CN110262078A - A kind of sunglasses lenses and preparation method thereof of the anti-near infrared ray of photonic crystal technology - Google Patents
A kind of sunglasses lenses and preparation method thereof of the anti-near infrared ray of photonic crystal technology Download PDFInfo
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- CN110262078A CN110262078A CN201910586472.2A CN201910586472A CN110262078A CN 110262078 A CN110262078 A CN 110262078A CN 201910586472 A CN201910586472 A CN 201910586472A CN 110262078 A CN110262078 A CN 110262078A
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- near infrared
- indium oxide
- eyeglass substrate
- pillar
- infrared ray
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- 238000005516 engineering process Methods 0.000 title claims abstract description 15
- 239000004038 photonic crystal Substances 0.000 title claims abstract description 15
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 239000002061 nanopillar Substances 0.000 claims abstract description 28
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000013078 crystal Substances 0.000 claims abstract description 25
- 229910000449 hafnium oxide Inorganic materials 0.000 claims abstract description 12
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011800 void material Substances 0.000 claims abstract description 9
- GRPQBOKWXNIQMF-UHFFFAOYSA-N indium(3+) oxygen(2-) tin(4+) Chemical compound [Sn+4].[O-2].[In+3] GRPQBOKWXNIQMF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000001704 evaporation Methods 0.000 claims description 13
- 230000008020 evaporation Effects 0.000 claims description 12
- 238000007740 vapor deposition Methods 0.000 claims description 11
- 238000004062 sedimentation Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 230000003068 static effect Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 11
- 230000005855 radiation Effects 0.000 abstract description 7
- 230000004888 barrier function Effects 0.000 abstract description 3
- 230000009471 action Effects 0.000 abstract description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract description 2
- 230000010355 oscillation Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 230000004297 night vision Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 210000001508 eye Anatomy 0.000 description 6
- 208000027418 Wounds and injury Diseases 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 208000014674 injury Diseases 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000010415 tropism Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 208000002177 Cataract Diseases 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 210000003491 skin Anatomy 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 206010047571 Visual impairment Diseases 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 210000004204 blood vessel Anatomy 0.000 description 1
- 210000005252 bulbus oculi Anatomy 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 210000001365 lymphatic vessel Anatomy 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 210000002752 melanocyte Anatomy 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 210000001640 nerve ending Anatomy 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 206010033675 panniculitis Diseases 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000019612 pigmentation Effects 0.000 description 1
- BOTHRHRVFIZTGG-UHFFFAOYSA-K praseodymium(3+);trifluoride Chemical compound F[Pr](F)F BOTHRHRVFIZTGG-UHFFFAOYSA-K 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- SDLBJIZEEMKQKY-UHFFFAOYSA-M silver chlorate Chemical compound [Ag+].[O-]Cl(=O)=O SDLBJIZEEMKQKY-UHFFFAOYSA-M 0.000 description 1
- -1 silver halide Chemical class 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 210000004304 subcutaneous tissue Anatomy 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 210000001519 tissue Anatomy 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000002792 vascular Effects 0.000 description 1
- 208000029257 vision disease Diseases 0.000 description 1
- 230000004393 visual impairment Effects 0.000 description 1
- 229940105963 yttrium fluoride Drugs 0.000 description 1
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Polarising Elements (AREA)
- Eyeglasses (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of sunglasses lenses and preparation method thereof of anti-near infrared ray of photonic crystal technology, the front of eyeglass substrate is deposited with 2 D photon crystal film, and 2 D photon crystal film includes: the brilliant tin indium oxide nano-pillar formed, the hafnium oxide nano-pillar in the void area for being filled in tin indium oxide nano-pillar to be grown on the eyeglass substrate surface and positioned at the indium oxide tin film of extexine；There is certain tilt angle between the tin indium oxide nano-pillar and the eyeglass substrate.Two layers of nanometer grade indium tin oxide that the present invention forms layering has stronger near infrared ray high barriering rate and visible light high perspective rate.Reflection is generated due to absorption and the plasma oscillation phenomenon of carrier in near-infrared band region, barrier action to near-infrared band heat radiation is to absorb and reflect coefficient result, reflection and absorption all play the role of shielding near infrared light, obstruct near infrared region light wave.
