CN110257767B

CN110257767B - Mask strip material attribute obtaining method and device and mask plate manufacturing method

Info

Publication number: CN110257767B
Application number: CN201910372790.9A
Authority: CN
Inventors: 邓江涛; 杨晓宇; 嵇凤丽; 徐鹏
Original assignee: BOE Technology Group Co Ltd; Chengdu BOE Optoelectronics Technology Co Ltd
Current assignee: BOE Technology Group Co Ltd; Chengdu BOE Optoelectronics Technology Co Ltd
Priority date: 2019-05-06
Filing date: 2019-05-06
Publication date: 2021-05-07
Anticipated expiration: 2039-05-06
Also published as: CN110257767A

Abstract

The embodiment of the invention provides a method and a device for acquiring material properties of mask strips and a manufacturing method of a mask plate, relates to the technical field of display, and can quickly and simply acquire the material properties of the mask strips. A method of obtaining a material property of a mask strip, comprising: manufacturing a simulation graph according to the mask strip model, wherein the simulation graph and the repeating units on the mask strip model have the same shape and size; wherein the repeating unit comprises at least one evaporation hole; constructing an equivalent graph according to the simulation graph, wherein the equivalent graph is in a cuboid shape; the length, width and height of the cuboid are respectively equal to those of the simulation graph; setting a plurality of groups of test parameters, wherein each group of test parameters comprises displacement constraint values of all surfaces of the simulation graph; extracting the counter force on the surface of the simulated graph according to each group of test parameters; and calculating the material attribute of the simulation graph according to the reaction force on the surface of the simulation graph and the area of the corresponding equivalent graph surface.

Description

Mask strip material attribute obtaining method and device and mask plate manufacturing method

Technical Field

The invention relates to the technical field of display, in particular to a method and a device for acquiring mask strip material properties and a method for manufacturing a mask plate.

Background

One core technology for manufacturing a high-quality Organic Light Emitting Diode (OLED) display device is to vapor-deposit an Organic material onto a glass substrate according to a predetermined procedure by a vapor deposition method, and form a rgb device by using a pattern on a Fine Mask (FMM).

The fine mask plate is complex in structure and high in cost, and the product yield can be guaranteed by realizing the accurate design of the fine mask plate. Wherein the fine mask plate comprises a mask plate frame and a plurality of mask bars.

Disclosure of Invention

The embodiment of the invention provides a method and a device for acquiring material properties of mask strips and a method for manufacturing a mask plate, which can quickly and simply acquire the material properties of the mask strips.

In order to achieve the above purpose, the embodiment of the invention adopts the following technical scheme:

in one aspect, an embodiment of the present invention provides a method for obtaining a material property of a mask strip, including: manufacturing a simulation graph according to the mask strip model, wherein the shape and the size of the simulation graph are the same as those of the repeating units on the mask strip model; wherein the repeating unit comprises at least one evaporation hole; constructing an equivalent graph according to the simulation graph, wherein the equivalent graph is in a cuboid shape; the length, the width and the height of the cuboid are respectively equal to those of the simulation graph; setting a plurality of groups of test parameters, wherein each group of test parameters comprises displacement constraint values of all surfaces of the simulation graph; extracting the counter force on the surface of the simulation graph according to each group of test parameters; calculating the material attribute of the simulation graph according to the counter force on the surface of the simulation graph and the area of the corresponding surface of the equivalent graph; the material properties include young's modulus, poisson's ratio, and shear modulus.

Optionally, the plurality of sets of test parameters includes a first set of the test parameters, a second set of the test parameters, a third set of the test parameters, a fourth set of the test parameters, a fifth set of the test parameters, and a sixth set of the test parameters; in the first group of test parameters, the normal displacement constraint value of the right side surface of the simulation graph is a first preset value, and the normal displacement constraint values of the other five surfaces are zero; the first direction is a normal direction of the right side surface, and the first preset value is a product of positive strain and a length of the simulation graph along the first direction; in the second group of test parameters, the normal displacement constraint value of the upper surface of the simulation graph is a second preset value, and the normal displacement constraint values of the other five surfaces are zero; the second direction is a normal direction of the upper surface, and the second preset value is a product of the positive strain and a length of the simulation graph along the second direction; in the third group of test parameters, the normal displacement constraint value of the front side surface of the simulation graph is a third preset value, and the normal displacement constraint values of the other five surfaces are zero; the third direction is a normal direction of the front side surface, the third preset value is a product of the positive strain and a length of the simulation graph along a third direction, and the first direction, the second direction and the third direction are perpendicular to each other; in a fourth set of the test parameters, the displacement constraint value of the right side surface in the second direction is the second preset value, the displacement constraint value of the upper surface in the first direction is the first preset value, the displacement constraint value of the left side surface in the second direction is 0, the displacement constraint value of the lower surface in the first direction is 0, and the normal displacement constraint values of the front side surface and the back side surface are 0; in a fifth set of the test parameters, a displacement constraint value of the front side surface in the first direction is the first preset value, a displacement constraint value of the right side surface in the third direction is the third preset value, a displacement constraint value of the back side surface in the first direction is 0, a displacement constraint value of the left side surface in the third direction is 0, and normal displacement constraint values of the upper surface and the lower surface are 0; in a sixth set of the test parameters, a displacement constraint value of the upper surface in the third direction is the third preset value, a displacement constraint value of the front side surface in the second direction is the second preset value, a displacement constraint value of the lower surface in the third direction is 0, a displacement constraint value of the rear side surface in the second direction is 0, and a normal displacement of the left side surface and the right side surface is 0.

Optionally, the positive strain is a value in the range of 0.01% to 0.02%.

Optionally, extracting a counterforce on the surface of the simulation graph according to each set of the test parameters includes: extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to a first set of the test parameters; extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to a second group of the test parameters; extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to the third group of test parameters; extracting the counter force of the right side surface of the simulation graph according to the fourth group of the test parameters; extracting a reaction force of the front side surface of the simulation graph according to a fifth group of the test parameters; and extracting the counter force of the upper surface of the simulation graph according to the sixth group of the test parameters.

Optionally, calculating a material property of the simulated pattern according to the counterforce on the surface of the simulated pattern and the area of the corresponding surface of the equivalent pattern, including: dividing the reaction force of the right side surface by the area of the first surface at the same position on the equivalent graph according to the reaction forces of the surfaces extracted by the first group of test parameters to obtain a constant Q₁₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface at the same position on the equivalent graph to obtain a constant Q₁₂(ii) a Dividing the reaction force of the front side surface by the area of the third surface at the same position on the equivalent graph to obtain a constant Q₁₃(ii) a Dividing the reaction force of the right side surface by the area of the first surface based on the reaction forces of the surfaces extracted from the second set of test parameters to obtain a constant Q₂₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₂₃(ii) a Dividing the reaction force of the right side surface by the area of the first surface according to the reaction forces of the surfaces extracted from the third set of test parameters to obtain a constant Q₃₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₃₃(ii) a Dividing the reaction force of the right side surface by the area of the first surface according to the reaction forces of the surfaces extracted by the fourth set of test parameters to obtain a constant Q₆₆(ii) a Dividing the reaction force of the front side surface by the area of the third surface according to the reaction forces of the surfaces extracted from the fifth set of test parameters to obtain a constant Q₅₅(ii) a Dividing the reaction force of the upper surface by the area of the second surface based on the reaction forces of the surfaces extracted from the sixth set of test parameters to obtain a constant Q₄₄(ii) a According to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

Alternatively, according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating the material attribute of the simulation graph, wherein the calculation comprises the following steps: according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄Establishing a stiffness matrix

Calculating an inverse matrix of the rigidity matrix according to the rigidity matrix to obtain a flexibility matrix

According to the relation between the compliance matrix and the material property

And calculating to obtain the material property.

