CN117718829A - Automatic resistor disc polishing equipment - Google Patents
Automatic resistor disc polishing equipment Download PDFInfo
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- CN117718829A CN117718829A CN202311788240.8A CN202311788240A CN117718829A CN 117718829 A CN117718829 A CN 117718829A CN 202311788240 A CN202311788240 A CN 202311788240A CN 117718829 A CN117718829 A CN 117718829A
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- Prior art keywords
- resistor disc
- station
- rotating
- floating
- mounting plate
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- 238000005498 polishing Methods 0.000 title claims abstract description 69
- 238000007599 discharging Methods 0.000 claims abstract description 26
- 230000007246 mechanism Effects 0.000 claims description 178
- 238000007667 floating Methods 0.000 claims description 79
- 238000001179 sorption measurement Methods 0.000 claims description 23
- 230000006835 compression Effects 0.000 claims description 12
- 238000007906 compression Methods 0.000 claims description 12
- 230000002457 bidirectional effect Effects 0.000 claims description 8
- 230000000149 penetrating effect Effects 0.000 claims description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 238000005507 spraying Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 5
- 230000003139 buffering effect Effects 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
The invention discloses an automatic resistor disc polishing device, which comprises: the device comprises a workbench, a feeding device, a multi-station rotating device, a feeding and discharging device, a rotating positioning device, a polishing device and a discharging device, wherein the feeding device, the multi-station rotating device, the feeding and discharging device, the rotating positioning device, the polishing device and the discharging device are arranged on the workbench; the multi-station rotating device is used for performing multi-station rotation; the feeding device is used for feeding the resistor disc to be polished to the idle station of the multi-station rotating device; the rotary positioning device is used for fixing the resistor disc to be polished and driving the resistor disc to be polished to rotate; the polishing device is used for polishing the rotating resistor disc to be polished; the feeding and discharging device is used for placing the resistor disc to be polished, which is positioned on a certain station on the multi-station rotating device, on the rotating positioning device and simultaneously placing the polished resistor disc positioned on the rotating positioning device on the station; the blanking device is used for blanking the polished resistor disc on the multi-station rotating device. The invention effectively improves the working efficiency.
Description
Technical Field
The invention relates to the technical field of resistor disc processing equipment, in particular to automatic resistor disc polishing equipment.
Background
The zinc oxide resistor disc is the core device of the arrester. In order to make the conductivity between the zinc oxide resistor sheets better, aluminum spraying and edge-keeping treatment are performed on the zinc oxide resistor sheets when the zinc oxide resistor sheets are processed. Traditional aluminum spraying and edge leaving process needs to rely on manual disassembly and assembly of aluminum spraying fixtures to realize aluminum spraying treatment on upper and lower end faces of the resistor disc, and is complex in operation, heavy in labor intensity of operators and unstable in production quality. The existing partial aluminum spraying and edge retaining equipment needs to polish and chamfer the end face edges of the zinc oxide resistor sheets after aluminum spraying one by one, and has low working efficiency.
Disclosure of Invention
In order to solve the technical problems in the background technology, the invention provides automatic resistor disc polishing equipment.
The invention provides automatic resistor disc polishing equipment, which comprises the following components: the device comprises a workbench, a feeding device, a multi-station rotating device, a feeding and discharging device, a rotating and positioning device, a polishing device and a discharging device;
the multi-station rotating device is arranged on the workbench, and the feeding device, the rotary positioning device and the discharging device are sequentially arranged on the workbench along the circumferential direction of the multi-station rotating device;
the multi-station rotating device is used for performing multi-station rotation;
the feeding device is used for feeding the resistor disc to be polished to the idle station of the multi-station rotating device;
the rotary positioning device is used for fixing the resistor disc to be polished and driving the fixed resistor disc to be polished to rotate;
the polishing device is arranged on the workbench at one side of the rotary positioning device and is used for polishing the rotating resistor disc to be polished;
the feeding and discharging device is arranged on a workbench between the rotary positioning device and the multi-station rotary device, and is used for placing the resistor disc to be polished on a certain station on the multi-station rotary device on the rotary positioning device and simultaneously placing the polished resistor disc on the rotary positioning device on the station;
the blanking device is used for blanking the polished resistor disc on the multi-station rotating device.
Preferably, the rotational positioning device and the sanding head of the sanding device are rotated in the same direction.
Preferably, the loading and unloading device comprises: the device comprises a first bracket, a first vertical moving mechanism, a first mounting plate, a first rotating mechanism, a second mounting plate and two adsorption mechanisms; the first vertical moving mechanism is arranged on the first bracket, and the moving end of the first vertical moving mechanism can move up and down along the vertical direction relative to the first bracket; the first mounting plate is horizontally arranged, one end of the first mounting plate is fixedly connected with the moving end of the first vertical moving mechanism, and the other end of the first mounting plate is a free end;
the second mounting plate is horizontally arranged below the free end of the first mounting plate; the first rotating mechanism is arranged at the free end of the first mounting plate, and an output shaft of the first rotating mechanism penetrates through the first mounting plate and is fixedly connected with the middle part of the second mounting plate; the output shaft of the rotation driving mechanism can rotate relative to the first mounting plate by taking the self axis as the center; the two adsorption mechanisms are located below the second mounting plate and fixedly connected with the two ends of the second mounting plate in one-to-one correspondence respectively, and the adsorption mechanisms are used for adsorbing the resistor disc.
