CN110239194B - Preparation method of high Nb-TiAl alloy material - Google Patents
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- CN110239194B CN110239194B CN201910637522.5A CN201910637522A CN110239194B CN 110239194 B CN110239194 B CN 110239194B CN 201910637522 A CN201910637522 A CN 201910637522A CN 110239194 B CN110239194 B CN 110239194B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
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- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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Abstract
The invention discloses a preparation method of a high Nb-TiAl alloy material, belongs to the technical field of alloy preparation, and aims to solve the problem of preparing high Nb-TiAl alloys with uniform distribution of Nb and other alloy elements, near-forming materials and other complex shapes. The film is prepared by combining a magnetron sputtering technology with a foil metallurgy vacuum hot pressing technology, namely, Ti foil and Al foil plated with Nb or Nb alloy are alternately laminated and subjected to vacuum hot pressing. The method comprises the following steps: preparing a Nb or Nb alloy target material; cleaning the surfaces of large-size Ti foils and large-size Al foils; plating Nb or Nb alloy on the surfaces of the washed Ti foil and Al foil through magnetron sputtering; preparing a prefabricated body: cutting the Ti foil and the Al foil subjected to magnetron sputtering into proper sizes, and then alternately laminating to prepare a high Nb-TiAl alloy material prefabricated body; low-temperature heat treatment; medium temperature heat treatment; high-temperature annealing and heat preservation are carried out to obtain the high Nb-TiAl alloy material. The method is used for preparing the high Nb-TiAl alloy with uniform distribution of alloy elements such as Nb and the like and other complex shapes such as a near-forming material and the like.
Description
Technical Field
The invention belongs to the technical field of alloy material preparation, and particularly relates to a preparation method of a high Nb-TiAl alloy material.
Background
The high Nb-TiAl alloy has excellent high-temperature performance, and the high Nb content can improve the oxidation resistance of the TiAl alloy at a temperature of over 700 ℃ and can also improve the service temperature of the TiAl alloy by 60-100 ℃. However, the problems of low room-temperature shaping and toughness, difficult processing and forming and the like of the TiAl alloy which are always existed in the high Nb-TiAl alloy are still not changed; in addition, the addition of high-melting-point refractory alloy such as alloy element Nb makes the smelting of the high-Nb-TiAl alloy more difficult, and the high-Nb-TiAl alloy ingot prepared by adopting the traditional smelting mode has the defects of segregation, shrinkage cavity and the like. The method for preparing the high Nb-TiAl alloy by using the powder metallurgy method is a good looking method, can change the problem of uneven Nb diffusion to a great extent, and can form plates and other structural members with complex shapes at the same time; however, powder metallurgy itself needs powder making, powder mixing or prealloying powder preparation, the earlier stage process is complex, the cost is high, and in addition, a large amount of oxygen is introduced in the powder making process, so that the oxygen content of the prepared plate is high, and the performance is not good.
Disclosure of Invention
The invention aims to solve the problems that high-melting-point refractory alloy such as alloy element Nb is not uniformly diffused, room-temperature plastic toughness of a high-Nb-TiAl alloy material is low and formability is poor when the high-Nb-TiAl alloy material is prepared, and provides a preparation method of the high-Nb-TiAl alloy material.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
a preparation method of a high Nb-TiAl alloy material comprises the steps of sputtering alloy element coating films on the surfaces of a Ti foil and an Al foil in a magnetron sputtering mode, and then alternately laminating the Ti foil and the Al foil subjected to magnetron sputtering coating films and performing multi-step hot pressing; the high Nb-TiAl alloy material consists of alloyed gamma-TiAl and alpha2-a TiAl phase.
Compared with the prior art, the invention has the beneficial effects that:
firstly, alloying is carried out on the surface of the foil by adopting magnetron sputtering, so that the types and the contents of alloy elements can be accurately controlled;
secondly, the high Nb-TiAl-based alloy material prepared by the method has the advantages of no pollution, good formability, compactness and no defect.
