CN111564385A - Rotary cleaning device - Google Patents

Abstract

A rotary cleaning unit is provided, which ensures that the dry items to be cleaned do not get wet again. The rotary cleaning device (1) has: a horizontally movable nozzle (60) that sprays a mixture of cleaning water and air; The scattered mixed liquid flows downward; and a unit (16) that lifts and lowers the preventing cover. The preventing cover comprises: an annular surrounding plate (51) formed such that the cross section is inclined gradually from the opening (50) through which the worktable can pass; and an upper plate (53) connecting the side plate and the surrounding plate, and the rotary cleaning device further has a scattering preventing portion (7), which sprays air from the nozzle to make the outer periphery (Wd) of the cleaned object to be cleaned. In order to prevent the water accumulated on the upper surface of the upper plate from splashing during drying, the scattering preventing portion prevents the force of the air from acting on the water accumulated on the upper surface of the upper plate.

Description

Rotary cleaning device

technical field

The present invention relates to a spin cleaning apparatus for cleaning objects to be cleaned, such as semiconductor wafers.

Background technique

A grinding apparatus that grinds a workpiece such as a semiconductor wafer with a grinding tool and a polishing apparatus that grinds a workpiece with a polishing pad have a rotary cleaning device that holds the workpiece after processing. The rotary table of this type rotates at a high speed to wash the workpiece while supplying washing water (for example, refer to Patent Document 1).

Patent Document 1: Japanese Patent Laid-Open No. 2014-180739

When the workpiece is supported by the substrate (support substrate), machining debris accumulates between the outer periphery of the substrate and the outer periphery of the workpiece, and therefore it is necessary to actively clean the outer periphery of the workpiece. Therefore, a two-fluid mixture of water and washing water is blown to the outer periphery of the workpiece to remove machining debris. In addition, one of the reasons why machining chips tend to accumulate between the outer periphery of the substrate and the outer periphery of the workpiece is, for example, that the outer periphery of the workpiece is chamfered so as to have an arc-shaped cross-section, and the substrate and the workpiece are chamfered. The boundary of the object is formed with a depression.

In addition, in the rotary cleaning device, in order to prevent the blown second fluid from being rolled up on the upper surface of the workpiece and re-adhering to the workpiece, there is an inclined surface surrounding the workpiece around the rotary table. When the cleaning waste liquid caused by the centrifugal force caused by the rotation of the rotary table is radiated outward from the workpiece, it descends on the slope, falls into a drainage container or the like, and is discharged. That is, the rotary cleaning apparatus has a scattering prevention cover that surrounds a rotary table that holds the workpiece.

In addition, after the two-fluid cleaning is performed, water droplets tend to accumulate on the boundary between the outer periphery of the substrate and the outer periphery of the workpiece. Therefore, air is actively blown to the outer periphery of the cleaned workpiece, and the outer periphery of the substrate and the workpiece are blown together. The peripheral border is dry.

However, when the outer peripheral portion of the workpiece is actively cleaned with the two fluids, puddles may be formed on the scattering prevention cover. In addition, in order to dry the outer peripheral portion of the workpiece, the air jetted to the outer peripheral portion splashes the water accumulated in the scattering prevention cover, and the dried workpiece is wetted again.

SUMMARY OF THE INVENTION

Therefore, an object of the present invention is to provide a rotary cleaning device capable of ensuring that the workpiece that has been dried after cleaning is not wetted again.

According to the present invention, there is provided a rotary cleaning apparatus including: a rotary table having a holding surface for holding an object to be cleaned; a rotary unit that rotates the rotary table; and a cleaning nozzle that holds the rotary table The object to be cleaned is sprayed with a mixture of cleaning water and air; a horizontal moving unit makes the cleaning nozzle move horizontally above the rotary table; a scattering prevention cover surrounds the rotary table so that the cleaning nozzle is sprayed to The mixed liquid of the object to be cleaned imparts centrifugal force brought about by the rotation of the rotary table, so that the mixed liquid to be scattered radially from the rotary table flows downward; The swivel shaft of the table rotates in an axial direction, wherein the scattering prevention cover has an opening through which the rotary table can pass, and an annular surrounding plate formed so as to gradually expand in cross section from the opening and incline. a side plate, which surrounds the surrounding plate, and extends in the lifting direction of the rotary table; The opening is positioned above the upper surface of the object to be cleaned held by the rotary table, the mixture is sprayed from the cleaning nozzle to clean the object to be cleaned, and air is sprayed from the cleaning nozzle to clean the object to be cleaned In a series of cleaning and drying operations of drying, when the outer periphery of the object to be cleaned is dried by jetting air from the cleaning nozzle after the cleaning, water accumulated on the upper surface of the upper plate of the scattering prevention cover is prevented from being removed. The scattering prevention part prevents the force of the air jetted from the cleaning nozzle from acting on the water accumulated on the upper surface of the upper plate.

