CN111048386B

CN111048386B - Adjustable plasma reaction cavity structure of radio frequency coil

Info

Publication number: CN111048386B
Application number: CN201811190407.XA
Authority: CN
Inventors: 陈俊龙; 徐光俊
Original assignee: Hermes Epitek Corp
Current assignee: Hermes Epitek Corp
Priority date: 2018-10-12
Filing date: 2018-10-12
Publication date: 2022-07-12
Anticipated expiration: 2038-10-12
Also published as: CN111048386A

Abstract

The invention provides a plasma reaction cavity structure with an adjustable radio frequency coil, which comprises: an upper support member; a plurality of clamping bolts which can be continuously combined with the upper clamping part in a sliding way; a lower support; a plurality of continuous sliding holders having a lower holder and a strip-shaped through hole; and the radio frequency coil is clamped between the upper clamping part and the lower clamping part and forms a surrounding structure. By the implementation of the invention, the adjustment of the radio frequency coil can be rapidly completed and the aim of uniformly distributing the plasma field in the cavity can be achieved.

Description

Adjustable plasma reaction cavity structure of radio frequency coil

Technical Field

The invention relates to a plasma reaction cavity structure with an adjustable radio frequency coil, in particular to a plasma reaction cavity structure with an adjustable radio frequency coil of an etching machine.

Background

Plasma has been widely used in various fields, such as semiconductor integrated circuit fabrication, for example, the growth of films of different materials and the etching of circuits, and is commonly achieved by plasma technology. Plasma sources are critical to the system in plasma technology. The current methods for generating plasma use power sources such as Direct Current (DC) discharge, low and medium frequency (several KHz to several MHz) discharge, radio frequency (13.6MHz) discharge, and microwave (2.45GHz) discharge.

As shown in fig. 1A and 1B, rf discharge is most frequently used in semiconductor manufacturing, and therefore, rf coils are often used to achieve rf discharge, but all tools must be calibrated by rf coils before use. In the conventional radio frequency coil, a lower clamping piece P10 with a fixed and single clamping groove is used, and an upper pressing piece P20 pressed from the upper side is matched to limit the position of the radio frequency coil 50 in a single-format fixed base mode.

Disclosure of Invention

The invention relates to a radio frequency coil adjustable plasma reaction cavity structure, which mainly solves the problems that a radio frequency coil is only fixed according to a single format, a fixed design does not have an adjusting mechanism, and the upper part of the radio frequency coil is easy to deform, so that the shape of a circular radio frequency coil cannot be formed, and the distribution and the stability of plasma are further influenced.

The invention provides a plasma reaction cavity structure with an adjustable radio frequency coil, which comprises: an upper support member; a plurality of clamping bolts which can be adjusted in lifting height and combined with the upper supporting piece, and each clamping bolt is combined with the upper clamping part in a continuous sliding way; the lower support piece is correspondingly formed at the lower side of the upper support piece; each continuous sliding clamping piece is provided with a lower clamping part and a strip-shaped through hole, and is fixedly locked on the lower supporting piece after penetrating through the strip-shaped through hole by a locking piece; and the radio frequency coil is clamped between the upper clamping part and the lower clamping part and forms a surrounding structure.

In the plasma reaction chamber structure, each of the clamping bolts includes a lifting screw and a combining sleeve, and the combining sleeve is combined with the lifting screw by a spiral part.

In the plasma reaction chamber structure, a suspension screw is disposed in the coupling sleeve, a guide block is coupled to a bottom of the suspension screw, and the upper clamping portion is coupled to the guide block by a sliding groove in a continuous sliding manner.

In the plasma reaction chamber structure, the upper clamping portion or the lower clamping portion is an insulator made of polyetheretherketone resin.

In the above plasma reaction chamber structure, the upper clamping portion has a plate-shaped clamping groove.

In the plasma reaction chamber structure, the lower clamping portion is a plate-shaped clamping groove.

In the above plasma reaction chamber structure, the upper clamping portion and the lower clamping portion are disposed in a one-to-one corresponding manner.

In the plasma reaction chamber structure, the lower clamping portion has a strip-shaped groove formed by extending the strip-shaped through hole outwards.