Drawings
FIG. 1 is a macroscopic topography of a foil after a film is coated on the surface of the foil by magnetron sputtering;
FIG. 2 is a microscopic topography of a foil after a film is plated on the surface of the foil by magnetron sputtering;
FIG. 3 is a schematic structural view of a plurality of periodic layers of a laminate material;
FIG. 4 is an electron back scattering image after the reaction of 550 ℃/30min/50MPa +650 ℃/4h/15MPa +865 ℃/3h/20 MPa;
FIG. 5 is an electron back scattering image after the reaction of 550 ℃/30min/50MPa +650 ℃/4h/15MPa +865 ℃/20h/20 MPa.
Detailed Description
The technical solution of the present invention is further described below with reference to the drawings and the embodiments, but the present invention is not limited thereto, and modifications or equivalent substitutions may be made to the technical solution of the present invention without departing from the spirit of the technical solution of the present invention, and the technical solution of the present invention is covered by the protection scope of the present invention.
The first embodiment is as follows: the embodiment describes a preparation method of a high Nb-TiAl alloy material, which comprises the steps of sputtering alloy element coating films on the surfaces of a Ti foil and an Al foil in a magnetron sputtering mode, and then alternately laminating the Ti foil and the Al foil subjected to magnetron sputtering coating films and carrying out multi-step hot pressing; the high Nb-TiAl alloy material consists of alloyed gamma-TiAl and alpha2The TiAl phase composition, the alloy elements are uniformly distributed in the material, and the prepared material is compact and flat and has no defects such as holes, cracks and the like.
The second embodiment is as follows: in a specific embodiment, the alloy element contains Nb, and the thickness of the plated film is 2 to 6 μm.
The third concrete implementation mode: in the second embodiment, the alloy element further includes one or more of Mo, Cr, W, B, and Y.
The fourth concrete implementation mode: according to any one of the first to third embodiments, the preparation method of the high Nb-TiAl alloy material specifically comprises the following steps:
firstly, preparing a pure Nb ingot or a Nb-based alloy ingot, and then preparing a high-purity Nb target or a Nb-based alloy target material;
secondly, sequentially using alcohol and acetone to respectively ultrasonically clean the Ti foil and the Al foil for 5-10 min to remove oil stains on the surface, then sequentially using 5-15 vol.% HF and 5-15 vol.% NaOH solution to clean the surfaces of the Ti foil and the Al foil to remove oxide skins on the surfaces, and finally ultrasonically cleaning the surfaces for 2-5 min by using the alcohol (2000W), and blowing the surfaces for later use by using a blower;
thirdly, respectively carrying out magnetron sputtering plating on the surfaces of the Ti foil and the Al foil obtained in the second step to form Nb or Nb alloy films, and vacuumizing to 1 × 10 before plating-3Introducing Ar gas during film coating to maintain the pressure to 1-4 Pa, controlling the current to 2-3A, controlling the sputtering power to 500-600W and controlling the film coating time to 5-40 h; the thickness of the sputtered alloy element can be controlled by controlling the magnetron sputtering time, so that the content of the alloy element is controlled; when the film is plated by magnetron sputtering, plating a film on one surface or plating a film on two surfaces of the foil; the Ti foil and the Al foil are 5-150 cm in length and 5-35 cm in width. The chemical components, the content of alloy elements and the mechanical property of the final high Nb-TiAl alloy material can be changed by adjusting the thicknesses of the Ti foil, the Al foil and the alloy elements.
