CN111208853A - Mass flow control device, reaction chamber pressure control system and adjusting method - Google Patents
Mass flow control device, reaction chamber pressure control system and adjusting method Download PDFInfo
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- CN111208853A CN111208853A CN201811390438.XA CN201811390438A CN111208853A CN 111208853 A CN111208853 A CN 111208853A CN 201811390438 A CN201811390438 A CN 201811390438A CN 111208853 A CN111208853 A CN 111208853A
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000001105 regulatory effect Effects 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims description 19
- 238000001514 detection method Methods 0.000 claims description 16
- 239000003638 chemical reducing agent Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 230000001276 controlling effect Effects 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 230000008901 benefit Effects 0.000 abstract description 7
- 239000007789 gas Substances 0.000 description 23
- 238000010586 diagram Methods 0.000 description 6
- 238000005086 pumping Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D27/00—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00
- G05D27/02—Simultaneous control of variables covered by two or more of main groups G05D1/00 - G05D25/00 characterised by the use of electric means
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Abstract
The invention provides a mass flow control device and a reaction chamber pressure control system, which comprise a mass flow pipeline, a flow control module and a driving module, wherein the flow control module is arranged on the mass flow pipeline and used for limiting the flow of gas flowing through, and the driving module is connected with the flow control module and used for driving the flow control module to move so as to adjust the flow of the gas flowing through the flow control module. The flow control module is arranged on the pipeline and is driven by the driving module, so that the flow passing through the flow control module can be adjusted between a completely opened state and a completely closed state, and the control precision of the mass flow control device is improved. The pressure regulating method of the reaction chamber provided by the invention can regulate the pressure of the reaction chamber by regulating the flow through the mass flow control device, and has the advantages of quick corresponding time and high pressure regulating precision.
Description
Technical Field
The invention belongs to the technical field of semiconductor manufacturing, and particularly relates to a mass flow control device, a reaction chamber pressure control system and an adjusting method.
Background
In the fields of semiconductor manufacturing, photovoltaics, etc., the reaction chamber is the most important device, and H entering the reaction chamber2HCl, excess O2A small amount of C2H2Cl2And N2The chemical reaction is required to be performed at a constant pressure to secure the thickness of the plating layer, and the pressure in the reaction chamber is greater or less than a set pressure to affect the thickness of the plating layer, and thus, it is necessary to secure a stable pressure in the reaction chamber.
FIG. 1 is a schematic diagram of a prior art reaction chamber pressure control system. As shown in fig. 1, the reaction chamber pressure control system includes a pressure sensor 101, a control valve 102, a vacuum pump 103, a variable frequency motor 104, and a controller 105, wherein the controller 105 receives a pressure detection result sent by the sensor 101, compares the pressure detection result with a predetermined pressure value, and adjusts the motor frequency by driving the variable frequency motor 104 to adjust the vacuum pumping capacity of the vacuum pump 103 if the pressure detection result is not equal to the predetermined pressure value, so as to achieve the purpose of stabilizing the system pressure.
However, since the control valve 102 in the prior art is a pneumatic valve and has only two operating states of fully opening or fully closing, the flow rate of the gas flowing through cannot be monitored in real time, and once the pressure in the reaction chamber fluctuates, the response time of the whole pressure system is inevitably too long, and the pressure in the reaction chamber cannot be stabilized to the set pressure value in a short time, thereby affecting the thickness of the coating.
Disclosure of Invention
The present invention is directed to at least one of the problems of the prior art, and provides a mass flow control device, a reaction chamber pressure control system and a regulation method capable of rapidly regulating a chamber pressure.
To solve the above problems, the present invention provides a mass flow control device, wherein,
a mass flow line;
the flow control module is arranged on the mass flow pipeline and used for limiting the flow of gas flowing through;
and the driving module is connected with the flow control module and used for driving the flow control module to move so as to adjust the gas flow passing through the flow control module.
The flow control module comprises a valve plate and a valve rod connected with the valve plate, and the valve plate is arranged on the mass flow pipeline;
the driving module comprises a motor and a speed reducer, an output shaft of the speed reducer is connected with the valve rod, and the opening degree of the valve plate is controlled by controlling the rotating angle of the valve rod; the speed reducer is connected with the motor and used for reducing the rotating speed output by the motor.