The invention also provides a plasma reaction cavity structure with an adjustable radio frequency coil, which comprises: an upper support member; the first multi-slot bolts are combined with the upper supporting piece in a lifting height adjustable mode, and a first multi-slot part is arranged below each first multi-slot bolt; the lower support piece is correspondingly formed at the lower side of the upper support piece; a plurality of second multi-slot members locked to the lower support member; and the radio frequency coil is clamped between the first multi-slot component and the second multi-slot component and forms a surrounding structure.

In the plasma reaction chamber structure, each of the first multi-groove bolts includes a lifting screw and a coupling sleeve, and the coupling sleeve is coupled to the lifting screw via a spiral portion.

In an embodiment of the plasma reaction chamber structure, the first multi-groove member or the second multi-groove member is an insulator made of peek resin.

In the plasma reaction chamber structure, a hanging screw is disposed in the combining sleeve, and the bottom of the hanging screw is combined with the first multi-slot member.

In an embodiment, the first multi-slot component and the second multi-slot component are disposed in a one-to-one correspondence manner.

The invention also provides a plasma reaction cavity structure with an adjustable radio frequency coil, which comprises: an upper support member; a plurality of vertical adjustment modules, each vertical adjustment module comprising: a first motor which is combined with the upper supporting piece and is provided with a first output shaft; the lifting rod is combined on one side of the first output shaft and moves up and down along with the rotation of the first output shaft; a plurality of leveling modules, each leveling module comprising: a second motor coupled to the lift lever; and a C-shaped clamp which is combined on a second output shaft of the second motor and horizontally shifts along with the rotation of the second output shaft; and the radio frequency coil is clamped between the C-shaped clamps and forms a surrounding structure.

In the plasma reaction chamber structure, the C-shaped clip is an insulator made of polyetheretherketone resin.

In the plasma reaction chamber structure, each of the C-shaped clamps has a plate-shaped clamping groove on the upper and lower sides thereof, and the rf coil is clamped in the plate-shaped clamping groove.

The plasma reaction cavity structure is characterized in that: the motor further comprises a control module, and each first motor and/or each second motor is in signal connection with the control module.

In the plasma reaction chamber structure, the control module further includes a network unit.

By implementing the invention, at least the following progressive effects can be achieved:

firstly, the radio frequency coil can be adjusted continuously to finish adjustment and calibration quickly.

And secondly, the radio frequency coil can be adjusted in a staged manner to quickly finish adjustment.

And thirdly, the fine adjustment of the circular radio frequency coil can be easily completed, and the requirements of slightly different distances from the circle center can be met.

And fourthly, the aim of uniformly distributing the plasma field in the cavity can be achieved.

The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, the present invention may be implemented in accordance with the content of the description, and in order to make the above and other objects, features, and advantages of the present invention more clearly understood, the following preferred embodiments are described in detail with reference to the accompanying drawings.

Drawings

FIG. 1A is a schematic view of a conventional RF coil and its fixing structure.

Fig. 1B is a partially enlarged view of fig. 1A.

FIG. 2A is a diagram of a first embodiment of a tunable RF coil plasma reaction chamber structure according to the present invention.

Fig. 2B is a partially enlarged view of fig. 2A.

Fig. 2C is a view of an embodiment of a clamping bolt of the first embodiment.

Fig. 2D is a view of the continuous slide clamp embodiment of the first embodiment.

Fig. 2E is a cross-sectional view of the embodiment of fig. 2D.

FIG. 3A is a diagram of a second embodiment of a tunable RF coil plasma chamber structure according to the present invention.

FIG. 3B is a diagram of an embodiment of a second embodiment of a RF coil clamp.

Fig. 3C is a partial enlarged view of fig. 3B.

Fig. 3D is a diagram of a multi-card slot bolt embodiment of the first embodiment.

FIG. 4A is a diagram of a third embodiment of a tunable RF coil plasma reaction chamber structure according to the present invention.

Fig. 4B is a partially enlarged view of the first adjustment state of fig. 4A.

Fig. 4C is a partially enlarged view of the second adjustment state of fig. 4A.

FIG. 5 is a diagram of an embodiment of a RF coil tunable plasma chamber structure control system.