Alternately laminating the Ti foil and the Al foil subjected to magnetron sputtering, coating the outermost two layers of the laminated layers with a graphite paper, and fixing the laminated layers by using a steel wire with the diameter of 0.1-0.2 mm to obtain a high Nb-TiAl alloy material prefabricated body; in the step, the graphite paper and the steel wire are matched for use, so that the cross sections of all foils are the same in the process of die filling and hot pressing of the laminated material, and the laminated material is easy to form; the thickness of the lamination can be adjusted from one layer to tens of layers; said one layer is made of a Ti plus an Al foil, i.e./Ti-Al/Ti-Al/… …/Ti-Al/Ti-Al/;
fifthly, the prefabricated body is placed into a graphite mould and then is placed into a vacuum hot-pressing furnace, and the vacuum hot-pressing furnace is vacuumized to 1 multiplied by 10-2Keeping the temperature at 520-580 ℃ for 10-60 min under Pa, applying 40-80 MPa of pressure, then heating to 600-750 ℃, keeping the temperature for 4-10 h, applying 0-30 MPa of pressure to obtain Nb-TiAl with a periodic structure3-Ti-A layered material of Nb; the graphite mould can be in a cuboid shape or other complex shapes, so that the aim of forming a plate or a complex structural part is fulfilled;
sixthly, the periodic structure obtained in the fifth step is Nb-TiAl3The layered material of-Ti-Nb is subjected to heat preservation for 10-30 h at 800-880 ℃, and pressure of 30-50 MPa is applied to obtain a layered material with a periodic structure of Nb-Ti3Al-TiAl-Nb layer structure material;
seventhly, the periodic structure obtained in the step six is Nb-Ti3Heating the Al-TiAl-Nb laminated structure material to 1200-1400 ℃, preserving the heat for 10-120 min, and applying 40-80 MPa pressure to obtain the high Nb-TiAl alloy material with different structures such as a two-state structure, a fully lamellar structure, a nearly fully lamellar structure and an equiaxial structure. The structure and the grain size of the material can be controlled by the high temperature and the heat preservation time, so that the material meeting different performance requirements can be obtained.
The fifth concrete implementation mode: in the second step of the method for preparing a high Nb-TiAl alloy material according to the fourth embodiment, the Ti foil is TC4 or TA1, and the thickness is 20 to 100 μm; the Al foil is pure Al foil, and the thickness of the Al foil is 10-100 mu m; the total thickness ratio of the Ti foil to the Al foil is 1.06-1.17: 1.
the sixth specific implementation mode: in the third step, the surfaces of the Ti foil and the Al foil obtained in the second step are respectively plated with Nb or Nb alloy films by magnetron sputtering, and before the plating, the surfaces are vacuumized to 1 × 10-3In the following, Ar gas is introduced to maintain the pressure to 2-3 Pa, the current is 2-2.5A, the sputtering power is 500-550W, and the coating time is 10-15 h.
The seventh embodiment: in the fourth step of the preparation method of the high Nb-TiAl alloy material according to the fourth embodiment, in the high Nb-TiAl alloy, an atomic ratio of Ti to Al is 45 to 50: 45-50.
The specific implementation mode is eight: in a fifth step of the method for preparing a high Nb-TiAl alloy material according to the fourth specific embodiment, the preform is placed in a graphite mold, and then placed in a vacuum autoclave, and the vacuum autoclave is evacuated to 1 × 10-2Keeping the temperature at 520-550 ℃ for 30-60 min under Pa, applying pressure of 60-80 MPa, then heating to 600-660 ℃, keeping the temperature for 8-10 h, applying pressure of 10-20 MPa, and obtaining Nb-TiAl with a periodic structure3-a layered material of Ti-Nb.
The specific implementation method nine: in a fifth step of the method for preparing a high Nb-TiAl alloy material according to the fourth specific embodiment, the preform is placed in a graphite mold, and then placed in a vacuum autoclave, and the vacuum autoclave is evacuated to 1 × 10-2Keeping the temperature below Pa at 550-580 ℃ for 10-30 min, applying 40-60 MPa pressure, then heating to 660-750 ℃, keeping the temperature for 4-6 h, and obtaining Nb-TiAl with a periodic structure3-a layered material of Ti-Nb.
The detailed implementation mode is ten: in a sixth step of the method for preparing a high Nb-TiAl alloy material according to the fourth embodiment, the periodic structure obtained in the fifth step is Nb-TiAl3The layered material of-Ti-Nb is subjected to heat preservation for 10-20 h at 860-880 ℃, and pressure of 30-40 MPa is applied to obtain the layered material with the periodic structure of Nb-Ti3Al-TiAl-Nb layer structure material.
The invention firstly adopts magnetron sputtering to coat a film on the surface of a foil material and combines vacuum hot-pressing sintering to prepare various complex structural members with curved surfaces, such as high Nb-TiAl-based alloy materials, corrugated plates and the like. The invention can accurately control the variety and content of the alloy elements by coating the film on the surface of the foil for alloying. The preparation method has no pollution, good formability and compact material without defects.
