CN118127475B - High-toughness bimetal band saw blade and preparation method thereof - Google Patents
High-toughness bimetal band saw blade and preparation method thereof Download PDFInfo
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- CN118127475B CN118127475B CN202410385262.8A CN202410385262A CN118127475B CN 118127475 B CN118127475 B CN 118127475B CN 202410385262 A CN202410385262 A CN 202410385262A CN 118127475 B CN118127475 B CN 118127475B
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- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 27
- 238000002791 soaking Methods 0.000 claims description 22
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- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/002—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working by rapid cooling or quenching; cooling agents used therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a bimetal band saw blade with high toughness and a preparation method thereof, wherein the preparation method comprises the following steps: ultrasonic cleaning is carried out on the surface of the band saw blade matrix, heat treatment is carried out on the band saw blade matrix after drying, and then sand blasting treatment, acid pickling treatment and passivation treatment are sequentially carried out on the surface of the band saw blade matrix after heat treatment; depositing a CrN bonding layer on the surface of the band saw blade matrix by adopting a magnetron sputtering process; depositing a CrAlN transition layer on the surface of the Cr transition layer by adopting a magnetron sputtering process; and depositing a CrAlMoN functional layer on the surface of the CrAlN transition layer by adopting a magnetron sputtering process. According to the invention, the band saw blade substrate is subjected to sand blasting, acid pickling and passivation treatment, so that residual compressive stress can be introduced to the surface of the band saw blade substrate, and the fatigue resistance of the band saw blade substrate can be improved.
Description
Technical Field
The invention belongs to the technical field of band saw blades, and relates to a bimetal band saw blade with high strength and toughness and a preparation method thereof.
Background
With the rapid development of manufacturing industry and mechanical processing industry in recent years, the variety and quantity of raw materials, particularly sawing materials, are rapidly increased, and the sawing materials are more and more urgently required to realize mass, rapid and high-precision in the industry, so that sawing cutters are required to have the characteristics of high efficiency, stability, high wear resistance, long service life and low cost.
The saw cutting mode commonly has two types of circular saw and band saw, and the band saw adopts the saw blade to use with the band sawing machine is matchd, is applicable to almost all types of metal continuous saw cuts, like: structural steel, weathering steel, alloy steel, bearing steel, stainless steel, heat resistant steel, aluminum alloy, mold steel, and the like. Band sawing machine and band saw blade are born in the year 30 of the world 19, and its action form is that the metal is cut with a ring saw blade on band sawing machine owner, follow driving wheel, originally uses the carbon tool steel that tooth point and back of the saw material are the same to cut, and production efficiency is lower, and the phenomenon of tooth point easy emergence jumping tooth or wearability are not enough to the metallic material that can cut is very limited.
The advent of the bimetal saw blade has opened a new era of the cutting tool industry, and the bimetal saw blade is manufactured by welding high-speed steel and alloy steel and performing a series of processes such as machining, heat treatment and the like, so that the problems of insufficient wear resistance of tooth tips, low sawing efficiency and the like are successfully solved. The band saw blade has the advantages of energy conservation, high efficiency, sharpness, wide application and the like, and has obvious advantages compared with the traditional circular saw and bow saw in the aspects of energy conservation, environmental protection, cutting efficiency and the like, so that the band saw blade rapidly replaces the traditional band saw blade cutting mode.
The bimetal saw blade is formed by compounding a back material and a tooth material, wherein the back material is made of steel with high strength, high toughness and high fatigue resistance. The backing material is made of a material with a lower yield ratio, so that the processing is easier, and the cost is reduced. In order to ensure the high hardness, high wear resistance and high red hardness of the tooth material, the back can only be suitable for the heat treatment process parameters of the tooth, so that the research and development of the back material are always important subjects for the development of the bimetallic saw blade.
In recent years, with the development of high and new technologies such as aerospace, a great amount of high-hardness and high-temperature-resistant materials are applied, and the bimetallic band saw blade is required to have more excellent cutting performance, but the hardness and toughness of the current band saw blade still cannot meet ideal use requirements, so that development of a bimetallic band saw blade with high strength and high toughness is highly demanded.
Disclosure of Invention
Aiming at the defects existing in the prior art, the invention aims to provide a bimetallic band saw blade with high toughness and a preparation method thereof, the invention can introduce residual compressive stress on the surface of the band saw blade matrix by carrying out sand blasting, acid washing and passivation treatment on the band saw blade matrix, the fatigue resistance of the band saw blade matrix can be improved, and the bimetal band saw blade with high strength and high toughness is prepared by depositing the CrN bonding layer, the CrAlN transition layer and the CrAlMoN functional layer on the surface of the band saw blade matrix.
To achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a method of manufacturing a high-toughness bi-metallic band saw blade, the method comprising:
ultrasonic cleaning is carried out on the surface of a band saw blade matrix, heat treatment is carried out on the band saw blade matrix after drying, and then sand blasting treatment, acid pickling treatment and passivation treatment are sequentially carried out on the surface of the band saw blade matrix after heat treatment;
(II) depositing a CrN bonding layer on the surface of the band saw blade matrix by adopting a magnetron sputtering process;
(III) depositing a CrAlN transition layer on the surface of the Cr transition layer by adopting a magnetron sputtering process;
And (IV) depositing a CrAlMoN functional layer on the surface of the CrAlN transition layer by adopting a magnetron sputtering process.
According to the invention, the band saw blade substrate is subjected to sand blasting, acid pickling and passivation treatment, so that residual compressive stress can be introduced to the surface of the band saw blade substrate, and the fatigue resistance of the band saw blade substrate can be improved. According to the invention, the CrN bonding layer is deposited on the surface of the band saw blade matrix, so that the film base bonding strength of the composite coating can be remarkably improved, the abrupt interface between the band saw blade matrix and the CrAlN transition layer can be eliminated, and the stress generated by the non-integration or different thermal expansion coefficients between the interfaces can be relieved; then, the CrAlN transition layer is continuously deposited on the surface of the CrN bonding layer, so that cracks deflect and are passivated at the interface, and the strength and toughness of the bimetallic strip saw blade can be remarkably improved; finally, a CrAlMoN functional layer is continuously deposited on the surface of the CrAlN transition layer, and under the room temperature environment, the CrAlMoN functional layer forms MoO 3 with self-lubricating function and low shear modulus in the friction process, has obvious lubricating antifriction effect, and can obviously improve the wear resistance of the bimetallic band saw blade. The preparation method provided by the invention can be used for preparing the bimetal band saw blade with high strength and high toughness.
In a preferred embodiment of the present invention, in the step (i), the ultrasonic power used for the ultrasonic cleaning is 300 to 400W, for example, 300W, 310W, 320W, 330W, 340W, 350W, 360W, 370W, 380W, 390W or 400W, but the present invention is not limited to the above-mentioned values, and other values not shown in the above-mentioned value range are equally applicable.
In some alternative examples, the time of the ultrasonic cleaning is 40-50 min, for example, 40min, 41min, 42min, 43min, 44min, 45min, 46min, 47min, 48min, 49min or 50min, but the time is not limited to the recited values, and other non-recited values in the range of the values are also applicable.
In some alternative examples, the ultrasonic cleaning employs a cleaning medium that is absolute ethanol.
As a preferred embodiment of the present invention, in the step (i), the heat treatment process includes:
(1) Quenching: the band saw blade substrate is heated to 850-950 ℃, for example, 850 ℃, 860 ℃, 870 ℃, 880 ℃, 890 ℃, 900 ℃, 910 ℃, 920 ℃, 930 ℃, 940 ℃ or 950 ℃; the temperature is maintained for 1-2min, such as 1.0min, 1.1min, 1.2min, 1.3min, 1.4min, 1.5min, 1.6min, 1.7min, 1.8min, 1.9min or 2.0min; oil quenching is then carried out at a cooling rate of 80-100 ℃ per second until the cooling is at room temperature, for example, 80 ℃/s, 82 ℃/s, 84 ℃/s, 86 ℃/s, 88 ℃/s, 90 ℃/s, 92 ℃/s, 94 ℃/s, 96 ℃/s, 98 ℃/s or 100 ℃/s, but not limited to the recited values, and other non-recited values within the range of values are equally applicable;
(2) Tempering: the band saw blade substrate is continuously heated to 520-600 ℃, such as 520 ℃, 530 ℃, 540 ℃, 550 ℃, 560 ℃, 570 ℃, 580 ℃, 590 ℃ or 600 ℃, kept at the temperature for 3-5 min, and cooled to room temperature to finish tempering operation, such as 3.0min, 3.2min, 3.4min, 3.6min, 3.8min, 4.0min, 4.2min, 4.4min, 4.6min, 4.8min or 5.0min, but the band saw blade substrate is not limited to the listed values, and other non-listed values in the range of the values are applicable.
(3) The tempering operation of step (2) is repeated 3 to 6 times, for example, 3 times, 4 times, 5 times or 6 times, but is not limited to the recited values, and other non-recited values within the range are equally applicable.
The invention particularly limits the quenching temperature of the band saw blade matrix to 850-950 ℃, the band saw blade matrix obtained after quenching within the temperature range has better comprehensive mechanical properties, and the alloy elements such as Nb, ni, mn, V, mo, cr in the band saw blade matrix gradually dissolve into solid solution along with the increase of the quenching temperature, and the higher the quenching temperature is, the more the alloy element dissolution amount is.
According to the invention, after the band saw blade matrix is quenched, tempering is carried out, alloy elements can be fully dissolved and diffused for recombination, dispersion carbides separated out from supersaturated solid solutions form dispersion strengthening, and the alloy carbides are dispersed and distributed in the band saw blade matrix, so that dislocation movement can be prevented, the hardness and strength of the band saw blade matrix are improved, and a dispersion hardening effect is generated. The invention particularly limits the tempering temperature of the band saw blade matrix to 520-600 ℃, when the tempering temperature exceeds 600 ℃, the size of precipitated granular carbide is overlarge, aggregation and growth are easy to occur, the quantity of carbide is reduced, and various mechanical properties of the band saw blade matrix are further reduced.
In a preferred embodiment of the present invention, in step (i), the sand material used for the sand blasting treatment includes any one or a combination of at least two of brown corundum, garnet, white corundum, glass beads and silicon carbide.
In some alternative examples, the particle size of the sand is 100-120 mesh, for example, 100 mesh, 102 mesh, 104 mesh, 106 mesh, 108 mesh, 110 mesh, 112 mesh, 114 mesh, 116 mesh, 118 mesh or 120 mesh, but not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the blasting pressure of the blasting treatment is 0.6-0.8 MPa, for example, 0.6MPa, 0.62MPa, 0.64MPa, 0.66MPa, 0.68MPa, 0.7MPa, 0.72MPa, 0.74MPa, 0.76MPa, 0.78MPa or 0.8MPa, but not limited to the values listed, and other values not listed in the range of values are equally applicable.
