CN110068951A - Picture element light shield, the method for producing display and display - Google Patents
Picture element light shield, the method for producing display and display Download PDFInfo
- Publication number
- CN110068951A CN110068951A CN201910227700.7A CN201910227700A CN110068951A CN 110068951 A CN110068951 A CN 110068951A CN 201910227700 A CN201910227700 A CN 201910227700A CN 110068951 A CN110068951 A CN 110068951A
- Authority
- CN
- China
- Prior art keywords
- light
- light shield
- picture element
- display
- transmission area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The embodiment of the present invention provides a kind of picture element light shield, method and display for producing display, belongs to field of display technology.The picture element light shield includes: principal light transmission area, for penetrating light；And auxiliary light transmission area, it is arranged on the corner in the principal light transmission area, for slowing down the light in the diffraction of the corner.It is thereby achieved that improving the penetrance of light.
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of picture element light shield, the method for producing display and
Display.
Background technique
The promotion of penetrance is always the important topic of display industry, for raising to penetrate rate score even up to black
Ancient unit of weight, equal to 1/24 liang must compared with stage.Since TFT-LCD belongs to passive display element, lamp source of arranging in pairs or groups is needed in use process, can just make function
It runs well.And the penetrance for promoting TFT-LCD can be effectively reduced energy consumption.In the pixel design of current TFT-LCD,
General corner cases can be not sharp keen shape due to the relationship of light shield layer BM (photoresist), but arc-shaped, this part can reduce light
Penetrate.
Summary of the invention
The object of the present invention is to provide a kind of picture element light shield, the method for producing display and displays, can realize
The circular arc situation for improving shading once corner, improves the penetrance of light.
To achieve the goals above, one aspect of the present invention provides a kind of picture element light shield, which includes: main saturating
Light area, for penetrating light；And auxiliary light transmission area, it is arranged on the corner in the principal light transmission area, for slowing down the light
In the diffraction of the corner.
Optionally, the shape in the auxiliary light transmission area include it is following at least one: rectangle, square and triangle.
Optionally, the size in the auxiliary light transmission area is greater than or equal to 0.5um and is less than or equal to 1.0um.
In addition, another aspect of the present invention also provides a kind of method for producing display, this method is based on above-mentioned
Light shield layer in display described in picture element light shield manufacture.
In addition, another aspect of the present invention also provides a kind of display, which includes based on above-mentioned picture element light shield
The light shield layer of production.
Through the above technical solutions, the auxiliary light transmission area of corner, principal light transmission area, which is arranged in, can slow down through principal light transmission area
Light corner diffraction phenomena so that light is more concentrated in corner, so that corresponding with the corner in principal light transmission area
The shape of light shield layer be more bonded with the turning so that because light diffraction caused by the arc-shaped of light shield layer to improve be relatively sharp
Shape, reduces the occlusion area of light shield layer, to improve penetrance of the light in the display of the application light shield layer.
Other features and advantages of the present invention will the following detailed description will be given in the detailed implementation section.
Detailed description of the invention
Attached drawing is to further understand for providing to the embodiment of the present invention, and constitute part of specification, under
The specific embodiment in face is used to explain the present invention embodiment together, but does not constitute the limitation to the embodiment of the present invention.Attached
In figure:
Fig. 1 is the example of picture element mask set figure and actual product figure；
Fig. 2 is the example of the picture element mask set figure that one embodiment of the invention provides and actual product figure；
Fig. 3 is the scale diagrams of picture element light shield shown in Fig. 2.
Description of symbols
1 principal light transmission area, 2 auxiliary light transmission area
3 turnings
Specific embodiment
It is described in detail below in conjunction with specific embodiment of the attached drawing to the embodiment of the present invention.It should be understood that this
Locate described specific embodiment and be merely to illustrate and explain the present invention embodiment, is not intended to restrict the invention embodiment.
Fig. 1 is the example of picture element mask set figure and actual product figure, wherein Fig. 1 a is picture element mask set figure, Fig. 1 b
For CF (Color Filter, colored filter) actual product figure, light is irradiated to the light shield layer in CF after picture element light shield, warp
Developing process is added in overexposure, forms CF actual product figure.As shown in Figure 1a, the part of picture element light shield is broadly divided into transparent area
And alternatively non-transparent district, wherein black portions are transparent area, and white portion is alternatively non-transparent district.BM (Black used in general CF
Matrix, black matrix") photoresist be minus photoresist, that is, figure is remained after exposure and imaging technique, such as Fig. 1 b institute
Show, grey parts are black light shield layer, which is BM photoresist.As shown in Figure 1 b, from the screening in actual CF product
From the point of view of photosphere BM, turning all on-right angles, and inclined arc angle, as shown in the circled in Fig. 1 b, main cause is optical diffraction
Length or range when problem or picture element mask set is too small, cause practical photoresist after being exposed caused by.
