CN111010791A - Plasma generating device based on porous medium discharge - Google Patents
Plasma generating device based on porous medium discharge Download PDFInfo
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- CN111010791A CN111010791A CN201911258871.2A CN201911258871A CN111010791A CN 111010791 A CN111010791 A CN 111010791A CN 201911258871 A CN201911258871 A CN 201911258871A CN 111010791 A CN111010791 A CN 111010791A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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Abstract
The invention discloses a plasma generating device based on porous medium discharge, which comprises: the device comprises two electrode outgoing lines, two flat plate electrodes, a porous medium, an insulating shell, an air inlet, an air outlet and a pulse power supply, wherein the two flat plate electrodes are arranged in parallel at a certain interval, the porous medium is arranged between the two flat plate electrodes, and the porous medium is tightly attached to the flat plate electrodes; a plurality of millimeter-scale holes are formed in the porous medium; the insulating shell wraps the two flat electrodes and the porous medium, and an air inlet and an air outlet are reserved on the insulating shell; the two flat electrodes are fixed on the insulating shell through the clamping grooves; one end of each of the two electrode lead-out wires is respectively connected with the two flat electrodes, and the other end of each of the two electrode lead-out wires is respectively connected with two poles of a pulse power supply; the air inlet and the air outlet are arranged on the insulating shell at two ends of the porous medium. Millimeter-scale holes are distributed in the porous medium of the device, gas discharges in the holes of the porous medium, and the throughput of air circulation is increased.
Description
Technical Field
The invention relates to the technical field of gas ionization, in particular to a plasma generating device based on porous medium discharge.
Background
A plasma can be generated by applying a sufficiently high voltage between the two electrodes that results in electrical breakdown of the gas. The plasma has wide application in the fields of environmental treatment, sterilization, ozone production, surface modification, illumination and the like. Various means have been proposed in the past to generate plasma at atmospheric pressure, most typically a flat dielectric barrier discharge device, i.e., at least one dielectric sheet is applied between two electrodes to block the formation of an arc path to achieve a continuous filament or uniform discharge. The structure needs very high breakdown voltage for generating plasma, and has very high requirement on discharge voltage, so that the gas gap is often only several millimeters, and the treatment capacity is difficult to improve when air is treated.
Disclosure of Invention
The present invention is directed to solving, at least to some extent, one of the technical problems in the related art.
Therefore, an object of the present invention is to provide a plasma generator based on porous medium discharge, in which the gas to be treated is discharged in the pores of the porous medium, the throughput of air circulation is increased, and the action effect of the plasma and the gas to be treated is greatly improved due to the tortuous pores.
In order to achieve the above object, an embodiment of the present invention provides a plasma generating device based on porous medium discharge, including: the device comprises two electrode outgoing lines, two flat electrodes, a porous medium, an insulating shell, an air inlet, an air outlet and a pulse power supply;
the two flat electrodes are arranged in parallel at a certain interval, the porous medium is arranged between the two flat electrodes, and the porous medium is tightly attached to the flat electrodes;
a plurality of millimeter-scale holes are formed in the porous medium;
the insulating shell wraps the two flat electrodes and the porous medium, and the air inlet and the air outlet are reserved on the insulating shell and used for gas to be treated to pass through;
the two flat electrodes are fixed on the insulating shell through clamping grooves;
one end of each of the two electrode outgoing lines is connected with the two flat electrodes, and the other end of each of the two electrode outgoing lines is connected with two poles of the pulse power supply;
the gas inlet and the gas outlet are arranged on the insulating shell at two ends of the porous medium, gas to be treated is discharged from the gas outlet after passing through the porous medium from the gas inlet, and plasma is generated when the gas to be treated passes through the porous medium.
According to the plasma generating device based on porous medium discharge, the porous medium is arranged between the flat electrodes, gas is discharged in the pores of the porous medium, the air circulation handling capacity is increased, the action effect of the plasma and the gas flow to be treated is greatly improved due to the tortuous pores, the reaction space of the gas to be treated is increased, and the gas handling capacity is improved.