Wherein E is₁、E₂、E₃Is Young's modulus, v₁₂、ν₁₃、ν₂₃Is Poisson's ratio, G₂₃、G₃₁、G₁₂Is the shear modulus.

On the other hand, an embodiment of the present invention further provides a method for manufacturing a mask blank, including: applying the material properties obtained by the method for obtaining the material properties of the mask strip to a mask strip model; simulating and stretching the mask strip model, and adjusting the tension along the extension direction of the mask strip model until the mask strip model is flat; and respectively acquiring the elongation along the extending direction of the mask strip model and the shrinkage along the extending direction vertical to the mask strip model, and compensating the mask strips in the actual manufacturing process of the mask strips.

In another aspect, an embodiment of the present invention further provides an apparatus for obtaining the material property of a mask strip, including: the construction module is configured to manufacture a simulation graph according to a mask plate model, and the shape and the size of the simulation graph are the same as those of the repeating units on the mask strip model; wherein the repeating unit comprises at least one evaporation hole; the building module is also configured to build an equivalent graph according to the simulation graph, and the equivalent graph is in a cuboid shape; the length, the width and the height of the cuboid are respectively equal to those of the simulation graph; the setting module is configured to set a plurality of groups of test parameters, and each group of test parameters comprises displacement constraint values of all surfaces of the simulation graph; the extraction module is configured to extract the counter force on the surface of the simulation graph according to each group of the test parameters; the calculating module is configured to calculate the material attribute of the simulation graph according to the counterforce on the surface of the simulation graph and the area of the corresponding surface of the equivalent graph; the material properties include young's modulus, poisson's ratio, and shear modulus.

Optionally, the calculating module is configured to calculate a material property of the simulated graphics according to the counterforce on the surface of the simulated graphics and the area of the corresponding surface of the equivalent graphics, and includes: the calculation module is configured to obtain a constant Q by dividing the reaction force of the right side surface by the area of the first surface at the same position on the equivalent graph according to the reaction forces of the surfaces extracted from the first set of test parameters₁₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface at the same position on the equivalent graph to obtain a constant Q₁₂(ii) a Dividing the reaction force of the front side surface by the area of the third surface at the same position on the equivalent graph to obtain a constant Q₁₃(ii) a The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q based on the reaction forces of the surfaces extracted from the second set of test parameters₂₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₂₃(ii) a The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q according to the reaction forces of the surfaces extracted by the third set of test parameters₃₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₃₃(ii) a The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q according to the reaction forces of the surfaces extracted by the fourth set of test parameters₆₆(ii) a The calculation module is further configured to divide the reaction force of the front side surface by the area of the third surface according to the reaction forces of the surfaces extracted from the fifth set of test parameters to obtain a constant Q₅₅(ii) a The calculation module is further configured to divide the reaction force of the upper surface by the area of the second surface to obtain a constant Q, based on the reaction forces of the surfaces extracted from the sixth set of test parameters₄₄(ii) a The computing moduleIs also configured according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

Optionally, the computing module is configured to calculate according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating the material attribute of the simulation graph, wherein the calculation comprises the following steps:

the computing module configured to compute according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄Establishing a stiffness matrix

The calculation module is also configured to calculate an inverse matrix of the stiffness matrix according to the stiffness matrix to obtain a compliance matrix

The calculation module is further configured to calculate a compliance matrix based on the compliance matrix and the material property

Calculating to obtain the material attribute;

The embodiment of the invention provides a method and a device for acquiring the material property of a mask strip and a method for manufacturing a mask plate. And then applying a plurality of groups of test parameters to the simulation graph, extracting the counterforce on the surface of the simulation graph, and quickly and simply calculating to obtain the material attribute of the simulation graph by combining the area of the corresponding equivalent graph surface, so that the material attribute can be used as the material attribute of the repeating unit and further can be used as the material attribute of the mask strip.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.

Fig. 1 is a schematic structural diagram of a fine mask blank according to an embodiment of the present invention;

FIG. 2 is a schematic flow chart of a method for obtaining the material property of a mask strip according to an embodiment of the present invention;

FIG. 3 is a schematic top view of a mask strip according to an embodiment of the present invention;

FIG. 4a is an enlarged top view of the portion of FIG. 3;

FIG. 4b is a schematic perspective view of the simulation graph created based on FIG. 4 a;

FIG. 5a is another enlarged top view of the device of FIG. 3;

FIG. 5b is a schematic perspective view of the simulation graph created based on FIG. 5 a;

FIG. 6a is a schematic perspective view of yet another simulation graph;

FIG. 6b is a cross-sectional view taken along direction EE' of FIG. 6 a;

FIG. 7 is a schematic illustration of an equivalent graph;

FIG. 8 is a schematic flow chart of extracting a reaction force on a simulated graphical surface according to each set of test parameters according to an embodiment of the present invention;

FIG. 9 is a schematic flow chart illustrating a process for calculating material properties of a simulation graph according to an embodiment of the present invention;

FIG. 10 is a schematic flow chart illustrating another process for calculating material properties of a simulation graph according to an embodiment of the present invention;

fig. 11 is a schematic flow chart of a method for manufacturing a mask blank according to an embodiment of the present invention;

fig. 12 is a schematic structural view of a device for acquiring the material property of the mask strip.

Reference numerals:

1-fine mask plate; 2-a mask frame; 3-mask stripes; 10-mask bar pattern; 11-evaporation area; 20-a repeating unit; 21-vapor plating holes; 30-simulating a graph; 40-equivalent graph; 50-building a module; 60-setting module; 70-an extraction module; 80-a calculation module.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The manufacturing process of the fine mask plate 1 comprises the following steps: as shown in fig. 1, after the mask stripes 3 are fabricated, the mask stripes 3 are attached to the mask frame 2 on a tenter, thereby forming a fine mask plate 1. After the screen is stretched, the attachment state of the mask stripes 3, for example, whether flat or not, directly affects the vapor deposition effect. The fit of the mask stripes 3 is in turn influenced by the material properties of the mask stripes 3. Therefore, it is important to analyze the material properties of the mask stripes 3.