Preferably, a buffer mechanism is connected between each adsorption mechanism and the second mounting plate.
Preferably, the buffer mechanism comprises a first connecting plate, a second connecting plate, two connecting columns, two first guide columns, two first limiting plates and two elastic sleeves; the second connecting plate is fixed at the top of the adsorption mechanism, and the first connecting plate is horizontally arranged between the second connecting plate and the second mounting plate; the two connecting columns are connected between the first connecting plate and the second mounting plate; the top ends of the two first guide posts penetrate through the two sixth through holes in a one-to-one correspondence manner and are fixedly connected with the two first limiting plates in a one-to-one correspondence manner; the two elastic sleeves are sleeved on the two first guide posts in one-to-one correspondence, and the bottom ends of the elastic sleeves are fixedly connected with the second connecting plate and the first connecting plate respectively.
Preferably, the first rotating mechanism comprises a motor seat and a first motor, a fifth through hole is formed in the free end of the first mounting plate, a first waist-shaped through hole is formed in the position, corresponding to the fifth through hole, of the motor seat, and the motor seat is fixed to the free end of the first mounting plate through a first fastening bolt penetrating through the fifth through hole and the first waist-shaped through hole and a first fastening nut matched with the first fastening bolt; a second waist-shaped through hole for the output shaft of the first motor to pass through is formed at the corresponding position of the first mounting plate and the output shaft of the first motor; the first motor is fixed on the motor cabinet, and the output shaft of first motor passes second kidney-shaped through-hole and is fixedly connected with the middle part of second mounting panel.
Preferably, the grinding device comprises: the device comprises a second bracket, a second vertical moving mechanism, a horizontal moving mechanism, an angle adjusting mechanism and a polishing mechanism; the second vertical moving mechanism is arranged on the second bracket, and the moving end of the second vertical moving mechanism can move up and down along the vertical direction relative to the second bracket; the horizontal moving mechanism is arranged on the moving end of the second vertical moving mechanism, and the moving end of the horizontal moving mechanism can move along the horizontal direction relative to the moving end of the second vertical moving mechanism; the angle adjusting mechanism is arranged on the moving end of the horizontal moving mechanism, and the rotating end of the angle adjusting mechanism can rotate relative to the horizontal moving mechanism; the polishing mechanism is arranged at the rotating end of the angle adjusting mechanism and is used for polishing the resistor disc.
Preferably, a bidirectional floating mechanism is connected between the polishing mechanism and the angle adjusting mechanism.
Preferably, the bidirectional floating mechanism comprises a first floating component arranged on the angle adjusting mechanism and a second floating component arranged on the first floating component, the floating direction of the second floating component and the first floating component is vertical, the grinding mechanism is arranged on the second floating component, and the axial direction of a grinding head of the grinding mechanism is parallel to the floating direction of the second floating component or the floating direction of the first floating component;
wherein the first floating assembly and the second floating assembly each comprise a first floating plate and a second floating plate which are oppositely arranged, the first floating plate is fixed and the second floating plate floats; the first floating plate is symmetrically provided with third connecting plates at two ends in the floating direction, and a second guide column is vertically connected between the two third connecting plates; the two ends of the second floating plate in the floating direction are symmetrically provided with fourth connecting plates, and the two fourth connecting plates are positioned in the middle of the two third connecting plates and are respectively connected with the second guide posts in a sliding manner; two second limiting plates are fixedly arranged on the second guide post between the two fourth connecting plates along the axial direction, and a second compression spring is sleeved on the second guide post between the second limiting plate and the fourth connecting plate adjacent to the second limiting plate.
Preferably, a first through hole is formed in the position, corresponding to the second guide column, of the fourth connecting plate, a sleeve is coaxially fixed in the first through hole, sleeves on the two fourth connecting plates are oppositely arranged, and a stepped through hole structure with large middle and small two ends is arranged in the sleeve; the second limiting plate is slidably connected in the middle of the sleeve, the second guide posts are slidably connected with two end ports of the sleeve respectively, and the second compression spring is connected between the second limiting plate and one end port of the sleeve.
Preferably, two limiting blocks are arranged on one surface of each fourth connecting plate facing the adjacent third connecting plate, the two limiting blocks are symmetrically arranged on two sides of the second guide post, and limiting screws used for limiting the stroke of the limiting blocks are in threaded connection with the corresponding positions of the third connecting plates and the limiting blocks.
Preferably, the multi-station rotating device comprises a third support fixed on the workbench and a multi-station rotary table mechanism arranged on the third support, the multi-station rotary table mechanism comprises a cam divider and a multi-station rotary table, the cam divider is arranged on the third support, the multi-station rotary table is connected with a driving shaft of the cam divider, the cam divider is used for driving the multi-station rotary table to rotate, and a plurality of stations for placing the resistor disc are uniformly arranged on the multi-station rotary table along the circumferential direction at intervals.
