CN112015015A

CN112015015A - Display module and preparation method thereof

Info

Publication number: CN112015015A
Application number: CN202011151894.6A
Authority: CN
Inventors: 胡跃强; 欧香念; 段辉高; 李苓; 宋强; 马国斌; 徐晓波
Original assignee: Shenzhen Research Institute Of Hunan University; Long Optoelectronics Co Ltd; Hunan University
Current assignee: Shenzhen Research Institute Of Hunan University; Long Optoelectronics Co Ltd; Hunan University
Priority date: 2020-10-26
Filing date: 2020-10-26
Publication date: 2020-12-01
Anticipated expiration: 2040-10-26
Also published as: CN112015015B

Abstract

The embodiment of the invention relates to the technical field of display modules, in particular to a display module and a preparation method of the display module, wherein the display module comprises a first substrate layer, and the first substrate layer is used for light incidence; the first electrode layer is stacked on the first substrate layer and is used for being connected with an external power supply; a plurality of dielectric nano-pillars distributed on the first electrode layer; the first photoinduced orientation layer is stacked on the dielectric nano columns; a second photo-alignment layer; the liquid crystal layer is arranged between the first photo-induced alignment layer and the second photo-induced alignment layer; the second electrode layer is stacked on the second photoinduced orientation layer and is used for being connected with the external power supply; and the second substrate layer is stacked on the second electrode layer and used for emitting the light. And applying voltage to the first electrode layer and the second electrode layer, and aligning liquid crystal molecules in the liquid crystal layer, so that the switching of the hologram can be realized through the display module.

Description

Display module and preparation method thereof

Technical Field

The embodiment of the invention relates to the technical field of display modules, in particular to a display module and a preparation method of the display module.

Background

The super-structured surface is a novel plane optical regulation and control element based on generalized Snell's law in recent years and is formed by periodically or non-periodically arranging scattering bodies with sub-wavelength size and interval on a two-dimensional plane. By adjusting the shape, size, position and direction of the scatterer, the random regulation and control of the phase, amplitude, polarization and frequency of light can be almost realized. By utilizing the flexible structural design and the novel mechanism of the super-structure surface, the traditional display module with large volume and single function can be redesigned into a novel element which is light, thin, planar and multifunctional, and has wide application prospect.

In the process of implementing the invention, the inventor of the invention finds that: at present, a display module with a super-structured surface is generally a static element, that is, once the preparation is completed, incident light can only display one image after passing through the display module, that is, the traditional display module cannot be coordinated, and the user experience is not good.

Disclosure of Invention

In view of the above problems, embodiments of the present invention provide a display module and a method for manufacturing the display module, which overcome or at least partially solve the above problems.

According to an aspect of the embodiments of the present invention, there is provided a display module including: a first substrate layer for light to enter; the first electrode layer is stacked on the first substrate layer and is used for being connected with an external power supply; a plurality of dielectric nano-pillars distributed on the first electrode layer; the first photoinduced orientation layer is stacked on the dielectric nano columns; a second photo-alignment layer; the liquid crystal layer is arranged between the first photo-induced alignment layer and the second photo-induced alignment layer; the second electrode layer is stacked on the second photoinduced orientation layer and is used for being connected with the external power supply; and the second substrate layer is stacked on the second electrode layer and is used for emitting the light.

In an optional mode, the display module further includes a photoresist layer, the photoresist layer is stacked on the first electrode layer, the photoresist layer is provided with a plurality of through holes, the number of the through holes is the same as that of the dielectric nano columns, and one of the dielectric nano columns is located at one of the through holes.

In an alternative mode, at least one edge of the photoresist layer and an edge of the first electrode layer have a gap, and the gap is used for connecting the first electrode layer and the external power supply.

In an optional mode, the display module further comprises a dielectric material layer; the dielectric material is stacked on the dielectric nano columns and the photoresist layer; the first photo-alignment layer is disposed on the dielectric material layer.