An embodiment of the present invention provides a method for obtaining the material property of a mask strip, as shown in fig. 2, including:

s10, according to the mask strip model 10 (as shown in fig. 3), making a simulation pattern 30 (as shown in fig. 4b, 5b and 6 a), wherein the simulation pattern 30 and the repeating unit 20 on the mask strip model 10 have the same shape and size; wherein the repeating unit 20 includes at least one evaporation hole 21.

A mask strip model 10 as shown in fig. 3 may be created, for example, using Computer Aided Engineering (CAE) software, based on the shape and size of the mask strips 3 in the fine mask blank 1. The evaporation region 11 of the mask bar model 10 includes millions of evaporation holes 21, and the evaporation holes 21 are arranged in a periodic manner.

Based on this, the vapor deposition region 11 of the mask bar model 10 may be divided into a plurality of repeating units 20 having the same shape and size based on the established mask bar model 10, each repeating unit 20 including at least one vapor deposition hole 21. Then, a simulation figure 30 of the same shape and size is created from one of the repeating units 20.

Illustratively, according to the Pentile arrangement manner of the sub-pixels in the OLED display device, a mask bar model 10 is established corresponding to the used mask bars 3, and the evaporation region 11 in the mask bar model 10 is divided into a plurality of repeating units 20.

The division of the repeating unit 20 can be done, for example, as follows: as shown in fig. 4a and 5a, on the mask strip model 10, an oblique direction is selected as w direction, five evaporation holes are set as a period along the w direction, two evaporation holes at the two most sides, such as evaporation hole N1 and evaporation hole N2, are selected, and a central line L of the evaporation hole N1 is obtained along the v direction_v1Center line L of vapor deposition hole N2_v2And along the u direction, obtaining the center line L of the evaporation hole N1_u1Center line L of vapor deposition hole N2_u2And dividing the four middle lines as a basis. As shown in fig. 4a and 5a, the divided repeating unit 20 includes five evaporation holes 21, and then a simulation pattern 30 is constructed according to the shape and size of the repeating unit 20.

Based on this, as shown in fig. 4b and 5b, simulation patterns 30 of the same shape and size are created from the repeating units 20.

For example, as shown in fig. 4b and 5b, the opening shape of the evaporation hole 21 may be a rectangle or a rounded rectangle. Alternatively, as shown in fig. 6a and 6b, the same evaporation hole 21 may have different opening sizes on the plane T and the plane T' (the opposite side to the plane T, which is not shown) of the fine mask plate 10.

S20, as shown in FIG. 6a and FIG. 7, constructing an equivalent graph 40 according to the simulation graph 30, wherein the shape of the equivalent graph 40 is a cuboid; the length L, width W, and height H of the rectangular parallelepiped are equal to the length L, width W, and height H of the simulation pattern 30, respectively.

The invention simplifies the structure of the simulation graph 30, and the simulation graph is equivalent to a cuboid which has a regular shape, uniform thickness and no evaporation hole 21.

Illustratively, rectangular solids of equal length L, width W and height H are constructed as the equivalent figure 40, as shown in fig. 6a and 7, according to the dimensions of length L, width W and height H of the simulated figure 30 in S10.

And S30, setting multiple groups of test parameters according to all the surfaces of the simulation graph 30, wherein each group of test parameters comprises displacement constraint values of all the surfaces of the simulation graph 30.

Based on the finite element analysis method, a plurality of sets of test parameters may be set for the six surfaces of the simulated pattern 30 using ANSYS software, each set of test parameters including displacement constraint values for the six surfaces of the simulated pattern.

It should be noted that, a displacement constraint value is applied to any surface of the simulation graph 30, and the displacement constraint value refers to the maximum displacement of the surface after being stressed in a certain direction; a displacement constraint value of 0 indicates that the surface is constrained in a certain direction and does not change.

The displacement constraint value comprises a normal displacement constraint value, and the normal displacement constraint value refers to the maximum displacement of a certain surface after being stressed in the normal direction of the surface.

S40, extracting the reaction force on the surface of the simulation pattern 30 based on each set of the test parameters.

When a displacement constraint value is applied to the dummy pattern 30, the freedom of the surfaces of the dummy pattern 30 is limited, and thus the respective surfaces generate a counter force.

Wherein the reaction force on the surface of the simulation pattern 30 can be extracted using ANSYS software.

S50, calculating the material attribute of the simulation graph 30 according to the reaction force on the surface of the simulation graph 30 and the area of the corresponding equivalent graph 40 surface; material properties include young's modulus, poisson's ratio, and shear modulus.

The embodiment of the invention provides a method for acquiring the material property of a mask strip, which comprises the steps of dividing a mask plate model 10 into a plurality of repeating units 20, establishing simulation graphs 30 with the same shape and size according to the repeating units 20, and simplifying the structure of the simulation graphs 30 into an equivalent graph 40. Then, by applying a plurality of sets of test parameters to the simulation pattern 30, the reaction force on the surface of the simulation pattern 30 is extracted, and then the material property of the simulation pattern 30 is obtained by fast and simple calculation in combination with the area of the surface of the corresponding equivalent pattern 40, so that the material property can be used as the material property of the repeating unit 20, and further the material property of the mask strip 1.

Optionally, the plurality of sets of test parameters includes a first set of test parameters, a second set of test parameters, a third set of test parameters, a fourth set of test parameters, a fifth set of test parameters, and a sixth set of test parameters.

As shown in fig. 6a, in the first set of test parameters, the normal displacement constraint value of the right surface R of the simulation graph 30 is a first preset value, and the normal displacement constraint values of the other five surfaces are zero; the first direction X is a normal direction of the right side surface R, and the first preset value is a product of the positive strain and a length of the simulation pattern 30 in the first direction X.

The length of the simulated graphic 30 in the first direction X is a length L.

As shown in fig. 6a, in the second set of test parameters, the normal displacement constraint value of the upper surface S of the simulation graph 30 is a second preset value, and the normal displacement constraint values of the other five surfaces are zero; the second direction Y is normal to the upper surface S, and the second predetermined value is a product of the positive strain and a length of the simulated pattern in the second direction Y.

The length of the simulated figure 30 in the second direction Y is a width W.

As shown in fig. 6a, in the third set of test parameters, the normal displacement constraint value of the front side surface T of the simulation graph is a third preset value, and the normal displacement constraint values of the other five surfaces are zero; the third direction Z is a normal direction of the front side surface T, the third preset value is a product of the positive strain and the length of the simulation graph along the third direction Z, and the first direction X, the second direction Y and the third direction Z are perpendicular to each other.

The length of the simulated pattern 30 in the third direction Z is a height H.

As shown in fig. 6a, in the fourth set of test parameters, the displacement constraint value of the right side surface R in the second direction Y is a second preset value, the displacement constraint value of the upper surface S in the first direction X is a first preset value, the displacement constraint value of the left side surface R ' in the second direction Y is 0, the displacement constraint value of the lower surface S ' in the first direction X is 0, and the normal displacement constraint values of the front side surface T and the back side surface T ' are 0.