The method for preparing the Nb or Nb-based alloy ingot is not limited, and one or more of electron beam melting, plasma induction composite melting, electric arc melting and the like can be jointly used, so that the prepared target ingot is uniform in components and free of segregation. When the Nb or Nb-based alloy ingot is prepared, one or a combination of several methods in the modes of hot rolling, cold rolling, forging and the like can be adopted to prepare the target material which has high purity and meets the requirements of magnetron sputtering on size.
In the present invention, when cleaning Ti foil and Al foil with larger sizes, the diameters can be determined first
And (3) rolling up the Ti foil or the Al foil, and then putting the rolled Ti foil or Al foil into the cylindrical ceramic pot for cleaning to remove the oxide skin on the surface. In the invention, magnetron sputtering adopts a balanced target source, and the target material is a square target material and can be carried out by hot sputtering or cold sputtering.
Example 1:
preparing a pure Nb ingot by an electron beam melting method, and then preparing a high-purity Nb target by a rolling method, wherein the Nb target has the size of length multiplied by width multiplied by height which is 420mm multiplied by 70mm multiplied by 6 mm;
secondly, sequentially using alcohol and acetone to respectively ultrasonically clean the Ti foil and the Al foil for 5min (2000W), removing oil stains on the surface, then respectively cleaning the surfaces of the Ti foil and the Al foil by using 10 vol.% of HF solution and 10 vol.% of NaOH solution, removing oxide scales on the surfaces, finally ultrasonically cleaning the surfaces for 5min by using alcohol (2000W), and drying the surfaces for later use by using a blower; wherein the thickness of the Ti foil is 20 μm, the thickness of the Al foil is 18.5 μm, the length of the Ti foil and the Al foil is 135cm, and the width of the Ti foil and the Al foil is 8 cm;
thirdly, plating Nb or Nb alloy films on the washed Ti foil and Al foil by direct current magnetron sputtering respectively, and vacuumizing to 1 × 10 before plating-3And then, adopting a room-temperature sputtering mode, introducing Ar gas to maintain the pressure to 2Pa during film coating, controlling the current to be 2.02A, the sputtering power to be about 550W and the film coating time to be about 10h, and adopting a foil single-side film coating with the film coating thickness of 2-4 microns.
Cutting the Ti foil and the Al foil subjected to magnetron sputtering into proper sizes, then alternately laminating, coating the outermost two layers of the laminated layers with the Ti foil, then coating the outside with a layer of graphite paper, and fixing the laminated layers by using a 0.15mm steel wire to prepare a high Nb-TiAl alloy material prefabricated body;
fifthly, the prefabricated body is placed into a graphite mould and then is placed into a vacuum hot-pressing furnace, and the vacuum hot-pressing furnace is vacuumized to 1 multiplied by 10-2Keeping the temperature below Pa at 520-580 ℃ for 10-60 min, applying 40-80 MPa of pressure, then heating to 635 ℃, keeping the temperature for 7h, applying 10MPa of pressure to obtain Nb-TiAl with a periodic structure3-a layered material of Ti-Nb;
sixthly, the periodic structure obtained in the fifth step is Nb-TiAl3-Ti-Nb layered material, preserving heat at 865 ℃ for 20h, applying 40MPa pressure to obtain a periodic structure of Nb-Ti3Al-TiAl-Nb layer structure material;
seventhly, the periodic structure obtained in the step six is Nb-Ti3Heating the Al-TiAl-Nb laminated structure material to 1340 ℃, preserving the temperature for 20min, and applying 50MPa pressure to obtain the fully lamellar high Nb-TiAl alloy material.