Preferably, the scattering preventing portion includes a sloped plate extending from the opening of the scattering preventing cover toward the outer peripheral edge of the upper plate along the movement trajectory of the cleaning nozzle, the sloped plate on the side of the opening. high and the outer peripheral edge side is low; and a water discharge opening formed in the outer peripheral edge to allow water to fall from the edge of the lower end side of the inclined plate.

As an alternative, the said scattering prevention part is comprised by the porous member arrange|positioned on the said upper plate of the said scattering prevention cover along the movement trajectory of the said cleaning nozzle.

According to the rotary cleaning device of the present invention, it is possible to prevent the water accumulated on the upper surface of the upper plate of the scattering prevention cover from being splashed by the air by absorbing the force of the air by the scattering preventing portion. Therefore, it is possible to prevent the water droplets splashed by the air from adhering to the dry cleaning object again.

The scattering preventing portion includes: a sloping plate extending on the upper plate from the opening of the scattering preventing cover toward the outer periphery along the movement trajectory of the cleaning nozzle, the sloping plate having an opening side high and an outer peripheral side lower; and a drain port It is formed on the outer peripheral edge and causes water to fall from the edge of the lower end side of the inclined plate. In this case, when drying the outer peripheral edge of the object to be cleaned, the force of the air jetted from the cleaning nozzle is prevented from reaching the upper surface of the upper plate. The accumulated water can prevent the water accumulated on the upper surface of the upper plate from being splashed by the air. Therefore, it is possible to prevent the water droplets splashed by the air from adhering to the dry cleaning object again.

In the case where the scattering preventing portion is composed of a porous member disposed on the upper plate of the scattering preventing cover along the movement locus of the cleaning nozzle, when drying the outer periphery of the object to be cleaned, the air ejected from the cleaning nozzle is The force of the upper plate does not act on the water accumulated on the upper surface of the upper plate, so that the water accumulated on the upper surface of the upper plate can be prevented from being splashed by the air. Therefore, it is possible to prevent the water droplets splashed by the air from adhering to the dry cleaning object again.

Description of drawings

FIG. 1 is a perspective view showing an example of a rotary cleaning apparatus having a sloping plate and a water outlet in a scattering prevention portion.

FIG. 2 is a perspective view showing an example of the rotary cleaning apparatus in a state where the scattering prevention cover is pulled down.

3 is a perspective view showing an example of a rotary cleaning apparatus in which the scattering prevention portion is a porous member disposed on the upper plate of the scattering prevention cover.

4 is a cross-sectional view illustrating a state in which the outer peripheral edge of the object to be cleaned is dried by spraying air from the cleaning nozzle in the rotary cleaning device having the sloping plate and the drain port in the scattering prevention portion.

5 is a cross-sectional view illustrating a state in which the outer periphery of the object to be cleaned is dried by jetting air from a cleaning nozzle in a rotary cleaning device in which the scattering preventing portion is a porous member disposed on the upper plate of the scattering preventing cover.

6 is a cross-sectional view for explaining a state in which a mixed liquid is sprayed from a cleaning nozzle to clean a to-be-cleaned object in a conventional rotary cleaning device.

7 is a cross-sectional view illustrating a state in which the outer peripheral edge of the object to be cleaned is dried by spraying air in the conventional rotary cleaning apparatus.

Label description

W: object to be cleaned; Wb: upper surface of object to be cleaned; Wd: outer periphery of object to be cleaned; W1: semiconductor wafer; W2: substrate; 1: rotary cleaning device; 16: lifting unit; 30: rotary table; 300: suction part; 300a: holding surface; 301: frame body; 32: rotating unit; 320: rotating shaft; 321: motor; 305: skirt part; 2: container part; : inner peripheral plate; 202: bottom plate; 21: bracket cover; 22: upper cover; 40: horizontal movement unit; 400: rotating shaft part; 401: arm part; 402: rotating motor; 60: cleaning nozzle; ;69: Water source; 68: Air source; 5: Scatter prevention cover; 50: Opening; 51: Surrounding plate; 52: Side plate; 53: Upper plate; ; 7A: a scattering prevention part composed of a porous member; 1B: a conventional rotary cleaning device.