[ description of main element symbols ]

P10: lower clip piece P20: upper casting die

100: first embodiment of RF coil adjustable plasma reaction chamber structure

200: second embodiment of RF coil adjustable plasma reaction chamber structure

300: third embodiment of RF coil adjustable plasma reaction chamber structure

10: the upper support 20: clamping bolt

21: first multi-slot bolt 210: upper clamping part

211: the guide block 212: suspended screw

213: the chute 214: plate-shaped clamping groove

215: first multi-slot member 220: lifting screw

230: the coupling sleeve 231: screw part

232: positioning bolt 30: lower support

310: vertical adjustment module 311: the first motor

312: the lifting rod 313: first output shaft

320: the leveling module 321: second motor

322: the C-shaped clamp 323: second output shaft

330: the control module 331: network unit

40: continuous slide clamp 41: second multiple-slot member

410: lower clamping portion 420: strip-shaped perforation

430: the elongated grooves 440: nut contact surface

50: the radio frequency coil 60: screw/locking piece

Detailed Description

As shown in fig. 2A to 2E, a first embodiment is a tunable rf coil plasma reaction chamber structure 100, which includes: an upper support 10; a plurality of clamping bolts 20; a lower support 30; a plurality of continuous slide clamps 40; and a radio frequency coil 50.

And an upper supporter 10 which is a structural support member of the plasma reaction chamber structure.

As shown in fig. 2C, a plurality of clamping bolts 20 are combined with the upper supporting member 10, and each clamping bolt 20 is combined with the upper clamping portion 210 in a continuous sliding manner, so as to adjust the rf coil 50 more precisely, elastically, conveniently and effectively.

The continuity in this embodiment is not limited to a first order distance, and may be any distance movement, for example: 0.5 cm, 0.01 cm, 0.003 cm, 0.N cm …, etc., and the movement is performed without any distance hierarchy limitation.

The clamping bolt 20 may include a lifting screw 220 and a coupling sleeve 230. The elevating screw 220 is coupled to the upper supporter 10 with adjustable elevating height, and the coupling sleeve 230 is coupled to the elevating screw 220 by means of a spiral portion 231 of the inner screw. By rotating the lifting screw 220, the height of the upper clamping portion 210 can be adjusted, thereby changing the pressing degree of the RF coil 50.

The coupling sleeve 230 may further be fixed by a positioning bolt 232, which is directly fastened to the lifting screw 220 after the positioning bolt 232 penetrates the coupling sleeve 230.

In order to achieve continuous sliding of the upper clamping portion 210, a guiding block 211 may be disposed at the bottom of the clamping bolt 20, and the guiding block 211 may rotate arbitrarily, for example, a hanging screw 212 that may rotate arbitrarily is disposed in a combining sleeve 230 of the clamping bolt 20, and the guiding block 211 is combined at the bottom of the hanging screw 212, at this time, the guiding block 211 may also rotate arbitrarily. The upper clamping portion 210 may be provided with a slide groove 213, and the upper clamping portion 210 may be coupled to the guide block 211 by continuously sliding the guide block 211 into the slide groove 213.

Since the upper clamping portion 210 is mainly used for clamping the rf coil 50, and since the rf coil 50 has a plate-shaped structure, the upper clamping portion 210 can be designed to have a plate-shaped clamping groove 214, so as to clamp the rf coil 50 more stably.

The lower support 30, which is also a structural support member for the plasma reaction chamber structure, is correspondingly formed at the lower side of the upper support 10.

As shown in fig. 2D and 2E, each of the continuous sliding holders 40 has a lower holder 410 and an elongated through hole 420. The lower clamping portion 410 is also used for clamping the rf coil 50, so the lower clamping portion 410 can be designed to have a plate-shaped clamping groove 214, thereby clamping the rf coil 50 more firmly.

The elongated through hole 420 is mainly to allow the lower clamping portion 410 to achieve continuous sliding adjustment, and when in use, the screw/locking member 60 can penetrate through the elongated through hole 420 and continuously move inside the elongated through hole 420, and when the adjustment and positioning are achieved, the screw/locking member 60 is used to lock the lower clamping portion 410 to the lower support 30.