Fig. 1 is a macroscopic surface topography of the Ti foil plated with the Nb film by magnetron sputtering in step three of this embodiment, and it can be seen that the surface of the foil plated with the Nb film is flat and smooth. Fig. 2 is a scanning electron microscope image of the foil surface plated with the Nb film in step three of this example, and it can be seen that Nb atoms are uniformly distributed on the foil surface, and the atom sizes are substantially uniform. The structure of the preform in the fourth step is shown in fig. 3, which shows the stacking sequence of the high Nb-TiAl alloy layered composite material and the schematic view of the preform prepared by using the graphite paper-coated steel wire fixing foil. The scanning electron microscopy-backscattered electron imaging mode is utilized to detect the layered material after heat preservation for 3 hours in the sixth test step, the result is shown in figure 4, and the material mainly comprises Nb, gamma-TiAl and Ti3Al and TiAl2The material has no obvious defects such as holes, cracks and the like, and the layer interface connection is better. FIG. 5 is a scanning electron microscopy-backscattered electron imaging mode used for detecting the microstructure of the material after 20h reaction in the sixth test step, and it can be seen that the material is formed by Nb, gamma-TiAl, Ti3And Al phase composition.
Claims (9)
1. A preparation method of a high Nb-TiAl alloy material is characterized by comprising the following steps: sputtering alloy element coating films on the surfaces of the Ti foil and the Al foil in a magnetron sputtering mode, and alternately laminating and carrying out multi-step hot pressing on the Ti foil and the Al foil subjected to magnetron sputtering coating; the high Nb-TiAl alloy material consists of alloyed gamma-TiAl and alpha2-a TiAl phase;
the preparation method comprises the following steps:
firstly, preparing a pure Nb ingot or a Nb-based alloy ingot, and then preparing a Nb target or a Nb-based alloy target material;
secondly, ultrasonically cleaning the Ti foil and the Al foil for 5-10 min by using alcohol and acetone in sequence, removing oil stains on the surfaces of the Ti foil and the Al foil, then sequentially cleaning the surfaces of the Ti foil and the Al foil by using 5-15 vol.% of HF and 5-15 vol.% of NaOH solution, removing oxide skins on the surfaces of the Ti foil and the Al foil, and finally ultrasonically cleaning the Ti foil and the Al foil for 2-5 min by using alcohol and blow-drying the Ti foil and the Al foil for later use;
thirdly, respectively carrying out magnetron sputtering plating on the surfaces of the Ti foil and the Al foil obtained in the second step to form Nb or Nb alloy films, and vacuumizing to 1 × 10 before plating-3Introducing Ar gas during film coating to maintain the pressure to 1-4 Pa, controlling the current to 2-3A, controlling the sputtering power to 500-600W and controlling the film coating time to 5-40 h;
alternately laminating the Ti foil and the Al foil subjected to magnetron sputtering, coating the outermost two layers of the laminated layers with graphite paper, and fixing the laminated layers by using a steel wire to obtain a high Nb-TiAl alloy material prefabricated body;
fifthly, the prefabricated body is placed into a graphite mould and then is placed into a vacuum hot-pressing furnace, and the vacuum hot-pressing furnace is vacuumized to 1 multiplied by 10-2Keeping the temperature at 520-580 ℃ for 10-60 min under Pa, applying 40-80 MPa of pressure, then heating to 600-750 ℃, keeping the temperature for 4-10 h, applying 0-30 MPa of pressure to obtain Nb-TiAl with a periodic structure3-a layered material of Ti-Nb;
sixthly, the periodic structure obtained in the fifth step is Nb-TiAl3The layered material of-Ti-Nb is subjected to heat preservation for 10-30 h at 800-880 ℃, and pressure of 30-50 MPa is applied to obtain a layered material with a periodic structure of Nb-Ti3Al-TiAl-Nb layer structure material;
seventhly, the periodic structure obtained in the step six is Nb-Ti3Heating the Al-TiAl-Nb laminated structure material to 1200-1400 ℃, preserving the heat for 10-120 min, and applying 40-80 MPa pressure to obtain the high-Nb-TiAl alloy material.
2. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: the alloy element contains Nb, and the thickness of the plated film is 2-6 μm.
3. The method for preparing the high Nb-TiAl alloy material according to claim 2, wherein the method comprises the following steps: the alloy element also contains one or more of Mo, Cr, W, B and Y.
4. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: in the second step, the Ti foil is TC4 or TA1, and the thickness is 20-100 mu m; the Al foil is pure Al foil, and the thickness of the Al foil is 10-100 mu m; the total thickness ratio of the Ti foil to the Al foil is 1.06-1.17: 1.