In some alternative examples, the time of the sand blasting is 50-60 min, for example, 50min, 51min, 52min, 53min, 54min, 55min, 56min, 57min, 58min, 59min or 60min, but the present invention is not limited to the recited values, and other non-recited values within the range of the values are also applicable.
In some alternative examples, the spraying direction of the spraying nozzle of the spraying device used in the sand blasting treatment is kept perpendicular to the surface of the band saw blade substrate, and the perpendicular distance between the spraying nozzle and the surface of the band saw blade substrate is 20-30 cm, for example, 20cm, 21cm, 22cm, 23cm, 24cm, 25cm, 26cm, 27cm, 28cm, 29cm or 30cm, but the spraying direction is not limited to the listed values, and other non-listed values in the range of the values are equally applicable.
In some alternative examples, the pickling process includes: soaking the band saw blade matrix in the pickling solution for 20-30 min, for example, 20min, 21min, 22min, 23min, 24min, 25min, 26min, 27min, 28min, 29min or 30min; then taking out, cleaning and drying; the pickling solution comprises 10-15 parts by weight of nitric acid, 2-8 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the nitric acid can be 10 parts by weight, 10.5 parts by weight, 11 parts by weight, 11.5 parts by weight, 12 parts by weight, 12.5 parts by weight, 13 parts by weight, 13.5 parts by weight, 14 parts by weight, 14.5 parts by weight or 15 parts by weight, and the hydrofluoric acid can be 2.0 parts by weight, 2.5 parts by weight, 3.0 parts by weight, 3.5 parts by weight, 4.0 parts by weight, 4.5 parts by weight, 5.0 parts by weight, 5.5 parts by weight, 6.0 parts by weight, 6.5 parts by weight, 7.0 parts by weight, 7.5 parts by weight or 8.0 parts by weight; the temperature of the pickling solution may be 60 to 70 ℃, for example, 60 ℃, 61 ℃, 62 ℃, 63 ℃, 64 ℃, 65 ℃, 66 ℃, 67 ℃, 68 ℃, 69 ℃, or 70 ℃, but the pickling solution is not limited to the above-mentioned values, and other values not mentioned in the above-mentioned range are applicable.
In some alternative examples, the passivation process includes: soaking the band saw blade matrix in the passivation solution for 20-30 min, for example, 20min, 21min, 22min, 23min, 24min, 25min, 26min, 27min, 28min, 29min or 30min; then taking out, cleaning and drying; wherein the passivation solution consists of 5-10 parts by weight of citric acid, 2-5 parts by weight of oxalic acid, 2-5 parts by weight of phosphoric acid, 5-10 parts by weight of cationic surfactant, 10-20 parts by weight of sodium molybdate and 10-15 parts by weight of deionized water, wherein the weight parts of citric acid can be 5.0 parts, 5.5 parts, 6.0 parts, 6.5 parts, 7.0 parts, 7.5 parts, 8.0 parts, 8.5 parts, 9.0 parts, 9.5 parts or 10.0 parts, the weight parts of oxalic acid can be 2.0 parts, 2.5 parts, 3.0 parts, 3.5 parts, 4.0 parts, 4.5 parts or 5.0 parts, the weight part of phosphoric acid can be 2.0 parts, 2.5 parts, 3.0 parts, 3.5 parts, 4.0 parts, 4.5 parts or 5.0 parts, the weight part of cationic surfactant can be 5.0 parts, 5.5 parts, 6.0 parts, 6.5 parts, 7.0 parts, 7.5 parts, 8.0 parts, 8.5 parts, 9.0 parts, 9.5 parts or 10.0 parts, the weight part of sodium molybdate can be 10 parts, 11 parts, 12 parts, 13 parts, 14 parts, 15 parts, 16 parts, 17 parts, 18 parts, 19 parts or 20 parts, and the weight part of deionized water can be 10 parts, 10.5 parts, 11 parts, 11.5 parts, 12 parts, 12.5 parts, 13 parts, 13.5 parts, 14 parts, 14.5 parts or 15 parts; the temperature of the passivation solution may be 40 to 50 ℃, for example, 40 ℃,41 ℃,42 ℃,43 ℃,44 ℃, 45 ℃, 46 ℃, 47 ℃, 48 ℃, 49 ℃, or 50 ℃, but is not limited to the above-mentioned values, and other values not mentioned in the above-mentioned range are applicable.
As a preferred technical solution of the present invention, in the step (ii), the operation steps of the magnetron sputtering process of the CrN bonding layer include:
fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; and applying bias to the band saw blade substrate, applying sputtering current to the Cr target, and depositing the CrN bonding layer on the surface of the band saw blade substrate.
In some alternative examples, the vacuum degree in the cavity of the vacuum plating apparatus is 10 -5~10-4 Pa, for example 1×10-5Pa、0.9×10-5Pa、0.8×10-5Pa、0.7×10-5Pa、0.6×10-5Pa、0.5×10-5Pa、0.4×10-5Pa、0.3×10-5Pa、0.2×10-5Pa Pa or 1×10 -4 Pa, but not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the nitrogen may be introduced at 200-300 sccm, for example, 200sccm, 210sccm, 220sccm, 230sccm, 240sccm, 250sccm, 260sccm, 270sccm, 280sccm, 290sccm or 300sccm, but the present invention is not limited to the recited values, and other non-recited values within the recited values are equally applicable.
In some alternative examples, the argon gas may be introduced at a volume of 100-200 sccm, for example, 100sccm, 110sccm, 120sccm, 130sccm, 140sccm, 150sccm, 160sccm, 170sccm, 180sccm, 190sccm or 200sccm, but not limited to the recited values, and other non-recited values within the recited values are equally applicable.
In some alternative examples, the sputtering air pressure in the cavity of the vacuum plating apparatus is 0.1 to 0.3Pa, for example, may be 0.1Pa, 0.12Pa, 0.14Pa, 0.16Pa, 0.18Pa, 0.2Pa, 0.22Pa, 0.24Pa, 0.26Pa, 0.28Pa or 0.3Pa, but is not limited to the recited values, and other non-recited values in the range of values are equally applicable.
The invention particularly limits the sputtering air pressure to 0.1-0.3 Pa, and the surface roughness of the CrN bonding layer is increased, the uniformity is reduced, and the number of surface particles and defects are increased along with the increase of the sputtering air pressure. The method is characterized in that as the sputtering air pressure is increased, the average free path of particle movement is relatively reduced, the collision probability of particles and gas molecules is increased, so that the energy loss of the particles is caused, when the particles reach the surface of the band saw blade matrix, the particles cannot penetrate the surface layer of the band saw blade matrix because of insufficient energy, and further adhere to the surface layer of the band saw blade matrix, so that the nucleation and growth mode of the CrN bonding layer on the matrix are affected; meanwhile, as the sputtering air pressure is increased, the bombardment effect of nitrogen on the Cr target is enhanced, the surface of the Cr target can be covered with a nitriding layer, so that the sputtering effect of the Cr target is reduced, and the quality of the CrN bonding layer is also reduced.
In some optional examples, the rotation speed of the turntable is 30-40 r/min, for example, 30r/min, 31r/min, 32r/min, 33r/min, 34r/min, 35r/min, 36r/min, 37r/min, 38r/min, 39r/min or 40r/min, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In some alternative examples, the band saw blade substrate may be heated to a temperature of 100 to 200 ℃, such as 100 ℃, 110 ℃,120 ℃, 130 ℃, 140 ℃, 150 ℃, 160 ℃, 170 ℃, 180 ℃, 190 ℃, or 200 ℃, but is not limited to the values recited, and other values not recited in the range are equally applicable.
In some alternative examples, the bias applied to the band saw blade substrate is-120V to-150V, such as-120V, -122V, -124V, -126V, -128V, -130V, -132V, -134V, -136V, -138V, -140V, -142V, -144V, -146V, -148V, or-150V, although not limited to the recited values, and other non-recited values within the range of values are equally applicable.
The invention particularly limits the bias voltage on the saw blade substrate in the sputtering deposition process of the CrN bonding layer to be-120V to-150V, and when the bias voltage is within the numerical range limited by the invention, the particles and defects on the surface of the CrN bonding layer are obviously reduced. This is because the greater the bias, the higher the energy of the incident particles and the greater the total density of the ion flow, which affects the nucleation and growth of the CrN bond layer on the surface of the band saw blade substrate, and thus affects the flatness and compactness of the CrN bond layer surface. When the bias voltage is lower than-120V, the energy of the incident particles is lower, the particles collide with each other in the sputtering process to cause the energy loss of the particles, so that the incident particles cannot break down the surface layer of the band saw blade matrix and are adsorbed on the surface layer of the band saw blade matrix, and the surface roughness of the CrN bonding layer is increased. With the increase of the bias voltage, the energy of the incident particles is increased, so that the incident particles can penetrate through the surface layer of the band saw blade matrix to form a compact CrN bonding layer. Meanwhile, as the bias voltage is increased, the ionization rate of the gas can be increased, the total density of ion flow is increased, and the sputtering rate of Ar is also increased, so that the sputtering effect of Ar on the surface of the CrN bonding layer is enhanced, and impurities on the surface of the band saw blade matrix can be properly bombarded, thereby improving the film forming quality of the CrN bonding layer and reducing the surface roughness of the CrN bonding layer.
In addition, as the bias voltage is increased, the interfacial bonding strength between the CrN bonding layer and the band saw blade matrix shows a trend of increasing and then decreasing, and when the bias voltage is within the range of-120 to-150V, the interfacial bonding strength between the CrN bonding layer and the band saw blade matrix is at a higher level. This is because the energy of the incident particles and the sputtering action of Ar can improve the interface bonding quality between the CrN bonding layer and the band saw blade substrate, and greatly improve the interface bonding force between the CrN bonding layer and the band saw blade substrate. However, when the bias voltage continues to be increased, the Ar sputtering effect is overlarge, so that the surface defect of the CrN bonding layer is increased and becomes a stress source, and the internal stress of the CrN bonding layer is increased; in addition, the energy of the particles partially adsorbed on the surface of the CrN bonding layer is high, so that the internal stress of the CrN bonding layer is increased, and the interface bonding strength between the CrN bonding layer and the band saw blade matrix is reduced.
In some alternative examples, the sputtering current applied to the Cr target is 5 to 15A, for example, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, 14A or 15A, but not limited to the recited values, and other non-recited values within the range are equally applicable.
In some alternative examples, the deposition time of the magnetron sputtering is 10 to 20min, for example, may be 10min, 11min, 12min, 13min, 14min, 15min, 16min, 17min, 18min, 19min or 20min, but is not limited to the recited values, and other non-recited values in the range of the values are equally applicable.