Note that the left side surface R ' and the right side surface R are opposed, the upper surface S and the lower surface S ' are opposed, and the front side surface T and the rear side surface T ' are opposed. The first direction X is a normal to the left and right side surfaces R ' and R ', and is a negative normal to the left side surface R ' and a positive normal to the right side surface R; the second direction Y is the normal direction of the lower surface S 'and the upper surface S, and is the negative normal direction of the lower surface S' and the positive normal direction of the upper surface S; the third direction Z is a normal to the rear surface T 'and the front surface T, and is a negative normal direction of the rear surface T' and a positive normal direction of the front surface T.

As shown in fig. 6a, in the fifth set of test parameters, the displacement constraint value of the front side surface T in the first direction X is a first preset value, the displacement constraint value of the right side surface R in the third direction Z is a third preset value, the displacement constraint value of the back side surface T 'in the first direction X is 0, the displacement constraint value of the left side surface R' in the third direction Z is 0, and the normal displacement constraint values of the upper surface R 'and the lower surface S' are 0.

As shown in fig. 6a, in the sixth set of test parameters, the displacement constraint value of the upper surface S in the third direction Z is a third preset value, the displacement constraint value of the front side surface T in the second direction Y is a second preset value, the displacement constraint value of the lower surface S ' in the third direction Z is 0, the displacement constraint value of the rear side surface T ' in the second direction Y is 0, and the normal displacements of the left side surface R ' and the right side surface R are 0.

It should be noted that the "front side surface", "right side surface", "upper surface", "lower surface", "front side surface", and "rear side surface" of the simulation chart 30 are only used to indicate the positional relationship, and when the absolute position of the description object is changed, the relative positional relationship may also be changed accordingly.

The object can generate certain deformation under the action of external force, internal force can be generated in the object to resist the action of the external cause, and the internal force per unit area of a certain section of the object is called stress before the object is tried to recover from deformation to deformation, the internal force perpendicular to the section is called positive stress, and the internal force tangential to the section is called shear stress.

The degree to which an object deforms is known as strain, and strain includes primarily positive strain and shear strain. The positive strain refers to taking a certain infinitesimal on an object, and taking the ratio of the length increment generated by deformation on a tiny line segment along a certain direction to the original length, namely,

where L 'is the length before deformation,. DELTA.L' is the length after deformation, and ε is the positive strain expressed as a percentage. The shear strain refers to a change value of an angle between two perpendicular tiny line segments after deformation.

Optionally, the positive strain is in a range of 0.01% to 0.02%.

Illustratively, the value of the positive strain is 0.01%, or the value of the positive strain is 0.015%, or the value of the positive strain is 0.02%.

Based on this, as shown in fig. 6a, by way of example, a coordinate system is established, the first direction X, the second direction Y and the third direction Z are perpendicular to each other, the right side surface of the simulation pattern 30 is R, the upper surface is S, the front side surface is T, the left side surface is R ', the lower surface is S ', the rear side surface is T ', and the length L is 200 μm, which is the length of the simulation pattern 30 in the first direction X; the width W is the length of the dummy pattern 30 in the second direction Y and is 200 μm; the height H is a length of the dummy pattern 30 in the third direction Z, and is 30 μm.

Take the value of positive strain as 0.015%. The first set of test parameters is set, and the normal displacement constraint value of the right side surface R is a first preset value, which is 0.015% × 200 ═ 0.03(μm), and the normal displacement constraint values on the upper surface S, the front side surface T, the left side surface R ', the lower surface S ', and the rear side surface T ' are 0.

A second set of test parameters is set, and the normal displacement constraint value of the upper surface S is a second preset value, which is 0.015% × 200 ═ 0.03(μm), and the normal displacement constraint values on the rear side surface R, the front side surface T, the left side surface R ', the lower surface S ', and the rear side surface T ' are 0.

Setting a third set of test parameters, where the normal displacement constraint value of the front side surface T is a third preset value, the third preset value is 0.015% × 30 ═ 0.0045(μm), and the normal displacement constraint values on the right side surface R, the upper surface S, the left side surface R ', the lower surface S ', and the back side surface T ' are 0.

Setting a fourth set of test parameters, the displacement constraint value of the right side surface R in the second direction Y is a second preset value, i.e., 0.03 μm. The displacement constraint value of the upper surface S in the first direction X is a first preset value, i.e., 0.03 μm. Meanwhile, the displacement constraint value of the left side surface R ' in the second direction Y is 0, the displacement constraint value of the lower surface S ' in the first direction X is 0, and the normal displacement constraint values on the front side surface T and the rear side surface T ' are 0.

The fifth set of test parameters is set such that the displacement constraint value of the front side surface T in the first direction X is a first preset value, i.e., 0.03 μm. The displacement constraint value of the right side surface R in the third direction Z is a third preset value, i.e., 0.0045 μm. Meanwhile, the displacement constraint value of the rear side surface T ' in the first direction X is 0, the displacement constraint value of the left side surface R ' in the third direction Z is 0, and the normal displacement constraint values of the upper surface S and the lower surface S ' are 0.

And setting a sixth group of test parameters, wherein the displacement constraint value of the upper surface S in the third direction Z is a third preset value, namely 0.0045 μm. The displacement constraint value of the front side surface T in the second direction Y is a second preset value, i.e., 0.03 μm. Meanwhile, the displacement constraint value of the lower surface S ' in the third direction Z is 0, the displacement constraint value of the rear side surface T ' in the second direction Y is 0, and the normal displacement constraint values of the left side surface R ' and the right side surface R are 0.

Optionally, extracting the counterforce on the surface of the simulated pattern according to each set of test parameters, as shown in fig. 8, includes:

s301, as shown in fig. 6a, the reaction forces of the right surface R, the upper surface S, and the front surface T of the simulation pattern 30 are extracted based on the first set of test parameters.

S302, as shown in fig. 6a, the reaction forces of the right surface R, the upper surface S, and the front surface T of the simulation pattern 30 are extracted based on the second set of test parameters.

S303, as shown in fig. 6a, the reaction forces of the right surface R, the upper surface S, and the front surface T of the simulation pattern 30 are extracted based on the third set of test parameters.

S304, as shown in fig. 6a, the reaction force of the right surface R of the simulation pattern 30 is extracted based on the fourth set of test parameters.

S305, as shown in fig. 6a, the reaction force of the front surface T of the simulation pattern 30 is extracted based on the fifth set of test parameters.

S306, as shown in fig. 6a, the reaction force of the upper surface S of the simulation pattern 30 is extracted based on the sixth set of test parameters.