Description
Technical field
The invention belongs to sunglasses technical field more particularly to a kind of sunglasses lenses of the anti-near infrared ray of photonic crystal technology
And preparation method thereof.
Background technique
Solar radiation is divided into three ultraviolet light, visible light, infrared ray regions by wavelength, and energy is concentrated mainly on near-infrared
Light region accounts for about 97%；Infrared ray belongs to the scope of electromagnetic wave, is a kind of radioactive ray with heat-flash effect；People will be different
The infrared ray of wave-length coverage is divided near infrared ray, middle infrared ray, far infrared region；Near infrared light region is to reach ground
About 53% is accounted in solar radiation.The IR wavelength of general name is the wavelength between 780nm~4000000nm, its wave
Length is shorter than radio wave, and longer than visible light, be invisible to the naked eye infrared ray, and any object all emits infrared ray, hot object it is red
UV radiation is stronger than cold object.
Near-infrared (NIR) line is a certain range of electromagnetic radiation that wavelength is greater than red optical wavelength, near-infrared (NIR) line
As a kind of high energy heat radiation, object can be promoted rapidly to heat up, it is especially even more serious to the injury of eyes.Near infrared ray pair
The injury of human eye is often ignored by people, and it is most deep that short infrared wavelength 780nm~2000nm near infrared ray part penetrates tissue,
Penetration depth can be applied directly to blood vessel, lymphatic vessel, nerve endings and other subcutaneous tissues of skin up to 10mm, large dosage
When infrared ray repeatedly irradiates skin, the pigmentation of brown marble sample can produce, this strengthens vascular wall substrate with heat effect
The pigment of melanocyte is formed related in cellular layer.Specifically, near infrared ray can by the iris and absorption of crystal in eyes,
It is damaged so as to cause to eyes, visual impairment, it is stronger to near-infrared absorbing since eyeball contains more liquid, because
And cataract can be caused when near infrared ray direct irradiation eyes, the generation of cataract and the effect of short infrared are related.Therefore
How near infrared ray is completely cut off for sunglasses lenses, it appears particularly important.
In the prior art, to obstruct near infrared ray, those skilled in the art generally use following technical solution:
1, the anti-infrared film layer of absorption-type is generated with dip coating manner, dip coating manner uses organic compound near infrared absorbent
Carry out blocking near infrared ray.The mixing for carrying out function of bonding other components formation film layer etc. using resin matrix simultaneously is common
Effect；Dip coating manner is coated with resin bottom coating layer to lens substrate first, and organic compound near infrared absorbent is carried out after prebake
Anti-infrared coating coating, with 120 degree solidifications in heating, drying 120 minutes after drying carries out stiffening layer coating again, or with purple
Curing of coatings is produced the pellicle film of the homogeneous film thickness of final required absorption type anti-infrared by outside line or electron beam,
Process is tedious and production efficiency is not high for operation in this way；That there are production processes is cumbersome, flow chemical parameter is numerous is not easy accurately to manage,
Various coating methods and painting parameter involve various key parameters such as viscosity of the coating, coating accuracy, application rate etc., vulnerable to
Provincialism, climacteric influence and production efficiency is not high, and various coating methods can not all form combined type 2 D photon crystal completely,
Do not have the defects of characteristic of the anti-reflection visible light light wave of 2 D photon crystal.
2, it is produced in such a way that physical vaporous deposition carries out the plated films such as vacuum evaporation, magnetron sputtering, ion beam sputtering anti-
The pellicle film of the homogeneous film thickness of infrared ray.But the uniform films that the film to be formed is absorption type anti-infrared are deposited in traditional vacuum
Thick pellicle film, can not plated film form combined type 2 D photon crystal, do not have the anti-reflection visible light light wave of 2 D photon crystal
Characteristic；In addition, the deposition rate of magnetron sputtering is low and sedimentation time is partially long and operating air pressure is higher, also can not plated film formed it is compound
Formula 2 D photon crystal does not have the characteristic of the anti-reflection visible light light wave of 2 D photon crystal；And the target area of ion beam sputtering is too
Small, deposition rate is low and sedimentation time is also partially long, and, equipment is excessively complicated and operating cost is higher, and can not plated film formed
Combined type 2 D photon crystal does not have the characteristic of the anti-reflection visible light light wave of 2 D photon crystal.