In addition, the plasma generating device based on porous medium discharge according to the above embodiment of the present invention may further have the following additional technical features:
further, in one embodiment of the present invention, the two plate electrodes are conductive metal electrodes.
Further, in one embodiment of the present invention, the surface of the porous medium is coated with a catalyst.
Further, in an embodiment of the present invention, the method further includes: and the fan is used for blowing the gas to be treated into the plasma generating device through the air inlet.
Further, in one embodiment of the present invention, the processing speed and effect of the plasma generation device are adjusted by controlling the porosity of the porous medium.
Further, in one embodiment of the present invention, the processing speed and effect of the plasma generation device are adjusted by controlling the thickness of the porous medium.
Further, in one embodiment of the present invention, the porous medium includes, but is not limited to, a metal oxide ceramic.
Further, in one embodiment of the present invention, the insulating housing material includes but is not limited to ABS engineering plastic and organic glass.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The foregoing and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a perspective view of a porous dielectric discharge based plasma generating device according to one embodiment of the present invention;
FIG. 2 is a front view of a porous dielectric discharge based plasma generation device according to one embodiment of the present invention;
FIG. 3 is a side view of a porous dielectric discharge based plasma generating device according to one embodiment of the present invention;
FIG. 4 is a top view of a porous dielectric discharge based plasma generation device according to one embodiment of the present invention;
FIG. 5 is a diagram of an overall device of a porous medium discharge based plasma generating device according to an embodiment of the present invention;
fig. 6 is a schematic diagram of a porous medium discharge based plasma generating device according to an embodiment of the present invention.
Reference numerals: 1-flat electrode, 2-porous medium, 3-insulating shell, 4-electrode lead-out wire, 5-electrode lead-out wire, 6-air inlet, 7-air outlet, 8-plasma reactor, 9-pulse power supply, 10-gas path and 11-fan.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
The plasma generating apparatus based on porous dielectric discharge proposed according to the embodiment of the present invention is described below with reference to the accompanying drawings.
Fig. 1 is a perspective view of a porous medium discharge based plasma generating device according to an embodiment of the present invention.
As shown in fig. 1, the plasma generating device based on porous medium discharge comprises: two flat electrodes 1, two electrode lead wires (4 and 5), a porous medium 2, an insulating shell 3, a gas inlet 6, a gas outlet 7 and a pulse power supply (not shown in figure 1).
According to the drawings shown in fig. 1-5, two flat electrodes are arranged in parallel at a certain interval, a porous medium is arranged between the two flat electrodes, the porous medium is tightly attached to the flat electrodes, and a plurality of millimeter-sized holes are arranged in the porous medium;
the insulating shell is wrapped by the two flat electrodes and the porous medium, and an air inlet and an air outlet are reserved on the insulating shell for the gas to be treated to pass through;
the two flat electrodes are fixed on the insulating shell through the clamping grooves;
one end of each of the two electrode lead-out wires is respectively connected with the two flat electrodes, and the other end of each of the two electrode lead-out wires is respectively connected with two poles of a pulse power supply;
the gas inlet and the gas outlet are arranged on the insulating shells at two ends of the porous medium, the gas to be treated is discharged from the gas outlet after passing through the porous medium from the gas inlet, and plasma is generated when the gas to be treated passes through the porous medium.
In embodiments of the invention, the plate electrode is a conductive metal electrode that generates a plasma when a sufficiently high voltage is applied across the porous medium to be treated.
The metal plate electrode has higher strength, and on one hand, the metal plate electrode is used for conducting electricity and on the other hand, plays a role in fixing protection.
It can be understood that the porous medium is arranged in the middle of the flat electrode, the thickness of the porous medium in the embodiment of the invention can exceed 10 cm, the inside of the medium is filled with the millimeter-scale holes which are bent and looped, the processing space is increased by more than 10 times, the pores of the porous medium are the main field for generating plasma and are also the main reaction field of the plasma and the gas to be processed, when the gas to be processed passes through the porous medium, the porous medium can more efficiently react with the air to be processed, and the processing effect is better.
The use of a porous dielectric allows the discharge to be generated uniformly in the pores of the dielectric material and adequately treated when the gas flow flows non-linearly through the plasma-filled pores.