Optionally, calculating a material property of the simulated pattern according to the counterforce on the surface of the simulated pattern and the area of the corresponding equivalent pattern surface, as shown in fig. 9, includes:

s401, as shown in FIGS. 6a and 7, the reaction force of the right side surface R is divided by the area of the first surface A at the same position on the equivalent graph 40 according to the surface reaction forces extracted from the first set of test parameters to obtain a constant Q₁₁(ii) a The reaction force of the upper surface S is divided by the area of the second surface B at the same position on the equivalent graph 40 to obtain a constant Q₁₂(ii) a The reaction force of the front side surface T is divided by the area of the third surface C at the same position on the equivalent graph 40 to obtain a constant Q₁₃。

Illustratively, as shown in fig. 7, the same coordinate system as that of fig. 6a is established, and the first direction X, the second direction Y and the third direction Z are perpendicular to each other, in which case the first surface a is located at the right side of the equivalent graph 40 and at the same position as the right side surface of the simulation graph 30, the second surface B is located above the equivalent graph 40 and at the same position as the upper surface of the simulation graph 30, and the third surface C is located at the front side of the equivalent graph 40 and at the same position as the front side surface of the simulation graph 30.

S402, as shown in FIGS. 6a and 7, the reaction force of the right side surface R is divided by the area of the first surface A according to the reaction forces of the surfaces extracted by the second set of test parameters to obtain a constant Q₂₁(ii) a Dividing the reaction force of the upper surface S by the area of the second surface B to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front side surface T by the area of the third surface C to obtain a constant Q₂₃。

S403, as shown in FIGS. 6a and 7, the reaction force of the right side surface R is divided by the area of the first surface A according to the reaction forces of the surfaces extracted by the third set of test parameters to obtain a constant Q₃₁(ii) a Dividing the reaction force of the upper surface S by the area of the second surface B to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front side surface T by the area of the third surface C to obtain a constant Q₃₃。

S404, as shown in FIGS. 6a and 7, the reaction force of the right side surface R is divided by the area of the first surface A according to the surface reaction forces extracted by the fourth set of test parameters to obtain a constant Q₆₆。

S405, as shown in FIGS. 6a and 7, the reaction force of the front side surface T is divided by the area of the third surface C according to the reaction forces of the surfaces extracted from the fifth set of test parameters to obtain a constant Q₅₅。

S406, as shown in FIGS. 6a and 7, the reaction force of the upper surface S is divided by the area of the second surface B to obtain a constant Q according to the surface reaction forces extracted from the sixth set of test parameters₄₄。

S407, as shown in FIGS. 6a and 7, according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

Alternatively, according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄The material properties of the simulation graph 30 are calculated, as shown in fig. 10, and include:

s501, according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄Establishing a stiffness matrix

According to the generalized Hooke's law, when a material is stretched, the stress sigma is proportional to the axial strain epsilon (consistent with the stretching direction), the proportionality constant is defined as Young's modulus E, and the relation is

The ratio of radial strain (perpendicular to the direction of stretching) to axial strain is also constant, defined as poisson's ratio ν; the shear stress on the material is also proportional to the shear strain, with the proportionality coefficient known as the shear elastic modulus G.

Based on this, the relationship of the positive stress, the shear stress, the positive strain and the shear strain is:

therein, for example, as shown in FIG. 6a, σ₁Representing a positive stress, σ, acting on the right surface R of the simulation diagram 30 and acting in the first direction X₂Representing a positive stress, σ, acting on the upper surface S of the simulated pattern 30 and acting in the second direction Y₃A positive stress acting on the front-side surface T of the simulation figure 30 and acting in the third direction Z is represented. Epsilon₁Expressed as a positive strain, epsilon, in a first direction X₂Denotes a positive strain, ε, in a second direction Y₃Representing a positive strain in the third direction Z.

τ₂₃Representing a shear stress, τ, acting on the upper surface S of the dummy pattern 30 and acting in a third direction Z₃₁Representing a shear stress, τ, acting on the front side surface T of the dummy pattern 30 and acting in a first direction X₁₂Representing actions on simulated graphics 30A shear stress acting on the right side surface R and in the second direction Y. Gamma ray₂₃Representing a change of right angle between the second direction Y and the third direction Z, gamma₃₁Representing the change of right angle between the third direction Z and the first direction X, gamma₁₂Indicating a change of right angle between the first direction X and the second direction Y.

Further, the matrix in equation (one)

Referred to as compliance matrix S_ij。

On the basis, according to the definitions of elasticity mechanics and composite material mechanics, when the certain material is an orthotropic material, that is, in a coordinate system in which three directions are mutually orthogonal, the material properties along the three directions are different, in this case, the orthotropic material has three orthogonal material property symmetry planes. Thus, the compliance matrix S_ijConstant S in₁₄、S₁₅、S₁₆、S₂₄、S₂₅、S₂₆、S₃₄、S₃₅、S₃₆、S₄₁、S₄₂、S₄₃、S₄₅、S₄₆、S₅₁、S₅₂、S₅₃、S₅₄、S₅₆、S₆₁、S₆₂、S₆₃、S₆₄、S₆₅Are all 0, and the compliance matrix S_ijIs a symmetric matrix, i.e. S_ij＝S_ji. Wherein i is more than or equal to 1 and less than or equal to 6, j is more than or equal to 1 and less than or equal to 6, and i and j are positive integers.

At this time, the compliance matrix S_ijComprising only 9 independent constants, the compliance matrix being reduced to

Compliance matrix S expressed by engineering constants for orthotropic material_ijComprises the following steps:

illustratively, as shown in FIG. 6a, E₁、E₂、E₃Young's moduli in a first direction X, a second direction Y, and a third direction Z, respectively; v is_mnThe poisson's ratio, which is the strain in the n-direction when stress acts in the m-th direction, that is,

wherein m is more than or equal to 1 and less than or equal to 3, n is more than or equal to 1 and less than or equal to 3, and m and n are positive integers.

G₂₃Representing a shear modulus, G, acting on the right side surface R of the simulation graph 30 and acting in a third direction Z₃₁Representing a shear modulus, G, acting on the front side surface T of the simulation diagram 30 and acting in a first direction X₁₂The shear modulus acting on the upper surface S of the simulation pattern 30 and acting in the second direction Y is represented.

Can be obtained from the formula (two) and the formula (three),

and also the relationship:

according to the compliance matrix S in the formula (II)_ijSolving an inverse matrix, namely a rigidity matrix

Wherein,

s502, calculating an inverse matrix of the rigidity matrix according to the rigidity matrix to obtain a flexibility matrix

S503, according to the relational expression of the compliance matrix and the material attribute

And calculating to obtain the material property.

By way of example, a number of steps are provided below to clearly illustrate the computational process of finding material properties by building a stiffness matrix, and reverse reasoning.

As shown in FIGS. 6a and 7, the equivalent pattern 40 has the same shape and size as the dummy pattern 30, has a length L of 200 μm, a width W of 200 μm, and a height H of 30 μm, and approximates the dummy pattern 30 to an orthotropic material. And take the value of positive strain as 0.015%.

The first step is as follows: a first set of test parameters is set, and the normal displacement constraint value of the right side surface R is a first preset value, which is 0.015% × 200 ═ 0.03(μm), and the normal displacement constraint values of the upper surface S, the front side surface T, the left side surface R ', the lower surface S ', and the rear side surface T ' are 0.