Detailed ways

The rotary cleaning apparatus 1 shown in FIG. 1 includes: a rotary table 30 having a holding surface 300a for holding the object to be cleaned W; a rotary unit 32 for rotating the rotary table 30; and a cleaning nozzle 60 for rotating the work The object to be cleaned W held by the table 30 is sprayed with a mixture of cleaning water and air (two fluids); the horizontal movement unit 40 moves the cleaning nozzle 60 horizontally above the rotary table 30; the scattering prevention cover 5 rotates around the table 30 so that the mixed liquid to be scattered radially from the rotary table 30 flows downward due to the centrifugal force caused by the rotation of the rotary table 30 to the mixed liquid sprayed from the cleaning nozzle 60 to the object to be cleaned W; The unit 16 raises and lowers the scattering prevention cover 5 along the axial direction (Z-axis direction) of the rotation shaft 320 that rotates the rotary table 30 . The rotary cleaning apparatus 1 may be used alone, or may be used by being assembled in a grinding apparatus, a polishing apparatus, a cutting apparatus, or a cluster-type apparatus having functions of a plurality of these apparatuses.

The object to be cleaned W is, for example, a so-called bonded wafer. The bonding wafer is formed by bonding a circular semiconductor wafer W1 and a substrate (supporting substrate) W2 of approximately the same diameter with an adhesive or the like, and processing the semiconductor wafer W1 and the substrate W2 as one body can improve the performance. The handleability of the thin semiconductor wafer W1 can be prevented, and the warpage or breakage of the semiconductor wafer W1 during processing can be prevented.

The semiconductor wafer W1 is, for example, a circular wafer made of a silicon base material or the like, a plurality of devices are formed on the front surface Wa of the semiconductor wafer W1 facing downward in FIG. 1 , and a substrate W2 is attached for protection. The back surface Wb of the semiconductor wafer W1 on the opposite side to the front surface Wa is the surface to which the grinding process is performed, and becomes the upper surface Wb on which the cleaning of the object to be cleaned W is performed. In addition to silicon, the object to be cleaned W may be composed of gallium arsenide, sapphire, ceramics, resin, gallium nitride, silicon carbide, or the like.

In addition, the to-be-cleaned object W may be only the circular semiconductor wafer W1 which consists of a silicon base material etc., for example. In addition, the cleaning object W may be a so-called TAIKO wafer: a region corresponding to the device region in the rear surface Wb of the semiconductor wafer W1 having the device formed on the front surface Wa is ground to form a circular concave portion, and a circular concave portion is formed on the back surface Wb of the semiconductor wafer W1 having the devices formed on the front surface Wa. The region of the back surface Wb corresponding to the remaining peripheral region of the device region forms an annular convex portion for reinforcement.

The rotary cleaning apparatus 1 has the container part 2 which accommodates the said component. The container portion 2 includes: a casing 20 whose outer shape is, for example, a polygonal shape in plan view; a bracket cover 21 erected from an upper end surface on the rear side (+X direction side) of the casing 20; and an upper cover 22 with the bracket The cover 21 is connected to cover the case 20 from above. The upper cover 22 has the same planar shape as the case 20 when viewed from the +Z direction, and its +Y direction side end is fixed to the upper end of the bracket cover 21 with fasteners such as bolts.

The case 20 includes: an outer peripheral plate 200 ; an inner peripheral plate 201 shown in FIG. 4 ; The concave space in the longitudinal section surrounded by the outer peripheral plate 200 , the inner peripheral plate 201 , and the bottom plate 202 is a space in which the used cleaning liquid can be temporarily stored. For example, a drain pipe such as a drain hose is connected to the bottom plate 202, and the drain pipe may communicate with a drain container (not shown).

The scattering prevention cover 5 has an opening 50 through which the rotary table 30 can pass, an annular surrounding plate 51 formed so as to gradually expand in cross section from the opening 50 as shown in FIG. 4 , and a side plate 52 . Surrounding the surrounding plate 51 and extending in the elevating direction (Z-axis direction) of the rotary table 30 ; and an upper plate 53 connecting the side plate 52 and the lower end of the surrounding plate 51 . In FIG. 1, the state which raised the side plate 52 in order to wash the to-be-washed object W, and the upper end surface of the upper end surface is in contact with the lower surface of the upper cover 22 is shown.

The side plate 52 is smaller than the casing 20 and similar to the casing 20 , and is a cylindrical body having a polygonal shape in plan view. The side plate 52 is located inside the casing 20 when viewed from the +Z direction. As shown in FIG. 2 , when the object to be cleaned W is attached to and detached from the rotary table 30, the side plate 52 is lowered into the casing 20 to be in an open state, and the object to be cleaned W is washed and dried as shown in FIG. 1 . At this time, the side plate 52 rises from the inside of the casing 20 to be in a closed state, thereby preventing the scattering of the mixed liquid or the like. The side plate 52 and the upper cover 22 may be constituted by a transparent member such as an acrylic plate, for example, in order for the operator to confirm the state of the object to be cleaned W being cleaned.