In the step (iii), as a preferred technical solution of the present invention, the operation steps of the magnetron sputtering process of the CrAlN transition layer include:
Fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; and applying bias to the band saw blade substrate, independently applying sputtering current to the Cr target and the Al target, and depositing the CrAlN transition layer on the surface of the CrN bonding layer.
In some alternative examples, the vacuum degree in the cavity of the vacuum plating apparatus is 10 -5~10-4 Pa, for example 1×10-5Pa、0.9×10-5Pa、0.8×10-5Pa、0.7×10-5Pa、0.6×10-5Pa、0.5×10-5Pa、0.4×10-5Pa、0.3×10-5Pa、0.2×10-5Pa Pa or 1×10 -4 Pa, but not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the nitrogen may be introduced at 200-300 sccm, for example, 200sccm, 210sccm, 220sccm, 230sccm, 240sccm, 250sccm, 260sccm, 270sccm, 280sccm, 290sccm or 300sccm, but the present invention is not limited to the recited values, and other non-recited values within the recited values are equally applicable.
According to the invention, the nitrogen gas inflow amount is particularly limited to 200-300 sccm, and when the nitrogen gas flow rate is increased and exceeds 300sccm, the deposition rate of the CrAlN transition layer is obviously reduced, because in the sputtering deposition process, the total pressure in the chamber is unchanged while the nitrogen gas flow rate is increased, the argon partial pressure is relatively reduced, the ionized Ar + quantity and the Ar + quantity of bombarding the target material are reduced, and the sputtering rate of the CrAlN transition layer is reduced.
In some alternative examples, the argon gas may be introduced at a volume of 100-200 sccm, for example, 100sccm, 110sccm, 120sccm, 130sccm, 140sccm, 150sccm, 160sccm, 170sccm, 180sccm, 190sccm or 200sccm, but not limited to the recited values, and other non-recited values within the recited values are equally applicable.
According to the invention, the introducing amount of argon is particularly limited to 100-200 sccm, when the introducing amount of argon is lower than 100sccm, the partial pressure of nitrogen in the cavity is larger, the number of ionized Ar + and the number of Ar + bombarding a target material are reduced, and in addition, the quantity of sputtered metal ions is obviously reduced and the energy is obviously reduced due to collision with nitrogen molecules in the movement process, so that the diffusion energy of Ar + reaching the surface of the CrAlN transition layer is lower, the CrAlN transition layer grows in a columnar crystal mode, and the surface roughness of the CrAlN transition layer formed by deposition is larger.
In some alternative examples, the sputtering air pressure in the cavity of the vacuum plating apparatus is 0.8 to 1Pa, for example, 0.8Pa, 0.82Pa, 0.84Pa, 0.86Pa, 0.88Pa, 0.9Pa, 0.92Pa, 0.94Pa, 0.96Pa, 0.98Pa or 1Pa, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In some optional examples, the rotation speed of the turntable is 30-40 r/min, for example, 30r/min, 31r/min, 32r/min, 33r/min, 34r/min, 35r/min, 36r/min, 37r/min, 38r/min, 39r/min or 40r/min, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In some alternative examples, the band saw blade substrate may be heated to a temperature of 100 to 200 ℃, such as 100 ℃, 110 ℃,120 ℃, 130 ℃, 140 ℃, 150 ℃, 160 ℃, 170 ℃, 180 ℃, 190 ℃, or 200 ℃, but is not limited to the values recited, and other values not recited in the range are equally applicable.
The invention particularly limits the heating temperature of the band saw blade matrix to 100-200 ℃, and the surface quality of the CrAlN transition layer is improved along with the increase of the heating temperature. When the heating temperature is lower than 100 ℃, the atomic diffusion energy is lower, the nucleation capacity is weaker, the CrAlN transition layer is grown in an island shape, larger gaps are generated between islands, pits appear on the surface of the CrAlN transition layer, and the film forming quality is poorer; as the heating temperature increases, the thermal movement of the deposited atoms is accelerated, the mobility of the surface of the CrN bonding layer is enhanced, and at the moment, the number of deposited atomic layers is increased, and the islands are combined, so that the number of pits on the surface of the formed CrAlN transition layer is reduced, and the surface becomes compact and uniform.
In some alternative embodiments, the bias applied to the band saw blade substrate is-80 to-90V, such as-80V, -81V, -82V, -83V, -84V, -85V, -86V, -87V, -88V, -89V, or-90V, but is not limited to the recited values, as other non-recited values within the range are equally applicable.
The invention particularly limits the bias voltage on the saw blade substrate in the sputtering deposition process of the CrAlN transition layer to be-80 to-90V, and when the bias voltage is lower than-80V, the deposited CrAlN transition layer is uneven and uneven, and has more particles and pits on the surface and poorer quality. This is because, under a lower bias, the incident atoms have weaker mobility and tend to nucleate with the deposited atoms, and form small clusters, with larger spacing between clusters, resulting in island-like growth of the CrAlN transition layer. In addition, since voids are generated between islands, many pits exist on the surface of the CrAlN transition layer.
With the improvement of the bias voltage, the number of large particles of the CrAlN transition layer is reduced, the particle structure of the surface is thinned, and the flatness is improved, because the improvement of the bias voltage can enhance the effect of particle bombardment, the deposition nucleation of the CrAlN transition layer is accelerated, and the combination between islands is promoted, so that the surface of the CrAlN transition layer is more compact and flat. In addition, the larger the bias voltage is, the higher the bombardment energy of the particles is, the faster the movement rate of the particles is, the number and energy of times that the tip of the surface of the CrAlN transition layer is bombarded are improved, and therefore atoms with low bonding strength in the CrAlN transition layer are sputtered, and the density of the CrAlN transition layer is enhanced.
When the bias voltage exceeds-90V, the surface of the CrAlN transition layer is smoother, the particles are fewer, pits still exist, the surface bombardment effect of sputtered particles on the CrAlN transition layer is too strong due to the fact that the bias voltage is too high, and when the high-energy particles bombard the deposited CrAlN transition layer, the particles with low bonding strength are separated from the CrAlN transition layer, so that sputtered pits are generated on the surface of the CrAlN transition layer. In addition, when the bias voltage exceeds-90V, the deposition rate of the CrAlN transition layer is obviously reduced, because atoms and ions sputtered from the target material are deposited on the surface of the CrN bonding layer under the action of the bias voltage in the sputtering process to form the CrAlN transition layer, but the bombardment of sputtered particles on the deposited CrAlN transition layer can cause the deposited atoms to be sputtered into the atmosphere again, so that the deposition rate of the CrAlN transition layer is obviously reduced.
In addition, when the bias voltage is within the range of-80V to-90V, the hardness of the CrAlN transition layer formed by deposition is also at a higher level, because with the improvement of the bias voltage, higher kinetic energy is given to deposited ions, ions bombarding the surface of the CrAlN transition layer in unit time are increased, the defect density of the CrAlN transition layer is reduced, the structure is more compact, and the hardness of the CrAlN transition layer is improved. Meanwhile, a small amount of Al atoms are dissolved in the CrN lattice to cause lattice distortion, so that the hardness of the CrAlN transition layer can be improved. When the bias voltage is further increased, the hardness of the CrAlN transition layer gradually decreases, and the hardness of the CrAlN transition layer decreases due to the fact that the bias voltage is too high, so that the ion energy is too high, the bombardment effect on the surface of the CrAlN transition layer is enhanced, crystal grains in the CrAlN transition layer grow again, defects such as dislocation and pores are formed, and the hardness of the CrAlN transition layer is reduced. Meanwhile, the elastic modulus of the CrAlN transition layer has the same variation trend with the hardness, and the elastic modulus of the CrAlN transition layer is lower due to the fact that more defects exist in the CrAlN transition layer and the tissue structure is loose when the bias voltage is lower. With the improvement of the bias voltage, the sputtered particles obtain higher energy, and the bombardment effect is enhanced during deposition, so that the internal structure of the CrAlN transition layer becomes compact, the defect density is lower, and the elastic modulus is improved. When the bias voltage exceeds-90V, the elastic modulus of the CrAlN transition layer is reduced again, because the bias voltage is too large, sputtering particles form strong bombardment on the deposited CrAlN transition layer, the reverse sputtering effect exists, and meanwhile, crystal grains in the CrAlN transition layer are regrown to form defects such as dislocation, pores and the like, so that the elastic modulus is reduced.
In some alternative examples, the sputtering current applied to the Cr target is 3-5 a, which may be, for example, 3.0A, 3.2A, 3.4A, 3.6A, 3.8A, 4.0A, 4.2A, 4.4A, 4.6A, 4.8A, or 5.0A, but is not limited to the recited values, and other non-recited values within the range are equally applicable.
In some alternative examples, the sputtering current applied to the Al target is 5-8A, which may be, for example, 5.0A, 5.2A, 5.4A, 5.6A, 5.8A, 6.0A, 6.2A, 6.4A, 6.6A, 6.8A, 7.0A, 7.2A, 7.4A, 7.6A, 7.8A or 8.0A, but are not limited to, the recited values, and other non-recited values within the range of values are equally applicable.
In some optional examples, the deposition time of the magnetron sputtering is 20 to 30min, for example, 20min, 21min, 22min, 23min, 24min, 25min, 26min, 27min, 28min, 29min or 30min, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In the step (iv), as a preferred technical solution of the present invention, the operation steps of the magnetron sputtering process of the CrAlMoN functional layers include:
Fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; and applying bias to the band saw blade matrix, and independently applying sputtering currents to the Cr target, the Al target and the Mo target respectively to deposit and form the CrAlMoN functional layer on the surface of the CrAlN transition layer.
In some alternative examples, the vacuum degree in the cavity of the vacuum plating apparatus is 10 -5~10-4 Pa, for example 1×10-5Pa、0.9×10-5Pa、0.8×10-5Pa、0.7×10-5Pa、0.6×10-5Pa、0.5×10-5Pa、0.4×10-5Pa、0.3×10-5Pa、0.2×10-5Pa Pa or 1×10 -4 Pa, but not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the nitrogen may be introduced at 200-300 sccm, for example, 200sccm, 210sccm, 220sccm, 230sccm, 240sccm, 250sccm, 260sccm, 270sccm, 280sccm, 290sccm or 300sccm, but the present invention is not limited to the recited values, and other non-recited values within the recited values are equally applicable.
In some alternative examples, the argon gas may be introduced at a volume of 100-200 sccm, for example, 100sccm, 110sccm, 120sccm, 130sccm, 140sccm, 150sccm, 160sccm, 170sccm, 180sccm, 190sccm or 200sccm, but not limited to the recited values, and other non-recited values within the recited values are equally applicable.
