CN115505337B - Preparation method and application of polishing slurry - Google Patents
Preparation method and application of polishing slurry Download PDFInfo
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- CN115505337B CN115505337B CN202211020017.4A CN202211020017A CN115505337B CN 115505337 B CN115505337 B CN 115505337B CN 202211020017 A CN202211020017 A CN 202211020017A CN 115505337 B CN115505337 B CN 115505337B
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- polishing slurry
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- abrasive
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a preparation method and application of polishing slurry, wherein the preparation raw materials comprise: abrasives, hydroxy fatty acids, alcohol amines, and builders; the abrasive comprises alumina powder; the abrasive also comprises at least one of aluminum silicate powder and pumice powder; the builder comprises cationic starch. The invention provides polishing slurry, which can prevent a cloth wheel from rotating at a high speed to throw out the polishing slurry when an acrylic plate is polished, and damage the acrylic plate by beating, so that white marks are generated. Meanwhile, the polished acrylic plate can be cleaned by simply soaking the acrylic plate in clear water.
Description
Technical Field
The invention belongs to the technical field of nonmetallic surface treatment, and particularly relates to a preparation method and application of polishing slurry.
Background
Acrylic materials are widely used because of their good mechanical properties and decorative properties. The surface of the acrylic material needs to be polished in the processing process, so that the appearance of the acrylic material has a bright shell while the surface flatness is improved. At present, the acrylic polishing mainly adopts a mechanical polishing mode. Mechanical polishing consists in removing the convex portions of the surface of the object to be polished by the grinding action of the polishing slurry carried on the polishing wheel, thereby obtaining a smooth glossy surface. In the acrylic polishing process, rough polishing, medium polishing and fine polishing are generally required to be carried out on the surface in order to achieve the bright effect. Rough polishing is to use a part with rough surface of a hard wheel pair to perform preliminary processing for reducing the surface roughness; the middle polishing is to use a polishing wheel softer than the rough polishing wheel to further process the surface subjected to rough polishing, and scratches left by the rough polishing can be removed through the middle polishing and a medium-brightness surface is generated; the finish polishing is the final polishing step, and the soft polishing wheel is used for polishing, so that the surface of the polished part obtains mirror surface brightness.
At the present stage, acrylic fine polishing is mainly performed by adopting a polishing slurry combined fine polishing cloth wheel, and polishing is performed by spraying polishing slurry onto the cloth wheel rotating at a high speed by adopting a spray pipe. Because of the high-speed rotation of the cloth wheel, the polishing slurry at the edge part of the cloth wheel is easy to throw off and strike on the surface of the acrylic plate, so that white marks which cannot be wiped off are generated. Because the surface of the acrylic is oleophilic, the grease component in the polishing slurry is extremely easy to firmly adsorb on the surface of the acrylic, and the subsequent cleaning needs to be carried out at high temperature (about 80 ℃) by using wax removing water or special cleaning agent under the assistance of ultrasonic waves. The polished sub-strong polished surface is very easy to scratch under ultrasonic vibration, so that the whole processing yield is always low.
In summary, it is an urgent need to provide a polishing slurry to prevent the acrylic plate from being scratched during polishing, and to clean the polished acrylic plate by simply soaking the acrylic plate in clear water.
Disclosure of Invention
The present invention aims to solve at least one of the technical problems existing in the prior art. Therefore, the polishing slurry provided by the invention can prevent the acrylic plate from being damaged due to the fact that the cloth wheel rotates at a high speed to throw out the polishing slurry when the acrylic plate is polished, so that white marks are generated. Meanwhile, the polished acrylic plate can be cleaned by simply soaking the acrylic plate in clear water.
A second aspect of the present invention provides a method for producing the above-described polishing slurry.
The third aspect of the invention provides an application of the polishing slurry in acrylic plate treatment.
According to an embodiment of the first aspect of the present invention, a polishing slurry is prepared from: abrasives, hydroxy fatty acids, alcohol amines, and builders;
the abrasive comprises alumina powder;
the abrasive also comprises at least one of aluminum silicate powder and pumice powder;
the builder comprises cationic starch.
Embodiments of the first aspect of the invention have at least the following advantageous effects:
1. the alumina powder in the abrasive in the polishing slurry has good cutting effect, can play a role in rapidly flattening the surface in the polishing process, and the aluminum silicate powder and the pumice powder have fluffy forms, so that the polishing slurry has good cutting capability and obvious fluffiness at the same time through the combination of the alumina powder and the aluminum silicate powder or the pumice powder. Therefore, the polishing slurry thrown out during use is beaten on the acrylic plate, so that the acrylic plate is not easy to be scratched, and white marks are avoided.