In an alternative, the dielectric material layer is integrally formed with the dielectric nano-pillars.

In an alternative, the plurality of dielectric nanocolumns all have different in-plane angles.

In an alternative, the dielectric nanorods are the same size.

In an optional manner, the number of the first electrode layers is multiple, multiple first electrode layers are distributed on the first substrate layer, each of the multiple first electrode layers has a spacing space therebetween, and one first electrode layer is used for being connected to one external power supply.

According to an aspect of the embodiments of the present invention, there is provided a method for manufacturing a display module, including: forming a first electrode layer on a first substrate layer; forming a number of dielectric nano-pillars on the first electrode layer; stacking a first photoinduced orientation layer on the dielectric nano columns; a liquid crystal layer is stacked on the first photoinduced orientation layer; stacking a second photo-alignment layer on the liquid crystal layer; forming a second electrode layer on the second photo-alignment layer; and a second substrate layer is stacked on the second electrode layer.

In an alternative mode, the step of forming a plurality of dielectric nano-pillars on the first electrode layer further includes: forming a photoresist layer on the first electrode layer; exposing and developing the photoresist layer to form a plurality of through holes; depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias.

In an alternative mode, the step of forming a photoresist layer on the first electrode layer further includes: protecting at least one edge of the first electrode layer; and coating photoresist on the unprotected part of the first electrode layer to form the photoresist layer.

In an alternative mode, the step of forming a plurality of dielectric nano-pillars on the first electrode layer further includes: forming a photoresist layer on the first electrode layer; exposing and developing the photoresist layer to form a plurality of through holes; depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias and forming a layer of dielectric material.

In an optional mode, the number of the first electrode layers is plural, a plurality of the first electrode layers are distributed on the first substrate layer, and after the step of forming the first electrode layer on the first substrate layer, the method further includes: coating photoresist on the first electrode layer; exposing and developing the photoresist to form a plurality of etching areas; etching the first electrode layer in the etching area to form a plurality of first electrode layers, wherein spacing spaces are formed among the first electrode layers; and removing the photoresist.

The embodiment of the invention has the beneficial effects that: the display module comprises a first substrate layer, a first electrode layer, a plurality of dielectric nano columns, a first photoinduced orientation layer, a second photoinduced orientation layer, a liquid crystal layer, a second electrode layer and a second substrate layer. The first substrate layer, the first electrode layer, the first photoinduced orientation layer, the liquid crystal layer, the second photoinduced orientation layer, the second electrode layer and the second substrate layer are sequentially overlapped. The photoresist layer is provided with a plurality of through holes, and the dielectric nano column is arranged in one through hole. The first substrate layer is for light to enter. The second substrate layer is for the light to exit. The first electrode layer and the second electrode layer are used for being connected with an external power supply. By applying voltage to the first electrode layer and the second electrode layer, liquid crystal molecules in the liquid crystal layer are aligned, and the switching of the hologram can be realized through the display module.

Drawings

One or more embodiments are illustrated by way of example in the accompanying drawings, which correspond to the figures in which like reference numerals refer to similar elements and which are not to scale unless otherwise specified.

Fig. 1 is a schematic view of a display module according to an embodiment of the invention;

fig. 2 is a schematic view illustrating a plurality of first electrode layers of the display module stacked on a first substrate layer according to the embodiment of the invention;

FIG. 3 is an enlarged view of area A of FIG. 2 according to an embodiment of the present invention;

FIG. 4 is a diagram illustrating simulation results of conversion efficiency and iteration number according to an embodiment of the present invention;

FIG. 5 is a schematic diagram of a display module reconstructing a hologram according to an embodiment of the present invention;

FIG. 6 is an optical representation of a set of display module switching holograms according to an embodiment of the present invention;

FIG. 7 is an optical representation of another set of display module switching holograms according to an embodiment of the present invention;

FIG. 8 is a schematic flow chart illustrating a method for manufacturing a display module according to an embodiment of the present invention;

FIG. 9 is a schematic flow chart of a method for forming dielectric nano-pillars on a first electrode layer according to an embodiment of the present invention;

FIG. 10 is a schematic flow chart of another method for forming dielectric nano-pillars on a first electrode layer according to an embodiment of the present invention;

fig. 11 is a schematic flow chart illustrating a manufacturing method of another display module according to an embodiment of the invention.