The one aspect of the embodiment of the present invention provides a kind of picture element light shield.The picture element light shield includes that principal light transmission area and auxiliary are saturating
Light area.Wherein, principal light transmission area is for penetrating light；Auxiliary light transmission area is arranged on the corner in principal light transmission area, for slowing down light
In the diffraction of corner.Wherein, depending on quantity of the quantity in auxiliary light transmission area according to turning included in principal light transmission area.Its
In, the turning in principal light transmission area can be right angle, obtuse angle, acute angle or arc chord angle.
The auxiliary light transmission area that corner, principal light transmission area is arranged in can slow down light spreading out in corner through principal light transmission area
Penetrate phenomenon so that light is more concentrated in corner so that the shape of light shield layer corresponding with the corner in principal light transmission area with
The turning is more bonded so that because light diffraction caused by light shield layer arc-shaped improve be relatively sharp shape, reduce light shield layer
Occlusion area, thus improve light application the light shield layer display in penetrance.
Fig. 2 is the schematic diagram for the picture element light shield that one embodiment of the invention provides.As shown in Fig. 2, picture element light shield includes main saturating
Light area 1 and auxiliary light transmission area 2.Wherein, the shape in principal light transmission area 1 is identical as the shape of transparent area in Fig. 1 a, including turns everywhere
Angle, and each turning is right angle, as shown in the turning 3 in Fig. 1 a.Three corners in principal light transmission area 1 are provided with auxiliary
Transparent area 2.Corner of the auxiliary light transmission area 2 in principal light transmission area 1 increases the area of light transmission, reduces the diffraction in corner's light
Effect improves the light shield layer (BM photoresist) in practical CF product in its circular arc situation of corner, becomes so that light is more concentrated
More close to right angle, the light transmittance of CF product is improved, improves penetrance of the light in the display of the application CF product.
As shown in figure 2b, compared to shown in Fig. 1 b, light shield layer shown in Fig. 2 b is more close to right angle in corner.Wherein, lead to
The circled in comparison diagram 2b and the circled in Fig. 1 b are crossed it will be clear that light shield layer shown in Fig. 2 b is in corner
More it is close to right angle.In addition, it is necessary to explanation, in embodiments of the present invention, the light shield layer in CF product is not necessarily negative
Type photoresist is also possible to eurymeric photoresist.
Optionally, in embodiments of the present invention, the quantity in auxiliary light transmission area according to the turning in principal light transmission area quantity and
It is fixed.In the case where it includes one that auxiliary light transmission area, which only has, the shape in auxiliary light transmission area can be rectangle, square or three
It is angular.In the case where the quantity in auxiliary light transmission area is multiple, the shape in multiple auxiliary light transmission areas can be rectangle, pros
Shape or triangle are also possible to rectangle, any combination of squares and triangles.
Optionally, in embodiments of the present invention, the size in auxiliary light transmission area may be greater than or be equal to 0.5um and is less than
Or it is equal to 1.0um.As shown in figure 3, picture element light shield shown in Fig. 3 is identical as picture element light shield shown in Fig. 2 a, in the auxiliary of right angle
Transparent area scale is helped to be equal to 0.5um, the scale such as auxiliary light transmission area is too big, then will affect the line width size of light shield layer, may
Lead to light leakage or fracture.
In addition, another aspect of the present invention also provides a kind of method for producing display, this method is based on above-mentioned reality
Apply the light shield layer in picture element light shield manufacture display described in example.
In addition, another aspect of the present invention also provides a kind of display, which includes middle institute based on the above embodiment
The light shield layer for the picture element light shield manufacture stated.
The optional embodiment of the embodiment of the present invention is described in detail in conjunction with attached drawing above, still, the embodiment of the present invention is simultaneously
The detail being not limited in above embodiment can be to of the invention real in the range of the technology design of the embodiment of the present invention
The technical solution for applying example carries out a variety of simple variants, these simple variants belong to the protection scope of the embodiment of the present invention.
It is further to note that specific technical features described in the above specific embodiments, in not lance
In the case where shield, it can be combined in any appropriate way.In order to avoid unnecessary repetition, the embodiment of the present invention pair
No further explanation will be given for various combinations of possible ways.