In some alternative examples, the sputtering air pressure in the cavity of the vacuum plating apparatus is 0.7 to 0.8Pa, for example, may be 0.7Pa, 0.71Pa, 0.72Pa, 0.73Pa, 0.74Pa, 0.75Pa, 0.76Pa, 0.77Pa, 0.78Pa, 0.79Pa or 0.8Pa, but is not limited to the recited values, and other non-recited values in the range of values are equally applicable.
The sputtering air pressure mainly influences the sputtering rate and the deposition quality, the invention particularly limits the sputtering air pressure of the CrAlN transition layer to 0.7-0.8 Pa in the deposition process, when the sputtering air pressure is lower than 0.7Pa, the sputtered particles are few and the average free path is large, the collision probability is small in the particle transportation process, the energy reaching the surface of the CrN bonding layer is large, the reverse sputtering is easy to form a cavity or a bulge on the CrN bonding layer, and the deposition rate is low; when the sputtering air pressure exceeds 0.8Pa, the average free path of sputtered particles is smaller, the probability of collision with gas ions is increased, the scattering is serious, a CrAlN transition layer with high crystallinity cannot be obtained, and the deposition rate is also reduced. Therefore, the proper sputtering air pressure has both deposition rate and target utilization rate, and a CrAlN transition layer with high quality is prepared.
In some optional examples, the rotation speed of the turntable is 30-40 r/min, for example, 30r/min, 31r/min, 32r/min, 33r/min, 34r/min, 35r/min, 36r/min, 37r/min, 38r/min, 39r/min or 40r/min, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In some alternative examples, the band saw blade substrate may be heated to a temperature of 100 to 200 ℃, such as 100 ℃, 110 ℃,120 ℃, 130 ℃, 140 ℃, 150 ℃, 160 ℃, 170 ℃, 180 ℃, 190 ℃, or 200 ℃, but is not limited to the values recited, and other values not recited in the range are equally applicable.
In some alternative embodiments, the bias applied to the band saw blade substrate is-70V to-80V, such as-70V, -71V, -72V, -73V, -74V, -75V, -76V, -77V, -78V, -79V, or-80V, but is not limited to the recited values, as other non-recited values within the range are equally applicable.
The invention particularly limits the bias voltage on the saw blade substrate to be-70 to-80V in the CrAlMoN functional layer sputtering deposition process, and the hardness of the CrAlMoN functional layer is gradually increased along with the increase of the bias voltage, because the increase of the bias voltage causes incident particles to have higher energy to bombard the surface of the CrAlMoN functional layer, thereby improving the nucleation rate of the CrAlMoN functional layer, refining grains, and the particles can enter columnar crystal gaps, so that the surface of the CrAlMoN functional layer is more compact, and the hardness is increased; meanwhile, the increase of the bias voltage improves the sputtering effect of Ar on CrAlMoN functional layers, can sputter impurities adsorbed on the surfaces of CrAlMoN functional layers, and improves the film forming quality of CrAlMoN functional layers.
In some alternative examples, the sputtering current applied to the Cr target is 3-5 a, which may be, for example, 3.0A, 3.2A, 3.4A, 3.6A, 3.8A, 4.0A, 4.2A, 4.4A, 4.6A, 4.8A, or 5.0A, but is not limited to the recited values, and other non-recited values within the range are equally applicable.
In some alternative examples, the sputtering current applied to the Al target is 1 to 3a, for example, 1.0A, 1.2A, 1.4A, 1.6A, 1.8A, 2.0A, 2.2A, 2.4A, 2.6A, 2.8A, or 3.0A, but not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the sputtering current applied to the Mo target is 0.5 to 0.6A, which may be, for example, 0.5A, 0.51A, 0.52A, 0.53A, 0.54A, 0.55A, 0.56A, 0.57A, 0.58A, 0.59A, or 0.6A, but is not limited to the recited values, and other non-recited values within the range of values are equally applicable.
In some alternative examples, the magnetron sputtering time is 40-50 min, for example, 40min, 41min, 42min, 43min, 44min, 45min, 46min, 47min, 48min, 49min or 50min, but not limited to the recited values, and other non-recited values in the range of values are equally applicable.
In a second aspect, the invention provides a high-toughness bimetallic band saw blade prepared by the preparation method in the first aspect, which comprises a band saw blade substrate, and a CrN bonding layer, a CrAlN transition layer and a CrAlMoN functional layer which are sequentially formed on the surface of the band saw blade substrate.
As a preferable technical scheme of the invention, the band saw blade matrix comprises the following elements in percentage by weight: 1.38-1.45 wt% of C, 0.3-0.4 wt% of Si, 0.5-0.6 wt% of Mn, 3.8-4 wt% of Cr, 0.50-0.70 wt% of Ni, 2-2.5 wt% of Mo, 1.4-1.8 wt% of V, 0.08-0.20 wt% of Nb, 0.02-0.03 wt% of Al and the balance of Fe; wherein, the weight percentage of the C element can be 1.38wt%, 1.39wt%, 1.4wt%, 1.41wt%, 1.42wt%, 1.43wt%, 1.44wt% or 1.45wt%, the weight percentage of the Si element can be 0.3wt%, 0.31wt%, 0.32wt%, 0.33wt%, 0.34wt%, 0.35wt%, 0.36wt%, 0.37wt%, 0.38wt%, 0.39wt% or 0.4wt%, and the weight percentage of the Mn element can be 0.5wt%, 0.51wt%, 0.52wt%, 0.53wt%, 0.54wt%, 0.55wt%, 0.56wt%, 0.57wt%, 0.58wt%, 0.59wt% or 0.6wt%, the weight percentage of Cr element may be 3.8wt%, 3.82wt%, 3.84wt%, 3.86wt%, 3.88wt%, 3.9wt%, 3.92wt%, 3.94wt%, 3.96wt%, 3.98wt% or 4.0wt%, the weight percentage of Ni element may be 0.5wt%, 0.52wt%, 0.54wt%, 3.9wt%, 3.92wt%, 3.94wt%, 3.96wt%, or 4.0wt%, the weight percentage of Ni element may be, 0.56wt%, 0.58wt%, 0.6wt%, 0.62wt%, 0.64wt%, 0.66wt%, 0.68wt% or 0.7wt% of element Mo may be 2.0wt%, 2.05wt%, 2.1wt%, 2.15wt%, 2.2wt%, 2.25wt%, 2.3wt%, 2.35wt%, 2.4wt%, 2.45wt% or 2.5wt%, and the weight% of element V may be 1.4wt%, 1.45wt%, 1.5wt%, 1.55wt%, 1.6wt%, 1.5wt% of element V, 1.65wt%, 1.7wt%, 1.75wt% or 1.8wt%, the weight percentage of Nb element may be 0.08wt%, 0.09wt%, 0.1wt%, 0.11wt%, 0.12wt%, 0.13wt%, 0.14wt%, 0.15wt%, 0.16wt%, 0.17wt%, 0.18wt%, 0.19wt% or 0.2wt%, the weight percentage of Al element may be 0.02wt%, 0.021wt%, 0.022wt%, 0.023wt%, 0.024wt%, and, 0.025wt%, 0.026wt%, 0.027wt%, 0.028wt%, 0.029wt% or 0.03wt%, but is not limited to the recited values, and other non-recited values within this range of values are equally applicable.
In some alternative examples, the CrN tie layer comprises the following components in weight percent: 40-50wt% of Cr element and 50-60wt% of N element; wherein, the weight percentage of Cr element can be 40wt%, 41wt%, 42wt%, 43wt%, 44wt%, 45wt%, 46wt%, 47wt%, 48wt%, 49wt% or 50wt%, and the weight percentage of N element can be 50wt%, 51wt%, 52wt%, 53wt%, 54wt%, 55wt%, 56wt%, 57wt%, 58wt%, 59wt% or 60wt%, but is not limited to the recited values, and other non-recited values in the range of the values are equally applicable.
In some alternative examples, the cran transition layer comprises the following elements in weight percent: 40-50wt% of Cr element, 5-8wt% of Al element and 45-55wt% of N element; wherein, the weight percentage of Cr element can be 40wt%, 41wt%, 42wt%, 43wt%, 44wt%, 45wt%, 46wt%, 47wt%, 48wt%, 49wt%, or 50wt%, the weight percentage of Al element can be 5.0wt%, 5.5wt%, 6.0wt%, 6.5wt%, 7.0wt%, 7.5wt%, or 8.0wt%, and the weight percentage of N element can be 45wt%, 46wt%, 47wt%, 48wt%, 49wt%, 50wt%, 51wt%, 52wt%, 53wt%, 54wt%, or 55wt%, but is not limited to the recited values, and other non-recited values in the numerical range are equally applicable.
In some optional examples, the CrAlMoN functional layers comprise the following components in percentage by weight: 30-40wt% of Cr element, 3-5wt% of Al element, 15-20wt% of Mo element and 40-50wt% of N element; wherein the weight percentage of Cr element may be 30wt%, 31wt%, 32wt%, 33wt%, 34wt%, 35wt%, 36wt%, 37wt%, 38wt%, 39wt% or 40wt%, the weight percentage of Al element may be 3.0wt%, 3.2wt%, 3.4wt%, 3.6wt%, 3.8wt%, 4.0wt%, 4.2wt%, 4.4wt%, 4.6wt%, 4.8wt% or 5.0wt%, the weight percentage of Mo element may be 15wt%, 15.5wt%, 16wt%, 16.5wt%, 17wt%, 17.5wt%, 18wt%, 18.5wt%, 19wt%, 19.5wt% or 20wt%, the weight percentage of N element may be 40wt%, 41wt%, 42wt%, 43wt%, 44wt%, 45wt%, 46wt%, 47wt%, 48wt%, 49wt% or 50wt%, but not limited to the recited values, the other values not listed within the range of the values are equally applicable.
According to the invention, the content of Mo element is limited to 15-20wt%, the surface grain size of CrAlMoN functional layers is obviously reduced along with the improvement of the content of Mo element, the boundaries among grains are blurred, and the compactness of the film is obviously improved.
In a preferred embodiment of the present invention, the CrN bonding layer has a thickness of 0.5 to 1.5. Mu.m, for example, 0.5. Mu.m, 0.6. Mu.m, 0.7. Mu.m, 0.8. Mu.m, 0.9. Mu.m, 1.0. Mu.m, 1.1. Mu.m, 1.2. Mu.m, 1.3. Mu.m, 1.4. Mu.m, or 1.5. Mu.m, but the present invention is not limited to the above-mentioned values, and other values not mentioned in the above-mentioned value range are applicable.
In some alternative examples, the thickness of the CrAlN transition layer is 1.8-2.3 μm, such as 1.8 μm, 1.85 μm, 1.9 μm, 1.95 μm, 2.0 μm, 2.05 μm, 2.1 μm, 2.15 μm, 2.2 μm, 2.25 μm or 2.3 μm, but not limited to the recited values, and other non-recited values within the range are equally applicable.