For example, a sealing member such as rubber (not shown) may be disposed on the upper end surface of the side plate 52, and when the side plate 52 is raised to be in a closed state, the bottom surface of the peripheral edge portion of the upper cover 22 contacts the sealing member to seal the side plate 52. It is hermetically sealed with the upper cover 22 .

The opening 50 of the scattering prevention cover 5 is formed in a circular shape according to the circular outer shape of the rotary table 30 . As shown in FIG. 4 , the surrounding plate 51 is formed such that the cross section is gradually expanded and inclined from the opening 50, and is annular in plan view. In the example shown in FIG. 1 , the area of the surrounding plate 51 is set to be smaller than the area of the upper plate 53 , but it is not limited to this. In addition, the inclination angle of the surrounding plate 51 and the like are set to appropriate values in consideration of the ejection amount of the mixed liquid ejected from the cleaning nozzle 60 and the like. As shown in FIGS. 1 and 4 , the upper plate 53 connects the side plate 52 and the lower end of the surrounding plate 51 to form the bottom portion of the scattering prevention cover 5 by the surrounding plate 51 and the upper plate 53 .

The rotary table 30 which is arranged in the container portion 2 and holds the object to be cleaned W has, for example, a circular outer shape. suction; and a frame body 301 that supports the suction part 300 . The suction part 300 communicates with a suction source (not shown), and sucks and holds the object to be cleaned W on a flat holding surface 300 a that is an exposed surface of the suction part 300 and is flush with the upper end surface of the housing 301 .

The rotation unit 32 has a rotation shaft 320 connected to the bottom surface side of the rotary table 30 at its upper end; a motor 321 connected to the lower end side of the rotation shaft 320 to generate rotational driving force; The axial direction of the rotary shaft 320 that rotates the rotary table 30 is the Z-axis direction (vertical direction).

For example, as shown in FIG. 4 , the rotating shaft 320 has a skirt 305 extending horizontally from its outer peripheral surface and hanging down in the −Z direction. The skirt 305 prevents the mixed liquid flowing down from the rotating table 30 from entering the rotating shaft. 320 and the inner peripheral plate 201.

The elevating unit 16 for raising and lowering the scattering prevention cover 5 in the axial direction (Z-axis direction) of the rotating shaft 320 that rotates the rotary table 30 is an air cylinder, an electric air cylinder, a ball screw mechanism, or the like. For example, the elevating unit 16 and the side plate The lower end side of 52 or the connection around the lower surface of plate 51 is shown simplified in FIG. 1 .

The horizontal movement unit 40 shown in FIG. 1 includes, for example, a rotating shaft portion 400 that penetrates the upper plate 53 of the scattering prevention cover 5 via a bearing, a sealing material, etc., not shown, and is erected on the upper plate 53 , and an arm portion 401 , which extends in the horizontal direction from the upper end side of the rotating shaft portion 400 ; In addition, the cleaning nozzle 60 is fixed to the front end of the arm portion 401 .

Accordingly, when the rotary motor 402 rotates the rotary shaft portion 400 around the axis in the Z-axis direction, the arm portion 401 and the cleaning nozzle 60 are horizontally moved (rotated) in the horizontal direction. Therefore, the movement locus of the cleaning nozzle 60 is arc-shaped in plan view, and the cleaning nozzle 60 can position the ejection port 600 formed at the lower end portion of the cleaning nozzle 60 above the holding surface 300a of the rotary table 30 from the retracted position. For example, it is preferable that the rotation center of the rotary table 30 is located under the movement trajectory of the cleaning nozzle 60 .

The cleaning nozzle 60 is connected to a water source 69 composed of a pump or the like and supplying, for example, pure water as cleaning water, via a joint 690 and a water flow path 691 such as a flexible resin tube. A water channel on-off valve 692 is arranged on the water channel 691 . In addition, the cleaning nozzle 60 communicates with an air source 68, which is constituted by a compressor or the like, and supplies compressed air via a joint 680 and an air flow path 681 such as a flexible resin tube. An air flow passage opening and closing valve 682 is arranged on the air passage 681 . The washing water supplied from the water source 69 and the air supplied from the air source 68 are mixed in the washing nozzle 60 to form a mixed liquid, and sprayed downward from the spray port 600 .

The rotary cleaning device 1 shown in FIG. 1 includes a scattering preventing portion 7 (hereinafter referred to as the scattering preventing portion 7 of the first embodiment), and the opening 50 is positioned on the upper surface of the cleaning object W held by the rotary table 30 . In the upper position of Wb, in a series of cleaning and drying operations in which the mixed liquid of water and air is sprayed from the cleaning nozzle 60 to clean the object W to be cleaned, and then air is sprayed from the cleaning nozzle 60 to dry the object W to be cleaned, When the outer peripheral edge Wd of the object to be cleaned W is dried by jetting air from the cleaning nozzle 60 after cleaning, the scattering preventing portion 7 prevents the water accumulated on the upper surface of the upper plate 53 of the scattering preventing cover 5 from splashing. The force of the air jetted from the cleaning nozzle 60 is prevented from acting on the water accumulated on the upper surface of the upper plate 53 .