Detailed Description

In order to facilitate an understanding of the invention, the invention is described in more detail below with reference to the accompanying drawings and specific examples. It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may be present. The terms "vertical," "horizontal," "left," "right," "inner," "outer," and the like as used herein are for descriptive purposes only.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

Example one

Referring to fig. 1, fig. 1 is a schematic view of a display module according to an embodiment of the invention. The display module 100 includes: a first substrate layer 10, a first electrode layer 20, a number of dielectric nano-pillars 30, a first photo-alignment layer 40, a second photo-alignment layer 50, a liquid crystal layer 60, a second electrode layer 70, a second substrate layer 80, a photoresist layer 90, and a dielectric material layer 110. The first substrate layer 10, the first electrode layer 20, the photoresist layer 90, the dielectric material layer 110, the first photo-alignment layer 40, the liquid crystal layer 60, the second photo-alignment layer 50, the second electrode layer 70, and the second substrate layer 80 are sequentially stacked. The photoresist layer 90 is provided with a plurality of through holes, and one of the dielectric nano-pillars 30 is provided in one of the through holes. The first substrate layer 10 is intended for light incidence. The second substrate layer 80 is used for the light exit. The first electrode layer 20 and the second electrode layer 70 are used for connection to an external power source. By applying a voltage to the first electrode layer 20 and the second electrode layer 70, the liquid crystal molecules in the liquid crystal layer 60 are aligned, and the switching of the hologram can be realized by the display module 100.

As for the first substrate layer 10 and the second substrate layer 80 described above, the first substrate layer 10 is used for light incidence, and the second substrate layer 80 is used for light emergence. In some embodiments, the first substrate layer 10 is transparent. The second clear layer is transparent.

For the photoresist layer 90 and the first electrode layer 20, at least one edge of the photoresist layer 90 and the edge of the first electrode layer 20 have a gap (not shown), and the gap is used for connecting the first electrode layer 20 and the external power source.

With respect to the first electrode layer 20 and the second electrode layer 70, in some embodiments, the first electrode layer 20 is an indium tin oxide electrode and the second electrode layer 70 is an indium tin oxide electrode.

Referring to fig. 2 and fig. 3, in some embodiments, the number of the first electrode layers 20 is multiple, a plurality of the first electrode layers 20 are distributed on the first substrate layer 10, a spacing space 201 is provided between each of the first electrode layers 20, and one of the first electrode layers 20 is used for connecting with an external power source. By arranging a plurality of first electrode layers 20 in the display module 100, one first electrode layer 20 is used for being connected with one external power supply, when voltages are respectively applied to the external power supplies connected with the plurality of first electrode layers 20, simultaneous switching of a plurality of holograms can be realized, or regional switching of one hologram can be realized. When the holograms are switched in different areas, a user can adjust the image of a certain area in a personalized manner, so that the whole hologram does not need to be switched, on one hand, the user experience is good, on the other hand, the number of the holograms switched by the display module 100 can be increased, and finally, all the holograms do not need to be adjusted through the switching of the local areas, and the equipment burden of the display module 100 is light.

It is understood that the voltages applied to the plurality of first electrode layers 20 may be the same or different, and may be adjusted according to actual needs.

It is understood that the plurality of first electrode layers 20 are stacked on the first substrate layer 10, and then the first substrate layer 10 is exposed at the spacing space 201.