5. the method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: in the third step, the surfaces of the Ti foil and the Al foil obtained in the second step are respectively plated with Nb or Nb alloy films by magnetron sputtering, and the surfaces are vacuumized to 1 multiplied by 10 before film plating-3In the following, Ar gas is introduced to maintain the pressure to 2-3 Pa, the current is 2-2.5A, the sputtering power is 500-550W, and the coating time is 10-15 h.
6. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: in the fourth step, in the high Nb-TiAl alloy, the atomic ratio of Ti to Al is 45-50: 45-50.
7. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: step five, the prefabricated body is put into a graphite mould and then put into a vacuum hot-pressing furnace, and the vacuum hot-pressing furnace is vacuumized to 1 multiplied by 10-2Keeping the temperature at 520-550 ℃ for 30-60 min under Pa, applying pressure of 60-80 MPa, then heating to 600-660 ℃, keeping the temperature for 8-10 h, applying pressure of 10-20 MPa, and obtaining Nb-TiAl with a periodic structure3-a layered material of Ti-Nb.
8. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: step five, the prefabricated body is put into a graphite mould and then put into a vacuum hot-pressing furnace, and the vacuum hot-pressing furnace is vacuumized to 1 multiplied by 10-2Keeping the temperature below Pa at 550-580 ℃ for 10-30 min, applying 40-60 MPa pressure, heating to 660-750 ℃, keeping the temperature for 4-6 h, and obtaining the productThe phase structure is Nb-TiAl3-a layered material of Ti-Nb.
9. The method for preparing the high Nb-TiAl alloy material according to claim 1, wherein the method comprises the following steps: in the sixth step, the periodic structure obtained in the fifth step is Nb-TiAl3The layered material of-Ti-Nb is subjected to heat preservation for 10-20 h at 860-880 ℃, and pressure of 30-40 MPa is applied to obtain the layered material with the periodic structure of Nb-Ti3Al-TiAl-Nb layer structure material.
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| CN115319268B (en) * | 2022-08-22 | 2024-06-25 | 中国航发北京航空材料研究院 | For TiAl alloy/Ti2AlNb alloy or Ti3Intermediate layer for Al-based alloy connection and diffusion welding method |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102776413A (en) * | 2012-07-27 | 2012-11-14 | 中国航空工业集团公司北京航空材料研究院 | Method for preparing novel titanium base high temperature alloys |
| CN105584151A (en) * | 2015-12-12 | 2016-05-18 | 苏州锂盾储能材料技术有限公司 | High-barrier and high-acid-resisting aluminum-plastic film and preparation method thereof |
| CN107900352A (en) * | 2017-12-19 | 2018-04-13 | 哈尔滨理工大学 | A kind of stratiform high niobium containing titanium aluminium alloy composite panel and preparation method thereof |
| CN108749210A (en) * | 2018-04-23 | 2018-11-06 | 深圳万佳互动科技有限公司 | A kind of magnesium alloy composite board |
-
2019
- 2019-07-15 CN CN201910637522.5A patent/CN110239194B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102776413A (en) * | 2012-07-27 | 2012-11-14 | 中国航空工业集团公司北京航空材料研究院 | Method for preparing novel titanium base high temperature alloys |
| CN105584151A (en) * | 2015-12-12 | 2016-05-18 | 苏州锂盾储能材料技术有限公司 | High-barrier and high-acid-resisting aluminum-plastic film and preparation method thereof |
| CN107900352A (en) * | 2017-12-19 | 2018-04-13 | 哈尔滨理工大学 | A kind of stratiform high niobium containing titanium aluminium alloy composite panel and preparation method thereof |
| CN108749210A (en) * | 2018-04-23 | 2018-11-06 | 深圳万佳互动科技有限公司 | A kind of magnesium alloy composite board |
Non-Patent Citations (1)
| Title |
|---|
| 箔-箔法制备TiAlNb三元金属间化合物合金;赵业青 等;《中国有色金属学报》;20101031;第20卷(第227期);1060-1063页 * |
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