3, deposited metal particle, inorganic compound, metal ion etc. are carried out with chemical vapour deposition technique etc., produced most
The pellicle film of the homogeneous film thickness of infrared resistant required for end.But the film formed is the uniform films of absorption type anti-infrared
Thick pellicle film is merely creating RESONANCE ABSORPTION when being irradiated by infrared light-wave.It absorbs light and emits the basic unit of light
Harmonic oscillator, every kind of harmonic oscillator has its intrinsic frequency, when external electromagnetic wave it is identical with the intrinsic frequency of harmonic oscillator when, it is humorous
Oscillator can generate very strong absorption to external radiation, and this absorb is known as RESONANCE ABSORPTION.It and is equally that can not form combined type
2 D photon crystal does not have the characteristic of the anti-reflection visible light light wave of 2 D photon crystal.
Summary of the invention
In order to solve the above technical problems, the present invention provides a kind of sunglasses lenses of anti-near infrared ray of photonic crystal technology and
Preparation method.In order to which some aspects of the embodiment to disclosure have a basic understanding, simple summary is shown below.
The summarized section is not extensive overview, nor to determine key/critical component or describe the protection model of these embodiments
It encloses.Its sole purpose is that some concepts are presented with simple form, in this, as the preamble of following detailed description.
The present invention adopts the following technical scheme:
There is provided a kind of sunglasses lenses of anti-near infrared ray of photonic crystal technology, comprising: eyeglass substrate；The eyeglass substrate
Front is deposited with 2 D photon crystal film, and the 2 D photon crystal film includes: the long brilliant formation on the eyeglass substrate surface
Tin indium oxide nano-pillar, the hafnium oxide nano-pillar that is filled in the void area of tin indium oxide nano-pillar and positioned at extexine
Indium oxide tin film；There is certain tilt angle between the tin indium oxide nano-pillar and the eyeglass substrate.
A kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology, comprising:
The direction for adjusting eyeglass substrate, steaming the normal of the eyeglass substrate and evaporation source has one between the direction of line
A inclination angle is denoted as angle β；
Evaporation source evaporates line to the eyeglass substrate, and the eyeglass substrate vapor deposition is with angle of inclination beta according to deposition rate 3nm/
Min~10nm/min static sedimentation 3~10 minutes, deposits the tin indium oxide nanometer column length to 10~20nm；
The rotation of eyeglass substrate carries out zero degree vapor deposition, fills hafnium oxide into the void area of tin indium oxide nano-pillar
Nano-pillar, until 20~50nm of nanometer column length；
Zero degree vapor deposition, static sedimentation 3~10 minutes, until 10~20nm of indium oxide tin film film thickness.
Wherein, the distance between the eyeglass substrate and evaporation source are 40cm~70cm.
Wherein, the normal of the eyeglass substrate and evaporation source steam the numberical range of the angle β between the direction of line are as follows:
65 ° of 88 ° of < β <.