Based on the first set of test parameters, the reaction force on the right surface R of the simulated pattern 30 is extracted using ANSYS software, and divided by the area 30 × 200 of the first surface a at the same position on the equivalent pattern 40 to 6000(μm)²) To obtain a constant Q₁₁(ii) a The reaction force of the upper surface S is extracted and divided by the area 30 × 200 of the second surface B at the same position on the equivalent pattern 40, which is 6000(μm)²) To obtain a constant Q₁₂(ii) a The reaction force of the front surface T is extracted and divided by the area of the third surface C at the same position on the equivalent graph 40, which is 200 × 200＝4000(μm²) To obtain a constant Q₁₃。

The second step is that: a second set of test parameters is set, and the normal displacement constraint value of the upper surface S is a second preset value, which is 0.015% × 200 ═ 0.03(μm), and the normal displacement constraint values on the rear side surface R, the front side surface T, the left side surface R ', the lower surface S ', and the rear side surface T ' are 0.

According to the second set of test parameters, ANSYS software is used for extracting the counterforce of the surface R at the right side of the simulation graph 30, and then the counterforce is divided by the area 6000 mu m of the first surface A of the corresponding equivalent graph 40²To obtain a constant Q₂₁(ii) a The reaction force of the upper surface S is extracted and divided by the area 6000 μm of the second surface B of the corresponding equivalent pattern 40²To obtain a constant Q₂₂(ii) a The counterforce of the front surface T is extracted and divided by the area 40000 μm of the third surface C of the corresponding equivalent pattern 40²To obtain a constant Q₂₃。

The third step: setting a third set of test parameters, where the normal displacement constraint value of the front side surface T is a third preset value, the third preset value is 0.015% × 30 ═ 0.0045(μm), and the normal displacement constraint values on the right side surface R, the upper surface S, the left side surface R ', the lower surface S ', and the back side surface T ' are 0.

According to the third group of test parameters, ANSYS software is used for extracting the counterforce of the surface R at the right side of the simulation graph 30, and then the counterforce is divided by the area 6000 mu m of the first surface A of the corresponding equivalent graph 40²To obtain a constant Q₃₁(ii) a The reaction force of the upper surface S is extracted and divided by the area 6000 μm of the second surface B of the corresponding equivalent pattern 40²To obtain a constant Q₃₂(ii) a The counterforce of the front surface T is extracted and divided by the area 40000 μm of the third surface C of the corresponding equivalent pattern 40²To obtain a constant Q₃₃。

The fourth step: setting a fourth set of test parameters, the displacement constraint value of the right side surface R in the second direction Y is a second preset value, i.e., 0.03 μm. The displacement constraint value of the upper surface S in the first direction X is a first preset value, i.e., 0.03 μm. Meanwhile, the displacement constraint value of the left side surface R ' in the second direction Y is 0, the displacement constraint value of the lower surface S ' in the first direction X is 0, and the normal displacement constraint value of the front side surface T and the rear side surface T ' is 0.

According to the fourth group of test parameters, the reaction force of the surface R at the right side of the simulation graph 30 is extracted by ANSYS software, and then the reaction force is divided by the area 6000 mu m of the first surface A of the corresponding equivalent graph 40²To obtain a constant Q₆₆。

The fifth step: the fifth set of test parameters is set such that the displacement constraint value of the front side surface T in the first direction X is a first preset value, i.e., 0.03 μm. The displacement constraint value of the right side surface R in the third direction Z is a third preset value, i.e., 0.0045 μm. Meanwhile, the displacement constraint value of the rear side surface T ' in the first direction X is 0, the displacement constraint value of the left side surface R ' in the third direction Z is 0, and the normal displacement constraint values of the upper surface S and the lower surface S ' are 0.

According to the fifth set of test parameters, the reaction force of the front surface T of the simulation graph 30 is extracted by ANSYS software, and then divided by the area 40000 μm of the third surface C of the corresponding equivalent graph 40²To obtain a constant Q₅₅。

And a sixth step: and setting a sixth group of test parameters, wherein the displacement constraint value of the upper surface S in the third direction Z is a third preset value, namely 0.0045 μm. The displacement constraint value of the front side surface T in the second direction Y is a second preset value, i.e., 0.03 μm. Meanwhile, the displacement constraint value of the lower surface S ' in the third direction Z is 0, the displacement constraint value of the rear side surface T ' in the second direction Y is 0, and the normal displacement constraint values of the left side surface R ' and the right side surface R are 0.

According to the sixth set of test parameters, ANSYS software is used for extracting the reaction force of the upper surface S of the simulation graph 30, and then the reaction force is divided by the area 6000 mu m of the second surface B of the corresponding equivalent graph 40²To obtain a constant Q₄₄。

The seventh step: q obtained from the first to sixth steps₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₄₄、Q₅₅And Q₆₆Establishing a stiffness matrix

Eighth step: according to the stiffness matrix Q_ijSolve its inverse matrix S_ijI.e. compliance matrix S_ijIs composed of

Wherein,

the ninth step: according to the compliance matrix S_ijRelation with material property

And calculating to obtain the material property.

Wherein,

it can be deduced that:

ν₁₂＝-S₁₂×E₁，ν₂₁＝-S₁₂×E₂，ν₁₃＝-S₁₃×E₁，ν₃₁＝-S₃₁×E₃，ν₂₃＝-S₂₃×E₂，ν₃₂＝-S₃₂×E₃，

thus, E is obtained₁、E₂、E₃I.e. Young's modulus, the resulting v₁₂、ν₁₃、ν₂₃、ν₂₁、ν₃₁、ν₂₃I.e. Poisson's ratio, G₂₃、G₃₁、G₁₂I.e. the shear modulus, the resulting young's modulus, poisson's ratio and shear modulus are the material properties of the simulated pattern 30, and thus are the material properties of the mask strip.

An embodiment of the present invention further provides a method for manufacturing a mask blank, as shown in fig. 11, including:

s601, applying the material property obtained by the above method for obtaining the material property of the mask strip to the mask strip model.

The calculated Young's modulus E₁、E₂、E₃The obtained Poisson ratio v₁₂、ν₁₃、ν₂₃The resulting shear modulus G₂₃、G₃₁、G₁₂To the mask strip pattern.

S602, simulating screen stretching of the mask strip model, and adjusting the tension along the extension direction of the mask strip model until the mask strip model is flat.

And S603, respectively acquiring the elongation along the extending direction of the mask strip model and the shrinkage along the extending direction perpendicular to the mask strip model.

S604, compensating the mask strips in the actual manufacturing process of the mask strips.

Illustratively, the mask stripe pattern has a length P in the extending direction of the mask stripe pattern₁1000mm, the length P of the mask strip pattern in a direction perpendicular to the extension of the mask strip pattern₂Is 80 mm.