It should be noted that each of the first electrode layers 20 is provided with a super-structured surface disposition region 202, and a group of the dielectric nano-pillars 30 may be disposed in the super-structured surface disposition region 202.

It should be noted that the structures of the dielectric nanorods 30 disposed on the metamaterial surface disposing region 202 may be the same or different, and may be adjusted according to actual needs.

It should be noted that each of the first electrode layers 20 is provided with a positioning mark 203, and the positioning mark 203 is used to facilitate the positioning of the dielectric nano-pillars 30 and each of the first electrode layers 20.

It should be noted that, by providing a plurality of second electrode layers 70 instead of the plurality of first electrode layers 20, simultaneous switching of a plurality of holograms or switching of one hologram in different regions can be realized.

For the number of dielectric nano-pillars 30, photoresist layer 90, and dielectric material layer 110 described above. The dielectric nanorods 30 are the same size. In some embodiments, the in-plane angles of the number of dielectric nanocolumns 30 are all different. The photoresist layer 90 is stacked on the first electrode layer 20, the photoresist layer 90 is provided with a plurality of through holes, the number of the through holes is the same as that of the dielectric nano-pillars 30, and one of the dielectric nano-pillars 30 is located at one of the through holes. The dielectric material layer 110 is stacked on the dielectric nano-pillars 30, and the dielectric material layer 110 is integrally formed with the dielectric nano-pillars 30.

It will be appreciated that the number of dielectric nano-pillars 30 distributed on the first electrode layer 20 constitutes the nanostructured surface.

It is noted that in some embodiments, the material of the dielectric nanocolumns 30 comprises TiO₂、HfO₂、ZrO₂、GaN、Si₂N₃Si, GaAs, ZnS or AlN. The height range of the nano-pillar structure is 200nm-1500nm, the size of the dielectric nano-pillar 30 on the surface of the dielectric substrate is 20nm-1000nm, and the dielectric nano-pillar 30 is randomly arranged on the surface of the first electrode layer 20.

It should be noted that, in some embodiments, the photoresist layer 90 and the dielectric material layer 110 may not be provided in the display module 100, and then the first substrate layer 10, the first electrode layer 20, the first photo-alignment layer 40, the liquid crystal layer 60, the second photo-alignment layer 50, the second electrode layer 70, and the second substrate layer 80 are stacked in sequence. The number of dielectric nano-pillars 30 is disposed between the first electrode layer 20 and the first photo-alignment layer 40.

It should be noted that, by providing the photoresist layer 90 and the dielectric material layer 110, the light conversion efficiency of the display module 100 is higher than that of the display module 100 without providing the photoresist layer 90 and the dielectric material layer 110.

Referring to fig. 4, fig. 4 is a schematic diagram of a simulation result of conversion efficiency and iteration number according to an embodiment of the present invention. The simplified process is to provide the display module 100 with the photoresist layer 90 and the dielectric material layer 110, and the complete process is to provide the display module 100 without the photoresist layer 90 and the dielectric material layer 110. As can be seen from fig. 4, through simulation, the conversion efficiency of the display module 100 obtained through simplified process to light with different wavelengths is better than that of the display module 100 obtained through complete process. That is, the display module 100 provided with the photoresist layer 90 and the dielectric material layer 110 has a higher light conversion efficiency than the display module 100 not provided with the photoresist layer 90 and the dielectric material layer 110.