Preferably, the rotary positioning device comprises a fourth bracket, a second rotating mechanism and a pneumatic three-jaw chuck, wherein the second rotating mechanism is arranged on the fourth bracket, and the rotating end of the second rotating mechanism can rotate relative to the fourth bracket by taking the axis of the second rotating mechanism as the center; the pneumatic three-jaw chuck is coaxially arranged on the rotating end of the second rotating mechanism and is used for positioning the resistor disc to be polished.
When the resistor disc polishing device is particularly used, the resistor disc to be polished is fed to the idle station of the multi-station rotating device by the feeding device; the multi-station rotating device rotates, and the feeding and discharging device places the resistor disc to be polished on a certain station on the multi-station rotating device on the rotary positioning device and simultaneously places the polished resistor disc on the rotary positioning device on the station; the rotary positioning device is used for fixing the resistor disc to be polished and driving the fixed resistor disc to be polished to rotate; the polishing device polishes the rotating resistor disc to be polished; and the blanking device is used for blanking the polished resistor disc positioned on the multi-station rotating device.
According to the automatic resistor disc polishing equipment, full-automatic edging treatment can be carried out on the resistor disc subjected to aluminum spraying, so that the working efficiency is effectively improved, the labor intensity of workers is reduced, and the product quality is improved; and the resistor disc to be polished, which is positioned on a certain station of the multi-station rotating device, is placed on the rotating positioning device through the feeding and discharging device, and meanwhile, the resistor disc which is positioned on the rotating positioning device and is polished is placed on the station, so that the working efficiency is further improved.
Drawings
Fig. 1 is a schematic structural diagram of an automatic resistor disc polishing apparatus (blanking device is not shown) according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a loading and unloading device according to an embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a buffering mechanism according to an embodiment of the present invention.
Fig. 4 is a schematic structural view of a polishing apparatus according to an embodiment of the present invention.
Fig. 5 is a schematic structural diagram of a bidirectional floating mechanism according to an embodiment of the present invention.
Fig. 6 is a schematic structural diagram of a bidirectional floating mechanism according to another embodiment of the present invention.
Fig. 7 is a schematic structural diagram of a rotary positioning device according to an embodiment of the invention.
Detailed Description
It should be noted that, without conflict, the embodiments of the present invention and features of the embodiments may be combined with each other. The invention will be described in detail below with reference to the drawings in connection with embodiments.
Referring to fig. 1, the present invention provides an automatic resistor disc polishing apparatus, comprising: the device comprises a workbench 1000, a feeding device 2000, a multi-station rotating device 3000, a feeding and discharging device 5000, a rotating positioning device 4000, a polishing device 6000 and a discharging device;
the multi-station rotating device 3000 is mounted on the workbench 1000, and the feeding device 2000, the rotary positioning device 4000 and the discharging device are sequentially arranged on the workbench 1000 along the circumferential direction of the multi-station rotating device 3000;
the multi-station rotating device 3000 is used for performing multi-station rotation;
the feeding device 2000 is used for feeding the resistor disc to be polished to an empty station of the multi-station rotating device 3000;
the rotary positioning device 4000 is used for fixing the resistor disc to be polished and driving the fixed resistor disc to be polished to rotate;
the polishing device 6000 is arranged on the workbench 1000 at one side of the rotary positioning device 4000, and the polishing device 6000 is used for polishing the rotating resistor disc to be polished;
the feeding and discharging device 5000 is arranged on the workbench 1000 between the rotary positioning device 4000 and the multi-station rotary device 3000, and the feeding and discharging device 5000 is used for placing a resistor disc to be polished on a certain station on the multi-station rotary device 3000 on the rotary positioning device 4000 and simultaneously placing the resistor disc to be polished on the rotary positioning device 4000 on the station;
the blanking device is used for blanking the polished resistor disc on the multi-station rotating device 3000.
When the invention is particularly used, the feeding device 2000 feeds the resistor disc to be polished to the idle station of the multi-station rotating device 3000; the multi-station rotating device 3000 rotates, and the feeding and discharging device 5000 places the resistor disc to be polished on a certain station on the multi-station rotating device 3000 on the rotating positioning device 4000 and simultaneously places the polished resistor disc on the rotating positioning device 4000 on the station; the rotary positioning device 4000 is used for fixing the resistor disc to be polished and driving the fixed resistor disc to be polished to rotate; polishing device 6000 polishes the rotating resistor disc to be polished; the discharging device discharges the polished resistor disc positioned on the multi-station rotating device 3000.
The invention can carry out full-automatic edging treatment on the sprayed aluminum resistor disc, effectively improves the working efficiency, reduces the labor intensity of workers and improves the product quality; and the resistor disc to be polished, which is positioned on a certain station on the multi-station rotating device 3000, is placed on the rotating positioning device 4000 through the feeding and discharging device 5000, and meanwhile, the resistor disc which is positioned on the rotating positioning device 4000 and is polished is placed on the station, so that the working efficiency is further improved.
In order to ensure that the resistor disc is smooth on the ground surface during grinding, and does not collapse, in this embodiment,
the polishing heads of the rotary positioning device 4000 and the polishing device 6000 are rotated in the same direction.