In some alternative examples, the CrAlMoN functional layer has a thickness of 2.6-2.8 μm, for example, 2.6 μm, 2.62 μm, 2.64 μm, 2.68 μm, 2.7 μm, 2.72 μm, 2.74 μm, 2.76 μm, 2.78 μm, or 2.8 μm, but is not limited to the recited values, and other non-recited values within the range of values are equally applicable.
Illustratively, the present invention provides a method of preparing a high-toughness bi-metallic band saw blade, the method comprising:
(1) Ultrasonic cleaning: soaking the band saw blade matrix in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 300-400W, and the cleaning time is 40-50 min; wherein, the weight percentage of each element in the band saw blade matrix is as follows: 1.38-1.45 wt% of C, 0.3-0.4 wt% of Si, 0.5-0.6 wt% of Mn, 3.8-4 wt% of Cr, 0.5-0.7 wt% of Ni, 2-2.5 wt% of Mo, 1.4-1.8 wt% of V, 0.08-0.20 wt% of Nb, 0.02-0.03 wt% of Al and the balance of Fe;
(2) And (3) heat treatment: heating the band saw blade matrix after ultrasonic cleaning to 850-950 ℃, preserving heat for 1-2min, and then carrying out oil quenching at a cooling speed of 80-100 ℃/s until the band saw blade matrix is cooled to room temperature; continuously heating the band saw blade matrix to 520-600 ℃, preserving heat for 3-5 minutes, and cooling to room temperature to finish tempering operation; repeating tempering operation for 3-6 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix subjected to heat treatment by adopting sand materials with 100-120 meshes, wherein the sand blasting pressure is 0.6-0.8 MPa, the sand blasting time is 50-60 min, and the vertical distance between a nozzle and the surface of the band saw blade matrix is 20-30 cm;
(4) Acid washing: soaking the band saw blade matrix subjected to sand blasting in pickling solution for 20-30 min, then taking out, cleaning and drying; the pickling solution consists of 10-15 parts by weight of nitric acid, 2-8 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 60-70 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix subjected to acid washing treatment in a passivating solution for 20-30 min, then taking out, cleaning and drying; the passivation solution consists of 5-10 parts by weight of citric acid, 2-5 parts by weight of oxalic acid, 2-5 parts by weight of phosphoric acid, 5-10 parts by weight of cationic surfactant, 10-20 parts by weight of sodium molybdate and 10-15 parts by weight of deionized water, and the temperature of the passivation solution is 40-50 ℃.
(6) Depositing a CrN bonding layer: fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5~10-4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200-300 sccm, and the filling amount of the argon is 100-200 sccm so as to adjust the pressure in the cavity to 0.1-0.3 Pa; starting a rotary table, driving a band saw blade matrix to rotate at a rotating speed of 30-40 r/min, and heating the band saw blade matrix to 100-200 ℃; applying bias voltage of-120 to-150V to the band saw blade matrix, applying sputtering current of 5-15A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade matrix for 10-20min to deposit and form a CrN bonding layer with the thickness of 0.5-1.5 mu m; 40-50wt% of Cr element and 50-60wt% of N element in the CrN bonding layer;
(7) Depositing a CrAlN transition layer: fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5~10-4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200-300 sccm, and the filling amount of the argon is 100-200 sccm so as to adjust the pressure in the cavity to 0.8-1 Pa; starting a rotary table, driving a band saw blade matrix to rotate at a rotating speed of 30-40 r/min, and heating the band saw blade matrix to 100-200 ℃; applying bias voltage of-80 to-90V to the band saw blade matrix, applying sputtering current of 3-5A to the Cr target, applying sputtering current of 5-8A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer for 20-30 min to deposit and form a CrAlN transition layer with the thickness of 1.8-2.3 mu m; 40-50wt% of Cr element, 5-8wt% of Al element and 45-55wt% of N element in the CrAlN transition layer;
(8) Depositing CrAlMoN functional layers: fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5~10-4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200-300 sccm, and the filling amount of the argon is 100-200 sccm so as to adjust the pressure in the cavity to 0.7-0.8 Pa; starting a rotary table, driving a band saw blade matrix to rotate at a rotating speed of 30-40 r/min, and heating the band saw blade matrix to 100-200 ℃; applying bias voltage of-70 to-80V to the band saw blade matrix, applying sputtering current of 3-5A to the Cr target, applying sputtering current of 1-3A to the Al target, applying sputtering current of 0.5-0.6A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer for 40-50 min to deposit and form CrAlMoN functional layers with the thickness of 2.6-2.8 mu m; 30-40wt% of Cr element, 3-5wt% of Al element, 15-20wt% of Mo element and 40-50wt% of N element in the CrAlMoN functional layer.
Finally, the bimetallic band saw blade is prepared, and comprises a band saw blade substrate, and a CrN bonding layer, a CrAlN transition layer and a CrAlMoN functional layer which are sequentially formed on the surface of the band saw blade substrate.
Compared with the prior art, the invention has the beneficial effects that:
According to the invention, the band saw blade substrate is subjected to sand blasting, acid pickling and passivation treatment, so that residual compressive stress can be introduced to the surface of the band saw blade substrate, and the fatigue resistance of the band saw blade substrate can be improved. According to the invention, the CrN bonding layer is deposited on the surface of the band saw blade matrix, so that the film base bonding strength of the composite coating can be remarkably improved, the abrupt interface between the band saw blade matrix and the CrAlN transition layer can be eliminated, and the stress generated by the non-integration or different thermal expansion coefficients between the interfaces can be relieved; then, by continuously depositing a CrAlN transition layer on the surface of the CrN bonding layer, the crack deflects at the interface and the tip of the crack is passivated, so that the strength and toughness of the bimetallic strip saw blade can be obviously improved; finally, a CrAlMoN functional layer is continuously deposited on the surface of the CrAlN transition layer, and under the room temperature environment, the CrAlMoN functional layer forms MoO 3 with self-lubricating function and low shear modulus in the friction process, has obvious lubricating antifriction effect, and can obviously improve the wear resistance of the bimetallic band saw blade. The preparation method provided by the invention can be used for preparing the bimetal band saw blade with high strength and high toughness.
Drawings
FIG. 1 is a flow chart of a process for manufacturing a bi-metallic band saw blade according to embodiments 1-11 of the present invention;
FIG. 2 is a schematic view of a bimetallic band saw blade according to embodiments 1-11 of the present invention;
FIG. 3 is a scanning electron microscope image of the surface micro-morphology of the CrAlN transition layer prepared in example 1;
FIG. 4 is a scanning electron microscope image of the cross-sectional microscopic morphology of the CrAlN transition layer prepared in example 1;
FIG. 5 is a scanning electron microscope image of the surface micro-morphology of CrAlMoN functional layers prepared in example 1;
FIG. 6 is a scanning electron microscope image of the cross-sectional microscopic morphology of CrAlMoN functional layers prepared in example 1;
FIG. 7 is a scanning electron microscope image of the wear scar microstructure of the bi-metal band saw blade prepared in example 1;
FIG. 8 is a scanning electron microscope image of the wear scar microstructure of the bi-metal band saw blade prepared in the comparative example;
Wherein, 1-band saw blade matrix; a 2-CrN binding layer; a 3-CrAlN transition layer; 4-CrAlMoN functional layers.
Detailed Description
The technical scheme of the application is described in detail below with reference to specific embodiments and attached drawings. The examples described herein are specific embodiments of the present application for illustrating the concept of the present application; the description is intended to be illustrative and exemplary in nature and should not be construed as limiting the scope of the application in its aspects. In addition to the embodiments described herein, those skilled in the art can adopt other obvious solutions based on the disclosure of the claims and the specification thereof, including those adopting any obvious substitutions and modifications to the embodiments described herein.
Example 1
The embodiment provides a preparation method of a high-toughness bimetallic band saw blade, as shown in fig. 1, comprising the following steps:
(1) Ultrasonic cleaning: soaking the band saw blade matrix 1 in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 300W, and the cleaning time is 50min; wherein, the weight percentage of each element in the band saw blade matrix 1 is as follows: 1.38wt% of C element, 0.3wt% of Si element, 0.5wt% of Mn element, 3.8wt% of Cr element, 0.5wt% of Ni element, 2wt% of Mo element, 1.4wt% of V element, 0.08wt% of Nb element, 0.02wt% of Al element and the balance of Fe element;
(2) And (3) heat treatment: heating the band saw blade matrix 1 subjected to ultrasonic cleaning to 850 ℃, preserving heat for 2min, and then carrying out oil quenching at a cooling speed of 80 ℃/s until the band saw blade matrix is cooled to room temperature; continuously heating the band saw blade matrix 1 to 520 ℃, preserving heat for 5min, and cooling to room temperature to finish tempering operation; repeating tempering operation for 6 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix 1 subjected to heat treatment by adopting 100-mesh brown fused alumina, wherein the sand blasting pressure is 0.6MPa, the sand blasting time is 60min, and the vertical distance between a nozzle and the surface of the band saw blade matrix 1 is 20cm;
(4) Acid washing: soaking the band saw blade matrix 1 subjected to sand blasting in pickling solution for 20min, then taking out, cleaning and drying; the pickling solution consists of 10 parts by weight of nitric acid, 2 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 60 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix 1 subjected to acid washing treatment in passivation solution for 20min, and then taking out for cleaning and drying; the passivation solution consists of 5 parts by weight of citric acid, 2 parts by weight of oxalic acid, 2 parts by weight of phosphoric acid, 5 parts by weight of cetyltrimethylammonium bromide, 10 parts by weight of sodium molybdate and 10 parts by weight of deionized water, and the temperature of the passivation solution is 40 ℃.
(6) Depositing a CrN bonding layer 2: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200sccm, and the filling amount of the argon is 100sccm so as to adjust the pressure in the cavity to 0.1Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 30r/min, and heating the band saw blade matrix 1 to 100 ℃; applying a bias voltage of-120V to the band saw blade substrate 1, applying a sputtering current of 5A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade substrate 1 for 10min to deposit a CrN bonding layer 2 with a thickness of 0.5 μm; the Cr element in the CrN bonding layer 2 accounts for 40wt percent, and the N element accounts for 60wt percent;
(7) Depositing a CrAlN transition layer 3: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200sccm, and the filling amount of the argon is 100sccm so as to adjust the pressure in the cavity to 0.8Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 30r/min, and heating the band saw blade matrix 1 to 100 ℃; applying a bias voltage of-80V to the band saw blade substrate 1, applying a sputtering current of 3A to the Cr target, applying a sputtering current of 5A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer 2 for 20min to deposit a CrAlN transition layer 3 with a thickness of 1.8 mu m; the Cr element in the CrAlN transition layer 3 accounts for 40wt%, the Al element accounts for 5wt%, and the N element accounts for 55wt%;
(8) And depositing CrAlMoN a functional layer 4: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 200sccm, and the filling amount of the argon is 100sccm so as to adjust the pressure in the cavity to 0.7Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 30r/min, and heating the band saw blade matrix 1 to 100 ℃; applying a bias voltage of-70V to the band saw blade substrate 1, applying a sputtering current of 3A to the Cr target, applying a sputtering current of 1A to the Al target, applying a sputtering current of 0.5A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer 3 for 40min to deposit a CrAlMoN functional layer 4 with a thickness of 2.6 μm; the CrAlMoN functional layer 4 contains 30wt% of Cr element, 3wt% of Al element, 17wt% of Mo element and 50wt% of N element.