In the example shown in FIG. 1 , the scattering prevention part 7 has a sloped plate 70 which is upward from the opening 50 of the scattering prevention cover 5 toward the outer peripheral edge of the upper plate 53 along the arc-shaped movement locus of the cleaning nozzle 60 . Extending on the plate 53, the opening 50 side of the inclined plate 70 is high and the outer peripheral side of the upper plate 53 is low; fall.

The inclined plate 70 has, for example, a substantially rectangular outer shape, and is fixed with a bolt or the like (not shown) in a state in which the upper end side is spanned over the upper end side of the surrounding plate 51 . The lower end side of the inclined plate 70 is cut obliquely, for example, and in the example shown in FIG. 1 , the lower end side of the inclined plate 70 reaches the outer peripheral edge of the upper plate 53 . The lower end side of the inclined plate 70 is fixed to the upper surface of the upper plate 53 by bolts or the like not shown.

The drain port 71 is formed by, for example, cutting the upper plate 53 of the scattering prevention cover 5 into a triangular shape so that a part of the outer peripheral edge of the upper plate 53 becomes one side thereof, and is connected to the lower end of the inclined plate 70 . In addition, the drain port 71 communicates with a concave space in the longitudinal section of the casing 20, and the space can store the used mixed liquid.

In addition, the outer shape of the inclined plate 70 and the drain port 71 is not limited to the example shown in the figure, and the inclined plate 70 may be directed from the opening 50 of the scattering prevention cover 5 toward the upper plate along the arc-shaped movement locus of the cleaning nozzle 60, for example. The outer peripheral edge of 53 extends on the upper plate in a circular arc shape.

Further, in the example shown in FIG. 1 , only one scattering preventing portion 7 is provided on the upper plate 53 , but it may be located at the center of the rotary table 30 sandwiched therebetween, for example, under the arc-shaped movement locus of the cleaning nozzle 60 . On the other hand, another scattering preventing portion similar to the scattering preventing portion 7 is arranged at a position symmetrical to the arrangement position of the scattering preventing portion 7 .

The rotary cleaning device 1 of the present invention may include a scattering preventing portion 7A shown in FIG. 3 (hereinafter referred to as the scattering preventing portion 7A of the second embodiment) instead of the scattering preventing portion 7 shown in FIG. 1 . The scattering preventing portion 7A is a porous member disposed on the upper plate 53 of the scattering preventing cover 5 along the movement trajectory of the cleaning nozzle 60 . As the porous member, for example, porous ceramics, porous metals, porous carbons, or objects obtained by rolling up and folding a metal mesh or a resin mesh into multiple layers, etc. can be used. The scattering preventing portion 7A has, for example, a substantially triangular prism-shaped outer shape, and extends from the opening 50 of the scattering preventing cover 5 toward the outer periphery of the upper plate 53 along the movement trajectory of the cleaning nozzle 60 so as to span the upper surfaces of the surrounding plate 51 and the upper plate 53 . It is extended in such a way that it is fixed on the upper surface of the upper plate 53 with an adhesive or the like.

In the example shown in FIG. 3 , the upper surface of the scattering prevention portion 7A facing the cleaning nozzle 60 is an inclined surface that is lowered toward the outer peripheral edge of the upper plate 53, but it is not limited to this, and may be directed toward the outer peripheral edge. become a flat surface. In addition, the outer shape of the scattering prevention portion 7A is not limited to a substantially triangular prism shape. Further, in the example shown in FIG. 3 , only one scattering preventing portion 7A is provided on the upper plate 53 , but for example, under the arc-shaped movement locus of the cleaning nozzle 60 , it may be placed between the rotating table 30 and the side. Another scattering preventing portion similar to the scattering preventing portion 7A is arranged at a position symmetrical to the arrangement position of the scattering preventing portion 7A in the center.

For example, as shown in FIG. 5 , a drain port 75 is penetratingly formed at a position below the scattering preventing portion 7A on the upper plate 53 . The drain port 75 communicates with the concave space in the longitudinal section of the casing 20 , and the space can be stored and used up. of the mixture. In addition, the arrangement position of the drain port 75 is not limited to the example shown in this embodiment.

Hereinafter, the case where the upper surface Wb of the object to be cleaned W is cleaned with a mixed liquid (two fluids) of air and cleaning water is used to dry the object to be cleaned W by blowing air from the cleaning nozzle 60 using the rotary cleaning device 1 The operation of the rotary cleaning device 1 will be described.