And simulating a screen on the mask strip model, and adjusting the tension along the extension direction of the mask strip model until the mask strip model is flat. Obtaining an elongation of 0.05% in the extending direction of the mask strip pattern and a shrinkage of 0.1% in the direction perpendicular to the extending direction of the mask strip pattern, i.e., P after screening₁Elongation of1000X 0.05% ═ 0.5(mm), P₂The shrinkage was 80 × 0.1% ═ 0.08 (mm). In the actual manufacturing process of the mask strips, the length of the mask strips in the extending direction is compensated to 999.5mm, and the length of the mask strips in the direction perpendicular to the extending direction is compensated to 80.08mm, so that the length of the mask strips in the extending direction is actually 1000mm and the length of the mask strips in the direction perpendicular to the extending direction is actually 80mm after the mask strips are completely expanded.

The embodiment of the invention provides a mask plate manufacturing method, which is characterized in that the material attribute obtained by the mask strip material attribute obtaining method is applied to a mask strip model, so that after the mask strip model is subjected to simulated screening, the change of the mask strip model is closer to the real mask strip screening condition, and then the mask strip is compensated in the actual mask strip manufacturing process by obtaining the elongation along the extending direction of the mask strip model and the shrinkage along the extending direction vertical to the mask strip model, so that the obtained evaporation effect is more accurate.

An embodiment of the present invention further provides an apparatus for obtaining the material property of a mask strip, as shown in fig. 12, including:

a building module 50 configured to make a simulation pattern according to the mask strip model, wherein the simulation pattern and the plurality of repeating units on the mask strip model have the same shape and size; wherein the repeating unit includes at least one evaporation hole.

The building module 50 is further configured to build an equivalent graph according to the simulation graph, wherein the equivalent graph is in a cuboid shape; the length, width and height of the cuboid are respectively equal to those of the simulation graph.

A setting module 60 configured to set a plurality of sets of test parameters, each set of test parameters including displacement constraint values for all surfaces of the simulated pattern.

An extraction module 70 configured to extract a counter force on the simulated graphical surface in accordance with each set of test parameters.

A calculating module 80 configured to calculate a material property of the simulated graphics according to the reaction force on the simulated graphics surface and the area of the corresponding equivalent graphics surface; material properties include young's modulus, poisson's ratio, and shear modulus.

Optionally, the calculating module 80 is configured to calculate the material property of the simulated graphics according to the counterforce on the surface of the simulated graphics and the area of the corresponding equivalent graphics surface, and includes:

a calculation module 80 configured to divide the reaction force of the right side surface R by the area of the first surface a at the same position on the equivalent graph to obtain a constant Q, based on the respective surface reaction forces extracted from the first set of test parameters₁₁(ii) a The reaction force of the upper surface S is divided by the area of the second surface B at the same position on the equivalent graph to obtain a constant Q₁₂(ii) a The reaction force of the front side surface T is divided by the area of the third surface C at the same position on the equivalent graph to obtain a constant Q₁₃。

A calculation module 80 further configured to divide the reaction force of the right side surface R by the area of the first surface a to obtain a constant Q based on the respective surface reaction forces extracted from the second set of test parameters₂₁(ii) a Dividing the reaction force of the upper surface S by the area of the second surface B to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front side surface T by the area of the third surface C to obtain a constant Q₂₃。

The calculation module 80 divides the reaction force of the right side surface R by the area of the first surface a to obtain a constant Q based on the reaction forces of the surfaces extracted from the third set of test parameters₃₁(ii) a Dividing the reaction force of the upper surface S by the area of the second surface B to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front side surface T by the area of the third surface C to obtain a constant Q₃₃。

A calculation module 80 further configured to divide the reaction force of the right side surface R by the area of the first surface a to obtain a constant Q based on the respective surface reaction forces extracted by the fourth set of test parameters₆₆。

A calculation module 80, further configured to extract from each surface reaction force according to the fifth set of test parameters, the reaction force of the front side surface T divided by the area of the third surface C, resulting in a constant Q₅₅。

A calculation module 80 further configured to obtain a constant Q by dividing the reaction force of the upper surface S by the area of the second surface B for each surface reaction force extracted from the sixth set of test parameters₄₄。

A computing module 80 further configured as a rootAccording to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

Optionally, a calculation module 80 configured to calculate the value according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating the material properties of the simulation graph, including:

a calculation module 80 configured to calculate a value according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄Establishing a stiffness matrix

The calculating module 80 is further configured to calculate an inverse matrix of the stiffness matrix according to the stiffness matrix to obtain a compliance matrix

A calculation module 80 further configured to calculate a compliance matrix based on the relationship between the compliance matrix and the material property

Calculating to obtain material properties;

The embodiment of the invention provides a device for acquiring the material property of a mask strip, which divides a mask plate model 10 into a plurality of repeating units 20, establishes simulation graphs 30 with the same shape and size according to the repeating units 20 through a building module 50, and simplifies the structure of the simulation graphs 30 into an equivalent graph 40. Then, a plurality of sets of test parameters are applied to the simulated pattern 30 through the setting module 60, the extraction module 70 extracts the reaction force on the surface of the simulated pattern 30, and then the calculation module 80 calculates the material property of the simulated pattern 30 quickly and simply by combining the area of the surface of the corresponding equivalent pattern 40, so that the material property can be used as the material property of the repeating unit 20 and further the material property of the mask strip 1.

The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.

Claims

1. A method for obtaining a material property of a mask strip, comprising:

manufacturing a simulation graph according to the mask strip model, wherein the shape and the size of the simulation graph are the same as those of the repeating units on the mask strip model; wherein the repeating unit comprises at least one evaporation hole;

constructing an equivalent graph according to the simulation graph, wherein the equivalent graph is in a cuboid shape; the length, the width and the height of the cuboid are respectively equal to those of the simulation graph;

setting a plurality of groups of test parameters, wherein each group of test parameters comprises displacement constraint values of all surfaces of the simulation graph;

extracting the counter force on the surface of the simulation graph according to each group of test parameters;

calculating the material attribute of the simulation graph according to the counter force on the surface of the simulation graph and the area of the corresponding surface of the equivalent graph; the material properties include Young's modulus, Poisson's ratio, and shear modulus;

wherein the plurality of sets of test parameters comprise a first set of the test parameters, a second set of the test parameters, a third set of the test parameters, a fourth set of the test parameters, a fifth set of the test parameters, and a sixth set of the test parameters;

in the first group of test parameters, the normal displacement constraint value of the right side surface of the simulation graph is a first preset value, and the normal displacement constraint values of the other five surfaces are zero; the first direction is the normal direction of the right side surface, and the first preset value is the product of the positive strain and the length of the simulation graph along the first direction;

in the second group of test parameters, the normal displacement constraint value of the upper surface of the simulation graph is a second preset value, and the normal displacement constraint values of the other five surfaces are zero; the second direction is the normal direction of the upper surface, and the second preset value is the product of the positive strain and the length of the simulation graph along the second direction;