As shown in fig. 2 and 3, in this embodiment, the loading and unloading device 5000 includes: a first carriage 5100, a first vertical movement mechanism, a first mounting plate 5400, a first rotation mechanism, a second mounting plate 5700, and two adsorption mechanisms 5800; the first vertical moving mechanism is mounted on the first bracket 5100, and a moving end of the first vertical moving mechanism can move up and down in a vertical direction relative to the first bracket 5100; the first mounting plate 5400 is horizontally arranged, one end of the first mounting plate 5400 is fixedly connected with the moving end of the first vertical moving mechanism, and the other end is a free end;
the second mounting plate 5700 is horizontally disposed below the free end of the first mounting plate 5400; the first rotating mechanism is arranged on the free end of the first mounting plate 5400, and an output shaft of the first rotating mechanism penetrates through the first mounting plate 5400 and is fixedly connected with the middle part of the second mounting plate 5700; an output shaft of the rotation driving mechanism is rotatable about its own axis with respect to the first mounting plate 5400; the two adsorption mechanisms 5800 are located below the second mounting plate 5700, and the two adsorption mechanisms 5800 are fixedly connected with two ends of the second mounting plate 5700 in one-to-one correspondence, and the adsorption mechanisms 5800 are used for adsorbing the resistor disc.
In specific implementation, the first rotating mechanism works to enable the second mounting plate 5700 to rotate until the two adsorbing mechanisms 5800 are respectively positioned above the resistor to be polished on a certain station on the multi-station rotating device 3000 and above the resistor just polished on the rotating positioning device 4000;
then, the first vertical moving mechanism works to enable the second mounting plate 5700 to move downwards, so that the two adsorption mechanisms 5800 respectively contact the resistor disc to be polished and the resistor disc after polishing; the two adsorption mechanisms 5800 work to adsorb the resistor disc to be polished and the resistor disc after polishing respectively;
then, after the first vertical moving mechanism works to enable the second mounting plate 5700 to move upwards to a certain distance, the first rotating mechanism works to enable the second mounting plate 5700 to rotate 180 degrees, so that the resistor to be polished is located above the rotary positioning device 4000 and the resistor after polishing is located above the station on the multi-station rotary device 3000;
then, when the first vertical moving mechanism works, the second mounting plate 5700 moves downwards until the resistor to be polished is positioned on the rotary positioning device 4000 and the resistor after polishing is positioned on the station of the multi-station rotary device 3000;
then, the two adsorption mechanisms 5800 stop working, and the first vertical moving mechanism works to enable the second mounting plate 5700 to move upwards, so that one-time feeding of the resistor disc to be polished and one-time discharging of the resistor disc to be polished are completed.
According to the invention, the feeding of the resistor disc to be polished and the discharging of the polished resistor disc can be completed at the same time through one round trip, so that the working efficiency is greatly improved.
In a further embodiment, a buffer mechanism 5900 is connected between each adsorption mechanism 5800 and the second mounting plate 5700, so that the adsorption mechanism 5800 can automatically level and compensate for adsorption errors.
In a still further embodiment, as shown in fig. 3, the cushioning mechanism 5900 includes a first connecting plate 5901, a second connecting plate 5902, two connecting posts 5903, two first guide posts 5904, two first limiting plates 5905, and two elastic sleeves 5906; the second connecting plate 5902 is fixed on top of the adsorption mechanism 5800, and the first connecting plate 5901 is horizontally arranged between the second connecting plate 5902 and the second mounting plate 5700; both connecting posts 5903 are connected between the first connecting plate 5901 and the second mounting plate 5700; the two first guide posts 5904 are vertically fixed on the top surface of the second connecting plate 5902, sixth through holes for sliding connection of the corresponding first guide posts 5904 are formed in the positions, corresponding to the first guide posts 5904, of the first connecting plate 5901, and the top ends of the two first guide posts 5904 penetrate through the two sixth through holes in a one-to-one correspondence manner and are fixedly connected with the two first limiting plates 5905 in a one-to-one correspondence manner; the two elastic sleeves 5906 are sleeved on the two first guide posts 5904 in a one-to-one correspondence manner, and the bottom ends of the elastic sleeves 5906 are fixedly connected with the second connecting plate 5902 and the first connecting plate 5901 respectively.
So set up, when adsorption equipment 5800 atress, buffer gear 5900 can carry out elasticity flexible in vertical direction, and first limiting plate 5905, first connecting plate 5901 and elastic sleeve 5906 cooperate the upper and lower limit that the buffering of restriction buffer gear 5900, avoid compression or tensile degree to surpass the limit of elastic sleeve 5906 moreover.
Specifically, the elastic sleeve 5906 is a first compression spring.
In this embodiment, the suction mechanism 5800 includes a suction cup that is connected to an external suction pump via an air tube.
In this embodiment, the first rotating mechanism includes a motor base 5600 and a first motor 5500, a fifth through hole is formed on a free end of the first mounting plate 5400, a first kidney-shaped through hole is formed at a position corresponding to the fifth through hole of the motor base 5600, and the motor base 5600 is fixed on the free end of the first mounting plate 5400 through a first fastening bolt passing through the fifth through hole and the first kidney-shaped through hole and a first fastening nut matching the first fastening bolt; a second kidney-shaped through hole for the output shaft of the first motor 5500 to pass through is formed in the corresponding position of the first mounting plate 5400 and the output shaft of the first motor 5500; the first motor 5500 is fixed on the motor base 5600, and the output shaft of the first motor 5500 passes through the second kidney-shaped through hole and is fixedly connected with the middle part of the second mounting plate 5700.
