 31 is a left and right translation adjusting table, 32 is a height adjusting table and an azimuth adjusting table, 33 is a pitching adjusting table, 34 is a rear translation guide rail, and 35 is a laser range finder.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example 1
Referring to fig. 1 to 4, a wide-range distortion measuring device includes a distortion target module 1, a large-view-field collimator 2, an adjusting table module 3, and an illumination light source 4; the large-view-field collimator 2 is positioned in the middle of the distortion target module 1, and the optical axis is superposed with the central normal of the distortion target module 1; the adjusting platform module 3 is positioned on the ground and is connected with the ground through an expansion screw; the illumination light sources 4 are positioned on two sides of the distortion target and used for illuminating the distortion target.
The distortion target module comprises a marble supporting structure 11, an aluminum plate target pattern 12 and a laser pointer 13; the marble supporting structure supports and fixes the marble panel through the two marble columns; the distorted pattern is made by laser marking, and the pattern is in a dot matrix-grid form.
The large-view-field collimator 2 comprises a laser indicator installation reference 21, a shell structure 22, an objective lens 23, a reticle 24, ground glass 25 and a halogen tungsten lamp 26; the housing structure 22 is the support body for the large field of view collimator; the ground glass mainly has the function of enabling emergent light of a light source to be uniform; the halogen tungsten lamp 26 is used for large-view field collimator reticle illumination and is powered by a 12V direct current transformer.
The adjusting platform module 3 is used for adjusting the position, pitch, elevation (height) and position (left and right) of a product; the adjusting platform module 3 comprises a left-right translation adjusting platform 31, a height adjusting platform 32, an azimuth adjusting platform 33, a back translation guide rail 34 and a laser range finder 35; the left-right translation adjusting platform is mainly used for left-right translation micro-motion of the product to the optical axis; the height adjusting platform is mainly used for lifting adjustment of a tested product so as to adapt to the tested products with different center heights; the azimuth and elevation adjusting platform is mainly used for adjusting the azimuth and elevation angle of a tested product, and is convenient for aligning an optical axis; the front and back translation guide rail is mainly used for adjusting the distance between the product and the target so as to adapt to the products of a telescopic system and a photographic system.
The illumination source 4 is mainly used for distortion target illumination.
Example 2
A wide range distortion measurement apparatus method, comprising: firstly, adjusting the alignment of a tested photoelectric imaging system (arranged in an adjusting platform module) and a test target plate, adjusting the distance between the tested photoelectric imaging system and a standard target according to the field of view of the tested photoelectric system to ensure that a distorted target image is full of the field of view of the tested photoelectric system, and adjusting the lifting, the direction, the pitching and the position of the tested photoelectric system according to a target image of a collimator with a large field of view to ensure that the optical axis of the tested photoelectric system is aligned with the center of a distorted target; and for an infinite imaging system with a view field of 10-22.5 degrees, a large-view-field collimator is adopted for measurement. Placing a distortion target on a focal plane, adjusting the position of a measured photoelectric system to ensure that an entrance pupil of the measured photoelectric system is superposed with an exit pupil of a large-view-field collimator, collecting an image of the distortion target, and analyzing by test software to obtain a distortion quantity; for an imaging system with a field of view of 22.5-90 degrees, standard distortion target measurement is adopted; the standard distortion target image shot by the photoelectric system to be measured is converted into a digital image through analog-to-digital conversion and transmitted to a computer, and the distortion quantity can be obtained through distortion measurement and analysis software; the distortion measurement adopts a polynomial model, the coordinates of the ideal image point position and the coordinates of the image point position in the distorted image are respectively represented by extracting image control points, a mathematical expression of the polynomial model is given, and the distortion measurement precision can be ensured to reach 0.5%.
The invention provides a photoelectric distortion measuring system device which can simultaneously measure distortion of large, medium and small fields of view through a distortion comprehensive target consisting of a large-field collimator and a real target. Wherein, a distortion target is placed on the focal plane of the collimator with a large view field, and the distortion of the infinite imaging system with a small view field is measured; the standard distortion target is used to measure the distortion of a large field-of-view imaging system.
The invention combines a large-view-field collimator for measuring the distortion of a small-view-field photoelectric system and a standard distortion target for measuring the distortion of a large-view-field photoelectric system to form a distortion comprehensive target for measuring the distortion of the large-view-field photoelectric system.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (6)
1. A wide-range distortion measuring device is characterized by comprising a distortion target module (1), a large-view-field collimator (2), an adjusting table module (3) and an illuminating light source (4); the large-view-field collimator (2) is positioned in the middle of the distortion target module (1), and the optical axis is superposed with the central normal of the distortion target module (1); the adjusting platform module (3) is positioned on the ground and is connected with the ground through an expansion screw; and the illumination light sources (4) are positioned on two sides of the distortion target and used for illuminating the distortion target.
2. The wide range distortion measurement apparatus of claim 1 wherein the distortion target module comprises a marble support structure (11), an aluminum plate target pattern (12), a laser pointer (13); the marble supporting structure supports and fixes the marble panel through the two marble columns; the distorted pattern is made by laser marking, and the pattern is in a dot matrix-grid form.