Wherein, the long brilliant temperature of the eyeglass substrate is 40 DEG C~60 DEG C, and vacuum degree is 1 × 10 when work-5Pa~5 × 10- 5Pa。
The utility model has the advantages that composite construction of the invention has high near infrared light in the near infrared region brought by of the invention
Wave barrier properties.Two layers of nanometer grade indium tin oxide for forming layering has near infrared ray high barriering rate and visible light high perspective rate special
Property.Reflection is generated due to absorption and the plasma oscillation phenomenon of carrier in near-infrared band region, near infrared ray
The barrier action of wave band heat radiation is to absorb and reflect coefficient as a result, reflection and absorption all play shielding near infrared light
Effect, obstruct near infrared region light wave；
Meanwhile so that incident visible light wave light beam has the same tropism of photon crystal self-aligning effect straight-line transmitting forward
It broadcasts, tin indium oxide uniformity film is deposited in outer layer zero degree, forms the characteristic of stronger anti-reflection visible light light wave, can all obstruct shortwave
Infrared ray wave band 780nm~2000nm and night vision perspective rate reach 80% or more, high particular near infrared range rejection rate,
Visible light region perspective rate is high, enhancing night vision is clear, can not only protect the anti-infrared injury of eye-safe, but also can be enhanced
Night vision is seen apparent
Detailed description of the invention
Fig. 1 is the structural schematic diagram of sunglasses lenses of the invention；
Fig. 2 is oblique angle evaporating coating schematic diagram of the invention；
Fig. 3 is SEM photograph of the invention.
Specific embodiment
The following description and drawings fully show specific embodiments of the present invention, so that those skilled in the art's energy
Enough practice them.Other embodiments may include structure, logic, it is electrical, process and other change.Implement
Example only represents possible variation.Unless explicitly requested, otherwise individual components and functionality is optional, and the sequence operated can
With variation.The part of some embodiments and feature can be included in or replace part and the feature of other embodiments.
As shown in Figure 1, in some illustrative embodiments, providing a kind of sun of anti-near infrared ray of photonic crystal technology
Eyeglass, comprising: eyeglass substrate 1；Eyeglass substrate is chosen as glass baseplate, CR-39, MR-8, any other resin lens substrate etc..
The front of the eyeglass substrate 1 is deposited with 2 D photon crystal film, and the 2 D photon crystal film includes: in the eyeglass substrate
The long brilliant tin indium oxide nano-pillar 2 formed, the hafnium oxide nanometer being filled in the void area of tin indium oxide nano-pillar on surface
Column 3 and indium oxide tin film 4 positioned at extexine；Have centainly between the tin indium oxide nano-pillar 2 and the eyeglass substrate 1
Tilt angle.The hafnium oxide nano-pillar being filled in the void area of tin indium oxide nano-pillar 2 receives 3
The hafnium oxide nano-pillar 3 being filled in the void area of tin indium oxide nano-pillar can overcome light beam anomalous dispersion and spread out
It penetrates diverging, forms photon crystal self-aligning effect, the equal frequencies line with photonic crystal light beam, the straightline propagation with tropism forward,
So that the more anti-reflection property of light beam；Hafnium oxide can improve carrier concentration and promote substitution of the Sn to In, also help improvement film
Surface can, chemical and thermal stability.
The preferential oblique angle vapor deposition of bottom have near infrared light high barriering rate and visible light high perspective rate in periodically
The tin indium oxide nano-pillar 2 of arrangement architecture.Then in the gap slit region of this tin indium oxide nano-pillar 2, it is high thoroughly to fill visible light
Depending on the hafnium oxide of rate and near infrared light high barriering rate, hafnium oxide is also formed simultaneously nano column array periodic arrangement.Above-mentioned two change
Closing object is all tilting nano column array periodic arrangement structure, the auto-collimation effect characteristic with 2 D photon crystal energy band,
Occur the light wave enhancement with tropism straightline propagation forward when visible light light wave transmits in 2 D photon crystal, is formed more
The characteristic of anti-reflection visible light light wave；Tin indium oxide uniformity film is deposited in zero degree to outer layer again, forms two layers of tin indium oxide of layering,
Near infrared ray light wave region is more strongly more fully obstructed.Due to being the photon of special combined type nanometer-scale periodic arrangement
Crystal bandgap, so that incident visible light wave light beam has the same tropism of photon crystal self-aligning effect straight-line transmitting forward
It broadcasts, indium oxide tin film is deposited in zero degree to outer layer again, which is uniformity film layer, forms stronger anti-reflection visible light light wave
Characteristic, can all obstruct short infrared wave band 780nm~2000nm and night vision perspective rate reaches 80% or more, particular for
Near infrared range rejection rate is high, visible light region perspective rate is high, enhancing night vision is clear, in conjunction with anti-near infrared ray and night vision
One technology, can not only protect the anti-infrared injury of eye-safe, but can be enhanced night vision see it is apparent.