The valve rod is connected with the output shaft of the speed reducer through the shaft coupling.
The mass flow pipeline is arranged on the gas inlet pipe, and the mass flow pipeline is arranged on the gas inlet pipe and used for detecting the flow of gas flowing through the gas inlet pipe.
The invention also provides a reaction chamber pressure control system which comprises a reaction chamber and the mass flow control device, wherein the mass flow control device is connected with the reaction chamber, and the pressure of the reaction chamber can be adjusted by adjusting the flow passing through the mass flow control device.
The device also comprises a cooling and draining unit, wherein the cooling and draining unit is connected between the reaction chamber and the mass flow control device and used for cooling gas and draining condensed water formed in the cooling process.
The cooling and water draining unit comprises a three-way pipeline, a position sensor and a pneumatic valve; wherein,
the first end of the three-way pipeline is respectively connected with the position sensor and the pneumatic valve, the second end of the three-way pipeline is connected with the reaction chamber, the third end of the three-way pipeline is connected with the mass flow control device, the pipeline in the three-way pipeline, which is connected with the reaction chamber and the mass flow control device, is a double-layer pipeline, and a cooling medium is introduced between the inner layer and the outer layer of the double-layer pipeline so as to cool the gas flowing through the double-layer pipeline;
the sensor is used for detecting whether condensed water formed by cooling between the inner layer and the outer layer reaches a preset height.
Wherein, the three-way pipeline is made of quartz materials.
The pressure detection unit is connected with the reaction chamber and is used for detecting the real-time pressure of the reaction chamber;
the control unit is respectively connected with the pressure detection unit and the mass flow control device and is used for controlling the mass flow control device to adjust the gas flow according to the size relation between the current pressure and the preset pressure.
The invention also provides a pressure regulating method of the reaction chamber, which comprises the following steps:
detecting a current pressure within the reaction chamber;
when the current pressure is equal to the preset pressure, the mass flow control device is kept in the current working state;
and when the current pressure is smaller than the preset pressure, the control unit controls the mass flow control device to adjust the gas flow so as to adjust the pressure in the reaction chamber to the preset pressure.
The invention has the following beneficial effects:
the invention provides a mass flow control device which comprises a mass flow pipeline, a flow control module and a driving module, wherein the flow control module is arranged on the mass flow pipeline and used for limiting the flow of gas flowing through, and the driving module is connected with the flow control module and used for driving the flow control module to move so as to adjust the flow of the gas flowing through the flow control module. The flow control module is arranged on the pipeline and is driven by the driving module, so that the flow passing through the flow control module can be adjusted between a completely opened state and a completely closed state, and the control precision of the mass flow control device is improved.
The reaction chamber pressure control system provided by the invention adopts the mass flow control device provided by the invention to adjust the pressure of the reaction chamber by adjusting the flow through the mass flow control device, and has the advantages of quick corresponding time and high pressure adjustment precision.
The pressure regulating method of the reaction chamber provided by the invention comprises the steps of detecting the current pressure in the reaction chamber; when the current pressure is equal to the preset pressure, the mass flow control device is enabled to keep the current working state, and when the current pressure is smaller than the preset pressure, the control unit controls the mass flow control device to adjust the gas flow so as to adjust the pressure in the reaction chamber to the preset pressure. The pressure regulating method of the reaction chamber adopts the pressure control system of the reaction chamber, so that the flow can be regulated through the mass flow control device to regulate the pressure of the reaction chamber, and the pressure regulating method has the advantages of quick corresponding time and high pressure regulating precision.
Drawings
FIG. 1 is a schematic diagram of a prior art reaction chamber pressure control system;
FIG. 2 is a schematic diagram of a mass flow control device employed in the pressure control system of the present invention;
fig. 3 is a schematic diagram of a reaction chamber pressure control system according to an embodiment of the present invention.