Finally, a bimetallic band saw blade shown in fig. 2 is prepared, which comprises a band saw blade substrate 1, and a CrN bonding layer 2, a CrAlN transition layer 3 and a CrAlMoN functional layer 4 which are sequentially formed on the surface of the band saw blade substrate 1.
Example 2
The embodiment provides a preparation method of a high-toughness bimetallic band saw blade, as shown in fig. 1, comprising the following steps:
(1) Ultrasonic cleaning: soaking the band saw blade matrix 1 in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 320W, and the cleaning time is 48min; wherein, the weight percentage of each element in the band saw blade matrix 1 is as follows: 1.4wt% of C element, 0.32wt% of Si element, 0.53wt% of Mn element, 3.82wt% of Cr element, 0.53wt% of Ni element, 2.1wt% of Mo element, 1.5wt% of V element, 0.1wt% of Nb element, 0.022wt% of Al element and the balance of Fe element;
(2) And (3) heat treatment: heating the band saw blade matrix 1 subjected to ultrasonic cleaning to 880 ℃, preserving heat for 1.8min, and then carrying out oil quenching at a cooling speed of 85 ℃ per second until the room temperature is cooled; continuously heating the band saw blade matrix 1 to 540 ℃, preserving heat for 4.5min, and cooling to room temperature to finish tempering operation; repeating the tempering operation for 5 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix 1 subjected to heat treatment by adopting 105 meshes of white corundum, wherein the sand blasting pressure is 0.65MPa, the sand blasting time is 58min, and the vertical distance between a nozzle and the surface of the band saw blade matrix 1 is 22cm;
(4) Acid washing: soaking the band saw blade matrix 1 subjected to sand blasting in pickling solution for 22min, then taking out, cleaning and drying; the pickling solution consists of 11 parts by weight of nitric acid, 4 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 62 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix 1 subjected to acid washing treatment in a passivating solution for 22min, and then taking out the band saw blade matrix to be cleaned and dried; the passivation solution consists of 6 parts by weight of citric acid, 3 parts by weight of oxalic acid, 3 parts by weight of phosphoric acid, 6 parts by weight of cetyltrimethylammonium bromide, 12 parts by weight of sodium molybdate and 11 parts by weight of deionized water, and the temperature of the passivation solution is 42 ℃.
(6) Depositing a CrN bonding layer 2: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 3X10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 220sccm, and the filling amount of the argon is 120sccm so as to adjust the pressure in the cavity to 0.15Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 32r/min, and heating the band saw blade matrix 1 to 120 ℃; applying a bias voltage of-130V to the band saw blade substrate 1, applying a sputtering current of 8A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade substrate 1 for 12min to deposit a CrN bonding layer 2 with a thickness of 0.8 μm; the Cr element in the CrN bonding layer 2 accounts for 42wt percent, and the N element accounts for 58wt percent;
(7) Depositing a CrAlN transition layer 3: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 3X 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 220sccm, and the filling amount of the argon is 120sccm so as to adjust the pressure in the cavity to 0.85Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 32r/min, and heating the band saw blade matrix 1 to 120 ℃; applying a bias voltage of-82V to the band saw blade substrate 1, applying a sputtering current of 3.5A to the Cr target, applying a sputtering current of 6A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer 2 for 22min to deposit a CrAlN transition layer 3 with a thickness of 1.9 mu m; the Cr element in the CrAlN transition layer 3 accounts for 42wt%, the Al element accounts for 8wt% and the N element accounts for 50wt%;
(8) And depositing CrAlMoN a functional layer 4: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 3X10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 220sccm, and the filling amount of the argon is 120sccm so as to adjust the pressure in the cavity to 0.72Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 32r/min, and heating the band saw blade matrix 1 to 120 ℃; applying a bias voltage of-72V to the band saw blade substrate 1, applying a sputtering current of 3.5A to the Cr target, applying a sputtering current of 1.5A to the Al target, applying a sputtering current of 0.52A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer 3 for 42min to deposit a CrAlMoN functional layer 4 with a thickness of 2.65 μm; crAlMoN the functional layer 4 contains 32wt% of Cr element, 3.5wt% of Al element, 16wt% of Mo element and 48.5wt% of N element.
Finally, a bimetallic band saw blade shown in fig. 2 is prepared, which comprises a band saw blade substrate 1, and a CrN bonding layer 2, a CrAlN transition layer 3 and a CrAlMoN functional layer 4 which are sequentially formed on the surface of the band saw blade substrate 1.
Example 3
The embodiment provides a preparation method of a high-toughness bimetallic band saw blade, as shown in fig. 1, comprising the following steps:
(1) Ultrasonic cleaning: soaking the band saw blade matrix 1 in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 350W, and the cleaning time is 45min; wherein, the weight percentage of each element in the band saw blade matrix 1 is as follows: 1.42wt% of C element, 0.35wt% of Si element, 0.56wt% of Mn element, 3.84wt% of Cr element, 0.55wt% of Ni element, 2.2wt% of Mo element, 1.6wt% of V element, 0.13wt% of Nb element, 0.025wt% of Al element and the balance of Fe element;
(2) And (3) heat treatment: heating the band saw blade matrix 1 subjected to ultrasonic cleaning to 900 ℃, preserving heat for 1.5min, and then carrying out oil quenching at a cooling speed of 90 ℃/s until the band saw blade matrix is cooled to room temperature; continuously heating the band saw blade matrix 1 to 550 ℃, preserving heat for 4min, and cooling to room temperature to finish tempering operation; repeating tempering operation for 4 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix 1 subjected to heat treatment by adopting 110-mesh glass beads, wherein the sand blasting pressure is 0.7MPa, the sand blasting time is 55min, and the vertical distance between a nozzle and the surface of the band saw blade matrix 1 is 25cm;
(4) Acid washing: soaking the band saw blade matrix 1 subjected to sand blasting in pickling solution for 25min, then taking out, cleaning and drying; the pickling solution consists of 12 parts by weight of nitric acid, 5 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 65 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix 1 subjected to acid washing treatment in a passivating solution for 25min, and then taking out the band saw blade matrix to be cleaned and dried; the passivation solution consists of 7 parts by weight of citric acid, 4 parts by weight of oxalic acid, 4 parts by weight of phosphoric acid, 7 parts by weight of cetyltrimethylammonium bromide, 15 parts by weight of sodium molybdate and 12 parts by weight of deionized water, and the temperature of the passivation solution is 45 ℃.
(6) Depositing a CrN bonding layer 2: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 5 multiplied by 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 250sccm, and the filling amount of the argon is 150sccm so as to adjust the pressure in the cavity to 0.2Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 35r/min, and heating the band saw blade matrix 1 to 150 ℃; applying a bias voltage of-135V to the band saw blade substrate 1, applying a sputtering current of 10A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade substrate 1 for 15min to deposit a CrN bonding layer 2 with a thickness of 1 μm; the Cr element in the CrN bonding layer 2 accounts for 45wt percent, and the N element accounts for 55wt percent;
(7) Depositing a CrAlN transition layer 3: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 5 multiplied by 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 250sccm, and the filling amount of the argon is 150sccm so as to adjust the pressure in the cavity to 0.9Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 35r/min, and heating the band saw blade matrix 1 to 150 ℃; applying a bias voltage of-85V to the band saw blade substrate 1, applying a sputtering current of 4A to the Cr target, applying a sputtering current of 6A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer 2 for 25min to deposit a CrAlN transition layer 3 with a thickness of 2 mu m; 45wt% of Cr element, 6wt% of Al element and 49wt% of N element in the CrAlN transition layer 3;
(8) And depositing CrAlMoN a functional layer 4: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 5 multiplied by 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 250sccm, and the filling amount of the argon is 150sccm so as to adjust the pressure in the cavity to 0.75Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 35r/min, and heating the band saw blade matrix 1 to 150 ℃; applying a bias voltage of-75V to the band saw blade substrate 1, applying a sputtering current of 4A to the Cr target, applying a sputtering current of 2A to the Al target, applying a sputtering current of 0.55A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer 3 for 45min to deposit a CrAlMoN functional layer 4 with a thickness of 2.7 μm; the CrAlMoN functional layer 4 contains 36wt% of Cr element, 4wt% of Al element, 20wt% of Mo element and 40wt% of N element.
Finally, a bimetallic band saw blade shown in fig. 2 is prepared, which comprises a band saw blade substrate 1, and a CrN bonding layer 2, a CrAlN transition layer 3 and a CrAlMoN functional layer 4 which are sequentially formed on the surface of the band saw blade substrate 1.
Example 4
The embodiment provides a preparation method of a high-toughness bimetallic band saw blade, as shown in fig. 1, comprising the following steps:
(1) Ultrasonic cleaning: soaking the band saw blade matrix 1 in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 380W, and the cleaning time is 42min; wherein, the weight percentage of each element in the band saw blade matrix 1 is as follows: 1.44wt% of C element, 0.38wt% of Si element, 0.57wt% of Mn element, 3.88wt% of Cr element, 0.58wt% of Ni element, 2.4wt% of Mo element, 1.7wt% of V element, 0.16wt% of Nb element, 0.028wt% of Al element and the balance of Fe element;
(2) And (3) heat treatment: heating the band saw blade matrix 1 subjected to ultrasonic cleaning to 920 ℃, preserving heat for 1.2min, and then carrying out oil quenching at a cooling speed of 95 ℃/s until the band saw blade matrix is cooled to room temperature; continuously heating the band saw blade matrix 1 to 580 ℃, preserving heat for 3.5min, and cooling to room temperature to finish tempering operation; repeating tempering operation for 4 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix 1 subjected to heat treatment by adopting 115-mesh silicon carbide, wherein the sand blasting pressure is 0.75MPa, the sand blasting time is 52min, and the vertical distance between a nozzle and the surface of the band saw blade matrix 1 is 28cm;
(4) Acid washing: soaking the band saw blade matrix 1 subjected to sand blasting in pickling solution for 28min, then taking out, cleaning and drying; the pickling solution consists of 14 parts by weight of nitric acid, 6 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 68 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix 1 subjected to acid washing treatment in a passivation solution for 28min, and then taking out the band saw blade matrix to be cleaned and dried; the passivation solution consists of 8 parts by weight of citric acid, 4 parts by weight of oxalic acid, 4 parts by weight of phosphoric acid, 8 parts by weight of cetyltrimethylammonium bromide, 18 parts by weight of sodium molybdate and 14 parts by weight of deionized water, and the temperature of the passivation solution is 48 ℃.