Further, the processing speed and effect of the plasma generating device are adjusted by controlling the porosity of the porous medium. The processing speed and effect of the plasma generating device are adjusted by controlling the thickness of the porous medium.
In one embodiment of the invention, the media may have a thickness of 1cm to 20cm and a porosity of 10ppi to 50 ppi.
Further, the porous medium material and the gas to be processed can be adjusted to generate plasmas with different parameters. The material of the porous medium includes, but is not limited to, metal oxide ceramics.
Furthermore, the treatment effect can be improved by coating a catalyst on the surface of the porous medium.
In one embodiment of the invention, one end of each of the two electrode outgoing lines is respectively connected with the two flat electrodes, and the other end of each of the two electrode outgoing lines is connected with two poles of the pulse power supply, namely the high-voltage power supply and the ground.
The pulse power supply used in the embodiment of the invention is a pulse high-voltage power supply, and the power supply parameters are as follows: the peak voltage is 20kV to 50kV, the frequency is 100Hz to 13.56MHz, and the pulse width is 100ns to 10 us.
In the plasma generating apparatus, the discharge may not be converted into an arc using a pulse power source.
In one embodiment of the present invention, the flat electrode and the porous medium are wrapped by an insulating housing, which is made of materials including but not limited to ABS engineering plastic and organic glass, and has an air inlet and an air outlet.
A clamping groove is formed in the insulating shell, and the flat plate electrode is fixed on the insulating shell through the clamping groove.
In one embodiment of the invention, the air inlet and the air outlet are arranged at two ends of the porous medium, and the air inlet direction is parallel to the two flat electrodes.
Further, the apparatus of the embodiment of the present invention may further include a blower (11 in fig. 5), which is typically a centrifugal blower, the blower is disposed at the air inlet, the gas to be treated is blown into the air inlet through the air passage (10 in fig. 5), and the insulating housing serves as an air passage for gas circulation.
The gas to be treated enters through the gas inlet, passes through the porous medium, generates plasma in the porous medium under the condition that the flat electrode applies high pressure, and then is discharged through the gas outlet.
Specifically, gas is drawn in by a blower 11, through a gas path 10, and then blown into the gas inlet 6, with the gas flow direction parallel to the plate electrode, through the porous media. The insulating housing 3 is both an insulating protection and an air passage. The insulating housing encloses the electrodes and porous media and circulates gas only in both the gas inlet 6 and the gas outlet 7 directions.
It can be understood that the plasma generating device with the above structure can also be used in a parallel and laminated manner, a plurality of flat electrodes are arranged in parallel with a certain distance, a porous medium is arranged between every two adjacent flat electrodes, the plurality of flat electrodes are connected through a plurality of electrode lead-out wires, and the plurality of electrode lead-out wires are gathered through a bus bar and then connected with two poles of a pulse power supply. Thus, the plasma generating apparatus more efficiently generates plasma.
It should be noted that the material of the plate electrode, the positions of the gas inlet and the gas outlet can be adjusted according to actual requirements, for example, the plate electrode can be a metal foam electrode, and the gas inlet and the gas outlet can also be arranged at two sides of the plate electrode, so that the gas to be treated enters the porous medium perpendicular to the plate electrode.
It can be understood that in the past, the air inlet of the dielectric barrier discharge is perpendicular to the discharge direction, the air flow passes through the plasma directly along a straight line, and the action time is extremely short. The dielectric barrier discharge requires that the air gap is not too large, the treatment gas amount is small, the equivalent capacitance of the power supply is too large, and the discharge is difficult. Embodiments of the present invention improve the solid media-air-solid media structure into a complete piece of porous media. The discharge form is changed from the original dielectric barrier discharge to the creeping discharge, and the air gap electric field is distorted and enhanced by the porous dielectric. So that the structure can still generate strong discharge under the condition of much lower than normal discharge voltage. The pulse power supply can ensure that discharge is not converted into electric arc, and the discharge is dispersed in the whole medium and can be fully and fully mixed with the passing air. The structure can ensure that the porous medium with the thickness of several centimeters still keeps good discharge under lower voltage, thereby not only improving the gas treatment capacity, but also reducing the equivalent capacitance.