The dielectric nanorods 30 form the super-structured surface, and the conventional method for preparing the super-structured surface is to spin-coat a photoresist on a substrate, expose and develop the photoresist to form a through hole for accommodating the dielectric nanorods, perform atomic layer deposition on the photoresist to form a plurality of dielectric nanorods and a dielectric material layer, etch away the dielectric material layer, and finally etch away the photoresist. The first electrode layer in this application is equivalent to the above substrate, and if the conventional preparation method of the super-structured surface is adopted, the display module 100 according to the embodiment of the present invention includes the first substrate layer 10, the first electrode layer 20, the first photo-alignment layer 40, the liquid crystal layer 60, the second photo-alignment layer 50, the second electrode layer 70, and the second substrate layer 80, that is, the display module obtained by the complete process. The display module 100 according to the embodiment of the present application may be provided with the photoresist layer 90 and the dielectric material layer 110, that is, when the super-structured surface is prepared, after atomic layer deposition is performed on the photoresist to form a plurality of dielectric nano-pillars and dielectric material layers, the dielectric material layer does not need to be etched, and the photoresist does not need to be etched, that is, the display module obtained by the simplified process does not need to be etched. Referring to fig. 4, the conversion efficiency of the display module 100 obtained by the simplified process to light with different wavelengths is better than that of the display module 100 obtained by the complete process, so that the display module obtained by the simplified process of the present application overcomes the technical bias and obtains unexpected technical effects.

In order to make the reader better understand the functions of the display module of the present invention, the principle of the display module implementing the switching of the holograms will now be explained.

Considering the dielectric nanocolumn as a linear birefringent element, the dielectric nanocolumn can be expressed by the following jones matrix (equation (1)):

（1）

wherein, theθIs the in-plane angle of the dielectric nanocolumn, the T: (θ) In-plane angle ofθThe Jones matrix of the dielectric nanocolumns of (a), the R: (θ) For a rotation matrix, the T₀A Jones matrix of the dielectric nanocolumns with an in-plane angle of zero, the

And

phase delays along the long and short axes of the dielectric nanopillar, respectively, when the light is incident from the first substrate layer.

Wherein R is (A), (B), (Cθ) Satisfies the following formula (2):

（2）

wherein, theθIs the in-plane angle of the dielectric nanocolumn.

When circularly polarized light is incident, an additional phase related to the in-plane angle of the dielectric nanocolumn is generated, and the expression of the emergent electric field of the emergent light is as follows:

（3）

wherein, E is₀For emitting an electric field, T: (θ) In-plane angle ofθThe Jones matrix of the dielectric nanocolumn of, the E_iIs an incident electric field, said

And

phase delays along the major axis and the minor axis of the dielectric nanocolumn when the light is incident from the first substrate layer, respectively, the ± corresponding to right-handed circularly polarized light and left-handed circularly polarized light, respectively.

According to the formula (3), the in-plane angle of the dielectric nano-pillar is rotated from 0 degree to 180 degrees, and the phase of the emergent light can cover the range of 0-2 pi.

Designing a phase profile for the phase distribution of different channels

To control the phase distribution of right-handed circularly polarized light, reconstruct independent holographic image on given plane, and design another phase profile

The phase distribution of the incident left-handed circularly polarized light is controlled, and the holographic image is reconstructed on the same plane. The two phase profiles are then combined together by the following expression (4) and encoded into a single nanocolumn structure, and the switching of two independent holographic images can be achieved by two circularly polarized light inputs of different polarities.

（4）

The liquid crystal in the liquid crystal layer is an intermediate state combining partial properties of liquid and crystal, so that the liquid crystal layer has liquidity of the liquid and various properties of the crystal, the arrangement mode of the internal structure of the liquid crystal layer is sensitive to the external environment, and the refractive index and the polarization direction of the liquid crystal material can be influenced by the change of the applied voltage. The refractive index of the liquid crystal layer may be expressed by the following formula (5):

（5）

wherein n is an equivalent refractive index of liquid crystal, and

is the angle between the polarization direction of incident light and the major axis of the liquid crystal molecules, n₀The refractive index of the liquid crystal for ordinary light, n_eIs the refractive index of the liquid crystal for very light.

The phase retardation of the light passing through the liquid crystal layer may be expressed as the following formula (6):

（6）

wherein, the

A phase delay for the light to pass through the liquid crystal layer, d is a thickness of the liquid crystal layer, n is an equivalent refractive index of the liquid crystal, and n₀Is the refractive index of the liquid crystal for ordinary light, the

Is the wavelength of the incident light.