First, as shown in FIG. 2 , the elevating unit 16 of the rotary cleaning apparatus 1 is operated, and the scattering prevention cover 5 is lowered and the side plate 52 is opened. That is, the rotary cleaning apparatus 1 opens the space between the upper cover 22 and the casing 20 in the Z-axis direction, and is in a state in which the objects W to be cleaned can enter the inside.

The to-be-cleaned object W is conveyed to the rotary table 30, and the to-be-cleaned object W is mounted on the holding surface 300a so that the upper surface Wb may become an upper side. Then, the suction force generated by an unillustrated suction source connected to the rotary table 30 is transmitted to the holding surface 300a, and the rotary table 30 sucks and holds the object to be cleaned W on the holding surface 300a.

Next, as shown in FIG. 1 , the elevating unit 16 operates to raise the scattering prevention cover 5 from the inside of the casing 20 , and the upper end surface of the side plate 52 abuts on the lower surface of the peripheral edge portion of the upper cover 22 and stops. The space between the upper cover 22 and the casing 20 is sealed by the side plate 52 , and the upper cover 22 and the scattering prevention cover 5 form a closed space for washing and drying the objects W to be cleaned. In addition, the opening 50 of the scattering prevention cover 5 is positioned above the upper surface Wb of the object to be cleaned W held by the rotary table 30 . That is, the upper surface Wb of the to-be-cleaned object W is positioned below the upper end surface of the surrounding plate 51 .

Next, the cleaning nozzle 60 is rotationally moved by the horizontal moving unit 40 , and the ejection port 600 of the cleaning nozzle 60 is positioned above the center of the upper surface Wb of the cleaning object W whose center is aligned and sucked and held by the rotary table 30 . In this state, the cleaning water is supplied from the water source 69 to the cleaning nozzle 60 and the compressed air is supplied from the air source 68 to the cleaning nozzle 60, and the air and the A mixture of cleaning water (two fluids). In addition, the cleaning nozzle 60 that jets the mixed liquid is rotationally moved above the object W to be cleaned so as to reciprocate at a predetermined angle around the axis in the Z-axis direction. In addition, by rotating the rotary table 30 at a predetermined rotational speed by the rotary unit 32 , the mixed liquid is sprayed from the cleaning nozzle 60 to the entire upper surface Wb of the object W to be cleaned.

In addition, the cleaning nozzle 60 may be moved linearly in the horizontal direction without rotational movement.

In addition, the cleaning nozzle 60 may not be positioned above the center of the object W to be cleaned. That is, the center and the center portion of the object to be cleaned W are not cleaned, but only the outer peripheral edge Wd portion is cleaned.

Thereby, the adhering matter such as grinding dust adhering to the upper surface Wb of the object to be cleaned W is washed and removed by the mixed solution. Then, the mixed solution to which the centrifugal force generated by the rotation of the rotary table 30 is applied flows on the upper surface Wb of the object to be cleaned W from the center side toward the outer peripheral side, and flows from the upper surface Wb to the outer periphery of the casing 20 . The plate 200 , the inner peripheral plate 201 (see FIG. 4 ), and the bottom plate 202 (see FIG. 1 ) have a concave space in longitudinal section surrounded, and are stored in the space.

In addition, centrifugal force caused by the rotation of the rotary table 30 is applied to the mixed liquid sprayed from the cleaning nozzle 60 to the object to be cleaned W, and the mixed liquid scattered radially from the rotary table 30 or the object to be cleaned W is similar to the one shown in FIG. 4 . The scattering prevention cover 5 collides with the lower surface side of the surrounding plate 51 , flows downward along the lower surface, and flows into the longitudinal direction surrounded by the outer peripheral plate 200 , the inner peripheral plate 201 , and the bottom plate 202 (see FIG. 1 ) of the casing 20 . Sectional concave space.

After the entire upper surface Wb of the object to be cleaned W is cleaned for a predetermined time, the outer periphery Wd of the object to be cleaned W, which is a bonded wafer, is actively cleaned with the mixed liquid. This is because adhering matter such as grinding debris is often deposited on the outer peripheral edge Wd of the bonded wafer. The cleaning nozzle 60 is rotated and moved by the horizontal moving unit 40 , the injection port 600 of the cleaning nozzle 60 is positioned above the outer periphery Wd of the object to be cleaned W sucked and held by the rotary table 30 , and the movement of the cleaning nozzle 60 is stopped.