Wherein,
1-a reaction chamber; 2-mass flow control means; 21-flow measurement module; 211-inlet connection; 212-a channel; 213-a flow divider; 214-a flow sensor; 215-a circuit board; 22-a drive module; 221-a motor; 222-a reducer; 223-a circuit board; 224-a housing; 23-a flow control module; 231-a valve seat; 232-valve plate; 233-valve stem; 234-locking nut; 235-an air outlet joint; 3-a vacuum source; 4-an air extraction pipeline; 5-cooling the drainage unit; 6-a coupler; 8-a pressure detection unit; 9-a control unit; 10-industrial control computer; 101-a pressure sensor; 102-a control valve; 103-vacuum pump; 104-a variable frequency motor; 105-a controller.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the mass flow control device, the reaction chamber pressure control system and the adjustment method provided by the present invention are described in detail below with reference to the accompanying drawings.
FIG. 2 is a schematic diagram of a mass flow control device used in the pressure control system of the present invention.
As an aspect of the present invention, the present invention provides a mass flow control device 2, as shown in fig. 2, which includes a mass flow pipeline, a flow control module 23 and a driving module 22, wherein the flow control module 23 is disposed on the mass flow pipeline and is used for limiting the flow of gas flowing through the mass flow pipeline, and the driving module 22 is connected to the flow control module 23 and is used for driving the flow control module 23 to move so as to adjust the flow of gas flowing through the flow control module 23.
According to the invention, the flow control module 23 is arranged on the pipeline, and the driving module 22 drives the flow control module 23, so that the flow passing through the flow control module can be adjusted between the fully open state and the fully closed state, and the control precision of the mass flow control device 2 is improved.
As a specific driving manner, in this embodiment, the flow control module 23 includes a valve plate 232 and a valve rod 233 connected to the valve plate 232, the valve plate 232 is disposed on the mass flow pipeline, the air inlet joint 211 and the air outlet joint 235 of the mass flow pipeline are respectively disposed on two sides of the valve plate 232, at this time, the driving module 22 includes a motor 221 and a reducer 222, an output shaft of the reducer 222 is connected to the valve rod 233, the opening degree of the valve plate 232 is controlled by controlling a rotation angle of the valve rod 233, so as to achieve the purpose of adjusting the flow rate, and the reducer 222 is connected to the motor 221 for reducing the rotation speed output by the motor 221. The speed reducer 222 is used to avoid sudden flow rate change caused by sudden speed change.
Preferably, the mass flow control device 2 further comprises a coupling 6, and an output shaft of the reducer 222 is connected with the valve rod 233 through the coupling 6 to transmit the power output by the motor 221 to the flow control module 23, so as to drive the valve plate 232 to rotate.
In this embodiment, the mass flow control unit 2 further includes a flow detection module 21, which is disposed on the mass flow pipeline and is used for detecting the flow of the gas flowing through the mass flow pipeline.
The flow detection module 21 further includes a shunt 213, a flow sensor 214, and a circuit board 215, the shunt 213 is disposed on the mass flow pipe, the flow sensor 214 is used to detect the flow of gas flowing through, and the circuit board 215 is integrated with high-precision components such as a resistor, a capacitor, and the like.
Preferably, the portion of the mass flow control device 2 that contacts the gas is made of polyetheretherketone, which has the advantage of corrosion resistance, thereby extending the useful life of the mass flow control device 2.
Optionally, the flow control module 23 further includes a valve seat 231 and a lock nut 234, a through hole is provided on a sidewall of the mass flow pipeline, the valve seat 231 is disposed opposite to the through hole, the lock nut 234 is fixed on the through hole, and the valve stem 233 passes through the lock nut 234 and extends to the valve seat 231. The position of the valve stem 233 on the mass flow line is guided by the valve seat 231 and the lock nut 234 together.
Optionally, the driving module 22 further includes a circuit board 223, and the circuit board 223 integrates components such as a capacitor and a resistor to realize driving.
Optionally, the driving module 22 further includes a housing 224, which is disposed outside the motor 221, the reducer 222 and the circuit board 223 for protection.
It should be noted that, although in the present embodiment, the opening degree of the valve sheet 232 is adjusted by adopting a driving manner of driving the valve sheet 232 to rotate, the present invention is not limited to this, and in practical applications, the opening degree of the valve sheet may also be adjusted by controlling the valve sheet to move along the radial direction of the mass flow pipeline, and accordingly, the driving source adopts a linear reciprocating driving source.