In this embodiment, the positions of the first rotating mechanism, the second mounting plate 5700, and the suction mechanism 5800 mounted on the second mounting plate 5700 can be finely adjusted, and the loading and unloading positions can be adjusted.
In the present embodiment, the first vertical moving mechanism includes a guide rail 5200 fixed on the first bracket 5100 in the vertical direction, a slider 5300 slidably connected to the guide rail 5200 in the vertical direction, and a vertical driving assembly for driving the slider 5300 to slide along the guide rail 5200; the first mounting plate 5400 is fixedly connected to the slider 5300.
In a further embodiment, a stiffener is coupled between the slider 5300 and the first mounting plate 5400 to enhance the load bearing capacity and stability of the first mounting plate 5400.
As shown in fig. 4 to 6, in the present embodiment, the polishing apparatus 6000 includes: a second bracket 6100, a second vertical movement mechanism 6200, a horizontal movement mechanism 6300, an angle adjustment mechanism 6400, and a polishing mechanism 6600; the second vertical movement mechanism 6200 is mounted on the second bracket 6100, and a movement end of the second vertical movement mechanism 6200 can move up and down in the vertical direction with respect to the second bracket 6100; the horizontal movement mechanism 6300 is mounted on the movement end of the second vertical movement mechanism 6200, and the movement end of the horizontal movement mechanism 6300 is movable in the horizontal direction with respect to the movement end of the second vertical movement mechanism 6200; the angle adjustment mechanism 6400 is mounted on the moving end of the horizontal movement mechanism 6300, and the rotating end of the angle adjustment mechanism 6400 can rotate relative to the horizontal movement mechanism 6300; the polishing mechanism 6600 is mounted on the rotating end of the angle adjustment mechanism 6400, and the polishing mechanism 6600 is used for polishing the resistor disc.
In the polishing process of the resistor, errors exist in the diameters of different resistor, so that a polishing grinding head of the polishing mechanism 6600 can be attached to the resistor, and accordingly the precision of automatic chamfering of the resistor is guaranteed, and in the embodiment, a bidirectional floating mechanism 6500 is connected between the polishing mechanism 6600 and the angle adjusting mechanism 6400.
As shown in fig. 5, in the present embodiment, the bidirectional floating mechanism 6500 includes a first floating assembly mounted on the angle adjusting mechanism 6400 and a second floating assembly mounted on the first floating assembly, the floating direction of the second floating assembly and the first floating assembly is perpendicular, the grinding mechanism 6600 is mounted on the second floating assembly, and the axial direction of the grinding head of the grinding mechanism 6600 is parallel to the floating direction of the second floating assembly or the floating direction of the first floating assembly;
wherein the first floating assembly and the second floating assembly each comprise a first floating plate 6501 and a second floating plate 6502 arranged opposite each other, the first floating plate 6501 being fixed and the second floating plate 6502 floating; the first floating plate 6501 is symmetrically provided with third connecting plates 6503 at two ends in the floating direction, and a second guide post 6504 is vertically connected between the two third connecting plates 6503; the two ends of the second floating plate 6502 in the floating direction are symmetrically provided with fourth connecting plates 6505, and the two fourth connecting plates 6505 are positioned in the middle of the two third connecting plates 6503 and are respectively connected with the second guide posts 6504 in a sliding manner; two second limiting plates 6509 are fixedly arranged on the second guide posts 6504 between the two fourth connecting plates 6505 along the axial direction, and second compression springs 6510 are sleeved on the second guide posts 6504 between the second limiting plates 6509 and the fourth connecting plates 6505 adjacent to the second limiting plates 6509.
In this embodiment, the second floating plate 6502 can elastically float in the axial direction of the guide post with respect to the first floating plate 6501. Therefore, the cooperation of second floating assembly and first floating assembly can make the grinding head of grinding machanism 6600 carry out two-way floating, has further guaranteed the laminating of grinding head and resistance card, has further improved the precision of polishing.
Specifically, the number of second guide posts 6504 is one or more.
As shown in fig. 6, in a further embodiment, a first through hole is formed at a position corresponding to the second guide post 6504 on the fourth connecting plate 6505, a sleeve 6508 is coaxially fixed in the first through hole, the sleeves 6508 on the two fourth connecting plates 6505 are oppositely arranged, and a stepped through hole structure with a large middle and two small ends is arranged inside the sleeve 6508; the second limiting plate 6509 is slidably connected in the middle of the sleeve 6508, the second guide posts 6504 are slidably connected with the two end ports of the sleeve 6508, respectively, and the second compression spring 6510 is connected between the second limiting plate 6509 and the one end port of the sleeve 6508.
By the arrangement, the second compression spring 6510 is wrapped inside the sleeve 6508, and waste scraps generated by polishing can be prevented from being sprayed into the second compression spring 6510, so that compression and stretching of the second compression spring 6510 are prevented from being influenced.
In a further embodiment, two limiting blocks 6506 are disposed on a surface of each fourth connecting plate 6505 facing an adjacent third connecting plate 6503, the two limiting blocks 6506 are symmetrically disposed on two sides of the second guiding post 6504, and a limiting screw 6507 for limiting the stroke of the limiting block 6506 is in threaded connection with a corresponding position of the third connecting plate 6503 and the limiting block 6506.