It for the gap slit region of tin indium oxide nano-pillar 2 also may be selected that filling is not deposited or zero degree vapor deposition filling be as follows
It substance and is not limited only to as follows: titanium oxide, zirconium oxide, manganese oxide, tantalum oxide, silica, aluminium oxide, silicon-aluminum mixture, oxidation
Silver, copper oxide, silver chlorate, yttrium oxide, niobium oxide, silver halide, zinc sulphide, silicon nitride, magnesium fluoride, yttrium fluoride, praseodymium fluoride, fluorination
Germanium, other metal particles or metal ion such as iron, copper, manganese, cobalt, gold, silver, aluminium, titanium, rhodium etc. or the tungsten containing complex ion, tin,
The metal complexes such as copper.
A kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology, includes the following steps:
S1: as shown in Figure 1-3, the direction of adjustment eyeglass substrate 1, makes the normal of the eyeglass substrate 1 and evaporation source steam beam
There is an inclination angle between the direction of stream 11, be denoted as angle β；
S2: evaporation source evaporates line to the eyeglass substrate 1, and the vapor deposition of eyeglass substrate 1 is with angle of inclination beta according to deposition rate
3nm/min~10nm/min static sedimentation 3~10 minutes, deposit 2 length of tin indium oxide nano-pillar to 10~20nm；
S3: when the tin indium oxide nanometer column length is deposited to 10~20nm, the rotation of eyeglass substrate carries out zero degree vapor deposition
Deposition fills hafnium oxide nano-pillar into the void area of tin indium oxide nano-pillar, until 20~50nm of nanometer column length.
S4: zero degree vapor deposition, static sedimentation 3~10 minutes, until 10~20nm of indium oxide tin film film thickness.
In an alternative embodiment, the distance between the eyeglass substrate and evaporation source are 40cm~70cm.
In an alternative embodiment, the normal of the eyeglass substrate and evaporation source steam the angle between the direction of line
The numberical range of β are as follows: 65 ° of 88 ° of < β <.
In an alternative embodiment, the long brilliant temperature of the eyeglass substrate is 40 DEG C~60 DEG C, and vacuum degree is 1 when work
×10-5Pa~5 × 10-5Pa。
It should also be appreciated by one skilled in the art that various illustrative logical boxs, mould in conjunction with the embodiments herein description
Electronic hardware, computer software or combinations thereof may be implemented into block, circuit and algorithm steps.In order to clearly demonstrate hardware and
Interchangeability between software surrounds its function to various illustrative components, frame, module, circuit and step above and carries out
It is generally described.Hardware is implemented as this function and is also implemented as software, depends on specific application and to entire
The design constraint that system is applied.Those skilled in the art can be directed to each specific application, be realized in a manner of flexible
Described function, still, this realization decision should not be construed as a departure from the scope of protection of this disclosure.
Claims (5)
1. a kind of sunglasses lenses of the anti-near infrared ray of photonic crystal technology characterized by comprising eyeglass substrate；The eyeglass
The front of substrate is deposited with 2 D photon crystal film, and the 2 D photon crystal film includes: long on the eyeglass substrate surface
Tin indium oxide nano-pillar that crystalline substance is formed, the hafnium oxide nano-pillar that is filled in the void area of tin indium oxide nano-pillar and it is located at outer
The indium oxide tin film on surface layer；There is certain tilt angle between the tin indium oxide nano-pillar and the eyeglass substrate.
2. a kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology characterized by comprising
The direction for adjusting eyeglass substrate steams the normal of the eyeglass substrate and evaporation source between the direction of line and inclines with one
Oblique angle is denoted as angle β；
Evaporation source evaporates line to the eyeglass substrate, eyeglass substrate vapor deposition with angle of inclination beta according to deposition rate 3nm/min~
10nm/min static sedimentation 3~10 minutes, deposits the tin indium oxide nanometer column length to 10~20nm；
The rotation of eyeglass substrate carries out zero degree vapor deposition, and hafnium oxide nanometer is filled into the void area of tin indium oxide nano-pillar
Column, until 20~50nm of nanometer column length；
Zero degree vapor deposition, static sedimentation 3~10 minutes, until 10~20nm of indium oxide tin film film thickness.