2. The hydroxy fatty acid has strong lubricating capability and can play a role in surface brightening. The hydroxyl fatty acid contains water-soluble hydroxyl, and after the hydroxyl fatty acid is neutralized with alcohol amine, corresponding polyhydroxy alcohol amine soap is generated, so that the difficulty of subsequent cleaning is reduced.
3. The cationic starch disclosed by the invention can be adsorbed on the surface of acrylic, so that the polished surface of acrylic is hydrophilic, the adsorption of grease on the surface of acrylic is reduced, and the washability of polishing slurry is further improved. By adding the easily-cleaned hydroxy fatty acid, the alcohol amine and the cationic starch, grease components in the polishing slurry are not easy to adsorb on the surface of acrylic, so that the cleaning difficulty of the polishing slurry is reduced.
According to some embodiments of the invention, the alcohol amine comprises at least one of diethanolamine and triethanolamine.
According to some embodiments of the invention, the alumina powder has a particle size D50 of between 0.5 and 1.5 μm.
According to some embodiments of the invention, the aluminum silicate powder and the pumice powder have a mesh number between 1000 and 4000 mesh.
According to some embodiments of the invention, the abrasive comprises the alumina powder and the aluminum silicate powder in a weight ratio of 0.5 to 1:0.5.
when the weight ratio of the alumina powder to the aluminum silicate powder is too high, the polishing slurry is easy to damage the acrylic plate; if the weight ratio is too low, the cutting force of the polishing slurry may be insufficient.
According to some embodiments of the invention, the abrasive comprises the alumina powder and the pumice powder in a weight ratio of 0.5-1:1.
when the weight ratio of the alumina powder to the pumice powder is too high, the polishing slurry is easy to damage the acrylic plate; if the weight ratio is too low, the cutting force of the polishing slurry may be insufficient.
According to some embodiments of the invention, the hydroxy fatty acid comprises at least one of hydroxy myristic acid and hydroxy palmitic acid.
According to some embodiments of the invention, the polishing slurry further comprises a viscosity stabilizer and water.
According to some embodiments of the invention, the viscosity stabilizer comprises a hydrophobically modified acrylic polymer.
The viscosity stabilizer ensures that the viscosity of the polishing slurry is kept stable at room temperature (10-35 ℃), so that the quantity sprayed by an automatic spray gun is kept stable when the polishing slurry is used, and the stability and consistency of the process are ensured.
According to some embodiments of the invention, the polishing slurry comprises the following components in parts by weight:
according to some embodiments of the invention, the polishing slurry comprises the following components in parts by weight:
30-40 parts of abrasive;
10-20 parts of viscosity stabilizer;
26-34 parts of water.
According to some preferred embodiments of the present invention, the polishing slurry comprises the following components in parts by weight:
according to some preferred embodiments of the present invention, the polishing slurry comprises the following components in parts by weight:
according to a second aspect of the present invention, there is provided a method for producing the polishing slurry, comprising adding the abrasive after mixing and dispersing the hydroxy fatty acid, the alcohol amine and the builder.
The hydroxy fatty acid, the alcohol amine, the builder and the water are uniformly mixed to form a homogeneous fluid, and then the abrasive is added, so that the abrasive is uniformly dispersed in the homogeneous fluid.
According to some embodiments of the invention, the mixing further comprises adding the viscosity stabilizer.
According to some embodiments of the invention, the temperature of the mixing is 80-90 ℃.
According to some embodiments of the invention, the temperature up to the temperature of the mixing is at a rate of 15-25 ℃/h.
Under the heating rate, the problem that the viscosity of the polishing slurry is higher due to the fact that mixed materials expand due to the fact that the heating rate is too high is avoided, and meanwhile, the problem that the whole preparation process is long in time consumption due to the fact that the heating rate is too low, and the production efficiency is affected.
According to some embodiments of the invention, the dispersing comprises dispersing with water.
According to some embodiments of the invention, the water has a temperature of 80-90 ℃.
According to some embodiments of the invention, the dispersing comprises stirring.
According to some embodiments of the invention, the stirring speed is 40-60r/min.
According to some embodiments of the invention, the stirring time is 10-20min.
According to some embodiments of the invention, the adding water further comprises cooling the mixed solution to room temperature.
According to some embodiments of the invention, the cooling comprises stirred cooling.
According to some embodiments of the invention, the cooling is at a rate of 20 ℃/h.
According to some embodiments of the invention, the stirring time is 10-20min.
According to some embodiments of the invention, the stirring speed is 40-60r/min
According to a third aspect of the present invention, there is provided an application of the polishing slurry in acrylic sheet treatment.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
Detailed Description
The conception and the technical effects produced by the present invention will be clearly and completely described in conjunction with the embodiments below to fully understand the objects, features and effects of the present invention. It is apparent that the described embodiments are only some embodiments of the present invention, but not all embodiments, and that other embodiments obtained by those skilled in the art without inventive effort are within the scope of the present invention based on the embodiments of the present invention. The test methods used in the examples are conventional methods unless otherwise specified; the materials, reagents and the like used, unless otherwise specified, are those commercially available. If not specified, the same ingredients of each example and comparative example were purchased from the same manufacturer in the same batch; the corresponding parameters are the same as in example 1 unless otherwise specified.