In this embodiment, the amount of floating force of the floating assembly can be manually adjusted by adjusting the stop screw 6507.
In one embodiment, the third connecting plate 6503 is provided with a screw hole matched with the limit screw 6507, and the limit screw 6507 is in threaded connection with the screw hole.
In another embodiment, the device further comprises two third fastening nuts, the third connecting plate 6503 is provided with a second through hole for the limit screw 6507 to pass through, the front end of the limit screw 6507 passes through the second through hole, the two third fastening nuts are respectively connected to the limit screws 6507 on two sides of the third connecting plate 6503 in a threaded manner, and the two third fastening nuts are matched to fix the limit screws 6507 on the third connecting plate 6503.
In this embodiment, the polishing mechanism 6600 includes a second motor and a polishing head, the second motor is mounted on the rotating end of the angle adjusting mechanism 6400, and the output shaft of the second motor extends vertically downwards and is detachably and fixedly connected with the polishing head, so that the polishing head is convenient to replace.
In this embodiment, a laser ranging sensor for detecting a distance between the resistive sheet and the polishing head is disposed on the first motor 5500 seat of the second motor located at one side of the polishing head.
This embodiment sets up, conveniently polishes the position of bistrique according to the distance between resistance card and the bistrique of polishing to accurate control polishes the bistrique and leaves the limit to the resistance card.
Specifically, the second motor adopts the brushless first motor 5500 of high speed, can adjust the speed of polishing, long service life, and it is steady to polish.
In this embodiment, the second vertical movement mechanism 6200 is a screw linear drive mechanism, a cylinder drive mechanism, an oil cylinder drive mechanism, or an electric push rod.
In this embodiment, the horizontal movement mechanism 6300 is a screw rod linear driving mechanism, a cylinder driving mechanism, an oil cylinder driving mechanism, or an electric push rod.
In the present embodiment, the angle adjustment mechanism 6400 is a manual angle adjustment mechanism 6400 or an automatic angle adjustment mechanism.
In one specific embodiment, the angle adjusting mechanism 6400 includes an adjusting seat, a rotating shaft, a mounting plate, a second fastening bolt and a second fastening nut, the adjusting seat is fixed on the moving end of the horizontal moving mechanism 6300, and the mounting plate is rotatably connected to the adjusting seat through the rotating shaft; the polishing mechanism 6600 is fixed on the mounting plate; a third through hole is formed in the adjusting seat located on one side of the rotating shaft, a fourth through hole corresponding to the third through hole is formed in the mounting disc along the circumferential direction, and the second fastening bolt is fixedly connected with the second fastening nut beyond the third through hole and one fourth through hole. Therefore, the angle can be adjusted by replacing the fourth through hole fixed with the second fastening bolt.
In this embodiment, the multi-station rotating device 3000 includes a third bracket fixed on the workbench 1000 and a multi-station turntable mechanism mounted on the third bracket, the multi-station turntable mechanism includes a cam divider and a multi-station turntable, the cam divider is mounted on the third bracket, the multi-station turntable is connected with a driving shaft of the cam divider, the cam divider is used for driving the multi-station turntable to rotate, and a plurality of stations for placing the resistor disc are uniformly and alternately arranged on the multi-station turntable along the circumferential direction.
The multi-station turntable mechanism in the embodiment adopts a cam divider, and has the characteristics of accurate indexing, stable motion curve, high-speed mechanical property and the like.
As shown in fig. 7, in the present embodiment, the rotational positioning device 4000 includes a fourth carrier 4100, a second rotation mechanism 4200, and an air three-jaw chuck 4300, the second rotation mechanism 4200 is mounted on the fourth carrier 4100, and a rotation end of the second rotation mechanism 4200 is rotatable with respect to the fourth carrier 4100 about its own axis; the pneumatic three-jaw chuck 4300 is coaxially mounted on a rotating end of the second rotating mechanism 4200, and the pneumatic three-jaw chuck 4300 is used for positioning a resistor sheet to be polished.
In this embodiment, when the resistive sheet to be polished is placed on the air three-jaw chuck 4300, the air three-jaw chuck 4300 clamps and positions the resistive sheet to be polished; second rotation mechanism 4200 operates to rotate air three-jaw chuck 4300, thereby facilitating sharpening or cutting of the rotating resistive sheet to be sharpened by sharpening mechanism 6600.
Of course, the air cylinder of the pneumatic three-jaw chuck 4300 in this embodiment is connected to the air source pipe through the rotary joint, so that it is ensured that air can be supplied to the air cylinder of the pneumatic three-jaw chuck 4300 during rotation, and the air pipe is not stranded.