In this state, a mixed liquid of air and washing water is jetted from the jetting port 600 of the washing nozzle 60 . Then, by rotating the rotary table 30 at a predetermined rotational speed, the mixed liquid is sprayed over the entire outer periphery Wd of the object W to be cleaned. In the cleaning of the outer periphery, most of the mixed solution flows into the concave space in the longitudinal section of the casing 20 through the surrounding plate 51 of the scattering prevention cover 5, but a part of the mixed solution ejected from the cleaning nozzle 60 flows into the upper plate On the upper surface of the upper plate 53 , or the mixed solution that is imparted with centrifugal force and scattered radially from the rotary table 30 or the object to be cleaned W flies to the upper surface of the upper plate 53 . Therefore, water accumulates on the upper surface of the upper plate 53, and a puddle V as shown in FIG. 4 or FIG. 5 may be formed.

Next, in the rotary cleaning apparatus 1, drying of the to-be-cleaned object W is performed. In the drying of the object to be cleaned W, for example, the upper surface Wb is first dried. The cleaning nozzle 60 is rotationally moved by the horizontal movement unit 40 , the injection port 600 of the cleaning nozzle 60 is positioned above the center of the object to be cleaned W sucked and held by the rotary table 30 , and the movement of the cleaning nozzle 60 is stopped. In addition, the cleaning nozzle 60 may be rotationally moved so as to reciprocate in the horizontal direction above the object W to be cleaned. The cleaning nozzle 60 is supplied with compressed air from the air source 68 , and the air is ejected from the ejection port 600 of the cleaning nozzle 60 toward the center of the upper surface Wb of the object W to be cleaned. In addition, by rotating the rotary table 30 at a predetermined rotational speed, the air flowing radially from the center on the upper surface Wb of the object W and the centrifugal force imparted by the rotation of the rotary table 30 are left behind. The washing water on the upper surface Wb of the object to be cleaned W flows from the upper surface Wb into the space surrounded by the outer peripheral plate 200 , the inner peripheral plate 201 (refer to FIGS. 4 and 5 ), and the bottom plate 202 of the casing 20 having a concave longitudinal cross-section .

After drying the entire upper surface Wb of the object to be cleaned W for a predetermined time, the outer peripheral edge Wd of the object to be cleaned W serving as the bonded wafer is actively dried with air. This is because the cleaning water is often accumulated on the outer peripheral edge Wd of the bonded wafer.

As shown in FIG. 4 or FIG. 5 , the cleaning nozzle 60 is rotationally moved by the horizontal moving unit 40 , and the ejection port 600 of the cleaning nozzle 60 is positioned on the side where the scattering prevention portion 7 is located and on the object attracted and held by the rotary table 30 . Above the outer peripheral edge Wd of the object to be cleaned W, the movement of the cleaning nozzle 60 is stopped. Then, air is injected from the injection port 600 of the cleaning nozzle 60 . In addition, by rotating the rotary table 30 at a predetermined rotational speed, air is sprayed over the entire outer periphery Wd of the object W to be cleaned.

Here, the problems in the conventional rotary cleaning apparatus 1B when the outer peripheral edge Wd of the object to be cleaned W is actively dried with air will be briefly described with reference to FIGS. 6 and 7 . Unlike the rotary cleaning device 1 of the present invention, the rotary cleaning device 1B shown in FIGS. 6 and 7 is configured not to have the scattering preventing portion 7 of the first embodiment shown in FIG. 4 or the second embodiment shown in FIG. 5 . The scattering prevention part 7A of the form.

Similar to the case where the outer peripheral edge Wd of the object W to be cleaned W is actively cleaned with the mixed liquid using the spin cleaning apparatus 1 of the present invention described above, the conventional spin cleaning apparatus 1B shown in FIG. 6 is used and the mixed liquid is used. When actively cleaning the outer peripheral edge Wd of the object to be cleaned W, a part of the mixed liquid sprayed from the cleaning nozzle 60 flows into the upper surface of the upper plate 53, or is imparted with centrifugal force, and is removed from the rotary table 30 or the object to be cleaned W. The mixed liquid scattered radially flies onto the upper surface of the upper plate 53 . Therefore, water accumulates on the upper surface of the upper plate 53, and a puddle V as shown in FIG. 6 may be formed.

In addition, similarly to the case where the outer peripheral edge Wd of the cleaned object W is positively air-dried using the rotary cleaning device 1 of the present invention described above, when the conventional rotary cleaning device 1B shown in FIG. When the outer peripheral edge Wd of the object to be cleaned W is actively air-dried, there is a problem in that, as shown in FIG. The water in the puddles V splashes, and the splashed water turns into droplets and rolls up, and then falls on the upper surface Wb of the dry object to be cleaned W, and wets the upper surface Wb again.