Fig. 6 is a schematic view of a plasma generation device according to an embodiment of the present invention, and the structure of the device can be clearly seen.
According to the plasma generating device based on the porous medium discharge, provided by the embodiment of the invention, the porous medium is arranged between the flat electrodes, gas is discharged in the pores of the porous medium, the throughput of air circulation is increased, the action effect of the plasma and the gas flow to be treated is greatly improved due to the tortuous pores, the reaction space of the gas to be treated is increased, and the gas throughput is improved.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
Claims (8)
1. A porous dielectric discharge-based plasma generating device, comprising:
the device comprises two electrode outgoing lines, two flat electrodes, a porous medium, an insulating shell, an air inlet, an air outlet and a pulse power supply;
the two flat electrodes are arranged in parallel at a certain interval, the porous medium is arranged between the two flat electrodes, and the porous medium is tightly attached to the flat electrodes;
a plurality of millimeter-scale holes are formed in the porous medium;
the insulating shell wraps the two flat electrodes and the porous medium, and the air inlet and the air outlet are reserved on the insulating shell and used for gas to be treated to pass through;
the two flat electrodes are fixed on the insulating shell through clamping grooves;
one end of each of the two electrode outgoing lines is connected with the two flat electrodes, and the other end of each of the two electrode outgoing lines is connected with two poles of the pulse power supply;
the gas inlet and the gas outlet are arranged on the insulating shell at two ends of the porous medium, gas to be treated is discharged from the gas outlet after passing through the porous medium from the gas inlet, and plasma is generated when the gas to be treated passes through the porous medium.
2. The porous-medium-discharge-based plasma generation device of claim 1, wherein the two flat electrodes are conductive metal electrodes.
3. The porous-medium-discharge-based plasma generation device of claim 1, wherein the surface of the porous medium is coated with a catalyst.
4. The porous-medium-discharge-based plasma generation apparatus according to claim 1, further comprising: and the fan is used for blowing the gas to be treated into the plasma generating device through the air inlet.
5. The porous-medium-discharge-based plasma generation device of claim 1, wherein the processing speed and effect of the plasma generation device are adjusted by controlling the porosity of the porous medium.
6. The porous-medium-discharge-based plasma generation device of claim 1, wherein the processing speed and effect of the plasma generation device are adjusted by controlling the thickness of the porous medium.
7. The porous-media-discharge-based plasma generation apparatus of claim 1, wherein the porous media includes, but is not limited to, metal oxide ceramics.
8. The porous-medium-discharge-based plasma generation device of claim 1, wherein the insulating housing material includes but is not limited to ABS engineering plastic and plexiglass.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911258871.2A CN111010791A (en) | 2019-12-10 | 2019-12-10 | Plasma generating device based on porous medium discharge |
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| CN201911258871.2A CN111010791A (en) | 2019-12-10 | 2019-12-10 | Plasma generating device based on porous medium discharge |
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| CN111010791A true CN111010791A (en) | 2020-04-14 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116367401A (en) * | 2023-03-30 | 2023-06-30 | 四川大学 | Method for inducing micro-channel discharge in porous material by plasma jet |
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2019
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| JP2004207145A (en) * | 2002-12-26 | 2004-07-22 | Sekisui Chem Co Ltd | Discharge plasma processing device |
| US20050214181A1 (en) * | 2004-03-26 | 2005-09-29 | Canon Kabushiki Kaisha | Dielectric, gas treatment apparatus using the same, and plasma generator |
| KR20090124201A (en) * | 2008-05-29 | 2009-12-03 | 정장근 | Hole type high intensity non-thermal plasma generator for high intensity non-thermal plasma generation |
| DE102014013716A1 (en) * | 2014-09-11 | 2016-03-17 | Cinogy Gmbh | Electrode arrangement for forming a dielectrically impeded plasma discharge |
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| CN116367401A (en) * | 2023-03-30 | 2023-06-30 | 四川大学 | Method for inducing micro-channel discharge in porous material by plasma jet |
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