In order to allow the screw 60 to more firmly lock the continuous sliding clamp 40, the lower clamp 410 may further have an elongated groove 430, the elongated groove 430 does not penetrate through the continuous sliding clamp 40, the elongated groove 430 is formed by extending the elongated through hole 420 and is formed with a nut contact surface 440.

In order to avoid the generation of radio frequency arc (RF arc), the upper clamping portion 210 or the lower clamping portion 410 may be an insulator of polyether ether ketone (PEEK) resin.

The rf coil 50 is mainly used to provide power for forming plasma, so that the rf coil 50 is sandwiched between the upper clamping portion 210 and the lower clamping portion 410, and forms a surrounding structure, thereby forming an electric field.

For better adjustment, the upper clamping portion 210 and the lower clamping portion 410 are disposed in a one-to-one correspondence manner, that is, the upper clamping portion 210 and the lower clamping portion 410 are located at the upper and lower relative positions of the same vertical line, and simultaneously clamp the rf coil 50.

During calibration, the rf coil 50 is roughly clamped between the upper clamping portion 210 and the lower clamping portion 410, and then each of the continuous sliding clamping members 40 can be moved or fine-tuned; when the continuous sliding clamping member 40 is moved, the rf coil 50 is driven to move, and when the rf coil 50 moves, the upper clamping portion 210 synchronously slides continuously along with the rf coil 50 under the action of the sliding groove 213 and the guiding block 211.

After all adjustment and calibration are completed, each continuous sliding clamping piece 40 is locked, and then the lifting screw 220 can be adjusted, so that the upper clamping part 210 can tightly press the radio frequency coil 50; therefore, the adjustment operation and time of the machine can be greatly saved.

As shown in fig. 3A to 3D, a second embodiment is a tunable rf coil plasma reaction chamber structure 200, which includes: an upper support 10; a plurality of first multi-slot bolts 21; a lower support 30; a plurality of second multi-slot members 41; and a radio frequency coil 50.

As shown in fig. 3C and 3D, the first multi-slot bolts 21 are combined with the upper supporting member 10 with adjustable lifting height, and a first multi-slot member 215 is disposed below each first multi-slot bolt 21. The first multi-slot device 215 is a multi-slot device formed by a plurality of parallel plates, each of which is adapted to hold the rf coil 50.

The first multi-groove bolt 21 includes a lifting screw 220 and a coupling sleeve 230, wherein the lifting screw 220 is coupled to the upper support 10 with adjustable lifting height, and the coupling sleeve 230 is coupled to the lifting screw 220 via a spiral portion 231 of the inner threads. By rotating the lifting screw 220, the height of the first multi-slot device 215 can be adjusted, thereby changing the pressing degree of the RF coil 50.

In order to keep the first multi-slot device 215 with a certain rotation elasticity, a hanging screw 212 capable of rotating freely is disposed in the combining sleeve 230, and the bottom of the hanging screw 212 is combined with the first multi-slot device 215. At this point, the first multi-slot device 215 will also rotate as desired.

The lower support 30, which is also a structural support member of the plasma reaction chamber structure, is correspondingly formed at the lower side of the upper support 10, and the lower support 30 is correspondingly formed at the lower side of the upper support 10.

As shown in fig. 3C, a plurality of second multi-slot members 41 are secured to the lower support member 30. The second multi-slot device 41 is also a multi-slot formed by a plurality of parallel plates, and each slot is also adapted to retain the rf coil 50.

To avoid the generation of radio frequency arcs, the first multi-slot device 215 or the second multi-slot device 41 may be an insulator of polyetheretherketone resin.

The rf coil 50 is mainly used to provide power for forming plasma, so that the rf coil 50 is sandwiched between the first multi-slot device 215 and the second multi-slot device 41, and forms a surrounding structure, thereby forming an electric field.

For better calibration, the first multi-slot device 215 and the second multi-slot device 41 are disposed in a one-to-one correspondence manner, that is, the first multi-slot device 215 and the second multi-slot device 41 are located at the upper and lower relation positions of the same vertical line, and simultaneously clamp the rf coil 50.