In addition, any combination can also be carried out between a variety of different embodiments of the embodiment of the present invention, as long as it is not
The thought of the embodiment of the present invention is violated, equally should be considered as disclosure of that of the embodiment of the present invention.
Claims (5)
1. a kind of picture element light shield, which is characterized in that the picture element light shield includes:
Principal light transmission area, for penetrating light；And
Auxiliary light transmission area is arranged on the corner in the principal light transmission area, for slowing down the light in the diffraction of the corner.
2. picture element light shield according to claim 1, which is characterized in that the shape in the auxiliary light transmission area include it is following at least
One: rectangle, square and triangle.
3. picture element light shield according to claim 2, which is characterized in that the size in the auxiliary light transmission area is greater than or equal to
0.5um and be less than or equal to 1.0um.
4. a kind of method for producing display, which is characterized in that this method is based on of any of claims 1-3
Light shield layer in display described in picture element light shield manufacture.
5. a kind of display, which is characterized in that the display includes being based on picture element light shield of any of claims 1-3
The light shield layer of production.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2019100360762 | 2019-01-15 | ||
| CN201910036076 | 2019-01-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110068951A true CN110068951A (en) | 2019-07-30 |
Family
ID=67366638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910227700.7A Pending CN110068951A (en) | 2019-01-15 | 2019-03-25 | Picture element light shield, the method for producing display and display |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110068951A (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6033811A (en) * | 1998-01-21 | 2000-03-07 | Lg Semicon Co., Ltd. | Optical proximity correction mask for semiconductor device fabrication |
| US20030162103A1 (en) * | 2002-02-28 | 2003-08-28 | Katsuo Oshima | Mask pattern correction method |
| CN1633625A (en) * | 2001-12-26 | 2005-06-29 | 松下电器产业株式会社 | Photomask, method of producing it and pattern forming method using the photomask |
| US20070059609A1 (en) * | 2005-09-09 | 2007-03-15 | Hsin-Ping Wu | Optical proximity correction mask and method of fabricating color filter |
| CN1983027A (en) * | 2005-12-14 | 2007-06-20 | 东部电子股份有限公司 | Color filter mask layout |
| US20130163850A1 (en) * | 2011-12-27 | 2013-06-27 | United Microelectronics Corp. | Mask pattern and correcting method thereof |
| CN103869604A (en) * | 2012-12-10 | 2014-06-18 | 中芯国际集成电路制造(上海)有限公司 | Light shield and its designing method |
| KR101439082B1 (en) * | 2013-05-27 | 2014-09-12 | 한국과학기술원 | Photomask for manufacturing capping wafer for wafer level package and method of manufacturing capping wafer for wafer level package using the same |
| CN106200257A (en) * | 2016-07-13 | 2016-12-07 | 武汉华星光电技术有限公司 | A kind of light shield with exposure correction |
-
2019
- 2019-03-25 CN CN201910227700.7A patent/CN110068951A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6033811A (en) * | 1998-01-21 | 2000-03-07 | Lg Semicon Co., Ltd. | Optical proximity correction mask for semiconductor device fabrication |
| CN1633625A (en) * | 2001-12-26 | 2005-06-29 | 松下电器产业株式会社 | Photomask, method of producing it and pattern forming method using the photomask |
| US20030162103A1 (en) * | 2002-02-28 | 2003-08-28 | Katsuo Oshima | Mask pattern correction method |
| US20070059609A1 (en) * | 2005-09-09 | 2007-03-15 | Hsin-Ping Wu | Optical proximity correction mask and method of fabricating color filter |
| CN1983027A (en) * | 2005-12-14 | 2007-06-20 | 东部电子股份有限公司 | Color filter mask layout |
| US20130163850A1 (en) * | 2011-12-27 | 2013-06-27 | United Microelectronics Corp. | Mask pattern and correcting method thereof |
| CN103869604A (en) * | 2012-12-10 | 2014-06-18 | 中芯国际集成电路制造(上海)有限公司 | Light shield and its designing method |
| KR101439082B1 (en) * | 2013-05-27 | 2014-09-12 | 한국과학기술원 | Photomask for manufacturing capping wafer for wafer level package and method of manufacturing capping wafer for wafer level package using the same |
| CN106200257A (en) * | 2016-07-13 | 2016-12-07 | 武汉华星光电技术有限公司 | A kind of light shield with exposure correction |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190730 |
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| RJ01 | Rejection of invention patent application after publication |