In the description of the present invention, the descriptions of the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
Example 1
This example prepared a polishing slurry consisting of the following components by weight:
wherein the alumina powder is HP01 produced by Zhengzhou flower new material Co., ltd; the aluminum silicate powder and the cationic starch are respectively produced by the fine chemical industry Co-Ltd of Guangdong mountain and the modified starch Co-Ltd of Taian mountain, and the hydrophobic modified acrylic polymer is Acusol 845 produced by the Dow company.
Example 2
The embodiment provides a preparation method of polishing slurry, which comprises the following specific steps:
according to the weight components in the example 1, the hydrophobic modified acrylic polymer, the hydroxy myristic acid, the triethanolamine and the cationic starch are poured into a reaction kettle, stirred at the stirring speed of 50r/min for 15min at normal temperature, heated to 85 ℃ at the speed of 20 ℃/h, added with water at 85 ℃ and continuously stirred for 15min, cooled at the speed of 20 ℃/h, added with alumina powder and aluminum silicate powder and continuously stirred for 15min, and the acrylic polishing slurry is obtained.
Example 3
This example prepared a polishing slurry consisting of the following components by weight:
example 4
The embodiment provides a preparation method of polishing slurry, which comprises the following specific steps:
according to the weight components in the example 3, the hydrophobic modified acrylic polymer, the hydroxy palmitic acid, the diethanol amine and the cationic starch are poured into a reaction kettle, stirred for 15min at the stirring speed of 50r/min at normal temperature, heated to 85 ℃ at the speed of 20 ℃/h, added with water at 85 ℃ and continuously stirred for 15min, cooled at the speed of 20 ℃/h, added with alumina powder and pumice powder and continuously stirred for 15min, and the acrylic polishing slurry is obtained.
Example 5
This example provides a polishing slurry, which differs from example 1 in that the hydrophobically modified acrylic polymer of example 1 is excluded, with the remaining conditions being the same.
Example 6
This example provides a method for preparing a polishing slurry, which differs from example 2 in that the preparation is performed according to the weight component in example 5, with the remaining conditions being the same.
Comparative example 1
This comparative example provides a polishing slurry, and this comparative example differs from example 1 in that aluminum silicate powder (2000 mesh) in example 1 is not included, and the remaining conditions are the same.
Comparative example 2
This comparative example provides a method for producing a polishing slurry, which differs from example 2 in that the production is carried out in accordance with the weight components in comparative example 1, with the remaining conditions being the same.
Comparative example 3
This comparative example provides a polishing slurry, and the difference between this comparative example and example 1 is that myristic acid is used instead of hydroxy myristic acid in example 1, with the remaining conditions being the same.
Comparative example 4
This comparative example provides a method for producing a polishing slurry, which differs from example 1 in that the production is carried out in accordance with the weight components in comparative example 3, with the remaining conditions being the same.
Comparative example 5
This comparative example provides a polishing slurry, and this comparative example differs from example 1 in that the cationic starch of example 1 is not included, and the remaining conditions are the same.
Comparative example 6
This comparative example provides a method for producing a polishing slurry, which differs from example 1 in that the production is carried out in accordance with the weight components in comparative example 5, with the remaining conditions being the same.
Comparative example 7
This comparative example provides a polishing slurry, and this comparative example differs from example 1 in that the alcohol amine of example 1 is not included, and the remaining conditions are the same.
Comparative example 8
This comparative example provides a method for producing a polishing slurry, which differs from example 1 in that the production is carried out in accordance with the weight components in comparative example 7, with the remaining conditions being the same.
Test example 1
The polishing slurries of the above examples and comparative examples were tested for viscosity stability, cleanability and scratch resistance by the following methods:
(1) Viscosity stability test
The viscosity of the slurry was measured with a digital viscometer at 10℃and 25℃and 35℃respectively, and the results of the measurements are shown in Table 1.
(2) Cleaning test
10 acrylic plates were selected and polished on an automatic polisher with the polishing slurry prepared as above, with a polishing time fixed at 40s each time. The polished acrylic plate with the polishing slurry on the surface was weighed and the weight was recorded as M0. Soaking and cleaning with pure water at 80deg.C for 15min, leaching with pure water at normal temperature for 3 times, oven drying at 90deg.C for 60min, naturally cooling to room temperature, weighing, and recording as M1. The surface of the acrylic plate is wiped by pure white soft wiping cloth, and whether foreign matters exist on the surface of the wiping cloth or not is observed, if no visible foreign matters exist, the cleaning rate is 100%. If the foreign matters are visible to the naked eyes, continuously putting the acrylic plate into alcohol for thorough cleaning, accurately weighing the final weight of the acrylic plate after thorough cleaning, marking as M2, and calculating the average cleaning rate. Cleaning rate= (M0-M1)/(M0-M2) 100%, and the related data are shown in table 1.