According to the formulas (5) and (6), the orientation angle of the liquid crystal is changed by using the applied voltage, and the included angle between the polarization direction of the incident light and the long axis of the liquid crystal molecules is further changed

And changing the equivalent refractive index n of the liquid crystal, the phase of the light passing through the liquid crystal layer can be regulated, namely, the light passingSwitching of the hologram can be achieved by adjusting the phase of the second substrate layer.

Fig. 5 is a schematic view of a display module reconstructing a hologram according to an embodiment of the present invention. Wherein, R1 is the incident right-handed circular polarized light, L1 is the emergent left-handed circular polarized light, and M1 is the reconstructed hologram. L2 is incident left-handed circularly polarized light, R2 is emergent right-handed circularly polarized light, and M2 is the reconstructed hologram. Referring to fig. 5, after a voltage is applied to the liquid crystal layer, the hologram is switched.

In order to make the reader more clearly understand the switching situation of the display module group to the hologram according to the embodiment of the present invention, two examples are now given, please refer to fig. 6 and fig. 7, respectively.

FIG. 6 is an optical representation of a set of display module switching holograms according to an embodiment of the present invention.

Wherein, the simulation graph is a simulation image of the computer. The super-structure surface experimental graph is an imaging graph when the display module does not comprise the liquid crystal layer. The display module does not include the liquid crystal layer, and two display modules are needed to form two different holograms. The display module is used for displaying an imaging graph of the display module provided by the embodiment of the invention. According to the display module provided by the embodiment of the invention, by adjusting the voltage applied to the display module, the liquid crystal molecules in the liquid crystal layer are oriented, so that one display module can display two different holograms, and the switching of the holograms can be realized through one display module.

FIG. 7 is an optical representation of another set of display module switching holograms according to an embodiment of the present invention.

Wherein, the simulation graph is a simulation image of the computer. The super-structure surface experimental graph is an imaging graph when the display module does not comprise the liquid crystal layer. The display module is used for displaying an imaging graph of the display module provided by the embodiment of the invention.

In the embodiment of the invention, the display module comprises a first substrate layer, a first electrode layer, a plurality of dielectric nano-columns, a first photo-induced alignment layer, a second photo-induced alignment layer, a liquid crystal layer, a second electrode layer and a second substrate layer. The first substrate layer, the first electrode layer, the first photoinduced orientation layer, the liquid crystal layer, the second photoinduced orientation layer, the second electrode layer and the second substrate layer are sequentially overlapped. The photoresist layer is provided with a plurality of through holes, and the dielectric nano column is arranged in one through hole. The first substrate layer is for light to enter. The second substrate layer is for the light to exit. The first electrode layer and the second electrode layer are used for being connected with an external power supply. By applying voltage to the first electrode layer and the second electrode layer, liquid crystal molecules in the liquid crystal layer are aligned, and the switching of the hologram can be realized through the display module.

Example two

Referring to fig. 8, fig. 8 is a schematic flow chart illustrating a manufacturing method of a display module according to an embodiment of the present invention. The method comprises the following steps:

step S10: a first electrode layer is formed on the first substrate layer.

Step S20: a number of dielectric nano-pillars are formed on the first electrode layer.

Specifically, referring to fig. 9, the step S20 includes:

step S201: and forming a photoresist layer on the first electrode layer.

Since the first electrode layer is used for connecting with an external power supply, a gap for accessing the external power supply needs to be reserved when the photoresist layer is formed on the first electrode layer. Specifically, the method for forming the photoresist layer on the first electrode layer includes protecting at least one edge of the first electrode layer. And coating photoresist on the unprotected part of the first electrode layer to form the photoresist layer.

It is understood that after the photoresist layer is formed on the first electrode layer, the protection of the first electrode layer may be removed to expose the at least one edge of the first electrode layer to form the gap, thereby facilitating the connection of the first electrode layer to an external power source.