In this embodiment, the loading device 2000 and the unloading device may be an existing resistor disc loading device 2000, or may be a mechanical arm.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (10)
1. An automatic resistor disc polishing device, comprising: the device comprises a workbench (1000), a feeding device (2000), a multi-station rotating device (3000), a feeding and discharging device (5000), a rotating positioning device (4000), a polishing device (6000) and a discharging device;
the multi-station rotating device (3000) is arranged on the workbench (1000), and the feeding device (2000), the rotary positioning device (4000) and the discharging device are sequentially arranged on the workbench (1000) along the circumferential direction of the multi-station rotating device (3000); the feeding and discharging device (5000) is arranged on the workbench (1000) between the rotary positioning device (4000) and the multi-station rotary device (3000); the polishing device (6000) is arranged on the workbench (1000) at one side of the rotary positioning device (4000);
the multi-station rotating device (3000) is used for performing multi-station rotation; the feeding device (2000) is used for feeding the resistor disc to be polished to an empty station of the multi-station rotating device (3000); the rotary positioning device (4000) is used for fixing the resistor disc to be polished and driving the fixed resistor disc to be polished to rotate; the polishing device (6000) is used for polishing the rotating resistor disc to be polished; the feeding and discharging device (5000) is used for placing the resistor disc to be polished on a certain station on the multi-station rotating device (3000) on the rotating positioning device (4000) and simultaneously placing the polished resistor disc on the rotating positioning device (4000) on the station; the blanking device is used for blanking the polished resistor disc on the multi-station rotating device (3000).
2. An automatic resistor disc grinding apparatus according to claim 1, characterized in that the grinding heads of the rotary positioning device (4000) and the grinding device (6000) are rotated in the same direction.
3. The automatic resistor disc grinding apparatus according to claim 1, wherein the loading and unloading device (5000) includes: a first bracket (5100), a first vertical movement mechanism, a first mounting plate (5400), a first rotation mechanism, a second mounting plate (5700), and two adsorption mechanisms (5800); the first vertical moving mechanism is arranged on the first bracket (5100), and the moving end of the first vertical moving mechanism can move up and down along the vertical direction relative to the first bracket (5100); the first mounting plate (5400) is horizontally arranged, one end of the first mounting plate (5400) is fixedly connected with the moving end of the first vertical moving mechanism, and the other end is a free end;
the second mounting plate (5700) is horizontally arranged below the free end of the first mounting plate (5400); the first rotating mechanism is arranged on the free end of the first mounting plate (5400), and an output shaft of the first rotating mechanism penetrates through the first mounting plate (5400) and is fixedly connected with the middle part of the second mounting plate (5700); an output shaft of the rotation driving mechanism can rotate relative to the first mounting plate (5400) by taking the self axis as the center; two adsorption mechanisms (5800) are all located below the second mounting plate (5700), and the two adsorption mechanisms (5800) are fixedly connected with two ends of the second mounting plate (5700) in one-to-one correspondence respectively, and the adsorption mechanisms (5800) are used for adsorbing the resistor disc.
4. The automatic resistor disc grinding device according to claim 1, characterized in that a buffer mechanism (5900) is connected between each adsorption mechanism (5800) and the second mounting plate (5700);
preferably, the buffer mechanism (5900) comprises a first connecting plate (5901), a second connecting plate (5902), two connecting columns (5903), two first guide columns (5904), two first limiting plates (5905) and two elastic sleeves (5906); the second connecting plate (5902) is fixed at the top of the adsorption mechanism (5800), and the first connecting plate (5901) is horizontally arranged between the second connecting plate (5902) and the second mounting plate (5700); both connecting posts (5903) are connected between the first connecting plate (5901) and the second mounting plate (5700); the two first guide posts (5904) are vertically fixed on the top surface of the second connecting plate (5902), sixth through holes for sliding connection of the corresponding first guide posts (5904) are formed in the positions, corresponding to the first guide posts (5904), of the first connecting plate (5901), and the top ends of the two first guide posts (5904) penetrate through the two sixth through holes in a one-to-one correspondence manner and are fixedly connected with the two first limiting plates (5905) in a one-to-one correspondence manner; the two elastic sleeves (5906) are sleeved on the two first guide posts (5904) in a one-to-one correspondence manner, and the bottom ends of the elastic sleeves (5906) are fixedly connected with the second connecting plate (5902) and the first connecting plate (5901) respectively.
5. The automatic resistor disc grinding device according to claim 3, wherein the first rotating mechanism comprises a motor base (5600) and a first motor (5500), a fifth through hole is formed in the free end of the first mounting plate (5400), a first waist-shaped through hole is formed in the position, corresponding to the fifth through hole, of the motor base (5600), and the motor base (5600) is fixed to the free end of the first mounting plate (5400) through a first fastening bolt penetrating through the fifth through hole and the first waist-shaped through hole and a first fastening nut matched with the first fastening bolt; a second kidney-shaped through hole for the output shaft of the first motor (5500) to pass through is formed in the corresponding position of the first mounting plate (5400) and the output shaft of the first motor (5500); the first motor (5500) is fixed on the motor cabinet (5600), and the output shaft of the first motor (5500) passes through the second kidney-shaped through hole and is fixedly connected with the middle part of the second mounting plate (5700).