In summary, with the mass flow control device 2 provided in the embodiment of the present invention, the flow control range is 0.3 to 30SLM, the response time is less than or equal to 5s, and the control accuracy is 0.2% f.s., and further, the pressure control range of the reaction chamber 1 is 680torr to 780 torr. Further, the present invention provides a pressure control system that can adjust the pressure in the reaction chamber to a preset pressure within 10 seconds.
The invention also provides a reaction chamber pressure control system, and a mass flow control device of the reaction chamber pressure control system, wherein the mass flow control device is connected with the reaction chamber, and the pressure of the reaction chamber can be adjusted by adjusting the flow passing through the mass flow control device.
The reaction chamber pressure control system provided by the invention adopts the mass flow control device, and can adjust the flow passing through the flow control module between the completely opened state and the completely closed state, so that the control precision of the mass flow control device is improved, and the reaction chamber pressure control system has the advantages of quick corresponding time and high pressure adjustment precision.
Fig. 3 is a schematic diagram of a reaction chamber pressure control system according to an embodiment of the present invention. As shown in fig. 3, the pressure control system further includes a cooling and draining unit 5, wherein the cooling and draining unit 5 is connected between the reaction chamber 1 and the mass flow control device 2, and is used for cooling the gas flowing out of the reaction chamber 1 and draining the condensed water formed in the cooling process.
The specific structure of the cooling drain unit 5 will be described in detail below.
In the present embodiment, the cooling drain unit 5 includes a three-way pipe, a position sensor, and a pneumatic valve. Wherein, position sensor and pneumatic valve are connected respectively to tee bend pipeline's first end, and tee bend pipeline's second end is connected reaction chamber 1, and tee bend pipeline's third end is connected mass flow control device 2 and is connected to, the pipeline of connecting reaction chamber 1 and mass flow control device 2 among the tee bend pipeline is double-deck pipeline, lets in coolant between double-deck pipeline's inlayer and skin to cool off the gas in the middle of the double-deck pipeline of convection current. The sensor is used for detecting whether the condensed water formed by cooling between the inner layer and the outer layer reaches a preset height, and when the condensed water reaches the preset height, the pneumatic valve is opened to discharge the condensed water.
Wherein, the cooling medium can be the comdenstion water that the cooling formed to reduce equipment cost.
Preferably, the material of the three-way pipeline is made of quartz material, so as to improve the high temperature resistance of the three-way pipeline.
In this embodiment, the reaction chamber pressure control system further includes a pressure detection unit 8 and a control unit 9, wherein the pressure detection unit 8 is connected to the reaction chamber 1 and is used for detecting the real-time pressure of the reaction chamber 1. The control unit 9 is respectively connected with the pressure detection unit 8 and the mass flow control device 2, and is used for controlling the mass flow control device 2 to adjust the gas flow according to the magnitude relation between the current pressure P1 and the preset pressure P, so as to adjust the pressure of the reaction chamber 1.
Wherein, the preset pressure P is the pressure set in the reaction chamber 1 during the process.
The control unit 9 performs control based on the PID algorithm.
The pressure control system further includes an industrial control computer 10, as shown in fig. 3, the industrial control computer 10 is connected to the control unit 9, and a user performs operation control on the reaction chamber pressure control system through the industrial control computer 10.
The pressure detection unit 8 may be provided in parallel with the mass flow control device 2 as shown in fig. 3, or may be connected in series with the mass flow control device 2, as long as the pressure detection unit 8 can measure the real-time pressure P1 of the reaction chamber 1.
In addition, the reaction chamber pressure control system also comprises a vacuum source 3 and an air pumping pipeline 4. Wherein, the vacuum source 3 is connected to the reaction chamber 1 through the pumping line 4 for evacuating the reaction chamber 1.
Wherein the vacuum source 3 is a vacuum generator. Compared with the vacuum pump used in the prior art, the vacuumizing power of the vacuum generator is fixed, and the gas flow is regulated by the mass flow control device, so that the vacuum pump with adjustable vacuumizing power is not needed to be used like the prior art, and the cost of the vacuum source is reduced. In addition, the vacuum generator also has the advantages of small volume, low noise, corrosion resistance and the like.