It should be noted that, in some embodiments, the photoresist layer is made of a positive electron beam resist.

Step S202: and exposing and developing the photoresist layer to form a plurality of through holes.

It should be noted that the shape and the arrangement position of the through holes determine the shape and the in-plane angle of the dielectric nano-pillars.

Step S203: depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias.

In some embodiments, when the dielectric nano-pillars are formed in the through holes, the dielectric material layer is formed at the same time, and the dielectric material layer and the photoresist layer are removed, only the dielectric nano-pillars are remained, and the display module prepared by the method does not comprise the photoresist layer and the dielectric material layer.

In some embodiments, when the dielectric nano-pillars are formed in the through holes, the dielectric material layer is formed at the same time, the dielectric material layer and the photoresist layer may not be removed, and the display module prepared by the method comprises the photoresist layer and the dielectric material layer. Specifically, referring to fig. 10, step S20 includes:

step S201': and forming a photoresist layer on the first electrode layer.

Step S202': and exposing and developing the photoresist layer to form a plurality of through holes.

Step S203': depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias and forming a layer of dielectric material.

As described in the first embodiment, the module including the photoresist layer and the dielectric material layer has a higher light conversion efficiency than a display module without the photoresist layer and the dielectric material layer.

It is noted that, the method for forming a plurality of dielectric nano-pillars on the first electrode layer may further include preparing the dielectric nano-pillars using a mold, and then transferring the dielectric nano-pillars prepared using the mold to the first electrode layer.

Step S30: and a first photo-induced orientation layer is stacked on the dielectric nano-pillars.

Step S40: and a liquid crystal layer is stacked on the first photoinduced orientation layer.

Step S50: and overlapping a second photo-alignment layer on the liquid crystal layer.

Step S60: and forming a second electrode layer on the second photo-alignment layer.

Step S70: and a second substrate layer is stacked on the second electrode layer.

In some embodiments, to enable simultaneous switching of multiple holograms, or to enable split zone switching of one hologram. The display module is provided with a plurality of first electrode layers. When the display module is provided with a plurality of first electrode layers, please refer to fig. 11, the method for manufacturing the display module includes:

step S10': a first electrode layer is formed on the first substrate layer.

Step S20': and coating photoresist on the first electrode layer.

Step S30': and exposing and developing the photoresist to form a plurality of etching areas.

Step S40': and etching the first electrode layer in the etching area to form a plurality of first electrode layers, wherein spacing spaces are arranged among the first electrode layers.

In some embodiments, a locator mark is formed on each of the first electrode layers to facilitate positioning of the dielectric nanopillars with each of the first electrode layers.

Step S50': and removing the photoresist.

Step S60': a number of dielectric nano-pillars are formed on the first electrode layer.

Step S70': and a first photo-induced orientation layer is stacked on the dielectric nano-pillars.

Step S80': and a liquid crystal layer is stacked on the first photoinduced orientation layer.

Step S90': and overlapping a second photo-alignment layer on the liquid crystal layer.

Step S110': and forming a second electrode layer on the second photo-alignment layer.

Step S120': and a second substrate layer is stacked on the second electrode layer.

In the embodiment of the present invention, the first electrode layer is formed by forming the first electrode layer on the first substrate layer; forming a number of dielectric nano-pillars on the first electrode layer; stacking a first photoinduced orientation layer on the dielectric nano columns; a liquid crystal layer is stacked on the first photoinduced orientation layer; stacking a second photo-alignment layer on the liquid crystal layer; forming a second electrode layer on the second photo-alignment layer; and the prepared display module can switch the hologram by the method of overlapping the second substrate layer on the second electrode layer.