6. The automatic resistor disc grinding apparatus according to claim 1, wherein the grinding device (6000) includes: a second bracket (6100), a second vertical movement mechanism (6200), a horizontal movement mechanism (6300), an angle adjustment mechanism (6400) and a polishing mechanism (6600); the second vertical moving mechanism (6200) is arranged on the second bracket (6100), and the moving end of the second vertical moving mechanism (6200) can move up and down along the vertical direction relative to the second bracket (6100); the horizontal moving mechanism (6300) is mounted on the moving end of the second vertical moving mechanism (6200), and the moving end of the horizontal moving mechanism (6300) is movable in the horizontal direction relative to the moving end of the second vertical moving mechanism (6200); the angle adjusting mechanism (6400) is arranged on the moving end of the horizontal moving mechanism (6300), and the rotating end of the angle adjusting mechanism (6400) can rotate relative to the horizontal moving mechanism (6300); the polishing mechanism (6600) is arranged on the rotating end of the angle adjusting mechanism (6400), and the polishing mechanism (6600) is used for polishing the resistor disc;
preferably, a bidirectional floating mechanism (6500) is connected between the polishing mechanism (6600) and the angle adjusting mechanism (6400);
preferably, the bidirectional floating mechanism (6500) comprises a first floating assembly mounted on the angle adjusting mechanism (6400) and a second floating assembly mounted on the first floating assembly, the floating direction of the second floating assembly and the first floating assembly is vertical, the polishing mechanism (6600) is mounted on the second floating assembly, and the axial direction of a polishing head of the polishing mechanism (6600) is parallel to the floating direction of the second floating assembly or the floating direction of the first floating assembly;
wherein the first floating assembly and the second floating assembly each comprise a first floating plate (6501) and a second floating plate (6502) which are oppositely arranged, the first floating plate (6501) is fixed and the second floating plate (6502) floats; the first floating plate (6501) is symmetrically provided with third connecting plates (6503) at two ends in the floating direction, and a second guide column (6504) is vertically connected between the two third connecting plates (6503); the two ends of the second floating plate (6502) in the floating direction are symmetrically provided with fourth connecting plates (6505), and the two fourth connecting plates (6505) are positioned in the middle of the two third connecting plates (6503) and are respectively connected with the second guide column (6504) in a sliding manner; two second limiting plates (6509) are fixedly arranged on a second guide column (6504) between the two fourth connecting plates (6505) along the axial direction, and a second compression spring (6510) is sleeved on the second guide column (6504) between the second limiting plates (6509) and the fourth connecting plates (6505) adjacent to the second limiting plates (6509).
7. The automatic resistor disc polishing equipment according to claim 6, wherein a first through hole is formed in a position, corresponding to the second guide post (6504), of the fourth connecting plate (6505), a sleeve (6508) is coaxially fixed in the first through hole, the sleeves (6508) on the two fourth connecting plates (6505) are oppositely arranged, and a stepped through hole structure with a large middle part and small two ends is arranged inside the sleeve (6508); the second limiting plate (6509) is slidably connected in the middle of the sleeve (6508), the second guide columns (6504) are slidably connected with two end ports of the sleeve (6508) respectively, and the second compression spring (6510) is connected between the second limiting plate (6509) and one end port of the sleeve (6508).
8. The automatic resistor disc polishing device according to claim 6, wherein two limiting blocks (6506) are arranged on one surface of each fourth connecting plate (6505) facing the adjacent third connecting plate (6503), the two limiting blocks (6506) are symmetrically arranged on two sides of the second guide post (6504), and limiting screws (6507) used for limiting the stroke of the limiting blocks (6506) are connected at positions, corresponding to the limiting blocks (6506), of the third connecting plates (6503).
9. The automatic resistor disc polishing apparatus according to claim 1, wherein the multi-station rotating device (3000) comprises a third bracket fixed on the table (1000) and a multi-station turntable mechanism mounted on the third bracket, the multi-station turntable mechanism comprises a cam divider and a multi-station turntable, the cam divider is mounted on the third bracket, the multi-station turntable is connected with a driving shaft of the cam divider, the cam divider is used for driving the multi-station turntable to rotate, and a plurality of stations for placing the resistor disc are uniformly and alternately arranged on the multi-station turntable along the circumferential direction.
10. The automatic resistor disc grinding apparatus according to claim 1, wherein the rotational positioning device (4000) includes a fourth bracket (4100), a second rotation mechanism (4200) and a pneumatic three-jaw chuck (4300), the second rotation mechanism (4200) is mounted on the fourth bracket (4100), and a rotation end of the second rotation mechanism (4200) is rotatable with respect to the fourth bracket (4100) about its own axis; a pneumatic three-jaw chuck (4300) is coaxially mounted on the rotating end of the second rotating mechanism (4200), the pneumatic three-jaw chuck (4300) being used for positioning the resistive sheet to be polished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311788240.8A CN117718829A (en) | 2023-12-22 | 2023-12-22 | Automatic resistor disc polishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311788240.8A CN117718829A (en) | 2023-12-22 | 2023-12-22 | Automatic resistor disc polishing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117718829A true CN117718829A (en) | 2024-03-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311788240.8A Pending CN117718829A (en) | 2023-12-22 | 2023-12-22 | Automatic resistor disc polishing equipment |
Country Status (1)
| Country | Link |
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| CN (1) | CN117718829A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118219117A (en) * | 2024-05-24 | 2024-06-21 | 山西鼎盛伟业机械制造有限责任公司 | Component processing equipment and processing method for coal mining machine |
-
2023
- 2023-12-22 CN CN202311788240.8A patent/CN117718829A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118219117A (en) * | 2024-05-24 | 2024-06-21 | 山西鼎盛伟业机械制造有限责任公司 | Component processing equipment and processing method for coal mining machine |
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