in the third group of test parameters, the normal displacement constraint value of the front side surface of the simulation graph is a third preset value, and the normal displacement constraint values of the other five surfaces are zero; the third direction is a normal direction of the front side surface, the third preset value is a product of the positive strain and a length of the simulation graph along the third direction, and the first direction, the second direction and the third direction are perpendicular to each other;

in a fourth set of the test parameters, the displacement constraint value of the right side surface in the second direction is the second preset value, the displacement constraint value of the upper surface in the first direction is the first preset value, the displacement constraint value of the left side surface in the second direction is 0, the displacement constraint value of the lower surface in the first direction is 0, and the normal displacement constraint values of the front side surface and the back side surface are 0;

in a fifth set of the test parameters, a displacement constraint value of the front side surface in the first direction is the first preset value, a displacement constraint value of the right side surface in the third direction is the third preset value, a displacement constraint value of the back side surface in the first direction is 0, a displacement constraint value of the left side surface in the third direction is 0, and normal displacement constraint values of the upper surface and the lower surface are 0;

in a sixth set of the test parameters, a displacement constraint value of the upper surface in the third direction is the third preset value, a displacement constraint value of the front side surface in the second direction is the second preset value, a displacement constraint value of the lower surface in the third direction is 0, a displacement constraint value of the rear side surface in the second direction is 0, and a normal displacement constraint value of the left side surface and the right side surface is 0;

and extracting the counter force on the surface of the simulation graph according to each group of the test parameters, comprising:

extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to a first set of the test parameters;

extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to a second group of the test parameters;

extracting reaction forces of the right side surface, the upper surface and the front side surface of the simulation graph according to the third group of test parameters;

extracting the counter force of the right side surface of the simulation graph according to the fourth group of the test parameters;

extracting a reaction force of the front side surface of the simulation graph according to a fifth group of the test parameters;

and extracting the counter force of the upper surface of the simulation graph according to the sixth group of the test parameters.

2. The method of claim 1, wherein the positive strain is in a range of 0.01% to 0.02%.

3. The method as claimed in claim 1, wherein the calculating the material property of the simulated pattern according to the counterforce on the surface of the simulated pattern and the area of the corresponding equivalent pattern surface comprises:

according to the first set of said testsThe reaction force of each surface extracted by the test parameters is divided by the area of the first surface at the same position on the equivalent graph to obtain a constant Q₁₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface at the same position on the equivalent graph to obtain a constant Q₁₂(ii) a Dividing the reaction force of the front side surface by the area of the third surface at the same position on the equivalent graph to obtain a constant Q₁₃；

Dividing the reaction force of the right side surface by the area of the first surface based on the reaction forces of the surfaces extracted from the second set of test parameters to obtain a constant Q₂₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₂₃；

Dividing the reaction force of the right side surface by the area of the first surface according to the reaction forces of the surfaces extracted from the third set of test parameters to obtain a constant Q₃₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₃₃；

Dividing the reaction force of the right side surface by the area of the first surface according to the reaction forces of the surfaces extracted by the fourth set of test parameters to obtain a constant Q₆₆；

Dividing the reaction force of the front side surface by the area of the third surface according to the reaction forces of the surfaces extracted from the fifth set of test parameters to obtain a constant Q₅₅；

Dividing the reaction force of the upper surface by the area of the second surface based on the reaction forces of the surfaces extracted from the sixth set of test parameters to obtain a constant Q₄₄；

According to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

4. The method of claim 3, wherein Q is a value₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating the material attribute of the simulation graph, wherein the calculation comprises the following steps:

according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄Establishing a stiffness matrix

Calculating to obtain the material attribute;

5. A manufacturing method of a mask plate is characterized by comprising the following steps:

applying the material property obtained by the method for obtaining a material property of a mask strip according to any one of claims 1 to 4 to a mask strip model;

simulating and stretching the mask strip model, and adjusting the tension along the extension direction of the mask strip model until the mask strip model is flat;

respectively acquiring the elongation along the extending direction of the mask strip model and the shrinkage along the extending direction perpendicular to the mask strip model;

the mask strip is compensated during the actual manufacturing process of the mask strip.

6. An apparatus for obtaining the material property of a mask strip according to any one of claims 1 to 4, comprising:

the construction module is configured to manufacture a simulation graph according to a mask plate model, and the shape and the size of the simulation graph are the same as those of the repeating units on the mask strip model; wherein the repeating unit comprises at least one evaporation hole;

the building module is also configured to build an equivalent graph according to the simulation graph, and the equivalent graph is in a cuboid shape; the length, the width and the height of the cuboid are respectively equal to those of the simulation graph;

the setting module is configured to set a plurality of groups of test parameters, and each group of test parameters comprises displacement constraint values of all surfaces of the simulation graph;

the extraction module is configured to extract the counter force on the surface of the simulation graph according to each group of the test parameters;

the calculating module is configured to calculate the material attribute of the simulation graph according to the counterforce on the surface of the simulation graph and the area of the corresponding surface of the equivalent graph; the material properties include young's modulus, poisson's ratio, and shear modulus.

7. The apparatus according to claim 6, wherein the calculating module is configured to calculate the material property of the simulated pattern according to the counterforce on the surface of the simulated pattern and the area of the corresponding equivalent pattern surface, and comprises:

the calculation module is configured to extract the respective surface reaction forces from the first set of test parametersDividing the reaction force of the right side surface by the area of the first surface at the same position on the equivalent graph to obtain a constant Q₁₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface at the same position on the equivalent graph to obtain a constant Q₁₂(ii) a Dividing the reaction force of the front side surface by the area of the third surface at the same position on the equivalent graph to obtain a constant Q₁₃；

The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q based on the reaction forces of the surfaces extracted from the second set of test parameters₂₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₂₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₂₃；

The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q according to the reaction forces of the surfaces extracted by the third set of test parameters₃₁(ii) a Dividing the reaction force of the upper surface by the area of the second surface to obtain a constant Q₃₂(ii) a Dividing the reaction force of the front surface by the area of the third surface to obtain a constant Q₃₃；

The calculation module is further configured to divide the reaction force of the right side surface by the area of the first surface to obtain a constant Q according to the reaction forces of the surfaces extracted by the fourth set of test parameters₆₆；

The calculation module is further configured to divide the reaction force of the front side surface by the area of the third surface according to the reaction forces of the surfaces extracted from the fifth set of test parameters to obtain a constant Q₅₅；

The calculation module is further configured to divide the reaction force of the upper surface by the area of the second surface to obtain a constant Q, based on the reaction forces of the surfaces extracted from the sixth set of test parameters₄₄；

The computing module is further configured to compute according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating to obtain the material attribute of the simulation graph.

8. The apparatus of claim 7, wherein the computing module is configured to obtain the mask strip material property according to Q₁₁、Q₁₂、Q₁₃、Q₂₁、Q₂₂、Q₂₃、Q₃₁、Q₃₂、Q₃₃、Q₆₆、Q₅₅、Q₄₄And calculating the material attribute of the simulation graph, wherein the calculation comprises the following steps:

Calculating to obtain the material attribute;