It should be noted that the description of the present invention and the accompanying drawings illustrate preferred embodiments of the present invention, but the present invention may be embodied in many different forms and is not limited to the embodiments described in the present specification, which are provided as additional limitations to the present invention and to provide a more thorough understanding of the present disclosure. Moreover, the above technical features are combined with each other to form various embodiments which are not listed above, and all the embodiments are regarded as the scope of the present invention described in the specification; further, modifications and variations will occur to those skilled in the art in light of the foregoing description, and it is intended to cover all such modifications and variations as fall within the true spirit and scope of the invention as defined by the appended claims.

Claims

1. A display module, comprising:

a first substrate layer for light to enter;

the first electrode layer is stacked on the first substrate layer and is used for being connected with an external power supply;

a plurality of dielectric nano-pillars distributed on the first electrode layer;

the first photoinduced orientation layer is stacked on the dielectric nano columns;

a second photo-alignment layer;

the liquid crystal layer is arranged between the first photo-induced alignment layer and the second photo-induced alignment layer;

the second electrode layer is stacked on the second photoinduced orientation layer and is used for being connected with the external power supply;

and the second substrate layer is stacked on the second electrode layer and is used for emitting the light.

2. The display module of claim 1, further comprising a photoresist layer, wherein the photoresist layer is stacked on the first electrode layer, the photoresist layer is provided with a plurality of through holes, the number of the through holes is the same as the number of the dielectric nano-pillars, and one of the dielectric nano-pillars is located in one of the through holes.

3. The display module of claim 2, wherein at least one edge of the photoresist layer and an edge of the first electrode layer have a gap, and the gap is used for connecting the first electrode layer and the external power source.

4. The display module of claim 2, further comprising a layer of dielectric material;

the dielectric material is stacked on the dielectric nano columns and the photoresist layer;

the first photo-alignment layer is disposed on the dielectric material layer.

5. The display module of claim 4, wherein the dielectric material layer is integrally formed with the dielectric nano-pillars.

6. The display module of any one of claims 1-5, wherein the dielectric nanocolumns all have different in-plane angles.

7. The display module of any one of claims 1-5, wherein the dielectric nanorods are the same size.

8. The display module according to any one of claims 1 to 5, wherein the number of the first electrode layers is plural, a plurality of the first electrode layers are distributed on the first substrate layer, a space is provided between the plurality of the first electrode layers, and one of the first electrode layers is used for connecting with one of the external power supplies.

9. A preparation method of a display module is characterized by comprising the following steps:

forming a first electrode layer on a first substrate layer;

forming a number of dielectric nano-pillars on the first electrode layer;

stacking a first photoinduced orientation layer on the dielectric nano columns;

a liquid crystal layer is stacked on the first photoinduced orientation layer;

stacking a second photo-alignment layer on the liquid crystal layer;

forming a second electrode layer on the second photo-alignment layer;

and a second substrate layer is stacked on the second electrode layer.

10. The method of claim 9, wherein the step of forming dielectric nano-pillars on the first electrode layer further comprises:

forming a photoresist layer on the first electrode layer;

exposing and developing the photoresist layer to form a plurality of through holes;

depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias.

11. The method of claim 10, wherein the step of forming a photoresist layer on the first electrode layer further comprises:

protecting at least one edge of the first electrode layer;

and coating photoresist on the unprotected part of the first electrode layer to form the photoresist layer.

12. The method of claim 9, wherein the step of forming dielectric nano-pillars on the first electrode layer further comprises:

forming a photoresist layer on the first electrode layer;

depositing a dielectric material on the photoresist layer to form the number of dielectric nanopillars within the number of vias and forming a layer of dielectric material.

13. The method of claim 9, wherein the number of the first electrode layers is plural, a plurality of the first electrode layers are distributed on the first substrate layer, and after the step of forming the first electrode layers on the first substrate layer, the method further comprises:

coating photoresist on the first electrode layer;

exposing and developing the photoresist to form a plurality of etching areas;

etching the first electrode layer in the etching area to form a plurality of first electrode layers, wherein spacing spaces are formed among the first electrode layers;

and removing the photoresist.