During calibration, the rf coil 50 may be selectively disposed in the slot, and then the elevation of the first multi-slot member 215 may be adjusted by rotating the elevating screw 220, so as to change the pressing degree of the rf coil 50 during clamping.

As shown in fig. 4A to 4C, a third embodiment is a tunable rf coil plasma reaction chamber structure 300, which includes: an upper support 10; a plurality of vertical adjustment modules 310; a plurality of leveling modules 320; and a radio frequency coil 50.

The upper support 10, which is also a structural support member of the plasma reaction chamber structure 300.

A plurality of vertical adjustment modules 310, each vertical adjustment module 310 comprising: a first motor 311; and a lift rod 312. The first motor 311 is coupled to the upper support 10 and has a first output shaft 313, and the first output shaft 313 is driven by the first motor 311 to rotate; the lifting rod 312 is coupled to one side of the first output shaft 313 and moves up and down according to the rotation of the first output shaft 313.

A plurality of leveling modules 320, each leveling module 320 comprising: a second motor 321; and a C-clip 322. The second motor 321 is coupled to the lifting rod 312, so that the second motor 321 moves up and down along with the lifting rod 312; the C-clip 322 is coupled to the second output shaft 323 of the second motor 321, and when the second output shaft 323 rotates, the C-clip 322 is driven to horizontally displace.

In order to effectively hold the rf coil 50, the C-shaped clips 322 may have plate-shaped clip grooves 214 on the upper and lower sides thereof, respectively, and when the rf coil 50 is clamped in the plate-shaped clip grooves 214, the rf coil 50 can be stably held. To avoid rf arcing, the C-clip 322 or the plate clip groove 214 may be an insulator of peek resin.

The RF coil 50, also used to provide power for forming plasma, is sandwiched between the C-shaped clamps 322 and forms a surrounding structure with the RF coil 50. When the vertical adjustment module 310 and the horizontal adjustment module 320 are actuated, the rf coil 50 can move up and down or horizontally, thereby achieving the purpose of fast adjustment.

As shown in fig. 5, for the purpose of automation or remote central control, each first motor 311 and/or each second motor 321 is in signal connection with the control module 330, and the control module 330 can control the displacement driven by the first motor 311 and/or each second motor 321; in addition, the control module 330 may further include a network unit 331, and the network unit 331 may be connected to a remote end and receive a remote calibration control signal.

Although the present invention has been described with reference to a preferred embodiment, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims

1. A kind of plasma reaction cavity structure that the radio frequency coil can be regulated, characterized by that it includes:

an upper support member;

a plurality of clamping bolts which can be adjusted in lifting height and combined with the upper supporting piece, and each clamping bolt is combined with an upper clamping part which can continuously slide;

the lower supporting piece is correspondingly formed at the lower side of the upper supporting piece;

each continuous sliding clamping piece is provided with a lower clamping part and a strip-shaped through hole, and is fixedly locked on the lower supporting piece after penetrating through the strip-shaped through hole by a locking piece; and

and the radio frequency coil is clamped between the upper clamping part and the lower clamping part and forms a surrounding structure.

2. The plasma reaction chamber structure according to claim 1, wherein: each clamping bolt comprises a lifting screw rod and a combination sleeve, and the combination sleeve is combined with the lifting screw rod through a spiral part.

3. The plasma reaction chamber structure according to claim 2, wherein: wherein, a suspending screw is arranged in the combining sleeve, a guiding block is combined at the bottom of the suspending screw, and the upper clamping part can be combined with the guiding block in a continuous sliding way by the sliding chute.

4. The plasma reaction chamber structure of claim 1, wherein: wherein the upper clamping part or the lower clamping part is an insulator of polyether-ether-ketone resin.

5. The plasma reaction chamber structure of claim 1, wherein: wherein the upper clamping part is provided with a plate-shaped clamping groove.

6. The plasma reaction chamber structure of claim 1, wherein: wherein the lower clamping part is a plate-shaped clamping groove.

7. The plasma reaction chamber structure of claim 1, wherein: wherein the upper clamping part and the lower clamping part are arranged in a one-to-one corresponding manner.

8. The plasma reaction chamber structure according to claim 1, wherein: the lower clamping part is provided with a strip-shaped groove which is formed by extending the strip-shaped through hole outwards.