3. The wide range distortion measurement device of claim 1, wherein the large field of view collimator (2) comprises a laser pointer mounting datum (21), a housing structure (22), an objective lens (23), a reticle (24), ground glass (25), a tungsten halogen lamp (26); the shell structure (22) is a support body of the large-field collimator; the ground glass mainly has the function of enabling emergent light of a light source to be uniform; the halogen tungsten lamp (26) is used for the illumination of the large-view-field collimator reticle and is supplied with power through a 12V direct current transformer.
4. The wide range distortion measurement device of claim 1, wherein the adjustment stage module (3) is used for azimuth, pitch, elevation, position adjustment of the product; the adjusting platform module (3) comprises a left-right translation adjusting platform (31), a height adjusting platform (32), an azimuth and elevation adjusting platform (33), a rear translation guide rail (34) and a laser range finder (35); the left-right translation adjusting platform is mainly used for left-right translation micro-motion of the product to the optical axis; the height adjusting platform is mainly used for lifting adjustment of a tested product so as to adapt to the tested products with different center heights; the azimuth and elevation adjusting platform is mainly used for adjusting the azimuth and elevation angle of a tested product, and is convenient for aligning an optical axis; the front and back translation guide rail is mainly used for adjusting the distance between the product and the target so as to adapt to the products of a telescopic system and a photographic system.
5. The wide range distortion measurement apparatus of claim 1, wherein the illumination source (4) is primarily used for distortion target illumination.
6. A wide range distortion measurement device method, comprising: firstly, adjusting the alignment of a tested photoelectric imaging system and a test target plate, adjusting the distance between the tested photoelectric imaging system and a standard target according to the view field of the tested photoelectric system to ensure that a distorted target image is full of the view field of the tested photoelectric system, and adjusting the lifting, the direction, the pitching and the position of the tested photoelectric system according to the target image of a collimator tube with a large view field to ensure that the optical axis of the tested photoelectric system is aligned with the center of a distorted target; for an infinite imaging system with a view field of 10-22.5 degrees, a large-view-field collimator is adopted for measurement; placing a distortion target on a focal plane, adjusting the position of a measured photoelectric system to ensure that an entrance pupil of the measured photoelectric system is superposed with an exit pupil of a large-view-field collimator, collecting an image of the distortion target, and analyzing by test software to obtain a distortion quantity; for an imaging system with a field of view of 22.5-90 degrees, standard distortion target measurement is adopted; the standard distortion target image shot by the photoelectric system to be measured is converted into a digital image through analog-to-digital conversion and transmitted to a computer, and the distortion quantity can be obtained through distortion measurement and analysis software; the distortion measurement adopts a polynomial model, the coordinates of the ideal image point position and the coordinates of the image point position in the distorted image are respectively represented by extracting image control points, a mathematical expression of the polynomial model is given, and the distortion measurement precision can be ensured to reach 0.5%.
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| CN202110858830.8A CN113405782B (en) | 2021-07-28 | 2021-07-28 | A wide range distortion measurement device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114838917A (en) * | 2022-04-26 | 2022-08-02 | 孝感华中精密仪器有限公司 | A Distortion Comprehensive Target Device |
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| US5446536A (en) * | 1992-05-06 | 1995-08-29 | Nippon Sheet Glass Co., Ltd. | System of detecting optical distortion of a light-transmitting plate-like member |
| CN2558982Y (en) * | 2002-08-16 | 2003-07-02 | 中国科学院西安光学精密机械研究所 | Distortion measuring device for ultra-wide view field optical system |
| CN102706536A (en) * | 2012-03-20 | 2012-10-03 | 浙江大学 | Device and method for automatically measuring distortion of optical system with wide field of view |
| CN106404352A (en) * | 2016-08-23 | 2017-02-15 | 中国科学院光电技术研究所 | Method for measuring distortion and field curvature of optical system of large-field telescope |
| US20200355625A1 (en) * | 2018-10-19 | 2020-11-12 | China North Standardization Center | Method for controlling surface errors of sample in homogeneity measurement of infrared optical materials |
| CN215296620U (en) * | 2021-07-28 | 2021-12-24 | 西安工业大学 | A Wide Range Distortion Measurement Device |
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2021
- 2021-07-28 CN CN202110858830.8A patent/CN113405782B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5446536A (en) * | 1992-05-06 | 1995-08-29 | Nippon Sheet Glass Co., Ltd. | System of detecting optical distortion of a light-transmitting plate-like member |
| CN2558982Y (en) * | 2002-08-16 | 2003-07-02 | 中国科学院西安光学精密机械研究所 | Distortion measuring device for ultra-wide view field optical system |
| CN102706536A (en) * | 2012-03-20 | 2012-10-03 | 浙江大学 | Device and method for automatically measuring distortion of optical system with wide field of view |
| CN106404352A (en) * | 2016-08-23 | 2017-02-15 | 中国科学院光电技术研究所 | Method for measuring distortion and field curvature of optical system of large-field telescope |
| US20200355625A1 (en) * | 2018-10-19 | 2020-11-12 | China North Standardization Center | Method for controlling surface errors of sample in homogeneity measurement of infrared optical materials |
| CN215296620U (en) * | 2021-07-28 | 2021-12-24 | 西安工业大学 | A Wide Range Distortion Measurement Device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114838917A (en) * | 2022-04-26 | 2022-08-02 | 孝感华中精密仪器有限公司 | A Distortion Comprehensive Target Device |
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