(3) Beat injury test
Observing the acrylic plate thoroughly cleaned as above with a magnifying glass, counting the proportion of the acrylic plate with white spots, and calculating the injury rate. The damage ratio = number of white spots acrylic plates/total acrylic plates 100%, and the related data are shown in table 1.
TABLE 1 results of viscosity stability, cleaning and wound testing
As can be seen from Table 1, the viscosities of examples 2 and 4 were maintained substantially stable at room temperature, the cleaning rates were 100% and no acrylic plate was scratched. As can be seen from comparative example 2 and comparative example 2, the addition of aluminum silicate powder can significantly prevent the acrylic plate from being damaged by the impact. As can be seen from comparative example 2 and comparative examples 4 and 6, the hydroxy myristic acid is more easily washed than the myristic acid, and the cationic starch can significantly enhance the cleanability of the polishing slurry. As can be seen from a comparison of example 2 and example 6, the hydrophobically modified acrylic polymer maintains a stable slurry viscosity at room temperature of 10-35 ℃. The polishing slurry disclosed by the invention keeps stable viscosity at room temperature, can prevent an acrylic plate from being scratched by the polishing slurry, and can be cleaned by soaking in clear water, so that the polishing slurry has a high practical application value.
While the embodiments of the present invention have been described in detail, the present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art. Furthermore, embodiments of the invention and features of the embodiments may be combined with each other without conflict.
Claims (3)
1. A polishing slurry, characterized in that the polishing slurry comprises the following components in parts by weight:
30-40 parts of abrasive;
10-15 parts of hydroxy fatty acid;
3-5 parts of a builder;
alcohol amine 5-8 parts;
the preparation raw materials of the polishing slurry also comprise a viscosity stabilizer and water;
the builder comprises cationic starch;
the abrasive comprises alumina powder and aluminum silicate powder, wherein the weight ratio of the alumina powder to the aluminum silicate powder is 0.5-1:0.5;
or the abrasive comprises alumina powder and pumice powder, wherein the weight ratio of the alumina powder to the pumice powder is 0.5-1:1, a step of;
the hydroxy fatty acid comprises at least one of hydroxy myristic acid and hydroxy palmitic acid;
the alcohol amine comprises at least one of diethanolamine and triethanolamine;
the viscosity stabilizer comprises a hydrophobically modified acrylic polymer.
2. The method of claim 1, comprising adding the abrasive to the slurry after mixing and dispersing the hydroxy fatty acid, the alcohol amine, the viscosity stabilizer, the water, and the builder.
3. Use of the polishing slurry according to claim 1 in acrylic sheet treatment.
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| CN110923718A (en) * | 2019-12-12 | 2020-03-27 | 广东红日星实业有限公司 | Water-soluble fine polishing solution and preparation method thereof |
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| CN113150696A (en) * | 2021-03-01 | 2021-07-23 | 广州凌玮科技股份有限公司 | Polishing solution for reducing micro scratches on surface of silicon wafer |
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| US7374592B2 (en) * | 2005-12-15 | 2008-05-20 | Ashland Licensing And Intellectual Property, Llc (Alip) | Cleaning and polishing composition for metallic surfaces |
| KR102466923B1 (en) * | 2019-03-20 | 2022-11-14 | 닛폰세이시가부시키가이샤 | thermal recorder |
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2022
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| US4209504A (en) * | 1977-12-22 | 1980-06-24 | Blendax-Werke R. Schneider Gmbh & Co. | Toothpaste with zeolite polishing agent |
| CN104302710A (en) * | 2012-05-11 | 2015-01-21 | 欧米亚国际集团 | Charge controlled PHCH |
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| WO2020138717A1 (en) * | 2018-12-28 | 2020-07-02 | 주식회사 케이씨텍 | Cmp slurry composition for polishing polycrystalline silicon and polishing method using same |
| CN110923718A (en) * | 2019-12-12 | 2020-03-27 | 广东红日星实业有限公司 | Water-soluble fine polishing solution and preparation method thereof |
| CN112500800A (en) * | 2020-12-15 | 2021-03-16 | 广东红日星实业有限公司 | Stainless steel polishing wax and preparation method thereof |
| CN113150696A (en) * | 2021-03-01 | 2021-07-23 | 广州凌玮科技股份有限公司 | Polishing solution for reducing micro scratches on surface of silicon wafer |
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