(6) Depositing a CrN bonding layer 2: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 7X 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 280sccm, and the filling amount of the argon is 180sccm so as to adjust the pressure in the cavity to 0.25Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 38r/min, and heating the band saw blade matrix 1 to 180 ℃; applying a bias voltage of-140V to the band saw blade substrate 1, applying a sputtering current of 12A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade substrate 1 for 18min to deposit a CrN bonding layer 2 with a thickness of 1.2 μm; 48wt% of Cr element and 52wt% of N element in the CrN bonding layer 2;
(7) Depositing a CrAlN transition layer 3: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 7X 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 280sccm, and the filling amount of the argon is 180sccm so as to adjust the pressure in the cavity to 0.95Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 38r/min, and heating the band saw blade matrix 1 to 180 ℃; applying a bias voltage of-88V to the band saw blade substrate 1, applying a sputtering current of 4.5A to the Cr target, applying a sputtering current of 7A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer 2 for 28min to deposit a CrAlN transition layer 3 with a thickness of 2.1 mu m; 48wt% of Cr element, 7wt% of Al element and 45wt% of N element in the CrAlN transition layer 3;
(8) And depositing CrAlMoN a functional layer 4: fixing the band saw blade matrix 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 7X 10 -5 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 280sccm, and the filling amount of the argon is 180sccm so as to adjust the pressure in the cavity to 0.78Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 38r/min, and heating the band saw blade matrix 1 to 180 ℃; applying a bias voltage of-78V to the band saw blade substrate 1, applying a sputtering current of 4.5A to the Cr target, applying a sputtering current of 2.5A to the Al target, applying a sputtering current of 0.58A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer 3 for 48min to deposit a CrAlMoN functional layer 4 with a thickness of 2.75 μm; crAlMoN the Cr element in the functional layer 4 accounts for 30wt%, the Al element accounts for 4.5wt%, the Mo element accounts for 18wt%, and the N element accounts for 47.5wt%.
Finally, a bimetallic band saw blade shown in fig. 2 is prepared, which comprises a band saw blade substrate 1, and a CrN bonding layer 2, a CrAlN transition layer 3 and a CrAlMoN functional layer 4 which are sequentially formed on the surface of the band saw blade substrate 1.
Example 5
The embodiment provides a preparation method of a high-toughness bimetallic band saw blade, as shown in fig. 1, comprising the following steps:
(1) Ultrasonic cleaning: soaking the band saw blade matrix 1 in absolute ethyl alcohol for ultrasonic cleaning, wherein the ultrasonic power is 400W, and the cleaning time is 40min; wherein, the weight percentage of each element in the band saw blade matrix 1 is as follows: 1.45wt% of C element, 0.4wt% of Si element, 0.6wt% of Mn element, 4wt% of Cr element, 0.7wt% of Ni element, 2.5wt% of Mo element, 1.8wt% of V element, 0.2wt% of Nb element, 0.03wt% of Al element and the balance of Fe element;
(2) And (3) heat treatment: heating the band saw blade matrix 1 subjected to ultrasonic cleaning to 950 ℃, preserving heat for 1min, and then carrying out oil quenching at a cooling speed of 100 ℃/s until the band saw blade matrix is cooled to room temperature; continuously heating the band saw blade matrix 1 to 600 ℃, preserving heat for 3min, and cooling to room temperature to finish tempering operation; repeating the tempering operation for 3 times;
(3) Sand blasting: carrying out sand blasting on the surface of the band saw blade matrix 1 subjected to heat treatment by adopting 120-mesh garnet, wherein the sand blasting pressure is 0.8MPa, the sand blasting time is 50min, and the vertical distance between a nozzle and the surface of the band saw blade matrix 1 is 30cm;
(4) Acid washing: soaking the band saw blade matrix 1 subjected to sand blasting in pickling solution for 30min, then taking out, cleaning and drying; the pickling solution consists of 15 parts by weight of nitric acid, 8 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 70 ℃;
(5) And (3) passivation treatment: soaking the band saw blade matrix 1 subjected to acid washing treatment in a passivating solution for 30min, and then taking out the band saw blade matrix to be cleaned and dried; the passivation solution consists of 10 parts by weight of citric acid, 5 parts by weight of oxalic acid, 5 parts by weight of phosphoric acid, 10 parts by weight of cetyltrimethylammonium bromide, 20 parts by weight of sodium molybdate and 15 parts by weight of deionized water, and the temperature of the passivation solution is 50 ℃.
(6) Depositing a CrN bonding layer 2: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 300sccm, and the filling amount of the argon is 200sccm so as to adjust the pressure in the cavity to 0.3Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 40r/min, and heating the band saw blade matrix 1 to 200 ℃; applying a bias voltage of-150V to the band saw blade substrate 1, applying a sputtering current of 15A to the Cr target, and performing magnetron sputtering on the surface of the band saw blade substrate 1 for 20min to deposit a CrN bonding layer 2 with a thickness of 1.5 μm; the Cr element in the CrN bonding layer 2 accounts for 50wt percent, and the N element accounts for 50wt percent;
(7) Depositing a CrAlN transition layer 3: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 300sccm, and the filling amount of the argon is 200sccm so as to adjust the pressure in the cavity to 1Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 40r/min, and heating the band saw blade matrix 1 to 200 ℃; applying a bias voltage of-90V to the band saw blade substrate 1, applying a sputtering current of 5A to the Cr target, applying a sputtering current of 8A to the Al target, and performing magnetron sputtering on the surface of the CrN bonding layer 2 for 30min to deposit a CrAlN transition layer 3 with a thickness of 2.3 mu m; the Cr element in the CrAlN transition layer 3 accounts for 50wt%, the Al element accounts for 5wt% and the N element accounts for 45wt%;
(8) And depositing CrAlMoN a functional layer 4: fixing a band saw blade substrate 1 on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment to 10 -4 Pa, and filling argon and nitrogen into the cavity, wherein the filling amount of the nitrogen is 300sccm, and the filling amount of the argon is 200sccm so as to adjust the pressure in the cavity to 0.8Pa; starting a rotary table to drive the band saw blade matrix 1 to rotate at a rotating speed of 40r/min, and heating the band saw blade matrix 1 to 200 ℃; applying a bias voltage of-80V to the band saw blade substrate 1, applying a sputtering current of 5A to the Cr target, applying a sputtering current of 3A to the Al target, applying a sputtering current of 0.6A to the Mo target, and performing magnetron sputtering on the surface of the CrAlN transition layer 3 for 50min to deposit a CrAlMoN functional layer 4 with a thickness of 2.8 μm; the CrAlMoN functional layer 4 contains 40wt% of Cr element, 5wt% of Al element, 15wt% of Mo element and 40wt% of N element.
Finally, a bimetallic band saw blade shown in fig. 2 is prepared, which comprises a band saw blade substrate 1, and a CrN bonding layer 2, a CrAlN transition layer 3 and a CrAlMoN functional layer 4 which are sequentially formed on the surface of the band saw blade substrate 1.
Example 6
This example provides a method for manufacturing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (6), the bias voltage applied to the band saw blade substrate is adjusted to-100V, and other operation steps and process parameters are exactly the same as those of example 1.
Example 7
This example provides a method for manufacturing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (6), the bias voltage applied to the band saw blade substrate is adjusted to-180V, and other operation steps and process parameters are exactly the same as those of example 1.
Example 8
This example provides a method for producing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (7), the bias voltage applied to the band saw blade substrate is-70V, and other operation steps and process parameters are exactly the same as those of example 1.
Example 9
This example provides a method for producing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (7), the bias voltage applied to the band saw blade substrate is-100V, and other operation steps and process parameters are exactly the same as those of example 1.
Example 10
This example provides a method for producing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (8), the bias voltage applied to the band saw blade substrate is-60V, and other operation steps and process parameters are exactly the same as those of example 1.
Example 11
This example provides a method for producing a bi-metallic band saw blade having high toughness, which is different from example 1 in that in step (8), the bias voltage applied to the band saw blade substrate is-90V, and other operation steps and process parameters are exactly the same as those of example 1.
Comparative example
The comparative example provides a method for preparing a high-toughness bimetallic band saw blade, which is different from the embodiment 1 in that the step (8) is omitted, and the finally prepared bimetallic band saw blade only comprises a band saw blade substrate 1, a CrN bonding layer 2 and a CrAlN transition layer 3, and other operation steps and process parameters are identical to those of the embodiment 1.
The hardness and elastic modulus of the bimetallic band saw blades prepared in examples 1-11 and comparative examples were tested and the test results are shown in Table 1.
TABLE 1
| Hardness (GPa) | Elastic modulus (GPa) | |
| Example 1 | 43.4 | 438.6 |
| Example 2 | 44.6 | 443.4 |
| Example 3 | 45.2 | 450.3 |
| Example 4 | 47.7 | 458.7 |
| Example 5 | 46.5 | 454.9 |
| Example 6 | 38.3 | 397.8 |
| Example 7 | 40.6 | 409.4 |
| Example 8 | 36.4 | 375.3 |
| Example 9 | 37.8 | 389.2 |
| Example 10 | 32.3 | 363.1 |
| Example 11 | 34.1 | 370.3 |
| Comparative example | 28.9 | 332.1 |
As can be seen from the test data provided in Table 1, the hardness and elastic modulus of the bimetallic band saw blades prepared in examples 1-5 are higher than those of the bimetallic band saw blades prepared in examples 6-11 and comparative examples, which shows that the bimetallic band saw blade prepared by the preparation method provided by the invention has high hardness and high toughness.
As can be seen from the test data of example 1, example 6 and example 7, the hardness and elastic modulus of the bimetallic band saw blade prepared in example 6 and example 7 are lower than those of example 1, because the too high or too low bias voltage affects the surface morphology of the CrN bonding layer during the magnetron sputtering deposition of the CrN bonding layer, so that more particles and pits appear on the surface of the CrN bonding layer, the surface flatness and uniformity of the CrN bonding layer are seriously affected, the interface bonding strength between the composite coating and the band saw blade substrate is further affected, and finally the hardness and elastic modulus of the bimetallic band saw blade are affected.
As can be seen from the test data of example 1, example 8 and example 9, the hardness and the elastic modulus of the bimetallic strip saw blade prepared in example 8 and example 9 are lower than those of example 1, because the too high or too low bias voltage can influence the surface morphology of the CrAlN transition layer in the process of magnetron sputtering deposition of the CrAlN transition layer, so that more particles and pits appear on the surface of the CrAlN transition layer, and the surface flatness and uniformity of the CrAlN transition layer are seriously influenced, and further, the hardness and the elastic modulus of the bimetallic strip saw blade are influenced.