On the other hand, in the rotary cleaning device 1 of the present invention shown in FIG. 4 , there is provided the scattering preventing portion 7 for preventing the force of the air jetted from the cleaning nozzle 60 from acting on the water accumulated on the upper surface of the upper plate 53, The scattering preventing portion 7 has a sloped plate 70 extending from the opening 50 of the scattering preventing cover 5 toward the outer periphery of the upper plate 53 along the movement trajectory of the cleaning nozzle 60 on the upper plate 53 , the sloped plate 70 on the side of the opening 50 . high and the outer peripheral edge side of the upper plate 53 is low; and a drain port 71, which is formed on the outer peripheral edge of the upper plate 53, allowing water to fall from the edge of the lower end side of the inclined plate 70, so that the outer peripheral edge Wd of the object to be cleaned W falls During drying, the force of the air ejected from the cleaning nozzle 60 can flow along the inclined surface (upper surface) of the inclined plate 70 without acting on the puddles V on the upper surface of the upper plate 53, so that it can be accumulated on the upper surface of the upper plate 53. The water on the surface is not splashed by the air. Therefore, it is possible to prevent the water droplets splashed by the air from adhering to the dry cleaning object W again. In addition, since the upper surface of the sloping plate 70 is a sloping surface, water droplets and the like adhering to the upper surface of the sloping plate 70 flow downward and are discharged from the drain port 71 when the object to be cleaned W is cleaned by the mixed solution. When the air at the outer peripheral edge Wd of the object W dries, water droplets do not remain on the slope of the sloped plate 70, and water is not splashed by the air.

In addition, in the rotary cleaning device 1 of the present invention shown in FIG. 5 , there is provided a scattering preventing portion 7A that prevents the force of the air jetted from the cleaning nozzle 60 from acting on the water accumulated on the upper surface of the upper plate 53 , thereby preventing scattering. The portion 7A is a porous member disposed on the upper plate 53 of the scattering prevention cover 5 along the movement locus of the cleaning nozzle 60, and the air ejected from the cleaning nozzle 60 when drying the outer periphery Wd of the object W to be cleaned The force of the air is weakened by the scattering preventing portion 7A which is a porous member, so that the air does not strongly act on the puddles V on the upper surface of the upper plate 53, so that the water accumulated on the upper surface of the upper plate 53 can be prevented from being destroyed by the air. splash. Therefore, it is possible to prevent the water droplets splashed by the air from adhering to the dry cleaning object W again.

The spin cleaning device 1 of the present invention is not limited to the example having the scattering preventing portion 7 of the first embodiment or the scattering preventing portion 7A of the second embodiment, but can be implemented in various ways within the scope of the technical idea. . In addition, the shape and the like of each structure of the rotary cleaning apparatus 1 shown in the drawings are not limited to this, and can be appropriately changed within a range in which the effects of the present invention can be exhibited.

Claims (3)

1. A rotary cleaning device, having:

a rotary table having a holding surface for holding an object to be cleaned;

a rotating unit that rotates the rotary table;

a cleaning nozzle for spraying a mixture of cleaning water and air to the object to be cleaned held by the rotary table;

a horizontal moving unit which horizontally moves the cleaning nozzle above the rotary table;

a scattering prevention cover surrounding the rotary table so that the mixed liquid to be scattered radially from the rotary table flows downward by a centrifugal force generated by rotation of the rotary table due to the mixed liquid sprayed to the object to be cleaned from the cleaning nozzle; and

a lifting unit for lifting the scattering prevention cover along the axial direction of the rotating shaft for rotating the rotating table,

wherein,

the scattering prevention cover comprises:

an opening through which the rotary table can pass;

an annular surrounding plate formed to be inclined in a gradually expanding shape in cross section from the opening;

a side plate surrounding the surrounding plate and extending in a lifting direction of the rotary table; and

an upper plate connecting the side plates and the lower end of the surrounding plate,

the rotary cleaning device also has a scatter prevention part,

in a series of cleaning and drying operations in which the opening is positioned above the upper surface of the object to be cleaned held by the rotary table, the mixed liquid is ejected from the cleaning nozzle to clean the object to be cleaned, and then air is ejected from the cleaning nozzle to dry the object to be cleaned,

the scattering prevention part prevents the momentum of the air injected from the washing nozzle from acting on the water stored on the upper surface of the upper plate in order to prevent the water stored on the upper surface of the upper plate of the scattering prevention cover from scattering when the air is injected from the washing nozzle after the washing to dry the outer peripheral edge of the object to be washed.

2. The rotary cleaning device according to claim 1,

the scattering prevention section includes:

a bevel plate extending from the opening of the splash prevention cover toward an outer peripheral edge on the upper plate along a moving trajectory of the cleaning nozzle, the bevel plate having a high opening side and a low outer peripheral edge side; and

and a water outlet formed in the outer peripheral edge for allowing water to fall from the edge of the lower end side of the slope plate.

3. The rotary cleaning device according to claim 1,

the scattering prevention part is formed of a porous member disposed on the upper plate of the scattering prevention cover along a movement trajectory of the washing nozzle.

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