3. a kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology as claimed in claim 2, feature
It is, the distance between the eyeglass substrate and evaporation source are 40cm~70cm.
4. a kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology as claimed in claim 3, feature
It is, the normal and evaporation source of the eyeglass substrate steam the numberical range of the angle β between the direction of line are as follows: 65 ° of < β <
88°。
5. a kind of preparation method of the sunglasses lenses of the anti-near infrared ray of photonic crystal technology as claimed in claim 4, feature
It is, the long brilliant temperature of the eyeglass substrate is 40 DEG C~60 DEG C, and vacuum degree is 1 × 10 when work-5Pa~5 × 10-5Pa。
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110346947A (en) * | 2019-07-10 | 2019-10-18 | 艾普偏光科技(厦门)有限公司 | The sunglasses lenses and preparation method thereof of gain far infrared activation eye circumference cell |
| CN111647261A (en) * | 2020-06-13 | 2020-09-11 | 江苏鸿晨集团有限公司 | Digital anti-infrared lens |
| CN113341568A (en) * | 2021-06-04 | 2021-09-03 | 深圳市前海合航科技有限公司 | Intelligent wearable and air purification combined device |
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|---|---|---|---|---|
| US20090323014A1 (en) * | 2006-03-15 | 2009-12-31 | The Board Of Trustees Of The University Of Illinois | Passive and active photonic crystal structures and devices |
| CN108363218A (en) * | 2018-02-01 | 2018-08-03 | 中国人民解放军62023部队 | A kind of goggles and preparation method thereof |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090323014A1 (en) * | 2006-03-15 | 2009-12-31 | The Board Of Trustees Of The University Of Illinois | Passive and active photonic crystal structures and devices |
| CN108363218A (en) * | 2018-02-01 | 2018-08-03 | 中国人民解放军62023部队 | A kind of goggles and preparation method thereof |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110346947A (en) * | 2019-07-10 | 2019-10-18 | 艾普偏光科技(厦门)有限公司 | The sunglasses lenses and preparation method thereof of gain far infrared activation eye circumference cell |
| CN110346947B (en) * | 2019-07-10 | 2020-08-07 | 艾普偏光科技(厦门)有限公司 | Sunglass lens for increasing far infrared ray to activate eye surrounding cells and preparation method thereof |
| CN111647261A (en) * | 2020-06-13 | 2020-09-11 | 江苏鸿晨集团有限公司 | Digital anti-infrared lens |
| CN113341568A (en) * | 2021-06-04 | 2021-09-03 | 深圳市前海合航科技有限公司 | Intelligent wearable and air purification combined device |
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Address after: 361028 3rd floor, 128 Houxiang South Road, Haicang District, Xiamen City, Fujian Province Patentee after: Eyepol Polarizing Technology (XIAMEN) Co.,Ltd. Address before: 361028 3rd floor, 128 Houxiang South Road, Haicang District, Xiamen City, Fujian Province Patentee before: EYEPOL POLARIZING TECHNOLOGY (XIAMEN) Co.,Ltd. |
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Denomination of invention: Photonic crystal technology for preventing near-infrared rays of solar lenses and its preparation method Effective date of registration: 20230817 Granted publication date: 20200703 Pledgee: Bank of China Limited Xiamen Huli sub branch Pledgor: Eyepol Polarizing Technology (XIAMEN) Co.,Ltd. Registration number: Y2023980052635 |
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Address after: No. 10 Hutou Road, Haicang District, Xiamen City, Fujian Province, 361000 Patentee after: Eyepol Polarizing Technology (XIAMEN) Co.,Ltd. Address before: 361028 3rd floor, 128 Houxiang South Road, Haicang District, Xiamen City, Fujian Province Patentee before: Eyepol Polarizing Technology (XIAMEN) Co.,Ltd. |