As can be seen from the test data of example 1, example 10 and example 11, the hardness and elastic modulus of the bimetallic band saw blade prepared in example 10 and example 11 are lower than those of example 1, because the too high or too low bias voltage affects the surface morphology of the CrAlMoN functional layer during magnetron sputtering deposition CrAlMoN, so that more particles and pits appear on the surface of the CrAlMoN functional layer, which seriously affects the surface flatness and uniformity of the CrAlMoN functional layer, and further affects the hardness and elastic modulus of the bimetallic band saw blade.
Fig. 3 and fig. 5 are scanning electron microscope images of the surface microscopic morphologies of the CrAlN transition layer and the CrAlMoN functional layer respectively, and fig. 4 and fig. 6 are scanning electron microscope images of the cross-section microscopic morphologies of the CrAlN transition layer and the CrAlMoN functional layer respectively, as can be seen from the figures, the surface of the CrAlN transition layer is relatively compact, and the cross-section of the CrAlN transition layer is grown in a relatively thin columnar crystal structure; compared with the CrAlN transition layer, the CrAlMoN functional layer has a more compact surface structure, the columnar crystal of the section of the functional layer is gradually thinned, and the compactness is obviously improved.
FIGS. 7 and 8 are scanning electron microscope images of the microscopic morphology of the grinding marks of the bimetallic band saw blade prepared in example 1 and comparative example, respectively, and it can be seen from the figures that the grinding marks of the bimetallic band saw blade in FIG. 8 are wider, the depth of the grinding marks reaches about 300nm, grinding dust is accumulated at the edges of the grinding marks, and microcracks at a plurality of positions appear. Whereas the wear scar of the bi-metal band saw blade in fig. 7 is narrowed and has a shallow depth, no significant accumulation of wear debris on both sides of the wear scar, indicating a small amount of wear, indicates that CrAlMoN functional layers can significantly improve the wear resistance of the bi-metal band saw blade.
The applicant declares that the above is only a specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and it should be apparent to those skilled in the art that any changes or substitutions that are easily conceivable within the technical scope of the present invention disclosed by the present invention fall within the scope of the present invention and the disclosure.
Claims (7)
1. A method for preparing a bimetallic band saw blade with high toughness, which is characterized by comprising the following steps:
ultrasonic cleaning is carried out on the surface of a band saw blade matrix, heat treatment is carried out on the band saw blade matrix after drying, and then sand blasting treatment, acid pickling treatment and passivation treatment are sequentially carried out on the surface of the band saw blade matrix after heat treatment;
(II) depositing a CrN bonding layer on the surface of the band saw blade matrix by adopting a magnetron sputtering process;
(III) depositing a CrAlN transition layer on the surface of the Cr transition layer by adopting a magnetron sputtering process;
(IV) depositing a CrAlMoN functional layer on the surface of the CrAlN transition layer by adopting a magnetron sputtering process;
In the step (II), the operation steps of the magnetron sputtering process of the CrN bonding layer comprise:
Fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; applying bias voltage to the band saw blade matrix, applying sputtering current to the Cr target, and depositing and forming the CrN bonding layer on the surface of the band saw blade matrix;
The vacuum degree in the cavity of the vacuum coating equipment is 10 -5~10-4 Pa;
the nitrogen gas is introduced into the reactor at an amount of 200-300 sccm;
The argon gas is introduced into the furnace at an amount of 100-200 sccm;
Sputtering air pressure in the cavity of the vacuum coating equipment is 0.1-0.3 Pa;
the rotating speed of the rotary table is 30-40 r/min;
the heating temperature of the band saw blade matrix is 100-200 ℃;
The bias voltage applied to the band saw blade matrix is-120 to-150V;
the sputtering current applied to the Cr target is 5-15A;
the deposition time of the magnetron sputtering is 10-20 min;
In the step (III), the operation steps of the magnetron sputtering process of the CrAlN transition layer comprise:
Fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; applying bias to the band saw blade matrix, independently applying sputtering current to the Cr target and the Al target respectively, and depositing the CrAlN transition layer on the surface of the CrN bonding layer;
The vacuum degree in the cavity of the vacuum coating equipment is 10 -5~10-4 Pa;
the nitrogen gas is introduced into the reactor at an amount of 200-300 sccm;
The argon gas is introduced into the furnace at an amount of 100-200 sccm;
sputtering air pressure in the cavity of the vacuum coating equipment is 0.8-1 Pa;
the rotating speed of the rotary table is 30-40 r/min;
the heating temperature of the band saw blade matrix is 100-200 ℃;
The bias voltage applied to the band saw blade matrix is-80 to-90V;
the sputtering current applied to the Cr target is 3-5A;
the sputtering current applied to the Al target is 5-8A;
The deposition time of the magnetron sputtering is 20-30 min;
The magnetron sputtering process of the CrAlMoN functional layer comprises the following operation steps:
Fixing a band saw blade matrix on a rotary table in a cavity of vacuum coating equipment, vacuumizing the cavity of the vacuum coating equipment, and filling argon and nitrogen into the cavity so as to adjust the pressure in the cavity to the sputtering pressure; starting a turntable to drive the band saw blade matrix to rotate and heat the band saw blade matrix; applying bias voltage to the band saw blade matrix, independently applying sputtering current to the Cr target, the Al target and the Mo target respectively, and depositing and forming the CrAlMoN functional layer on the surface of the CrAlN transition layer;
The vacuum degree in the cavity of the vacuum coating equipment is 10 -5~10-4 Pa;
the nitrogen gas is introduced into the reactor at an amount of 200-300 sccm;
The argon gas is introduced into the furnace at an amount of 100-200 sccm;
sputtering air pressure in the cavity of the vacuum coating equipment is 0.7-0.8 Pa;
the rotating speed of the rotary table is 30-40 r/min;
the heating temperature of the band saw blade matrix is 100-200 ℃;
The bias voltage applied to the band saw blade matrix is-70 to-80V;
the sputtering current applied to the Cr target is 3-5A;
the sputtering current applied to the Al target is 1-3A;
The sputtering current applied to the Mo target is 0.5-0.6A;
the magnetron sputtering time is 40-50 min.
2. The method according to claim 1, wherein in the step (i), the ultrasonic power used for the ultrasonic cleaning is 300 to 400w;
The ultrasonic cleaning time is 40-50 min;
The cleaning medium used for ultrasonic cleaning is absolute ethyl alcohol.
3. The method of claim 1, wherein in step (i), the heat treatment process comprises:
(1) Quenching: heating the band saw blade matrix to 850-950 ℃, preserving heat for 1-2min, and then carrying out oil quenching at a cooling speed of 80-100 ℃/s until the band saw blade matrix is cooled to room temperature;
(2) Tempering: continuously heating the band saw blade matrix to 520-600 ℃, preserving heat for 3-5 minutes, and cooling to room temperature to finish tempering operation;
(3) Repeating the tempering operation of the step (2) for 3 to 6 times.
4. The method according to claim 1, wherein in the step (i), the sand material used for the blasting treatment comprises any one or a combination of at least two of brown alumina, garnet, white corundum, glass beads and silicon carbide;
The granularity of the sand is 100-120 meshes;
the sand blasting pressure of the sand blasting treatment is 0.6-0.8 MPa;
The time of the sand blasting treatment is 50-60 min;
The spraying direction of a nozzle of spraying equipment adopted in the sand blasting treatment is kept perpendicular to the surface of the band saw blade matrix, and the perpendicular distance between the nozzle and the surface of the band saw blade matrix is 20-30 cm;
The pickling treatment process comprises the following steps: soaking the band saw blade matrix in pickling solution for 20-30 min, then taking out, cleaning and drying; the pickling solution comprises 10-15 parts by weight of nitric acid, 2-8 parts by weight of hydrofluoric acid and 100 parts by weight of deionized water, wherein the temperature of the pickling solution is 60-70 ℃;
The passivation treatment process comprises the following steps: soaking the band saw blade matrix in the passivation solution for 20-30 min, then taking out, cleaning and drying; the passivation solution consists of 5-10 parts by weight of citric acid, 2-5 parts by weight of oxalic acid, 2-5 parts by weight of phosphoric acid, 5-10 parts by weight of cationic surfactant, 10-20 parts by weight of sodium molybdate and 10-15 parts by weight of deionized water, and the temperature of the passivation solution is 40-50 ℃.
5. A bimetal band saw blade with high toughness prepared by the preparation method according to any one of claims 1 to 4, which is characterized by comprising a band saw blade substrate, and a CrN bonding layer, a CrAlN transition layer and a CrAlMoN functional layer which are sequentially formed on the surface of the band saw blade substrate.
6. The high toughness bi-metallic band saw blade according to claim 5, wherein the band saw blade base comprises the following elements in weight percent: 1.38-1.45 wt% of C, 0.3-0.4 wt% of Si, 0.5-0.6 wt% of Mn, 3.8-4 wt% of Cr, 0.5-0.7 wt% of Ni, 2-2.5 wt% of Mo, 1.4-1.8 wt% of V, 0.08-0.20 wt% of Nb, 0.02-0.03 wt% of Al and the balance of Fe;
the CrN bonding layer comprises the following elements in percentage by weight: 40-50wt% of Cr element and 50-60wt% of N element;
the CrAlN transition layer comprises the following elements in percentage by weight: 40-50wt% of Cr element, 5-8wt% of Al element and 45-55wt% of N element;
the CrAlMoN functional layer comprises the following elements in percentage by weight: 30-40 wt% of Cr element, 3-5 wt% of Al element, 15-20 wt% of Mo element and 40-50 wt% of N element.
7. The high-toughness bimetallic strip saw blade as claimed in claim 6, wherein said CrN bond layer has a thickness of 0.5-1.5 μm;
the thickness of the CrAlN transition layer is 1.8-2.3 mu m;
The thickness of the CrAlMoN functional layer is 2.6-2.8 mu m.
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| CN105624623A (en) * | 2016-01-26 | 2016-06-01 | 浙江工业大学 | CrMoAlN coating on cold work die steel substrate and preparation method and performance test method of CrMoAlN coating |
| CN113584438A (en) * | 2021-07-30 | 2021-11-02 | 湖南泰嘉新材料科技股份有限公司 | Periodic multilayer structure coating band saw blade and preparation method and application thereof |
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| CN105624623A (en) * | 2016-01-26 | 2016-06-01 | 浙江工业大学 | CrMoAlN coating on cold work die steel substrate and preparation method and performance test method of CrMoAlN coating |
| CN113584438A (en) * | 2021-07-30 | 2021-11-02 | 湖南泰嘉新材料科技股份有限公司 | Periodic multilayer structure coating band saw blade and preparation method and application thereof |
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