As still another aspect of the present invention, the present invention also provides a pressure regulating method of a reaction chamber, comprising the steps of:
s1, detecting the current pressure in the reaction chamber;
s2, when the current pressure P1 is equal to the preset pressure P, the mass flow control device 2 is kept in the current working state; and, when the current pressure is less than the preset pressure, the control unit 9 controls the mass flow control device 2 to adjust the gas flow rate to adjust the pressure in the reaction chamber 1 to the preset pressure P.
Here, "maintaining the current operating state" means keeping the opening degree of the valve sheet 232 of the flow control module 23 constant.
The pressure regulating method of the reaction chamber adopts the pressure control system of the reaction chamber, so that the flow can be regulated through the mass flow control device to regulate the pressure of the reaction chamber, and the pressure regulating method has the advantages of quick corresponding time and high pressure regulating precision.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (10)
1. A mass flow control device, wherein,
a mass flow line;
the flow control module is arranged on the mass flow pipeline and used for limiting the flow of gas flowing through;
and the driving module is connected with the flow control module and used for driving the flow control module to move so as to adjust the gas flow passing through the flow control module.
2. A mass flow control device according to claim 1, wherein the flow control module comprises a valve plate and a valve stem connected to the valve plate, the valve plate being disposed on the mass flow line;
the driving module comprises a motor and a speed reducer, an output shaft of the speed reducer is connected with the valve rod, and the opening degree of the valve plate is controlled by controlling the rotating angle of the valve rod; the speed reducer is connected with the motor and used for reducing the rotating speed output by the motor.
3. A mass flow control device according to claim 2, further comprising a coupling through which the output shaft of the speed reducer is connected to the valve stem.
4. The mass flow control device of claim 1, further comprising a flow sensing module disposed on the mass flow line for sensing the flow of gas therethrough.
5. A reaction chamber pressure control system comprising a reaction chamber and a mass flow control device according to any of claims 1 to 4, wherein the mass flow control device is connected to the reaction chamber and the pressure in the reaction chamber is adjustable by adjusting the flow through the mass flow control device.
6. The reaction chamber pressure control system of claim 5, further comprising a cooling drain unit connected between the reaction chamber and the mass flow control device for cooling the gas and draining condensed water formed during the cooling process.
7. The reaction chamber pressure control system of claim 6 wherein the cooling drain unit comprises a three-way pipe, a position sensor, and a pneumatic valve; wherein,
the first end of the three-way pipeline is respectively connected with the position sensor and the pneumatic valve, the second end of the three-way pipeline is connected with the reaction chamber, the third end of the three-way pipeline is connected with the mass flow control device, the pipeline in the three-way pipeline, which is connected with the reaction chamber and the mass flow control device, is a double-layer pipeline, and a cooling medium is introduced between the inner layer and the outer layer of the double-layer pipeline so as to cool the gas flowing through the double-layer pipeline;
the sensor is used for detecting whether condensed water formed by cooling between the inner layer and the outer layer reaches a preset height.
8. The reaction chamber pressure control system of claim 7, wherein the tee line is made of quartz material.
9. The reaction chamber pressure control system according to any one of claims 5 to 8, further comprising a pressure detection unit and a control unit, wherein the pressure detection unit is connected to the reaction chamber for detecting a real-time pressure of the reaction chamber;
the control unit is respectively connected with the pressure detection unit and the mass flow control device and is used for controlling the mass flow control device to adjust the gas flow according to the size relation between the current pressure and the preset pressure.
10. A method of regulating the pressure in a reaction chamber, comprising the steps of:
detecting a current pressure within the reaction chamber;
when the current pressure is equal to the preset pressure, the mass flow control device is kept in the current working state;
and when the current pressure is smaller than the preset pressure, the control unit controls the mass flow control device to adjust the gas flow so as to adjust the pressure in the reaction chamber to the preset pressure.
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Cited By (1)
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| CN111208853B (en) | 2021-11-16 |
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